JPS62116901A - Antireflection film - Google Patents

Antireflection film

Info

Publication number
JPS62116901A
JPS62116901A JP60256529A JP25652985A JPS62116901A JP S62116901 A JPS62116901 A JP S62116901A JP 60256529 A JP60256529 A JP 60256529A JP 25652985 A JP25652985 A JP 25652985A JP S62116901 A JPS62116901 A JP S62116901A
Authority
JP
Japan
Prior art keywords
layer
refractive index
layers
film
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60256529A
Other languages
Japanese (ja)
Inventor
Mikio Hotta
堀田 幹生
Satoshi Kusaka
日下 敏
Hideki Noda
秀樹 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60256529A priority Critical patent/JPS62116901A/en
Publication of JPS62116901A publication Critical patent/JPS62116901A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To decrease reflectivity in a specific wavelength band to about 0.05% by using a high refractive index material for the 1st and 3rd layers an a low refractive index material for the 2nd and 4th layers with a film consisting of 4 layers and standardizing and specifying the film thicknesses thereof at 1/4 the design wavelength. CONSTITUTION:Four layers of optical films are formed on a transparent substrate 5 consisting of glass, etc. The high refractive index material (for example, TiO2, 2.3 refractive index) is used for the 1st layer 1 and 3rd layer 3 counted from the substrate side and the low refractive index material (for example, SiO2, 1.46 refractive index) is used for the 2nd layer 2 and 4th layer 4. The respective layers are formed to the following film thickness with the thickness of 1/4 the design wavelength as 1: The 1st layer 1 is formed to 0.205-0.215, the 2nd layer 2 to 0.336-0.346, the 3rd layer 3 to 1.788-1.798 and the 4th layer 4 to 0.828-0.848. Then the transmission loss is 0.002dB at about 850nm and 1,100nm wavelength if the design wavelength is 1,250nm and the reflectivity is made about 0.05%.

Description

【発明の詳細な説明】 〔概 要〕 反射防止nりであって、4層からなる膜の第1゜3層を
高屈折材料を、第2.4層を低層率材料を用い、その膜
厚を、設計波長の2を規格化して、第1層は0.205
〜0.215、第2層は0.336〜0.346、第3
層は1.788〜1.798、第4層は0.828〜0
.848とすることにより特定の波長帯において反射率
を0.05%程度に小さくすることを可能とする。
[Detailed Description of the Invention] [Summary] The anti-reflection film is composed of four layers, with the first and third layers made of a high refractive index material and the second and fourth layers made of a low layer index material. The thickness is standardized by the design wavelength of 2, and the first layer is 0.205.
~0.215, second layer 0.336~0.346, third layer
The layer is 1.788-1.798, the fourth layer is 0.828-0
.. 848 makes it possible to reduce the reflectance to about 0.05% in a specific wavelength band.

〔産業上の利用分野〕[Industrial application field]

本発明は特定の波長帯において特に反射率を低下させた
反射防止膜に関するものである。
The present invention relates to an antireflection film that has particularly reduced reflectance in a specific wavelength band.

〔従来の技術〕[Conventional technology]

反射防止膜は主にガラスまたは他の透明物質の表面での
反射をへらし、透過率を増加させるための膜であり、従
来より光学用の単層膜又は多層膜が用いられている。
An anti-reflection film is a film mainly used to reduce reflection on the surface of glass or other transparent materials and increase transmittance, and conventionally, optical single-layer films or multi-layer films have been used.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来の反射防止膜では、通常透過率が99.5%、即ち
反射率が0.5%程度であり、特殊な用途に対しては反
射率が大き過ぎるという問題があった。
Conventional antireflection films usually have a transmittance of 99.5%, that is, a reflectance of about 0.5%, and there is a problem in that the reflectance is too high for special uses.

本発明はこのような点に鑑みて創作されたもので、反射
率が0.05%程度と小さい反射防止膜を提供すること
を目的としている。
The present invention was created in view of these points, and an object of the present invention is to provide an antireflection film with a low reflectance of about 0.05%.

C問題点を解決するための手段〕 このため本発明においては、基板側から数えて第1乃至
第4の層1〜4がガラス基板5上に形成されてなり、前
記第1及び第3層1.3は高屈折率の材料で形成され、
前記第2及び第4層2,4は低屈折率の材料で形成され
、且つ各層の膜厚は、当反射防止膜の設計波長のAで規
格化して第1層1は0.205〜0.215 、第2層
は2は0.336〜0.346、第3層3は1.788
〜1.79B 、第4層4は0.828〜0.848と
したことを特徴としている。
Means for Solving Problem C] Therefore, in the present invention, the first to fourth layers 1 to 4 counting from the substrate side are formed on the glass substrate 5, and the first and third layers are formed on the glass substrate 5. 1.3 is made of a material with a high refractive index,
The second and fourth layers 2 and 4 are formed of a material with a low refractive index, and the film thickness of each layer is standardized by the design wavelength A of the antireflection film, and the thickness of the first layer 1 is 0.205 to 0. .215, second layer 2 is 0.336-0.346, third layer 3 is 1.788
~1.79B, and the fourth layer 4 is characterized by having a value of 0.828 to 0.848.

