JPH05262537A - Production of perforated member - Google Patents

Abstract

PURPOSE:To readily form a through-hole having a truncated conical part in at least a part of a photosensitive glass substrate. CONSTITUTION:A light transmitting part (2a) of a photomask 2 is opposite onto a part where a through hole is to be formed in a photosensitive glass substrate 4. A reflecting plate 3 is opposite to the bottom of the part where the through hole is to be formed. Parallel rays of light for exposure are tilted at a prescribed angle from the normal direction of the photosensitive glass substrate 4, which is rotated while being exposed to light. Thereby, an exposed part having a truncated conical part can be formed in at least a part of the photosensitive glass substrate 4. The photosensitive glass substrate 4 can be crystallized and then etched to form the through hole (5a) having the central constricted part. Plural light transmitting parts or reflecting plates are provided and the sizes and shapes thereof are respectively varied according to the shape of the through hole. Thereby, the plural through holes of various shapes can be formed in the photosensitive glass substrate by exposure and etching treatment at a time.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a holed member used for an ion flow head, a wire guide of a printer head, a nozzle plate of an ink jet printer or the like.

[0002]

2. Description of the Related Art A photosensitive glass can be crystallized by heat development by irradiating it with ultraviolet rays having a wavelength of 300 to 320 nm, for example. This crystalline portion can be cut at a speed 20 times or more that of the non-crystalline portion by etching with hydrogen fluoride (HF), for example, so that various fine processing can be performed. Irradiation (exposure) with ultraviolet rays is performed with a mask aligner or the like using a mercury lamp.

In a normal mask aligner or the like, since the irradiation light is parallel, it is difficult to expose the photosensitive glass in a shape angled with respect to the thickness direction of the photosensitive glass, that is, in a tapered shape. Difficult to form in a waisted shape.

The photosensitive glass has a high etching ratio,
Although it is said that it is possible to process a three-dimensional shape, in reality, almost no such processing is performed.
This is because there is no means for easily performing dimensional exposure.

Therefore, an object of the present invention is to easily form a through hole having a truncated cone-shaped portion on at least a part of the photosensitive glass substrate.

[0006]

In order to achieve the above object, the first method for manufacturing a member with a hole according to the present invention comprises a light source on one surface of a photosensitive glass substrate through a light transmitting portion of a photomask. An exposure step of irradiating parallel rays to perform exposure,
In a method of manufacturing a member having a hole, which comprises a heat treatment step of heat-treating an exposed portion to form a crystal portion and an etching step of etching the crystal portion to form a through hole, light transmission of the other surface of the photosensitive glass substrate. Reflecting plates are juxtaposed to the portions corresponding to the portions, and in the exposure step, one surface is irradiated with parallel light rays in various directions in a state of being inclined at a predetermined angle with respect to the center line direction of the through hole.

In the second method for manufacturing a member with holes according to the present invention, the photomask has a plurality of through holes,
A pattern of a plurality of light transmitting portions is provided, and the pattern of the reflecting plate is juxtaposed on the other surface of the photosensitive glass substrate at a portion corresponding to all or a part of the light transmitting portions, and the penetrating in the exposure step. The parallel rays are applied to the one surface from various directions in a state of being inclined at a predetermined angle from the center line direction of the hole.

In the second method for manufacturing a member with holes, the light transmitting portion and the reflecting plate may be different in shape or size corresponding to the shape of the through hole to be formed.

In the method of manufacturing the first and second holed members, the light transmitting portion may be a hole portion formed in the photomask.

[0010]

According to the first method for manufacturing a member with holes according to the present invention, one surface of the photosensitive glass substrate is irradiated with a parallel light beam from the light source through the light transmitting portion of the photomask to expose the photosensitive glass substrate, A reflector is juxtaposed to a portion of the other surface of the glass substrate corresponding to the light transmitting portion, and the parallel light rays for exposure are inclined at a predetermined angle from the center line direction of the through hole. Depending on the angle formed by the parallel rays and the center line direction of the through hole, the shape of the light transmission part, and the shape of the reflector, the incident light of the parallel rays to the photosensitive glass substrate, the angle of the reflected light, and the exposure range can be adjusted. It is possible to form an exposure portion having a desired shape having a truncated cone shape portion on at least a part of the glass substrate.

