JPS6331020A - Magnetic disk formed protecting film and forming method for its protecting film - Google Patents
Magnetic disk formed protecting film and forming method for its protecting filmInfo
- Publication number
- JPS6331020A JPS6331020A JP17382886A JP17382886A JPS6331020A JP S6331020 A JPS6331020 A JP S6331020A JP 17382886 A JP17382886 A JP 17382886A JP 17382886 A JP17382886 A JP 17382886A JP S6331020 A JPS6331020 A JP S6331020A
- Authority
- JP
- Japan
- Prior art keywords
- film
- carbon
- magnetic disk
- protective film
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 39
- 239000007789 gas Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052786 argon Inorganic materials 0.000 claims abstract description 4
- 230000001681 protective effect Effects 0.000 claims description 53
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 19
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- 239000011737 fluorine Substances 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 239000002131 composite material Substances 0.000 claims description 5
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 abstract description 6
- 239000003990 capacitor Substances 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 84
- 239000010409 thin film Substances 0.000 description 8
- 229910021385 hard carbon Inorganic materials 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000005489 elastic deformation Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は保護皮膜を形成した磁気ディスクおよびその保
護皮膜の形成方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic disk on which a protective film is formed and a method for forming the protective film.
（従来の技術）
従来、このような分野の技術としては、昭和６０年特許
出願公告第２３４０６号公報に記載されるものがあった
。この従来の技術は、磁気ディスク表面に、グラファイ
ト状炭素薄膜、ダイヤモンド状炭素薄膜、グラファイト
状炭素薄膜とダイヤモンド状炭素薄膜とを交互に重ねた
薄膜、もしくは、グラファイト状炭素とダイヤモンド状
炭素との混在する薄膜のいずれかより成る保護皮膜を設
けたことを特徴として構成されたものであって、イオン
化室内のアルゴン雰囲気中の高圧放電装置において、炭
素を主成分とする保護皮膜を磁気ディスクの表面の全面
もしくは一部分に設けるようにし、該保護皮膜は磁気ヘ
ッドとの衝突摩耗に強いという効果を有するものであっ
た。(Prior Art) Conventionally, as a technology in this field, there was one described in Patent Application Publication No. 23406 of 1985. This conventional technology uses a thin film of graphite-like carbon, a diamond-like carbon thin film, an alternating stack of graphite-like carbon thin films and diamond-like carbon thin films, or a mixture of graphite-like carbon and diamond-like carbon on the magnetic disk surface. In a high-pressure discharge device in an argon atmosphere in an ionization chamber, a protective film mainly composed of carbon is applied to the surface of a magnetic disk. The protective coating was provided on the entire surface or a portion thereof, and had the effect of being resistant to wear due to collision with the magnetic head.
前記の従来技術の１例のいわゆるダイヤモンドライクカ
ーボンとよばれる硬質カーボン膜の外にも、他の例の硬
質力〒設ン膜をスパッタリングによって形成したもの、
又はさらに他の例のプラズマＣＶＤにより形成されたも
のもある。In addition to the hard carbon film called so-called diamond-like carbon, which is an example of the prior art described above, there are other examples of hard carbon films formed by sputtering.
Alternatively, there are still other examples formed by plasma CVD.
（発明が解決しようとする問題点）
磁気ディスクの高性能化を図るためには、情報の記録密
度を可能な限シ高めることが必要となる。(Problems to be Solved by the Invention) In order to improve the performance of magnetic disks, it is necessary to increase the information recording density as much as possible.
しかしこのためには磁気ディスクの磁気特性を向上させ
ることの他に、磁性膜の膜厚を薄くシ、シかも磁気ヘッ
ドとの間隙を極力小さくすることが要求される。その結
果、磁気ヘッドとの衝突、摩擦から磁気ディスクの磁性
膜に記録される情報を守るために保護皮膜を設けること
が必須とされている。このような保護皮膜は当然ながら
、極めて薄い膜でしかも十分な潤滑性および耐摩耗性を
備えたものでなければならないが、このような条件を満
たす保護皮膜は非常に少なく、磁気ディスクの装置の高
密度化に大きな障害となっている。However, this requires not only improving the magnetic properties of the magnetic disk, but also reducing the thickness of the magnetic film and minimizing the gap between it and the magnetic head. As a result, it is essential to provide a protective film to protect the information recorded on the magnetic film of the magnetic disk from collision and friction with the magnetic head. Naturally, such a protective film must be extremely thin and have sufficient lubricity and abrasion resistance, but there are very few protective films that meet these conditions, and it is not suitable for magnetic disk devices. This is a major obstacle to increasing density.
前記の従来技術のダイヤモンドライクカーボンとよばれ
る硬質カーボン膜は硬度が高く、潤滑性に優れているが
、磁気ディスクの表面にこの硬質カービン膜を形成する
ための工程は複雑であって装置の取扱いも複雑であり、
又イオン化室外に移動した場合空気中の湿度を硬質カー
ボン膜を受は易いという欠点があり、更に磁気ディスク
の弾性変形によシ下地と剥離し脱落しやすいという欠点
があった。また従来の他の例の硬質カーボン膜をスパッ
タリングによって形成したものは、皮膜は縞状、柱状組
織となシ、均一な膜が付きＫくいという欠点があった。The hard carbon film called diamond-like carbon in the prior art described above has high hardness and excellent lubricity, but the process for forming this hard carbon film on the surface of the magnetic disk is complicated and the handling of the equipment is difficult. is also complicated,
Furthermore, when the hard carbon film is moved outside the ionization chamber, it has the disadvantage that the hard carbon film easily absorbs the humidity in the air, and furthermore, it has the disadvantage that it is likely to separate from the base and fall off due to the elastic deformation of the magnetic disk. Further, other conventional hard carbon films formed by sputtering have the disadvantage that the film has a striped or columnar structure and is difficult to form a uniform film.
更に表面積の大きい炭素皮膜では、皮膜中に水蒸気等の
汚染物を吸着しやすく、内部に浸透して、磁性膜を形成
する磁性体を劣化させるなどの問題があった。また磁性
膜としてＣｏ−Ｎｉ等の金属薄膜媒体を用いた場合、カ
ーボン膜自体に吸着性があシ、水分等が吸着しやすく、
腐食によシ磁気特性および摩擦特性に影響を与えるとい
う問題がアシ、重要な課題となっている。Further, a carbon film having a large surface area has the problem that contaminants such as water vapor are easily adsorbed into the film, penetrate into the film, and deteriorate the magnetic material forming the magnetic film. In addition, when a metal thin film medium such as Co-Ni is used as a magnetic film, the carbon film itself has adsorption properties, and moisture etc. are easily adsorbed.
The problem of corrosion affecting magnetic and frictional properties has become an important issue.
さらに崖埃なども吸着しやすく、表面にほこりを堆積し
て、ヘッドクラッシュの原因となるなどの欠点があった
。また炭素自体は粉状の摩耗粉を形成しやすくこの摩耗
粉もヘッドクラッシュ等の障害の原因となりやすかった
。一方従来の更に他の例のプラズマＣＶＤによシ形成し
たものは、ち密な炭素膜かえられるが、皮膜形成時に、
高温になり、磁性媒体を劣化させやすい。さらに連続磁
気媒体形成工程との適合性が悪く、新たにプラズマＣＶ
Ｄの工程を導入する必要があり、比較的コストが高くな
るという欠点があった。Furthermore, it has the disadvantage that it easily attracts cliff dust and the like, causing dust to accumulate on the surface and causing head crashes. Further, carbon itself tends to form powdery wear particles, which also tend to cause problems such as head crashes. On the other hand, in yet another example of the conventional plasma CVD method, a dense carbon film can be formed, but during film formation,
It becomes high temperature and tends to deteriorate the magnetic medium. Furthermore, it is not compatible with the continuous magnetic medium forming process, and a new plasma CV
It is necessary to introduce step D, which has the drawback of relatively high cost.
