JPH01231046A - Method for developing photoresist - Google Patents

Abstract

PURPOSE:To prevent the generation of defects due to a residual developer in the following step by washing the developer adhered to the surface and back faces of a master disk with a water after developing it to remove the developer, followed by drying the plate. CONSTITUTION:The master disk 1 having an exposed photoresist film on the surface of the disk is mounted and fixed on a turn table 2, and a water is jetted on the master disk from a washing nozzle 3 and a back face washing nozzle 5 provided facing to the surface and back faces of the master disk respectively, while rotating the master disk 1, thereby removing the developer existing round about the surface and back faces of the master disk. Next, a dry air or a nitrogen gas coming from a dry nozzle 4 is sprayed towards from the center of the master disk 1 to the outer circumference thereof to dry the master disk, and at the same time, similarly, the back face of the disk 1 is dried by the back face dry nozzle 6. Thus, as the residue of the developer is not carried over to a following step, the generation of the defects in the following step is reduced.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for developing a photoresist used in the production of master discs for optical discs used in optical recording and reproducing devices such as video discs.

[Prior Art] Conventionally, in the development process of an optical disk master, the surface on which the pattern is to be formed is fixed on a turntable with the surface facing upward, and development, washing, and drying processes are performed while rotating the disc. In particular, measures have been taken to reduce defects on the surface of master discs, such as using splash prevention plates and controlling the temperature of the washing water. This reduced the occurrence of defects during the development process.

[Problem to be solved by the invention] However, in the above conventional example, as shown in FIGS. 3 and 4, only the resist surface side formed on the surface of the master 1 is washed and dried. For you, Hara! ! ! Only the surface of the il was actively washed and dried. In this case, the developing solution that had gotten around to the back side of the master 1 was not removed and remained as it was, and even if the washing water had gotten around to the back side, it could not be completely washed away. Naturally, if the original disc is placed in an oven and dried in this state, the residue of the developer will dry in the form of a powder bundle, contaminating not only the oven but also all the equipment used in subsequent processes. Therefore, if the developer residue on the back surface of the master 1 is left, even if no defects occur in the developing process, it will eventually induce defects in the subsequent process.

The present invention has been made in order to improve such conventional drawbacks, and in the development process in which development, washing, and drying are performed while rotating a master having a photoresist film exposed to light on the surface, After development, the developing solution adhering not only to the front surface but also to the back surface of the master disc is completely removed by washing with water.
It is an object of the present invention to provide a photoresist developing method that prevents defects from occurring in the next step due to remaining developer.

[Means for Solving the Problems] That is, the present invention provides a method for developing a master having a photoresist film exposed to light on its surface in a developing process in which development, water washing, and drying are performed while rotating a master having a photoresist film exposed to light on the surface. This invention relates to a method for developing a photoresist, which is characterized in that the developing solution adhering to the back surface is removed by washing with water, and then a drying process is performed.

In the present invention, the method of washing and removing the developing solution adhering to the front and back surfaces of the master after development involves spraying water from nozzles provided opposite to the front and back surfaces of the rotating master. It is preferable to remove the developer using a method.

[Function] According to the present invention, not only a water washing nozzle for washing the front surface of the master disc but also a back washing nozzle for washing the back surface of the master disc is provided, and the master disc after development is washed with water! The developer that has gotten around to the back side of the disc is completely removed in the same way as the front surface of the master disc, and then the front and back sides of the master disc are completely dried using the front and back drying nozzles, thereby removing the developer residue from the subsequent process. This prevents foreign matter from being brought in, and reduces the occurrence of defects in post-processing.

[Example] Hereinafter, the present invention will be explained in more detail with reference to Examples.

Example 1 FIG. 1 is an explanatory diagram showing a water washing process in the photoresist developing method of the present invention, and FIG. 2 is an explanatory diagram showing a drying process. In the same figure, 3 is a water washing nozzle;
5 is a back side water washing nozzle.

A G disk 1 having an exposed photoresist film on its surface is placed and fixed on a turntable 2, and while the master disk 1 is rotated, water washers provided opposite to the front and back surfaces of the TX disk are placed and fixed. Water is injected from the nozzle 3 and the back washing nozzle 5 to remove the developer that has gotten around to the front and back surfaces of the master l.

Next, drying air or nitrogen gas is blown from the drying nozzle 4 from the center to the outer periphery of the original i1 to dry it, and at the same time, the back side of the original 1 is also dried using the back side drying nozzle 6.

Example 2 During the washing process, the same effect as in Example 1 can also be obtained by filling the developing chamber in which the master l and turntable 2 are located with washing water, and submerging the original i1 in the washing water to perform washing.

[Effects of the Invention] As explained above, according to the present invention, since developer residue is no longer carried into the post-process, not only the occurrence of defects in the post-process is reduced, but also the turntable is improved. Since the adhering developer is also removed, there is no need to wash the inside of the development chamber with water after the development process is completed, making it possible to simplify the work.

[Brief explanation of the drawing]

FIG. 1 is an explanatory diagram showing the water washing process in the photoresist developing method of the present invention, FIG. 2 is an explanatory diagram showing the drying process, and FIG. 3 is an explanatory diagram showing the water washing process in the conventional photoresist developing method. The illustrated diagram and FIG. 4 are explanatory diagrams showing the drying process. 1...Master disc 2...Turntable 3.
...Water washing nozzle 4...Drying nozzle °5...Back washing nozzle 6...Back drying nozzle Fig. 1 Fig. 2 Fig. 3 Fig. 4

Claims (2)

[Claims] (1) In the development process in which development, washing, and drying are performed while rotating the master having a photoresist film that has been exposed to light on the surface, the developing solution adhering to the front and back surfaces of the master is washed with water after development. A method for developing a photoresist, which comprises removing and then drying. (2) The photoresist developing method according to claim 1, wherein the developer is removed by jetting water from nozzles provided opposite to the front and back surfaces of the rotating master.