JPH01267501A - Antireflection film for germanium - Google Patents

Antireflection film for germanium

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Publication number
JPH01267501A
JPH01267501A JP63096108A JP9610888A JPH01267501A JP H01267501 A JPH01267501 A JP H01267501A JP 63096108 A JP63096108 A JP 63096108A JP 9610888 A JP9610888 A JP 9610888A JP H01267501 A JPH01267501 A JP H01267501A
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JP
Japan
Prior art keywords
layer
germanium
refractive index
thickness
laminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63096108A
Other languages
Japanese (ja)
Inventor
Yukihiro Morimoto
森本 幸博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
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Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP63096108A priority Critical patent/JPH01267501A/en
Publication of JPH01267501A publication Critical patent/JPH01267501A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To reduce residual reflectivity and to prevent the reflection on the surface of germanium over wide bands by determining the refractive indices and optical thicknesses of 2nd-4th layers at specific relations. CONSTITUTION:This antireflection film has the 1st layer 7 which is laminated on the surface of the germanium 6 and has the optical thickness of 1/4 the reference wavelength lambda0, the 2nd layer 2 which is laminated on the 1st layer and has refractive index Na and thickness da, the 3rd layer 3 which is laminated on the 3rd layer 3 and has refractive index Nb and thickness da, the 4th layer 4 which is laminated on the 3rd layer 4 and has the refractive index Na and thickness da, and the 5th layer 5 which is laminated on the 4th layer, has the optical thickness of 1/4 the reference wavelength lambda0 and consists of sodium fluoride. The refractive indices Na, Nb and optical thicknesses da, db of the 2nd-4th layers are in the relations expressed by the equation I. The residual reflectivity of the antireflection film 1 for germanium is thereby lowered and the reflection on the surface of the germanium 6 is prevented over wide bands.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は赤外光学装置等に用いられるゲルマニウムの
表面における反射を広帯域にわたって防止するゲルマニ
ウム用反射防止膜に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an antireflection film for germanium that prevents reflection over a wide band on the surface of germanium used in infrared optical devices and the like.

[従来の技術] ゲルマニウムを用いた赤外光学装置においては。[Conventional technology] In infrared optical devices using germanium.

ゲルマニウムの表面における反射によって信号光が減少
したり、反射光が検出器に達してフレアやゴーストが生
じたりして赤外光学装置の光学特性が劣化する。このた
め上記反射光を防止するために真空蒸着法等を用いてゲ
ルマニウム用反射防止膜を設けていた。従来、この種の
ゲルマニウム用反射防止膜として第4図に示すようなも
のがあった。図において、1はゲルマニウム用反射防止
膜、6はゲルマニウム(Ge)−7は上記ゲルマニウム
6に積層されたシリコン(Si;屈折率3.43)から
なる第1層、8は上記第1層7に積層された硫化亜鉛(
ZnS;屈折率2.35)からなる第2層、9は上記第
2層8に積層されたフッ化ナトリウム(NaF2 ;屈
折率1.30)からなる第3層である。
Reflection on the surface of germanium reduces the signal light, and the reflected light reaches the detector, causing flares and ghosts, which deteriorate the optical characteristics of the infrared optical device. Therefore, in order to prevent the above-mentioned reflected light, an antireflection film for germanium has been provided using a vacuum deposition method or the like. Conventionally, there has been a type of antireflection film for germanium as shown in FIG. In the figure, 1 is an anti-reflection film for germanium, 6 is germanium (Ge)-7 is a first layer made of silicon (Si; refractive index 3.43) laminated on the germanium 6, and 8 is the first layer 7. Zinc sulfide (
A second layer 9 is made of ZnS (refractive index 2.35), and a third layer 9 is laminated on the second layer 8 and is made of sodium fluoride (NaF2; refractive index 1.30).

なお、各層7〜9の光学的厚さはいずれも規準波長λ。In addition, the optical thickness of each layer 7-9 is standard wavelength (lambda).

