JPH01270207A - Magnetic thin film for thin film magnetic head - Google Patents
Magnetic thin film for thin film magnetic headInfo
- Publication number
- JPH01270207A JPH01270207A JP9807388A JP9807388A JPH01270207A JP H01270207 A JPH01270207 A JP H01270207A JP 9807388 A JP9807388 A JP 9807388A JP 9807388 A JP9807388 A JP 9807388A JP H01270207 A JPH01270207 A JP H01270207A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- permalloy
- thin film
- film
- perminvar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 25
- 239000010408 film Substances 0.000 claims abstract description 28
- 229910000889 permalloy Inorganic materials 0.000 claims abstract description 28
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052742 iron Inorganic materials 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 5
- 239000010941 cobalt Substances 0.000 claims abstract 2
- 229910017052 cobalt Inorganic materials 0.000 claims abstract 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910002058 ternary alloy Inorganic materials 0.000 claims 2
- 230000004907 flux Effects 0.000 abstract description 17
- 230000035699 permeability Effects 0.000 abstract description 10
- 239000000203 mixture Substances 0.000 abstract description 7
- 229910045601 alloy Inorganic materials 0.000 abstract description 2
- 239000000956 alloy Substances 0.000 abstract description 2
- 238000010030 laminating Methods 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 14
- 238000007747 plating Methods 0.000 description 8
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 4
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 4
- 238000003475 lamination Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- ZDYQINDXPNAOKX-UHFFFAOYSA-N 4-fluoro-n-[5-[(4-fluorophenyl)methylsulfanyl]-1,3,4-thiadiazol-2-yl]benzamide Chemical compound C1=CC(F)=CC=C1CSC(S1)=NN=C1NC(=O)C1=CC=C(F)C=C1 ZDYQINDXPNAOKX-UHFFFAOYSA-N 0.000 description 1
- 101100342994 Arabidopsis thaliana IIL1 gene Proteins 0.000 description 1
- 229910020018 Nb Zr Inorganic materials 0.000 description 1
- JQGGAELIYHNDQS-UHFFFAOYSA-N Nic 12 Natural products CC(C=CC(=O)C)c1ccc2C3C4OC4C5(O)CC=CC(=O)C5(C)C3CCc2c1 JQGGAELIYHNDQS-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、薄膜磁気ヘッドの磁極用材料として用（・る
磁性薄膜に関し、特に高密度記録媒体に対応する薄膜磁
気ヘッドを対象とするものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a magnetic thin film used as a magnetic pole material of a thin film magnetic head, and is particularly directed to a thin film magnetic head compatible with high-density recording media. It is.
従来薄膜磁気ヘッド用磁性薄膜には、ニッケル８０重量
パーセント、残余鉄よりなる８０パーマロイ膜が使用さ
れている。これについては、特開昭６０−１０４１０号
公報を参照されたい。８０パーマロイ膜は、高周波領域
での透出率が高いため、これを磁極材として使用した薄
膜磁気ヘッドは読み出し性能が優れる。しかしながら、
この８０パーマロイは飽和磁束密度が約１０キロガウス
と低いため、これを磁作材として使用した薄膜磁気ヘッ
ドは書き込み性能が劣る。今後の高密度記録化には、媒
体の高保磁力化が不可欠であり、メタル媒体のような高
保磁力高密度媒体が使用される場合には、８０パーマロ
イを磁極材とした薄膜磁気ヘッドでは書き込み性能が不
足し、従ってより高飽和磁束密度を有する磁極材が必要
となる。Conventionally, an 80 permalloy film made of 80 weight percent nickel and the remainder iron has been used as a magnetic thin film for a thin film magnetic head. Regarding this, please refer to Japanese Patent Application Laid-Open No. 10410/1983. Since the 80 permalloy film has a high transmittance in the high frequency range, a thin film magnetic head using this film as a magnetic pole material has excellent read performance. however,
Since this 80 permalloy has a low saturation magnetic flux density of about 10 kilogauss, a thin film magnetic head using this as a magnetic material has poor writing performance. Increasing the coercive force of the medium will be essential for future high-density recording, and when a high-coercive force high-density medium such as a metal medium is used, a thin-film magnetic head using 80 permalloy as the magnetic pole material will have a high write performance. Therefore, a magnetic pole material with higher saturation magnetic flux density is required.
