JPH0485713A - Magnetic head - Google Patents
Magnetic headInfo
- Publication number
- JPH0485713A JPH0485713A JP19952890A JP19952890A JPH0485713A JP H0485713 A JPH0485713 A JP H0485713A JP 19952890 A JP19952890 A JP 19952890A JP 19952890 A JP19952890 A JP 19952890A JP H0485713 A JPH0485713 A JP H0485713A
- Authority
- JP
- Japan
- Prior art keywords
- thickness
- films
- film
- magnetic
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 63
- 229910000859 α-Fe Inorganic materials 0.000 claims abstract description 15
- 239000010408 film Substances 0.000 claims description 47
- 239000002184 metal Substances 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 239000010409 thin film Substances 0.000 claims description 17
- 238000005728 strengthening Methods 0.000 claims description 12
- 230000005294 ferromagnetic effect Effects 0.000 claims description 11
- 230000004907 flux Effects 0.000 claims description 6
- 230000000737 periodic effect Effects 0.000 claims description 3
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 abstract description 8
- 239000000853 adhesive Substances 0.000 abstract description 6
- 230000007547 defect Effects 0.000 abstract description 3
- 230000015556 catabolic process Effects 0.000 abstract 2
- 238000006731 degradation reaction Methods 0.000 abstract 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000011162 core material Substances 0.000 description 21
- 238000009792 diffusion process Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000137 annealing Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 229910000702 sendust Inorganic materials 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
り粟上立村且分肚
本発明は、磁気ヘッドに関するものであり、詳細には、
R−DATや高密度FDD装置等に使用される平行型M
I G (Metal In Gap) ヘッドにお
けるギャップ構造を改善して高密度記録を実現した磁気
ヘッドに関するものである。[Detailed Description of the Invention] The present invention relates to a magnetic head.
Parallel type M used for R-DAT and high-density FDD equipment, etc.
The present invention relates to a magnetic head that achieves high-density recording by improving the gap structure of the IG (Metal In Gap) head.
従来旦改孟
磁気記録の分野においては、情報信号の高密度記録化や
高周波数化等が進められており、これに対応して磁気記
録媒体としてF e r Co + N i等の強磁性
金属粉を磁性粉に用いたいわゆるメタルテープや磁性金
属材料を蒸着などの真空薄膜形成技術によりベースフィ
ルム上に直接被着したいわゆる蒸着テープ等が実用化さ
れ普及してきている。このような状況から磁気ヘッドに
対しては、例えば高い抗磁力や残留磁束密度を有する磁
気記録媒体に対して良好な記録再生を行うために、磁気
ヘッドのコア材料が高飽和磁束密度、高透磁率を有する
ことなど様々な特性が要求されている。In the field of magnetic recording, the recording density and frequency of information signals are increasing, and in response to this, ferromagnetic metals such as FerroCo+Ni are being used as magnetic recording media. So-called metal tapes in which powder is used as magnetic powder and so-called vapor-deposited tapes in which magnetic metal materials are directly deposited on base films using vacuum thin film forming techniques such as vapor deposition have been put into practical use and are becoming popular. Under these circumstances, the core material of the magnetic head must have a high saturation magnetic flux density and high permeability in order to perform good recording and reproduction on magnetic recording media with high coercive force and residual magnetic flux density. Various properties are required, such as having magnetic property.
かかる諸要求を満たす磁気ヘッドを、例えばフェライト
材等の強磁性酸化物材料単体で作製することは難しく、
そこで高飽和磁束密度を有する強磁性金属薄膜、例えば
センダストなどと組み合わせて磁気ヘッドを構成したい
わゆる複合型の磁気ヘッドが提案されている。このセン
ダストはすてに公知である通りF e r A IIS
tを主組成とする合金であり、例えば雑誌「電子材料
J 1981年6月号P2O6に示されるように、飽和
磁束密度Bsが9500Gauss +抗磁力Hcが2
QmOe、実効透磁率ueffが30000 at 3
00HZ 、 ビッカース硬度Hvが500というよ
うな優れた特性を備えているものである。It is difficult to manufacture a magnetic head that satisfies these requirements from a single ferromagnetic oxide material such as ferrite material;
Therefore, a so-called composite magnetic head has been proposed in which a magnetic head is constructed by combining a ferromagnetic metal thin film having a high saturation magnetic flux density, such as Sendust. As is well known, this Sendust
For example, as shown in the magazine "Electronic Materials J, June 1981 issue P2O6, the saturation magnetic flux density Bs is 9500 Gauss + the coercive force Hc is 2
QmOe, effective permeability ueff is 30000 at 3
It has excellent properties such as 00Hz and Vickers hardness Hv of 500.
