JPH01114433A - Heat resistant laminated body - Google Patents

Heat resistant laminated body

Info

Publication number
JPH01114433A
JPH01114433A JP27168887A JP27168887A JPH01114433A JP H01114433 A JPH01114433 A JP H01114433A JP 27168887 A JP27168887 A JP 27168887A JP 27168887 A JP27168887 A JP 27168887A JP H01114433 A JPH01114433 A JP H01114433A
Authority
JP
Japan
Prior art keywords
heat
laminate
layer
metal
filler
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27168887A
Other languages
Japanese (ja)
Other versions
JPH0530381B2 (en
Inventor
Takeo Kimura
武夫 木村
Shunji Chikamori
近森 俊二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON KOUDOSHI KOGYO KK
Nippon Kodoshi Corp
Original Assignee
NIPPON KOUDOSHI KOGYO KK
Nippon Kodoshi Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON KOUDOSHI KOGYO KK, Nippon Kodoshi Corp filed Critical NIPPON KOUDOSHI KOGYO KK
Priority to JP27168887A priority Critical patent/JPH01114433A/en
Publication of JPH01114433A publication Critical patent/JPH01114433A/en
Publication of JPH0530381B2 publication Critical patent/JPH0530381B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Abstract

PURPOSE:To increase the heat resistance to a solder and improve remarkably the reliability in adhesiveness under high temp. humid atmosphere by using a composition having aromatic polyamide-imide resin soluble in a polar organic solvent and a filler with high heat-conductivity as an adhesive layer in a laminate wherein, at least its one layer is a metal while the other layer is a metal or a ceramics. CONSTITUTION:An aromatic polyamide-imide resin is added to a polar organic solvent and after complete solution, a filler is added followed by uniform diffusion by using a stirrer, a ball-mill or a three-roller type roll-mill thereby obtaining a composition to be used as an adhesive layer. Then the obtained composition is coated on the layer made of a metal or ceramics, and after preliminary drying, a metallic layer is superposed thereon followed by heating and pressing. After that it is subjected to heat treatment and formed into a laminate. Thus, a laminate excellent in heat resistance to a solder, remarkably improved in the reliability in adhesiveness under high temp. humidity atmosphere can be obtained.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は電子部品用材料等に使用される金属と金属及び
/又はセラミックスを積層した高信頼性の耐熱積層体に
関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a highly reliable heat-resistant laminate in which metals and metals and/or ceramics are laminated to be used as materials for electronic components and the like.

〔従来の技術〕[Conventional technology]

金属およびセラミックスは熱伝導性に優れた材料であり
、その積層体はアルミ基板に代表される電子部品用材料
をはじめとする種々の用途に使用され、今後さらに発展
が期待されている。
Metals and ceramics are materials with excellent thermal conductivity, and their laminates are used in a variety of applications, including materials for electronic components such as aluminum substrates, and further development is expected in the future.

この積層体の接着層には、従来から主としてエポキシ系
接着剤が用いられてきた(例えば、特開昭58−152
90号参照)。
Conventionally, epoxy adhesives have been mainly used for the adhesive layer of this laminate (for example, Japanese Patent Laid-Open No. 58-152
(See No. 90).

しかし、エポキシ系接着剤には耐熱性・が充分でないと
いう問題点がある。
However, epoxy adhesives have a problem in that they do not have sufficient heat resistance.

そこで、エポキシ系接着剤よりももっと耐熱性の優れた
芳香族ポリアミドイミドと接着性付与剤からなる接着層
を用いる方法が提案されている(特開昭55−1582
6号参照)。
Therefore, a method has been proposed that uses an adhesive layer made of aromatic polyamideimide, which has better heat resistance than epoxy adhesives, and an adhesive agent (Japanese Patent Laid-Open No. 55-1582
(See No. 6).

しかし残念ながらいずれの方法も昨今の高度な耐熱性の
要求を満足するものにはなり1qていない。
Unfortunately, however, none of these methods has been able to satisfy the recent demands for high heat resistance.