の1/4であり、規準波長λ。は着目する波長範囲の短
波長側の限界波長λ1と長波長側の限界波長λ2の逆数
の算術平均の逆数に設定されている。第5図は、第4図
に示す上記ゲルマニウム用反射防止膜1の残留反射率の
波長依存性である。実用的見地から重要である波長範囲
3〜5μmの大気の窓に対して反射を防止するため、規
準波長λ。を3.75μmとした場合の特性である。
is 1/4 of the standard wavelength λ. is set to the reciprocal of the arithmetic mean of the reciprocals of the short wavelength limit wavelength λ1 and the long wavelength limit wavelength λ2 of the wavelength range of interest. FIG. 5 shows the wavelength dependence of the residual reflectance of the germanium antireflection film 1 shown in FIG. 4. In order to prevent reflections against the atmospheric window in the wavelength range 3-5 μm, which is important from a practical point of view, the reference wavelength λ. This is the characteristic when 3.75 μm.

波長範囲3.6〜3.9μmに対して0.3%以下の残
留反射率を得る。
A residual reflectance of 0.3% or less is obtained in the wavelength range of 3.6 to 3.9 μm.

以上のように構成されたゲルマニウム用反射防止膜1は
、ゲルマニウム6と第1層7.各層7〜9問および第3
層9と空気との各境界において反射される光が干渉しあ
ってゲルマニウム6の表面における反射を防止すること
ができる。
The germanium antireflection film 1 configured as described above includes the germanium 6 and the first layer 7. 7-9 questions for each layer and 3rd
The light reflected at each boundary between the layer 9 and the air interferes with each other, and reflection at the surface of the germanium 6 can be prevented.

[発明が解決しようとする課題] 従来のゲルマニウム用反射防止膜は以上のように構成さ
れているので、波長範囲3.6〜3.9μmに対して0
.3%以下の残留反射率が得られるが、波長範囲3〜5
μmに対しては0.6%に達し、コントラストの小さい
赤外領域においては反射の防止が充分でなく、残留反射
率をさらに低減しなければならない。
[Problems to be Solved by the Invention] Since the conventional antireflection film for germanium is configured as described above, it has a zero reflection value in the wavelength range of 3.6 to 3.9 μm.
.. A residual reflectance of 3% or less can be obtained, but in the wavelength range 3 to 5
It reaches 0.6% with respect to μm, and in the infrared region where contrast is small, prevention of reflection is not sufficient, and the residual reflectance must be further reduced.

また、第6図に示すように、上記ゲルマニウム用反射防
止膜の第1層のシリコンの屈折率を3.43゜第3層の
フッ化ナトリウムの屈折率を1.3Qおよび規準波長λ
。を3.75μmとして、第2層の材質を変えて屈折率
を変えたとき、最大残留反射率は第2Nの屈折率が2.
20のときに最適値となり、波長範囲3〜5μmと広帯
域にわたって残留反射率を0.3%以下に下げるには第
2層の屈折率を2.12〜2.28の範囲内にしなけれ
ばならない。しかし、2.12〜2.28の屈折率を有
する材質がないため、上記残留反射率を0.3%以下に
できないなどの問題点があった。(但し、上記第5図に
おいて、横軸は第2層の屈折率であり、縦軸は波長範囲
3〜5μmにおける最大残留反射率である。)この発明
は上記のような問題点を解消するためになされたもので
、ゲルマニウム用反射防止膜の残留反射率を低減し、広
帯域にわたってゲルマニウムの表面における反射を防止
することのできるゲルマニウム用反射防止膜を得ること
を目的とする。
In addition, as shown in FIG. 6, the refractive index of silicon as the first layer of the germanium antireflection film is 3.43°, the refractive index of sodium fluoride as the third layer is 1.3Q, and the reference wavelength λ
. is 3.75 μm, and when the material of the second layer is changed to change the refractive index, the maximum residual reflectance is when the refractive index of the second layer is 2.75 μm.
The optimum value is reached when the refractive index is 20, and the refractive index of the second layer must be within the range of 2.12 to 2.28 in order to reduce the residual reflectance to 0.3% or less over a wide wavelength range of 3 to 5 μm. . However, since there is no material having a refractive index of 2.12 to 2.28, there are problems in that the residual reflectance cannot be reduced to 0.3% or less. (However, in FIG. 5 above, the horizontal axis is the refractive index of the second layer, and the vertical axis is the maximum residual reflectance in the wavelength range of 3 to 5 μm.) This invention solves the above problems. The purpose of this invention is to obtain an anti-reflection film for germanium that can reduce the residual reflectance of the anti-reflection film for germanium and prevent reflection on the surface of germanium over a wide range.

