JPH0124288B2 - - Google Patents

Info

Publication number
JPH0124288B2
JPH0124288B2 JP56158566A JP15856681A JPH0124288B2 JP H0124288 B2 JPH0124288 B2 JP H0124288B2 JP 56158566 A JP56158566 A JP 56158566A JP 15856681 A JP15856681 A JP 15856681A JP H0124288 B2 JPH0124288 B2 JP H0124288B2
Authority
JP
Japan
Prior art keywords
photopolymerizable
carbon atoms
alkyl chain
chain containing
organic compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56158566A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5796332A (en
Inventor
Kuraaku Burainii Gearii
Jozefu Fuyuanisu Suteiibun
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS5796332A publication Critical patent/JPS5796332A/ja
Publication of JPH0124288B2 publication Critical patent/JPH0124288B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP56158566A 1980-10-06 1981-10-05 Light copolymerizing element Granted JPS5796332A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19391980A 1980-10-06 1980-10-06

Publications (2)

Publication Number Publication Date
JPS5796332A JPS5796332A (en) 1982-06-15
JPH0124288B2 true JPH0124288B2 (Direct) 1989-05-11

Family

ID=22715565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56158566A Granted JPS5796332A (en) 1980-10-06 1981-10-05 Light copolymerizing element

Country Status (6)

Country Link
EP (1) EP0049504B1 (Direct)
JP (1) JPS5796332A (Direct)
AU (1) AU542721B2 (Direct)
BR (1) BR8106379A (Direct)
CA (1) CA1170887A (Direct)
DE (1) DE3169566D1 (Direct)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0089041B1 (en) * 1982-03-16 1987-11-25 E.I. Du Pont De Nemours And Company Use of a negative acting photopolymerizable element as a solder mask
JPS5993443A (ja) * 1982-11-19 1984-05-29 Sekisui Chem Co Ltd 感光性組成物
EP0152889B1 (de) * 1984-02-18 1987-09-16 BASF Aktiengesellschaft Lichtempfindliche Aufzeichnungsmaterialien
DE3504254A1 (de) 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE3706561A1 (de) * 1987-02-28 1988-09-08 Basf Ag Lichtempfindliches aufzeichnungsmaterial mit erhoehter flexibilitaet
JP2726072B2 (ja) * 1988-12-15 1998-03-11 ダイセル化学工業株式会社 光重合性組成物
DE3926708A1 (de) * 1989-08-12 1991-02-14 Basf Ag Photopolymerisierbares schichtuebertragungsmaterial
US12032286B2 (en) 2019-06-17 2024-07-09 Asahi Kasei Kabushiki Kaisha Method for producing multi-layered type microchannel device using photosensitive resin laminate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE639767A (Direct) * 1962-11-13
US4198236A (en) * 1974-01-21 1980-04-15 E. I. Du Pont De Nemours And Company Method for preparation of lithographic printing plate having addition polymerized areas and binder areas
JPS51149021A (en) * 1974-12-28 1976-12-21 Fuji Yakuhin Kogyo Kk Water soluble photosensitive resin composition
DE2822191A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
US4245030A (en) * 1979-05-23 1981-01-13 Hoechst Aktiengesellschaft Photopolymerizable mixture containing improved plasticizer

Also Published As

Publication number Publication date
CA1170887A (en) 1984-07-17
AU7602881A (en) 1982-04-22
EP0049504A1 (en) 1982-04-14
AU542721B2 (en) 1985-03-07
JPS5796332A (en) 1982-06-15
DE3169566D1 (de) 1985-05-02
EP0049504B1 (en) 1985-03-27
BR8106379A (pt) 1982-06-22

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