JPH01164553A - Chamfering working device for magnetic head - Google Patents
Chamfering working device for magnetic headInfo
- Publication number
- JPH01164553A JPH01164553A JP32127287A JP32127287A JPH01164553A JP H01164553 A JPH01164553 A JP H01164553A JP 32127287 A JP32127287 A JP 32127287A JP 32127287 A JP32127287 A JP 32127287A JP H01164553 A JPH01164553 A JP H01164553A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- tape
- elastic body
- polishing tape
- chamfering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 claims abstract description 28
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 229910010293 ceramic material Inorganic materials 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 235000009852 Cucurbita pepo Nutrition 0.000 description 1
- 241000219104 Cucurbitaceae Species 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は磁気ディスク用磁気ヘッド等の磁気ヘッドの
稜線部の面取加工を行なう面取加工装置に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a chamfering device for chamfering the ridgeline portion of a magnetic head such as a magnetic head for a magnetic disk.
第５図に示すような磁気ディスク用磁気ヘッド１０を用
いて磁気ディスク（図示せず）に記録、再生を行なう場
合には、記録、再生を行なわないときには、磁気ヘッド
１０が磁気ディスクに接しているが、記録、再生を行な
っているときには、磁気ヘッド１０が磁気ディスクから
約α３μ肩浮上するから、記録、再生を繰り返すと、磁
気ヘッド１０が浮上、接地を繰り返す。そして、磁気ヘ
ッド１０の外積線部１０Ａ 、内稜線部１０ｃに微細な
面取加工を行なうと、浮上−接地の繰返特性が向上する
。When recording or reproducing information on a magnetic disk (not shown) using a magnetic head 10 for a magnetic disk as shown in FIG. 5, when recording or reproducing is not performed, the magnetic head 10 is in contact with the magnetic disk. However, during recording and reproduction, the magnetic head 10 floats from the magnetic disk by about α3μ, so when recording and reproduction are repeated, the magnetic head 10 repeatedly floats and lands. When the outer stack line portion 10A and inner ridge line portion 10c of the magnetic head 10 are finely chamfered, the repeatability of floating and grounding is improved.
従来の磁気ヘッドの面取加工装置においては。In a conventional magnetic head chamfering device.
特公昭５７−５６１０５号公報に示されるように、平板
状に基台の上に弾性体シートを載せ、弾性体シートの上
に研磨フィルムを載置し、スイングアームに磁気ヘッド
１０を取り付け、磁気ヘッド１０の磁気ディスク対向面
１０αを研磨フィルムに圧接した状態としたのち、スイ
ングアームな揺動している。As shown in Japanese Patent Publication No. 57-56105, an elastic sheet is placed on a flat base, a polishing film is placed on the elastic sheet, and a magnetic head 10 is attached to a swing arm. After the magnetic disk facing surface 10α of the head 10 is brought into pressure contact with the polishing film, the head 10 swings like a swing arm.
この磁気ヘッドの面取加工装置においては、スイングア
ームな揺動すると、研磨フィルムが揺動面と直角な外積
線部１０Ａに押されて１弾性体シートが変形するから、
研磨フィルムが凹状となり。In this magnetic head chamfering device, when the swing arm swings, the polishing film is pushed by the outer laminated line portion 10A perpendicular to the swinging surface and the first elastic sheet is deformed.
The polishing film becomes concave.
揺動面と直角な外積線部１０Ａが研磨フィルムと接する
から、揺動面と直角な外波線部１０Ａの面取加工を行な
うことができる。Since the outer wavy line portion 10A, which is perpendicular to the swinging surface, contacts the polishing film, the outer wavy line portion 10A, which is perpendicular to the swinging surface, can be chamfered.
