JPH01240646A - 大量蒸着用ｈｃｄ法イオンプレーティング装置 - Google Patents

大量蒸着用ｈｃｄ法イオンプレーティング装置

Info

Publication number
JPH01240646A
JPH01240646A JP6370788A JP6370788A JPH01240646A JP H01240646 A JPH01240646 A JP H01240646A JP 6370788 A JP6370788 A JP 6370788A JP 6370788 A JP6370788 A JP 6370788A JP H01240646 A JPH01240646 A JP H01240646A
Authority
JP
Japan
Prior art keywords
hollow cathode
ionization
ion plating
reactant gas
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6370788A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0477074B2 (show.php
Inventor
Masao Iguchi
征夫 井口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Ulvac Inc
Original Assignee
Ulvac Inc
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Kawasaki Steel Corp filed Critical Ulvac Inc
Priority to JP6370788A priority Critical patent/JPH01240646A/ja
Publication of JPH01240646A publication Critical patent/JPH01240646A/ja
Publication of JPH0477074B2 publication Critical patent/JPH0477074B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP6370788A 1988-03-18 1988-03-18 大量蒸着用ｈｃｄ法イオンプレーティング装置 Granted JPH01240646A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6370788A JPH01240646A (ja) 1988-03-18 1988-03-18 大量蒸着用ｈｃｄ法イオンプレーティング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6370788A JPH01240646A (ja) 1988-03-18 1988-03-18 大量蒸着用ｈｃｄ法イオンプレーティング装置

Publications (2)

Publication Number Publication Date
JPH01240646A true JPH01240646A (ja) 1989-09-26
JPH0477074B2 JPH0477074B2 (show.php) 1992-12-07

Family

ID=13237116

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6370788A Granted JPH01240646A (ja) 1988-03-18 1988-03-18 大量蒸着用ｈｃｄ法イオンプレーティング装置

Country Status (1)

Country Link
JP (1) JPH01240646A (show.php)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0750056A1 (en) * 1995-06-19 1996-12-27 GALILEO VACUUM TEC S.p.A. Continuous vacuum evaporation system
EP1334778A2 (en) 2002-02-08 2003-08-13 Fuji Photo Film Co., Ltd. Rod for a coating device, and process for producing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0750056A1 (en) * 1995-06-19 1996-12-27 GALILEO VACUUM TEC S.p.A. Continuous vacuum evaporation system
EP1334778A2 (en) 2002-02-08 2003-08-13 Fuji Photo Film Co., Ltd. Rod for a coating device, and process for producing the same

Also Published As

Publication number Publication date
JPH0477074B2 (show.php) 1992-12-07

Similar Documents

Publication Publication Date Title
US4197175A (en) Method and apparatus for evaporating materials in a vacuum coating plant
US4419202A (en) Metal coatings
JPH05214522A (ja) スパッタリング方法及び装置
US5227203A (en) Ion-plating method and apparatus therefor
EP0511153A1 (en) Plasma enhancement apparatus and method for physical vapor deposition
JPH02285072A (ja) 加工物表面のコーティング方法及びその加工物
CN106119780A (zh) 一种涂布系统
JP2009543951A (ja) 電気絶縁皮膜の堆積方法
JPS61201769A (ja) 酸化物、窒化物、酸化窒化物および炭化物からなる層の反応的蒸着法
JPH0372067A (ja) 複数の蒸発ルツボを備えたアーク放電型蒸発器
US5976636A (en) Magnetic apparatus for arc ion plating
US20140034484A1 (en) Device for the elimination of liquid droplets from a cathodic arc plasma source
JPH06212433A (ja) 真空室内で基板を被覆する装置及び方法
JPH09176840A (ja) 真空被覆装置
KR20010021341A (ko) 아크형 이온 플레이팅 장치
JPH0477074B2 (show.php)
JPS60251269A (ja) イオンプレ−テイング方法および装置
JPH09165674A (ja) 真空被覆装置
JP2898652B2 (ja) イオンプレーティング用蒸発装置
JPH0646456B2 (ja) 磁気記録媒体製造装置
JP2003253440A (ja) 熱電子プラズマ発生装置
JPH06306588A (ja) 成膜装置及びそれを用いた複数の物質からなる 膜の製造方法
JP2667309B2 (ja) Ｈｃｄイオンプレーティングによる耐摩耗性被膜形成法
JPH01246360A (ja) イオンプレーティング装置
KR20180054176A (ko) 다층박막 코팅 장치

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees