JPH01119594A - Crystal growing device - Google Patents

Crystal growing device

Info

Publication number
JPH01119594A
JPH01119594A JP27789587A JP27789587A JPH01119594A JP H01119594 A JPH01119594 A JP H01119594A JP 27789587 A JP27789587 A JP 27789587A JP 27789587 A JP27789587 A JP 27789587A JP H01119594 A JPH01119594 A JP H01119594A
Authority
JP
Japan
Prior art keywords
molten metal
raw materials
raw material
falling
supply pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27789587A
Other languages
Japanese (ja)
Other versions
JPH0723277B2 (en
Inventor
Naoki Ono
直樹 小野
Michio Kida
喜田 道夫
Yoshiaki Arai
義明 新井
Tateaki Sahira
佐平 健彰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP62277895A priority Critical patent/JPH0723277B2/en
Priority to DE8888118267T priority patent/DE3865628D1/en
Priority to EP88118267A priority patent/EP0315156B1/en
Publication of JPH01119594A publication Critical patent/JPH01119594A/en
Priority to US07/521,683 priority patent/US5080873A/en
Publication of JPH0723277B2 publication Critical patent/JPH0723277B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the waving and oscillating of a molten metal surface during falling of raw materials by providing a decelerating part which lowers the falling speed of the raw materials to the molten metal to a supplying pipe for supplying polycrystal raw materials to the molten metal. CONSTITUTION:The polycrystals are melted to form the molten metal Y in a crucible 6 and a pulling up wire 7 is raised to pull up an Si single crystal, etc., from the molten metal Y. The raw materials are supplied to the molten metal Y through the supplying pipe 10 according to the pulling up amt. of the crystal. Baffle plates 11 (decelerating part) made of quartz are alternately fixed at every specified interval respectively in the downward inclined state to, for example, the inside of the inclined part of the supplying pipe 10. The baffle plates 11 form spacings between the bottom end edges thereof and the inside surface of the pipe. The min. width T of these spacings is set at the size at which the raw material grains can easily pass the spacing and at the value which is so considered as to provide an adequate decelerating effect. The angle of inclination of the baffle plates 11 is so set that the raw materials do not stop during the course of falling and the speed at the time of falling to the molten metal Y attains a prescribed value or below.

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は、高純度シリコン単結晶等の製造に用いられる
結晶育成装置に関する。
DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a crystal growth apparatus used for manufacturing high-purity silicon single crystals and the like.

「従来の技術」 CZ法によるシリコン単結晶の製造においては、結晶引
き上げによる溶湯型減少に伴い、溶湯と石英ルツボとの
接触面積が変化し、ルツボからの酸素溶出量が変化する
。しかし最近では、半導体素子基板としてのシリコン単
結晶に、酸素層間とドーパンl−6度の双方に厳しい許
容規格が設けられており、このため、引き上げられた単
結晶のうち半導体素子として使用可能なのは一部分にし
か過ぎず、原料の歩留まりが悪い問題があった。
"Prior Art" In the production of silicon single crystals by the CZ method, as the molten metal type decreases due to crystal pulling, the contact area between the molten metal and a quartz crucible changes, and the amount of oxygen eluted from the crucible changes. However, recently, strict tolerance standards have been set for silicon single crystals used as semiconductor device substrates for both the oxygen interlayer and dopan 1-6 degrees, and for this reason, only a few of the pulled single crystals can be used as semiconductor devices. There was a problem that the yield of raw materials was poor because it was only a part of the process.

そこでこの問題を改善するため、結晶の引き上げ量に応
じて、顆粒状ノリコン原料を供給管を通じてルツボ内に
順次供給して溶78 rJiを一定に保ち、溶出条件の
変化を防ぐようにした装置が従来より各種提案されてい
る(例えば特公昭57−40119号)。
Therefore, in order to improve this problem, a device was developed in which the granular Noricon raw material was sequentially supplied into the crucible through the supply pipe according to the amount of crystals pulled to keep the melt 78 rJi constant and prevent changes in the elution conditions. Various proposals have been made so far (for example, Japanese Patent Publication No. 57-40119).

