JPH01166049A - Numbering exposure device - Google Patents
Numbering exposure deviceInfo
- Publication number
- JPH01166049A JPH01166049A JP62324464A JP32446487A JPH01166049A JP H01166049 A JPH01166049 A JP H01166049A JP 62324464 A JP62324464 A JP 62324464A JP 32446487 A JP32446487 A JP 32446487A JP H01166049 A JPH01166049 A JP H01166049A
- Authority
- JP
- Japan
- Prior art keywords
- photomasks
- numbering
- exposure
- symbols
- circular
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 208000003580 polydactyly Diseases 0.000 claims 1
- 238000000059 patterning Methods 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は基板に管理記号等をパターンニングする露光装
置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an exposure apparatus for patterning control symbols and the like on a substrate.
従来、第2図に示すように一枚のフォトマスク1を用い
、そのフォトマスクの回転及び基板2のピッチ送りを繰
り返し一桁づつ露光する時分割露光方式により、所定の
管理記号をパターンニングするナンバリング露光装置が
知られていた。Conventionally, as shown in FIG. 2, a predetermined control symbol is patterned using a time-division exposure method in which a single photomask 1 is used and the photomask is rotated and the substrate 2 is pitched repeatedly to expose one digit at a time. A numbering exposure device was known.
しかし従来のナンバリング露光装置では、時分割露光に
より複数回の露光を行う為に、ナンバリングに要するタ
クトタイムが長くなるという問題点を有する。そこで本
発明はこのような問題点を解決するもので、その目的と
するところは数桁の管理記号を一括露光でパターンニン
グするところにある。However, the conventional numbering exposure apparatus has a problem in that the takt time required for numbering becomes long because exposure is performed multiple times by time-division exposure. The present invention is intended to solve these problems, and its purpose is to pattern control symbols of several digits by batch exposure.
本発明のナンバリング露光装置は、円周上に記号が配列
されている円形フォトマスク四枚と、それぞれの円形フ
ォトマスクを独立に回転駆動できる機構とを有し、これ
らの円形フォトマスクを二枚づつ同一軸上に二段に配置
し、かつこれを二組つき合わせるように配置することに
より、これらの接点部分または近接部分において各フォ
トマスクの記号の組合せにより複数桁の管理記号を任意
に構成し、かつ前記管理記号を一括露光することを特徴
とする。The numbering exposure apparatus of the present invention has four circular photomasks in which symbols are arranged on the circumference, and a mechanism that can rotate each circular photomask independently. By arranging the photomasks in two stages on the same axis and arranging the two pairs side by side, a multi-digit control symbol can be arbitrarily configured by combining the symbols of each photomask at these contact points or adjacent areas. and the control symbol is exposed all at once.
第1図は本発明の実施例における概略図であって、円形
上に二指の記号が配列されている円形フォトマスク1a
と1b及び1cと1dをそれぞれ同一軸上に二段に配置
し、この二組をつき合わせ、これらの接点部分または近
接部分において各フォトマスクの記号の組合せにより8
桁の管理記号を構成している。それぞれの円形フォトマ
スクはパルスモータ−3により独立に回転駆動でき、露
光前に任意の管理記号に設定される。4〜12は露光光
学系であり、所定の管理記号を一括露光する。FIG. 1 is a schematic diagram of an embodiment of the present invention, and shows a circular photomask 1a in which two-finger symbols are arranged on a circle.
1b, 1c, and 1d are arranged in two stages on the same axis, and these two sets are brought together, and 8 is formed by combining the symbols of each photomask at the contact points or adjacent parts.
It constitutes a control symbol for digits. Each circular photomask can be rotated independently by a pulse motor 3, and is set to an arbitrary control symbol before exposure. 4 to 12 are exposure optical systems, which collectively expose predetermined management symbols.
第3図はフォトマスクの配置図。第4図はフォトマスク
駆動部の詳細図で、紫外光は窓14より照射され、八0
00−000という管理記号が基板2に露光される。本
実施例ではフォトマスク1aと1c及び1bと1dは同
一平面になるよう配置しており、これによりフォトマス
クと基板との間隔を最小にし、露光解像度を高めている
。またフォトマスクのCr面を、1aとICは上面に、
1bと1dは下面にすることにより、露光解像度をでき
るだけ均一にしている。また本実施例ではフォトマスク
がネガタイプである為、フォトマスク1a、1dの外周
がわずかに重なり合うようマスク径を設定している。こ
うすることにより上位4桁と下位4桁の記号の間に光の
もれがなくなる。Figure 3 is a layout diagram of the photomask. FIG. 4 is a detailed diagram of the photomask drive section, in which ultraviolet light is irradiated from the window 14,
A control symbol 00-000 is exposed on the substrate 2. In this embodiment, the photomasks 1a and 1c and 1b and 1d are arranged on the same plane, thereby minimizing the distance between the photomasks and the substrate and increasing the exposure resolution. In addition, the Cr surface of the photomask is placed on the top surface of 1a and the IC.