しかし、このよ５な磁気ヘッドの面取加工装置において
は、揺動面と平行な外波線部１０ｂ、内稜線部１０１！
−が研磨フィルムと接しないので、揺動面と平行な外積
線部１０ｂ、内稜線部１０ｃの面取加工を行なうことが
できない。However, in this type of magnetic head chamfering device, the outer wavy line portion 10b, the inner ridge line portion 101, which is parallel to the swinging surface!
- does not come into contact with the polishing film, so it is not possible to chamfer the outer laminated line portion 10b and inner ridgeline portion 10c parallel to the swinging surface.
そして、揺動面と平行な外波線部１０ｊの面取加工をも
行なうためには、スイングアームから一且磁気ヘッド１
０を取り外し、スイングアームに方向を換えて磁気ヘッ
ドを再度取り付けたのち、スイングアームな揺動する必
要があり、また内稜線部１０ｃの面取加工をも行なうた
めには、別の装置による面取加工を行なう必要があり、
面取加工作業が面倒である。In order to also chamfer the outer wavy line portion 10j parallel to the swinging surface, it is necessary to remove the magnetic head 1 from the swing arm.
0, change the direction to the swing arm, and reinstall the magnetic head, and then it is necessary to swing the swing arm. Also, in order to chamfer the inner ridge line portion 10c, a separate device is required to chamfer the inner ridge line portion 10c. It is necessary to carry out processing,
Chamfering work is troublesome.
この発明は上述の問題点を解決するためになされたもの
で、１回の面取加工作業で磁気ヘッドの全ての稜線部の
面取加工を行なうことができる磁気ヘッドの面取加工装
置を提供することを目的とする。This invention was made to solve the above-mentioned problems, and provides a magnetic head chamfering device that can chamfer all the ridge lines of a magnetic head in one chamfering operation. The purpose is to
この目的を達成するため、この発明においては、磁気ヘ
ッドの稜線部の間取加工を行なう面取加工装置において
、テープガイドと、上記テープガイドのテープガイド面
に取り付けられた平板状の弾性体と１弾性体の表面に接
した研磨テープと、上記磁気ヘッドを移動する移動装置
と、上記磁気ヘッドを上記研磨テープに押し付ける押付
装置とを設げる。In order to achieve this object, the present invention provides a chamfering device for machining the floor plan of the ridgeline portion of a magnetic head, which includes a tape guide and a flat elastic body attached to the tape guide surface of the tape guide. A polishing tape in contact with the surface of one elastic body, a moving device for moving the magnetic head, and a pressing device for pressing the magnetic head against the polishing tape are provided.
この磁気ヘッドの面取加工装置においては、押付装置に
より磁気ヘッドを研磨テープに押し付けた状態で、移動
装置により磁気ヘッドを移動すると、弾性体が変形し、
研磨テープが磁気ヘッドの凹凸にならりて変形するから
、磁気ヘッドの稜線部のみが研磨テープと接し、稜線部
の面取加工を行なうことができる。In this magnetic head chamfering device, when the magnetic head is pressed against the polishing tape by the pressing device and the magnetic head is moved by the moving device, the elastic body is deformed.
Since the abrasive tape deforms following the unevenness of the magnetic head, only the ridgeline portion of the magnetic head comes into contact with the abrasive tape, making it possible to chamfer the ridgeline portion.
第１図はこの発明に係る磁気ヘッドの面取加工装置を示
す概略図、第２図は第１図の拡大Ａ−Ａ断面図である。FIG. 1 is a schematic view showing a magnetic head chamfering apparatus according to the present invention, and FIG. 2 is an enlarged cross-sectional view taken along the line AA in FIG.
図において、４はテープガイド。In the figure, 4 is a tape guide.
７はテープガイド４のテープガイド面に取り付けられた
平板状の弾性体、２はブレーキ付ボビン、６は巻取ボビ
ン、１は両端がブレーキ付ボビン２゜巻取ボビン６に取
り付けられた研磨テープ、３．５は研磨テープ１を案内
するガイドローラで、研磨テープ１はブレーキ付ボビ／
２に巻かれており。7 is a flat elastic body attached to the tape guide surface of the tape guide 4, 2 is a bobbin with a brake, 6 is a take-up bobbin, 1 is an abrasive tape with both ends attached to the bobbin 2° and the take-up bobbin 6. , 3.5 is a guide roller that guides the polishing tape 1, and the polishing tape 1 is a bobbin/brake equipped with a brake.
