JPH0120731B2 - - Google Patents

Info

Publication number
JPH0120731B2
JPH0120731B2 JP18327580A JP18327580A JPH0120731B2 JP H0120731 B2 JPH0120731 B2 JP H0120731B2 JP 18327580 A JP18327580 A JP 18327580A JP 18327580 A JP18327580 A JP 18327580A JP H0120731 B2 JPH0120731 B2 JP H0120731B2
Authority
JP
Japan
Prior art keywords
photosensitive
soluble
polyamide
layer
alcohol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18327580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57105736A (en
Inventor
Keiji Kubo
Koichiro Arita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP18327580A priority Critical patent/JPS57105736A/ja
Publication of JPS57105736A publication Critical patent/JPS57105736A/ja
Publication of JPH0120731B2 publication Critical patent/JPH0120731B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP18327580A 1980-12-23 1980-12-23 Photosensitive image-forming material Granted JPS57105736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18327580A JPS57105736A (en) 1980-12-23 1980-12-23 Photosensitive image-forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18327580A JPS57105736A (en) 1980-12-23 1980-12-23 Photosensitive image-forming material

Publications (2)

Publication Number Publication Date
JPS57105736A JPS57105736A (en) 1982-07-01
JPH0120731B2 true JPH0120731B2 (enrdf_load_stackoverflow) 1989-04-18

Family

ID=16132800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18327580A Granted JPS57105736A (en) 1980-12-23 1980-12-23 Photosensitive image-forming material

Country Status (1)

Country Link
JP (1) JPS57105736A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS57105736A (en) 1982-07-01

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