本発明の目的は、従来の磁気ディスクの保護皮膜の欠点
を除去し、機械的耐久性を飛躍的に向上させた高性能磁
気ディスクを提供することにある。An object of the present invention is to provide a high-performance magnetic disk that eliminates the drawbacks of the protective coating of conventional magnetic disks and has dramatically improved mechanical durability.
（問題点を解決するための手段）
前記問題点を解決するため、本発明は、基板上に磁性膜
とその保護皮膜を有する磁気ディスクにおいて、フッ化
炭素を含有する炭素膜よりなる保護皮膜をディスク表面
に設けて磁気ディスクを構成し、また該保護皮膜の形成
方法として、炭素ターゲットまたは炭素を主成分とする
複合ターゲットを用い、アルゴンとフッ化炭素ガス又は
フッ化炭素ガスのみをプラズマ中で作用させスｉＥ ７
タリングによシ保護皮膜を形成するように構成する形成
方法あるいは炭素および含フツ素高分子の複数ターゲッ
トまたはそれらの複合材をターゲットとし、スノやツタ
リングによシ形成する形成方法を構成した。(Means for Solving the Problems) In order to solve the above problems, the present invention provides a magnetic disk having a magnetic film and its protective film on a substrate, in which a protective film made of a carbon film containing carbon fluoride is provided. The protective film is formed on the disk surface to form a magnetic disk by using a carbon target or a composite target containing carbon as the main component, and using argon and fluorocarbon gas or only fluorocarbon gas in plasma. Action iE 7
A method of forming a protective film by tuttering or a method of forming a protective film by snobbing or tuttering using multiple targets of carbon and fluorine-containing polymers or a composite material thereof was constructed.
（作用）
本発明を前記の通りの保護皮膜を有する磁気ディスクと
保護皮膜の形成方法に構成したので、保護皮膜は十分な
潤滑性および耐摩耗性を備え、また耐環境性、ばっ水（
油）性、低摩擦性などのすぐれたち密で均一な膜が得ら
れ寿命の長い信頼性の高い磁気ディスクが得られまた保
護皮膜の形成の工程は複雑でなく装置の取扱いも単純化
されるのである。すなわち、保護皮膜を形成するフッ化
炭素材料は、フッ素原子と炭素原子との結合に於ける低
分極率、高結合エネルギーおよび小さな結合距離などの
分子構造上の際立った物理学的特性に基づき耐熱性、耐
環境性、ばっ水（油）性、低摩擦性などの優れた物性を
有している。従って、吸着物も少なく、耐湿性も改善さ
れる。(Function) Since the present invention is configured as a magnetic disk having a protective film and a method for forming the protective film as described above, the protective film has sufficient lubricity and abrasion resistance, and also has environmental resistance and water repellency (
A dense and uniform film with excellent oil resistance and low friction properties can be obtained, and a highly reliable magnetic disk with a long life can be obtained.The process of forming the protective film is not complicated, and the handling of the equipment is also simplified. It is. In other words, the fluorocarbon material that forms the protective film has excellent heat resistance due to its outstanding physical properties in its molecular structure, such as low polarizability, high bond energy, and small bond distance in the bond between fluorine atoms and carbon atoms. It has excellent physical properties such as hardness, environmental resistance, water (oil) repellency, and low friction. Therefore, there are fewer adsorbed substances and moisture resistance is also improved.
またフッ化炭素を導入することにより、重合度が大きく
、よシ高分子状になシ、架橋などによシち密で、均一な
膜が形成できる。したがって、塵埃も吸着せず、また炭
素を主成分とすると膜の電気抵抗も小さくすることも可
能でアシ、静電気による塵埃の吸着も少ない、という特
徴を有する。Furthermore, by introducing fluorocarbon, a dense and uniform film can be formed due to the high degree of polymerization, high molecular weight, crosslinking, etc. Therefore, it does not attract dust, and if carbon is the main component, it is possible to reduce the electrical resistance of the film, and it has the characteristics that dust is not attracted by dust or static electricity.
またスノクツタリング工程でも均一に形成できるので媒
体形成工程との適合性もよいのでおる。Further, since it can be formed uniformly even in the snoktuttering process, it is compatible with the media forming process.