「発明が解決しようと才ろ問題点」 しかしこの種の装置では、原料の落下時に溶f′易表面
が波立ち、振動が単結晶の成長113に伝わって転位等
の結晶欠陥を引き起こしてしまう問題があった。そこで
対応策の一つとして、単結晶棒と原料落下部との間に円
筒状の仕切り等を配置することも試みられているが(U
 S −2892739号、特開昭57−183392
号、特開昭61−36197号など)、これらにおいて
も、仕切り材の内側と外側をつなぐ連通孔を通って単結
晶成長部に伝達される振動かやはり存在し、効果は完全
ではなかった。また、このような仕切りを設けると、単
結晶棒と仕切りとの間隔、および仕切りとルツボとの間
隔をあける必要から、通常よりも大口径のルツボが要求
され、引き上げに必要な溶湯深さを確保するためにシリ
コン原料が多量に必要で、仕切りの無い場合に比べて必
然的に原料の歩留まりが低下し、製造コストが高い欠点
があった。また、仕切りの表面にシリコン結晶が析出し
やすく、結晶成長条件を変化させたり、場合によっては
単結晶成長を阻害するといった問題をも有している。
``Problems that no invention can solve'' However, in this type of equipment, the melting surface becomes undulating when the raw material falls, and the vibrations are transmitted to the growing single crystal 113, causing crystal defects such as dislocations. was there. As a countermeasure, attempts have been made to place a cylindrical partition between the single crystal rod and the raw material falling part (U
No. S-2892739, JP-A-57-183392
(No. 61-36197, etc.), in these as well, vibrations were transmitted to the single crystal growth area through the communicating holes connecting the inside and outside of the partitioning material, and the effect was not perfect. In addition, if such a partition is provided, a crucible with a larger diameter than usual is required because it is necessary to leave a gap between the single crystal bar and the partition, and a gap between the partition and the crucible, which makes it difficult to increase the depth of molten metal required for pulling. A large amount of silicon raw material is required in order to secure it, and the yield of the raw material is inevitably lower than in the case without partitions, which has the drawback of high manufacturing cost. In addition, silicon crystals tend to precipitate on the surfaces of the partitions, resulting in changes in crystal growth conditions and, in some cases, inhibiting single crystal growth.

「問題点を解決する手段」 本発明は上記問題を解決するためになされたもので、溶
湯に多結晶原料を供給する供給管に、原料の溶湯への落
下速度を低下させる減速部を形成したことを特徴とし、
これにより原料落下時の溶湯表面の波立ち・振動を防ぐ
ようにしている。
"Means for Solving the Problems" The present invention has been made to solve the above problems, and includes forming a deceleration part in the supply pipe that supplies the polycrystalline raw material to the molten metal to reduce the rate at which the raw material falls into the molten metal. It is characterized by
This prevents ripples and vibrations on the molten metal surface when the raw material falls.

「実施例」 第1図は、本発明に係わる結晶育成装置の一実施例を示
す縦断面図である。
Embodiment FIG. 1 is a longitudinal sectional view showing an embodiment of a crystal growth apparatus according to the present invention.

図中符号lは炉体、2は断熱材、3は加熱ヒータ、4は
回転軸5の上端に固定された黒鉛サセプタ、6は黒鉛サ
セプタ4にはめ込まれた石英ルツボであり、このルツボ
6の上方には、下端にシードSを固定した引上ワイヤ7
を昇降する引上機構(図示路)が設けられている。
In the figure, reference numeral 1 denotes a furnace body, 2 a heat insulator, 3 a heater, 4 a graphite susceptor fixed to the upper end of the rotating shaft 5, and 6 a quartz crucible fitted in the graphite susceptor 4. Above is a pulling wire 7 with a seed S fixed to its lower end.
A lifting mechanism (path shown) is provided to raise and lower the

以上の構成は従来のらのと同様で、本発明の特徴は符号
lOに示す原料供給管にある。
The above configuration is similar to the conventional one, and the feature of the present invention lies in the raw material supply pipe indicated by the symbol 1O.