By placing 1b and 1d on the bottom surface, the exposure resolution is made as uniform as possible. Furthermore, in this embodiment, since the photomasks are of a negative type, the mask diameters are set so that the outer peripheries of the photomasks 1a and 1d slightly overlap. This eliminates light leakage between the upper four digits and the lower four digit symbols.
本発明は以上説明したように、所定の管理記号を複数枚
のフォトマスクの記号の組合せにより構成し、これを−
括露光でパターンニングすることにより、ナンバリング
に要するタクトタイムが短かくなるという効果を有する
。As explained above, the present invention configures a predetermined management symbol by a combination of symbols of a plurality of photomasks, and
Patterning by continuous exposure has the effect of shortening the takt time required for numbering.
第1図は本発明のナンバリング露光装置の概略図、
第2図は従来のナンバリング露光装置の概略図、第3図
は本発明の実施例におけるフォトマスクの配置図。
第4図はフォトマスク駆動部の詳細図。
1・・・フォトマスク 2・・・基板3・・・パルス
モータ−4・・・コリメータレンズ5・・・ミラー 6
・・・鏡筒 7・・・出射レンズ8・・・ファイバーラ
イトガイド 9・・・入射レンズ10・・・コールドミ
ラー 11・・・楕円ミラー12・・・水銀ショートア
ークランプ
13・・・タイミングベルト 14・・・露光窓15・
・・軸受 16・・・カップリング以上
出願人 セイコーエプソン株式会社
づ−FIG. 1 is a schematic diagram of a numbering exposure apparatus according to the present invention, FIG. 2 is a schematic diagram of a conventional numbering exposure apparatus, and FIG. 3 is a layout diagram of a photomask in an embodiment of the present invention. FIG. 4 is a detailed diagram of the photomask drive section. 1... Photomask 2... Substrate 3... Pulse motor 4... Collimator lens 5... Mirror 6
... Lens tube 7 ... Output lens 8 ... Fiber light guide 9 ... Input lens 10 ... Cold mirror 11 ... Elliptical mirror 12 ... Mercury short arc lamp 13 ... Timing belt 14... Exposure window 15.
...Bearings 16...Couplings and above Applicant: Seiko Epson Corporation
Claims (1)
いて、円周上に記号が配列されている円形フォトマスク
四枚と、それぞれの円形フォトマスクを独立に回転駆動
できる機構とを有し、これらの円形フォトマスクを二枚
づつ同一軸上に二段に配置し、かつこれを二組つき合わ
せるように配置することにより、これらの接点部分また
は近接部分において各フォトマスクの記号の組合せによ
り複数桁の管理記号を任意に構成し、かつ前記管理記号
を一括露光することを特徴とするナンバリング露光装置
。An exposure device that patterns control symbols etc. on a substrate has four circular photomasks with symbols arranged on the circumference and a mechanism that can rotate each circular photomask independently. By arranging two photomasks in two stages on the same axis and arranging the two sets so that they meet, multiple digits can be managed by combining the symbols of each photomask at the contact points or adjacent areas. A numbering exposure apparatus characterized in that symbols are arbitrarily configured and the management symbols are exposed all at once.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62324464A JPH01166049A (en) | 1987-12-22 | 1987-12-22 | Numbering exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62324464A JPH01166049A (en) | 1987-12-22 | 1987-12-22 | Numbering exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01166049A true JPH01166049A (en) | 1989-06-29 |
Family
ID=18166104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62324464A Pending JPH01166049A (en) | 1987-12-22 | 1987-12-22 | Numbering exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01166049A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003076026A (en) * | 2001-09-05 | 2003-03-14 | Sumitomo Special Metals Co Ltd | Method for recording identification information, and photomask set |
-
1987
- 1987-12-22 JP JP62324464A patent/JPH01166049A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003076026A (en) * | 2001-09-05 | 2003-03-14 | Sumitomo Special Metals Co Ltd | Method for recording identification information, and photomask set |
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