JPH0122977B2 - - Google Patents
Info
- Publication number
- JPH0122977B2 JPH0122977B2 JP55500330A JP50033080A JPH0122977B2 JP H0122977 B2 JPH0122977 B2 JP H0122977B2 JP 55500330 A JP55500330 A JP 55500330A JP 50033080 A JP50033080 A JP 50033080A JP H0122977 B2 JPH0122977 B2 JP H0122977B2
- Authority
- JP
- Japan
- Prior art keywords
- image
- plane
- window
- short line
- parallel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 22
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 12
- 238000005259 measurement Methods 0.000 claims description 10
- 238000001514 detection method Methods 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 description 8
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19792905635 DE2905635A1 (de) | 1979-02-14 | 1979-02-14 | Verfahren und vorrichtung zum ausrichten der bild- und/oder objektflaechen bei optischen kopiereinrichtungen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56500196A JPS56500196A (US20100223739A1-20100909-C00025.png) | 1981-02-19 |
| JPH0122977B2 true JPH0122977B2 (US20100223739A1-20100909-C00025.png) | 1989-04-28 |
Family
ID=6062917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55500330A Expired JPH0122977B2 (US20100223739A1-20100909-C00025.png) | 1979-02-14 | 1980-02-06 |
Country Status (5)
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH678666A5 (US20100223739A1-20100909-C00025.png) * | 1981-05-15 | 1991-10-15 | Gen Signal Corp | |
| US4425037A (en) * | 1981-05-15 | 1984-01-10 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| US4431304A (en) * | 1981-11-25 | 1984-02-14 | Mayer Herbert E | Apparatus for the projection copying of mask patterns on a workpiece |
| DE3485022D1 (de) * | 1983-12-26 | 1991-10-10 | Hitachi Ltd | Belichtungsvorrichtung und verfahren fuer die ausrichtung einer maske mit einem arbeitsstueck. |
| DE3402177A1 (de) * | 1984-01-23 | 1985-07-25 | Werner Dr. Vaduz Tabarelli | Einrichtung zum kopieren einer maske auf ein halbleitersubstrat |
| US4652914A (en) * | 1984-04-27 | 1987-03-24 | Dainippon Screen Mfg. Co., Ltd. | Method of recording register marks |
| US4701050A (en) * | 1984-08-10 | 1987-10-20 | Hitachi, Ltd. | Semiconductor exposure apparatus and alignment method therefor |
| JPH0685387B2 (ja) * | 1986-02-14 | 1994-10-26 | 株式会社東芝 | 位置合わせ方法 |
| US4780616A (en) * | 1986-09-25 | 1988-10-25 | Nippon Kogaku K. K. | Projection optical apparatus for mask to substrate alignment |
| JPS63223648A (ja) * | 1987-03-12 | 1988-09-19 | Yutaka Denki Kk | 見当合わせ装置 |
| GB2249387B (en) * | 1990-10-11 | 1995-01-25 | Holtronic Technologies Ltd | Apparatus for and a method of transverse position measurement in proximity lithographic systems |
| JPH0754794B2 (ja) * | 1992-04-27 | 1995-06-07 | 株式会社ニコン | 投影型露光装置 |
| CN100468209C (zh) * | 2006-07-21 | 2009-03-11 | 上海微电子装备有限公司 | 一种提高光强探测器测量精度的方法 |
| DE102012208514A1 (de) * | 2012-05-22 | 2013-11-28 | Carl Zeiss Smt Gmbh | Justagevorrichtung sowie Masken-Inspektionsvorrichtung mit einer derartigen Justagevorrichtung |
| CN113267865B (zh) * | 2021-04-12 | 2023-02-07 | 浙江舜宇光学有限公司 | 镜筒及镜头 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1250257B (US20100223739A1-20100909-C00025.png) * | ||||
| DE1087372B (de) * | 1954-09-04 | 1960-08-18 | Voigtlaender A G | Verfahren und Einrichtung zur vollautomatischen Scharfeinstellung optischer Geraete |
| US3029348A (en) * | 1959-10-02 | 1962-04-10 | Western Electric Co | Electro-optical servo system for coarse and fine positioning of transistors |
| US3729966A (en) * | 1972-02-02 | 1973-05-01 | Ibm | Apparatus for contouring the surface of thin elements |
| DE2259892A1 (de) * | 1972-12-07 | 1974-06-12 | Rodenstock Optik G | Verfahren und anordnung zur automatischen fokussierung von objektiven vorzugsweise reproduktionsobjektiven |
| US3943359A (en) * | 1973-06-15 | 1976-03-09 | Hitachi, Ltd. | Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope |
| JPS5548693B2 (US20100223739A1-20100909-C00025.png) * | 1973-06-26 | 1980-12-08 | ||
| US3989385A (en) * | 1974-09-16 | 1976-11-02 | International Business Machines Corporation | Part locating, mask alignment and mask alignment verification system |
| US4052603A (en) * | 1974-12-23 | 1977-10-04 | International Business Machines Corporation | Object positioning process and apparatus |
| US4000417A (en) * | 1975-08-25 | 1976-12-28 | Honeywell Inc. | Scanning microscope system with automatic cell find and autofocus |
| JPS52109875A (en) * | 1976-02-25 | 1977-09-14 | Hitachi Ltd | Position matching system for mask and wafer and its unit |
| DE2633297A1 (de) * | 1976-07-23 | 1978-01-26 | Siemens Ag | Verfahren zur automatischen justierung |
| NO146924C (no) * | 1976-07-28 | 1982-12-29 | Mobil Oil Corp | Fremgangsmaate ved marine seismiske undersoekelser |
| JPS5375773A (en) * | 1976-12-17 | 1978-07-05 | Fujitsu Ltd | Automatic focussing unit |
| JPS5952535B2 (ja) * | 1977-01-21 | 1984-12-20 | キヤノン株式会社 | 光学装置 |
| JPS541553A (en) * | 1977-06-07 | 1979-01-08 | Toshiba Corp | Group management control method of elevator |
| DE2845603C2 (de) * | 1978-10-19 | 1982-12-09 | Censor Patent- und Versuchs-Anstalt, 9490 Vaduz | Verfahren und Einrichtung zum Projektionskopieren |
-
1979
- 1979-02-14 DE DE19792905635 patent/DE2905635A1/de active Granted
-
1980
- 1980-02-06 US US06/476,249 patent/US4496241A/en not_active Expired - Fee Related
- 1980-02-06 JP JP55500330A patent/JPH0122977B2/ja not_active Expired
- 1980-02-06 WO PCT/AT1980/000007 patent/WO1980001721A1/de active IP Right Grant
- 1980-08-25 EP EP80900263A patent/EP0025036B1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| WO1980001721A1 (en) | 1980-08-21 |
| EP0025036A1 (de) | 1981-03-18 |
| DE2905635C2 (US20100223739A1-20100909-C00025.png) | 1987-01-22 |
| JPS56500196A (US20100223739A1-20100909-C00025.png) | 1981-02-19 |
| US4496241A (en) | 1985-01-29 |
| EP0025036B1 (de) | 1984-01-18 |
| DE2905635A1 (de) | 1980-08-21 |
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