[課題を解決するための手段] この発明に係るゲルマニウム用反射防止膜は、ゲルマニ
ウムの表面に積層され光学的厚さが規準波長λ。の1/
4であるシリコンからなる第1層と、この第1層に積層
され屈折率がNaで厚さがdaである第2層と、この第
2層に積層され屈折率がNbで厚さがdbである第3層
と、この第3層に積層され屈折率がNaで厚さがdaで
ある第4層と、この第4層に積層され光学的厚さが規準
波長λ。の1/4であるフッ化ナトリウムからなる第5
層を備え、上記第2層〜第4層の屈折率Na、 Nbと
光学的厚さda、 dbとが次式の関係にあるようにし
たものである。
[Means for Solving the Problems] The antireflection film for germanium according to the present invention is laminated on the surface of germanium and has an optical thickness of a reference wavelength λ. 1/ of
4, a second layer laminated on this first layer and having a refractive index of Na and a thickness of da, and a second layer laminated on this second layer and having a refractive index of Nb and a thickness of db. a fourth layer laminated on this third layer and having a refractive index of Na and a thickness of da; and a fourth layer laminated on this fourth layer and having an optical thickness of a reference wavelength λ. The fifth layer consists of sodium fluoride, which is 1/4 of the
The refractive index Na, Nb and the optical thickness da, db of the second to fourth layers have the following relationship.

cog−’[cos2δa−−4(R+H4)  5l
n25asin5bコ =晋δa = ” Nada 
    5b = ” Nbdbλ0        
     λ。
cog-'[cos2δa--4(R+H4) 5l
n25asin5bko=jinδa=”Nada
5b = ”Nbdbλ0
λ.

[作用] この発明におけるゲルマニウム用反射防止膜は、第2層
と第3層および第4層の屈折率と厚さを適切に選定し、
第2層〜第4層を等測的に屈折率を2.12〜2.28
.光学的厚さ規準波長λ。の1/4である単層膜とする
ことにより、ゲルマニウムにおける残留反射率を低減す
る。
[Function] The antireflection film for germanium in the present invention is obtained by appropriately selecting the refractive index and thickness of the second layer, third layer, and fourth layer,
The refractive index of the second to fourth layers is 2.12 to 2.28.
.. Optical thickness reference wavelength λ. The residual reflectance in germanium is reduced by forming a single-layer film that is 1/4 of that of germanium.

[実施例] 以下、この発明の一実施例であるゲルマニウム用反射防
止膜1を第1図及び第2図を用いて説明する。なお、第
4図と同じものは同一の符号を用いて説明を省略する。
[Example] Hereinafter, an antireflection film 1 for germanium, which is an example of the present invention, will be described with reference to FIGS. 1 and 2. Components that are the same as those in FIG. 4 are designated by the same reference numerals, and the description thereof will be omitted.

図において、2は第1層7に積層されたフッ化鉛(Pb
F2;屈折率1.75)からなる第2層、3は上記第2
層2に積層された硫化亜鉛(ZnS;屈折率2.35)
からなる第3層、4は上記第3.13に梼暦され第21
2と同一の材質および厚さからなる第4層、5は上記第
4層4に積層され光学的厚さがM、準波長λ。の1/4
であるフン化ナトリウムからなる第5層である。−般に
外側の層の屈折率がNaで厚さがdaであり、内側の層
の屈折率がNbで厚さがdbである対称3層膜の特性マ
ドリソゲス、すなわち、上記第2N2〜第4.荀4の屈
折率および厚さは以下の式より算出することができる。
In the figure, 2 is lead fluoride (Pb) laminated on the first layer 7.
F2: a second layer consisting of a refractive index of 1.75);
Zinc sulfide (ZnS; refractive index 2.35) laminated in layer 2
The third layer consisting of
A fourth layer 5 made of the same material and thickness as 2 is laminated on the fourth layer 4, has an optical thickness of M, and has a quasi-wavelength λ. 1/4 of
The fifth layer is made of sodium fluoride. - In general, the characteristics of a symmetrical three-layer film in which the outer layer has a refractive index of Na and a thickness of da, and the inner layer has a refractive index of Nb and a thickness of db, that is, the above-mentioned 2N2 to 4th .. The refractive index and thickness of the shaft 4 can be calculated using the following formula.

= (、J+  i−”)             
    (1)1m21     m!2 艇= ”−” Nbda        (2)&=ゴ
Nada       λ。
= (, J+ i-”)
(1) 1m21m! 2 Boat = “-” Nbda (2) & = Go Nada λ.

