JPH01239859A - Method of mounting semiconductor element - Google Patents

Method of mounting semiconductor element

Info

Publication number
JPH01239859A
JPH01239859A JP6615688A JP6615688A JPH01239859A JP H01239859 A JPH01239859 A JP H01239859A JP 6615688 A JP6615688 A JP 6615688A JP 6615688 A JP6615688 A JP 6615688A JP H01239859 A JPH01239859 A JP H01239859A
Authority
JP
Japan
Prior art keywords
semiconductor element
wiring pattern
hole
substrate
observing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6615688A
Other languages
Japanese (ja)
Inventor
Shigenari Takami
茂成 高見
Jiro Hashizume
二郎 橋爪
Tatsuhiko Irie
達彦 入江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP6615688A priority Critical patent/JPH01239859A/en
Publication of JPH01239859A publication Critical patent/JPH01239859A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15312Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a pin array, e.g. PGA

Landscapes

  • Structure Of Printed Boards (AREA)
  • Wire Bonding (AREA)

Abstract

PURPOSE:To improve alignment accuracy, to improve alignment work, and to confirm the alignment accuracy after adhering by aligning a semiconductor element while observing one or both of a wiring pattern and a boundary of layers via a through hole opened in advance in a mounting board. CONSTITUTION:In order to couple a semiconductor element 1 to a mounting board 2 through a salient electrode 4, a through hole 5 capable of observing the wiring pattern of the element 1 and/or a layer of the element 1 through a boundary is formed in advance at the board 2, and the element 1 is aligned while observing at least one of the wiring pattern of the element 1 and the boundary of the layer via the through hole 5. For example, the element 1 is held at a bonding head 6, and the wiring pattern of the face of the element 1 to be coupled is observed via the hole 5 by a TV camera 7. An image observed by the camera 7 is transmitted to a pattern recognition unit 8 to be displayed on a TV monitor 9, while the head 6 is operated in cooperation with the unit 8.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、半導体素子を実装用基板に実装する方法に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for mounting a semiconductor element on a mounting substrate.

〔従来の技術〕[Conventional technology]

従来、半導体素子を実装用基板に実装するには、たとえ
ば、半導体素子または基板上に設けられた突起電極(バ
ンブとも言う)により、半導体素子の電極を基板上の電
極に一括して一度に接合する、いわゆる、ギヤングボン
ディングにより行っている。
Conventionally, in order to mount a semiconductor element on a mounting substrate, for example, the electrodes of the semiconductor element are bonded all at once to the electrodes on the substrate using protruding electrodes (also called bumps) provided on the semiconductor element or the substrate. This is done by so-called Guyang bonding.

ギヤングボンディングでは、半導体素子と基板の位置合
わせ精度が、たとえば、10μm以下であることが要求
されている。このような位置合わせ精度を実現するため
に、半導体素子の電極位置と基板側の電極位置とを別々
のカメラなどでパターン認識し、演算した上で、位置決
めを行っている。
In gigantic bonding, the alignment accuracy between a semiconductor element and a substrate is required to be, for example, 10 μm or less. In order to achieve such alignment accuracy, positioning is performed after pattern recognition is performed on the electrode positions of the semiconductor element and the electrode positions on the substrate side using separate cameras, etc., and calculations are performed.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

このように位置決めする際には、パターン認識の後、カ
メラを移動させるか、あるいは、カメラ上にある半導体
素子を一定量移動させ、基板上にセットするかしなけれ
ばならない。いずれにしても、カメラを通して電極位置
を見ながら移動させるのではなく、パターン認識後の演
算処理のみによって移動させるため、位置合わせ精度に
悪影響を及ぼすという問題点がある。
When positioning in this way, after pattern recognition, the camera must be moved, or the semiconductor element on the camera must be moved by a certain amount and set on the substrate. In any case, since the electrode position is not moved while observing the electrode position through a camera, but is moved only by calculation processing after pattern recognition, there is a problem that alignment accuracy is adversely affected.

