JPH0120495B2 - - Google Patents
Info
- Publication number
- JPH0120495B2 JPH0120495B2 JP1351181A JP1351181A JPH0120495B2 JP H0120495 B2 JPH0120495 B2 JP H0120495B2 JP 1351181 A JP1351181 A JP 1351181A JP 1351181 A JP1351181 A JP 1351181A JP H0120495 B2 JPH0120495 B2 JP H0120495B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- base material
- magnetic recording
- recording medium
- ion beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005291 magnetic effect Effects 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 30
- 238000010884 ion-beam technique Methods 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 230000005294 ferromagnetic effect Effects 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 12
- 230000007935 neutral effect Effects 0.000 claims description 8
- 238000007733 ion plating Methods 0.000 claims description 7
- 239000000696 magnetic material Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 230000005684 electric field Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 230000005415 magnetization Effects 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 5
- 239000010941 cobalt Substances 0.000 description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 5
- -1 polyethylene terephthalate Polymers 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 238000005566 electron beam evaporation Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910000640 Fe alloy Inorganic materials 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】
本発明は、強磁性金属を磁性層とする磁気記録
媒体の製造方法に関しより具体的には、磁性層を
形成する強磁性金属の蒸発粒子からなるイオンビ
ームを逐次異なる入射角度で基材へ入射せしめて
磁性層を形成することにより電磁変換特性が改良
された磁気記録媒体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a magnetic recording medium having a magnetic layer made of a ferromagnetic metal. The present invention relates to a method of manufacturing a magnetic recording medium with improved electromagnetic conversion characteristics by forming a magnetic layer by making the light incident on a base material at an incident angle.
最近、記録密度の飛躍的増大を目的として、樹
脂バインダーを使用せず、非磁性基材上に磁気記
録層として強磁性金属薄膜を設けた磁気記録テー
プが湿式メツキ法、真空蒸着法、スパツタリング
法、イオンプレーテイング法等の薄膜形成法を用
いて精力的に研究開発され、一部は実用に供され
ている。 Recently, with the aim of dramatically increasing recording density, magnetic recording tapes that do not use a resin binder and have a ferromagnetic metal thin film as a magnetic recording layer on a non-magnetic base material have been developed using wet plating, vacuum evaporation, and sputtering methods. , ion plating and other thin film formation methods have been actively researched and developed, and some of them have been put into practical use.
しかしながら、上記各薄膜形成法によつて得ら
れる磁気記録媒体は、それぞれに欠点があり、実
用上、種々の問題点を有していた。 However, the magnetic recording media obtained by each of the above-mentioned thin film forming methods have their own drawbacks and have various practical problems.
即ち、湿式メツキ、真空蒸着によつて形成され
た薄膜型の磁気記録媒体は磁性層と基材との密着
強度が極めて低いため、記録―再生時に於いて、
磁気ヘツドとの接触走査による機械的摩擦によつ
て、磁性層が剥離したり、摩滅、損傷等を生じ易
いという欠点があつた。 That is, in thin-film magnetic recording media formed by wet plating or vacuum deposition, the adhesion strength between the magnetic layer and the base material is extremely low, so during recording and reproduction,
The disadvantage is that the magnetic layer is susceptible to peeling, wear, damage, etc. due to mechanical friction caused by contact scanning with a magnetic head.
又、スパツタリング法、イオンプレーテイング
法によつて形成された薄膜型の磁気記録媒体は、
磁性層と基材との密着強度は改善されるものの、
圧力10-3トール以上の低真空中での直流グロー放
電又は高周波プラズマを利用して薄膜形成を行な
う方法であるため、残留ガスの取り込み、不純物
の混入などによつて、強磁性体薄膜層の結晶性に
悪影響を及ぼし、角形比が小さくなるなど、磁気
特性上に欠点があつた。又放電状態の不均一性に
起因する膜品質及び磁気特性上のバラツキ、不均
一性などの難点を有し、高性能高密度記録用の磁
気記録媒体としては、いまだ解決しなければなら
ない問題点を多く残していた。 In addition, thin film magnetic recording media formed by sputtering method or ion plating method are
Although the adhesion strength between the magnetic layer and the base material is improved,
Since this method uses direct current glow discharge or high-frequency plasma in a low vacuum with a pressure of 10 -3 Torr or more to form a thin film, the ferromagnetic thin film layer may be damaged due to the incorporation of residual gas or the incorporation of impurities. It had drawbacks in magnetic properties, such as a negative effect on crystallinity and a decrease in squareness ratio. Furthermore, it has drawbacks such as variations and non-uniformity in film quality and magnetic properties due to non-uniformity of the discharge state, and these problems still need to be solved as a magnetic recording medium for high-performance, high-density recording. I left a lot of.
