JPH01232721A - Electron beam exposing device - Google Patents

Abstract

PURPOSE:To contrive improvement in the throughput of the title exposing device by a method wherein an exposure chamber, a holder-exchanging chamber and a load- locking chamber are arranged separately on different vibration-insulating stands, the exposure chamber and the holder-exchanging chamber are coupled using a vibration-insulating bellows, and a cylinder with which the compression of the bellows by the atmospheric air is compensated, is provided. CONSTITUTION:A main chamber 11 is arranged on a vibration-insulating stand 31, a holder-changing chamber 12 and a sub-chamber 13 are supported by the pedestal 32 which is provided independent of the vibration-insulating stand 31. Besides, as the main chamber 12 and the holder-changing chamber 12 are coupled with a bellows 33, a fluid cylinder 34 and vibration-insulating rubber 35, an exposing part and a conveying part are vibrationally isolated. To be more precise, the vibrations generated when the holder 16 is conveyed by a robot arm 17, an elevator mechanism 18, or the vibration generated by the opening or closing of the first and the second gate valves 19 and 20, and a vacuum valve 21 are prevented from transmission to the side of the main chamber 11. Accordingly, it is unnecessary to discontinue the exposing operation, time is not wasted, and the throughput of the title exposing device can be improved.

Description

[Detailed Description of the Invention] [Summary] The electron beam exposure apparatus has been improved to prevent vibrations during exposure, and the present invention has been developed to prevent vibrations during opening and closing of vacuum valves, transporting holders, etc. without being affected by vibrations. The aim is to provide an electron beam exposure system that can continue exposure and improve throughput, and has an exposure chamber that performs exposure using an electron beam, a holder exchange chamber that exchanges holders, and a switch between vacuum and atmosphere. In an electron beam exposure apparatus equipped with a load-lock chamber, the exposure chamber, the holder exchange chamber, and the load-lock chamber are arranged on separate vibration-isolating tables, and the exposure chamber and the holder exchange chamber are vibration-insulated. The present invention includes an electron beam exposure apparatus characterized in that the cylinder is connected by a vertical bellows and is provided with a cylinder that compensates for compression of the bellows by the atmosphere.

[Industrial application field]

The present invention relates to an electron beam exposure apparatus improved to prevent vibration during exposure.

[Conventional technology]

2. Description of the Related Art Conventionally, as semiconductor devices become more highly integrated, electron beam exposure apparatuses have been used to form fine patterns.

FIG. 5 is a block diagram of a conventional electron beam exposure apparatus. In the figure, the electron beam exposure apparatus includes an exposure chamber (main chamber) 11 equipped with an electron optical system, and an exchange chamber (holder changer chamber) 12 in which holders to which wafer substrates, masks, etc. are fixed are exchanged in vacuum. A vacuum load lock chamber (subchamber) 13 for switching between atmosphere and vacuum when loading and unloading the holder is integrally constructed, and these are arranged on a vibration isolating table 14. An XY stage 15 is provided in the main chamber 11, and a holder 16 to which a wafer substrate, a mask, etc. is fixed is placed on the XY stage 15. Further, the holder changer chamber 12 is equipped with a robot arm 17 and an elevator mechanism 18, so that exposed holders 16 and unexposed holders 16 can be exchanged in a vacuum. A first gate valve 19 and a second gate valve 20 are provided at the connection portion between the holder changer chamber 12 and the vacuum load lock chamber 13 and at the entrance portion of the holder changer chamber 12 in order to switch between the vacuum and the atmosphere, respectively. It is being Further, the holder changer chamber 12 is connected to a vacuum evacuation device (not shown) via a vacuum valve 21.

In such an electron beam exposure apparatus, the holder 16 exposed in the main chamber 11 is transported from the XY stage 15 on a track or the like to the robot arm 17 in the holder changer chamber 12, and then moved to the elevator mechanism 1.
8, it is replaced with the unexposed holder 16. This unexposed holder 16 is transported on a track or the like and placed on an XY stage 15.
placed on top. On the other hand, the exposed holder 16 is transported into the vacuum load lock chamber 13 with the first gate valve 19 opened, and after closing the first gate valve 19, the second gate valve 20 is opened and the exposed holder 16 is transported into the vacuum load lock chamber 13. is released and taken out to the outside. After the new unexposed holder 16 is transported into the vacuum load lock chamber 13 by a container or the like, the second gate valve 20 is closed and the vacuum valve 21 is opened to perform evacuation. By repeating the above operations,
Exposure is performed continuously.

