JPH01166049A - Numbering exposure device - Google Patents

Numbering exposure device

Info

Publication number
JPH01166049A
JPH01166049A JP62324464A JP32446487A JPH01166049A JP H01166049 A JPH01166049 A JP H01166049A JP 62324464 A JP62324464 A JP 62324464A JP 32446487 A JP32446487 A JP 32446487A JP H01166049 A JPH01166049 A JP H01166049A
Authority
JP
Japan
Prior art keywords
photomasks
numbering
exposure
symbols
circular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62324464A
Other languages
Japanese (ja)
Inventor
Kazuhiko Okamura
和彦 岡村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP62324464A priority Critical patent/JPH01166049A/en
Publication of JPH01166049A publication Critical patent/JPH01166049A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To shorten the processing cycle time required for numbering by combining codes of plural photomasks to constitute a prescribed management code and patterning this code with collective exposure. CONSTITUTION:Circular photomasks 1a and 1b where two-digit codes are arranged on circles are arranged on the same axis in two stages, and similar circular photomasks 1c and 1d are arranged on the same axis in two stages, and these two pairs of photomasks are butted, and codes of these masks 1a-1d are combined in the contact part or the close part between them to constitute an eight-digit management code. Respective circular photomasks 1a-1d are rotated and driven independently of one another by a pulse motor 3 and are set for an arbitrary management code before exposure. Exposure optical systems 4-12 collectively expose the prescribed management code. Thus, the processing cycle time required for numbering is shortened.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は基板に管理記号等をパターンニングする露光装
置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an exposure apparatus for patterning control symbols and the like on a substrate.

〔従来の技術〕[Conventional technology]

従来、第2図に示すように一枚のフォトマスク1を用い
、そのフォトマスクの回転及び基板2のピッチ送りを繰
り返し一桁づつ露光する時分割露光方式により、所定の
管理記号をパターンニングするナンバリング露光装置が
知られていた。
Conventionally, as shown in FIG. 2, a predetermined control symbol is patterned using a time-division exposure method in which a single photomask 1 is used and the photomask is rotated and the substrate 2 is pitched repeatedly to expose one digit at a time. A numbering exposure device was known.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし従来のナンバリング露光装置では、時分割露光に
より複数回の露光を行う為に、ナンバリングに要するタ
クトタイムが長くなるという問題点を有する。そこで本
発明はこのような問題点を解決するもので、その目的と
するところは数桁の管理記号を一括露光でパターンニン
グするところにある。
However, the conventional numbering exposure apparatus has a problem in that the takt time required for numbering becomes long because exposure is performed multiple times by time-division exposure. The present invention is intended to solve these problems, and its purpose is to pattern control symbols of several digits by batch exposure.

〔問題点を解決するための手段〕[Means for solving problems]

本発明のナンバリング露光装置は、円周上に記号が配列
されている円形フォトマスク四枚と、それぞれの円形フ
ォトマスクを独立に回転駆動できる機構とを有し、これ
らの円形フォトマスクを二枚づつ同一軸上に二段に配置
し、かつこれを二組つき合わせるように配置することに
より、これらの接点部分または近接部分において各フォ
トマスクの記号の組合せにより複数桁の管理記号を任意
に構成し、かつ前記管理記号を一括露光することを特徴
とする。
The numbering exposure apparatus of the present invention has four circular photomasks in which symbols are arranged on the circumference, and a mechanism that can rotate each circular photomask independently. By arranging the photomasks in two stages on the same axis and arranging the two pairs side by side, a multi-digit control symbol can be arbitrarily configured by combining the symbols of each photomask at these contact points or adjacent areas. and the control symbol is exposed all at once.