本発明者らは、上記各薄膜形成法によつて得ら
れる蒸着型の磁気記録媒体の問題点を抜本的に解
決するものとして、先に高真空イオンプレーテイ
ング法によつて磁性層を形成する磁気記録媒体の
製造方法（特願昭55−30807号）を提案した。該
製造方法により得られる磁気記録媒体は高密度磁
気記録媒体として実用に供し得るものであつた
が、その初期磁化特性は、外部印加磁場が小さい
とき、磁化されにくく保磁力に近い印加磁場で急
激に磁化されるような特徴的な特性を有してお
り、通常のテープレコーダにて録音・再生する際
バイアス電流が小のときは、再生出力の変動が大
きくなつてしまうという問題点を有していた。 The present inventors first formed a magnetic layer by a high vacuum ion plating method in order to fundamentally solve the problems of vapor-deposited magnetic recording media obtained by the above-mentioned thin film forming methods. We proposed a method for manufacturing magnetic recording media (Japanese Patent Application No. 55-30807). Although the magnetic recording medium obtained by this manufacturing method could be used practically as a high-density magnetic recording medium, its initial magnetization characteristics were such that it was difficult to be magnetized when the externally applied magnetic field was small, and suddenly changed when the applied magnetic field was close to the coercive force. It has a characteristic property of being magnetized by a magnet, and when recording and playing back with a normal tape recorder, when the bias current is small, the playback output fluctuates greatly. was.
本発明は前記従来の製法によつて得られる蒸着
型の磁気記録媒体の欠点を解明すると共に、上記
の如き電磁変換特性、特に、再生出力の変動も改
善された磁気記録媒体の製造方法を提供すること
を目的としてなされたものであり、その要旨は、
非磁性材料からなる基材上に、強磁性金属薄膜か
らなる磁性層を高真空下におけるイオンプレーテ
イング法により蒸着形成するに際し、まず上記基
材表面に或る入射角で強磁性金属蒸発粒子からな
るイオンビームを照射して中性蒸気粒子と共に蒸
着させ、次いで異なる入射角で上記のイオンビー
ムを照射して中性蒸気粒子と共に蒸着させて、磁
性層を形成させることを特徴とする磁気記録媒体
の製造方法に存する。 The present invention solves the drawbacks of the vapor-deposited magnetic recording medium obtained by the conventional manufacturing method, and also provides a method for manufacturing a magnetic recording medium that improves the electromagnetic characteristics as described above, especially the variation in reproduction output. It was made with the purpose of
When forming a magnetic layer made of a thin ferromagnetic metal film on a base material made of a non-magnetic material by vapor deposition using the ion plating method under high vacuum, first, evaporated ferromagnetic metal particles are deposited onto the surface of the base material at a certain angle of incidence. A magnetic recording medium characterized in that a magnetic layer is formed by irradiating the ion beam with an ion beam to deposit the neutral vapor particles together with the neutral vapor particles, and then irradiating the ion beam at different incident angles to deposit the ion beams together with the neutral vapor particles. It consists in the manufacturing method.