鴫=m2z=em2Sacm25b−+ (泳j’r−
B) 5in2δas+nア(3)mix  ”s+n
2δ愼δb+l←%Sa −1Vas1nδa) si
r+5bNa      Na Na   Nb   
        (4)m、、=Nas+n2Saco
s&+Na (8txsa 棺sinδa) 5in5
b      (5)一方、屈折率がNで厚さがDであ
る単層膜の特性マトリックスは、 Δ=←ND                    
 (7)/bQ で表される。
Sacm2z=em2Sacm25b-+ (swij'r-
B) 5in2δas+na(3) mix ”s+n
2δ愼δb+l←%Sa −1Vas1nδa) si
r+5bNa Na Na Nb
(4) m,,=Nas+n2Saco
s&+Na (8txsa coffin sin δa) 5in5
b (5) On the other hand, the characteristic matrix of a single layer film with a refractive index of N and a thickness of D is Δ=←ND
It is expressed as (7)/bQ.

第(1)式、第(6)式および第(7)式より次の関係
が成り立つ。
The following relationships hold from equations (1), (6), and (7).

N =  iNs+nA / ”s==ν三瓦1−(8
)cz? ”ND=rJ+=mzz         
      (9)んO 第(8)式、第(9)式に第(3)式、第(4)式およ
び第(5)式を代入すると、次式が得らiる。
N=iNs+nA/”s==νThree tiles 1-(8
)cz? ”ND=rJ+=mzz
(9) O By substituting equations (3), (4), and (5) into equations (8) and (9), the following equations are obtained.

N D = ?l−”;、cas−’ [cg 2δa
cm&−+ (牝”秒s+n2δasinδb]   
(11)つまり、対称3層膜は1等価的に第(10)式
、第(11)式で表される屈折率および光学的厚さを有
する単層膜と見做す事ができる。
ND=? l-'';, cas-' [cg 2δa
cm&-+ (female seconds s+n2δasinδb]
(11) In other words, the symmetrical three-layer film can be equivalently regarded as a single-layer film having the refractive index and optical thickness expressed by equations (10) and (11).

すなわち、上記ゲルマニウム用反射防止膜1は。That is, the germanium antireflection film 1 is as follows.

上記関係に注目し光学的厚さが規準波長λ。の1/4で
あるシリコンからなる第1層7と、光学的厚さが規1値
波長λ。の】、/・1であるフッ化すl−リウムからな
る第5層5とにはさまれた第2層〜第4 Jiを対称3
層構造の単層膜とし、その屈折率と光学的厚さを次式の
関係にあるようにした。
Paying attention to the above relationship, the optical thickness is the reference wavelength λ. The first layer 7 is made of silicon and has an optical thickness of 1/4 of the nominal wavelength λ. ], /・1 The second to fourth layers sandwiched between the fifth layer 5 made of l-lium fluoride are symmetrical 3
A single-layer film with a layered structure was used, and its refractive index and optical thickness were set to have the following relationship.

以上、第(121式、第(13)式から求めると上記第
2層2t9よび第・1層4の厚さdaは規準波長λ0の
0.08、第3M3の厚さdbは規f(り波長λ。の0
.0Bとなる。
As described above, when calculated from equations (121 and 13), the thickness da of the second layer 2t9 and the first layer 4 is 0.08 of the standard wavelength λ0, and the thickness db of the third layer M3 is 0.08 of the standard wavelength λ0. 0 of wavelength λ.
.. It becomes 0B.

以上のように構成さhたゲルマニウム用反射防止膜1は
、第2層2乃至第4M4が対称3層構造をしており、等
測的に屈折率が2.20で光学的厚さが規準波長λ。の
1/4である単層膜と見做す事ができ、シリコンからな
る第1N7と、屈折率が2.20の第2暦と、フッ化ナ
トリウムからなる第5層5とから構成され、各層の光学
的厚さの等しい3層からなる反射防止膜と同様に見做せ
る。すなわち、第5図から明らかなように、ゲルマニウ
ム6と第1層7.各N2〜5.7問および第5層5と空
気との各境界において反射される光が干渉して、広帯域
にわたってゲルマニウム6の表面における反射を防止で
きる。
The germanium antireflection film 1 constructed as described above has a symmetrical three-layer structure in which the second layer 2 to the fourth layer M4 have an isometric refractive index of 2.20 and an optical thickness as standard. Wavelength λ. It can be regarded as a single-layer film with a thickness of 1/4, and is composed of a first N7 made of silicon, a second layer 5 with a refractive index of 2.20, and a fifth layer 5 made of sodium fluoride. It can be regarded as the same as an anti-reflection film consisting of three layers with each layer having the same optical thickness. That is, as is clear from FIG. 5, germanium 6 and the first layer 7. The light reflected at each boundary between N2 to 5.7 and the fifth layer 5 and air interferes, and reflection on the surface of germanium 6 can be prevented over a wide band.

