JPH01259584A - Magnetoresistive element - Google Patents

Magnetoresistive element

Info

Publication number
JPH01259584A
JPH01259584A JP63087857A JP8785788A JPH01259584A JP H01259584 A JPH01259584 A JP H01259584A JP 63087857 A JP63087857 A JP 63087857A JP 8785788 A JP8785788 A JP 8785788A JP H01259584 A JPH01259584 A JP H01259584A
Authority
JP
Japan
Prior art keywords
magnetoresistive element
thin film
substrate
magnetic field
conductive thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63087857A
Other languages
Japanese (ja)
Inventor
Masumi Nakamichi
眞澄 中道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP63087857A priority Critical patent/JPH01259584A/en
Publication of JPH01259584A publication Critical patent/JPH01259584A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable a biased magnetic field strength to be arbitrarily set and allow mass production by forming a magnetoresistive element made of a ferromagnetic metal thin film on top of a substrate and a conductive thin film with a predetermined pattern on bottom of the substrate and by obtaining a magnetic field for magnetic biasing by the conduction of the conductive thin film. CONSTITUTION:An Ni-Fe film 12, a magnetoresistive element 12a, power supply terminals 12b, 12d, and a signal output terminal 12c are arranged on a ceramic substrate 11. On the bottom of the substrate 11, a conductive pattern 13 formed of a Cu thin film is arranged in a direction forming an angle of about 45 deg. with respect to the direction of forming the magnetoresistive element 12a. When the conductive thin film is conducted, a magnetic field is generated and a magnetically biased voltage is applied to the magnetoresistive element. Accordingly, the level of the magnetic biasing can arbitrarily adjusted by controlling the current supplied to the conductive thin film, thereby simplifying the formation of and allowing the mass-production for the element.

Description

【発明の詳細な説明】 (イ)産業上の利用分野 この発明は、主にモータのような回転体の回転速度を検
出する場合に、磁気検出用センサとして使用される磁気
抵抗素子に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application This invention relates to a magnetoresistive element used as a magnetic detection sensor, mainly when detecting the rotational speed of a rotating body such as a motor.

(ロ)従来の技術 第3図は磁気抵抗素子の動作を示す説明図であり、磁気
抵抗効果を有する薄膜1に信号磁界Os igが直交方
向に作用した場合、薄膜!中の磁化Xtの方向が角度θ
だけ変化し、これに伴って端子2゜3開の電気抵抗が一
般的に2〜5%低下する。従って、磁気抵抗素子に印加
される磁界Hs igに対する端子2.3間の抵抗変化
は、第4図に示すようにヒステリシス特性を有する。こ
のヒステリシス特性はバイアス磁界Hbiasを印加す
ることにより抑制することができるので、従来の磁気抵
抗素子においては、第5図に示すように基板4の上に強
磁性体からなる磁気抵抗効果エレメント5を形成して端
子6,7.8を設けると共に、基板4の裏面にバイアス
用永久磁石9を貼り付けている。
(b) Conventional technology FIG. 3 is an explanatory diagram showing the operation of a magnetoresistive element. When a signal magnetic field Os ig acts on a thin film 1 having a magnetoresistive effect in an orthogonal direction, the thin film! The direction of the magnetization Xt inside is at an angle θ
As a result, the electrical resistance of terminals 2° and 3rd open generally decreases by 2 to 5%. Therefore, the resistance change between the terminals 2.3 with respect to the magnetic field Hs ig applied to the magnetoresistive element has a hysteresis characteristic as shown in FIG. 4. This hysteresis characteristic can be suppressed by applying a bias magnetic field Hbias, so in a conventional magnetoresistive element, a magnetoresistive element 5 made of a ferromagnetic material is placed on a substrate 4 as shown in FIG. Terminals 6, 7, and 8 are formed on the substrate 4, and a bias permanent magnet 9 is attached to the back surface of the substrate 4.

(ハ)発明が解決しようとする課題 しカルながら、従来のこのような磁気抵抗素子において
は、磁気抵抗効果エレメント5に対して一定方向にバイ
アス磁界をかけなければならないため、バイアス用永久
磁石9を基板5に精度よく貼り付ける必要がある。とこ
ろで、素子間のバイアス磁界強度は、基板4へのバイア
ス用永久磁石9の取付は精度ばかりでなく、バイアス用
永久磁石9の磁力によってもバラつくため、−様な特性
を有する磁気抵抗素子を量産することか難しいという問
題点があった。
(c) Problems to be Solved by the Invention However, in such a conventional magnetoresistive element, since a bias magnetic field must be applied to the magnetoresistive element 5 in a fixed direction, the bias permanent magnet 9 It is necessary to affix it to the substrate 5 with high precision. By the way, the bias magnetic field strength between elements varies not only due to the accuracy of mounting the bias permanent magnet 9 to the substrate 4 but also due to the magnetic force of the bias permanent magnet 9. The problem was that it was difficult to mass produce.

