JPH01149959A - Production of alloy target - Google Patents
Production of alloy targetInfo
- Publication number
- JPH01149959A JPH01149959A JP30864987A JP30864987A JPH01149959A JP H01149959 A JPH01149959 A JP H01149959A JP 30864987 A JP30864987 A JP 30864987A JP 30864987 A JP30864987 A JP 30864987A JP H01149959 A JPH01149959 A JP H01149959A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- target
- alloy ingot
- sintering
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000956 alloy Substances 0.000 title claims abstract description 56
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 238000000034 method Methods 0.000 claims abstract description 34
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 18
- 150000002910 rare earth metals Chemical class 0.000 claims abstract description 18
- 239000000843 powder Substances 0.000 claims abstract description 16
- 238000005245 sintering Methods 0.000 claims abstract description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 13
- 150000003624 transition metals Chemical class 0.000 claims abstract description 12
- 239000001257 hydrogen Substances 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 9
- 229910052688 Gadolinium Inorganic materials 0.000 claims abstract description 3
- 229910052742 iron Inorganic materials 0.000 claims abstract description 3
- 229910052692 Dysprosium Inorganic materials 0.000 claims abstract 2
- 229910052693 Europium Inorganic materials 0.000 claims abstract 2
- 229910052689 Holmium Inorganic materials 0.000 claims abstract 2
- 229910052779 Neodymium Inorganic materials 0.000 claims abstract 2
- 229910052777 Praseodymium Inorganic materials 0.000 claims abstract 2
- 229910052772 Samarium Inorganic materials 0.000 claims abstract 2
- 229910052771 Terbium Inorganic materials 0.000 claims abstract 2
- 229910052775 Thulium Inorganic materials 0.000 claims abstract 2
- 239000000203 mixture Substances 0.000 claims description 7
- 238000006356 dehydrogenation reaction Methods 0.000 claims description 5
- 238000010298 pulverizing process Methods 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 8
- 239000001301 oxygen Substances 0.000 abstract description 8
- 229910052760 oxygen Inorganic materials 0.000 abstract description 8
- 238000002844 melting Methods 0.000 abstract description 6
- 230000008018 melting Effects 0.000 abstract description 6
- 239000011261 inert gas Substances 0.000 abstract description 4
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- 238000007731 hot pressing Methods 0.000 abstract description 2
- 229910052691 Erbium Inorganic materials 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 239000013077 target material Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000010409 thin film Substances 0.000 description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 238000000227 grinding Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- -1 SC0 transition metals Chemical class 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010309 melting process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001513 hot isostatic pressing Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Landscapes
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、合金ターゲットの製造方法に関し、詳しくは
、希土類金属と遷移金属からなる光磁気記録媒体用薄膜
を製造するのに好適なスパッタリング用合金ターゲット
の製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for producing an alloy target, and more specifically, a method for producing an alloy target for sputtering suitable for producing a thin film for magneto-optical recording media made of rare earth metals and transition metals. The present invention relates to a method for manufacturing an alloy target.
［従来技術］
Ｐ ｒ ＳＮ ｄ ％ Ｓ ｒａ等の希土類金属とＦ８
ＳＣ０の遷移金属からなる合金は、一般には薄膜で光磁
気記録媒体としての特性が得られ、工業的にこの薄膜を
作製する最適手段としてスパッタリング法が考えられて
いる。これに供用されるターゲットの製造方法には大別
して次の３種類がある。[Prior art] Rare earth metals such as P r SN d % S ra and F8
Alloys made of SC0 transition metals generally have properties as a magneto-optical recording medium in the form of a thin film, and sputtering is considered to be the optimal means for industrially producing this thin film. There are three main types of target manufacturing methods used for this purpose:
■ 溶解法；
溶解法によって得られた合金のインゴットを機械加工し
て、所定寸法のターゲットを製造する方法。■ Melting method: A method in which an alloy ingot obtained by the melting method is machined to produce a target of a predetermined size.
■ 複合法；
遷移金属板上に希土類金属チップを適当量埋め込んでタ
ーゲットを製造する方法。■ Composite method: A method in which a target is manufactured by embedding an appropriate amount of rare earth metal chips on a transition metal plate.