本発明において使用される非磁性材料からなる
基材とは、ポリ塩化ビニル、ポリフツ化ビニル、
酢酸セルロース、ポリエチレンテレフタレート、
ポリブチレンテレフタレート、ポリエチレン、ポ
リプロピレン、ポリカーボネート、ポリアミド、
ポリエーテルサルフオン、ポリバラバン酸等の高
分子材料やアルミニウム、銅、銅―亜鉛合金属の
非磁性金属材料や紙などの非磁性材料から作られ
た基材を云う。又、該基材の形状は磁気記録媒体
の用途に応じて適宜定められればよく、例えば、
テープ、フイルム、等の形状で使用される。そし
て該基材としては高分子材料からなる可撓性の性
質を有するものが好適である。 The base material made of non-magnetic material used in the present invention includes polyvinyl chloride, polyvinyl fluoride,
Cellulose acetate, polyethylene terephthalate,
polybutylene terephthalate, polyethylene, polypropylene, polycarbonate, polyamide,
Refers to base materials made from polymeric materials such as polyether sulfone and polyvalabanic acid, non-magnetic metal materials such as aluminum, copper, and copper-zinc alloys, and non-magnetic materials such as paper. Further, the shape of the base material may be determined as appropriate depending on the use of the magnetic recording medium, for example,
Used in the form of tape, film, etc. The base material is preferably made of a polymeric material and has flexibility.
又、本発明において上記基材に蒸着するのに用
いられる強磁性金属としては、鉄、コバルト及び
ニツケルが挙げられ、これらの一種以上を含有す
る合金やこれらの金属の１種以上と他の元素との
混合物も用いることが出来る。しかして鉄の合金
としては、鉄と、コバルト、ニツケル、マンガ
ン、クロム、銅、金、チタンなどとの合金、コバ
ルトの合金としては、コバルトとリン、クロム、
銅、ニツケル、マンガン、金、チタンイツトリウ
ム、サマリウム、ビスマス、などとの合金、ニツ
ケルの合金としては、ニツケルと銅、亜鉛、マン
ガン、などとの合金があげられる。 In the present invention, the ferromagnetic metals used for vapor deposition on the substrate include iron, cobalt, and nickel, and alloys containing one or more of these metals and one or more of these metals and other elements may be used. A mixture with can also be used. However, iron alloys include alloys of iron with cobalt, nickel, manganese, chromium, copper, gold, titanium, etc., and cobalt alloys include cobalt and phosphorus, chromium, etc.
Alloys of copper, nickel, manganese, gold, titanium, yttrium, samarium, bismuth, etc., and alloys of nickel include alloys of nickel with copper, zinc, manganese, etc.
又、鉄、コバルト又はニツケルと他の元素との
混合物としては、該他の元素がリン、クロム、
銅、亜鉛、金、チタン、イツトリウム、サマリウ
ム、ビスマスなどであるものがあり、これら他の
元素の１種若しくは２種以上が選択使用されてよ
い。 In addition, as a mixture of iron, cobalt or nickel and other elements, the other elements may be phosphorus, chromium,
Examples include copper, zinc, gold, titanium, yttrium, samarium, bismuth, etc., and one or more of these other elements may be selectively used.
本発明において強磁性金属薄膜からなる磁性層
を基材上に形成させるために採用される高真空下
におけるイオンプレーテイング法とは、８×10-4
トールから10-10トールの領域の高真空に排気さ
れた真空槽内に於いて、蒸発源材料である強磁性
金属を加熱蒸気化せしめて蒸気粒子となし、次い
で電子放射源から放出される電子を電界加速し上
記蒸気粒子と衝突させることによりこれを一部イ
オン化し、更に該イオン化蒸発粒子を電界加速し
て高エネルギーを与え、イオンビームとなし、該
イオンビームをイオン化されなかつた中性蒸気粒
子と共に基材上に衝突せしめて磁性薄膜を形成す
る方法である。 In the present invention, the ion plating method under high vacuum employed to form a magnetic layer made of a ferromagnetic metal thin film on a base material is 8×10 -4
In a vacuum chamber evacuated to a high vacuum in the range of 10 -10 Torr, the ferromagnetic metal that is the evaporation source material is heated and vaporized to form vapor particles, and then the electrons emitted from the electron radiation source are heated and vaporized. is accelerated in an electric field and collides with the vapor particles to partially ionize it, and the ionized vaporized particles are further accelerated in an electric field to give high energy to form an ion beam, and the ion beam is converted into neutral vapor that has not been ionized. This is a method of forming a magnetic thin film by colliding particles together with a substrate.