[Problem to be solved by the invention]

However, in the conventional electron beam exposure apparatus, as the pattern becomes finer, the main chamber 11, holder changer chamber 12, and subchamber 13 are integrally constructed on the vibration isolating table 14. After being transported onto the XY stage 15, when the exposed holder 16 is transported to the subchamber 13, when the first and second gate valves 19 and 20 are opened and closed, and when the vacuum valve 21 is operated when evacuation is performed or released. There is a problem in that vibrations and the like are transmitted to the main chamber 11, which adversely affects exposure. To deal with this, conventional vibration isolation measures have been applied to various parts, but this is not always sufficient, and in particular, discontinuous vibrations such as those caused by impacts cannot be tracked by the feedbank. Therefore, for example, when the motor moves to convey the holder 16, the valve 19.20
．． Exposure is temporarily stopped when the 21 is opened or closed, resulting in wasted time and affecting the throughput.

The present invention was created in view of the above-mentioned circumstances, and is designed to provide an electron beam that is not affected by vibrations even when opening/closing a vacuum valve or transporting a holder. The purpose is to provide an exposure device.

[Failure to solve the problem]

In an electron beam exposure apparatus equipped with an exposure chamber for performing exposure with an electron beam, a holder exchange chamber for exchanging holders, and a load lock chamber for switching between vacuum and atmosphere, the exposure chamber, the holder exchange chamber, and the load lock chamber are provided. The feature is that the lock chamber is placed on a separate vibration-isolating table, the exposure chamber and the holder exchange chamber are connected by a vibration-insulating bellows, and a cylinder is provided to compensate for the compression of the bellows by the atmosphere. This problem can be solved by using an electron beam exposure system.

[Function] That is, in the present invention, the exposure chamber, the holder exchange chamber, and the load lock chamber are arranged on separate vibration-proof tables, and the exposure chamber and the holder exchange chamber are separated by a vibration-insulating bellows. Due to the provision of a cylinder which is connected and compensates for the compression of the bellows by the atmosphere, the exposure section and the holder transport section are vibrationally separated. Therefore, even when opening/closing the vacuum valve provided on the holder transporting section side and transporting the holder, the exposure is affected by vibrations, and exposure can be continued, eliminating wasted time and improving throughput.

〔Example〕

Hereinafter, the present invention will be specifically explained with reference to an illustrated embodiment. In this embodiment, parts corresponding to those in FIG. 5 are denoted by the same reference numerals.

FIG. 1 is a block diagram of an electron beam exposure apparatus according to an embodiment of the present invention. As shown in the figure, a main chamber 11 equipped with an electron optical system similar to the conventional example is placed on a vibration isolation table 31. Inside this main chamber ti,
An XY stage 15 is provided, and a holder 16 on which a wafer substrate, a mask, etc. is fixed is mounted on the XY stage 15.
is placed. The holder changer chamber 12 for exchanging the holder 16 and the subchamber 13 for switching between atmosphere and vacuum are supported on a pedestal (vibration isolator) 32 provided independently of the vibration isolator 31. has been done. A robot arm 17 and an elevator mechanism 18 are provided in the holder changer chamber 12, and the exposed holder 16 and the unexposed holder 16 are exchanged in a vacuum. Holder changer chamber 12
A first gate valve 19 and a second gate valve 19 are installed at the connection between the vacuum load lock chamber 13 and the inlet of the holder changer chamber 12 to switch between the vacuum and the atmosphere, respectively.
A gate valve 20 is provided. Further, the holder changer chamber 12 is connected to a vacuum evacuation device (not shown) via a vacuum valve 21. And, between the main chamber 11 and the holder changer chamber 12,
The main chamber 11 and the holder changer chamber 12 are connected by a bellows 33 with a low spring constant so as not to transmit vibrations, and the distance between the main chamber 11 and the holder changer chamber 12 is kept constant in order to prevent the bellows 33 from being compressed by the vacuum. A fluid cylinder 34 is disposed with a vibration isolating rubber 35 interposed therebetween.

FIG. 2 is a detailed configuration diagram of the holder changer chamber 12 shown in FIG. 1. As shown in FIG. Further, the elevator mechanism 18 moves the holder 16 up and down to the pt and P2 positions, as shown in FIG. 2, and performs the exchange operation.

Figure 3 is a detailed configuration diagram of the XY stage 15 part in Figure 1;
FIG. 4 is a plan view of the XY stage 15 portion of FIG. 3. As shown in these figures, the XY stage 15 is provided with a pin 37 that is biased upwardly by a spring 36 and a pin 39 that is biased diagonally horizontally by a spring 38 for positioning the holder 16. There is. Furthermore, a plurality of L-shaped stoppers 40 are provided at the top of the XY stage 15, with which the holder 16 comes into contact. That is,
The holder 16 is urged upward by the pin 37 and the stopper 3
6, vertical positioning is performed, and the pin 39
is biased in the diagonal horizontal direction and comes into contact with the stopper 36, thereby performing positioning in the XY (horizontal) direction.