(発明が解決しようとする問題点) すなわち、実用されているエポキシ系接着剤には略々2
00℃程度の耐熱性しかなく、高温での信頼性に欠けて
いる。
(Problems to be solved by the invention) In other words, there are approximately 2 types of epoxy adhesives in practical use.
It has a heat resistance of only about 00°C and lacks reliability at high temperatures.

一方、芳香族ポリアミドイミドと接着性付与剤からなる
接着剤は、確かにエポキシ系接着剤に比べ、かなり高い
耐熱性を示しているものの熱湿時、つまり熱と湿度の両
方の負荷がかかったような場合の密着性が充分でなく、
厳しい環境下での信頼性に欠けるという問題点が残って
いた。
On the other hand, although adhesives made of aromatic polyamide-imide and adhesion promoters do show significantly higher heat resistance than epoxy adhesives, they are difficult to resist when exposed to both heat and humidity. In such cases, the adhesion is not sufficient,
The problem remained that it lacked reliability in harsh environments.

〔問題点を解決するための手段〕 本発明者は上記の問題を解決すべく鋭意検討を重ねた結
果、芳香族ポリアミドイミド樹脂に特定のフィラーを加
えた接着層を用いることにより、耐熱性が優れ、且つ熱
湿下の接着信頼性が高く、金属又はセラミックスが有し
ている高い耐熱性を生かした優れた積層体が得られたこ
とを見出し本発明に到達した。
[Means for Solving the Problems] As a result of extensive studies to solve the above problems, the inventors of the present invention have found that heat resistance can be improved by using an adhesive layer made of aromatic polyamideimide resin with a specific filler added. The present invention was achieved by discovering that an excellent laminate that has excellent adhesion reliability under hot and humid conditions and that takes advantage of the high heat resistance of metals or ceramics has been obtained.

すなわち本発明は、少なくとも1つの層が金属であり、
他の層が金属あるいはヒラミックスである積層体におい
て、接着層が極性有機溶媒可溶性芳香族ポリアミドイミ
ド樹脂と高熱伝導性フィラーとを有する組成物であるこ
とを特徴とする耐熱積層体を提供するものである。
That is, in the present invention, at least one layer is metal,
To provide a heat-resistant laminate in which the other layers are metal or Hiramix, and the adhesive layer is a composition comprising a polar organic solvent-soluble aromatic polyamide-imide resin and a highly thermally conductive filler. It is.

以下本発明の詳細な説明する。The present invention will be explained in detail below.

本発明の積層体の少なくとも1つの層は、金属層であり
、他の層は目的に応じて金属あるいはレラミックから選
択できる。電子部品材料、特に放熱基板の場合には金属
である場合が多い。
At least one layer of the laminate of the present invention is a metal layer, and other layers can be selected from metal or reramic depending on the purpose. Electronic component materials, especially heat-dissipating substrates, are often metals.

金属層としては銅、アルミニウム等の層状にすることか
できる全ての金属に適用できる。又、セラミックス層と
してはセラミックスであればよく、種々のものが使用で
きる。例えば、アルミナ、ジルコニア、窒化タイ素、窒
化ホウ素、炭化ケイ素などが使用できる。
As the metal layer, all metals that can be formed into a layer, such as copper and aluminum, can be used. Further, the ceramic layer may be made of ceramic, and various materials can be used. For example, alumina, zirconia, titanium nitride, boron nitride, silicon carbide, etc. can be used.

次に本発明の要部である接着層に用いられる芳香族ポリ
アミドイミド樹脂は極性有機溶媒可溶性の芳香族ポリア
ミドイミド樹脂であって、一般式 (但し、Xは酸素原子、硫黄原子、スルホニル基、カル
ボニル基又はメチレン基を表わし、nは2以上の整数を
表わす)で示される樹脂、又はその混合物が用いられる
Next, the aromatic polyamide-imide resin used for the adhesive layer, which is the main part of the present invention, is an aromatic polyamide-imide resin soluble in a polar organic solvent, and has the general formula (where X is an oxygen atom, a sulfur atom, a sulfonyl group, A resin represented by a carbonyl group or a methylene group, where n is an integer of 2 or more, or a mixture thereof is used.