従来の上記複合型磁気ヘッドでは、例えば第6図ないし
第8図に示すように巻線係止溝9 a +9b、巻線挿
通穴10を形成した磁気コア部2a。In the conventional composite magnetic head, as shown in FIGS. 6 to 8, for example, a magnetic core portion 2a has a winding locking groove 9a+9b and a winding insertion hole 10 formed therein.
2bの材料であるフェライトと、コアチップの頂端面8
において、磁気ギャップgを形成する金属薄膜5との付
着力を向上させるため、各コア2a、2bの磁気ギャッ
プgを形成しているエツジ部位2a+2bの端面に蒸着
あるいはスパッタ法(不活性ガス雰囲気、特にアルゴン
ガス)などにより、付着強化膜6を500〜700人の
厚さに被着形成しておき、その上にセンダストなどの金
属薄膜5を被着させる。この時、付着力強化膜6は元素
周期律表で第1Va〜VIa族に含まれる金属の中から
選択され、例えばCr、T+が多く用いられている。こ
のように形成した磁気ヘッド部2に銅製の線材7を巻回
して磁気ヘッド1を得ていた。また、付着力強化膜6と
して、これらの金属単体ではなく、拡散を防止するため
の酸化膜、すなわちSiO2などの薄膜14を300λ
〜500人の膜厚で形成し、それをはさみこんで積層構
造とすることにより、第9図ないし第10図に示すよう
な磁気へラドコア15とすることも行われていた。Ferrite which is the material of 2b and the top end surface 8 of the core chip
In order to improve the adhesion force with the metal thin film 5 forming the magnetic gap g, vapor deposition or sputtering (inert gas atmosphere, In particular, an adhesion reinforcing film 6 is formed to a thickness of 500 to 700 layers using argon gas, etc., and a metal thin film 5 such as Sendust is applied thereon. At this time, the adhesion-strengthening film 6 is selected from metals included in Groups 1 Va to VIa of the periodic table of elements, and for example, Cr and T+ are often used. The magnetic head 1 was obtained by winding a copper wire 7 around the magnetic head portion 2 formed in this manner. In addition, as the adhesion strength-enhancing film 6, instead of using these metals alone, an oxide film 14 for preventing diffusion, that is, a thin film 14 such as SiO2 is used.
By forming a film with a thickness of ~500 mm and sandwiching it to form a laminated structure, a magnetic herad core 15 as shown in FIGS. 9 and 10 was also made.
また、公開特許公報率1−223GO6号において、磁
気コア半休の磁性膜の形成面に比透磁率/膜厚が100
μm”という磁性材を下地膜として形成することにより
、殆どコンタ−効果が発生しない磁気ヘッドが得られる
との特許例もある。In addition, in published patent publication No. 1-223GO6, the relative magnetic permeability/film thickness is 100
There is also a patent example that states that by forming a magnetic material called "μm" as an underlayer film, a magnetic head with almost no contour effect can be obtained.
よ”
上述した、平行型MIGヘッド1は、その製造上溝切り
加工が簡単な点でその製作が容易であるという利点を存
する。しかしながら、そのコアチップ2を製造するのに
、所望の薄膜をスパッタリング等で形成した後、アニー
ルやガラス融着などの熱処理工程を経るため、付着力強
化膜6を形成するCr等の金属が、フェライトコア2a
、2b中のOと熱的に拡散することで結び付き、フェラ
イトコア2 a + 2 bと付着力強化膜6との界面
近傍で劣化層6aが形成され磁気特性が劣化する。The above-mentioned parallel type MIG head 1 has the advantage of being easy to manufacture in that the groove cutting process is simple.However, in order to manufacture the core chip 2, a desired thin film is sputtered, etc. After forming the ferrite core 2a, the metal such as Cr forming the adhesion strength film 6 undergoes a heat treatment process such as annealing and glass fusion.
, 2b through thermal diffusion, a degraded layer 6a is formed near the interface between the ferrite core 2a + 2b and the adhesion strengthening film 6, and the magnetic properties are degraded.
すなわち、磁気ギャップgに対して平行な金属薄膜5と
の間に上記劣化層6aが形成されると、この部分の磁気
抵抗が大きくなって磁気ギャップgと平行な疑似ギャッ
プg15g2となる。そうすると、このMIGヘッド1
,15により磁気媒体11に書き込まれた情報を再生す
る際、周波数特性に疑似ギャップによるうねり現象が発
生したり、正確な再生が困難になったりしてエラーが多
発するという不都合があった。That is, when the deteriorated layer 6a is formed between the metal thin film 5 parallel to the magnetic gap g, the magnetic resistance of this portion becomes large, resulting in a pseudo gap g15g2 parallel to the magnetic gap g. Then, this MIG head 1
, 15 on the magnetic medium 11, there are disadvantages in that wave characteristics occur in frequency characteristics due to pseudo gaps, and accurate reproduction becomes difficult, resulting in frequent errors.