現在、８０パーマロイにかわるより高飽和磁束密度を有
する材料として、センダスト
（Ｆｅ−８ｉ−Ａｌ）、７ モ）Ｌｔ ７ アス：７
／＜ Ａ／ ）（Ｃｏ −Ｎ ｂ −Ｚ ｒなど）等の
開発が進められているが、これらの形成法はいずれもス
パッタリングなとプラズマ中での乾式による成膜である
。そのためプラズマグ、メージ、コスト高、量産性の低
さ、成嘆時に４６ける基板の温度に昇等の問題があり、
（１式メツキによる高飽和磁束密度を有する材料の開発
が求められるわけである。Currently, Sendust (Fe-8i-Al) is being used as a material with higher saturation magnetic flux density to replace 80 permalloy.
/<A/) (Co-Nb-Zr, etc.), etc., are being developed, but all of these formation methods are sputtering or dry film formation in plasma. As a result, there are problems such as plasma lag, high cost, low mass production, and an increase in the temperature of the board at 46°C.
(There is a need to develop a material that has a high saturation magnetic flux density using Type 1 plating.
そこで本発明の目的は、湿式メツキで形成が可能であり
、透磁率−１１０００以上、飽和磁束密度（Ｂ Ｓ ）
１４キロガウス以上、保磁力（）（ｃ ）０５エルス
テツド以下の軟磁気特性を有する磁性膜な得ることを目
的とする。Therefore, the purpose of the present invention is to enable formation by wet plating, have a magnetic permeability of -11000 or more, and a saturation magnetic flux density (B S ).
The object of the present invention is to obtain a magnetic film having soft magnetic properties of 14 kilogauss or more and a coercive force (c) of 05 oersted or less.
磁気ヘッドにおいて記録密度の向上は常に技術課須とな
る。リジッドディスク及びフロッピーディスクにお℃・
でもともに記録密度の向上が望まれ、このため：′こト
ラック密度および線記録密度の双方から努力が払われて
いる。本発明は線記録密度の向−にに１関わる。Improving recording density in magnetic heads is always a technical challenge. °C for rigid disks and floppy disks
However, it is desired to improve both recording densities, and for this reason, efforts are being made to improve both track density and linear recording density. The present invention is concerned with the direction of linear recording density.
線記録密度は、記録媒体およびヘッド特性によって決ま
る。「磁気記録の理論」 （西用正明著、度り、。どの
間に以下のような関係がある。Linear recording density is determined by recording medium and head characteristics. "Theory of Magnetic Recording" (written by Masaaki Nishiyo), there is the following relationship between the two.
（Ｐ、１５９およびＰ、１６３） ここにお見・て Ｗ、ｏ−孤立再生波形の半値幅 ＨＣ−記録媒体の保磁力 Ｂｒ−記録媒体の残留Ｓ化 δ−記録媒体の厚み である。(P, 159 and P, 163) Look here W, o - half width of isolated playback waveform HC - coercive force of recording medium Br-Residual S in recording medium δ - Thickness of recording medium It is.
すなわち、缶化反転密度（線記録密度）Ｄ５゜は記録媒
体の保磁力、残留磁化および厚みにより決定される。残
留磁化および厚みを減じるとり、。父増加させることが
できるが、これら２つのパラメーターは再生出力の点か
らおのずと限界がある。That is, the can reversal density (linear recording density) D5° is determined by the coercive force, residual magnetization, and thickness of the recording medium. To reduce residual magnetization and thickness. However, these two parameters naturally have limits in terms of playback output.
従ってり、。は主に記録媒体保磁力により決定される。Accordingly. is mainly determined by the coercive force of the recording medium.
