JPH01122112A - Manufacture of pattern coil - Google Patents
Manufacture of pattern coilInfo
- Publication number
- JPH01122112A JPH01122112A JP27931287A JP27931287A JPH01122112A JP H01122112 A JPH01122112 A JP H01122112A JP 27931287 A JP27931287 A JP 27931287A JP 27931287 A JP27931287 A JP 27931287A JP H01122112 A JPH01122112 A JP H01122112A
- Authority
- JP
- Japan
- Prior art keywords
- electroless plating
- catalyst
- insulating substrate
- faces
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 238000007772 electroless plating Methods 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 239000004020 conductor Substances 0.000 claims abstract description 11
- 239000003054 catalyst Substances 0.000 claims abstract description 10
- 229920005989 resin Polymers 0.000 claims abstract description 10
- 239000011347 resin Substances 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 17
- 238000009713 electroplating Methods 0.000 claims description 4
- 238000007747 plating Methods 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- AYTAKQFHWFYBMA-UHFFFAOYSA-N chromium dioxide Chemical compound O=[Cr]=O AYTAKQFHWFYBMA-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000001023 inorganic pigment Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 235000014692 zinc oxide Nutrition 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- MFYSUUPKMDJYPF-UHFFFAOYSA-N 2-[(4-methyl-2-nitrophenyl)diazenyl]-3-oxo-n-phenylbutanamide Chemical compound C=1C=CC=CC=1NC(=O)C(C(=O)C)N=NC1=CC=C(C)C=C1[N+]([O-])=O MFYSUUPKMDJYPF-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Manufacture Of Motors, Generators (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は、薄く小型で、導体厚が導体間の間隔より大き
く、かつ高い信頼性を有するパターンコイルの製造方法
に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a patterned coil that is thin and compact, has conductor thickness greater than the spacing between conductors, and has high reliability.
[従来の技術]
従来、コイルを製造する方法としては、巻き線方式が多
用されてきた。しかしながら、この方法で製造されるコ
イルについては、導体の占有率が低いため、小型化、薄
型化することが困難であり、加えて、組立て精度に問題
があった。そのため、このコイルを使用して製造される
モーターの回転精度を上げるには限界があった。[Prior Art] Conventionally, a wire winding method has been frequently used as a method for manufacturing coils. However, since the occupancy rate of the conductor is low in the coil manufactured by this method, it is difficult to make the coil smaller and thinner, and in addition, there is a problem in assembly accuracy. Therefore, there was a limit to increasing the rotation accuracy of motors manufactured using this coil.
また、銅泊を原料とし、フォトエツチング法によって、
パターンコイルを製造する方法も知られている。しかし
、この方法によれば、一般的にコイルの導体間隔はコイ
ルの導体厚の2倍以上となり、導体の占有率が高い鯖密
コイルを製造するには、やはり限界があった。In addition, using copper foil as a raw material, using the photoetching method,
Methods of manufacturing patterned coils are also known. However, according to this method, the spacing between the conductors of the coil is generally more than twice the conductor thickness of the coil, and there is still a limit to the production of a dense coil with a high occupancy rate of the conductors.
フォトエレクトロフォーミング法を応用した製造法とし
て、絶縁フィルムを用い、その表面を触媒処理した後、
感光性ドライフィルムにより所望の回路を得、しかる後
無電解めっきまたはそれと電気めっき併用により高密度
パターンコイルを得る方法も提案されている(特開昭5
9−204215号)。As a manufacturing method applying the photoelectroforming method, an insulating film is used, and after the surface is treated with a catalyst,
A method has also been proposed in which a desired circuit is obtained using a photosensitive dry film, and then a high-density pattern coil is obtained by electroless plating or a combination of electroplating (JP-A-5
No. 9-204215).