また、このように位置合わせして接合した半導体素子が
、実際に正しく位置合わせされているか否かを確認する
必要がある。半導体素子側に突起電極が設けられている
場合には、X線透視によりその確認ができる。しかし、
基板側に突起電極を設けた場合には、半導体素子の電極
が通常、AI電極であるため、X線が透過してしまい、
位置合わせの確認は不可能であった。
Furthermore, it is necessary to confirm whether the semiconductor elements that have been aligned and bonded in this manner are actually aligned correctly. If a protruding electrode is provided on the semiconductor element side, this can be confirmed by X-ray fluoroscopy. but,
When a protruding electrode is provided on the substrate side, the electrode of the semiconductor element is usually an AI electrode, so X-rays pass through it.
It was not possible to confirm alignment.

そこで、この発明は、位置合わせ精度を向上させ、位置
合わせ作業を改善し、接合した後に位置合わせ精度を確
認することができる半導体素子実装方法を提供すること
を課題とする。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a semiconductor element mounting method that can improve alignment accuracy, improve alignment work, and confirm alignment accuracy after bonding.

〔課題を解決するための手段〕[Means to solve the problem]

この発明は、上記課題を解決するため、半導体素子の配
線パターン、および/または、同半導体素子における層
の境界を透かして観察できる貫通孔を実装用基板にあら
かじめ開けておき、貫通孔を通して配線パターンおよび
層の境界のうちいずれか一方または両方を観察しながら
半導体素子の位置合わせを行うようにしている。
In order to solve the above-mentioned problems, this invention pre-drills a through-hole in a mounting substrate through which the wiring pattern of a semiconductor element and/or the layer boundary of the semiconductor element can be observed, and allows the wiring pattern to be formed through the through-hole. The semiconductor element is aligned while observing one or both of the layer boundaries and the layer boundaries.

〔作   用〕[For production]

実装しようとする半導体素子の配線パターンおよび/ま
たは層の境界が貫通孔を通して見えるので、この配線パ
ターンおよび/または層の境界が正しい位置に合うよう
に、半導体素子のずれを補正することにより、容易に精
度良く位置合わせができる。しかも、接合後の位置の確
認も、その貫通孔を通して容易に行うことができる。
Since the wiring pattern and/or layer boundaries of the semiconductor element to be mounted can be seen through the through-hole, it is easy to correct the misalignment of the semiconductor element so that the wiring pattern and/or layer boundary is in the correct position. Positioning can be performed with high precision. Moreover, the position after joining can be easily confirmed through the through hole.

〔実 施 例〕〔Example〕

第1図および第2図は、この発明にかかる半導体素子実
装方法の1実施例の実施状態を表す。ここでは、半導体
素子1としてICを、これを実装する基板2としてピン
グリッドアレイ (PGA)用基板を、それぞれ用いて
いる。基板2上に形成された実装回路3・・・の中央側
先端部上に突起電極4・・・が設けられている。そして
、基板2の実装回路3・・・の中央側先端部で囲まれた
部分には、基板2を貫通する貫通孔5があけられている
。突起電極4・・・とその内側の部分が実装部である。
FIG. 1 and FIG. 2 show the state of implementation of one embodiment of the semiconductor element mounting method according to the present invention. Here, an IC is used as the semiconductor element 1, and a pin grid array (PGA) substrate is used as the substrate 2 on which it is mounted. Protruding electrodes 4 are provided on the central tips of mounted circuits 3 formed on the substrate 2. A through hole 5 penetrating the substrate 2 is formed in a portion of the substrate 2 surrounded by the central end portions of the mounted circuits 3 . The protruding electrodes 4 and their inner parts are the mounting portion.