規準波長λ。を3.42μmとし、第1図に示すゲルマ
ニウム用反射防止膜1の残留反射率を第2図に示す。波
長範囲2.9〜5.65μmと広帯域にわたって残留反
射率が0.3%以下であり、波長範囲3〜5μmに対し
ては0.1%以下となる。
Reference wavelength λ. is 3.42 μm, and the residual reflectance of the germanium antireflection film 1 shown in FIG. 1 is shown in FIG. The residual reflectance is 0.3% or less over a wide wavelength range of 2.9 to 5.65 μm, and is 0.1% or less in the wavelength range of 3 to 5 μm.

なお、本実施例においては、第2層2および第4層4を
屈折率1.75で厚さ0.08λ0であるフジ他船、第
3層3を屈折率2.35で厚さ0,06λ0である硫化
亜鉛とからなるとしたが、第2層2および第4層4の屈
折率Naと厚さdaと、第3層3の屈折率Nbと厚さd
bとを上記第(12)式、第(13)式より適切に選定
することにより、同様の効果を得られる。
In this example, the second layer 2 and the fourth layer 4 are made of Fuji and others with a refractive index of 1.75 and a thickness of 0.08λ0, and the third layer 3 is made of a material with a refractive index of 2.35 and a thickness of 0. 06λ0, the refractive index Na and thickness da of the second layer 2 and fourth layer 4, and the refractive index Nb and thickness d of the third layer 3.
A similar effect can be obtained by appropriately selecting b from the above equations (12) and (13).

第3図に第2層2および第4層4と第3層3どの他の組
合せを示す。また第3図に示す組合せは、上記実施例の
ように対称3層構造としただけでなく、波長範囲の短波
長側の限界波長λ1と長波長側の限界波長λ2の逆数の
算術平均の逆数とする設定法から、規準波長λ。を、第
3図に示す各組合せに対して適切に選定する方法にした
ことである。また、波長範囲3〜Sμmにおけるゲルマ
ニウム用反射防止膜1について説明したが、各層2〜5
,7の厚さを約2.6倍することで波長範囲8〜13μ
mの大気の窓に対しても同様の効果を有することはもち
ろんであり、他の波長範囲の場合でも、その波長範囲で
透過性を示す他のフッ化物を用いても同様の効果を有す
ることができる。
FIG. 3 shows other combinations such as the second layer 2, the fourth layer 4, and the third layer 3. Furthermore, the combination shown in FIG. 3 not only has a symmetrical three-layer structure as in the above embodiment, but also has the reciprocal of the arithmetic mean of the reciprocals of the limit wavelength λ1 on the short wavelength side of the wavelength range and the limit wavelength λ2 on the long wavelength side. From the setting method, the standard wavelength λ. The method is to select appropriately for each combination shown in FIG. 3. In addition, although the antireflection film 1 for germanium in the wavelength range of 3 to S μm has been described, each layer has a wavelength range of 2 to 5 μm.
By multiplying the thickness of ,7 by about 2.6, the wavelength range is 8 to 13μ.
It goes without saying that it has a similar effect on the atmospheric window of m, and it also has a similar effect in other wavelength ranges, even if other fluorides that are transparent in that wavelength range are used. I can do it.

また、本実施例においては、第2層2乃至第4層4を対
称3層構造とし、等価的に屈折率2.20の単層膜とし
たが、第6図に示すように屈折率が2.12〜2.28
の範囲、すなわち最大残留反射率が0.3%以下である
屈折率を有す名等師的な単層膜を構成しても同様の効果
が得られる。
In addition, in this example, the second layer 2 to the fourth layer 4 have a symmetrical three-layer structure, and are equivalently a single layer film with a refractive index of 2.20, but as shown in FIG. 2.12-2.28
A similar effect can be obtained by constructing a typical single-layer film having a refractive index in the range of 0.3% or less, that is, a maximum residual reflectance of 0.3% or less.