The replacement operation of the electron beam exposure apparatus having the above configuration will be explained.

First, the exposed holder 16 is transported from the XY stage 15 of the main chamber 11 to the holder changer chamber 12 by the robot arm 17, and is raised to the position Pi shown in FIG. 2 by the elevator mechanism 18.

Next, the unexposed holder 16 is transported from the subchamber 13 by the robot arm 17 to the position P2 shown in FIG.

Next, the unexposed holder 16 is placed on the XY stage 15 by the robot arm 17 after the elevator mechanism 18 is raised halfway. The unexposed holder 16 is transported on a trackless track and positioned on the XY stage 15, and then exposure is started.

Next, during the exposure, the elevator mechanism 18 descends, and the exposed holder 16 is transported from the holder changer chamber 12 to the subchamber 13 by the robot arm 17. Then, the first gate bubble 19 is closed, the second gate bubble 20 is opened, and the exposed holder 16 is exposed to the atmosphere.

Next, the holder 16 with the unexposed wafer substrate etc. mounted thereon is
It is stored in the subchamber 13, the second gate bubble 20 is closed, and the vacuum valve 21 is opened to draw a vacuum (.

The above operation is repeated.

In such an electron beam exposure apparatus, the main chamber 11 is arranged on a vibration isolating table 31, and the holder changer chamber 12 and the subchamber 13 are supported on a pedestal 32 provided independently of the vibration isolating table 31. Moreover, the main chamber 11 and the holder changer chamber 12 are connected by a bellows 33, a fluid cylinder 34, and a vibration-proof rubber 35, so that the exposure section and the holder conveyance section are vibrationally separated. ing.

That is, during exposure, the holder 16 is transported by the robot arm 17, the elevator mechanism 18, etc., or the first
Also, vibrations caused by opening and closing of the second gate bubbles 19 and 20 and the vacuum valve 21 are not transmitted to the main chamber 11 side. Therefore, there is no need to interrupt exposure, eliminating wasted time, and throughput can be improved.

In the present invention, it is sufficient that the main chamber 11 on the exposure section side and the holder changer chamber 12 and subchamber 13 on the holder transport section side are vibrationally insulated by separate vibration isolation tables or the like.

Further, the bellows 33 may be any material as long as it has a small spring constant and good vibration insulation properties.

Further, the fluid cylinder 34 may be of any type as long as it can compensate for the compression of the bellows 33 due to the atmosphere.

[Effects of the Invention] As explained above, according to the present invention, the exposure chamber, the holder exchange chamber, and the load lock chamber are arranged on separate vibration isolation tables, and the exposure chamber and the holder exchange chamber are separated from each other by vibration isolation. Since the cylinder is connected by an insulating bellows and compensates for compression of the bellows by the atmosphere, the exposure section and the holder conveyance section are vibrationally separated. Therefore, even when the vacuum valve provided on the holder transport section side is opened and closed, and when the holder is transported, etc., it is affected by vibrations, and exposure can be continued and throughput can be improved.

[Brief explanation of the drawing]

FIG. 1 is a block diagram of an electron beam exposure apparatus according to an embodiment of the present invention, FIG. 2 is a block diagram of a holder changer chamber according to an embodiment of the present invention, and FIG. 3 is a block diagram of an XY stage portion according to an embodiment of the present invention. 4 is a plan view of the XY stage portion of FIG. 3, and FIG. 5 is a configuration diagram of a conventional electron beam exposure apparatus. In the figure, 11 is the main chamber, 12 is the holder changer chamber, 13 is the subchamber, 15 is the XY stage, 16 is the holder, 17 is the robot arm, 18 is the elevator mechanism, 19 is the first gate valve, and 20 is the second gate valve. gate valve, 21 is a vacuum valve, 31 is a vibration isolation stand, 32 is a stand, 33 is a bellows, 34 is a fluid cylinder, 35 is an anti-vibration rubber, 36.38 is a spring, 37.39 is a pin, 40 is a stopper, shows.

Claims (1)

[Claims] An exposure chamber (11) for performing exposure with an electron beam, a holder exchange chamber (12) for exchanging holders (16), and a load lock chamber (13) for switching between vacuum and atmosphere. In the electron beam exposure apparatus, the exposure chamber (11) is separated from a holder exchange chamber (12) and a load lock chamber (13) by a separate vibration isolation table (31,
32) A cylinder (34) disposed above, which connects the exposure chamber (11) and the holder exchange chamber (12) by a vibration-insulating bellows (33), and compensates for the compression of the bellows (33) by the atmosphere. An electron beam exposure apparatus characterized by being provided with.