以下、図面を参照して本発明を更に詳細に説明
する。 Hereinafter, the present invention will be explained in more detail with reference to the drawings.
第１図は本発明磁気記録媒体の製造方法の一実
施例を示す模型図であり、真空槽内の主要部位を
表わしたものである。（但し電源は真空槽外に配
置されている）図中１は、イオンビーム源ユニツ
トを示し、２は、テープ状若しくはフイルム状長
尺基材２′の移動系を示している。 FIG. 1 is a schematic diagram showing an embodiment of the method for manufacturing a magnetic recording medium of the present invention, and shows the main parts inside a vacuum chamber. (However, the power source is placed outside the vacuum chamber.) In the figure, 1 indicates an ion beam source unit, and 2 indicates a moving system for a tape-shaped or film-shaped elongated base material 2'.
イオンビーム源ユニツト１は、電子ビーム蒸発
源３、蒸気遮蔽板４、イオン化部５、イオン加速
電極６及びイオンビーム遮蔽板４′とから構成さ
れている。 The ion beam source unit 1 is composed of an electron beam evaporation source 3, a vapor shielding plate 4, an ionization section 5, an ion accelerating electrode 6, and an ion beam shielding plate 4'.
電子ビーム蒸発源３は、180゜偏向Ｅガン７、水
冷銅電極８及び蒸発源材料９とからなつている
（但し電源等は図示されていない。）
イオン化部５は熱電子放出用フイラメント１
０、放出電子を電界加速するためのメツシユ状電
極１１及び電界制御のためのガード１２により構
成されている。 The electron beam evaporation source 3 consists of a 180° deflection E gun 7, a water-cooled copper electrode 8, and an evaporation source material 9 (however, a power source etc. are not shown).
0. It is composed of a mesh-like electrode 11 for accelerating emitted electrons with an electric field and a guard 12 for controlling the electric field.
本発明による記録媒体の製造は、真空槽を８×
10-4〜10-10トールの高真空に保ち、イオン源ユ
ニツト１のＥガン７により蒸発源材料９を電子ビ
ームで衝撃し加熱蒸発せしめて蒸気粒子となし、
真空槽外に配置された電源２０及び２１によりフ
イラメント１０を通電加熱し熱電子を放出せしめ
るとともに、負の直流電圧を印加し、該電子を電
界加速することで上記蒸気粒子を衝撃し、イオン
化せしめ、該蒸気粒子イオンを、電源２２により
負の高電圧に印加された加速電極６にて、電界加
速して運動エネルギーを付与してイオンビームと
なし、これを長尺基材２′に照射することにより
行われる。 The recording medium according to the present invention is manufactured using a vacuum chamber of 8×
Maintaining a high vacuum of 10 -4 to 10 -10 Torr, the evaporation source material 9 is bombarded with an electron beam by the E gun 7 of the ion source unit 1, heated and evaporated to form vapor particles.
Power supplies 20 and 21 placed outside the vacuum chamber heat the filament 10 with electricity to emit thermoelectrons, and apply a negative DC voltage to accelerate the electrons with an electric field, thereby impacting the vapor particles and ionizing them. The vapor particle ions are accelerated in an electric field by an accelerating electrode 6 to which a negative high voltage is applied by a power source 22, imparting kinetic energy to form an ion beam, which is irradiated onto the elongated base material 2'. This is done by
しかして上記長尺基材２′は、供給ロール２５
から矢印方向に進行し、ガイドロール２６，２
７，２８、を経て巻き取りロール２９に巻き取ら
れるようになされている。但し、供給ロール２
５、巻き取りロール２９を逆にして基材移動方向
を逆にすることも可能である。 Thus, the long base material 2' is fed to the supply roll 25.