半導体素子1を接合面の裏面側からボンディングヘッド
6に保持させ、半導体素子1の接合面を基板2の実装部
に向ける。半導体素子1のこの接合面には、配線パター
ンおよび電極が形成されている。貫通孔5を通して半導
体素子1の接合面の配線パターンを観察する。この観察
は、たとえば、基板2の貫通孔5の、半導体素子1とは
反対側に配置されたTVカメラ7で行う。TVカメラ7
でとらえた映像は、パターン認識装置8に送られ、この
装置8に接続されているTVモニター9に映しだされる
ようになっている。
The semiconductor element 1 is held by the bonding head 6 from the back side of the bonding surface, and the bonding surface of the semiconductor element 1 is directed toward the mounting portion of the substrate 2. A wiring pattern and electrodes are formed on this bonding surface of the semiconductor element 1. The wiring pattern on the bonding surface of the semiconductor element 1 is observed through the through hole 5. This observation is performed, for example, with a TV camera 7 placed on the side of the through hole 5 of the substrate 2 opposite to the semiconductor element 1. TV camera 7
The captured image is sent to a pattern recognition device 8 and displayed on a TV monitor 9 connected to this device 8.

他方、ボンディングヘッド6がパターン認識装置8と連
動して動作するようになっている。TVカメラ7で貫通
孔5を通して観察した半導体素子1の配線パターンは、
正確な実装状態での半導体素子の配線パターンと常に同
じでなければならない。同じでないときには、貫通孔5
を通して観察しながら、両パターンが一致するように、
ポンディングヘッド6を動かし、半導体素子1の位置を
合わせる。この移動は、不一致の状況に応じて、平行移
動、回動など種々である。
On the other hand, the bonding head 6 operates in conjunction with the pattern recognition device 8. The wiring pattern of the semiconductor element 1 observed through the through hole 5 with the TV camera 7 is as follows.
The wiring pattern of the semiconductor element must always be the same as the exact mounting state. If they are not the same, the through hole 5
While observing through, make sure that both patterns match.
The pounding head 6 is moved to align the semiconductor element 1. This movement may be various, such as parallel movement or rotation, depending on the mismatch situation.

つぎに位置合わせの1例をより具体的に説明する。第3
図(a)にみるように、基板2表面上の突起電極4・・
・を、基板2の裏面側から透視した状態でTVモニター
9の画面9aに表示する。さらに、第3図(b)にみる
ように、この突起電極4・・・に、半導体素子1の電極
を正しく接合したときの半導体素子1の配線パターン(
第3図+bl中、細線で示す)20を重ね合わせて表示
し、位置合わせの基準とする。この配線パターン20は
、同じ配線パターンを有する半導体素子を複数個(多数
個をも含む)実装する場合でも、1回認識しておくだけ
でよい。
Next, one example of alignment will be explained in more detail. Third
As shown in figure (a), protruding electrodes 4 on the surface of the substrate 2...
is displayed on the screen 9a of the TV monitor 9 as viewed from the back side of the board 2. Furthermore, as shown in FIG. 3(b), the wiring pattern (
20 (indicated by a thin line in FIG. 3+bl) are displayed in an overlapping manner and used as a reference for positioning. This wiring pattern 20 only needs to be recognized once even when a plurality (including a large number) of semiconductor elements having the same wiring pattern are mounted.

実装しようとする半導体素子1の配線パターン(第3図
(C)中、貫通孔5の内側に太線で示す)10を貫通孔
5を通してTVカメラ7で撮って観察し、第3図(C)
にみるように、そのTVモニター9に映す。この図では
、基準の配線パターン20と、実装しようとする半導体
素子1の配線パターン10とがずれている。第3図(d
lにみるように、TVカメラ7で撮られている配線パタ
ーン10が、TVモニターの画面9a中で前記基準の配
線パターン20にぴったり一致するようボンディングヘ
ッド6を移動させ、半導体素子1の位置のずれを補正す
る。そして、両パターン10.20がぴったり一致した
状態でボンディングヘッド6をおろし、半導体素子1と
基板2との接合を行う。
The wiring pattern (indicated by thick lines inside the through hole 5 in FIG. 3(C)) of the semiconductor element 1 to be mounted is photographed and observed with the TV camera 7 through the through hole 5.
It will be displayed on the TV monitor 9 as you can see. In this figure, the reference wiring pattern 20 and the wiring pattern 10 of the semiconductor element 1 to be mounted are misaligned. Figure 3 (d
As shown in FIG. 1, the bonding head 6 is moved so that the wiring pattern 10 photographed by the TV camera 7 exactly matches the reference wiring pattern 20 on the screen 9a of the TV monitor, and the position of the semiconductor element 1 is adjusted. Correct the deviation. Then, the bonding head 6 is lowered with both patterns 10 and 20 exactly aligned, and the semiconductor element 1 and the substrate 2 are bonded.