[発明の効果] 以上のように、この発明によればゲルマニウム用反射防
止膜を、光学的厚さが規準波長λ。の1/4であるシリ
コンからなる第1層と、屈折率がNaで厚さがdaであ
る第2層および第4層と、屈折率がNbで厚さがdbで
ある第3層と、光学的厚さが規準波長λ。の1/4であ
るフッ化ナトリウムからなる第5層を備え、第2層と第
3層および第4層の屈折率Na、 Nbと厚さda、 
dbを適切に選定し。
[Effects of the Invention] As described above, according to the present invention, the germanium antireflection film has an optical thickness equal to the reference wavelength λ. a first layer made of silicon, which has a refractive index of 1/4, a second and fourth layer having a refractive index of Na and a thickness of da, and a third layer having a refractive index of Nb and a thickness of db; Optical thickness is reference wavelength λ. The second layer, the third layer and the fourth layer have a refractive index Na, Nb and a thickness da,
Select the db appropriately.

第2層〜第4層を等価的に屈折率を2.12〜2.28
゜光学的厚さ規準波長λ。の1/4である単層膜とした
ので、ゲルマニウム用反射防止膜の残留反射率を低減で
き、広帯域にわたってゲルマニウムの表面における反射
を防止する。
The refractive index of the second to fourth layers is equivalently 2.12 to 2.28.
゜Optical thickness reference wavelength λ. Since the single-layer film is 1/4 of the above, the residual reflectance of the anti-reflection film for germanium can be reduced, and reflection on the surface of germanium can be prevented over a wide range.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図はこの発明の一実施例であるゲルマ
ニウム用反射防止膜の構成図および残留反射率の波長依
存性の特性図、第3図は他の実施例の第2層乃至第4層
の組合せを示す図表、第4図および第5図は従来のゲル
マニウム用反射防止膜の構成図および残留反射率の波長
依存性の特性図、第6図は光学的厚さが等しい3層の反
射防止膜において第1層をシリコン、第3層をフッ化ナ
トリウムとしたときの第2層の屈折率と残留反射率との
関係を示す特性図である。 1・・・・・ゲルマニウム用反射防止膜、2・・・・・
第2層、3・・・・・・第3層、4・・・・・・第4層
、6・・・・・ゲルマニウム。 代理人  大 岩 増 雄 (ほか2名)第1図 第2図 波            長    (μm)第3図 第4図 第5図 波            長    (μm)第6図 屈   折   率 手続補正Δ(自発) 1、事件の表示  特願昭 63−096108号2、
発明の名称 ゲルマニウム用反射防止膜 3、補正をする者 代表者 志 岐 守 哉 5 補正の対象 特許請求の範囲、発明の詳細な説明の欄60 補正の内
容 (1)特許請求の範囲を別紙のとおり補正する。 (2)明I書第3頁第2行目rNaFzJとあるのをr
NaFJと補正する。 (3)同書第4頁第12行目「最適値となり、」とある
のを「最小値となり、」と補正する。 (4)同書第5頁第1. s’71目乃至第19行目、
第9頁第10行目「と光学的厚さ」とあるのを「と厚さ
」と補正する。 (5)同書第6頁第1行目、第8頁第12行目、第9頁
第11行目 NaNb5ln2δacos&+(Na2cos22δ
a−Nb2sln2δa) Sinδb」とあるのを NaNb5ln2δacosEh+ (Na2cos2
δa−Nb”s+n”&) sln&  Jと補正する
。 (6)同書第6頁第7行目乃至第8行目、第12頁が2
.12〜2.28.光学的厚さが基準波長」と補正する
。 (7)同書第6頁第9行目乃至第10行目「ゲルマニウ
ムにおける」とあるのを「ゲルマニウムの表面における
」と補正する。 (8)同書第7頁第8行目乃至第9行目「マトリックス
、・・・・・・厚さは以下の式より」とあるのを[マト
リックスは以下の式より」と補正する。 (9)同書第7頁第14行目乃至第16行目’ m l
 l =m z 2 :・・・・・・・・・・・・・・
・ (5)」とあるのを’m++”m2*=cos2δ
a!δb l (”+’:) 5ln2δaslnδb
(3)mB−Nasln2δ躯δb4 叱cas”δa
 4sIn”δa)sinδb(4)」 と補正する。 (10)同書第9頁第9行目「対称3N構造の単層膜と
し、」とあるのを「対称3M構造とし、」と補正する。 (11)同書第9頁第14行目「第4層4の厚さdaは
」とあるのを「第4層4の光学的厚さdaはJと補正す
る。 (12)同書第9頁第15行目「第3層3の厚さdbは
」とあるのを「第3層3の光学的厚さdbは」と補正す
る。 (13)同書第10頁第19行目「屈折率1.75で厚
さ0.08え。」とあるのを「屈折率1.75で光学的
厚さ0.08λ。」と補正する。 (14)同書第10頁第20行目[屈折率2.35で厚
さ0.06λ。」とあるのを「屈折率2.35で光学的
厚さ0.06λ。」と補正する。 (15)同書第11頁第11行目乃至第12行目「した
ことである。」とあるのを「したものである。」と補正
する。 以上 2特許請求の範囲 ゲルマニウムの表面に積層され光学的厚さが規準波長λ
。の1/4であるシリコンからなる第1層と、この第1
層に積層され屈折率がNaで厚さがdaである第2層と
、この第2層に積層され屈折率がNbで厚さがdbであ
る第3層と、この第3層に積層され屈折率がNaで厚さ
がdaである第4層と、この第4層に積層され光学的厚
さが規準波長λ。の1/4であるフッ化ナトリウムから
なる第5層を備え、上記第2層〜第4層の屈折率Na、
 Nbと歴史da、 dbとが次式の関係にあることを
特徴とするゲルマニウム用反射防止膜。 ays−’ [ct1s25acos&−+ (R+R
) 5ln2δaslnδb]=晋Sa = ”” N
ada      Eh = ”’ Nbdbλ0  
       λ0
1 and 2 are diagrams showing the configuration of an antireflection film for germanium, which is an embodiment of the present invention, and a characteristic diagram of the wavelength dependence of the residual reflectance, and FIG. A diagram showing the combination of four layers. Figures 4 and 5 are a diagram of the configuration of a conventional antireflection film for germanium and a characteristic diagram of the wavelength dependence of residual reflectance. Figure 6 is a diagram showing the combination of three layers with equal optical thickness. FIG. 3 is a characteristic diagram showing the relationship between the refractive index of the second layer and the residual reflectance when the first layer is made of silicon and the third layer is made of sodium fluoride in the antireflection film of FIG. 1... Anti-reflection film for germanium, 2...