さらに、上記拡散の影響によりギャップ形成面g−9g
bに微小な凹凸が生じ、正確な磁気ギャップ形成が困難
となり、ギヤツブ内気泡やギヤツブ大不良の原因となっ
ていた。Furthermore, due to the influence of the above-mentioned diffusion, the gap forming surface g-9g
Microscopic irregularities were formed on the surface of the gear, making it difficult to form an accurate magnetic gap and causing air bubbles within the gear and major defects in the gear.
また、第9図ないし第10図に示すような拡散防止膜と
してSiO2などの薄層14を形成した磁気へラドコア
15においても、フェライトコア2 a t 2 bと
付着力強化膜6との界面近傍で磁気特性が劣化してしま
い、疑似ギャップとなる。さらに拡散防止層の厚みは3
00Å以上なければ拡散を止めることができず、厚くし
すぎると、今度はそれ自身が疑似ギャップとして作用し
たり、Crによる付着力強度が劣化するといった問題が
あり、膜厚の制御が非常に難しい。Also, in the magnetic herad core 15 in which a thin layer 14 of SiO2 or the like is formed as a diffusion prevention film as shown in FIGS. The magnetic properties deteriorate, resulting in a pseudo gap. Furthermore, the thickness of the diffusion prevention layer is 3
If the film is not larger than 00 Å, it will not be possible to stop diffusion, and if it is too thick, it will act as a pseudo gap or the adhesive strength due to Cr will deteriorate, making it extremely difficult to control the film thickness. .
そこて、本発明の主要な目的は、製作が容易でしかも、
疑似ギャップからのコンタ−効果による周波数特性のう
ねりの発生しにくい構造を有する平行型MIGヘッドを
提供することにある。Therefore, the main object of the present invention is to be easy to manufacture and to
It is an object of the present invention to provide a parallel type MIG head having a structure in which waviness in frequency characteristics due to a contour effect from a pseudo gap is less likely to occur.
− ための
本発明は、多結晶フェライトからなる一対のコアの磁気
ギャップを形成するエツジ部位に、下地酸化膜と元素周
期律表で第1a〜VIa族中の金属からなる付着力強化
膜を介して、高飽和磁束密度を有する強磁性体の金属薄
膜を磁気ギャップに平行に設けた磁気ヘッドにおいて、
上記下地酸化膜の膜厚を5〜25人、付着力強化膜の膜
厚を5〜200人に形成したことを特徴とする。- The present invention provides an adhesive strength-enhancing film made of a base oxide film and a metal from Groups 1a to VIa of the periodic table of elements, on the edge portions forming the magnetic gap of a pair of cores made of polycrystalline ferrite. In a magnetic head in which a ferromagnetic metal thin film with high saturation magnetic flux density is provided parallel to the magnetic gap,
It is characterized in that the base oxide film has a thickness of 5 to 25 layers, and the adhesion-strengthening film has a thickness of 5 to 200 layers.
■
上記の技術的手段によれば、一対のフェライト製コアの
磁気ギャップを形成するエツジ部位に、下地酸化膜を5
〜25人、次に付着力強化膜を5〜200人を介して強
磁性体の金属薄膜を設けることにより、付着力強化膜を
形成する金属が、アニールやコア接合一体化時の温度で
フェライトコア中に拡散して磁気特性劣化層を形成する
のを防止し、十分な膜の付着力を得ることができる。■ According to the above technical means, five base oxide films are applied to the edge portions of the pair of ferrite cores that form the magnetic gap.
~25 people, and then a ferromagnetic metal thin film is applied through 5 to 200 people, so that the metal forming the adhesion strength film becomes ferrite at the temperature during annealing and core bonding. It is possible to prevent the formation of a layer with deteriorated magnetic properties due to diffusion into the core, and to obtain sufficient adhesion of the film.
災胤桝
本発明の一実施例を第1図ないし第5図を参照して以下
に説明する。第6図ないし第10図と同一参照符号は同
一物を示し、その説明を省略する。An embodiment of the present invention will be described below with reference to FIGS. 1 to 5. The same reference numerals as in FIGS. 6 to 10 indicate the same parts, and the explanation thereof will be omitted.
