JPH01243230A - Magnetic disk - Google Patents
Magnetic diskInfo
- Publication number
- JPH01243230A JPH01243230A JP6932288A JP6932288A JPH01243230A JP H01243230 A JPH01243230 A JP H01243230A JP 6932288 A JP6932288 A JP 6932288A JP 6932288 A JP6932288 A JP 6932288A JP H01243230 A JPH01243230 A JP H01243230A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- diamond
- friction
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 239000010408 film Substances 0.000 claims description 41
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 10
- 239000011253 protective coating Substances 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 abstract description 13
- 238000000034 method Methods 0.000 abstract description 4
- 238000007747 plating Methods 0.000 abstract description 3
- 230000003247 decreasing effect Effects 0.000 abstract 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は磁気ディスクに関し、特に表面に特性の優れた
保護被膜を有する磁気ディスクに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic disk, and more particularly to a magnetic disk having a protective coating with excellent properties on its surface.
［従来の技術］
磁気ディスクの占める空間的大きざをできるだけ有効に
使用するためには、情報の記録密度を可能な限り高める
ことが必要である。しかし、そのためには磁気ヘッドと
磁気ディスクの間隔を極力小さくしなければならない。[Prior Art] In order to use the space occupied by a magnetic disk as effectively as possible, it is necessary to increase the recording density of information as much as possible. However, for this purpose, the distance between the magnetic head and the magnetic disk must be made as small as possible.
その結果、磁気ヘッドと磁気ディスクの衝突や摩耗が必
然的に増加することは避けられないので、磁気ディスク
の情報を守るために保護膜を設けることが必要となる。As a result, collisions and wear between the magnetic head and the magnetic disk inevitably increase, so it is necessary to provide a protective film to protect the information on the magnetic disk.
従来の磁気ディスクではその保護膜として比較的硬度の
高い５ｉ０２薄膜が用いられ、表面の摩擦係数を小さく
するため、その上に有機溶剤の潤滑層が設けられている
。In conventional magnetic disks, a relatively hard 5i02 thin film is used as a protective film, and a lubricating layer of an organic solvent is provided thereon to reduce the coefficient of friction on the surface.
［発明が解決しようとする課題］
しかしながら、上記のような従来の磁気ディスクに用い
られている保護膜としての５ｉ０２ 薄膜と有機潤滑層
の組合わせでは、磁気ヘッドと磁気ディスクの間隔が狭
くなった場合には磁気ヘッドに用いられている材質より
保護膜の材質の方が硬度が小さいので耐摩耗性が得られ
なくなる。また、表面に塗布した有機溶剤の潤滑層は液
体であるために乾燥やヘッドとの固着等の問題点が生じ
やすい等の欠点があった。[Problem to be solved by the invention] However, with the combination of the 5i02 thin film and organic lubricant layer used as a protective film for conventional magnetic disks as described above, the distance between the magnetic head and the magnetic disk becomes narrow. In this case, the material of the protective film has a lower hardness than the material used for the magnetic head, so that wear resistance cannot be obtained. Furthermore, since the lubricating layer of an organic solvent applied to the surface is a liquid, it has disadvantages such as drying and adhesion to the head.
本発明は以上述ぺたような従来の問題点を解決するため
になされたもので、優れた耐摩耗性を有すると共に、表
面における摩擦か低減化された保護被膜を有する磁気デ
ィスクを提供することを目的とする。The present invention has been made in order to solve the above-mentioned conventional problems, and aims to provide a magnetic disk having excellent wear resistance and a protective coating that reduces friction on the surface. purpose.
［課題を解決するための手段］
本発明は、磁性膜および表面に複数の溝を形成されたシ
リコン薄膜が順次設けられた基板上に、ダイヤモンド状
炭素で形成された保護被膜が設けられてなることを特徴
とする磁気ディスクである。[Means for Solving the Problems] The present invention comprises a substrate in which a protective coating made of diamond-like carbon is provided on a substrate on which a magnetic film and a silicon thin film with a plurality of grooves formed on the surface are sequentially provided. This is a magnetic disk characterized by the following.
上記の保護被膜は磁性膜の全面にわたって設けられてい
ることが望ましい。It is desirable that the protective coating described above be provided over the entire surface of the magnetic film.