It is wrapped in 2.
研磨テープ１は巻取ボビン６によって巻き取られ。The polishing tape 1 is wound up by a winding bobbin 6.
研磨テープ１は弾性体７０表面と接している。９は試料
台で、試料台９は移動装置（図示せず）により移動され
る。１３は試料台９の上部に固定された試料取付治具で
、試料取付治具１３に複数個の磁気ヘッド１０が取り付
けられている。８は試料台９の下部に取り付けられたロ
ーラ、１４は回動可能に支持されたアーム、１１はアー
ム１４の一端に回動可能に取り付けられた加圧カムで、
加圧カム１１はガイド（図示せず）により水平の状態で
上下動可能に支持されており、またストッパ（図示せず
）により加圧カム１１が所定位置よりも上方に移動する
のが防止されている。１１ｇは加圧カム１１の端部に設
けられた斜面、１２はアーム１４の他端に吊り下げられ
たおもりで、アーム１４．加圧カム１１．おもり１２等
で押付装置を構成している。The polishing tape 1 is in contact with the surface of the elastic body 70. Reference numeral 9 denotes a sample stage, and the sample stage 9 is moved by a moving device (not shown). A sample mounting jig 13 is fixed to the upper part of the sample stage 9, and a plurality of magnetic heads 10 are attached to the sample mounting jig 13. 8 is a roller attached to the lower part of the sample stage 9; 14 is an arm rotatably supported; 11 is a pressure cam rotatably attached to one end of the arm 14;
The pressure cam 11 is supported by a guide (not shown) so as to be able to move up and down in a horizontal state, and a stopper (not shown) prevents the pressure cam 11 from moving above a predetermined position. ing. 11g is a slope provided at the end of the pressurizing cam 11; 12 is a weight suspended from the other end of the arm 14; Pressure cam 11. The weight 12 and the like constitute a pressing device.
この磁気ヘッドの面取加工装置においては、試料台９を
第１図の図示の位置より右方の取付位置まで移動した状
態で、試料取付治具１３に磁気ヘッド１０を取り付けた
のち、移動装置により試料台９を第１図紙面左方に移動
すると、ローラ８が斜面１１ｔと接して、試料台９が上
昇し、おもり１２の力により磁気ヘッド１０が研磨テー
プ１と押し付けられる。この状態で、移動装置により試
料台９をたとえば第１図紙面左右方向に５、第１図紙面
と直角の方向に１の成分を有する方向に移動すると。In this magnetic head chamfering apparatus, after the magnetic head 10 is mounted on the sample mounting jig 13 with the sample stage 9 moved to the mounting position on the right side from the position shown in FIG. When the sample stage 9 is moved to the left in the plane of FIG. In this state, if the sample stage 9 is moved by the moving device in a direction having, for example, a component of 5 in the left-right direction of the plane of the first drawing and a component of 1 in the direction perpendicular to the plane of the first drawing.