この供給管IOは、基端側が原料供給機構(図示路)に
連結された石英製断面円形のもので、炉体壁を貫通して
固定され、炉体1内で下方に屈折し、その下端がルツボ
6の内周面近傍かつ溶7HYの若干上方に位置決めされ
ている。そして、原料供給機構から導入される顆粒状シ
リコン原料を溶4kYに落とし込む構成となっている。
This supply pipe IO is made of quartz and has a circular cross section, and its base end is connected to the raw material supply mechanism (path shown in the figure). is positioned near the inner peripheral surface of the crucible 6 and slightly above the melt 7HY. The structure is such that the granular silicon raw material introduced from the raw material supply mechanism is dropped into the molten 4kY.

この供給管IOの傾斜部分の内部には、第2図および第
3図に示すように、一定間隔毎に互い違いに石英製の邪
魔板11(減速部)が、それぞれ下方に傾斜した状態で
固定されている。これら邪魔板11は、その下端縁と管
内面との間に間隙を形成し、これら間隙の最小幅Tは、
原料顆粒が容易に通過できる大きさで、かつ適度な減速
効果が得られるように考慮された値となっている。また
、邪魔板Itの傾斜角度は、供給管10の傾斜角度を考
慮した上で、原料が落下途中で停止せず、しかも溶湯に
落下する際の速度が所定値以下となるように設定されて
いる。
Inside the inclined portion of the supply pipe IO, as shown in FIGS. 2 and 3, quartz baffle plates 11 (reduction parts) are fixed at fixed intervals in a downwardly inclined state. has been done. These baffle plates 11 form gaps between their lower edges and the inner surface of the tube, and the minimum width T of these gaps is:
The size is such that the raw material granules can easily pass through, and the value has been taken into consideration so that an appropriate deceleration effect can be obtained. Further, the inclination angle of the baffle plate It is set in consideration of the inclination angle of the supply pipe 10 so that the raw material does not stop mid-fall and the speed at which it falls into the molten metal is below a predetermined value. There is.

上記構成の結晶育成装置によれば、供給管IO内を伝わ
って落下する原料が各邪魔板11に衝突して連動エネル
ギーを奪われ、しかも進路を複雑に屈折されるため、溶
湯Yへ落下する際の速度が小さ(、溶湯Yの波立ちを小
さ(することができる。したがって、単結晶の結晶成長
部に振動を与えて転位を引き起こす可能性を小さくでき
、欠陥の少ない良質な単結晶の製造が可能で、原料の歩
留まりを向上することができる。また、ルツボ内に仕切
りを設けた装置と比較して、小形のルツボが使用できる
ため、ルツボにかかるコストが安価で、原料の残留が少
なく歩留まりが良いうえ、仕切りに結晶が付着するなど
の不都合もない。
According to the crystal growth apparatus having the above configuration, the raw material falling through the supply pipe IO collides with each baffle plate 11 and is deprived of interlocking energy, and is also refracted in a complicated path, so that it falls into the molten metal Y. It is possible to reduce the rippling of the molten metal Y. Therefore, it is possible to reduce the possibility of causing dislocations by applying vibrations to the crystal growth part of the single crystal, and to produce high-quality single crystals with few defects. It is possible to improve the yield of raw materials.In addition, compared to equipment with partitions inside the crucible, a smaller crucible can be used, so the cost of the crucible is lower and there is less leftover raw material. The yield is good and there are no problems such as crystals adhering to the partitions.

さらに上記装置では、供給管IO内での原料の滞留時間
が延びるので、原料は炉体l内界囲気により予熱され、
原料投入に伴う溶湯温度変化を低減し、溶湯の不必要な
再結晶を防ぐことかできる。
Furthermore, in the above device, since the residence time of the raw material in the supply pipe IO is extended, the raw material is preheated by the surrounding air inside the furnace body l,
It is possible to reduce the temperature change of the molten metal due to raw material input and prevent unnecessary recrystallization of the molten metal.