［作用］
ダイヤモンド状炭素膜は水素を含有したアモルファス構
造にもかかわらず、硬度がダイヤモンド結晶に近い値を
示し、ヤング率もダイヤモンド結晶の値に匹敵する。し
かし、ダイヤモンドに近いほど表面の摩擦係数は０．５
以上とかなり大きな値となる。これは磁気ヘッドと炭素
を主成分とする保護膜の表面が極めて滑らかなためにヘ
ッドと保護膜表面とが凝着しやすくなり、このために摩
擦係数が大ぎくなっているものと考えられる。本発明で
は摩擦係数を小さくするために磁性膜と保護膜の間に両
者の密着性を向上させるために設けられたシリコン薄膜
に極薄い溝を形成し、保護膜衣ｍｌに薄い段差を形成し
てヘッドと保護膜表面との接触面積を極力低減すること
によって表面での摩擦係数を０．０５以下とすることが
できる。このように本発明ではダイヤモンド状炭素膜の
表面に極薄い段差を形成することによって、耐摩耗性と
潤滑性を併せもたせているので高性能の磁気ディスクが
得られることになる。また、磁性膜上に設けるシリコン
薄膜は磁性膜とダイヤモンド状炭素膜との密着性を飛躍
的に向上させる性質を持っているので、どんな磁性膜上
でも上記ダイヤモンド状炭素膜を保護被膜として形成す
ることができ、ダイヤモンド状炭素膜自身の性質を有効
に利用できる。[Function] Although the diamond-like carbon film has an amorphous structure containing hydrogen, its hardness is close to that of a diamond crystal, and its Young's modulus is also comparable to that of a diamond crystal. However, the closer it is to diamond, the more the friction coefficient of the surface is 0.5.
This is a fairly large value. This is thought to be because the surfaces of the magnetic head and the protective film, which is mainly composed of carbon, are extremely smooth, making it easy for the head and the protective film to adhere to each other, resulting in a large coefficient of friction. In the present invention, in order to reduce the coefficient of friction, an extremely thin groove is formed in the silicon thin film provided between the magnetic film and the protective film to improve the adhesion between the two, and a thin step is formed in the protective film. By reducing the contact area between the head and the surface of the protective film as much as possible, the coefficient of friction on the surface can be reduced to 0.05 or less. As described above, in the present invention, by forming extremely thin steps on the surface of the diamond-like carbon film, both wear resistance and lubricity are provided, so that a high-performance magnetic disk can be obtained. In addition, the silicon thin film provided on the magnetic film has the property of dramatically improving the adhesion between the magnetic film and the diamond-like carbon film, so the diamond-like carbon film can be formed as a protective film on any magnetic film. This makes it possible to effectively utilize the properties of the diamond-like carbon film itself.
［実施例］
以下、本発明の実施例について図面を参照して詳細に説
明する。[Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
第１図は本発明の一実施例の縦断面図である。FIG. 1 is a longitudinal sectional view of an embodiment of the present invention.
表面にＮｉＰメツキ層１２およびＣｏ、 Ｃｏ−Ｃｒ等
の磁性膜１３を順次形成したＭ基板１１上に、スパッタ
、真空蒸着あるいはクラスターイオンビーム等によって
１００Å以下のシリコン薄膜１４を磁性膜とダイヤモン
ド状炭素膜との密着性を高めるために極薄く形成する。On the M substrate 11 on which a NiP plating layer 12 and a magnetic film 13 of Co, Co--Cr, etc. are sequentially formed, a silicon thin film 14 of 100 Å or less is formed by sputtering, vacuum evaporation, cluster ion beam, etc., with a magnetic film and diamond-like carbon. Formed extremely thin to improve adhesion to the membrane.
次に、シリコン薄膜１４が形成された基板の表面に７オ
トレジストを塗布し、乾燥させた後に紫外線露光装置に
よってフォトレジストに幅約１０ｐａ程度の窓を形成し
、その後イオンエツヂング装置によってシリコン膜の厚
さの約５分の１程度の深さの溝を縦横に形成する。その
後、フォトレジストを除去する。以上のようにして形成
した基板を真空槽内の平行平板電極の負電極上に設置す
る。まず、真空槽内を１Ｏ−６Ｔｏｒｒ以下の真空度に
した後、メタンガスと水素ガスを導入する。メタンと水
素の混合比は０．１〜５％の範囲とし、圧力を０．１〜
１０ＴｏｒｒＭ’調節する。その後、真空槽内の平行平
板電極間に２５０〜３５０Ｖ程度の放電型′圧、０．１
〜１ｍＡ／ｃｍ２程度の放電電流を印加してＤＣグロー
放電を生じさせる。１分はどプラズマを発生させて約２
００人のダイヤモンド状炭素膜１５を形成する。この時
点では表面のビッカース硬度は１００００Ｋｇ／ｍｍ２
程度でおり、膜表面の動摩擦係数を測定したところ０．
０５以下であった。一方、シリコン薄膜に溝を形成しな
い以外は上記と同様にして作製した膜の動摩擦係数は０
．５以上であった。Next, a photoresist (7) is applied to the surface of the substrate on which the silicon thin film 14 has been formed, and after drying, a window with a width of about 10 pa is formed in the photoresist using an ultraviolet exposure device, and then a window with a width of about 10 pa is formed in the photoresist using an ion etching device. Grooves with a depth of about one-fifth of the thickness are formed vertically and horizontally. After that, the photoresist is removed. The substrate formed as described above is placed on the negative electrode of the parallel plate electrode in a vacuum chamber. First, after the vacuum chamber is brought to a vacuum level of 10-6 Torr or less, methane gas and hydrogen gas are introduced. The mixing ratio of methane and hydrogen is in the range of 0.1 to 5%, and the pressure is in the range of 0.1 to 5%.