[発明が解決しようとする問題点コ
しかしながら、かかる方法で用いられる絶縁フィルムは
、感光性ドライフィルムを露光する際の紫外線に対して
、遮光性がないため、製造しようとする回路形状が表裏
で異なる場合、両面同時に回路形成ができないか、ある
いはできたとしても非常に品質の点で信頼性に欠けるも
のしか提供できないという欠点、即ち、生産性、高精度
性が著しく低いという欠点があった。[Problems to be Solved by the Invention] However, the insulating film used in this method does not have the ability to block ultraviolet light when exposing the photosensitive dry film, so the circuit shape to be manufactured may have two sides. In different cases, circuits cannot be formed on both sides at the same time, or even if they can be formed, they can only provide extremely unreliable products in terms of quality, ie, productivity and high precision are extremely low.
本発明は上記欠点を解決するためになされたものであり
、その目的はフォトエレクトロフォーミング法を利用し
つつも、表裏でパターンが異なる、パターンコイルを、
両面同時露光工程を経て、製造できる方法を提供するこ
とにある。The present invention was made to solve the above-mentioned drawbacks, and its purpose is to create a patterned coil with different patterns on the front and back sides, while utilizing the photoelectroforming method.
It is an object of the present invention to provide a manufacturing method through a double-sided simultaneous exposure process.
[問題点を解決するための手段]
本発明は、紫外線に対して遮光性を有する絶縁基体を用
いて、両面同時露光を可能にし、上記目的を達成したも
のである。即ち、本発明は当該基体の両面に無電解めっ
きのための触媒処理を行う工程と、該両面に感光性樹脂
を被覆後、両面に対して同時パターン露光と、現像とを
実施する工程と、無電解めっきまたは無電解めっきと電
気めっきとの併用によって、導体層を形成する工程とを
有することを特徴とするパターンコイルの製造方法であ
る。[Means for Solving the Problems] The present invention achieves the above object by using an insulating substrate that blocks ultraviolet rays to enable simultaneous exposure of both sides. That is, the present invention includes a step of subjecting both sides of the substrate to a catalyst treatment for electroless plating, a step of coating both sides with a photosensitive resin, and then performing simultaneous pattern exposure and development on both sides. This method of manufacturing a patterned coil includes the step of forming a conductor layer by electroless plating or a combination of electroless plating and electroplating.
以下、本発明の基本的態様を、その工程に沿って詳細に
説明する。Hereinafter, the basic aspects of the present invention will be explained in detail along the steps thereof.
まず、紫外線に対して遮光性を有する絶縁基体を用意し
、その両面に無電解めフき用の触媒処理を行う。First, an insulating substrate having a light-shielding property against ultraviolet rays is prepared, and both surfaces thereof are treated with a catalyst for electroless wipes.
ここで用いる、紫外線に対して遮光性を有する絶縁基体
として、絶縁性基体内に紫外線遮光性の材料を混入した
ものが代表的なものとして挙げられる。その絶縁性基体
としては、アクリル系、ポリアミド系、ポリエステル系
等の熱可塑性樹脂もしくはフェノール系、エポキシ系、
ポリイミド系等の熱硬化性樹脂等から成るフィルムまた
は板を挙げることができる。A typical example of the insulating substrate used here that has a UV-blocking property is an insulating base in which an ultraviolet-blocking material is mixed. The insulating substrate may be thermoplastic resin such as acrylic, polyamide, polyester, phenol, epoxy, etc.
Examples include films or plates made of thermosetting resins such as polyimide.
このような絶縁性基体に混入する紫外線遮光性材料とし
ては、各種の有機、無機顔料や、染料が利用できるが、
紫外線に対する遮光効率、経済性から無機顔料のカーボ
ン黒や亜鉛華、ハンザ黄等が良好である。Various organic and inorganic pigments and dyes can be used as the ultraviolet light blocking material mixed into such an insulating substrate.
Inorganic pigments such as carbon black, zinc white, and Hansa yellow are good in terms of their UV blocking efficiency and economic efficiency.