すなわち媒体保磁力Ｈｃが大きくなる程、線記録密度り
、。！４太き（なる。ところで媒体保磁力゛）（ｃを太
き（すると、それに応じてヘッドの書き込み磁界を太き
（する必要があり、このヘッドの３き込み磁界はヘッド
磁極材の飽和磁束密度Ｂｓで決定される。That is, the larger the medium coercive force Hc, the higher the linear recording density. ! By the way, the medium coercive force ゛) (by increasing c), it is necessary to increase the write magnetic field of the head accordingly. It is determined by the density Bs.
−１き込みＳ界）（Ｘｒｎａｘは、
ここで ■■ｇ−ギャギャップ内
磁界−ギャップ長
ｙ＝Ｊｄ（ｄ＋δ）
ｄ −ヘッド−媒体量分離長
δ −媒体厚み
である。またギャップ内磁界Ｉ−（ｇは、Ｉ（ｇ≦Ｂｓ
Ｂｓ−磁極材の飽和磁束密度
なる関係があり、他のパラメーターを固定した場合、は
き込み磁界ＨＸｍｍｚ は磁極材の飽和磁束密ｊ！ｌ
Ｂ Ｓで決定されるっ
また中面らの報告（通研研究実用化報告第２８巻１０号
、１９７９年 Ｐ、１４９ ）によれば、消去（重ねｎ
き）に必要な磁界は媒体保磁力ＩＩＣの３倍とされる。-1 injected S field) (Xrnax is, where ■■ g - Magnetic field in gap gap - Gap length y = Jd (d + δ) d - Head - Media amount separation length δ - Media thickness. Also, magnetic field in gap I -(g has the relationship: I(g≦Bs Bs - saturation magnetic flux density of the magnetic pole material, and when other parameters are fixed, the injected magnetic field HXmmz is the saturation magnetic flux density of the magnetic pole material j!l
According to a report by Nakamen et al. (Tsuken Research Practical Application Report Vol. 28, No. 10, 1979, p. 149), elimination (overlapping n
The magnetic field required for (a) is three times the medium coercive force IIC.
以上の考察を踏まえて、現在使用されているあるいは将
来使用されるであろう磁気記録媒体の保磁力Ｈｃと線記
録密度Ｄ５０の、それに書き込み可能な磁極材の飽和磁
束密度Ｂｓとの関係を第３図に示す。この結果によれば
従来薄膜磁気ヘッドに使用されている磁極材８０パーマ
ロイはＢ Ｓ＝１０キロガウス（ＫＧ）であり、Ｃｏ
Ｔ Ｆ ｅ２ｏ３ （ＨＣ＝７２０ エルステッド（
Ｏｅ）、［）、。＝２８ＫＢＰＩ ）までは十分書き込
み可能であるが、メタル塗布媒体（ＨＣ−１５０００ｅ
、Ｄ５ｏ＝４６ＫＢＰＩ）では書き込み不足となる。従
ってより高い飽和磁束密度Ｂｓを有する磁極材が望まれ
る。Based on the above considerations, let us examine the relationship between the coercive force Hc and linear recording density D50 of magnetic recording media that are currently being used or will be used in the future, and the saturation magnetic flux density Bs of the magnetic pole material that can be written to. Shown in Figure 3. According to this result, the magnetic pole material 80 permalloy used in conventional thin-film magnetic heads has a B S = 10 kilogauss (KG), and a Co
T F e2o3 (HC=720 Oersted (
Oe), [),. = 28KBPI), but metal coated media (HC-15000e)
, D5o=46KBPI), there will be insufficient writing. Therefore, a magnetic pole material having a higher saturation magnetic flux density Bs is desired.
Ｎ１４５重量％、Ｆｅ５Ｑ重量％、ＣＯ２５ＩＮ量％を
中心とする組織乞もつパーミンバーは約１４〜１８ＫＧ
と飽和磁束密度が高く、書き込み特性は優れている。し
かし透磁ギアは約４００〜６００と低い。Ｃ９Ｗ、５ｔ
ｅｅＡらによると書き込みシてはμ／１００程度がＩ（
Ｘ分布の劣化２抑えるための目安になるとさえしている
。The permin bar with a tissue containing mainly N145% by weight, Fe5Q% by weight, and CO25IN amount is approximately 14-18KG.
