JPH01200304A - Multilayered optical film - Google Patents
Multilayered optical filmInfo
- Publication number
- JPH01200304A JPH01200304A JP2396588A JP2396588A JPH01200304A JP H01200304 A JPH01200304 A JP H01200304A JP 2396588 A JP2396588 A JP 2396588A JP 2396588 A JP2396588 A JP 2396588A JP H01200304 A JPH01200304 A JP H01200304A
- Authority
- JP
- Japan
- Prior art keywords
- film
- films
- stress
- ta2o5
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012788 optical film Substances 0.000 title abstract description 4
- 230000003287 optical effect Effects 0.000 claims abstract description 17
- 239000010408 film Substances 0.000 abstract description 73
- 229910001635 magnesium fluoride Inorganic materials 0.000 abstract description 9
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 abstract description 9
- 150000002500 ions Chemical class 0.000 description 29
- 239000012528 membrane Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- -1 oxygen ions Chemical class 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910004481 Ta2O3 Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、干渉フィルタ等に用いる光学多層膜に関する
。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an optical multilayer film used for interference filters and the like.
（従来の技術）
干渉フィルタは一定の光学的厚さをもつ薄い誘電体膜を
数層または多数層重ねて、その内部で生じる光の干渉を
利用して、特定の波長領域の光のみを透過または反射す
るフィルタである。(Prior art) Interference filters are made by stacking several or many layers of thin dielectric films with a certain optical thickness, and utilize the light interference that occurs inside them to transmit only light in a specific wavelength range. or a reflective filter.
一般に誘電体による干渉フィルタは、高屈折率物質、例
えばＴ ａ 、０．、Ｔｉｅ、、ＺｒＯ２等と低屈折率
物質、例えばＭｇＦいＳｉＯ□等との交互積層膜により
構成されている。通常の蒸着により得られた干渉フィル
タは湿度に対して不安定であり、より安定なフィルタを
得ようとすると、イオン照射、イオンブレーティング等
の技術が必要となってくる。しかし、イオン照射等を行
うと、高屈折率物質の応力が引張応力から圧縮応力へと
変わっていき、低屈折率物質として一般に用いられるＳ
ｉ０ｇ膜は圧縮応力のままである。Generally, a dielectric interference filter is made of a high refractive index material, for example, T a , 0. , Tie, ZrO2, etc. and a low refractive index material such as MgF, SiO□, etc., which are alternately laminated. Interference filters obtained by ordinary vapor deposition are unstable with respect to humidity, and techniques such as ion irradiation and ion blating are required to obtain more stable filters. However, when ion irradiation is performed, the stress of the high refractive index material changes from tensile stress to compressive stress, and S
The i0g film remains under compressive stress.
（発明が解決しようとする課題）
そこで、イオン照射等を行わない場合は、応力のバラン
スが取れており、基板等の反り等は無視できるが、イオ
ン照射等を行う場合は、応力のバランスが崩れ、膜にク
ラックが入ったり基板が反ったりする問題を生じる。(Problem to be solved by the invention) Therefore, when ion irradiation, etc. are not performed, the stress is balanced and warping of the substrate etc. can be ignored, but when ion irradiation, etc. is performed, the stress is balanced. This causes problems such as cracks in the film and warping of the substrate.
本発明はイオン照射等を行う場合にも、応力のバランス
が崩れない光学多層膜を提供することを目的とする。An object of the present invention is to provide an optical multilayer film that does not lose its stress balance even when subjected to ion irradiation or the like.
（課題を解決するための手段）
本発明の、光学多層膜はＴ ａ 、０．膜とＭ ｇ Ｆ
ｚ膜を有することを特徴とする特
Ｔａ、○、膜は高屈折率物質として、またＭｇＦ。(Means for Solving the Problems) The optical multilayer film of the present invention has a T a of 0. Membrane and M g F
The film is characterized by having a z film, which is a high refractive index material, and also contains MgF.
膜は低屈折率物質として用いられ、イオン照射等を行い
ながら成膜する。その際に、Ｍ ｇ Ｆ を膜はイオン
照射等を行わなくとも湿度に対して安定であることを見
出した。従って、Ｔａ２Ｏ５膜のみにイオン照射等を行
いながら成膜することができる。The film is used as a low refractive index material, and is formed while performing ion irradiation or the like. At that time, it was discovered that the MgF film is stable against humidity even without ion irradiation. Therefore, it is possible to form the Ta2O5 film while performing ion irradiation or the like only on the Ta2O5 film.