弾性体７が変形し、研磨テープ１が磁気ヘッド１０の凹
凸にならって変形するから、磁気ヘッド１０の外波線部
１０ｈ、内稜線部１００のみが研磨テープ１と接し、外
積線部１０ｂ、内稜線部１０ｃの面取加工を行なうこと
ができる。つぎに、移動装置により試料台９を第１図紙
面左方に移動すると、ローラ８が斜面１１αと接して、
試料台９が下降し、試料台９を第１図紙面左方の取付位
置まで移動した状態で、試料取付治具１３から磁気ヘッ
ド１０を取り外したのち、試料台９を取付位置まで移動
するとともに１巻取ボビン６により研磨テープ１を所定
長さ巻き取る。このような操作を繰り返すことにより、
磁気ヘッド１００面取作業を行なう。Since the elastic body 7 is deformed and the polishing tape 1 is deformed following the unevenness of the magnetic head 10, only the outer wavy line portion 10h and the inner ridge line portion 100 of the magnetic head 10 are in contact with the polishing tape 1, and the outer wavy line portion 10b and the inner ridge line portion 10 are in contact with the polishing tape 1. The ridgeline portion 10c can be chamfered. Next, when the sample stage 9 is moved to the left in the paper of FIG. 1 by the moving device, the roller 8 comes into contact with the slope 11α, and
With the sample stage 9 lowered and moved to the mounting position on the left side of the paper in Figure 1, the magnetic head 10 is removed from the sample mounting jig 13, and then the sample stage 9 is moved to the mounting position. The abrasive tape 1 is wound up to a predetermined length using a take-up bobbin 6. By repeating these operations,
The magnetic head 100 is chamfered.
このように、この磁気ヘッドの面取加工装置においては
、１回の面取加工作業で磁気ヘッド１０の外波線部１０
ｂおよび内稜線部１０ｃの面取加工を行なうことができ
るから、容易に磁気ヘッド１００面取加工を行なうこと
ができ、また磁気ヘッド１０の外波線部１０ｂ、内稜線
部１０ｃのみが研磨テープ１と接するから、磁気ディス
ク対向面１０Ｇの平面形状を劣化させることはない。In this way, in this magnetic head chamfering apparatus, the outer wavy line portion 10 of the magnetic head 10 can be chamfered in one chamfering operation.
b and the inner ridgeline portion 10c, the magnetic head 100 can be chamfered easily, and only the outer wavy line portion 10b and the inner ridgeline portion 10c of the magnetic head 10 can be chamfered with the polishing tape 1. Therefore, the planar shape of the magnetic disk facing surface 10G is not deteriorated.
発明者等の実験によれば、研磨テープ１として粒度α５
μＩＩＩ％厚さＩ Ｎｉｌのダイヤモンドラッピングテ
ープを用い、弾性体７として厚さ１．２■、変形特性４
．５ Ｘ １０−４ｙｘ／ｙ １の発泡ポリウレタン材
のボリシングクロスからなるシートを用い、１個の磁気
ヘッド１０あたりの負荷重なα２ｋｌｆ／個とし、加工
距離を１００■とじ、試料取付治具１３に５個のアルミ
ナ系セラミック材からなる磁気ヘッド１ｏを取り付けて
、面取加工を行なったところ、第４図に示す外波線部１
０ｂ、内稜線部１０ｃの面取幅ｊ１が１０μ肩、面取深
さ！、が（Ｌ４μ翼となり、角部１０ｔＬが滑らかな曲
面形状となった。According to experiments by the inventors, the polishing tape 1 has a particle size of α5.
Using diamond lapping tape with μIII% thickness I Nil, thickness 1.2■ as elastic body 7, deformation characteristic 4
．． Using a sheet made of a polyurethane foaming cloth of 5 x 10-4 yx/y 1, the load was heavy α2 klf/piece per magnetic head 10, the processing distance was set at 100 mm, and the sample mounting jig 13 was used. When five magnetic heads 1o made of alumina-based ceramic material were attached and chamfered, the outer wavy line portion 1 as shown in Fig. 4 was formed.
0b, the chamfer width j1 of the inner ridge line part 10c is 10μ, the chamfer depth! , became a (L4μ blade), and the corner part 10tL became a smooth curved shape.
また、研磨テープ１として粒度α５μ寓、厚さ１ｎｉｌ
のダイヤモンドラッピングテープを用い２弾性体７とし
て厚さα１６ｍ、変形特性３−３Ｘ１０−’ｍ／ｋｆｆ
の不織布を基材としたテープを用い、１個の磁気ヘッド
１０あたりの負荷重なｏ、２ｋｑｆ／ａとし。In addition, the polishing tape 1 has a particle size of α5μ and a thickness of 1nil.