It has a high saturation magnetic flux density and excellent writing characteristics. However, the magnetic permeability gear is low at about 400-600. C9W, 5t
According to eeA et al., when writing, I(
It is even said that it can be used as a guideline for suppressing the deterioration of the X distribution2.
また前出の「磁気記録の理論」（西用著）によれば、再
生ヘッドには記録ヘッドに比べると１桁大きい透磁率を
有するコアが要求される。（Ｐ、 １１３）すなわち透
磁率アは、１００以下では読み書き不可の領域となり、
１００〜１０００では書き込みのみ可の領域となり、１
０００以上で読み書き可の領域となる。第４図にこれら
の考察を踏まえて８０パーマロイとパーミンバ組成の性
能を評価する。８０パーマロイは’２ｒ＝２０００と高
いがＢｓ＝ＪＯＫＧでメタル塗布媒体に対して書き込み
性能が不足する。一方パーミンバー組成のものはＢＳ＝
１５〜１８ＫＧと高いが、ア＝４００〜６００と低（読
み取り性能に劣る。Furthermore, according to the aforementioned ``Theory of Magnetic Recording'' (written by Nishiyo), the reproducing head is required to have a core with magnetic permeability that is one order of magnitude higher than that of the recording head. (P, 113) In other words, when the magnetic permeability A is less than 100, reading and writing becomes impossible.
100 to 1000 is a writable area, and 1
If it is 000 or more, it becomes a readable/writable area. Figure 4 evaluates the performance of 80 permalloy and perminba compositions based on these considerations. 80 Permalloy has a high value of '2r=2000, but Bs=JOKG, and the write performance is insufficient for metal-coated media. On the other hand, those with permin bar composition have BS=
It is high at 15-18KG, but low at A=400-600 (poor reading performance).
本発明は、８０パーマロイとパーミンバー型Ｃｏ −Ｆ
ｅ −Ｎ ｉ ３元膜を交互に積層し、Ｂｓ）１４Ｋ
Ｇ、、ａ）１０００、Ｈｃ （０，５０ｅという値をも
つ磁極材を得、第２図に示されるようにメタル塗布媒体
に対して読み書きともに満足する性能を有するヘッドを
提供するのが目的である。以下実施例により説明する。The present invention uses 80 permalloy and perminvar type Co-F.
e -N i ternary films are alternately stacked, Bs) 14K
The purpose is to obtain a magnetic pole material with a value of G, , a) 1000, Hc (0.50e) and to provide a head that has satisfactory performance in both reading and writing for metal-coated media as shown in Figure 2. Yes, this will be explained below using examples.
（実施例１）
８０パーマロイはＮ１５Ｏ，・７Ｈ２０（３００ｇ／Ｖ
）。(Example 1) 80 permalloy is N15O, 7H20 (300g/V
).
ＮｉＣｌ２・６Ｈ２０（３０ｇ／ｌ）およびＦ ｅ Ｓ
０４−７ Ｈ２Ｏ（３０ｇ／ｌ） その他Ｈ３ＢＯ
８、サッカリンナトリウム、ラウリル硫酸ナトリウムを
含むメツー？液において、メツキ電流密度を７ｍＡ／Ｃ
７７Ｌ とすることにより得た。NiCl2.6H20 (30g/l) and FeS
04-7 H2O (30g/l) Other H3BO
8. Metsu containing sodium saccharin and sodium lauryl sulfate? In the liquid, the plating current density is 7 mA/C.
77L.