（実施例） 以下本発明の一実施例を図面と共に説明する。(Example) An embodiment of the present invention will be described below with reference to the drawings.
第１図ａは本発明の一実施例の平面図、第１図すは同じ
（Ｘ −Ｘ’断面図である。図において、１は磁気ディ
スク、２は基板、３は保護皮膜、４は磁性膜である。図
示する如く磁気ディスク１は、基板２の表面に設けられ
た磁性膜４とその上に保護皮膜としてほぼ全面にわたっ
て設けられたフッ化炭素含有炭素膜を主成分とする保護
皮膜３より構成される。第２図ａは本発明の他の実施例
の断面図、第２図すは本発明の更に他の実施例の断面図
である。図において４−１は磁性膜ａ（スパッタ媒体）
、４−２は磁性膜ｂ（金属薄膜媒体）５はアルマイト中
間層、６はニッケル中間層である。FIG. 1a is a plan view of an embodiment of the present invention, and FIG. As shown in the figure, the magnetic disk 1 includes a magnetic film 4 provided on the surface of a substrate 2, and a protective film mainly composed of a fluorocarbon-containing carbon film provided on almost the entire surface as a protective film. 3. Fig. 2a is a cross-sectional view of another embodiment of the present invention, and Fig. 2 is a cross-sectional view of still another embodiment of the present invention. (sputtering medium)
, 4-2 is a magnetic film b (metal thin film medium), 5 is an alumite intermediate layer, and 6 is a nickel intermediate layer.
第２図ａ、ｂに示した実施列は、最近注目されている連
続薄膜媒体の断面図を示している。基板２の上に中間層
としてアルマイト層５まだはＮｉ層６を形成し、磁性媒
体としてスパッタ媒体４−１金属薄膜媒体４−２を形成
し、さらに保護皮膜としてフッ化炭素含有炭素膜を主成
分とする保護皮膜３を形成したものである。The rows shown in FIGS. 2a and 2b show cross-sectional views of continuous thin film media that have recently attracted attention. An alumite layer 5 and a Ni layer 6 are formed as an intermediate layer on the substrate 2, a sputtering medium 4-1 and a metal thin film medium 4-2 are formed as a magnetic medium, and a fluorocarbon-containing carbon film is mainly formed as a protective film. A protective film 3 is formed as a component.
第３図は本発明の一実施例の保護皮膜形成装置の説明図
であり、この装置は高周波スパッタによる実施例である
。図に於て、１１は真空容器、１２は基板ホルダー、１
３は磁気ディスク基板、１４はターゲット、１５はシャ
ッター、１６は高周波電極、１７はマツチングボックス
、１８は高周波電源、１９は油拡散ポンプ、２０は油回
転ポンプ、２１はメインバルブ、２２は荒引きバルブ、
２３は油拡散ポンズ用吸引バルブ、２４はガス導入用可
変パルプ、２５はプラズマガスがンベでらる。FIG. 3 is an explanatory diagram of a protective film forming apparatus according to an embodiment of the present invention, and this apparatus is an embodiment using high frequency sputtering. In the figure, 11 is a vacuum container, 12 is a substrate holder, 1
3 is a magnetic disk substrate, 14 is a target, 15 is a shutter, 16 is a high frequency electrode, 17 is a matching box, 18 is a high frequency power supply, 19 is an oil diffusion pump, 20 is an oil rotary pump, 21 is a main valve, 22 is a rough pull valve,
23 is a suction valve for an oil diffusion pump, 24 is a variable pulp for gas introduction, and 25 is a valve for plasma gas.