〔実施例〕〔Example〕

第1図は本発明の実施例における概略図であって、円形
上に二指の記号が配列されている円形フォトマスク1a
と1b及び1cと1dをそれぞれ同一軸上に二段に配置
し、この二組をつき合わせ、これらの接点部分または近
接部分において各フォトマスクの記号の組合せにより8
桁の管理記号を構成している。それぞれの円形フォトマ
スクはパルスモータ−3により独立に回転駆動でき、露
光前に任意の管理記号に設定される。4〜12は露光光
学系であり、所定の管理記号を一括露光する。
FIG. 1 is a schematic diagram of an embodiment of the present invention, and shows a circular photomask 1a in which two-finger symbols are arranged on a circle.
1b, 1c, and 1d are arranged in two stages on the same axis, and these two sets are brought together, and 8 is formed by combining the symbols of each photomask at the contact points or adjacent parts.
It constitutes a control symbol for digits. Each circular photomask can be rotated independently by a pulse motor 3, and is set to an arbitrary control symbol before exposure. 4 to 12 are exposure optical systems, which collectively expose predetermined management symbols.

第3図はフォトマスクの配置図。第4図はフォトマスク
駆動部の詳細図で、紫外光は窓14より照射され、八0
00−000という管理記号が基板2に露光される。本
実施例ではフォトマスク1aと1c及び1bと1dは同
一平面になるよう配置しており、これによりフォトマス
クと基板との間隔を最小にし、露光解像度を高めている
。またフォトマスクのCr面を、1aとICは上面に、
1bと1dは下面にすることにより、露光解像度をでき
るだけ均一にしている。また本実施例ではフォトマスク
がネガタイプである為、フォトマスク1a、1dの外周
がわずかに重なり合うようマスク径を設定している。こ
うすることにより上位4桁と下位4桁の記号の間に光の
もれがなくなる。
Figure 3 is a layout diagram of the photomask. FIG. 4 is a detailed diagram of the photomask drive section, in which ultraviolet light is irradiated from the window 14,
A control symbol 00-000 is exposed on the substrate 2. In this embodiment, the photomasks 1a and 1c and 1b and 1d are arranged on the same plane, thereby minimizing the distance between the photomasks and the substrate and increasing the exposure resolution. In addition, the Cr surface of the photomask is placed on the top surface of 1a and the IC.
By placing 1b and 1d on the bottom surface, the exposure resolution is made as uniform as possible. Furthermore, in this embodiment, since the photomasks are of a negative type, the mask diameters are set so that the outer peripheries of the photomasks 1a and 1d slightly overlap. This eliminates light leakage between the upper four digits and the lower four digit symbols.

〔発明の効果〕〔Effect of the invention〕

本発明は以上説明したように、所定の管理記号を複数枚
のフォトマスクの記号の組合せにより構成し、これを−
括露光でパターンニングすることにより、ナンバリング
に要するタクトタイムが短かくなるという効果を有する
As explained above, the present invention configures a predetermined management symbol by a combination of symbols of a plurality of photomasks, and
Patterning by continuous exposure has the effect of shortening the takt time required for numbering.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のナンバリング露光装置の概略図、 第2図は従来のナンバリング露光装置の概略図、第3図
は本発明の実施例におけるフォトマスクの配置図。 第4図はフォトマスク駆動部の詳細図。 1・・・フォトマスク  2・・・基板3・・・パルス
モータ−4・・・コリメータレンズ5・・・ミラー 6
・・・鏡筒 7・・・出射レンズ8・・・ファイバーラ
イトガイド 9・・・入射レンズ10・・・コールドミ
ラー 11・・・楕円ミラー12・・・水銀ショートア
ークランプ 13・・・タイミングベルト 14・・・露光窓15・
・・軸受 16・・・カップリング以上 出願人 セイコーエプソン株式会社 づ−
FIG. 1 is a schematic diagram of a numbering exposure apparatus according to the present invention, FIG. 2 is a schematic diagram of a conventional numbering exposure apparatus, and FIG. 3 is a layout diagram of a photomask in an embodiment of the present invention. FIG. 4 is a detailed diagram of the photomask drive section. 1... Photomask 2... Substrate 3... Pulse motor 4... Collimator lens 5... Mirror 6
... Lens tube 7 ... Output lens 8 ... Fiber light guide 9 ... Input lens 10 ... Cold mirror 11 ... Elliptical mirror 12 ... Mercury short arc lamp 13 ... Timing belt 14... Exposure window 15.
...Bearings 16...Couplings and above Applicant: Seiko Epson Corporation