またハーミンバー組成の膜については、Ｃｏ Ｓ ０４
・７Ｈ２０、Ｎ Ｉ ８０４−６Ｈ２０，Ｎ ｉ Ｃ１
２・６Ｈ２ＱＦｅＳＯ４・７Ｈ２０その他Ｈ３ＢＯ５、
サッカリンナトリウム、ラウリル硫酸ナトリウムを含む
メツキ浴中のＣｏ、Ｆｅ、Ｎｉ成分量及びメツキ電流密
度を変化させることにより析出する膜組成を制御した。Furthermore, for a film with a Herminvar composition, Co S 04
・7H20, N I 804-6H20, N i C1
2.6H2QFeSO4.7H20Other H3BO5,
The composition of the deposited film was controlled by changing the amounts of Co, Fe, and Ni components in the plating bath containing sodium saccharin and sodium lauryl sulfate and the plating current density.
（実施例２）
実施例１記載の８０パーマロイ及び
Ｂｓ＝１７ＫＧＳｘ＝４００のＣｏ３７Ｆ ｅ２８Ｎ
Ｉ ３ｓ膜との積層を行なった。このパーミンバー組成
ノ膜は、Ｃｏ Ｓ ０４ ・７ Ｈ２０（５０ｇ ／
ｌ ）、ＮｉＳＯ４・６Ｈ２ｏ（２００ｇ／ｌ）、Ｎ
ｉｃｌ、・６Ｈ，０（３０ｇ／ｌ ’）、ＦＦｅ５０４
−７Ｈ２０（１２０／Ｊ）その他Ｈ３ＢＯ。(Example 2) 80 permalloy described in Example 1 and Co37F e28N with Bs=17KGSx=400
Lamination with an I3s film was performed. This perminvar composition film was made of Co S 04 ・7 H20 (50 g/
l), NiSO4・6H2o (200g/l), N
icl, 6H,0 (30g/l'), FFe504
-7H20 (120/J) Other H3BO.
サッカリンナトリウム、ラウリル硫酸ナトリウムより成
るメツキ液において、メツキ電流密度を７．２ｍＡ／ｆ
ｆｌとすることにより得た。In a plating liquid consisting of sodium saccharin and sodium lauryl sulfate, the plating current density was 7.2 mA/f.
It was obtained by setting fl.
このＣｏ３． Ｆ ｅ２．Ｎ ｉｓｓ 嘆を第１層、第
３層、第５層に、８０パーマロイを第２層及び第４層と
して、交互に計５層積層した膜の１層の膜厚に対する飽
和磁束密度Ｂｓ及び透磁率７：ｔ（４ＭＨｚ測定）の関
係を第１図に示す。なお８０パーマロイの１層の厚みは
１ｏｏｏＫとした。８０パーマロイに対するパーミンバ
ーの膜厚比が２〜５の範囲でＢｓ）１４ＫＧ、ｕ）１０
００であり、メタル塗布媒体を読み書きするのに十分な
性能２有する軟磁性薄膜が得られることがわかった。This Co3. F e2. The saturation magnetic flux density Bs and permeability for the film thickness of one layer of a film in which a total of 5 layers are laminated alternately, with 80 Permalloy as the 1st, 3rd, and 5th layers and 80 Permalloy as the 2nd and 4th layers. The relationship between magnetic constant 7 and t (measured at 4 MHz) is shown in FIG. The thickness of one layer of 80 permalloy was 1oooK. Bs) 14KG, u) 10 when the film thickness ratio of Perminvar to 80 Permalloy is in the range of 2 to 5.
00, and it was found that a soft magnetic thin film having a performance of 2 sufficient for reading and writing metal-coated media could be obtained.
（実施例３）
実施例１記載の８０パーマロイ及び
Ｂ Ｓ＝１５．６ＫＧ、 ＃＝６００のＣＯ３１Ｆｅ２
１ Ｎ ｉ４゜膜との積層７行なった。このパーミンバ
ー組成の膜は、ＣＯ３Ｏ４−７Ｈ，０（４０ｇ／Ａ’）
、ＮｉＳＯ４・６Ｈ２０（２００ｇ／ｌ）、ＮＩＣ１２
働６Ｈ２０（３０ｇ＃’）、Ｆｅ５ＣＬ・７Ｈ２０（１
４０ｇ／Ａ’）、その他Ｈ，ＢＯ１、サッカリンナトリ
ウム、ラウリル硫酸ナトリウムより成るメツキ液におい
てメツキ電流密度を７．５ ｍ Ａ ／ ａｎｔとする
ことにより得た。(Example 3) 80 permalloy described in Example 1 and BS=15.6KG, #=600 CO31Fe2
Seven laminations with 1Ni4° film were performed. The film with this perminvar composition is CO3O4-7H,0 (40g/A')
, NiSO4・6H20 (200g/l), NIC12
Fe5CL・7H20 (1
40 g/A'), H, BO1, sodium saccharin, and sodium lauryl sulfate at a plating current density of 7.5 mA/ant.