真空容器１１内の基板ホルダー１２に磁気ディスク基板
１３を、さらにターゲット１４として、カーボンを取シ
付ける。排気後、ガス導入用可変パルプ２４を開いて、
フッ化炭素ガス又はアルゴンとフッ化炭素ガスの混合ガ
スを導入する。電源１８により高周波電圧を印加し、メ
インバルブ２１で容器内のガス圧を調整して、プラズマ
を発生させる。さらにマツチングボックス１フ中のコン
デンサーにより投入電力を調整し、クリーニング後、シ
ャッター１５を開き、基板への膜形成を行う。以上説明
した如く、スフ４ツタリングにより炭素を主成分とする
皮膜を磁気ディスクの表面の全面もしくは一部分に設け
ることにより、磁気ヘッドとの衝突摩耗に強い磁気ディ
スクを達成することができる。A magnetic disk substrate 13 is attached to a substrate holder 12 in a vacuum container 11, and carbon is attached as a target 14. After exhausting, open the variable pulp 24 for gas introduction,
Introduce fluorocarbon gas or a mixed gas of argon and fluorocarbon gas. A high frequency voltage is applied by the power source 18, and the gas pressure in the container is adjusted by the main valve 21 to generate plasma. Further, the input power is adjusted by a capacitor in the matching box 1, and after cleaning, the shutter 15 is opened to form a film on the substrate. As explained above, by providing a film mainly composed of carbon on the entire surface or a portion of the surface of the magnetic disk by using the Sufu 4 Tsuttering method, it is possible to achieve a magnetic disk that is resistant to abrasion caused by collision with a magnetic head.
ターゲット１４には、後から第４図だ示すように炭素材
料とフッ素系高分子の複合材を用いることができる。ま
た保護皮膜を均一化するため磁気ディスク基板１３を皮
膜形成時に回転させると良い。またターゲット１４を回
転させても同様に均一な膜が得られる。このような保護
皮膜の厚さは情報の書込み読みだしを行う記憶領域で高
々５００〜１０００オングストロ一ム位であり、スノぐ
ツタリングにおいても膜の成長速度をもとて所定の成長
時間によシ制御される。なお前記保護皮膜はフッ化炭素
を含有しているので、耐環境性、はっ水（油）性、低摩
擦性などの優れた物性を有している。さらに、吸着物も
少なく、耐湿性も改善される。また、ち密で、均一な膜
が形成できる。さらに炭素を主成分としているので比較
的硬くて、固体潤滑性があるので潤滑性と耐摩耗性に優
れている。またこれらの性質を兼備した保護皮膜とする
ことができる。しかもこれの性質はス・り、タリング条
件を変化させ、フッ化炭素の成分比を変化させる事によ
シ用途によって、必要な特性を得ることができる。具体
的にはガス圧の比率とターゲットの成分比を要因として
、フッ化炭素の含有率、構造を変化させることができる
。As shown in FIG. 4 later, a composite material of a carbon material and a fluorine-based polymer can be used for the target 14. Further, in order to make the protective film uniform, it is preferable to rotate the magnetic disk substrate 13 when forming the film. Further, even if the target 14 is rotated, a uniform film can be similarly obtained. The thickness of such a protective film is approximately 500 to 1,000 angstroms at most in the storage area where information is written and read, and even in snogtuttering, it can be designed based on the growth rate of the film and set at a predetermined growth time. controlled. Since the protective film contains fluorocarbon, it has excellent physical properties such as environmental resistance, water (oil) repellency, and low friction. Furthermore, there are fewer adsorbed substances and moisture resistance is improved. Moreover, a dense and uniform film can be formed. Furthermore, since it is mainly composed of carbon, it is relatively hard and has solid lubricating properties, so it has excellent lubricity and wear resistance. Further, a protective film having both of these properties can be obtained. Moreover, the properties of this material are slender, and by changing the talling conditions and changing the component ratio of fluorocarbon, the required characteristics can be obtained depending on the application. Specifically, the content rate and structure of fluorocarbon can be changed depending on the gas pressure ratio and target component ratio.
以上に述べた実施例の保護皮膜および保獲皮膜形成法は
この発明を具現するための一例にすぎず、フッ化炭素を
ふくむ炭素膜を設けた磁気ディスクであればいずれもこ
の発明の特徴が生かされることは言うまでもない。たと
えば保護皮膜の形成法として、バイアス型のＲＦス・フ
ッタ、イオンビームスＡ’ツタ、高速原子線スノ’ｅツ
タ、プラズマＣＶＤの方法を用いても形成できる。The protective film and retention film forming method of the embodiments described above are merely examples for embodying the present invention, and any magnetic disk provided with a carbon film containing fluorocarbon will have the characteristics of the present invention. Needless to say, he will be saved. For example, the protective film can be formed using a bias type RF footer, ion beam A'e ivy, high speed atomic beam snow'e ivy, or plasma CVD method.