Using a diamond wrapping tape of
A tape made of a nonwoven fabric as a base material was used, and the load per magnetic head 10 was set to 2 kqf/a.
加工距離を１００■とじ、試料取付治具１３に５個のア
ルミナ系セラミック材からなる磁気ヘッド１０を取り付
けて５面取加工を行なったところ１面取幅！、が１０μ
罵、面取深さ！、がＱ、３μ篤となり、角部１０ｄが滑
らかな曲面形状となった。When the machining distance was set at 100 mm, five magnetic heads 10 made of alumina ceramic material were attached to the sample mounting jig 13, and five chamfers were machined, one chamfer width was achieved! , is 10μ
Cursing, chamfer depth! , had a thickness of Q, 3μ, and the corner 10d had a smooth curved shape.
さらに、研磨テープ１として粒度Ｑ、５μ簿、厚さ１
ｎｉｌのダイヤモンドラッピングテープを用い。Furthermore, as polishing tape 1, particle size Q, 5 μm, thickness 1
Use nil diamond wrapping tape.
弾性体７として厚さ０．１＋ｗ＋、変形特性７Ｘ１０−
’屑／’に４ｆのポリプロピレンフィルムを基材とした
テープを用い、１個の磁気ヘッド１０あたりの負荷重を
０．２助ｆ／個とし、加工距離を１００瓢とし、′試料
取付治具１３に５個のアルミナ系セラミック材からなる
磁気ヘッド１０を取り付けて１面取加工を行なったとこ
ろ、面取幅ｊ、が５μ鶏１面取深さｌ！が０．１μ風と
なり、角部１ｆＭが滑らかな曲面形状となった。The elastic body 7 has a thickness of 0.1+w+ and a deformation characteristic of 7X10-
A 4f polypropylene film-based tape was used as the 'waste/', the load weight per magnetic head 10 was 0.2 f/piece, the processing distance was 100 gourds, and the 'sample mounting jig When five magnetic heads 10 made of alumina-based ceramic material were attached to 13 and one-chamfer processing was performed, the chamfer width j was 5μ and the one-chamfer depth l! The wind was 0.1μ, and the corner 1fM had a smooth curved shape.
また、研磨テープ１として粒度Ｑ、５μ簿、厚さ１ｍ１
Ｌのダイヤモンドラッピングテープを用い、弾性体７と
して厚さ１．２■、変形特性７Ｘ１０−’罵／橡ｆの発
泡ポリウレタン材のボリシングクロスからなるシートを
用い、１個の磁気ヘッド１０あたりの負荷重を０．２ｋ
ｇｆ／個とし、加工距離を１００■とじ、試料取付治具
１５に５個のアルミナ系セラミック材からなる磁気ヘッ
ド１０を取り付けて１面取加工を行なったところ１面取
幅１１が１５μ屏１面取深さ！。In addition, as polishing tape 1, particle size Q, 5 μm, thickness 1 m1
L diamond lapping tape is used, and as the elastic body 7, a sheet made of foamed polyurethane cloth with a thickness of 1.2 mm and a deformation property of 7 x 10 mm is used. Load weight 0.2k
gf/piece, the machining distance was set at 100 square meters, five magnetic heads 10 made of alumina ceramic material were attached to the sample mounting jig 15, and one chamfer was machined. The width of one chamfer 11 was 15 μm. Chamfer depth! .
がＱ、４５μｍとなり、角部１０ｄが滑らかな曲面形状
となった。Q was 45 μm, and the corner 10d had a smooth curved shape.