Claims (1)

【特許請求の範囲】[Claims]  基板に管理記号等をパターンニングする露光装置にお
いて、円周上に記号が配列されている円形フォトマスク
四枚と、それぞれの円形フォトマスクを独立に回転駆動
できる機構とを有し、これらの円形フォトマスクを二枚
づつ同一軸上に二段に配置し、かつこれを二組つき合わ
せるように配置することにより、これらの接点部分また
は近接部分において各フォトマスクの記号の組合せによ
り複数桁の管理記号を任意に構成し、かつ前記管理記号
を一括露光することを特徴とするナンバリング露光装置
An exposure device that patterns control symbols etc. on a substrate has four circular photomasks with symbols arranged on the circumference and a mechanism that can rotate each circular photomask independently. By arranging two photomasks in two stages on the same axis and arranging the two sets so that they meet, multiple digits can be managed by combining the symbols of each photomask at the contact points or adjacent areas. A numbering exposure apparatus characterized in that symbols are arbitrarily configured and the management symbols are exposed all at once.
JP62324464A 1987-12-22 1987-12-22 Numbering exposure device Pending JPH01166049A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62324464A JPH01166049A (en) 1987-12-22 1987-12-22 Numbering exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62324464A JPH01166049A (en) 1987-12-22 1987-12-22 Numbering exposure device

Publications (1)

Publication Number Publication Date
JPH01166049A true JPH01166049A (en) 1989-06-29

Family

ID=18166104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62324464A Pending JPH01166049A (en) 1987-12-22 1987-12-22 Numbering exposure device

Country Status (1)

Country Link
JP (1) JPH01166049A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003076026A (en) * 2001-09-05 2003-03-14 Sumitomo Special Metals Co Ltd Method for recording identification information, and photomask set

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003076026A (en) * 2001-09-05 2003-03-14 Sumitomo Special Metals Co Ltd Method for recording identification information, and photomask set

Similar Documents

Publication Publication Date Title
US20060243713A1 (en) Method and device for marking identification code by laser beam
WO2017067239A1 (en) Mask plate and manufacturing method thereof, method using mask plate to compose pattern, and filter
JPH01166049A (en) Numbering exposure device
JPS60164324A (en) Device and method for treating rotary repeat lithography
JPH01166048A (en) Numbering exposure device
WO2010125823A1 (en) Color filter, liquid crystal display device, and method for manufacturing color filter
JPS57183031A (en) Method for wafer exposure and device thereof
JPH01166047A (en) Numbering exposure device
KR20110103422A (en) Method for forming projected pattern, exposure apparatus and photomask
JP3950518B2 (en) Method for manufacturing diffractive optical element
KR20170089761A (en) Exposure apparatus
JPH0845823A (en) Exposure device and its method
JP4791630B2 (en) Exposure equipment
JP2886408B2 (en) Double-sided pattern forming method
JPS62157035A (en) Production of mask plate
US3582208A (en) Method and means for producing multidensity tint screens
JPS60221757A (en) Mask for exposure
JPS61164223A (en) Printing exposure method by photo-repeater
JPH07108623A (en) Manufacture of composite optical element
JP2006010973A (en) Method for manufacturing micro lens array
JP5709495B2 (en) Exposure equipment
KR970007433B1 (en) Double photo treating process using image reverse photoresist
JPH05262537A (en) Production of perforated member
KR20050011378A (en) Photo exposing method of liquid crystal display device
CN115390367A (en) Photoetching device and preparation method and application method thereof