位置合わせ、および/または、接合は、TVモニター9
を見ながら手動で行うようにしてもよいが、視覚化する
ことなく、コンピュータ制御により自動的に行うように
してもよく、特にやり方に限定はない。
The alignment and/or bonding is done on the TV monitor 9.
This may be done manually while looking at the image, or it may be done automatically under computer control without visualization, and there are no particular limitations on the method.

上記のように、あらかじめ正しい接合位置の半導体素子
の配線パターンを認識、記憶させておき、貫通孔を通し
て観察している半導体素子の配線パターンの、記憶させ
た配線パターンとの位置ずれを補正すれば、位置合わせ
が容易に行えるのである。仮に、貫通孔を設ける位置が
基板ごとにずれていても、貫通孔を通して見える半導体
素子の配線パターンが基板ごとに異なるだけであり、位
置合わせに支障をきたさない。
As mentioned above, if the wiring pattern of the semiconductor element at the correct bonding position is recognized and memorized in advance, and the positional deviation between the wiring pattern of the semiconductor element observed through the through hole and the memorized wiring pattern is corrected. , alignment can be easily performed. Even if the positions where the through holes are provided are shifted from one substrate to another, the only difference is that the wiring pattern of the semiconductor element visible through the through holes differs from substrate to substrate, and alignment will not be hindered.

接合した後も、貫通孔5を通して半導体素子lの配線パ
ターンが見えるので、仮に半導体素子側に突起電極を設
けていなくても、容易に位置合わせを確認できる。基板
側に突起電極を設けていなくても、位置合わせは容易に
確認できる。
Even after bonding, the wiring pattern of the semiconductor element 1 can be seen through the through hole 5, so even if no protruding electrodes are provided on the semiconductor element side, alignment can be easily confirmed. Even if no protruding electrodes are provided on the substrate side, alignment can be easily confirmed.

試作工程等で高価な設備投資が行えない場合には、たと
えば、第4図に示すようにして位置合わせを行う。実装
しようとする半導体素子1を製造するのに用いたガラス
マスク11を準備する。このガラスマスク11の配線パ
ターンが、正しい接合位置にセットされたときの半導体
素子上の配線パターンと一致するように、たとえば、ガ
ラスマスク11の配線パターンの電極を、接合しようと
する基板2の電極に合わせ、ガラスマスク11をセット
して固定させる。つぎに、基板2の貫通孔5を通して、
実装しようとする半導体素子1の配線パターンを顕微鏡
またはTVカメラ17等で見ながら、このマスク11の
パターンと半導体素子1の配線パターンとが一致するよ
うに、半導体素子1および基板2のそれぞれの位置合わ
せを行えば、安価に位置合わせができる。
If expensive equipment investment cannot be made in the trial manufacturing process, positioning is performed as shown in FIG. 4, for example. A glass mask 11 used to manufacture the semiconductor element 1 to be mounted is prepared. For example, the electrodes of the wiring pattern of the glass mask 11 are connected to the electrodes of the substrate 2 to be bonded so that the wiring pattern of the glass mask 11 matches the wiring pattern on the semiconductor element when set at the correct bonding position. The glass mask 11 is set and fixed accordingly. Next, through the through hole 5 of the substrate 2,
While viewing the wiring pattern of the semiconductor element 1 to be mounted with a microscope or TV camera 17, etc., position the semiconductor element 1 and the substrate 2 so that the pattern of the mask 11 matches the wiring pattern of the semiconductor element 1. If alignment is performed, alignment can be done at low cost.

