JPH01248127A - Substrate holding device - Google Patents

Substrate holding device

Info

Publication number
JPH01248127A
JPH01248127A JP63077263A JP7726388A JPH01248127A JP H01248127 A JPH01248127 A JP H01248127A JP 63077263 A JP63077263 A JP 63077263A JP 7726388 A JP7726388 A JP 7726388A JP H01248127 A JPH01248127 A JP H01248127A
Authority
JP
Japan
Prior art keywords
substrate
transparent insulating
holding device
projection parts
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63077263A
Other languages
Japanese (ja)
Other versions
JP2591048B2 (en
Inventor
Wakao Miyazawa
和加雄 宮沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP63077263A priority Critical patent/JP2591048B2/en
Publication of JPH01248127A publication Critical patent/JPH01248127A/en
Application granted granted Critical
Publication of JP2591048B2 publication Critical patent/JP2591048B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

PURPOSE:To securely hold a transparent insulating substrate with a large diameter and to eliminate the warpage of the substrate completely by providing projection parts corresponding to holes of the outer peripheral part of the substrate. CONSTITUTION:The plural projection parts 3 corresponding to the plural holes 4 bored in the outer peripheral part of the transparent insulating substrate 2 are provided so that the transparent insulating substrate 2 is suspended vertically. In this case, the projection parts 3 are as many as or less than the holes of the substrate. The projection parts are so shaped as to only install the substrate vertically and grooves may be formed so as to secure the installation of the substrate. The substrate can be suspended vertically, so the substrate 2 does not contact any adjacent substrate and there is no adverse influence upon diffusion and oxidation. Further, even when a glass substrate is used as the substrate, it is suspended vertically, so the substrate is never warped.

Description

【発明の詳細な説明】 〔産業上の利用分野] 本発明は、液晶表示装置に用いられる透明絶縁基板(以
下基板と略記する)の保持に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to holding a transparent insulating substrate (hereinafter abbreviated as a substrate) used in a liquid crystal display device.

[発明の概要] 液晶表示装置に用いられる基板を保持する基板保持装置
において、該基板保持装置の複数個の突起部に対応する
穴を有する基板の穴に、前記基板保持装置の突起部を対
応させる事により、基板保持を可能にしたものである。
[Summary of the Invention] In a substrate holding device for holding a substrate used in a liquid crystal display device, a protrusion of the substrate holding device is adapted to correspond to a hole in a substrate having holes corresponding to a plurality of protrusions of the substrate holding device. This makes it possible to hold the substrate.

【従来の技術] 液晶表示装置においては、一方の基板に薄膜トランジス
タを形成したものを用いるアクティブマトリックス方式
と透明導電膜のパターンを付けた基板を用いる単純マト
リックス方式とがある。この様な液晶表示装置を製造す
るにあたり、薄膜形成あるいはバターニング等の工程を
繰り返し行なう必要がある。特にアクティブマトリック
ス方式に用いられる薄膜トランジスタの製作には、能動
素子となる半導体薄膜の形成、ゲート絶縁膜となる酸化
膜の形成など熱処理も多く用いられる。
[Prior Art] There are two types of liquid crystal display devices: an active matrix type in which a thin film transistor is formed on one substrate, and a simple matrix type in which a substrate is patterned with a transparent conductive film. In manufacturing such a liquid crystal display device, it is necessary to repeatedly perform processes such as thin film formation and patterning. In particular, in the production of thin film transistors used in active matrix systems, heat treatments are often used to form semiconductor thin films that will become active elements and oxide films that will become gate insulating films.

この場合の熱処理方法は、第2図の様に基板保持装置1
1上に基板12をセットし、熱処理炉内に挿入して行な
われる。
The heat treatment method in this case is as shown in FIG.
The substrate 12 is set on the substrate 1 and inserted into a heat treatment furnace.

[発明が解決しようとする課題] 前述の従来技術では、基板保持が基板下方のみで行なわ
れる為、基板12は傾き、隣接する基板と接触して拡散
や酸化に悪影響をもたらす。
[Problems to be Solved by the Invention] In the prior art described above, since the substrate is held only below the substrate, the substrate 12 is tilted and comes into contact with an adjacent substrate, which adversely affects diffusion and oxidation.

さらには、たとえば基板にガラス基板を用いる場合には
、ガラス基板の軟化点に近い状態での加工を行うと基板
に大きなソリが発生する。この場合はやはり基板の下方
のみの保持が原因である。
Furthermore, for example, when a glass substrate is used as the substrate, large warpage will occur in the substrate if processing is performed in a state close to the softening point of the glass substrate. In this case, the cause is that only the lower part of the substrate is held.

近年の液晶表示装置は表示すイズの大型化の傾向にあり
、それに伴なって使用する基板も大口径化を余儀なくな
っている。又、表示方式もアクティブマトリックス方式
が主流となってきているので、薄膜形成、熱処理工程も
増え増々基板保持が問題となってきている。
In recent years, the display size of liquid crystal display devices has tended to increase, and accordingly, the diameter of the substrates used has also become larger. In addition, as active matrix display systems have become mainstream, the number of thin film formation and heat treatment processes has increased, and substrate holding has become increasingly problematic.

本発明はこの様な問題点を解決するものであり、その目
的とするところは、大口径の基板の保持を確実に行なう
とともに、基板のソリを皆無にすることのできる基板保
持装置を提供するところにある。
The present invention is intended to solve these problems, and its purpose is to provide a substrate holding device that can reliably hold large-diameter substrates and eliminate warping of the substrate. There it is.

