JPH01259584A - Magnetoresistive element - Google Patents
Magnetoresistive elementInfo
- Publication number
- JPH01259584A JPH01259584A JP63087857A JP8785788A JPH01259584A JP H01259584 A JPH01259584 A JP H01259584A JP 63087857 A JP63087857 A JP 63087857A JP 8785788 A JP8785788 A JP 8785788A JP H01259584 A JPH01259584 A JP H01259584A
- Authority
- JP
- Japan
- Prior art keywords
- magnetoresistive element
- thin film
- substrate
- magnetic field
- conductive thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 claims abstract description 27
- 239000010409 thin film Substances 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 5
- 239000002184 metal Substances 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000000919 ceramic Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 abstract description 3
- 229910003271 Ni-Fe Inorganic materials 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000004020 conductor Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 101710198277 RNA polymerase sigma factor sigA Proteins 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
この発明は、主にモータのような回転体の回転速度を検
出する場合に、磁気検出用センサとして使用される磁気
抵抗素子に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application This invention relates to a magnetoresistive element used as a magnetic detection sensor, mainly when detecting the rotational speed of a rotating body such as a motor.
(ロ)従来の技術
第3図は磁気抵抗素子の動作を示す説明図であり、磁気
抵抗効果を有する薄膜1に信号磁界Os igが直交方
向に作用した場合、薄膜!中の磁化Xtの方向が角度θ
だけ変化し、これに伴って端子2゜3開の電気抵抗が一
般的に2〜5%低下する。従って、磁気抵抗素子に印加
される磁界Hs igに対する端子2.3間の抵抗変化
は、第4図に示すようにヒステリシス特性を有する。こ
のヒステリシス特性はバイアス磁界Hbiasを印加す
ることにより抑制することができるので、従来の磁気抵
抗素子においては、第5図に示すように基板4の上に強
磁性体からなる磁気抵抗効果エレメント5を形成して端
子6,7.8を設けると共に、基板4の裏面にバイアス
用永久磁石9を貼り付けている。(b) Conventional technology FIG. 3 is an explanatory diagram showing the operation of a magnetoresistive element. When a signal magnetic field Os ig acts on a thin film 1 having a magnetoresistive effect in an orthogonal direction, the thin film! The direction of the magnetization Xt inside is at an angle θ
As a result, the electrical resistance of terminals 2° and 3rd open generally decreases by 2 to 5%. Therefore, the resistance change between the terminals 2.3 with respect to the magnetic field Hs ig applied to the magnetoresistive element has a hysteresis characteristic as shown in FIG. 4. This hysteresis characteristic can be suppressed by applying a bias magnetic field Hbias, so in a conventional magnetoresistive element, a magnetoresistive element 5 made of a ferromagnetic material is placed on a substrate 4 as shown in FIG. Terminals 6, 7, and 8 are formed on the substrate 4, and a bias permanent magnet 9 is attached to the back surface of the substrate 4.
(ハ)発明が解決しようとする課題
しカルながら、従来のこのような磁気抵抗素子において
は、磁気抵抗効果エレメント5に対して一定方向にバイ
アス磁界をかけなければならないため、バイアス用永久
磁石9を基板5に精度よく貼り付ける必要がある。とこ
ろで、素子間のバイアス磁界強度は、基板4へのバイア
ス用永久磁石9の取付は精度ばかりでなく、バイアス用
永久磁石9の磁力によってもバラつくため、−様な特性
を有する磁気抵抗素子を量産することか難しいという問
題点があった。(c) Problems to be Solved by the Invention However, in such a conventional magnetoresistive element, since a bias magnetic field must be applied to the magnetoresistive element 5 in a fixed direction, the bias permanent magnet 9 It is necessary to affix it to the substrate 5 with high precision. By the way, the bias magnetic field strength between elements varies not only due to the accuracy of mounting the bias permanent magnet 9 to the substrate 4 but also due to the magnetic force of the bias permanent magnet 9. The problem was that it was difficult to mass produce.
この発明はこのような事情を考慮してなされたもので、
電流によ、って発生する磁界を用いてバイアスを印加し
バイアス磁界強度を任意に設定することが可能な磁気抵
抗効果素子を提供するものである。This invention was made in consideration of these circumstances,
The object of the present invention is to provide a magnetoresistive element that can apply a bias using a magnetic field generated by a current and arbitrarily set the bias magnetic field strength.