本発明の特徴は上記フェライトコア2 a + 2
bと金属薄膜5との間に下地酸化膜12を5〜25人、
付着力強化膜6を5〜200人の厚さに介在形成したこ
とである。The feature of the present invention is the above ferrite core 2a + 2
A base oxide film 12 is formed by 5 to 25 people between b and the metal thin film 5.
The adhesion-strengthening film 6 is formed to have a thickness of 5 to 200 layers.
上記下地酸化膜12の膜厚に関しては、膜厚を25Å以
上厚くすると、下地酸化膜が疑似ギャップとして影響を
出しはじめる。また、フェライトコア2a、2bと金属
薄膜5との密着性も悪くなり膜ハガレを発生する。また
逆に、下地酸化膜12の膜厚を5λ以下に薄くすると、
下地酸化膜の機能を失い、付着力強化膜6に使っている
金属とフェライトコア中のOとが半分以上結合してしま
い、磁気特性の劣化層を形成して疑似ギャップとなる。Regarding the film thickness of the base oxide film 12, if the film thickness is increased by 25 Å or more, the base oxide film starts to exert an influence as a pseudo gap. Furthermore, the adhesion between the ferrite cores 2a, 2b and the metal thin film 5 also deteriorates, resulting in film peeling. Conversely, if the thickness of the base oxide film 12 is made thinner than 5λ,
The function of the base oxide film is lost, and more than half of the metal used for the adhesion strength film 6 and the O in the ferrite core are combined, forming a layer with deteriorated magnetic properties, resulting in a pseudo gap.
付着力強化膜の膜厚は、5λ以下では、金属薄膜との密
着性に問題がある。また逆に200人以上では、アニー
ルやガラス融着などの熱処理時の拡散量が強磁性体であ
る金属薄膜の磁気特性の低下を引き起こし良好な磁気ヘ
ッド特性を得られない。If the thickness of the adhesion-strengthening film is less than 5λ, there is a problem in the adhesion with the metal thin film. On the other hand, if there are more than 200 people, the amount of diffusion during heat treatment such as annealing or glass fusion will deteriorate the magnetic properties of the ferromagnetic metal thin film, making it impossible to obtain good magnetic head properties.
第4図に下地酸化膜を100人、付着力強化膜を400
人とした時の実施例の結果を曲線Aで示す。Figure 4 shows 100 base oxide films and 400 adhesive strength films.
Curve A shows the results of the example when used as a human.
疑似ギャップによるコンタ−効果で周波数特性のうねり
が1.5dBと大きく、疑似ギャップが大きいことが判
る。It can be seen that the contour effect due to the pseudo gap causes a large waviness in the frequency characteristic of 1.5 dB, indicating that the pseudo gap is large.
第5図に本発明の下地酸化膜厚および付着力強化膜厚で
の実施例の結果を曲線Bで示す。コンタ−効果による周
波数特性のうねりが0.3dBと小さく押さえられてい
ることが判る。In FIG. 5, curve B shows the results of the example with the base oxide film thickness and the adhesion-strengthening film thickness of the present invention. It can be seen that the waviness in the frequency characteristics due to the contour effect has been suppressed to a small 0.3 dB.
光肌二史果
本発明によれば、一対のフェライト製コアを接合一体化
してなるコアチップの頂端面に磁気ギャップを形成し、
磁気ギャップに位置するコアのエツジ部位に、下地酸化
膜および付着力強化膜を介して強磁性体の金属薄膜を設
ける際、下地酸化膜の膜厚および付着力強化膜の膜厚を
最適化したことにより、付着力強化膜を形成する金属が
フェライトコアと強磁性金属薄膜の間に磁気劣化層の影
響が出ない適度な拡散を示し、殆どコンタ−効果のない
磁気ヘッドが得られた。また、付着力強化膜の拡散が少
ないため、それに伴うギヤツブ内気泡やギヤツブ大不良
による歩留りの低下を改善できるとともに、強磁性金属
薄膜自身の磁気特性劣化が防止されて出力特性が十分大
きな信頼性の高い磁気ヘッドを得ることができる。According to the present invention, a magnetic gap is formed on the top end surface of a core chip formed by bonding and integrating a pair of ferrite cores,
When a thin ferromagnetic metal film is provided on the edge of the core located in the magnetic gap via a base oxide film and an adhesion-strengthening film, the thickness of the base oxide film and the adhesion-strengthening film are optimized. As a result, the metal forming the adhesion strength film showed appropriate diffusion between the ferrite core and the ferromagnetic metal thin film without being affected by the magnetic deterioration layer, and a magnetic head with almost no contour effect was obtained. In addition, because the adhesion-strengthening film spreads less, it is possible to improve the yield loss caused by air bubbles in the gear hub and large gear gear defects, and to prevent deterioration of the magnetic properties of the ferromagnetic metal thin film itself, resulting in sufficiently high reliability in output characteristics. It is possible to obtain a magnetic head with high performance.