[課題を解決するための手段] 液晶表示装置に用いられる透明絶縁基板を保持する基板
保持装置において、前記透明絶縁基板の外周部に設けた
複数個の穴に対応する複数個の突起部を前記透明絶縁基
板を垂直に吊す様に設けた事を特徴とする。
[Means for Solving the Problems] In a substrate holding device for holding a transparent insulating substrate used in a liquid crystal display device, a plurality of protrusions corresponding to a plurality of holes provided on the outer periphery of the transparent insulating substrate are provided in the substrate holding device. It is characterized by a transparent insulating substrate that is hung vertically.

[実 施 例] 以下、本発明について、実施例に基づき詳細に説明する
[Examples] Hereinafter, the present invention will be described in detail based on Examples.

第1図は本発明の実施例を示す図である。FIG. 1 is a diagram showing an embodiment of the present invention.

複数個の穴を外周部に設けた基板2の穴4に対応する突
起部3を基板保持装置1の上方部に設け、第1図の様に
基板2を垂直に吊す様に設置する。
A protrusion 3 corresponding to the hole 4 of the substrate 2, which has a plurality of holes provided on the outer periphery, is provided on the upper part of the substrate holding device 1, and the substrate 2 is installed so as to hang vertically as shown in FIG.

この場合の突起部3の数は、基板の穴の数と同等あるい
は少なくすることもできる。又突起部の形状は、基板を
垂直に設置できる形状であれば良く、基板の設置が確実
にできる様に溝付けを行なうこともできる。
In this case, the number of protrusions 3 can be equal to or smaller than the number of holes in the substrate. Further, the shape of the protrusion may be any shape as long as the substrate can be installed vertically, and grooves may be formed to ensure the installation of the substrate.

基板保持装置lの材質としては多々あるが、−前約には
石英ガラス・炭火硅素やシリコン等が用いられる。
Although there are many materials that can be used for the substrate holding device 1, quartz glass, charcoal-fired silicon, silicon, etc. are commonly used.

基板保持装置の形状としては種々考えられるが、本発明
においては、基板保持装置の形状にこだわるものではな
く、基板を垂直に吊す構造である事が重要な点である。
Various shapes can be considered for the substrate holding device, but in the present invention, the important point is that the shape of the substrate holding device is not limited, and that it has a structure that vertically suspends the substrate.

[発明の効果] 以上述べたように、本発明は、基板を垂直に吊す事がで
きるので、基板2は隣接する基板と接触することはなく
、拡散や酸化に悪影響をおよぼさない。
[Effects of the Invention] As described above, in the present invention, since the substrate can be hung vertically, the substrate 2 does not come into contact with an adjacent substrate, and does not adversely affect diffusion or oxidation.

又ガラス基板を基板に用いた場合でも、垂直に吊るして
いるのでソリの発生が全くない。
Furthermore, even when a glass substrate is used as the substrate, there is no warping at all since it is hung vertically.

さらには、近年の液晶表示装置は表示すイズが大型化の
傾向にあり、それに伴なう基板の大型化には突起部の数
を多くするだけで容易に対処できる。この場合において
も、−本の突起部にかかる重量を考慮するだけで効果は
変わらなく設計できる。
Furthermore, in recent years, the display size of liquid crystal display devices has tended to increase, and the accompanying increase in the size of the substrate can be easily coped with simply by increasing the number of protrusions. Even in this case, the design can be made without changing the effect by simply considering the weight applied to the protrusion.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)(b)は本発明による実施例である。 第2図(a)(b)は従来例の図である。 1.11・・・基板保持装置 2.12・・・透明絶縁基板 3・・・・・・突起部 4・・・・・・基板の穴 以上 出願人 セイコーエプソン株式会社 FIGS. 1(a) and 1(b) show an embodiment according to the present invention. FIGS. 2(a) and 2(b) are diagrams of a conventional example. 1.11...Substrate holding device 2.12...Transparent insulating substrate 3...Protrusion 4・・・・・・Board hole that's all Applicant: Seiko Epson Corporation

Claims (1)

【特許請求の範囲】 1)液晶表示装置に用いられる透明絶縁基板を保持する
基板保持装置において、前記透明絶縁基板の外周部に設
けた複数個の穴に対応する複数個の突起部を具備するこ
とを特徴とする基板保持装置。 2)透明絶縁基板を垂直に吊す様に設けた複数個の突起
部を具備することを特徴とする請求項1記載の基板保持
装置。
[Claims] 1) A substrate holding device for holding a transparent insulating substrate used in a liquid crystal display device, comprising a plurality of protrusions corresponding to a plurality of holes provided on the outer periphery of the transparent insulating substrate. A substrate holding device characterized by: 2) The substrate holding device according to claim 1, further comprising a plurality of protrusions provided to hang the transparent insulating substrate vertically.
JP63077263A 1988-03-30 1988-03-30 Substrate holding device Expired - Lifetime JP2591048B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63077263A JP2591048B2 (en) 1988-03-30 1988-03-30 Substrate holding device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63077263A JP2591048B2 (en) 1988-03-30 1988-03-30 Substrate holding device

Publications (2)

Publication Number Publication Date
JPH01248127A true JPH01248127A (en) 1989-10-03
JP2591048B2 JP2591048B2 (en) 1997-03-19

Family

ID=13628957

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63077263A Expired - Lifetime JP2591048B2 (en) 1988-03-30 1988-03-30 Substrate holding device

Country Status (1)

Country Link
JP (1) JP2591048B2 (en)

Also Published As

Publication number Publication date
JP2591048B2 (en) 1997-03-19

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