第１図は、ＴｉＯ□膜とＴａ ２Ｏ５膜に対して、イオ
ンエネルギー１．５ ｋｅＶでイオン照射を行った場合
の圧縮応力と引張応力の関係を示すグラフである。Ｔｉ
Ｏ２膜ではイオン電流密度２ＯμＡ ／ ＣＩＪ以上で
、圧縮応ツノが引張応力よりも太き（なり引張応力から
圧縮応力に変化し、イオン電流密度の増加に伴い圧縮応
力が増加する。しかしＴａ２Ｏ。FIG. 1 is a graph showing the relationship between compressive stress and tensile stress when ion irradiation is performed on a TiO□ film and a Ta2O5 film at an ion energy of 1.5 keV. Ti
In the O2 film, at an ion current density of 20μA/CIJ or more, the compressive stress is thicker than the tensile stress (the tensile stress changes to compressive stress, and the compressive stress increases as the ion current density increases.However, in Ta2O.
膜では１００μＡ ／ ｃｉでも圧縮応力は３〜４Ｘ１
０’ｄｙｎ／ｃｎｔ程度で飽和する。Even at 100μA/ci in the membrane, the compressive stress is 3~4X1
It saturates at about 0'dyn/cnt.
イオン照射を行わない場合はＴ ａ 、０５膜とＭｇＦ
２膜の組合せに対して、Ｔ ａ 、０．膜は応力が殆ど
ゼロに近いが、ＭｇＦ、膜は引張応力が強く、応力のバ
ランスがとれず、この組合せは多層構造に不適当である
。When ion irradiation is not performed, T a , 05 film and MgF
For the two-membrane combination, T a , 0. The stress of the film is almost zero, but the MgF film has strong tensile stress and the stress cannot be balanced, making this combination unsuitable for multilayer structures.
一方、ＴｉＯ□膜とＭｇＦ２膜の組合せに対して耐候性
を良くするためにイオン照射を行った場合、Ｔｉｅ、’
膜の圧縮応力がＭｇＦ２膜の引張応力よりも強くなり、
応力のバランスがとれず、この組合せも多層構造に不適
当である。On the other hand, when ion irradiation is performed on the combination of TiO□ film and MgF2 film to improve weather resistance, Tie, '
The compressive stress of the film becomes stronger than the tensile stress of the MgF2 film,
This combination is also unsuitable for multilayer structures as the stresses are not balanced.
ところが、本発明によるＴ ａ 、０．膜とＭ［Ｆ２膜
の組合せに対してイオン照射を行った場合も、Ｔ ａ
、０．膜の圧縮応力とＭｇＦ２膜の引張応力のバランス
がとれており、この組合せは多層構造に適している。However, if T a of the present invention is 0. Even when ion irradiation is performed on the combination of membrane and M[F2 membrane, Ta
,0. The compressive stress of the film and the tensile stress of the MgF2 film are well balanced, and this combination is suitable for a multilayer structure.
（実施例） 以下、実施例に基づき本発明を具体的に説明する。。(Example) Hereinafter, the present invention will be specifically explained based on Examples. .
実施例Ｉ
Ｔ ａ ２Ｏ．膜とＭｇＦ２膜から成る光学多層膜を次
のようにして作成した。Example I T a 2O. An optical multilayer film consisting of a film and an MgF2 film was prepared as follows.
真空蒸着装置において、装置全体を５．ＯＸ １０−ｂ
ｍｍｌｌｇの圧力に排気し、電子ビームにより、Ｔａ２
Ｏ、膜及びＭｇＦ、膜をガラス基板上に蒸着する９７ａ
２Ｏ５膜を蒸着する時のみ、酸素イオンを０．５ｋＶ以
上のイオンエネルギー３０μＡ ／ ｃＪ以上のイオン
電流密度で照射する。In a vacuum evaporation apparatus, the entire apparatus is subjected to 5. OX10-b
It was evacuated to a pressure of mmllg, and Ta2
Depositing O, film and MgF, film on glass substrate 97a
Only when depositing a 2O5 film, oxygen ions are irradiated with an ion energy of 0.5 kV or more and an ion current density of 30 μA/cJ or more.