The guide rolls 26, 2 move forward in the direction of the arrow from
7, 28, and then wound onto a winding roll 29. However, supply roll 2
5. It is also possible to reverse the direction of substrate movement by reversing the take-up roll 29.
本実施例におけるガイドロール２６，２７，２
８の配置は、ガイドロール２６，２７間で基材
２′表面に入射するイオンビーム及び中性蒸気粒
子の入射角度（基材面の法線に対する角度θ1）が
40゜から170゜の範囲となり、ガイドロール２７，
２８間の入射角度θ2が75゜から89゜の範囲となるよ
うになされており、このため、矢印方向に進行せ
しめられている基材２′は、ガイドロール２６，
２７間で或る入射角θ1でのイオンビーム及び中性
蒸気粒子の入射により蒸着層が形成せしめられ、
次いでガイドロール２７，２８間で上記とは異な
る入射角θ2での入射により上記で形成された蒸着
層の上にさらに蒸着層が形成せしめられ、かくし
て本発明方法にもとずく磁気記録媒体が製造され
るものである。 Guide rolls 26, 27, 2 in this embodiment
8, the incident angle of the ion beam and neutral vapor particles that are incident on the surface of the base material 2' between the guide rolls 26 and 27 (angle θ 1 with respect to the normal to the surface of the base material) is
The angle ranges from 40° to 170°, and the guide roll 27,
The incident angle θ 2 between the guide rolls 26 and 28 is in the range of 75° to 89°.
A vapor deposited layer is formed by the incidence of an ion beam and neutral vapor particles at a certain incident angle θ 1 between
Next, a vapor deposited layer is further formed on the vapor deposited layer formed above by incidence at an incident angle θ 2 different from the above between the guide rolls 27 and 28, and thus the magnetic recording medium based on the method of the present invention is produced. It is manufactured.
本発明磁気記録媒体の製造方法は上述の通りの
方法であり、とくに高真空下におけるイオンプレ
ーテイング法により強磁性金属薄膜からなる磁性
層の形成が行われると共に、相異なつた入射角で
の強磁性層の形成がなされるので、密着強度や磁
性層の純度にすぐれ、磁気特性上のバラツキ、不
均一性等がなく、しかも電磁変換特性特に再生出
力の変動が改善された磁気記録媒体を製造するこ
とが出来るのである。 The method for manufacturing the magnetic recording medium of the present invention is as described above, and in particular, the magnetic layer made of a ferromagnetic metal thin film is formed by the ion plating method under high vacuum, and the magnetic layer is formed by a magnetic layer made of a thin ferromagnetic metal film. Since a magnetic layer is formed, we manufacture magnetic recording media with excellent adhesion strength and purity of the magnetic layer, no variation or non-uniformity in magnetic properties, and improved electromagnetic conversion properties, especially fluctuations in reproduction output. It is possible to do so.
以下本発明の実施例について説明する。 Examples of the present invention will be described below.
実施例 １
第１図に示した磁気記録媒体の製造装置を用い
て、下記に示した条件にて磁気記録媒体を得た。Example 1 A magnetic recording medium was obtained using the magnetic recording medium manufacturing apparatus shown in FIG. 1 under the conditions shown below.
基材：ポリエチレンテレフタレートフイルム
（厚さ9μm）
磁性層形成材料 ：コバルト（純度 99.99％）
フイルム送り速度：50mm／min
真空槽内真空度 ：９×10-6torr
入射角度：θ1＝55゜〜60゜
θ2＝83゜〜85゜
イオン源動作条件：イオン化電圧 500V、イ
オン化電流200mA、イオン加速電
圧 1.0KV、
得られた磁気記録媒体の磁性層の厚みは約1500
Åであり、その密着強度につき、セロハンテープ
によるピールテストで調べたところ全く剥離を生
じなかつた。 Base material: Polyethylene terephthalate film (thickness 9 μm) Magnetic layer forming material: Cobalt (purity 99.99%) Film feed speed: 50 mm/min Vacuum degree in vacuum chamber: 9 × 10 -6 torr Incident angle: θ 1 = 55° ~ 60゜θ 2 = 83゜~85゜ Ion source operating conditions: ionization voltage 500V, ionization current 200mA, ion acceleration voltage 1.0KV, the thickness of the magnetic layer of the obtained magnetic recording medium is approximately 1500
The adhesion strength was examined by a peel test using cellophane tape, and no peeling occurred at all.