このＣ０３１Ｆ ｅ２１ Ｎ ｉ４８ 膜を第１層、
第３層、第５層に、８０パーマロイを第２層および第４
層として交互に計５層積層した膜の１層の膜厚に対する
飽和磁束密度Ｂｓ及び透磁率” （４Ｍ Ｈｚ測定）の
関係を第２図に示す。なお８０パーマロイの１層の厚み
は１００ＯＡとした。８０パーマクイに対するパーミン
バーの膜厚比が２〜５の範囲で、ＢＳ＞１４ＫＧ、４＞
１０００であり、メタル塗布媒体を読み書きするのに十
分な性能を有する軟磁性薄膜が得られることがわかった
。This C031F e21 N i48 film was used as the first layer,
80 permalloy on the 2nd and 4th layers.
Figure 2 shows the relationship between the saturation magnetic flux density Bs and magnetic permeability (measured at 4MHz) with respect to the thickness of one layer of a film in which five layers are alternately laminated.The thickness of one layer of 80 Permalloy is 100OA. The film thickness ratio of Perminvar to 80 Permaqui was in the range of 2 to 5, BS>14KG, 4>
1000, and it was found that a soft magnetic thin film having sufficient performance for reading and writing metal-coated media could be obtained.
（実施例４）
上・下部筒磁極厚２，３μｍ、）ラック幅４０μｍ１ギ
ャップ長０３μｍ、ギャップ深さ２μｍおよびコイル巻
数５０ターン（２重コイル）のフロ・ビーディスク用の
薄膜磁気ヘット°を作製した。(Example 4) A thin film magnetic head for a Flo-Be-disk with upper and lower cylindrical magnetic poles thickness 2.3 μm, rack width 40 μm, gap length 03 μm, gap depth 2 μm, and coil winding number 50 turns (double coil) was fabricated. did.
−＼ノド、〜は、Ｃ０３７Ｆ ”２１１ Ｎ ｉ ３．
が５００ ＯＡで４ｒ＞４．８０・ζ−マロイカ−
１００ＯＡで３層、認積層二女７層、金膜１７が２．３
μｍからなる積層磁性薄膜をヨ）材とした。ヘッドＢは
、８０パ一マロイ単層膜を磁極材どした。ヘッドＣは、
Ｃｏ３７Ｆ ｅ２＋１Ｎ’３Ｓ中５層膜な磁極材とした
。-\Throat, ~ is C037F "211 N i 3.
is 500 OA and 4r>4.80・ζ-maloica-
100OA, 3 layers, certified laminate 2nd layer 7 layers, gold film 17 2.3
A laminated magnetic thin film of μm was used as the material. In head B, the magnetic pole material was an 80% permalloy single layer film. Head C is
The magnetic pole material was made of 5 layers of Co37F e2+1N'3S.
表１ニヘッドＡ１ヘッドＢおよびヘッドＣのメタノし塗
イｂ媒体（Ｈｃ二１５０００２）への読み書き性能、す
なわち出力電圧およびオーバーライド特性な示“才。ヘ
ットＢはオーバーライドが不足し、ヘッドＣは出力電圧
が不足して−・る。すなわち本発明によるパーミンバー
型合金膜と８０パーマロイ、とを交互積層した磁性薄膜
を磁極材としたヘッドＡのみが十分な読み書き性能７示
した。Table 1 The read/write performance of Head A1, Head B, and Head C on Methane coated medium (Hc2 150002), that is, the output voltage and override characteristics.Head B lacks override, and Head C has an output voltage. In other words, only head A, whose magnetic pole material was a magnetic thin film made by alternately laminating a perminvar type alloy film according to the present invention and 80% permalloy, showed sufficient read/write performance7.