(ニ)課題を解決するための手段
この発明は、基板と、基板表面に形成された強磁性体金
属薄膜からなる磁気抵抗効果エレメントと、基板裏面に
形成され所定パターンを有する導体薄膜とからなり、導
体薄膜に通電することによって磁気抵抗効果エレメント
に対する磁気バイアス用の磁界を形成することを特徴と
する磁気抵抗効果素子である。(d) Means for Solving the Problems This invention consists of a substrate, a magnetoresistive element made of a ferromagnetic metal thin film formed on the surface of the substrate, and a conductive thin film formed on the back surface of the substrate and having a predetermined pattern. , a magnetoresistive element characterized by forming a magnetic field for magnetic bias to a magnetoresistive element by applying current to a conductor thin film.
基板にはセラミックが主に使用され、強磁性体金属薄膜
にはNi−Pa、N1−Go等が用いられる。また導体
薄膜は磁気抵抗効果エメレントの電流通電方向に対して
直角もしくは45°に交わる角度に形成されることが好
ましい。Ceramic is mainly used for the substrate, and Ni-Pa, N1-Go, etc. are used for the ferromagnetic metal thin film. Further, it is preferable that the conductive thin film is formed at an angle perpendicular to or at an angle of 45° to the current direction of the magnetoresistive emerent.
(ホ)作用
導体薄膜イこ電流を通電するとそれによって磁界が発生
し、磁気抵抗効果エレメントに対して磁気バイアスが印
加される。従って、磁気バイアスの程度は、導体薄膜へ
の通11電流の大きさを制御することにより任意に調整
することができるので、磁気抵抗効果素子の製造に際し
て、基板に対する磁気抵抗効果エレメント及び導体薄膜
の位置関係について高い精度が要求されろことがない。(e) Working conductor When current is passed through the thin film, a magnetic field is generated and a magnetic bias is applied to the magnetoresistive element. Therefore, the degree of magnetic bias can be adjusted arbitrarily by controlling the magnitude of the current flowing through the conductive thin film, so when manufacturing the magnetoresistive element, the magnetoresistive element and the conductive thin film are attached to the substrate. There is no need for high precision in positional relationships.
(へ)実施例
以下、図面に示す実施例に基づいて、この発明を詳述す
る。これによってこの発明が限定されるしのではない。(f) Examples The present invention will now be described in detail based on examples shown in the drawings. This invention is not limited by this.
第1図はこの発明の一実施例を示す上面図、第2図は第
1図の底面図である。これらの図において2は厚さ0.
6IIMのセラミック製基板、12は抵抗加熱、電子ビ
ームまたはスパッタリング法によって形成された厚さ0
.05〜0.1μmf)N i −F e膜である。1
2aは磁気抵抗効果エレメント、+2b、+2dはそれ
ぞれ給電端子、12cは信号出力端子である。基板11
の裏面には第2図に示すように磁気抵抗効果エレメント
12の形成方向に対して約45°の方向に導体パターン
13が形成されている。導体パターン!3はメツキまた
は印刷法によって形成された厚さ100μm17)cu
薄膜である。なお、基板11の2つの角はスルーホール
14.15が形成され、端子!2bと端子13a、端子
12dと端子13bがそれぞれ電気的に接続されている
。FIG. 1 is a top view showing an embodiment of the present invention, and FIG. 2 is a bottom view of FIG. 1. In these figures, 2 indicates a thickness of 0.
6IIM ceramic substrate, 12 is 0 thickness formed by resistance heating, electron beam or sputtering method.
.. 05-0.1 μmf) Ni-Fe film. 1
2a is a magnetoresistive element, +2b and +2d are power supply terminals, and 12c is a signal output terminal. Board 11
As shown in FIG. 2, a conductive pattern 13 is formed on the back surface of the magneto-resistance effect element 12 at an angle of approximately 45° to the direction in which the magnetoresistive element 12 is formed. Conductor pattern! 3 has a thickness of 100 μm formed by plating or printing method 17) cu
It is a thin film. In addition, through holes 14 and 15 are formed at two corners of the board 11, and terminals are formed at the two corners of the board 11. 2b and the terminal 13a, and the terminal 12d and the terminal 13b are electrically connected.