本発明で用いる芳香族ポリアミドイミド樹脂の還元粘度
は0.5以上であれば特に制限されないが、使用時の溶
液粘度より3.5付近迄が実用的である。
The reduced viscosity of the aromatic polyamide-imide resin used in the present invention is not particularly limited as long as it is 0.5 or more, but it is practical to have a reduced viscosity of around 3.5 based on the solution viscosity at the time of use.

還元粘度が低すぎると機械的強度及び可撓性が低下する
し、還元粘度が高すぎると極性有機溶媒に対する溶解度
が低下し実用的でなくなる。
If the reduced viscosity is too low, the mechanical strength and flexibility will decrease, and if the reduced viscosity is too high, the solubility in polar organic solvents will decrease, making it impractical.

これらの芳香族ポリアミドイミド樹脂は、公知の方法、
例えば ■芳香族ジアミンと無水トリメリット酸クロライドとを
反応させるか或いは■芳香族ジインシアネートとビスイ
ミドジカルボン酸を反応ざUるかによって製造すること
ができる。
These aromatic polyamideimide resins can be prepared by known methods,
For example, it can be produced by (1) reacting an aromatic diamine with trimellitic anhydride, or (2) reacting an aromatic diincyanate with bisimidodicarboxylic acid.

このうち■の反応を代表例として以下に説明する。Among these, reaction (2) will be explained below as a representative example.

(式中のXは前記と同じ意味をもつ)或いは、アミン)
の(A)(8)いづれかの芳香族ジアミンと無水トリメ
リット酸クロリドとを、N、N−ジメチルアセトアミド
、N−メチル−2−ピロリドン等の極性有機溶媒中で反
応させる。
(X in the formula has the same meaning as above) or amine)
(A) (8) Any of the aromatic diamines and trimellitic anhydride are reacted in a polar organic solvent such as N,N-dimethylacetamide or N-methyl-2-pyrrolidone.

<A)の芳香族ジアミンとしては、4.4’ −ジアミ
ノジフェニルエーテル、4.4’−ジアミノジフェニル
スルフィド、4.4’−ジアミノジフェニルスルホン、
4.4′−ジアミノベンゾフェノン、4.4′−ジアミ
ノジフェニルメタンを挙げることができる。
<A) Aromatic diamines include 4.4'-diaminodiphenyl ether, 4.4'-diaminodiphenylsulfide, 4.4'-diaminodiphenylsulfone,
Examples include 4.4'-diaminobenzophenone and 4.4'-diaminodiphenylmethane.

更に(A>の芳香族ジアミンと(B)の芳香族ジアミン
では、可撓性、耐熱性、耐湿性の優れている(A>の芳
香族ジアミンがより好適である。
Furthermore, among the aromatic diamine (A>) and the aromatic diamine (B), the aromatic diamine (A>) is more preferable because it has excellent flexibility, heat resistance, and moisture resistance.

本発明の芳香族ポリアミドイミド樹脂の極性有機溶媒と
しては、N、N−ジメチルホルムアミド、N、N−ジメ
チルアセトアミド、ジメチルスルホキシド、N−メチル
−2−ピロリドン、ヘキサメチルホスホルアミド、ハロ
ゲン化クレゾールまたはこれらの混合溶媒、或いはこれ
等と他の慣用溶媒との混合系溶媒をあげることができる
Examples of the polar organic solvent for the aromatic polyamide-imide resin of the present invention include N,N-dimethylformamide, N,N-dimethylacetamide, dimethylsulfoxide, N-methyl-2-pyrrolidone, hexamethylphosphoramide, halogenated cresol or Examples include mixed solvents of these or mixed solvents of these and other commonly used solvents.