膜構成は、Ｔａｇｏｓ膜及びＭｇＦ、膜における光の波
長に対して１／４の光学膜厚を、それぞれＨ及びＬとす
ると、ＨＬＨＬＬＨＬＨである。得られた７層誘電体フ
ィルタの湿度に対する光学的シフト量は１ｍｍ以下であ
る。この時のＴａ２Ｏ５膜の応力は３〜４ Ｘ １０”
ｄｙｎ／ ｃａ （圧縮応力）であり、ＭｇＦ２膜の応
力は３〜４ Ｘ １０”ｄｙｎ ／ ｃｌ （引張応力
）であり、互いに反対方向で、はぼ同じ大きさの応力で
ある為、これらの膜を積層すると応力は打ち消され、は
ぼ０となる。The film structure is HLHLLHLH, where H and L are the optical film thicknesses of the Tagos film and MgF film, which are 1/4 of the wavelength of light in the film, respectively. The optical shift amount of the obtained 7-layer dielectric filter with respect to humidity is 1 mm or less. The stress of the Ta2O5 film at this time is 3 to 4 x 10"
dyn/ca (compressive stress), and the stress of the MgF2 film is 3 to 4 x 10" dyn/cl (tensile stress), and these films have stresses in opposite directions and approximately the same magnitude. When stacked, the stress is canceled out and becomes almost zero.
実施例２ 実施例１と同様に光学多層膜を作成した。Example 2 An optical multilayer film was created in the same manner as in Example 1.
但し、この実施例では、Ｔ ａ ２Ｏ．膜を蒸着する時
に酸素イオンを、Ｍ ｇ Ｆ ｚ膜を蒸着する時にフッ
素イオンを０．５ｋＶ以上のイオンエネルギー、３０μ
Ａ ／ ｃｔ１以上のイオン電流密度で照射する。However, in this example, T a 2O. Oxygen ions are used when depositing a film, and fluorine ions are used when depositing a M g F z film at an ion energy of 0.5 kV or more, 30μ.
Irradiate with an ion current density of A/ct1 or higher.
膜構成は、前述のように、ＨＬ ＨＬ Ｌ ＨＬ Ｈで
ある。得られた７層誘電体フィルタの湿度に対する光学
的シフｌ−１は、ｌｎｍ以下である。この時のＴ ａ
、０．膜の応力は３〜４ Ｘ １０’ｄｙｎ／ ｃＪ
（圧縮応力）であり、Ｍ ｇ Ｆ ２膜の応力は、やは
り３〜４Ｘ１０’ｄｙｎ／ｃｆｆｌ （引張応力）であ
り、互いに反対方向で、はぼ同じ大きさの応力である為
、これらの膜を積層した多層膜では応力が打ち消され、
はぼ０となる。The film configuration is HL HL L HL H as described above. The obtained seven-layer dielectric filter has an optical shift l-1 with respect to humidity of 1 nm or less. T a at this time
,0. The stress of the membrane is 3~4 x 10'dyn/cJ
(compressive stress), and the stress of the M g F 2 film is also 3~4X10'dyn/cffl (tensile stress), which is opposite to each other and has approximately the same magnitude of stress, so these films The stress is canceled out in a multilayer film made by laminating
It becomes 0.
比較例１
高屈折率物質としてＴ ａ ２Ｏ３、低屈折率物質とし
てＳｉＯ□を用い湿度に対する光学特性の安定性を考慮
して酸素イオンを０．５ｋＶ以上のイオンエネルギー、
３０μＡ ／ ｃｎ１以上のイオン電流密度にて照射す
る。Comparative Example 1 Using T a 2O3 as a high refractive index material and SiO□ as a low refractive index material, oxygen ions were heated at an ion energy of 0.5 kV or more, taking into consideration the stability of optical properties against humidity.
Irradiate at an ion current density of 30 μA/cn1 or more.
膜構成は、Ｔａ２Ｏ３膜及びＭ ｇ Ｆ ｚ膜における
光の波長に対して１／４の光学膜厚を、それぞれＩ（及
びＬとすると、ＨＬＨＬＬＨＬＨである。得られた７層
誘電体フィルタの湿度に対する光学的シフトｆｆｌは、
ｌｎｍ以下である。この時のＴａｚＯｓ膜の応力は３〜
４ Ｘ １０９ｄｙｎ ／ ａδ（圧縮応力）であり、
Ｓｉｎ、膜の応力も３〜５ Ｘ １０９ｄｙｎ／ ｃｒ
＆ （圧縮応力）である為、これらの積層膜は、同じ方
向の応力（圧縮応力）の積み重ねとなり、応力が強め合
い、基板が反ってしまう。The film structure is HLHLLHLH, where the optical film thickness is 1/4 of the wavelength of light in the Ta2O3 film and the MgFz film, respectively, and I (and L).The humidity of the obtained 7-layer dielectric filter The optical shift ffl for
It is less than lnm. The stress of the TazOs film at this time is 3~
4 × 109dyn/aδ (compressive stress),
Sin, the stress of the film is also 3 to 5 x 109dyn/cr
& (compressive stress), these laminated films are stacked with stress (compressive stress) in the same direction, and the stresses strengthen each other, causing the substrate to warp.