また今まで主てハード型の磁気ディスク装置について述
べたが、フレキシブルディスクに適用してもその効果は
太きい。特にフレキシブルディスクでは、ディスクとヘ
ッドが固体接触しているため、耐摩耗性が課題になって
おり、本発明の保護皮膜を形成した磁気ディスクの寿命
改善の効果は著しい。通常、柔軟性を有するフロッピー
ディスクに従来技術によるダイヤモンドライクカーボン
のように硬質な膜を形成した場合、ディスクの繰り返し
弾性変形によって下地と剥離し、脱落し易い。これに対
して、本発明では、フッ化炭素ガスの流量を大きくした
り、ターゲットの含フツ素系ポリマの成分を大きくする
ことてよシ、保護皮膜中のフッ化炭素の成分を増大させ
ることにより、膜の柔軟性を増大させ、繰り返し変形に
よる剥離、脱落を防ぐことが可能になる。Furthermore, although we have mainly discussed hard-type magnetic disk devices, the effect is significant even when applied to flexible disks. Particularly in the case of flexible disks, since the disk and the head are in solid contact, wear resistance is an issue, and the effect of improving the life of a magnetic disk on which the protective film of the present invention is formed is remarkable. Normally, when a hard film, such as diamond-like carbon according to the prior art, is formed on a flexible floppy disk, it is likely to separate from the underlying layer and fall off due to repeated elastic deformation of the disk. In contrast, in the present invention, the flow rate of the fluorocarbon gas is increased, the component of the fluorine-containing polymer in the target is increased, and the fluorocarbon component in the protective film is increased. This makes it possible to increase the flexibility of the membrane and prevent it from peeling off or falling off due to repeated deformation.
本発明の実施例の保護皮膜のすべり摩擦について、従来
技術による保護皮膜との比較において測定してみた。表
面に保護皮膜を形成した試験片表面上に負荷をかけた球
圧子を揺動せしめるすベシ摩擦試験で、摩擦係数の急増
するまでの摩擦回数を摩擦寿命とみなし相対的の比較を
行なった。The sliding friction of the protective film of the example of the present invention was measured in comparison with the protective film of the prior art. In a Vesi friction test in which a loaded ball indenter is oscillated on the surface of a test piece with a protective film formed on it, the number of times of friction until the friction coefficient suddenly increases is regarded as the friction life, and a relative comparison is made.
第５図は保護皮膜のすべり摩擦比較図である。FIG. 5 is a comparison diagram of sliding friction of protective films.
縦軸に相対摩擦寿命を、横軸に保護皮膜（イ）、（ロ）
。Relative friction life is plotted on the vertical axis, and protective film (a) and (b) are plotted on the horizontal axis.
.
（ハ）を記入した。（イ）は従来技術による炭素ターゲ
ットを用いＡｒガスを作用させた保護皮膜（ロ）、（ハ
）本発明の実施例の保護皮膜である。(c) was entered. (a) shows a protective film made by using a carbon target according to the prior art and exposed to Ar gas (b); and (c) a protective film according to an embodiment of the present invention.
従来性われていた炭素ターゲットを用い、Ａｒガスを作
用させて形成した保護膜（イに比べ、炭素ターゲットを
用い、ＣＦ４ガスを作用させて形成した保護膜、含フツ
素系高分子をターゲットとして用い、Ａｒガスを作用さ
せて形成した保護膜（ロ）、（／→はそれぞれ５倍、６
倍の摩擦寿命を示している。このように前記した方法に
よりフッ化炭素を含有した保護皮膜を形成して、耐摩耗
性、潤滑性を著しく改善できた。A protective film formed by using a conventional carbon target and applying Ar gas (compared to A), a protective film formed by using a carbon target and applying CF4 gas to a fluorine-containing polymer protective film (b), (/→ is 5 times and 6 times, respectively)
It shows twice the friction life. As described above, by forming a protective film containing fluorocarbon, wear resistance and lubricity were significantly improved.