無電解めっきのための触媒処理の方法は、公知法を利用
すればよい。この触媒処理以前に、絶縁性基体へのめっ
きの密着性を保証するため、適当な処理をするのが望ま
しい。その方法は種々あるが、例えば苛性ソーダ、クロ
ム酸と硫酸との混液もしくは有機溶媒による処理、また
はホーニング処理が挙げられる。A known method may be used for the catalyst treatment for electroless plating. Prior to this catalyst treatment, it is desirable to carry out an appropriate treatment in order to ensure the adhesion of the plating to the insulating substrate. There are various methods for this, such as treatment with caustic soda, a mixture of chromic acid and sulfuric acid, an organic solvent, or honing treatment.
次に、触媒処理された、紫外線に対して遮光性を有する
絶縁基体の両面に感光性樹脂を被覆し、その後両面に各
々独立なパターン露光を同時に実施する。Next, a photosensitive resin is coated on both sides of the catalytically treated insulating substrate having a light shielding property against ultraviolet rays, and then independent pattern exposure is simultaneously performed on both sides.
感光性樹脂の被覆は、感光性樹脂から成る通常のドライ
フィルムや液状レジスト等を用いれば良く、要求される
回路密度、回路導体厚により、被覆層の厚さを適宜選択
する。For coating the photosensitive resin, an ordinary dry film or liquid resist made of a photosensitive resin may be used, and the thickness of the coating layer is appropriately selected depending on the required circuit density and circuit conductor thickness.
パターン露光は代表的にはガラスマスクやフィルムマス
クを用いて実施できる。Pattern exposure can typically be performed using a glass mask or a film mask.
次に、感光性樹脂に応じた液によって、現像した後、無
電解めフきまたは無電解めっきと電気めっきの併用によ
って導体回路を形成する。以上の方法によって、高密度
、高精度なパターンコイルが生産性良く製造できる。Next, after developing with a solution suitable for the photosensitive resin, a conductor circuit is formed by electroless plating or a combination of electroless plating and electroplating. By the above method, a high-density, high-precision patterned coil can be manufactured with good productivity.
[実施例]
以下、本発明を実施例に従って、より具体的に説明する
。[Examples] Hereinafter, the present invention will be described in more detail according to Examples.
実施例1
紫外線に対して遮光性を有する絶縁基体として、カーボ
ンブラックを3重量%混入分散させた厚さ50pのPE
T(ポリエチレンテレフタレート)フィルムを用意し、
その所定位置にNc旋盤により0.8mmφの孔をあけ
、50g/jの苛性ソーダで60℃、5分間処理した。Example 1 PE with a thickness of 50p containing and dispersing 3% by weight of carbon black as an insulating substrate having a light-shielding property against ultraviolet rays.
Prepare T (polyethylene terephthalate) film,
A hole of 0.8 mmφ was made at a predetermined position using an NC lathe, and treated with 50 g/j of caustic soda at 60° C. for 5 minutes.
次いで、30g/jのCrO2,100のg/fのH2
SO4混液で50℃、5分間処理した後、無電解メツキ
触媒(商品名H5−101B日立化成株製)で触媒処理
をし、感光性ドライフィルム(商品名T1020 、デ
ュポン社製)を用い、20胛厚の感光層を形成した。Then 30 g/j CrO2, 100 g/f H2
After treating with an SO4 mixture at 50°C for 5 minutes, catalytic treatment was performed with an electroless plating catalyst (trade name H5-101B, manufactured by Hitachi Chemical Co., Ltd.), and a photosensitive dry film (trade name T1020, manufactured by DuPont) was used for 20 minutes. A thick photosensitive layer was formed.
次に、200 mJ/ cn+2の露光量で両面同時露
光後、トリエタン現像を行ない、所望するパターンを得
た。Next, after simultaneous exposure on both sides at an exposure dose of 200 mJ/cn+2, triethane development was performed to obtain a desired pattern.
使用したフィルムにおける紫外線365nmの透過量と
入射量は第1図に示した如くであり、露光時、互いに反
対面への影響は認められなった。The amount of transmitted and incident ultraviolet rays of 365 nm in the film used were as shown in FIG. 1, and no influence on opposite surfaces was observed during exposure.