又、その磁化特性を直流磁化測定装置により測
定した結果、第２図に示すように初期磁化が改善
された磁化曲線が得られた。又市販のテープレコ
ーダーを用いノーマルポジシヨンのバイアス条件
で録音・再生を行なつた結果、再生出力の出力変
動は1dB以内であつた。 Further, as a result of measuring the magnetization characteristics using a DC magnetization measuring device, a magnetization curve with improved initial magnetization was obtained as shown in FIG. Furthermore, when recording and playback was performed using a commercially available tape recorder under normal position bias conditions, the output fluctuation of the playback output was within 1 dB.
第１図は本発明の一実施例を示す模型図であ
り、第２図は本発明の実施例で得られた磁気記録
媒体の磁化曲線である。
１……イオンビーム源ユニツト、２……長尺基
材２′の移動系、３……電子ビーム蒸発源、４…
…蒸気遮蔽板、５……イオン化部、６……イオン
加速電極、４′……イオンビーム遮蔽板、７……
偏向Ｅガン、８……水冷銅電極、９……蒸発源材
料、１０……熱電子放出用フイラメント、１１…
…メツシユ状電極、１２……ガード、２０，２
１，２２……電源、２５……供給ロール、２９…
…巻き取りロール、２６，２７，２８……ガイド
ロール、θ1，θ2……入射角。
FIG. 1 is a model diagram showing an embodiment of the present invention, and FIG. 2 is a magnetization curve of a magnetic recording medium obtained in the embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Ion beam source unit, 2... Moving system for long base material 2', 3... Electron beam evaporation source, 4...
...Steam shielding plate, 5...Ionization section, 6...Ion accelerating electrode, 4'...Ion beam shielding plate, 7...
Deflection E gun, 8... water-cooled copper electrode, 9... evaporation source material, 10... filament for thermionic emission, 11...
...Mesh-shaped electrode, 12... Guard, 20,2
1, 22...power supply, 25...supply roll, 29...
... Winding roll, 26, 27, 28 ... Guide roll, θ 1 , θ 2 ... Incident angle.
Claims (1)
膜からなる磁性層を高真空下におけるイオンプレ
ーテイング法により蒸着形成するに際し、まず上
記基材表面に或る入射角で強磁性金属蒸発粒子か
らなるイオンビームを照射して中性蒸気粒子と共
に蒸着させ、次いで異なる入射角で上記のイオン
ビームを照射して中性蒸気粒子と共に蒸着させ
て、磁性層を形成させることを特徴とする磁気記
録媒体の製造方法。 ２ 非磁性材料からなる基材が高分子材料からな
る可撓性の基材である第１項記載の製造方法。[Claims] 1. When depositing a magnetic layer made of a ferromagnetic metal thin film on a base material made of a non-magnetic material by ion plating under high vacuum, first, a certain angle of incidence is applied to the surface of the base material. irradiation with an ion beam consisting of ferromagnetic metal evaporated particles to deposit them together with neutral vapor particles, and then irradiation with the above ion beam at different incident angles to deposit them together with neutral vapor particles to form a magnetic layer. A method of manufacturing a magnetic recording medium characterized by: 2. The manufacturing method according to item 1, wherein the base material made of a non-magnetic material is a flexible base material made of a polymeric material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1351181A JPS57127930A (en) | 1981-01-30 | 1981-01-30 | Manufacture for magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1351181A JPS57127930A (en) | 1981-01-30 | 1981-01-30 | Manufacture for magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57127930A JPS57127930A (en) | 1982-08-09 |
| JPH0120495B2 true JPH0120495B2 (en) | 1989-04-17 |
Family
ID=11835163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1351181A Granted JPS57127930A (en) | 1981-01-30 | 1981-01-30 | Manufacture for magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57127930A (en) |
-
1981
- 1981-01-30 JP JP1351181A patent/JPS57127930A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57127930A (en) | 1982-08-09 |
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