（発明の効果）
以上説明したように、本発明に係る磁気ディスクは表面
にフッ化炭素を含有した保護皮膜を形成しであるので、
耐環境性、はっ水（油）性、低摩擦性などの優れた物性
を有している。従って、吸着物も少なく、耐湿性も改善
される。また、ち密で、均一な膜が形成できる。さらに
炭素を主成分とし比較的硬くて、固体潤滑性があるので
潤滑性と耐摩耗性に優れている。従って耐環境性があり
、寿命の長い信頼性の高い磁気ディスクが得られるとい
う効果がある。(Effects of the Invention) As explained above, since the magnetic disk according to the present invention has a protective film containing fluorocarbon formed on its surface,
It has excellent physical properties such as environmental resistance, water (oil) repellency, and low friction. Therefore, there are fewer adsorbed substances and moisture resistance is also improved. Moreover, a dense and uniform film can be formed. Furthermore, it is relatively hard, mainly composed of carbon, and has solid lubricating properties, so it has excellent lubricity and wear resistance. Therefore, it is possible to obtain a highly reliable magnetic disk that is environmentally resistant and has a long life.
第１図ａは本発明の一実施例の平面図、第１図すは本発
明の一実施例のｘ −ｘ’断面図、第２図ａは本発明の
他の実施例の断面図、第２図すは本発明の更に他の実施
例、第３図は本発明の一実施例の保護皮膜形成装置の説
明図、第４図ａは保護皮膜形成用ス・ぐツタリング複合
ターゲットの１例の平面図、第４図すは同じ他の例の平
面図、第５図は保護皮膜のすベシ摩擦測定比較図である
。
１・・・磁気ディスク、２・・・基板、３・・・保護皮
膜、４・・・磁性膜、５・・・アルマイト層、６・・・
ニッケル層、１１・・・真空容器、１２・・・基板ホル
ダー、１３・・・磁気ディスク基板、１４・・・ターゲ
ット、１５・・・シャッター、１６・・・高周波電極、
１７・・・マツチングボックス、１８・・・高周波電源
、１９・・・油拡散ポンプ、２０・・・油回転ポンプ、
２１・・・メインバルブ、２２・・・荒引きバルブ、２
３・・・油拡散ポンプ用吸引バルブ、２４・・・ガス導
入用可変バルブ、２５・・・プラズマガスポンベ、３１
・・・炭素ターゲット、３２・・・含フツ素系高分子タ
ーゲット。
本発明の一実施例の平面図
第１図Ｏ
本発明の一実施例のＸ−Ｘ′断面図
第１図す
本発明の他の実施例の断面図
第２図ｃ
本発明の更に他の実施例
第２図ｂ
１２：基板ホルダー ２０；油回転ポンプ１３：磁気
ディスク基板２１：メインパルプ＋４ｉターグ７ト２２
；荒引きパルプ
１５：シャノタ−２３：油拡散ポンプ用吸引バルブＩ６
：高周波電極 ２４：ガス導入用可変パルプ１７：
マノチングボノクス ２５！７’ラズマガスボンベ旧：
高周波電極
本発明の一実施例の保護皮膜形成装置の説明図第３図
３１：炭素ターゲット
３２１含フン素系高分子ターケゞソト
ｙ−”””’”’ 同じく他の例の平面図複合
ターケゞノドの１ｆｔＸ啜Ｈ厄ス
第４図Ｏ第４図ｂFIG. 1a is a plan view of an embodiment of the present invention, FIG. 1 is a sectional view taken along the line x-x' of an embodiment of the present invention, and FIG. FIG. 2 is a further embodiment of the present invention, FIG. 3 is an explanatory diagram of a protective film forming apparatus according to an embodiment of the present invention, and FIG. FIG. 4 is a plan view of the same example, and FIG. 5 is a comparison diagram of the overall friction measurement of the protective film. DESCRIPTION OF SYMBOLS 1... Magnetic disk, 2... Substrate, 3... Protective film, 4... Magnetic film, 5... Alumite layer, 6...