According to the second method for manufacturing a member with holes according to the present invention, the photomask is provided with a plurality of patterns of light transmitting portions, and the other surface of the photosensitive glass substrate is formed.
The patterns of the reflecting plates are juxtaposed on all or some of the portions corresponding to the light transmitting portions. Therefore, in the same manner as in the method for manufacturing the first member with holes, it is possible to form a plurality of exposure portions each having a truncated cone-shaped portion on at least a part thereof on the photosensitive glass substrate by one exposure. Further, in the second method for manufacturing a member with holes, if the light transmitting portion and the reflecting plate are made to have different shapes or sizes corresponding to the shapes of the through holes, various shapes can be formed on the photosensitive glass substrate. It is possible to form a plurality of exposed portions by one exposure.

[0012]

Embodiments of the present invention will be described below with reference to the drawings.

As shown in FIG. 1, the apparatus according to the present embodiment comprises a parallel light exposure apparatus 1, a photosensitive glass substrate 4, a photomask 2, a reflector 3 and a photosensitive glass substrate rotating apparatus (not shown). .

The reflecting plate 3 is preferably one that efficiently reflects the wavelength of light used for exposure, and a thin film of Cr or Al is suitable. In this embodiment, the reflector 3 is made of Cr and is formed directly on the photosensitive glass substrate. For the photomask 2, an acrylic resin that absorbs ultraviolet rays well is dyed black. The photomask 2 and the reflection plate 3 are arranged so as to be in close contact with the front surface and the back surface of a plate-shaped photosensitive glass substrate 4 whose patterning surfaces are polished. The exposure hole (light transmitting portion) 2a of the photomask and the reflecting plate 3 face the portion where the through hole is formed.

A parallel light exposure device 1 is provided above the photosensitive glass 4.

The rotating shaft 6 of the photosensitive glass substrate rotating device is
It coincides with the center line direction of the through hole to be formed, and it is inclined at a desired angle θ with respect to the light beam emitted from the parallel light exposure device 1.

The operation will be described. The light source irradiates the photosensitive glass substrate 4 with parallel light rays (XeCl excimer laser) through the exposure hole 2a of the photomask. The parallel light rays are incident on the upper surface of the photosensitive glass substrate 4 and travel inside the photosensitive glass substrate 4. After that, among the parallel rays traveling in the photosensitive glass substrate 4, those which face the reflecting plate 3 are
The light is reflected by the reflection plate 3, travels through the photosensitive glass substrate 4 again, and is absorbed by the back surface of the photomask 2.

On the other hand, the remaining parallel light rays traveling in the photosensitive glass substrate 4 pass through the photosensitive glass substrate 4 and proceed downward as they are. By rotating the photosensitive glass substrate 4 by 360 ° by the photosensitive glass rotating device while performing the exposure, it is possible to perform the exposure in the shape in which the center is narrowed.

When the exposure is completed, the photomask 2 is removed and the reflection plate 3 formed on the photosensitive glass substrate 4 is removed by etching using a TW liquid for chromium etching. After that, the photosensitive glass substrate 4 is heated to a high temperature of about 500 to 700 ° C. to perform a heat development step of crystallizing the exposed portion.

Next, the photosensitive glass substrate 4 is subjected to etching by showering an etching solution composed of a hydrofluoric acid (HF) solution of 5 to 10% in a shower shape.

As described above, the through hole 5a having a narrowed center can be formed by melting the exposed portion by etching or the like as shown in FIG.

The second embodiment of the present invention will be described below.

As shown in FIG. 3, the photomask 12 and the pattern 13 of the reflection plate have patterning surfaces on the front and back surfaces of the photosensitive glass substrate 14, respectively. The photomask 12 has a plurality of patterns 12a, 12b, 12c of exposure holes (light transmitting portions) corresponding to the plurality of through holes.
Is provided. The pattern 13 of the reflector is the reflector 13a,
13b, and the reflectors 13a and 13b are juxtaposed to the portions corresponding to the exposure holes 12a and 12c.
The shapes or sizes of the a, 12b, 12c and the reflectors 13a, 13b are determined according to the shape of the through holes to be formed.

The operation will be described. By rotating the photosensitive glass substrate 14 by 360 ° by the photosensitive glass substrate rotating device while performing exposure as in the first embodiment, at least the photosensitive glass substrate 14 is exposed. It is possible to form a plurality of exposed portions of various shapes, each of which has a truncated cone-shaped portion, in a single exposure, and to form through holes corresponding to them in the photosensitive glass substrate 14.

That is, in the portion of the photosensitive glass substrate 14 facing the exposure hole 12a and the reflection plate 13a, the through hole 5b having a narrowed center can be formed in the same manner as in the first embodiment.
Since no reflecting plate is provided on a portion of the back surface of the photosensitive glass substrate 14 corresponding to the exposure hole 12b, a through hole 5c having a trapezoidal rotating body with a wide back surface is formed in this portion.