〔作 用〕[For production]

上記構成とすることにより設計波長が1250nmの場
合、850nmと1l100n付近で反射率を0.05
%程度(透過ロス0.002dB )とすることが可能
となる。
With the above configuration, when the design wavelength is 1250nm, the reflectance is reduced to 0.05 around 850nm and 1l100n.
% (transmission loss 0.002 dB).

〔実施例〕〔Example〕

第1図は本発明の実施例を示す図である。 FIG. 1 is a diagram showing an embodiment of the present invention.

本実施例は、ガラス等の透明基板5の上に、4層の光学
膜が形成されており、基板側から数えて第1〜第4層と
すると、第1層1及び第3層3は高屈折率の物質(例え
ばTiO2、屈折率2.3)を用い、第2層2及び第4
層4は低屈折率の物質(例えばSiO□、屈折率1.4
6)を用いて形成され、各層の膜厚は、設計波長のAを
1として、第1層1は0.210±o、oos 、第2
層2は0.341±0.005、第3層3は1.793
±0.005 、第4層4は0.838±0.01とな
っている。
In this embodiment, four layers of optical films are formed on a transparent substrate 5 such as glass, and the first to fourth layers are counted from the substrate side, and the first layer 1 and the third layer 3 are A material with a high refractive index (for example, TiO2, refractive index 2.3) is used for the second layer 2 and the fourth layer
Layer 4 is made of a material with a low refractive index (e.g. SiO□, refractive index 1.4).
6), and the film thickness of each layer is 0.210±o,oos for the first layer 1, and 0.210±o,oos for the first layer 1, with the design wavelength A being 1.
Layer 2 is 0.341±0.005, third layer 3 is 1.793
±0.005, and 0.838±0.01 for the fourth layer 4.

このように構成された本実施例は、設計波長を1250
nr@とした場合、透過ロス特性は第2図の如くになる
。透過ロスは波長850nm及び1l100n付近で0
.002 dBであり、反射光は入射光に対して約30
dBの減衰(即ち反射率は約0.05%)となる。これ
は通常の反射防止膜の減衰量より10dBはど大きく、
それだけ反射を低下できる。
In this embodiment configured in this way, the design wavelength is set to 1250.
In the case of nr@, the transmission loss characteristics are as shown in FIG. Transmission loss is 0 at wavelength 850nm and around 1l100n
.. 002 dB, and the reflected light is about 30 dB compared to the incident light.
dB attenuation (ie, the reflectance is approximately 0.05%). This is 10 dB greater than the attenuation of a normal anti-reflection film.
Reflection can be reduced accordingly.

本発明の反射防止膜は、例えば光フアイバ破断点検出の
際に利用できる。第3図にフォルトロケータを用いた光
フアイバ破断点検出方法を示す。
The antireflection film of the present invention can be used, for example, in detecting an optical fiber break point. FIG. 3 shows a method of detecting a break point in an optical fiber using a fault locator.

図により説明すると、フォルトロケータ10に内蔵され
るレーザ光源から送出された光は光ファイバ11の破断
点(×印で示す)で反射されたフォルトロケータ10内
の受光器に戻り、その遅延時間をカウントすることによ
り破断位置を検出する。
To explain with a diagram, the light sent out from the laser light source built into the fault locator 10 is reflected at the break point of the optical fiber 11 (indicated by an x mark) and returns to the receiver inside the fault locator 10, and the delay time is The fracture position is detected by counting.

破断点での反射は光ファイバと空気の屈折率のちがいに
よるフレネル反射であり、反射率は光ファイバの屈折率
をnとすると(n−1/n + 1) ”である。
The reflection at the break point is Fresnel reflection due to the difference in refractive index between the optical fiber and air, and the reflectance is (n-1/n+1)'', where n is the refractive index of the optical fiber.

この反射条件は光フアイバ入射端面でも同じであるから
、ここでも反射があり、かつ入射端であるから減衰せず
にロケータ本体に戻ってしまい、このままでは破断点の
検出に悪影響をおよぼず。本発明の反射防止膜を入射端
面に施すことにより、入射端面での反射を防止し、光フ
アイバ破断点の検出を容易にすることができる。
This reflection condition is the same at the optical fiber input end face, so there is reflection here as well, and since it is the input end, it returns to the locator body without being attenuated, and if it continues as it is, it will not adversely affect the detection of the break point. By applying the antireflection film of the present invention to the input end face, reflection at the input end face can be prevented and the optical fiber break point can be easily detected.