なお、第4図は上記実施例の変形例を示し、供給管10
の下端に二股管部12を形成したことを特徴とする。こ
うすれば、二股管部12との衝突により原料をさらに減
速さけるとともに、原料の落下地点を分散して溶iQ 
Yの波立ちを防ぐ効果が得られる。ただし、この場合は
二股管部12をルツボ6の周方向に向けて配置する必要
がある。
Note that FIG. 4 shows a modification of the above embodiment, in which the supply pipe 10
It is characterized in that a bifurcated tube portion 12 is formed at the lower end of the tube. In this way, the raw material is further decelerated due to collision with the bifurcated pipe section 12, and the falling points of the raw material are dispersed to reduce the melt iQ.
The effect of preventing Y ripples can be obtained. However, in this case, it is necessary to arrange the bifurcated tube portion 12 toward the circumferential direction of the crucible 6.

また、第5図は供給管IOを偏平にして邪魔板11を長
くした変形例を示し、この場合、減速効果を向上すると
ともに、原料の滞留時間をさらに延長して加熱効果を高
められる。
Further, FIG. 5 shows a modification in which the supply pipe IO is flattened and the baffle plate 11 is lengthened. In this case, the deceleration effect is improved, and the residence time of the raw material is further extended to enhance the heating effect.

以上の各実施例は邪魔板11により減速部を構成してい
たが、第6図のように壁を交互に反対方向から凹ませて
管内に凸部13を形成した供給管IOや、第7図のよう
に管全体を波形や螺旋状等に屈折させて減速部とした供
給管IOも可能で、これらによれば供給管の製造コスト
が低減できる。
In each of the above-described embodiments, the speed reduction section was configured by the baffle plate 11, but as shown in FIG. As shown in the figure, it is also possible to use the supply pipe IO by bending the entire pipe into a waveform, spiral shape, etc. to use it as a deceleration part, and with these, the manufacturing cost of the supply pipe can be reduced.

なお、本発明は上記実施例のみに限られず、上記各実施
例の組み合わせや、変形も可能であるし、前述のルツボ
内に仕切りを設ける方法と組み合わせて、より完全な効
果を得ることも可能である。
It should be noted that the present invention is not limited to the above-mentioned embodiments, and the above-mentioned embodiments can be combined and modified, and it is also possible to obtain a more complete effect by combining with the method of providing partitions in the crucible described above. It is.

「発明の効果」 以上説明したように、本発明の結晶育成装置においては
、供給管に形成した減速部により溶湯へ落下する際の原
料の速度を低下させるので、溶湯の波立ちを小さくする
ことができ、単結晶の結晶成長部に振動を与えて転位を
引き起こす可能性を小さくできる。したがって、欠陥の
少ない良質な単結晶の製造を可能とし、原料の歩留まり
を向上することができる。
"Effects of the Invention" As explained above, in the crystal growth apparatus of the present invention, the speed of the raw material falling into the molten metal is reduced by the deceleration part formed in the supply pipe, so it is possible to reduce ripples in the molten metal. This makes it possible to reduce the possibility of causing dislocations by applying vibration to the crystal growth part of the single crystal. Therefore, it is possible to manufacture a high-quality single crystal with few defects, and the yield of raw materials can be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例のシリコン結晶育成装置を示
す縦断面図、第2図および第3図は供給管の横断面図お
よび縦断面図である。また、第4図ないし第7図は、本
発明の他の実施例の供給管を示す断面図である。 l・・・炉体、      6・・・ルツボ、7・・・
引き上げワイヤ、IO・・・供給管、(以下、いずれも
減速部) 11・・・邪魔板、    12・・・二股管部、13
・・・凸部。
FIG. 1 is a longitudinal cross-sectional view showing a silicon crystal growth apparatus according to an embodiment of the present invention, and FIGS. 2 and 3 are a cross-sectional view and a vertical cross-sectional view of a supply pipe. Moreover, FIGS. 4 to 7 are cross-sectional views showing supply pipes according to other embodiments of the present invention. l... Furnace body, 6... Crucible, 7...
Pulling wire, IO... supply pipe, (hereinafter referred to as deceleration part) 11... baffle plate, 12... bifurcated pipe part, 13
...Protrusion.