次いで、無電解銅を1鱗析出させた後、電気銅めっきに
より25−の析出を得、シートコイルが形成された。Next, after one scale of electroless copper was deposited, 25- was deposited by electrolytic copper plating, and a sheet coil was formed.
実施例2
亜鉛華を5重量%混入分散させた、厚さ50−のPET
フィルムを用意し、その所定位置にNc旋盤により0.
8111mφの孔をあけ、サードブラスト処理により粗
面化した後、実施例1と同様な方法で触媒処理、感光層
形成、露光、現像を行い、所望とするパ°ターンを得た
。Example 2 50-thick PET with 5% by weight of zinc white mixed and dispersed
Prepare a film and place it in a predetermined position using an NC lathe.
After drilling holes of 8111 mφ and roughening the surface by third blasting, catalyst treatment, photosensitive layer formation, exposure, and development were performed in the same manner as in Example 1 to obtain a desired pattern.
使用したフィルムにおける紫外線385nmでの透過量
と入射量は第2図の如くであり、露光時、互いに反対面
の影響は認められなかった。以下実施例1と同様にして
パターンコイルを得た。The transmitted amount and incident amount of ultraviolet rays at 385 nm in the film used are as shown in FIG. 2, and no influence of opposite surfaces was observed during exposure. Thereafter, a patterned coil was obtained in the same manner as in Example 1.
[発明の効果]
以上詳細に説明した本発明のパターンコイルの製造方法
によって、表裏のパターンが異なるパターンコイルを生
産性高く、また高密度、高精度に製造できる。[Effects of the Invention] By the method for manufacturing a patterned coil of the present invention described in detail above, patterned coils with different patterns on the front and back sides can be manufactured with high productivity, high density, and high precision.
第1図、第2図はそれぞれ実施例での365nmの紫外
線の透過量と入射量とを示す図である。FIG. 1 and FIG. 2 are diagrams showing the transmitted amount and incident amount of 365 nm ultraviolet rays in Examples, respectively.
Claims (1)
その両面に無電解めっきのための触媒処理を行う工程と
、 該両面に感光性樹脂を被覆後、両面に対して同時パター
ン露光と、現像とを実施する工程と、無電解めっきまた
は無電解めっきと電気めっきとの併用によって、導体層
を形成する工程とを有することを特徴とするパターンコ
イルの製造方法。[Claims] 1) An insulating substrate having a light-shielding property against ultraviolet rays is prepared,
A step of subjecting both surfaces to a catalyst treatment for electroless plating, a step of coating both surfaces with a photosensitive resin, and then performing simultaneous pattern exposure and development on both sides, and an electroless plating or electroless plating step. A method for manufacturing a patterned coil, comprising the steps of: and forming a conductor layer by a combination of electroplating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27931287A JPH01122112A (en) | 1987-11-06 | 1987-11-06 | Manufacture of pattern coil |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27931287A JPH01122112A (en) | 1987-11-06 | 1987-11-06 | Manufacture of pattern coil |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01122112A true JPH01122112A (en) | 1989-05-15 |
Family
ID=17609410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27931287A Pending JPH01122112A (en) | 1987-11-06 | 1987-11-06 | Manufacture of pattern coil |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01122112A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0538854U (en) * | 1991-10-30 | 1993-05-25 | 株式会社トーキン | Coil with pin terminal |
JPH0553233U (en) * | 1991-12-18 | 1993-07-13 | 株式会社トーキン | Resin box type noise filter |
JPH0553232U (en) * | 1991-12-18 | 1993-07-13 | 株式会社トーキン | Substrate type noise filter |
-
1987
- 1987-11-06 JP JP27931287A patent/JPH01122112A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0538854U (en) * | 1991-10-30 | 1993-05-25 | 株式会社トーキン | Coil with pin terminal |
JPH0553233U (en) * | 1991-12-18 | 1993-07-13 | 株式会社トーキン | Resin box type noise filter |
JPH0553232U (en) * | 1991-12-18 | 1993-07-13 | 株式会社トーキン | Substrate type noise filter |
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