■ 焼結法；
アーク溶解によって得られた合金インゴットを機械的に
粉砕後、焼結法によって成形してターゲットを製造する
方法。■ Sintering method: A method in which an alloy ingot obtained by arc melting is mechanically crushed and then shaped using a sintering method to produce a target.
［従来技術の問題点コ
上記のターゲツト材を製造する ３方法のうち、■の溶
解法による合金ターゲットは脆いので一般に直径ｉ ｏ
ｏ ａｍ以上のターゲットを製造することが困難であ
る。[Problems with the prior art] Of the three methods for producing the target material described above, the alloy target produced by the melting method (ii) is brittle and generally has a diameter of io
It is difficult to manufacture a target with a diameter larger than o am.
■の複合法の場合、構成元素の面積比が場所によって大
きく変化するため、薄膜の組成不均一の原因となり易い
。また、マグネトロン・スパッタリングを行なう際、遷
移金属板の磁束密度が大きいため、マグネトロン・スパ
ッタリングに必要な漏洩磁束が得られに（い等の欠点が
ある。In the case of the composite method (2), the area ratio of the constituent elements varies greatly depending on the location, which tends to cause non-uniform composition of the thin film. Furthermore, when magnetron sputtering is performed, the magnetic flux density of the transition metal plate is large, so there are drawbacks such as difficulty in obtaining leakage magnetic flux necessary for magnetron sputtering.
■の焼結法の場合には、合金粉末の焼結体であるために
内部組成の均一なターゲツト材を製造することができ、
しかも任意の形状を持った大型−体品ターゲットを製造
することが可能となっている（例えば特開昭６１−９１
３３８号公報）。しかしながら、特開昭６１−９１３３
８号公報に開示の方法では、焼結体の原料である合金イ
ンゴットを粉砕する際に酸化が著しく進み、焼結された
ターゲット中の酸素濃度が高くなるという欠点を有して
いた。このターゲット中の酸素は、ターゲットの脆化を
もたらし、さらにスパッタリングによって形成された薄
膜の光磁気記録媒体としての特性を劣化させるため、タ
ーゲット中の酸素濃度は出来る限り少ないことが望まし
い。In the case of the sintering method (2), it is possible to produce a target material with a uniform internal composition because it is a sintered body of alloy powder.
Moreover, it has become possible to manufacture large-sized targets with arbitrary shapes (for example, Japanese Patent Laid-Open No. 61-91
Publication No. 338). However, JP-A-61-9133
The method disclosed in Publication No. 8 has the drawback that oxidation progresses significantly when the alloy ingot, which is the raw material for the sintered body, is crushed, and the oxygen concentration in the sintered target increases. Oxygen in this target causes the target to become brittle and further deteriorates the properties of a thin film formed by sputtering as a magneto-optical recording medium, so it is desirable that the oxygen concentration in the target be as low as possible.
［発明の目的］
本発明の目的は、内部組織が均一で、任意形状の大型一
体品が製造可能で、しかも酸素濃度を少なくすることに
より、靭性を有すると共に光磁気記録媒体としての特性
を向上させた合金ターゲットの製造方法を提供すること
にある。[Objective of the Invention] The object of the present invention is to make it possible to manufacture a large integrated product with a uniform internal structure and any shape, and to have toughness and improve characteristics as a magneto-optical recording medium by reducing oxygen concentration. An object of the present invention is to provide a method for manufacturing an alloy target.
［問題点を解決するための手段］
本発明の製造方法は、Ｐ ｒ ｓ Ｎ ｄ ｓ Ｓ ｍ
ｓ Ｅ ｕ、Ｇｄ ｓ Ｔｂ ＳＤｙ ｓ Ｈｏ Ｓ
Ｅｒ ＳＴｍから選ばれた１種以上の希土類金属とＦｅ
、Ｃｏから選ばれた１種以上の遷移金属からなる合金タ
ーゲットを製造する方法において、前記希土類金属と遷
移金属とを溶解して合金のインゴットとし、この合金イ
ンゴットを密閉容器に収容し、所定の真空度（例えば１
０−’Ｔ ｏｒｒ以下）まで排気した後、あるいはこの
時、該容器内の空気を予め不活性ガスおよび／または水
素ガスで置換した後、例えば該容器内に１ＴＯｒｒ〜５
０Ｋｙ／ｃｉの水素ガスを供給し、得られた粉末を焼結
法により成形することを特徴とする。[Means for solving the problems] The manufacturing method of the present invention includes P r s N d s S m
s E u, Gd s Tb SDy s Ho S
One or more rare earth metals selected from Er STm and Fe
, Co, in which the rare earth metal and the transition metal are melted to form an alloy ingot, the alloy ingot is placed in a sealed container, and a predetermined amount of Degree of vacuum (e.g. 1
After evacuation to 0-'T orr or less, or at this time, after replacing the air in the container with an inert gas and/or hydrogen gas, for example, 1 TOrr to 5
It is characterized by supplying hydrogen gas of 0 Ky/ci and molding the obtained powder by a sintering method.
本発明において用いられる希土類金属としては、Ｐｒ、
Ｎｄｓ ８１１％ ＥＬＩ％ Ｇｄｓ Ｔｂｓ Ｄｙ５
Ｈｏｓ Ｅ ｒ 、Ｔｌ１ｌから選ばれる １種以上で
あり、遷移金属としては、Ｆｅ５Ｃｏから選ばれる １
種以上であり、これらは単独または２種以上を混合して
用いられる。この希土類金属と遷移金属の混合割合は、
希土類金属２０〜６０ｗｔ％、遷移金属８０〜４０ｗｔ
％の範囲が好ましい。また、本発明により得られる合金
ターゲットには、光磁気記録媒体としての特性向上や耐
食性向上を目的として、Ｐｒ。The rare earth metals used in the present invention include Pr,
Nds 811% ELI% Gds Tbs Dy5
One or more types selected from Hos E r and Tl1l, and the transition metal is selected from Fe5Co1
These can be used alone or in a mixture of two or more types. The mixing ratio of rare earth metals and transition metals is
Rare earth metals 20-60wt%, transition metals 80-40wt%
A range of % is preferred. Further, the alloy target obtained by the present invention contains Pr for the purpose of improving properties as a magneto-optical recording medium and improving corrosion resistance.
Ｎｄ５Ｓｔｐ等の希土類金属と、Ｆ ｅ ＳＣｏの遷移
金属に加えて、Ｔｉ 、Ｃｕ ＳＰｔ ＳＡｕ等の金属
元素を、粉砕工程における粉砕が可能な範囲で適量添加
することもできる。In addition to rare earth metals such as Nd5Stp and transition metals such as Fe SCo, metal elements such as Ti, Cu SPt SAu, etc. can also be added in appropriate amounts within a range that allows pulverization in the pulverization process.
以下、本発明を各工程に分けて説明する。Hereinafter, the present invention will be explained by dividing into each step.
（１）溶解工程
まず、希土類金属と遷移金属を原料とし、これらを溶解
して合金インゴットを製造する。溶解の方法としては、
合金インゴット中の内部組成をできるだけ均一化するた
めに、アーク炉等を用いて真空中またはアルゴン等の不
活性ガス中で溶解して合金インゴットを製造するのが好
ましい。なお、この溶解時間は、希土類金属の蒸発を防
ぐために短時間で行なうのが望ましい。(1) Melting process First, rare earth metals and transition metals are used as raw materials, and these are melted to produce an alloy ingot. As for the method of dissolution,
In order to make the internal composition of the alloy ingot as uniform as possible, it is preferable to manufacture the alloy ingot by melting it in a vacuum or in an inert gas such as argon using an arc furnace or the like. Note that this dissolution time is desirably short in order to prevent evaporation of the rare earth metal.
（２）粉砕工程
本発明においては、上記溶解工程で得られた合金インゴ
ットを、密閉容器に収容して少なくとも１回水素を吸収
、または吸収、排出することによって合金を粉砕させる
ものである（以下、この粉砕を水素化粉砕という）。ま
た、このようにして得られた合金粉末は、後工程である
成形工程の前に、真空中またはアルゴン等の不活性ガス
中で１００〜７００℃に加熱して、その温度で３０分以
上保持し、脱水素処理することが望ましい。(2) Grinding process In the present invention, the alloy ingot obtained in the above melting process is placed in a closed container and hydrogen is absorbed or absorbed and discharged at least once to grind the alloy (hereinafter referred to as , this grinding is called hydrogen grinding). In addition, the alloy powder thus obtained is heated to 100 to 700°C in vacuum or in an inert gas such as argon and held at that temperature for 30 minutes or more before the subsequent molding process. However, it is desirable to perform dehydrogenation treatment.
具体的な粉砕工程としては、合金インゴットをステンレ
ス製チューブ等の密閉容器に入れ所定の真空度（例えば
１Ｏ−５Ｔ ｏｒｒ以下）まで排気した後、あるいはこ
の時、該容器内の空気を予め不活性ガスおよび／または
水素ガスで置換した後、該容器に所定の圧力の水素ガス
を一定時間供給して、合金インゴットの粉砕を行ない粉
体とする。ここで水素の吸収、排出を順次繰り返すこと
により、更に細い粒径の粉末を得ることが可能である。The specific crushing process involves placing the alloy ingot in a sealed container such as a stainless steel tube and evacuating it to a predetermined degree of vacuum (for example, 1O-5 Torr or less), or at this time, the air in the container is inertized in advance. After replacing the container with gas and/or hydrogen gas, hydrogen gas at a predetermined pressure is supplied to the container for a certain period of time to crush the alloy ingot into powder. By sequentially repeating hydrogen absorption and discharge, it is possible to obtain powder with even finer particle size.
また、この粉砕工程において、水素の吸収反応が進行し
難い場合には、活性化処理という前処理を行なったほう
がよい。この前処理は、チューブ内を排気した後に、合
金インゴットを所定の温度（例えば１００〜３００℃程
度）に加熱するか、あるいは１００〜３００℃程度に加
熱した状態で、該容器内に水素ガスを所定の圧力（例え
ば１Ｏ−２Ｔ ｏｒｒ ）まで導入し、水素を少し吸収
させるか、もしくは合金インゴットを破断して金属面を
露出させることにより行なわれる。In addition, in this pulverization step, if the hydrogen absorption reaction is difficult to proceed, it is better to perform a pretreatment called an activation treatment. This pretreatment is carried out by heating the alloy ingot to a predetermined temperature (for example, about 100 to 300°C) after evacuating the inside of the tube, or by introducing hydrogen gas into the container while it is heated to about 100 to 300°C. This is carried out by introducing a predetermined pressure (for example, 10-2 Torr) to absorb a small amount of hydrogen, or by fracturing the alloy ingot to expose the metal surface.
（３）焼結・成形工程
上記水素化粉砕、脱水素化処理された合金粉末を、所望
形状のグラファイト等からなるモールドに入れ、焼結法
により焼結、成形させる。この焼結法としては、ホット
プレス法、熱間静水圧圧縮（ＨＩ Ｐ）法、熱間鍛造法
、熱間バック圧延法等が挙げられるが、薄板の形状の製
造には、ホットプレス法が特に好ましく用いられる。こ
のときの焼結温度はターゲットの高密度化を図るため、
合金の固相線温度以上とすることが望ましい。なお、水
素化粉砕によって得られた合金粉末をトルエン中で篩分
けし、ホットプレス等の焼結を行なう装置に挿入した後
、前記した脱水素処理を該装置内で行なうこともできる
。(3) Sintering/forming process The alloy powder subjected to the hydrogenation-pulverization and dehydrogenation treatment is placed in a mold made of graphite or the like having a desired shape, and sintered and molded by a sintering method. Examples of this sintering method include the hot press method, hot isostatic pressing (HIP) method, hot forging method, and hot back rolling method. It is particularly preferably used. The sintering temperature at this time is set to increase the density of the target.
It is desirable that the temperature be higher than the solidus temperature of the alloy. It is also possible to sieve the alloy powder obtained by hydro-grinding in toluene, insert it into a sintering device such as a hot press, and then perform the above-described dehydrogenation treatment in the device.
［実施例］
以下、実施例等に基づき本発明をより具体的に説明する
が、本発明はこれに限定されるものではない。[Examples] Hereinafter, the present invention will be described in more detail based on Examples, but the present invention is not limited thereto.
実施例１〜５および比較例１〜５
純度９９．９％の希土類金属と、純度９９．９％の遷移
金属をアーク炉を用いて、アルゴンガス中でアーク溶解
して、第１表に示される成分組成の合金インゴットを得
た。Examples 1 to 5 and Comparative Examples 1 to 5 Rare earth metals with a purity of 99.9% and transition metals with a purity of 99.9% were arc melted in argon gas using an arc furnace, and the melts shown in Table 1 were melted. An alloy ingot with a composition as follows was obtained.
該合金インゴットを第１表に示される条件で水素化粉砕
、脱水素処理した後、トルエン中で篩分けし、第１表に
示される粒度の合金粉末とした。The alloy ingot was hydrogenated and dehydrogenated under the conditions shown in Table 1, and then sieved in toluene to obtain alloy powder having the particle size shown in Table 1.
この合金粉末を同じく第１表に示される条件でホットプ
レス法により焼結させ機械加工して、第１表に示される
サイズのターゲツト材を得た。This alloy powder was sintered and machined by hot pressing under the conditions shown in Table 1 to obtain target materials having the sizes shown in Table 1.
得られたそれぞれのターゲツト材の相対密度と含を酸素
濃度を第１表に示した。Table 1 shows the relative density and oxygen concentration of each target material obtained.
また、比較の目的で、第２表には、実施例１〜５で用い
たものと同組成の合金インゴットを、トルエン中で振動
ミルによって機械的に粉砕し、得られた粉末を脱水素処
理を行なわなかった以外は、実施例１〜５と全く同じ条
件で篩分け、焼結、加工して、第２表に示されるターゲ
ツト材を得た。For comparison purposes, Table 2 also shows alloy ingots having the same composition as those used in Examples 1 to 5, which were mechanically crushed in toluene using a vibrating mill, and the resulting powder was subjected to dehydrogenation treatment. The target materials shown in Table 2 were obtained by sieving, sintering, and processing under exactly the same conditions as in Examples 1 to 5, except that .
得られたそれぞれのターゲツト材の相対密度と含有酸素
濃度を第２表に示した。Table 2 shows the relative density and oxygen content of each target material obtained.
次に、実施例２および比較例２で得られたターゲツト材
を、第３表に示す条件で前記マグネトロン・スパッタリ
ング法により薄膜化し、その光磁気記録特性を調べ結果
を第１図に示した。第１図は、それぞれのターゲツト材
から得られた薄膜の保磁力（Ｈｅ ）とカー回転角（θ
Ｋ）の投入電力依存性を示すグラフである。Next, the target materials obtained in Example 2 and Comparative Example 2 were made into thin films by the magnetron sputtering method under the conditions shown in Table 3, and the magneto-optical recording characteristics thereof were examined and the results are shown in FIG. Figure 1 shows the coercive force (He) and Kerr rotation angle (θ) of the thin film obtained from each target material.
2 is a graph showing the input power dependence of K).
第３表
第１図から明らかなように、カー回転角はターゲツト材
の違いについてほとんど差異はないが、保磁力は実施例
２のターゲットを用いた場合の方が大きい値が得られて
いる。As is clear from Table 3 and Figure 1, there is almost no difference in the Kerr rotation angle depending on the target material, but a larger value of coercive force is obtained when the target of Example 2 is used.