このような構成において、端子12bと端子12dに電
圧が印加されると、磁気抵抗効果エレメント部12aに
電流か流れると共に、裏面の導体パターン!3にも電流
が流れる。導体パターン13の抵抗は磁気抵抗効果エレ
メント部12aの抵抗に比べ約1/10に設定されてい
るため、導体パターン13に大電流が流れる。導体パタ
ーン13に流れる電流によって磁界が発生し、その磁界
が磁気抵抗効果エレメント部12aに磁気バイアスを与
える。従って、このように構成した磁気抵抗効果素子を
磁気センサとして使用すると、そのヒステリシス特性を
充分に抑制することが可能となる。In such a configuration, when a voltage is applied to the terminals 12b and 12d, a current flows through the magnetoresistive element section 12a, and the conductor pattern on the back surface! Current also flows through 3. Since the resistance of the conductor pattern 13 is set to about 1/10 of the resistance of the magnetoresistive element section 12a, a large current flows through the conductor pattern 13. A magnetic field is generated by the current flowing through the conductor pattern 13, and the magnetic field applies a magnetic bias to the magnetoresistive element section 12a. Therefore, when the magnetoresistive element configured in this manner is used as a magnetic sensor, it is possible to sufficiently suppress its hysteresis characteristics.
(ト)発明の効果
この発明によれば、磁気抵抗効果エレメントを形成した
基板裏面に導体膜を製膜し、その導体に電流を通電する
ことによって磁気抵抗効果エレメントに磁気バイアスを
与えることが可能となる。(g) Effects of the invention According to this invention, it is possible to apply a magnetic bias to the magnetoresistive element by forming a conductive film on the back surface of the substrate on which the magnetoresistive element is formed and passing a current through the conductor. becomes.
従って、製作上の高い位置精度が不要となり、磁気抵抗
効果素子の製作が簡易化され、量産性が向上する。Therefore, there is no need for high positional accuracy in manufacturing, simplifying the manufacturing of the magnetoresistive element, and improving mass productivity.
第1図はこの発明の一実施例を示す上面図、第2図は第
1図の底面図、第3図は磁気抵抗素子の動作原理を示す
説明図、第4図は第3図に示す磁気抵抗素子の磁界と抵
抗変化との関係を示すグラフ、第5図は従来例を示す斜
視図である。
1!・・・・・・基板、12・・・・・・強磁性体金属
薄膜、12a・・・・・・磁気抵抗効果エレメント、1
2b、12d・・・・・・給電端子、12c・・・・・
・信号出力端子、
13・・・・・−導体パターン、
13a、13b・・・・・・給電端子、14.15・・
・・・・スルーホール。
51 Σ
42 工Fig. 1 is a top view showing an embodiment of the present invention, Fig. 2 is a bottom view of Fig. 1, Fig. 3 is an explanatory diagram showing the operating principle of the magnetoresistive element, and Fig. 4 is shown in Fig. 3. A graph showing the relationship between the magnetic field and resistance change of a magnetoresistive element, and FIG. 5 is a perspective view showing a conventional example. 1! ... Substrate, 12 ... Ferromagnetic metal thin film, 12a ... Magnetoresistive element, 1
2b, 12d...Power supply terminal, 12c...
・Signal output terminal, 13...-conductor pattern, 13a, 13b...power supply terminal, 14.15...
...Through hole. 51 Σ 42 Engineering
Claims (1)
らなる磁気抵抗効果エレメントと、基板裏面に形成され
所定パターンを有する導体薄膜とからなり、導体薄膜に
通電することによって磁気抵抗効果エレメントに対する
磁気バイアス用の磁界を形成することを特徴とする磁気
抵抗効果素子。1. Consisting of a substrate, a magnetoresistive element made of a ferromagnetic metal thin film formed on the surface of the substrate, and a conductive thin film formed on the back side of the substrate and having a predetermined pattern, the magnetoresistive element is formed by energizing the conductive thin film. A magnetoresistive element characterized by forming a magnetic field for magnetic bias against.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63087857A JPH01259584A (en) | 1988-04-08 | 1988-04-08 | Magnetoresistive element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63087857A JPH01259584A (en) | 1988-04-08 | 1988-04-08 | Magnetoresistive element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01259584A true JPH01259584A (en) | 1989-10-17 |
Family
ID=13926555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63087857A Pending JPH01259584A (en) | 1988-04-08 | 1988-04-08 | Magnetoresistive element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01259584A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110780088A (en) * | 2019-11-08 | 2020-02-11 | 中北大学 | Multi-bridge tunnel magnetic resistance double-shaft accelerometer |
-
1988
- 1988-04-08 JP JP63087857A patent/JPH01259584A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110780088A (en) * | 2019-11-08 | 2020-02-11 | 中北大学 | Multi-bridge tunnel magnetic resistance double-shaft accelerometer |
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