次の表に、実施例と比較例で得られたそれぞれの膜の物
性値を比較する。The following table compares the physical properties of the films obtained in Examples and Comparative Examples.
表
（発明の効果）
本発明によれば光学多層膜をＴ ａ 、０．膜とＭ１ｇ
Ｆ２膜により成膜したので、イオン照射等を行っても、
応力のバランスが崩れない光学多層膜を得ることができ
る。Table (Effects of the Invention) According to the present invention, the optical multilayer film has T a , 0. Membrane and M1g
Since the film was formed using F2 film, even if ion irradiation etc.
It is possible to obtain an optical multilayer film in which the stress balance is not disrupted.
例えば、Ｔ ａ 、０．膜へのイオン照射の条件として
イオンエネルギーをｉ、５ ｋｅＶ 、イオン電流密度
を１００μＡ ／ ｃＩＭまでのイオンを照射しても、
圧縮応力が３〜４ ｄｙｎ ／ ｃＩδ程度で飽和し、
これに対するＭｇＦ２膜も引張応力が３〜４ Ｘ １０
９ｄｙｎ ／ ｃｏ！程度であり、これらの膜を交互に
積層した干渉フィルタは、応力のバランスが取れている
。For example, T a , 0. Even if the membrane is irradiated with ions at an ion energy of i, 5 keV and an ion current density of up to 100 μA/cIM,
The compressive stress is saturated at about 3 to 4 dyn/cIδ,
On the other hand, the MgF2 film also has a tensile stress of 3 to 4 x 10
9dyn/co! An interference filter in which these films are alternately laminated has a well-balanced stress.
従って、膜にクランクが入ったり、基板が反ったりする
ことがない。また、当然イオン照射を行っているので湿
度に対しても安定である。Therefore, the film will not be cranked or the substrate will be warped. Also, since ion irradiation is performed, it is stable against humidity.
第１図は、Ｔ ｉ Ｏ２膜と］’ａ２Ｏ５膜に対して、
イオンエネルギー１．５ ｋｅＶでイオン照射を行った
場合の圧縮応力と引張応力の関係を示すグラフである。
特許出願人 株式会社 コ パ ル代理人弁理士
舟 橋 榮 子；、（
ｉ’２． ｉ′、″・Figure 1 shows that for the T i O2 film and ]'a2O5 film,
It is a graph showing the relationship between compressive stress and tensile stress when ion irradiation is performed at an ion energy of 1.5 keV. Patent applicant Copal Co., Ltd. Representative Patent Attorney Eiko Funahashi; (i'2. i',''・
Claims (2)
層膜。(1) Optical multilayer film having Ta_2O_5 film and MgF_2 film.
いる請求項１記載の光学多層膜。(2) The optical multilayer film according to claim 1, wherein the Ta_2O_5 film is formed by ion irradiation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2396588A JPH01200304A (en) | 1988-02-05 | 1988-02-05 | Multilayered optical film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2396588A JPH01200304A (en) | 1988-02-05 | 1988-02-05 | Multilayered optical film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01200304A true JPH01200304A (en) | 1989-08-11 |
Family
ID=12125262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2396588A Pending JPH01200304A (en) | 1988-02-05 | 1988-02-05 | Multilayered optical film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01200304A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03233501A (en) * | 1990-02-09 | 1991-10-17 | Copal Co Ltd | Optical multilayered film filter element and production thereof |
| EP0709509A1 (en) | 1994-10-25 | 1996-05-01 | Hams Corporation | Method of feeding a piece of tape to a belt loop sewing machine and tape feeder for effecting same |
| JP2005266069A (en) * | 2004-03-17 | 2005-09-29 | Kyocera Corp | Optical filter member and solid-state image pickup device using the same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62195602A (en) * | 1986-02-21 | 1987-08-28 | Minolta Camera Co Ltd | Reflecting mirror |
-
1988
- 1988-02-05 JP JP2396588A patent/JPH01200304A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62195602A (en) * | 1986-02-21 | 1987-08-28 | Minolta Camera Co Ltd | Reflecting mirror |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03233501A (en) * | 1990-02-09 | 1991-10-17 | Copal Co Ltd | Optical multilayered film filter element and production thereof |
| EP0709509A1 (en) | 1994-10-25 | 1996-05-01 | Hams Corporation | Method of feeding a piece of tape to a belt loop sewing machine and tape feeder for effecting same |
| JP2005266069A (en) * | 2004-03-17 | 2005-09-29 | Kyocera Corp | Optical filter member and solid-state image pickup device using the same |
| JP4632680B2 (en) * | 2004-03-17 | 2011-02-16 | 京セラ株式会社 | Optical filter member and solid-state imaging device using the same |
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