Nickel layer, 11... Vacuum container, 12... Substrate holder, 13... Magnetic disk substrate, 14... Target, 15... Shutter, 16... High frequency electrode,
17... Matching box, 18... High frequency power supply, 19... Oil diffusion pump, 20... Oil rotary pump,
21... Main valve, 22... Roughing valve, 2
3... Suction valve for oil diffusion pump, 24... Variable valve for gas introduction, 25... Plasma gas pump, 31
...Carbon target, 32...Fluorine-containing polymer target. A plan view of one embodiment of the present invention FIG. 1 O A sectional view taken along the line X-X' of one embodiment of the present invention FIG. Example Fig. 2 b 12: Substrate holder 20; Oil rotary pump 13: Magnetic disk substrate 21: Main pulp + 4i targ 7 to 22
; Roughing pulp 15: Shanota-23: Suction valve I6 for oil diffusion pump
: High frequency electrode 24: Variable pulp for gas introduction 17:
Manoching Bonox 25!7' Razuma gas cylinder old:
High frequency electrode Explanatory diagram of the protective film forming apparatus according to one embodiment of the present invention Fig. 3 31: Carbon target 321 Fluorine-containing polymer target Nodo's 1ft
Claims (3)
スクにおいて、フッ化炭素を含有する炭素膜よりなる保
護皮膜をディスク表面に設けたことを特徴とする保護皮
膜を形成した磁気ディスク。(1) A magnetic disk having a magnetic film and its protective film on a substrate, characterized in that a protective film made of a carbon film containing fluorocarbon is provided on the disk surface.
スクの保護皮膜の形成方法において、炭素ターゲットま
たは炭素を主成分とする複合ターゲットを用い、アルゴ
ンとフッ化炭素ガス又はフッ化炭素ガスのみをプラズマ
中で作用させスパッタリングにより形成することを特徴
とする保護皮膜の形成方法。(2) In a method for forming a protective film on a magnetic disk having a magnetic film and its protective film on a substrate, a carbon target or a composite target mainly composed of carbon is used, and only argon and fluorocarbon gas or fluorocarbon gas is used. 1. A method for forming a protective film, characterized by forming the film by sputtering in a plasma.
スクの保護皮膜の形成方法において、炭素および含フッ
素系高分子の複数ターゲットまたはそれらの複合材をタ
ーゲットとし、スパッタリングにより形成することを特
徴とする保護皮膜の形成方法。(3) A method for forming a protective film for a magnetic disk having a magnetic film and its protective film on a substrate, characterized in that the film is formed by sputtering using multiple targets of carbon and fluorine-containing polymers or a composite thereof. A method for forming a protective film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17382886A JPS6331020A (en) | 1986-07-25 | 1986-07-25 | Magnetic disk formed protecting film and forming method for its protecting film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17382886A JPS6331020A (en) | 1986-07-25 | 1986-07-25 | Magnetic disk formed protecting film and forming method for its protecting film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6331020A true JPS6331020A (en) | 1988-02-09 |
Family
ID=15967907
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17382886A Pending JPS6331020A (en) | 1986-07-25 | 1986-07-25 | Magnetic disk formed protecting film and forming method for its protecting film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6331020A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5275850A (en) * | 1988-04-20 | 1994-01-04 | Hitachi, Ltd. | Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias |
| WO2008069312A1 (en) * | 2006-12-07 | 2008-06-12 | National University Corporation Nagoya University | Process and apparatus for producing carbonaceous film |
-
1986
- 1986-07-25 JP JP17382886A patent/JPS6331020A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5275850A (en) * | 1988-04-20 | 1994-01-04 | Hitachi, Ltd. | Process for producing a magnetic disk having a metal containing hard carbon coating by plasma chemical vapor deposition under a negative self bias |
| WO2008069312A1 (en) * | 2006-12-07 | 2008-06-12 | National University Corporation Nagoya University | Process and apparatus for producing carbonaceous film |
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