このように、弾性体７の材質等の研磨条件を換えること
により、外波線部１０ｂ、内稜線部１０Ｃの面取形状を
換えることができる。In this way, by changing the polishing conditions such as the material of the elastic body 7, the chamfered shapes of the outer wavy line portion 10b and the inner ridge line portion 10C can be changed.
なお、上述実施例においては、アーム１４、加圧カム１
１．おもり１２等で押付装置を構成したが、押付装置と
してバネ等を有するものを用いてもよい。In addition, in the above-mentioned embodiment, the arm 14, the pressure cam 1
1. Although the pressing device is configured with the weight 12 and the like, a device having a spring or the like may be used as the pressing device.
以上説明したように、この発明に係る磁気ヘッドの面取
加工装置においては、１回の面取加工作業で磁気ヘッド
の全ての稜線部の面取加工を行なうことができるから、
容易に磁気ヘッドの面取加工を行なうことができる。こ
のように、この発明の効果は顕著である。As explained above, in the magnetic head chamfering apparatus according to the present invention, all the ridges of the magnetic head can be chamfered in one chamfering operation.
The magnetic head can be chamfered easily. As described above, the effects of this invention are remarkable.
第１図はこの発明に係る磁気ヘッドの面取加工装置を示
す概略図、第２図は第１図の拡大Ａ−Ａ断面図、第３図
は磁気ディスク用磁気ヘッドを示す斜視図、第４図は面
取加工後の磁気ディスク用磁気ヘッドの一部を示す断面
図である。
１・・・・・・・・・・・・研磨テープ４・・・・・・
・・−・・テープガイド７・・・・・・・・・・・・弾
性体
９・・・・・・・・−・・試料台
１０・・−・−・・磁気ディスク用磁気ディスク１０Ａ
・・・・・・・・・外波線部
１０ｃ・・・・−・・・・内稜線部
１１・・・・・−・・加圧カム
代理人 弁理士 小 川 勝 男
第１図
ｉ（
第？図FIG. 1 is a schematic diagram showing a magnetic head chamfering apparatus according to the present invention, FIG. 2 is an enlarged sectional view taken along line A-A in FIG. 1, and FIG. 3 is a perspective view showing a magnetic head for a magnetic disk. FIG. 4 is a sectional view showing a part of the magnetic head for a magnetic disk after chamfering. 1...... Polishing tape 4...
......Tape guide 7...Elastic body 9...Sample stage 10...Magnetic disk for magnetic disk 10A
......Outer wavy line part 10c...Inner ridge line part 11...Press cam agent Patent attorney Katsuo Ogawa Figure 1i ( Figure ?
Claims (1)
置において、テープガイドと、上記テープガイドのテー
プガイド面に取り付けられた平板状の弾性体と、弾性体
の表面に接した研磨テープと、上記磁気ヘッドを移動す
る移動装置と、上記磁気ヘッドを上記研摩テープに押し
付ける押付装置とを具備することを特徴とする磁気ヘッ
ドの面取加工装置。1. A chamfering device for chamfering the ridgeline of a magnetic head, which includes a tape guide, a flat elastic body attached to the tape guide surface of the tape guide, and an abrasive tape in contact with the surface of the elastic body. A magnetic head chamfering apparatus comprising: a moving device for moving the magnetic head; and a pressing device for pressing the magnetic head against the polishing tape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32127287A JPH0732983B2 (en) | 1987-12-21 | 1987-12-21 | Chamfering machine for magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32127287A JPH0732983B2 (en) | 1987-12-21 | 1987-12-21 | Chamfering machine for magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01164553A true JPH01164553A (en) | 1989-06-28 |
| JPH0732983B2 JPH0732983B2 (en) | 1995-04-12 |
Family
ID=18130717
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32127287A Expired - Lifetime JPH0732983B2 (en) | 1987-12-21 | 1987-12-21 | Chamfering machine for magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0732983B2 (en) |
-
1987
- 1987-12-21 JP JP32127287A patent/JPH0732983B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0732983B2 (en) | 1995-04-12 |
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