Claims (3)

【特許請求の範囲】[Claims] (1)多結晶を溶融して溶湯とするルツボと、前記溶湯
に多結晶原料を供給するための供給管と、前記ルツボ内
の溶湯から単結晶を引き上げる引上機構とを備えた結晶
育成装置において、 前記供給管に、原料の溶湯への落下速度を低下させる減
速部を少なくとも1箇所以上形成したことを特徴とする
結晶育成装置。
(1) A crystal growth device equipped with a crucible for melting polycrystals into a molten metal, a supply pipe for supplying a polycrystalline raw material to the molten metal, and a pulling mechanism for pulling up a single crystal from the molten metal in the crucible. A crystal growth apparatus according to the present invention, wherein the supply pipe is provided with at least one deceleration portion that reduces the rate at which the raw material falls into the molten metal.
(2)前記減速部は、供給管内に設けられた邪魔板によ
り構成されていることを特徴とする特許請求の範囲第1
項記載の結晶育成装置。
(2) The first aspect of the present invention is characterized in that the speed reducer is constituted by a baffle plate provided within the supply pipe.
Crystal growth apparatus described in Section 1.
(3)前記減速部は、供給管の一部を屈折して構成され
たものであることを特徴とする特許請求の範囲第1項記
載の結晶育成装置。
(3) The crystal growth apparatus according to claim 1, wherein the speed reduction section is constructed by bending a part of the supply pipe.
JP62277895A 1987-11-02 1987-11-02 Crystal growth equipment Expired - Lifetime JPH0723277B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62277895A JPH0723277B2 (en) 1987-11-02 1987-11-02 Crystal growth equipment
DE8888118267T DE3865628D1 (en) 1987-11-02 1988-11-02 CRYSTAL GROWING DEVICE.
EP88118267A EP0315156B1 (en) 1987-11-02 1988-11-02 Apparatus for growing crystals
US07/521,683 US5080873A (en) 1987-11-02 1990-05-10 Apparatus for growing crystals

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62277895A JPH0723277B2 (en) 1987-11-02 1987-11-02 Crystal growth equipment

Publications (2)

Publication Number Publication Date
JPH01119594A true JPH01119594A (en) 1989-05-11
JPH0723277B2 JPH0723277B2 (en) 1995-03-15

Family

ID=17589782

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62277895A Expired - Lifetime JPH0723277B2 (en) 1987-11-02 1987-11-02 Crystal growth equipment

Country Status (1)

Country Link
JP (1) JPH0723277B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01147269U (en) * 1988-03-30 1989-10-11
JP2005035802A (en) * 2003-07-15 2005-02-10 Sumitomo Mitsubishi Silicon Corp Method and device for feeding raw material
KR100490569B1 (en) * 1995-12-28 2005-09-16 미쓰비시 마테리알 가부시키가이샤 Single crystal pulling appratus
US8634641B2 (en) 2010-12-24 2014-01-21 Fuji Xerox Co., Ltd. Color processing apparatus and computer readable medium for color processing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688896A (en) * 1979-12-22 1981-07-18 Fujitsu Ltd Growth of single crystal
JPS57179095A (en) * 1981-04-28 1982-11-04 Tohoku Metal Ind Ltd Method and apparatus for manufacturing single crystal

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5688896A (en) * 1979-12-22 1981-07-18 Fujitsu Ltd Growth of single crystal
JPS57179095A (en) * 1981-04-28 1982-11-04 Tohoku Metal Ind Ltd Method and apparatus for manufacturing single crystal

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01147269U (en) * 1988-03-30 1989-10-11
KR100490569B1 (en) * 1995-12-28 2005-09-16 미쓰비시 마테리알 가부시키가이샤 Single crystal pulling appratus
JP2005035802A (en) * 2003-07-15 2005-02-10 Sumitomo Mitsubishi Silicon Corp Method and device for feeding raw material
US8634641B2 (en) 2010-12-24 2014-01-21 Fuji Xerox Co., Ltd. Color processing apparatus and computer readable medium for color processing

Also Published As

Publication number Publication date
JPH0723277B2 (en) 1995-03-15

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