〔発明の効果〕〔Effect of the invention〕

以上述べてきたように、本発明によれば、極めて簡易な
構成で反射率を低下することができ、実用的には極めて
有用である。
As described above, according to the present invention, it is possible to reduce the reflectance with an extremely simple configuration, and it is extremely useful in practice.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例を示す図、 第2図は本発明の実施例の透過ロス特性を示す図、 第3図はフォルトロケータによる光ファイバの破断点検
出方法を説明するための図である。 第1図において、 1は第1層 2は第2層 3は第3層 4は第4層 5は基板である。 本発明の実施例を示す図 第1図 1・・・第1層 2・・・第2層 3・・・第3層 4・・・第4層 5・・・基板 波長 (nm) 本発明の実施例の透過ロス特性を示す図第2図 フォルトロケータによる光フアイバ破断点検出方法を説
明するための図 竿3図 1o・・・ フォルトロケータ 11 ・・・光ファイバ
Fig. 1 is a diagram showing an embodiment of the present invention, Fig. 2 is a diagram showing transmission loss characteristics of an embodiment of the present invention, and Fig. 3 is a diagram illustrating a method for detecting a break point in an optical fiber using a fault locator. It is. In FIG. 1, 1 is a first layer 2, a second layer 3, a third layer 4, and a fourth layer 5, which are substrates. Figure 1 shows an embodiment of the present invention.1...First layer 2...Second layer 3...Third layer 4...Fourth layer 5...Substrate wavelength (nm) This invention Fig. 2 shows the transmission loss characteristics of the embodiment of Fig. 2. Fig. 3 for explaining the method of detecting the break point of an optical fiber using a fault locator.

Claims (1)

【特許請求の範囲】 1、基板側から数えて第1乃至第4の層(1〜4)が順
次ガラス基板(5)上に形成されてなり、上記第1及び
第3層(1、3)は高屈折率の材料で形成され、 上記第2及び第4層(2、4)は低屈折率の材料で形成
され、 且つ上記各層の膜厚は当反射防止膜の設計波長の1/4
で規格化して 第1層(1)は0.205〜0.215 第2層(2)は0.336〜0.346 第3層(3)は1.788〜1.798 第4層(4)は0.828〜0.848 としたことを特徴とする反射防止膜。
[Scope of Claims] 1. The first to fourth layers (1 to 4) counting from the substrate side are sequentially formed on a glass substrate (5), and the first and third layers (1, 3 ) is formed of a material with a high refractive index, the second and fourth layers (2, 4) are formed of a material with a low refractive index, and the film thickness of each layer is 1/1 of the design wavelength of the antireflection film. 4
Normalized by 4) is an anti-reflection film characterized in that it has an anti-reflection coating of 0.828 to 0.848.
JP60256529A 1985-11-18 1985-11-18 Antireflection film Pending JPS62116901A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60256529A JPS62116901A (en) 1985-11-18 1985-11-18 Antireflection film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60256529A JPS62116901A (en) 1985-11-18 1985-11-18 Antireflection film

Publications (1)

Publication Number Publication Date
JPS62116901A true JPS62116901A (en) 1987-05-28

Family

ID=17293889

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60256529A Pending JPS62116901A (en) 1985-11-18 1985-11-18 Antireflection film

Country Status (1)

Country Link
JP (1) JPS62116901A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6480904A (en) * 1987-09-22 1989-03-27 Nippon Sheet Glass Co Ltd Transparent plate stuck with conductive antireflection film
JPH08262203A (en) * 1995-03-17 1996-10-11 Lg Electron Inc Reflection preventing layer for display device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57140152A (en) * 1981-02-26 1982-08-30 Nippon Soken Heat wave reflecting membrane
JPS5870201A (en) * 1981-10-22 1983-04-26 Tokyo Optical Co Ltd Tempered glass coated with reflection preventing film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57140152A (en) * 1981-02-26 1982-08-30 Nippon Soken Heat wave reflecting membrane
JPS5870201A (en) * 1981-10-22 1983-04-26 Tokyo Optical Co Ltd Tempered glass coated with reflection preventing film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6480904A (en) * 1987-09-22 1989-03-27 Nippon Sheet Glass Co Ltd Transparent plate stuck with conductive antireflection film
JPH08262203A (en) * 1995-03-17 1996-10-11 Lg Electron Inc Reflection preventing layer for display device

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