2nd layer, 3...3rd layer, 4...4th layer, 6...germanium. Agent Masuo Oiwa (and 2 others) Figure 1 Figure 2 Wavelength (μm) Figure 3 Figure 4 Figure 5 Wavelength (μm) Figure 6 Refractive index procedure correction Δ (spontaneous) 1. Incident display patent application No. 63-096108 2,
Name of the invention: Anti-reflection coating for germanium 3, Representative of the person making the amendment: Moriya Shiki 5 Scope of patent claims to be amended, column for detailed explanation of the invention 60 Contents of the amendment (1) The scope of claims is attached on a separate sheet. Correct accordingly. (2) Mei I, page 3, line 2, rNaFzJ
Correct with NaFJ. (3) In the same book, page 4, line 12, the phrase ``becomes the optimum value'' is corrected to ``becomes the minimum value.'' (4) Same book, page 5, No. 1. s'71st to 19th line,
On page 9, line 10, "and optical thickness" is corrected to "and thickness." (5) Same book, page 6, line 1, page 8, line 12, page 9, line 11 NaNb5ln2δacos&+(Na2cos22δ
a−Nb2sln2δa) Sinδb” is replaced with NaNb5ln2δacosEh+ (Na2cos2
Correct as δa-Nb"s+n"&)sln&J. (6) The same book, page 6, lines 7 to 8, page 12 is 2
.. 12-2.28. The optical thickness is corrected as the reference wavelength. (7) In the same book, page 6, lines 9 and 10, the phrase ``on germanium'' is corrected to ``on the surface of germanium.'' (8) In the same book, page 7, lines 8 to 9, the statement "Matrix, . . . thickness is based on the following formula" is corrected to "Matrix is based on the following formula". (9) Same book, page 7, lines 14 to 16' m l
l = m z 2 :・・・・・・・・・・・・・・・
・(5)" is replaced by 'm++"m2*=cos2δ
a! δb l (”+’:) 5ln2δaslnδb
(3) mB-Nasln2δbodyδb4 scoldingcas”δa
4sIn”δa)sinδb(4)”. (10) In the same book, page 9, line 9, the phrase ``A single layer film with a symmetrical 3N structure,'' has been corrected to ``A symmetrical 3M structure.'' (11) Ibid., page 9, line 14, "The thickness da of the fourth layer 4 is" is corrected to "The optical thickness da of the fourth layer 4 is J." (12) Ibid., page 9. In the 15th line, "the thickness db of the third layer 3 is" is corrected to "the optical thickness db of the third layer 3 is". (13) In the same book, page 10, line 19, "Refractive index 1.75, thickness 0.08" is corrected to "Refractive index 1.75, optical thickness 0.08λ." (14) Ibid., page 10, line 20 [Refractive index 2.35, thickness 0.06λ. " is corrected to "Refractive index 2.35 and optical thickness 0.06λ." (15) In the same book, page 11, lines 11 to 12, the phrase ``It is what I did.'' is amended to ``It is what I did.'' The above two claims are laminated on the surface of germanium and have an optical thickness of reference wavelength λ.
. a first layer made of silicon, which is 1/4 of the
A second layer is laminated on the second layer and has a refractive index of Na and a thickness of da; a third layer is laminated on this second layer and has a refractive index of Nb and a thickness of db; A fourth layer having a refractive index of Na and a thickness of da, and a fourth layer laminated on this fourth layer and having an optical thickness of a reference wavelength λ. The refractive index of the second to fourth layers is Na,
An antireflection film for germanium, characterized in that Nb and history da and db have the following relationship. ays-'[ct1s25acos&-+ (R+R
) 5ln2δaslnδb]=JinSa=””N
ada Eh = ”' Nbdbλ0
λ0