なお、この発明は、上記実施例に限定されない。図示し
た基板は突起電極付きのPGA用基板基板ったが、この
発明に用いる実装用基板はこれに限定するものではなく
、ギヤングボンディングなど突起電極を介して接合を行
う半導体素子実装用基板ならばどのようなものでもよい
。実装する半導体素子は、ICに限定されない。また、
半導体素子の配線パターンを観察するために基板に開け
る貫通孔の形状も円形に限定するものではない。
Note that this invention is not limited to the above embodiments. Although the illustrated substrate is a PGA substrate with protruding electrodes, the mounting substrate used in the present invention is not limited to this, and may be any substrate for mounting semiconductor elements that performs bonding via the protruding electrodes such as gigantic bonding. It can be anything like that. The semiconductor element to be mounted is not limited to an IC. Also,
The shape of the through hole formed in the substrate for observing the wiring pattern of the semiconductor element is not limited to a circular shape either.

その孔の数も1つに限らず、2以上であってもよい。正
しい位置の半導体素子の配線パターンを認識するために
、上記実施例では基板上の突起電極をX線などで透視す
るようにしていたが、基板上の実装回路を透視したり、
その他の方法によって行ったりするようにしてもよい。
The number of holes is not limited to one, but may be two or more. In order to recognize the wiring pattern of the semiconductor element in the correct position, in the above embodiment, the protruding electrodes on the board were seen through with an X-ray, but it is also possible to see through the mounted circuit on the board.
It may also be done by other methods.

また、基板の貫通孔を通して見える正しい位置の半導体
素子の配線パターンは、基板上の電極または突起電極に
対する貫通孔の位置を計測することにより、TV画面上
などで明確にすることもできる。突起電極は、上記実施
例では基板側だけに設けていたが、半導体素子側だけに
設けたり、両方に設けたりしてもよい。実装用基板に、
スルーホールや端子ピン等を必ずしも設ける必要はない
Furthermore, the wiring pattern of the semiconductor element at the correct position visible through the through-hole of the substrate can also be made clear on a TV screen or the like by measuring the position of the through-hole with respect to the electrode or protruding electrode on the substrate. Although the protruding electrodes were provided only on the substrate side in the above embodiments, they may be provided only on the semiconductor element side or on both sides. On the mounting board,
It is not necessarily necessary to provide through holes, terminal pins, etc.

第3図(b)〜(d)で示している配線パターン10゜
20はそれぞれ実際のものを忠実に表すものではなく、
図示の都合で簡略化、模式化して表している。
The wiring patterns 10°20 shown in FIGS. 3(b) to 3(d) do not faithfully represent the actual wiring patterns;
The figures are simplified and schematically shown for convenience of illustration.

以上では、基板の貫通孔から半導体素子の配線パターン
を見るようにしていた。しかし、光のあて方によっては
、貫通孔を通して、半導体素子における層の境界も見え
るので、この層の境界を利用して上記配線パターンを見
る場合と同様に位置合わせすることができる。また、層
の境界と配線パターンの両方を見ながら位置合わせして
もよい。なお、半導体素子における層の境界とは、たと
えば、PN接合の境界、N層同士の境界、P層同士の境
界などであり、特に限定はない。
In the above description, the wiring pattern of the semiconductor element is viewed through the through hole of the substrate. However, depending on the way the light is applied, the layer boundaries in the semiconductor element can also be seen through the through-holes, so alignment can be performed using these layer boundaries in the same way as when viewing the wiring pattern. Alternatively, alignment may be performed while looking at both layer boundaries and wiring patterns. Note that the layer boundaries in a semiconductor element include, for example, a PN junction boundary, a boundary between N layers, a boundary between P layers, etc., and is not particularly limited.