第1図と第2図は、本発明に係る磁気ヘッドの一実施例
を示す斜視図と平面図、第3図は第1図磁気ヘッドの磁
気ギャップ近傍部分を示す要部拡大断面図、第4図と第
5図は本発明の実施例の結果を示す周波数−出力レベル
特性図である。第6図と第7図および第9図は従来の磁
気ヘッドの一具体例を示す斜視図と平面図、第8図は第
6図磁気ヘッドの磁気ギャップ近傍部分を示す要部拡大
断面図、第10図は第9図の磁気ヘッドの磁気ギャップ
近傍部分を示す要部拡大断面図である。
2・・・コアチップ、
2a+2b・・・コア、
5・・・金属薄膜、
6・・・付着力強化膜、
8・・・頂端面、
12・・・拡散防止層、
g・・・磁気ギャップ。
竿
閃
第
図
一一一帰 濁凌靭f
〔間1〕
β1−1 and 2 are a perspective view and a plan view showing an embodiment of the magnetic head according to the present invention, and FIG. 4 and 5 are frequency-output level characteristic diagrams showing the results of the embodiment of the present invention. 6, 7, and 9 are a perspective view and a plan view showing a specific example of a conventional magnetic head, and FIG. 8 is an enlarged sectional view of a main part showing a portion near the magnetic gap of the magnetic head shown in FIG. FIG. 10 is an enlarged cross-sectional view of a main part of the magnetic head of FIG. 9 showing a portion near the magnetic gap. 2...Core chip, 2a+2b...Core, 5...Metal thin film, 6...Adhesion strengthening film, 8...Top end surface, 12...Diffusion prevention layer, g...Magnetic gap. Rod flash figure 111 return turbidity f [duration 1] β1-
Claims (1)
磁気ギャップを形成するエッジ部に、下地酸化膜と元素
周期律表で、第IVa〜VIa族中の金属からなる付着力強
化膜を介して、高飽和磁束密度を有する強磁性体の金属
薄膜を磁気ギャップに平行に設けた磁気ヘッドにおいて
、 上記下地酸化膜の膜厚を5〜25Åおよび付着力強化膜
の膜厚を5〜200Åで介在・形成したことを特徴とす
る磁気ヘッド。[Claims] A base oxide film and an additive made of a metal from Groups IVa to VIa of the periodic table of elements are formed on the edge portions forming a magnetic gap of a pair of cores made of polycrystalline ferrite, a ferromagnetic oxide. In a magnetic head in which a ferromagnetic metal thin film having a high saturation magnetic flux density is provided in parallel to the magnetic gap via an adhesion-strengthening film, the thickness of the base oxide film is 5 to 25 Å and the thickness of the adhesion-strengthening film is 1. A magnetic head characterized in that a magnetic head is formed with a thickness of 5 to 200 Å.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19952890A JPH0485713A (en) | 1990-07-27 | 1990-07-27 | Magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19952890A JPH0485713A (en) | 1990-07-27 | 1990-07-27 | Magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0485713A true JPH0485713A (en) | 1992-03-18 |
Family
ID=16409333
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19952890A Pending JPH0485713A (en) | 1990-07-27 | 1990-07-27 | Magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0485713A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62145510A (en) * | 1985-12-18 | 1987-06-29 | Sony Corp | Magnetic head |
JPH01155509A (en) * | 1987-12-14 | 1989-06-19 | Alps Electric Co Ltd | Magnetic head |
JPH01173306A (en) * | 1987-12-26 | 1989-07-10 | Sharp Corp | Magnetic head and its production |
JPH0278004A (en) * | 1988-09-13 | 1990-03-19 | Nec Kansai Ltd | Magnetic head and production thereof |
-
1990
- 1990-07-27 JP JP19952890A patent/JPH0485713A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62145510A (en) * | 1985-12-18 | 1987-06-29 | Sony Corp | Magnetic head |
JPH01155509A (en) * | 1987-12-14 | 1989-06-19 | Alps Electric Co Ltd | Magnetic head |
JPH01173306A (en) * | 1987-12-26 | 1989-07-10 | Sharp Corp | Magnetic head and its production |
JPH0278004A (en) * | 1988-09-13 | 1990-03-19 | Nec Kansai Ltd | Magnetic head and production thereof |
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