JPH01249692A - 分子線エピタキシー装置 - Google Patents
分子線エピタキシー装置Info
- Publication number
- JPH01249692A JPH01249692A JP63077798A JP7779888A JPH01249692A JP H01249692 A JPH01249692 A JP H01249692A JP 63077798 A JP63077798 A JP 63077798A JP 7779888 A JP7779888 A JP 7779888A JP H01249692 A JPH01249692 A JP H01249692A
- Authority
- JP
- Japan
- Prior art keywords
- group
- evaporation
- evaporation source
- sources
- growth chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001451 molecular beam epitaxy Methods 0.000 title claims description 6
- 238000001704 evaporation Methods 0.000 claims abstract description 61
- 230000008020 evaporation Effects 0.000 claims abstract description 61
- 230000012010 growth Effects 0.000 claims abstract description 41
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 229910021478 group 5 element Inorganic materials 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 9
- 230000002035 prolonged effect Effects 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000013078 crystal Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229910052785 arsenic Inorganic materials 0.000 description 3
- 241000257465 Echinoidea Species 0.000 description 2
- 240000000249 Morus alba Species 0.000 description 2
- 235000008708 Morus alba Nutrition 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 1
- 244000241257 Cucumis melo Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- 240000005979 Hordeum vulgare Species 0.000 description 1
- 235000007340 Hordeum vulgare Nutrition 0.000 description 1
- 244000269722 Thea sinensis Species 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000005082 stem growth Effects 0.000 description 1
- 229940035289 tobi Drugs 0.000 description 1
- NLVFBUXFDBBNBW-PBSUHMDJSA-N tobramycin Chemical compound N[C@@H]1C[C@H](O)[C@@H](CN)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O[C@@H]2[C@@H]([C@@H](N)[C@H](O)[C@@H](CO)O2)O)[C@H](N)C[C@@H]1N NLVFBUXFDBBNBW-PBSUHMDJSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63077798A JPH01249692A (ja) | 1988-03-30 | 1988-03-30 | 分子線エピタキシー装置 |
| DE68926577T DE68926577T2 (de) | 1988-03-30 | 1989-03-23 | Einrichtung zur Molekularstrahlepitaxie |
| EP89105248A EP0335267B1 (en) | 1988-03-30 | 1989-03-23 | Molecular beam epitaxy apparatus |
| DE68916457T DE68916457T2 (de) | 1988-03-30 | 1989-03-23 | Einrichtung zur Molekularstrahlepitaxie. |
| EP92117113A EP0529687B1 (en) | 1988-03-30 | 1989-03-23 | Molecular beam epitaxy apparatus |
| TW080105276A TW202485B (enrdf_load_stackoverflow) | 1988-03-30 | 1989-03-24 | |
| US07/329,313 US4944246A (en) | 1988-03-30 | 1989-03-27 | Molecular beam epitaxy apparatus |
| CA000594977A CA1333038C (en) | 1988-03-30 | 1989-03-29 | Molecular beam epitaxy apparatus |
| KR1019890004152A KR930010750B1 (ko) | 1988-03-30 | 1989-03-30 | 분자선 에피택시 장치 |
| CA000616594A CA1333039C (en) | 1988-03-30 | 1993-03-30 | Molecular beam epitaxy apparatus |
| KR1019930013044A KR930010751B1 (ko) | 1988-03-30 | 1993-07-09 | 분자선 에피택시 장치 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63077798A JPH01249692A (ja) | 1988-03-30 | 1988-03-30 | 分子線エピタキシー装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01249692A true JPH01249692A (ja) | 1989-10-04 |
| JPH0516399B2 JPH0516399B2 (enrdf_load_stackoverflow) | 1993-03-04 |
Family
ID=13644020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63077798A Granted JPH01249692A (ja) | 1988-03-30 | 1988-03-30 | 分子線エピタキシー装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01249692A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2323209A (en) * | 1997-03-13 | 1998-09-16 | Sharp Kk | Molecular beam epitaxy apparatus and method |
| CN116288286A (zh) * | 2020-07-08 | 2023-06-23 | 应用材料公司 | 基板处理模块及移动工件的方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111304623B (zh) * | 2020-02-24 | 2021-01-19 | 西安交通大学 | 一种超高真空进样与样品处理两用系统及处理方法 |
-
1988
- 1988-03-30 JP JP63077798A patent/JPH01249692A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2323209A (en) * | 1997-03-13 | 1998-09-16 | Sharp Kk | Molecular beam epitaxy apparatus and method |
| US6146458A (en) * | 1997-03-13 | 2000-11-14 | Sharp Kabushiki Kaisha | Molecular beam epitaxy method |
| CN116288286A (zh) * | 2020-07-08 | 2023-06-23 | 应用材料公司 | 基板处理模块及移动工件的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0516399B2 (enrdf_load_stackoverflow) | 1993-03-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |