JPH01138611A - Magnetic disk - Google Patents

Magnetic disk

Info

Publication number
JPH01138611A
JPH01138611A JP29600887A JP29600887A JPH01138611A JP H01138611 A JPH01138611 A JP H01138611A JP 29600887 A JP29600887 A JP 29600887A JP 29600887 A JP29600887 A JP 29600887A JP H01138611 A JPH01138611 A JP H01138611A
Authority
JP
Japan
Prior art keywords
film
magnetic
diamond
magnetic disk
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29600887A
Other languages
Japanese (ja)
Inventor
Shigeki Hoshino
茂樹 星野
Kazutaka Fujii
和隆 藤井
Masahiro Yanagisawa
雅広 柳沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP29600887A priority Critical patent/JPH01138611A/en
Publication of JPH01138611A publication Critical patent/JPH01138611A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To improve the wear resistance of a magnetic disk and to decrease surface friction by providing a protective film formed of a diamond-like carbon film on a substrate on which a magnetic film is provided and providing a reformed layer by fluorine plasma or fluorine ions on the surface thereof. CONSTITUTION:The protective film 15 formed of the diamond-like carbon film is provided on the Al substrate 11 on which at least the magnetic film 13 is provided. The surface reformed layer 16 by the fluorine plasma or fluorine ions is formed on the surface of this protective film 16. A thin silicon film 14 is provided between the protective film 15 and the magnetic film 13 to enhance the adhesiveness between the protective film 15 formed of the diamond- like carbon film and the magnetic film 13 if said adhesiveness is poor. The high-performance magnetic disk improved in the wear resistance and lubricity of the magnetic disk is obtd. by forming the reformed layer of the fluorine plasma or fluorine ion extremely thinly on the surface of the diamond-like carbon film 15 in such a manner.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は磁気ディスクに関し、特に表面に保護被膜を有
する磁気ディスクに関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic disk, and particularly to a magnetic disk having a protective coating on its surface.

[従来の技術] 磁気ディスクの占める空間的大きさをできるだけ有効に
使用するためには、情報の記録密度を可能な限り高める
ことが必要で必る。しかし、そのためには磁気ヘッドと
磁気ディスクの間隔を極力小さくしなければならない。
[Prior Art] In order to use the space occupied by a magnetic disk as effectively as possible, it is necessary to increase the recording density of information as much as possible. However, for this purpose, the distance between the magnetic head and the magnetic disk must be made as small as possible.

その結果、磁気ヘッドと磁気ディスクの衝突や摩耗が必
然的に増加することは避けられないので、磁気ディスク
の情報を守るために保護膜を設けることが必要となる。
As a result, collisions and wear between the magnetic head and the magnetic disk inevitably increase, so it is necessary to provide a protective film to protect the information on the magnetic disk.

従来の磁気ディスクではその保護膜として比較的硬度の
高い5i02薄膜が用いられ、表面の摩擦係数を小さく
するためその上に有機溶剤の潤滑層が設けられている。
In conventional magnetic disks, a relatively hard 5i02 thin film is used as a protective film, and a lubricating layer of an organic solvent is provided thereon to reduce the coefficient of friction on the surface.

[発明が解決しようとする問題点] しかしながら、上記のような従来の磁気ディスクに用い
られている保護膜としての5i02と有機潤滑層の組合
わせでは、磁気ヘッドと磁気ディスクの間隔が狭くなっ
た場合には磁気ヘッドに用いられている材質より保護膜
の材質の方が硬度が小さいので耐摩耗性が1qられなく
なる。また、表面に塗布した有機溶剤の潤滑層は液体で
あるために乾燥やヘッドとの固着等の問題点が生じやす
い等の問題点があった。
[Problems to be Solved by the Invention] However, with the combination of 5i02 as a protective film and an organic lubricant layer used in conventional magnetic disks as described above, the distance between the magnetic head and the magnetic disk becomes narrow. In this case, since the material of the protective film has a lower hardness than the material used for the magnetic head, the wear resistance will be reduced by 1q. Furthermore, since the lubricating layer of organic solvent applied to the surface is liquid, there are problems such as drying and adhesion to the head.

本発明は以上述べたような従来の問題点を解決するため
になされたもので、2優れた耐摩耗性を有すると共に、
表面における摩擦が低減化された保護被膜を有する磁気
ディスクを提供することを目的とする。
The present invention was made in order to solve the conventional problems as described above, and has two excellent wear resistance,
An object of the present invention is to provide a magnetic disk having a protective coating with reduced friction on the surface.

[問題点を解決するための手段] 本発明は、少なくとも磁性膜が設けられた基板上に、ダ
イヤモンド状炭素で形成された保護被膜が設けられ、該
保護被膜の表面にはフッ素プラズマあるいはフッ素イオ
ンによる改質層が設けられてなることを特徴とする磁気
ディスクである。
[Means for Solving the Problems] In the present invention, a protective film made of diamond-like carbon is provided on a substrate provided with at least a magnetic film, and the surface of the protective film is treated with fluorine plasma or fluorine ions. This is a magnetic disk characterized in that it is provided with a modified layer of.

本発明では保護被膜と磁性膜との密着性が悪い場合には
保護被膜と磁性膜との間にシリコン薄膜を設けることが
好ましい。
In the present invention, if the adhesion between the protective coating and the magnetic film is poor, it is preferable to provide a silicon thin film between the protective coating and the magnetic film.

また、上記の保護被膜は磁性膜の全面に亘って設けられ
ていることが望ましい。
Furthermore, it is desirable that the above-mentioned protective coating be provided over the entire surface of the magnetic film.

[作用] ダイヤモンド状炭素膜は水素を含有したアモルファス構
造にもかかわらず、硬度がダイヤモンド結晶に近い値を
示し、ヤング率もダイヤモンド結晶の値に匹敵プる。し
かし、ダイヤモンドに近いほど表面の摩1察係数は0.
5以上とかなり大きな値となる。ダイヤモンド状炭素膜
には水素が多く含まれており、その表面にも多くの炭素
と水素結合が見られる。炭素と水素との結合は疎水性を
示し、そのために摩擦係数が大きくなっていると考えら
れる。一方、ダイヤモンド状炭素膜の極表@層だけをフ
ッ素プラズマやフッ素イオン打ち込み等によって親水性
の層に改質することによって摩擦係数は0.05以下と
することができる。本発明ではダイヤモンド状炭素膜の
表面にフッ素プラズマかフッ素イオンによる改質層を極
薄く形成することによって、耐摩耗性と潤滑性を併せも
たせているので高性能の磁気ディスクが得られることに
なる。
[Function] Although the diamond-like carbon film has an amorphous structure containing hydrogen, its hardness is close to that of a diamond crystal, and its Young's modulus is also comparable to that of a diamond crystal. However, the closer it is to diamond, the more the friction coefficient of the surface is 0.
It is a fairly large value of 5 or more. The diamond-like carbon film contains a lot of hydrogen, and many carbon and hydrogen bonds can be seen on its surface. The bond between carbon and hydrogen exhibits hydrophobicity, which is thought to be the reason for the large coefficient of friction. On the other hand, the friction coefficient can be reduced to 0.05 or less by modifying only the extreme surface layer of the diamond-like carbon film into a hydrophilic layer by fluorine plasma, fluorine ion implantation, or the like. In the present invention, by forming an extremely thin modified layer using fluorine plasma or fluorine ions on the surface of a diamond-like carbon film, a high-performance magnetic disk can be obtained because it has both wear resistance and lubricity. .

また、磁性膜上にシリコン薄膜を設けると磁性膜と炭素
膜との密着強度が飛躍的に向上するので、どんな磁性膜
上でも上記炭素膜を保護被膜として形成することができ
、炭素膜自身の性質を有効に利用できる。
In addition, when a silicon thin film is provided on a magnetic film, the adhesion strength between the magnetic film and the carbon film is dramatically improved, so the carbon film can be formed as a protective coating on any magnetic film, and the carbon film itself can be Characteristics can be used effectively.

[実施例] 以下、本発明の実施例について図面を参照して詳細に説
明する。
[Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.

第1図は本発明の一実施例の断面図である。表面にNi
P膜12およびCo、 Co−Cr等の磁性膜13を順
次形成したN基板11上に、スパッタ、真空蒸着あるい
はクラスターイオンビーム等によって100Å以下のシ
リコン薄膜14を炭素膜と磁性膜との密着性を高めるた
めに形成する。以上の基板を真空槽内の平行平板電極の
負電極上に設置する。まず、真空槽内を1O−6Tor
r以下の真空度にした後、メタンカスと水素ガスを導入
する。メタンと水素の混合比は0.1〜5%の範囲で、
圧力を0.1〜10Torrに調節する。その後、真空
槽内の平行平板電極間に250〜350V程度の放電電
圧、0.1〜’l mA/ ctn”程度の放電電流を
印加してDCグロー放電を生じさせる。1分はどプラズ
マを発生させて約200人のダイヤモンド状炭素薄膜1
5を形成する。この時点では表面のビッカース硬度は1
0000Kg/ #n2程度あるが、動摩擦係数を測定
すると0.5以上の大きな値となっている。次に、ダイ
ヤモンド状炭素薄膜15が形成された基板をそのままに
し、フッ素ガスを導入してDCグロー放電を発生させる
。このとき形成される表面改質層16の厚さは数10A
である。以上のようにして得られた膜表面の動摩擦係数
を測定したところ0.05以下であった。裏面にも以上
と同じプロセスによって保護被膜を形成した。
FIG. 1 is a sectional view of an embodiment of the present invention. Ni on the surface
On the N substrate 11 on which the P film 12 and the magnetic film 13 made of Co, Co--Cr, etc. have been sequentially formed, a thin silicon film 14 of 100 Å or less is formed by sputtering, vacuum evaporation, cluster ion beam, etc. to improve the adhesion between the carbon film and the magnetic film. formed in order to increase The above substrate is placed on the negative electrode of a parallel plate electrode in a vacuum chamber. First, the inside of the vacuum chamber is set to 1O-6 Torr.
After reducing the vacuum to r or less, methane gas and hydrogen gas are introduced. The mixing ratio of methane and hydrogen is in the range of 0.1 to 5%,
Adjust the pressure to 0.1-10 Torr. Thereafter, a discharge voltage of about 250 to 350 V and a discharge current of about 0.1 to 1 mA/ctn are applied between the parallel plate electrodes in the vacuum chamber to generate a DC glow discharge.The plasma is generated for 1 minute. Generate approximately 200 diamond-like carbon thin films 1
form 5. At this point, the Vickers hardness of the surface is 1
It is about 0000Kg/#n2, but when the dynamic friction coefficient is measured, it is a large value of 0.5 or more. Next, the substrate on which the diamond-like carbon thin film 15 is formed is left as it is, and fluorine gas is introduced to generate a DC glow discharge. The thickness of the surface modified layer 16 formed at this time is several tens of amps.
It is. The coefficient of dynamic friction of the surface of the film obtained as described above was measured and found to be 0.05 or less. A protective film was also formed on the back side using the same process as above.

以上のような方式で形成した磁気ディスクの表面で15
9程度の荷重をかけたセラミックA1303−TiC製
の磁気ヘッドの接触−浮上の繰返し試験(いわゆるco
ntact−start−stop試験)を行ったとこ
ろ、1O万回以上でも表面に傷は見られなかった。
15 on the surface of the magnetic disk formed using the method described above.
Repeated contact-floating test (so-called CO
When a ntact-start-stop test was performed, no scratches were observed on the surface even after 100,000 times or more.

以上の実施例では炭素膜をDCグロー放電CVDによっ
て合成したが、同じガスを用いたRFプラズマCVDや
イオンブレーティング、イオンビームスパッタ等によっ
てもほぼ同様な膜が得られた。また、本実施例ではDC
グロー放電における電極は平行平板構造であるが、アノ
ードとカソード電極が対向していない構造においても同
様な結果が得られる。
In the above examples, carbon films were synthesized by DC glow discharge CVD, but substantially similar films were also obtained by RF plasma CVD, ion blating, ion beam sputtering, etc. using the same gas. In addition, in this embodiment, DC
Although the electrodes in glow discharge have a parallel plate structure, similar results can be obtained in a structure in which the anode and cathode electrodes do not face each other.

[発明の効果] 以上説明したように、本発明の磁気ディスクは保護被膜
として耐摩耗性に優れたダイヤモンド状炭素膜が用いら
れていると共に、その表面にはフッ素による改質層が設
けられ、表面の摩擦係数か大幅に低減化されているので
、磁性膜を十分に保護し、かつ表面での摩擦をできるだ
け小さくすることができ、高性能の磁気ディスクが提供
できる。
[Effects of the Invention] As explained above, in the magnetic disk of the present invention, a diamond-like carbon film with excellent wear resistance is used as a protective coating, and a fluorine-modified layer is provided on the surface of the diamond-like carbon film. Since the coefficient of friction on the surface is significantly reduced, the magnetic film can be sufficiently protected and the friction on the surface can be minimized, making it possible to provide a high-performance magnetic disk.

また磁性膜と炭素膜との間にシリコン膜を設けると、両
者の密着性が良くなるので、このことを利用すると必ら
ゆる磁性膜上に上記炭素膜を形成することができる。
Furthermore, if a silicon film is provided between the magnetic film and the carbon film, the adhesion between the two will improve, so if this is utilized, the carbon film can be formed on any magnetic film.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の断面図である。 11・・・M基板       12・・・NiP膜1
3・・・磁性膜       14・・・シリコン簿膜
15・・・ダイヤモンド状炭素薄膜 16・・・表面改質層
FIG. 1 is a sectional view of an embodiment of the present invention. 11...M substrate 12...NiP film 1
3...Magnetic film 14...Silicon film 15...Diamond-like carbon thin film 16...Surface modified layer

Claims (2)

【特許請求の範囲】[Claims] (1)少なくとも磁性膜が設けられた基板上に、ダイヤ
モンド状炭素で形成された保護被膜が設けられ、該保護
被膜の表面にはフッ素プラズマあるいはフッ素イオンに
よる改質層が設けられてなることを特徴とする磁気ディ
スク。
(1) A protective film made of diamond-like carbon is provided on at least the substrate on which the magnetic film is provided, and a modified layer using fluorine plasma or fluorine ions is provided on the surface of the protective film. Features a magnetic disk.
(2)磁性膜と保護被膜との間にシリコン薄膜が設けら
れている特許請求の範囲第1項記載の磁気ディスク。
(2) The magnetic disk according to claim 1, wherein a silicon thin film is provided between the magnetic film and the protective coating.
JP29600887A 1987-11-26 1987-11-26 Magnetic disk Pending JPH01138611A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29600887A JPH01138611A (en) 1987-11-26 1987-11-26 Magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29600887A JPH01138611A (en) 1987-11-26 1987-11-26 Magnetic disk

Publications (1)

Publication Number Publication Date
JPH01138611A true JPH01138611A (en) 1989-05-31

Family

ID=17827936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29600887A Pending JPH01138611A (en) 1987-11-26 1987-11-26 Magnetic disk

Country Status (1)

Country Link
JP (1) JPH01138611A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0422654U (en) * 1990-06-15 1992-02-25
US6534131B1 (en) * 1999-06-18 2003-03-18 Sanyo Electric Co., Ltd. Method for treating carbon film, carbon film and component with carbon film
JP2008006659A (en) * 2006-06-28 2008-01-17 Toyo Seikan Kaisha Ltd Member for resin process
US9333570B2 (en) 2006-09-27 2016-05-10 Caterpillar Inc. Reversible bolt-on piercing tip

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6378328A (en) * 1986-09-19 1988-04-08 Matsushita Electric Ind Co Ltd Magnetic recording medium

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6378328A (en) * 1986-09-19 1988-04-08 Matsushita Electric Ind Co Ltd Magnetic recording medium

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0422654U (en) * 1990-06-15 1992-02-25
US6534131B1 (en) * 1999-06-18 2003-03-18 Sanyo Electric Co., Ltd. Method for treating carbon film, carbon film and component with carbon film
JP2008006659A (en) * 2006-06-28 2008-01-17 Toyo Seikan Kaisha Ltd Member for resin process
JP4702201B2 (en) * 2006-06-28 2011-06-15 東洋製罐株式会社 Resin processing parts
US9333570B2 (en) 2006-09-27 2016-05-10 Caterpillar Inc. Reversible bolt-on piercing tip

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