Further, the reflecting plate 13b has a width that opposes all the parallel rays incident on the photosensitive glass substrate 14 through the exposure hole 12c, and thereby all the parallel rays incident on the photosensitive glass substrate 14 are made. By the reflection, a through hole 5d having a trapezoidal rotating body with a wide front surface side is formed.

The present invention is not limited to the above embodiment, for example, the parallel light beam may not be the XeCl excimer laser,
Other ultraviolet rays may be used. The photomask may be a transparent photomask substrate on which a light-shielding film having an exposure hole is formed.

Further, the reflecting plate does not necessarily have to be formed on the photosensitive glass substrate and may be in close contact with the photosensitive glass substrate. The photomask may be provided above the photosensitive glass substrate.

Further, the exposure light source may be moved and rotated so that the exposure light beam is incident on the surface of the photosensitive glass substrate at a predetermined angle without rotating the photosensitive glass substrate itself.

[0030]

According to the first method of manufacturing a member with holes according to the present invention, one surface of a photosensitive glass substrate is irradiated with a parallel light beam from a light source through a light transmitting portion of a photomask to be exposed, A reflecting plate is juxtaposed to a portion of the other surface of the photosensitive glass substrate corresponding to the light transmitting portion, and the parallel light rays for exposure are inclined at a predetermined angle from the center line direction of the through hole. Thereby, by the angle formed by the parallel rays and the center line direction of the through hole, the shape of the light transmitting portion, the shape of the reflector, the incident light of the parallel rays to the photosensitive glass substrate, the angle of the reflected light, the exposure range can be adjusted, This makes it possible to easily form an exposed portion having a desired shape having a truncated cone-shaped portion on at least a part of the photosensitive glass substrate.

Further, according to the second method for manufacturing a member with holes according to the present invention, the photomask is provided with a plurality of patterns of light transmitting portions, and the photomask has the other surface of the photosensitive glass substrate.
The patterns of the reflecting plates are juxtaposed on all or some of the portions corresponding to the light transmitting portions. Therefore, in the same manner as in the method for manufacturing the first member with holes, it is possible to form a plurality of exposure portions each having a truncated cone-shaped portion on at least a part thereof on the photosensitive glass substrate by one exposure. Further, in the second method for manufacturing a member with holes, if the light transmitting portion and the reflecting plate have different shapes corresponding to the shape of the through hole, the photosensitive glass substrate can be provided with exposed portions of various shapes. A plurality of layers can be formed by one exposure.

[Brief description of drawings]

FIG. 1 is a partial cross-sectional side view showing a method for manufacturing a holed portion according to the present invention.

FIG. 2 is a perspective view of a photosensitive glass substrate to which the above processing method is applied.

FIG. 3 is a cross-sectional view showing a processing method of the second example above.

[Explanation of symbols]

 2, 12 Photomask 2a Light-transmitting part 3 Reflector 4, 14 Photosensitive glass substrate 5a, 5b, 5c, 5d Through-hole 6 Center line of through-hole 12a, 12b, 12c Light-transmitting part pattern 13 Reflector pattern

Claims (4)

[Claims] 1. An exposing step of exposing parallel light from a light source to one surface of a photosensitive glass substrate through a light transmitting portion of a photomask to perform exposure, and heat treating the exposed portion to form a crystal portion. In a method for manufacturing a holed member including a heat treatment step and an etching step of etching the crystal part to form a through hole, a reflection plate is provided on a part of the other surface of the photosensitive glass substrate corresponding to the light transmitting part. And arranging them in parallel, and irradiating the one surface with the parallel rays in various directions in a state of being inclined at a predetermined angle from the center line direction of the through hole in the exposure step. 2. An exposing step of exposing parallel light rays from a light source to one surface of a photosensitive glass substrate through a light transmitting portion of a photomask to perform exposure, and heat treating the exposing portion to form a crystal portion. In a method of manufacturing a holed member including a heat treatment step and an etching step of etching the crystal part to form a through hole, the photomask includes a plurality of through holes,
A plurality of patterns of the light-transmitting portion are provided, and on the other surface of the photosensitive glass substrate, the pattern of the reflecting plate is juxtaposed to a portion corresponding to all or part of the light-transmitting portion, and the exposing step is performed. In the method for producing a holed member, the parallel light rays are irradiated to the one surface from various directions in a state of being inclined at a predetermined angle with respect to the center line direction of the through hole. 3. The manufacturing of a perforated member according to claim 2, wherein the light transmitting portion and the reflecting plate have different shapes or sizes corresponding to the shapes of the through holes to be formed. Method. 4. The method for manufacturing a member with holes according to claim 1, wherein the light transmitting part is a hole formed in the photomask.