〔発明の効果〕
本発明によれば高保磁力、高線密度磁気記録媒体に対し
て優れた読み書ぎ性能を有する薄膜召気ヘッドを得るこ
とができる。[Effects of the Invention] According to the present invention, a thin film magnetic head having excellent read/write performance for high coercive force and high linear density magnetic recording media can be obtained.
第１図、第２図は本発明における積層磁性薄膜の形成要
因と飽和磁束密度Ｂｓおよび透磁率πの関係を示す図表
、第３図は各種磁気記録媒体の線記録密度とこれに書き
込み性能を有するヘッドｍ極材の飽和磁束密度Ｂｓの関
係を示す図表、第・１図はヘッド磁極材の飽和磁束密度
３ｓ、透磁ギアとヘッドの読み書き性能の関係を示す図
表である。
第１図
８０ハ一マ０イｒ４Ａ−１ｃｃＯＡｌ′−子弟２図
８０ハ・−マロイ月弊ＩＩＬ１（ＩＸ）Ａ一定第３閏
柁和嶽東＄度ａｓ（にＧ）
第４図
１１μFigures 1 and 2 are charts showing the relationship between the formation factors of the laminated magnetic thin film, the saturation magnetic flux density Bs, and the magnetic permeability π in the present invention, and Figure 3 shows the linear recording density of various magnetic recording media and the writing performance thereof. Figure 1 is a chart showing the relationship between the saturation magnetic flux density 3s of the head magnetic pole material, the permeable gear, and the read/write performance of the head. Fig. 1 80 Ham 0 Ir4A-1ccOAl'-Children 2 Fig. 80 Ha--Malloy IIL1 (IX) A constant 3rd step
Claims (1)
８重量パーセント、鉄１０〜３４重量パーセントからな
るパーミンバー型３元合金膜とニッケル７５〜８５重量
パーセント、残余鉄からなる８０パーマロイ薄膜とを交
互に積層した合計５層以上の積層膜からなり、８０パー
マロイ薄膜の膜厚が１００ｎｍであり、パーミンバー型
３元合金膜の膜厚が８０パーマロイ薄膜の１〜５倍の範
囲にあることを特徴とする薄膜磁気ヘッド用磁性薄膜。nickel 32-54 weight percent, cobalt 16-4
Consisting of a total of five or more laminated films in which a perminvar type ternary alloy film consisting of 8% by weight and 10 to 34% by weight of iron and an 80% permalloy thin film consisting of 75 to 85% by weight of nickel and the remainder iron are laminated alternately, A magnetic thin film for a thin-film magnetic head, characterized in that the permalloy thin film has a thickness of 100 nm, and the perminvar type ternary alloy film has a thickness in the range of 1 to 5 times that of the 80 permalloy thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9807388A JP2635674B2 (en) | 1988-04-22 | 1988-04-22 | Magnetic thin film for thin film magnetic head and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9807388A JP2635674B2 (en) | 1988-04-22 | 1988-04-22 | Magnetic thin film for thin film magnetic head and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01270207A true JPH01270207A (en) | 1989-10-27 |
| JP2635674B2 JP2635674B2 (en) | 1997-07-30 |
Family
ID=14210172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9807388A Expired - Fee Related JP2635674B2 (en) | 1988-04-22 | 1988-04-22 | Magnetic thin film for thin film magnetic head and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2635674B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4959200A (en) * | 1987-02-10 | 1990-09-25 | Chisso Corporation | Process for manufacturing silane |
-
1988
- 1988-04-22 JP JP9807388A patent/JP2635674B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4959200A (en) * | 1987-02-10 | 1990-09-25 | Chisso Corporation | Process for manufacturing silane |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2635674B2 (en) | 1997-07-30 |
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