JPH01127237U - - Google Patents
Info
- Publication number
- JPH01127237U JPH01127237U JP2445388U JP2445388U JPH01127237U JP H01127237 U JPH01127237 U JP H01127237U JP 2445388 U JP2445388 U JP 2445388U JP 2445388 U JP2445388 U JP 2445388U JP H01127237 U JPH01127237 U JP H01127237U
- Authority
- JP
- Japan
- Prior art keywords
- disc
- conductive
- electrode
- wires
- electrode plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
Landscapes
- Chemical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2445388U JPH01127237U (da) | 1988-02-24 | 1988-02-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2445388U JPH01127237U (da) | 1988-02-24 | 1988-02-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01127237U true JPH01127237U (da) | 1989-08-31 |
Family
ID=31244313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2445388U Pending JPH01127237U (da) | 1988-02-24 | 1988-02-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01127237U (da) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02108335U (da) * | 1989-02-17 | 1990-08-29 | ||
| JP2006278652A (ja) * | 2005-03-29 | 2006-10-12 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| JP2007251014A (ja) * | 2006-03-17 | 2007-09-27 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| WO2009131048A1 (ja) * | 2008-04-24 | 2009-10-29 | シャープ株式会社 | プラズマ処理装置およびそれを用いたプラズマ処理方法 |
-
1988
- 1988-02-24 JP JP2445388U patent/JPH01127237U/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02108335U (da) * | 1989-02-17 | 1990-08-29 | ||
| JP2006278652A (ja) * | 2005-03-29 | 2006-10-12 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| JP2007251014A (ja) * | 2006-03-17 | 2007-09-27 | Hitachi Kokusai Electric Inc | 基板処理装置 |
| WO2009131048A1 (ja) * | 2008-04-24 | 2009-10-29 | シャープ株式会社 | プラズマ処理装置およびそれを用いたプラズマ処理方法 |
| JP2009267048A (ja) * | 2008-04-24 | 2009-11-12 | Sharp Corp | プラズマ処理装置およびそれを用いたプラズマ処理方法 |
| JP4547443B2 (ja) * | 2008-04-24 | 2010-09-22 | シャープ株式会社 | プラズマ処理装置およびそれを用いたプラズマ処理方法 |