半導体素子を実装した後は、たとえば、通常の樹脂封止
の方法により、半導体素子を上面からだけでなく、基板
の貫通孔側からも樹脂を注入すれば、半導体素子を封止
できる。半導体素子の封止は、これ以外の方法により行
ってもよい。
After the semiconductor element is mounted, the semiconductor element can be sealed by injecting resin not only from the top surface of the semiconductor element but also from the through-hole side of the substrate using a normal resin sealing method, for example. The semiconductor element may be sealed by other methods.

〔発明の効果〕〔Effect of the invention〕

この発明にかかる半導体素子実装方法は、以上のように
、貫通孔を通して半導体素子の配線パターンおよび/ま
たは層の境界を観察しながら同半導体素子の位置合わせ
を行うので、位置合わせ精度が向上し、位置合わせ作業
を改善することができる。そして、半導体素子を接合し
た後に、貫通、孔を通して位置合わせ精度を確認するこ
とができる。
As described above, in the semiconductor device mounting method according to the present invention, since the semiconductor device is aligned while observing the wiring pattern and/or layer boundaries of the semiconductor device through the through hole, the alignment accuracy is improved. The alignment work can be improved. After bonding the semiconductor elements, alignment accuracy can be checked through the through holes.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明にかかる半導体素子実装方法の1実施
状態を表す一部断面概略図、第2図はその一部の斜視図
、第3図fa)〜(d)は位置合わせの1例を順番に示
す説明図、第4図は別の1実施状態を表す一部断面概略
図である。 1・・・半導体素子 2・・・実装用基板 4・・・突
起電極 5・・・貫通孔 10・・・半導体素子の配線
バク−代理人 弁理士  松 本 武 彦
Fig. 1 is a partial cross-sectional schematic diagram showing one implementation state of the semiconductor element mounting method according to the present invention, Fig. 2 is a perspective view of a part thereof, and Fig. 3 fa) to (d) are examples of alignment. FIG. 4 is a partially cross-sectional schematic diagram showing another implementation state. 1... Semiconductor element 2... Mounting board 4... Protruding electrode 5... Through hole 10... Wiring back of semiconductor element - Agent Patent attorney Takehiko Matsumoto

Claims (1)

【特許請求の範囲】[Claims] 1 突起電極を介して半導体素子を実装用基板に接合す
るにあたり、前記実装用基板に、前記半導体素子の配線
パターン、および/または、同半導体素子における層の
境界を透かして観察できる貫通孔をあらかじめ設けてお
き、同貫通孔を通して前記半導体素子の配線パターンお
よび層の境界の少なくとも一方を観察しながら同半導体
素子の位置合わせを行うことを特徴とする半導体素子実
装方法。
1. When bonding a semiconductor element to a mounting substrate via a protruding electrode, a through hole is formed in the mounting substrate in advance through which the wiring pattern of the semiconductor element and/or the layer boundary of the semiconductor element can be observed. 1. A method for mounting a semiconductor device, wherein the semiconductor device is aligned while observing at least one of a wiring pattern and a layer boundary of the semiconductor device through the through-hole.
JP6615688A 1988-03-19 1988-03-19 Method of mounting semiconductor element Pending JPH01239859A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6615688A JPH01239859A (en) 1988-03-19 1988-03-19 Method of mounting semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6615688A JPH01239859A (en) 1988-03-19 1988-03-19 Method of mounting semiconductor element

Publications (1)

Publication Number Publication Date
JPH01239859A true JPH01239859A (en) 1989-09-25

Family

ID=13307718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6615688A Pending JPH01239859A (en) 1988-03-19 1988-03-19 Method of mounting semiconductor element

Country Status (1)

Country Link
JP (1) JPH01239859A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8237753B2 (en) 2007-12-20 2012-08-07 Sharp Kabushiki Kaisha Display device with gradation conversion, and method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8237753B2 (en) 2007-12-20 2012-08-07 Sharp Kabushiki Kaisha Display device with gradation conversion, and method thereof

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