JPH0125046B2 - - Google Patents

Info

Publication number
JPH0125046B2
JPH0125046B2 JP56141677A JP14167781A JPH0125046B2 JP H0125046 B2 JPH0125046 B2 JP H0125046B2 JP 56141677 A JP56141677 A JP 56141677A JP 14167781 A JP14167781 A JP 14167781A JP H0125046 B2 JPH0125046 B2 JP H0125046B2
Authority
JP
Japan
Prior art keywords
conical
mirror
light beam
convex surface
condenser lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56141677A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5843416A (ja
Inventor
Makoto Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP56141677A priority Critical patent/JPS5843416A/ja
Priority to US06/416,029 priority patent/US4498742A/en
Publication of JPS5843416A publication Critical patent/JPS5843416A/ja
Publication of JPH0125046B2 publication Critical patent/JPH0125046B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
JP56141677A 1981-09-10 1981-09-10 ミラ−集光型逆エキスパンドアフオ−カル照明光学系 Granted JPS5843416A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56141677A JPS5843416A (ja) 1981-09-10 1981-09-10 ミラ−集光型逆エキスパンドアフオ−カル照明光学系
US06/416,029 US4498742A (en) 1981-09-10 1982-09-08 Illumination optical arrangement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56141677A JPS5843416A (ja) 1981-09-10 1981-09-10 ミラ−集光型逆エキスパンドアフオ−カル照明光学系

Publications (2)

Publication Number Publication Date
JPS5843416A JPS5843416A (ja) 1983-03-14
JPH0125046B2 true JPH0125046B2 (fr) 1989-05-16

Family

ID=15297627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56141677A Granted JPS5843416A (ja) 1981-09-10 1981-09-10 ミラ−集光型逆エキスパンドアフオ−カル照明光学系

Country Status (1)

Country Link
JP (1) JPS5843416A (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4812957A (en) * 1985-07-23 1989-03-14 Fusion Systems Corporation Optical system for uniform illumination of a plane surface
JPS62178207A (ja) * 1986-01-31 1987-08-05 Dainippon Screen Mfg Co Ltd 照明用の光学系
US4719547A (en) * 1986-09-19 1988-01-12 Minnesota Mining And Manufacturing Company Illumination system for overhead projector
DE3851485T2 (de) * 1987-07-17 1995-01-19 Dainippon Screen Mfg Optisches System zur Erhöhung der Beleuchtungsstärke in Peripherobjektzonen.
JPH02250016A (ja) * 1989-03-23 1990-10-05 Mitsutoyo Corp 落射暗視野照明装置
JP3278896B2 (ja) * 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JP2012191148A (ja) * 2011-03-14 2012-10-04 Ricoh Co Ltd 面発光レーザモジュール、光走査装置及び画像形成装置

Also Published As

Publication number Publication date
JPS5843416A (ja) 1983-03-14

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