Claims (1)

【特許請求の範囲】 ゲルマニウムの表面に積層され光学的厚さが規準波長λ
_0の1/4であるシリコンからなる第1層と、この第
1層に積層され屈折率がNaで厚さがdaである第2層
と、この第2層に積層され屈折率がNbで厚さがdbで
ある第3層と、この第3層に積層され屈折率がNaで厚
さがdaである第4層と、この第4層に積層され光学的
厚さが規準波長λ_0の1/4であるフッ化ナトリウム
からなる第5層を備え、上記第2層〜第4層の屈折率N
a、Nbと光学的厚さda、dbとが次式の関係にある
ことを特徴とする、ゲルマニウム用反射防止膜。 ▲数式、化学式、表等があります▼ ▲数式、化学式、表等があります▼ δa=(2π/λ_0)Nada、δb=(2π/λ_
0)Nbdb
[Claims] Laminated on the surface of germanium, the optical thickness is equal to the standard wavelength λ.
A first layer made of silicon which is 1/4 of _0, a second layer laminated on this first layer and having a refractive index of Na and a thickness of da, and a second layer laminated on this second layer and having a refractive index of Nb. A third layer having a thickness of db, a fourth layer laminated on this third layer and having a refractive index of Na and a thickness of da, and a fourth layer laminated on this fourth layer and having an optical thickness of a reference wavelength λ_0. The refractive index N of the second to fourth layers is 1/4 of sodium fluoride.
An antireflection film for germanium, characterized in that a, Nb and optical thickness da, db have the following relationship. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ ▲There are mathematical formulas, chemical formulas, tables, etc.▼ δa = (2π/λ_0) Nada, δb = (2π/λ_
0) Nbdb
JP63096108A 1988-04-19 1988-04-19 Antireflection film for germanium Pending JPH01267501A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63096108A JPH01267501A (en) 1988-04-19 1988-04-19 Antireflection film for germanium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63096108A JPH01267501A (en) 1988-04-19 1988-04-19 Antireflection film for germanium

Publications (1)

Publication Number Publication Date
JPH01267501A true JPH01267501A (en) 1989-10-25

Family

ID=14156193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63096108A Pending JPH01267501A (en) 1988-04-19 1988-04-19 Antireflection film for germanium

Country Status (1)

Country Link
JP (1) JPH01267501A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5243458A (en) * 1990-12-25 1993-09-07 Minolta Camera Kabushiki Kaisha Antireflection coating for infrared light
US8478204B2 (en) 2008-07-14 2013-07-02 Samsung Electronics Co., Ltd. System and method for antenna training of beamforming vectors having reuse of directional information

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5243458A (en) * 1990-12-25 1993-09-07 Minolta Camera Kabushiki Kaisha Antireflection coating for infrared light
US8478204B2 (en) 2008-07-14 2013-07-02 Samsung Electronics Co., Ltd. System and method for antenna training of beamforming vectors having reuse of directional information

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