この発明はこのような事情を考慮してなされたもので、
電流によ、って発生する磁界を用いてバイアスを印加し
バイアス磁界強度を任意に設定することが可能な磁気抵
抗効果素子を提供するものである。
This invention was made in consideration of these circumstances,
The object of the present invention is to provide a magnetoresistive element that can apply a bias using a magnetic field generated by a current and arbitrarily set the bias magnetic field strength.

(ニ)課題を解決するための手段 この発明は、基板と、基板表面に形成された強磁性体金
属薄膜からなる磁気抵抗効果エレメントと、基板裏面に
形成され所定パターンを有する導体薄膜とからなり、導
体薄膜に通電することによって磁気抵抗効果エレメント
に対する磁気バイアス用の磁界を形成することを特徴と
する磁気抵抗効果素子である。
(d) Means for Solving the Problems This invention consists of a substrate, a magnetoresistive element made of a ferromagnetic metal thin film formed on the surface of the substrate, and a conductive thin film formed on the back surface of the substrate and having a predetermined pattern. , a magnetoresistive element characterized by forming a magnetic field for magnetic bias to a magnetoresistive element by applying current to a conductor thin film.

基板にはセラミックが主に使用され、強磁性体金属薄膜
にはNi−Pa、N1−Go等が用いられる。また導体
薄膜は磁気抵抗効果エメレントの電流通電方向に対して
直角もしくは45°に交わる角度に形成されることが好
ましい。
Ceramic is mainly used for the substrate, and Ni-Pa, N1-Go, etc. are used for the ferromagnetic metal thin film. Further, it is preferable that the conductive thin film is formed at an angle perpendicular to or at an angle of 45° to the current direction of the magnetoresistive emerent.

(ホ)作用 導体薄膜イこ電流を通電するとそれによって磁界が発生
し、磁気抵抗効果エレメントに対して磁気バイアスが印
加される。従って、磁気バイアスの程度は、導体薄膜へ
の通11電流の大きさを制御することにより任意に調整
することができるので、磁気抵抗効果素子の製造に際し
て、基板に対する磁気抵抗効果エレメント及び導体薄膜
の位置関係について高い精度が要求されろことがない。
(e) Working conductor When current is passed through the thin film, a magnetic field is generated and a magnetic bias is applied to the magnetoresistive element. Therefore, the degree of magnetic bias can be adjusted arbitrarily by controlling the magnitude of the current flowing through the conductive thin film, so when manufacturing the magnetoresistive element, the magnetoresistive element and the conductive thin film are attached to the substrate. There is no need for high precision in positional relationships.

(へ)実施例 以下、図面に示す実施例に基づいて、この発明を詳述す
る。これによってこの発明が限定されるしのではない。
(f) Examples The present invention will now be described in detail based on examples shown in the drawings. This invention is not limited by this.

第1図はこの発明の一実施例を示す上面図、第2図は第
1図の底面図である。これらの図において2は厚さ0.
6IIMのセラミック製基板、12は抵抗加熱、電子ビ
ームまたはスパッタリング法によって形成された厚さ0
.05〜0.1μmf)N i −F e膜である。1
2aは磁気抵抗効果エレメント、+2b、+2dはそれ
ぞれ給電端子、12cは信号出力端子である。基板11
の裏面には第2図に示すように磁気抵抗効果エレメント
12の形成方向に対して約45°の方向に導体パターン
13が形成されている。導体パターン!3はメツキまた
は印刷法によって形成された厚さ100μm17)cu
薄膜である。なお、基板11の2つの角はスルーホール
14.15が形成され、端子!2bと端子13a、端子
12dと端子13bがそれぞれ電気的に接続されている
FIG. 1 is a top view showing an embodiment of the present invention, and FIG. 2 is a bottom view of FIG. 1. In these figures, 2 indicates a thickness of 0.
6IIM ceramic substrate, 12 is 0 thickness formed by resistance heating, electron beam or sputtering method.
.. 05-0.1 μmf) Ni-Fe film. 1
2a is a magnetoresistive element, +2b and +2d are power supply terminals, and 12c is a signal output terminal. Board 11
As shown in FIG. 2, a conductive pattern 13 is formed on the back surface of the magneto-resistance effect element 12 at an angle of approximately 45° to the direction in which the magnetoresistive element 12 is formed. Conductor pattern! 3 has a thickness of 100 μm formed by plating or printing method 17) cu
It is a thin film. In addition, through holes 14 and 15 are formed at two corners of the board 11, and terminals are formed at the two corners of the board 11. 2b and the terminal 13a, and the terminal 12d and the terminal 13b are electrically connected.