［発明の効果］
以上説明したように、本発明の製造方法によれば、内部
組織が均一で、任意形状の大型一体高が製造可能で、し
かも酸素濃度が少ないことから靭性を有すると共に光磁
気記録媒体としたときの特性に優れた合金ターゲットが
得られる。また、水素化粉砕によって得られた合金粉末
は、機械的に粉砕した従来方法によって得られた合金粉
末に比べ、粒度分布巾が狭く、粒径が揃っているために
、最終的に得られる焼結体であるターゲットの密度向上
が図れるという効果も有する。[Effects of the Invention] As explained above, according to the manufacturing method of the present invention, it is possible to manufacture a large integrated structure with a uniform internal structure and an arbitrary shape, and since the oxygen concentration is low, it has toughness and magneto-optical properties. An alloy target with excellent properties when used as a recording medium can be obtained. In addition, the alloy powder obtained by hydrogenation grinding has a narrower particle size distribution width and more uniform particle size than the alloy powder obtained by the conventional method of mechanical grinding, so the final sintered It also has the effect of increasing the density of the target, which is a solid body.
第１図は、実施例２および比較例２のターゲツト材から
得られた薄膜の保磁力（Ｈｅ ）およびカー回転角（θ
Ｋ）と投入電力の関係を示すグラフ。
特許出願人 三井金属鉱業株式会社
代理人 弁理士 伊 東 辰 雄
代理人 弁理士 伊 東 哲 也Figure 1 shows the coercive force (He) and Kerr rotation angle (θ) of the thin films obtained from the target materials of Example 2 and Comparative Example 2.
Graph showing the relationship between K) and input power. Patent applicant: Mitsui Mining & Mining Co., Ltd. Agent: Tatsuo Ito, patent attorney: Patent attorney: Tetsuya Ito
Claims (1)
、Ｅｒ、Ｔｍから選ばれた１種以上の希土類金属とＦｅ
、Ｃｏから選ばれた１種以上の遷移金属からなる合金タ
ーゲットを製造する方法において、前記希土類金属と遷
移金属とを溶解して合金のインゴットとし、この合金イ
ンゴットに少なくとも１回水素を吸収または吸収、排出
し、該合金を粉化することによって得られた合金粉末を
焼結法により成形することを特徴とする合金ターゲット
の製造方法。 ２、前記崩壊合金粉末を成形する前に、１００〜７００
℃で加熱し、脱水素処理する特許請求の範囲第１項記載
の合金ターゲットの製造方法。 ３、前記焼結法が、ホットプレス法である特許請求の範
囲第１項または第２項記載の合金ターゲットの製造方法
。 ４、前記合金の組成が、希土類金属の割合として２０〜
６０ｗｔ％である特許請求の範囲第１〜３項のいずれか
に記載の合金ターゲットの製造方法。[Claims] 1. Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho
, Er, and one or more rare earth metals selected from Tm and Fe.
, Co, in which the rare earth metal and the transition metal are melted to form an alloy ingot, and the alloy ingot absorbs or absorbs hydrogen at least once. , and forming the obtained alloy powder by sintering the alloy by pulverizing the alloy. 2. Before molding the disintegrated alloy powder,
The method for producing an alloy target according to claim 1, wherein the alloy target is heated at a temperature of 0.degree. C. and subjected to dehydrogenation treatment. 3. The method for manufacturing an alloy target according to claim 1 or 2, wherein the sintering method is a hot press method. 4. The composition of the alloy is 20 to 20 as the proportion of rare earth metals.
The method for producing an alloy target according to any one of claims 1 to 3, wherein the content is 60 wt%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30864987A JPH01149959A (en) | 1987-12-08 | 1987-12-08 | Production of alloy target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30864987A JPH01149959A (en) | 1987-12-08 | 1987-12-08 | Production of alloy target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01149959A true JPH01149959A (en) | 1989-06-13 |
Family
ID=17983609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30864987A Pending JPH01149959A (en) | 1987-12-08 | 1987-12-08 | Production of alloy target |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01149959A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10557195B2 (en) * | 2010-07-30 | 2020-02-11 | Jx Nippon Mining & Metals Corporation | Sputtering target and/or coil, and process for producing same |
-
1987
- 1987-12-08 JP JP30864987A patent/JPH01149959A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10557195B2 (en) * | 2010-07-30 | 2020-02-11 | Jx Nippon Mining & Metals Corporation | Sputtering target and/or coil, and process for producing same |
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