Adjust to 10 TorrM'. After that, a discharge type' pressure of about 250 to 350 V was applied between the parallel plate electrodes in the vacuum chamber, and the voltage was 0.1
A discharge current of about 1 mA/cm2 is applied to generate a DC glow discharge. Generate plasma for 1 minute and generate approximately 2
00 diamond-like carbon film 15 is formed. At this point, the Vickers hardness of the surface is 10,000 Kg/mm2
When the coefficient of dynamic friction of the film surface was measured, it was 0.
It was below 05. On the other hand, the coefficient of dynamic friction of a film prepared in the same manner as above except that no grooves were formed in the silicon thin film was 0.
．． It was 5 or more.
裏面にも上記と同じプロセスによって保護被膜を形成し
た。A protective film was also formed on the back side by the same process as above.
以上のような方法で形成した磁気□ディスクの表面で１
５ｇ程度の荷重をかけたセラミック＃２Ｑ３−ＴｉＣ製
の磁気ヘッドの接触−浮上の繰返し試験（いわゆるｃｏ
ｎｔａｃｔ−ｓｔａｒｔ−ｓｔｏｐ試験）を行ったとこ
ろ、１Ｏ万回以上でも表面には傷は見られなかった。1 on the surface of the magnetic □ disk formed by the above method.
A repeated contact-floating test (so-called CO
When a ntact-start-stop test was conducted, no scratches were observed on the surface even after 100,000 times or more.
以上の実施例ではダイヤモンド状炭素膜をＤＣグロー放
電ＣＶＤによって合成したが、同じガスを用いたＲＦプ
ラズマＣＶＤやイオンブレーティング、イオンビームス
パッタ等によってもほぼ同様な膜が得られる。また、本
実施例ではＤＣグロー放電における電極は平行平板構造
であるが、□アノードとカソード電極が対向していない
構造にお□いても同様な結果が得られる。In the above embodiments, diamond-like carbon films were synthesized by DC glow discharge CVD, but substantially similar films can also be obtained by RF plasma CVD, ion blating, ion beam sputtering, etc. using the same gas. Further, in this example, the electrodes in the DC glow discharge have a parallel plate structure, but similar results can be obtained even if the electrodes have a structure in which the anode and cathode electrodes do not face each other.
［発明の効果］
以上説明したように、本発明によると、基板上に設けら
れた磁性膜の上に磁性膜とダイヤモンド状炭素膜との密
着性を高めるためのシリコン膜を設け、このシリコン膜
の表面に極薄い溝を形成することによりダイヤモンド状
炭素膜の表面に段差を設けている。このためダイヤモン
ド状炭素膜の優れた特性によって磁性膜を保護しつつ表
面での摩擦の低減化が達成されるので、高性能の磁気デ
ィスクを提供することができる。[Effects of the Invention] As explained above, according to the present invention, a silicon film is provided on the magnetic film provided on the substrate to improve the adhesion between the magnetic film and the diamond-like carbon film, and the silicon film is Steps are provided on the surface of the diamond-like carbon film by forming extremely thin grooves on the surface of the diamond-like carbon film. Therefore, due to the excellent properties of the diamond-like carbon film, it is possible to reduce friction on the surface while protecting the magnetic film, making it possible to provide a high-performance magnetic disk.
第１図は本発明の一実施例の縦断面図である。
１１・・・Ｎ基板 １２・・・ＮｉＰメツキ
層１３・・・磁性膜 １４・・・シリコン薄
膜１５・・・ダイヤモンド状炭素膜FIG. 1 is a longitudinal sectional view of an embodiment of the present invention. 11...N substrate 12...NiP plating layer 13...magnetic film 14...silicon thin film 15...diamond-like carbon film
Claims (1)
ン薄膜が順次設けられた基板上に、ダイヤモンド状炭素
で形成された保護被膜が設けられてなることを特徴とす
る磁気ディスク。(1) A magnetic disk characterized in that a protective coating made of diamond-like carbon is provided on a substrate on which a magnetic film and a silicon thin film with a plurality of grooves formed on the surface are sequentially provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6932288A JPH01243230A (en) | 1988-03-25 | 1988-03-25 | Magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6932288A JPH01243230A (en) | 1988-03-25 | 1988-03-25 | Magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01243230A true JPH01243230A (en) | 1989-09-27 |
Family
ID=13399202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6932288A Pending JPH01243230A (en) | 1988-03-25 | 1988-03-25 | Magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01243230A (en) |
-
1988
- 1988-03-25 JP JP6932288A patent/JPH01243230A/en active Pending
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