このような構成において、端子12bと端子12dに電
圧が印加されると、磁気抵抗効果エレメント部12aに
電流か流れると共に、裏面の導体パターン!3にも電流
が流れる。導体パターン13の抵抗は磁気抵抗効果エレ
メント部12aの抵抗に比べ約1/10に設定されてい
るため、導体パターン13に大電流が流れる。導体パタ
ーン13に流れる電流によって磁界が発生し、その磁界
が磁気抵抗効果エレメント部12aに磁気バイアスを与
える。従って、このように構成した磁気抵抗効果素子を
磁気センサとして使用すると、そのヒステリシス特性を
充分に抑制することが可能となる。
In such a configuration, when a voltage is applied to the terminals 12b and 12d, a current flows through the magnetoresistive element section 12a, and the conductor pattern on the back surface! Current also flows through 3. Since the resistance of the conductor pattern 13 is set to about 1/10 of the resistance of the magnetoresistive element section 12a, a large current flows through the conductor pattern 13. A magnetic field is generated by the current flowing through the conductor pattern 13, and the magnetic field applies a magnetic bias to the magnetoresistive element section 12a. Therefore, when the magnetoresistive element configured in this manner is used as a magnetic sensor, it is possible to sufficiently suppress its hysteresis characteristics.

(ト)発明の効果 この発明によれば、磁気抵抗効果エレメントを形成した
基板裏面に導体膜を製膜し、その導体に電流を通電する
ことによって磁気抵抗効果エレメントに磁気バイアスを
与えることが可能となる。
(g) Effects of the invention According to this invention, it is possible to apply a magnetic bias to the magnetoresistive element by forming a conductive film on the back surface of the substrate on which the magnetoresistive element is formed and passing a current through the conductor. becomes.

従って、製作上の高い位置精度が不要となり、磁気抵抗
効果素子の製作が簡易化され、量産性が向上する。
Therefore, there is no need for high positional accuracy in manufacturing, simplifying the manufacturing of the magnetoresistive element, and improving mass productivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例を示す上面図、第2図は第
1図の底面図、第3図は磁気抵抗素子の動作原理を示す
説明図、第4図は第3図に示す磁気抵抗素子の磁界と抵
抗変化との関係を示すグラフ、第5図は従来例を示す斜
視図である。 1!・・・・・・基板、12・・・・・・強磁性体金属
薄膜、12a・・・・・・磁気抵抗効果エレメント、1
2b、12d・・・・・・給電端子、12c・・・・・
・信号出力端子、 13・・・・・−導体パターン、 13a、13b・・・・・・給電端子、14.15・・
・・・・スルーホール。 51 Σ 42 工
Fig. 1 is a top view showing an embodiment of the present invention, Fig. 2 is a bottom view of Fig. 1, Fig. 3 is an explanatory diagram showing the operating principle of the magnetoresistive element, and Fig. 4 is shown in Fig. 3. A graph showing the relationship between the magnetic field and resistance change of a magnetoresistive element, and FIG. 5 is a perspective view showing a conventional example. 1! ... Substrate, 12 ... Ferromagnetic metal thin film, 12a ... Magnetoresistive element, 1
2b, 12d...Power supply terminal, 12c...
・Signal output terminal, 13...-conductor pattern, 13a, 13b...power supply terminal, 14.15...
...Through hole. 51 Σ 42 Engineering

Claims (1)

【特許請求の範囲】[Claims] 1、基板と、基板表面に形成された強磁性体金属薄膜か
らなる磁気抵抗効果エレメントと、基板裏面に形成され
所定パターンを有する導体薄膜とからなり、導体薄膜に
通電することによって磁気抵抗効果エレメントに対する
磁気バイアス用の磁界を形成することを特徴とする磁気
抵抗効果素子。
1. Consisting of a substrate, a magnetoresistive element made of a ferromagnetic metal thin film formed on the surface of the substrate, and a conductive thin film formed on the back side of the substrate and having a predetermined pattern, the magnetoresistive element is formed by energizing the conductive thin film. A magnetoresistive element characterized by forming a magnetic field for magnetic bias against.
JP63087857A 1988-04-08 1988-04-08 Magnetoresistive element Pending JPH01259584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63087857A JPH01259584A (en) 1988-04-08 1988-04-08 Magnetoresistive element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63087857A JPH01259584A (en) 1988-04-08 1988-04-08 Magnetoresistive element

Publications (1)

Publication Number Publication Date
JPH01259584A true JPH01259584A (en) 1989-10-17

Family

ID=13926555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63087857A Pending JPH01259584A (en) 1988-04-08 1988-04-08 Magnetoresistive element

Country Status (1)

Country Link
JP (1) JPH01259584A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110780088A (en) * 2019-11-08 2020-02-11 中北大学 Multi-bridge tunnel magnetic resistance double-shaft accelerometer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110780088A (en) * 2019-11-08 2020-02-11 中北大学 Multi-bridge tunnel magnetic resistance double-shaft accelerometer

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