次に、本発明の接着層を構成する今一つの必須成分であ
るフィラーは高熱伝導性フィラーでなければならない。
Next, the filler, which is another essential component constituting the adhesive layer of the present invention, must be a highly thermally conductive filler.

ここでいう高熱伝導性フィラーとは熱伝導度が0.05
cal/cm、sec、 ”c以上の高熱伝導性無機フ
ィラーのことをいう。具体例としては、ベリリヤ(Be
d) 、マグネシア(MqO)、窒化ホウ素(BN)、
アルミナ(A、1!203)、炭化ケイ素(SiC)、
窒化ケイ素(Si3N4)、カーボン(C)及びこれら
の混合物をあげることができる。また−、毒性、耐湿性
、絶縁性の点を考慮すると、窒化ホウ素若しくはアルミ
ナが特に好ましいフィラーとして推奨される。
The high thermal conductivity filler mentioned here has a thermal conductivity of 0.05.
Cal/cm, sec, refers to a highly thermally conductive inorganic filler of ``c or higher.A specific example is Beryllya (Beryllium).
d), magnesia (MqO), boron nitride (BN),
Alumina (A, 1!203), silicon carbide (SiC),
Mention may be made of silicon nitride (Si3N4), carbon (C) and mixtures thereof. Furthermore, in consideration of toxicity, moisture resistance, and insulation, boron nitride or alumina is recommended as a particularly preferred filler.

フィラーの形状は特に限定されず、球状、角形状、針状
、層状、リン片状等、いずれの形状でも用いることがで
きる。また、粒径もいわゆる微粉体であれば使用できる
が、通常200μm以下、特に50μm以下が好ましい
The shape of the filler is not particularly limited, and any shape such as spherical, angular, acicular, layered, scale-like, etc. can be used. Further, the particle size can be used as long as it is a so-called fine powder, but it is usually 200 μm or less, particularly preferably 50 μm or less.

フィラーの配合割合は1〜35容但%であり、好ましく
は5〜25容量%である。フィラーの配合割合が高すぎ
ると機械的強度及び接着性が低下し、また低すぎると耐
熱性、及び耐湿性向上効果が小さい。したがって、フィ
ラーの配合割合いが低すぎるとより厳しい条件下でのハ
ンダ耐熱試験で不良が発生してしまう。
The blending ratio of the filler is 1 to 35% by volume, preferably 5 to 25% by volume. If the blending ratio of the filler is too high, mechanical strength and adhesiveness will decrease, and if it is too low, the effect of improving heat resistance and moisture resistance will be small. Therefore, if the blending ratio of the filler is too low, defects will occur in the solder heat resistance test under more severe conditions.

なお、目的とする用途、フィラーの形状、粒径によって
、その最適配合聞が変化するので、使用するフィラーの
物性と配合割合との関係を実験で予備的に求めておき、
これにもとづいて配合を決定することが推奨される。
Note that the optimum blending ratio will vary depending on the intended use, filler shape, and particle size, so the relationship between the physical properties of the filler to be used and the blending ratio should be preliminarily determined through experiments.
It is recommended that formulations be determined based on this.

本発明の接着層となるフィラーを含む芳香族ポリアミド
イミド樹脂組成物を製造する方法としては、従来公知の
方法が使用できる。例えば芳香族ポリアミドイミド樹脂
を、極性有機溶媒中に加え、完全に溶解させた後、フィ
ラーを添加し、攪拌機、ボールミール、三本ロールミル
等で均一に分散させることによって製造することができ
る。
Conventionally known methods can be used to produce the filler-containing aromatic polyamide-imide resin composition that becomes the adhesive layer of the present invention. For example, it can be produced by adding an aromatic polyamide-imide resin to a polar organic solvent, dissolving it completely, adding a filler, and uniformly dispersing it using a stirrer, a ball mill, a three-roll mill, etc.

本発明の接着層組成物には他に必要により種々の添加物
を加えることができる。接着性或いは機械的強度を高め
るためにシランカップリング剤やガラス粉末、ガラス繊
維、耐熱繊維などを添加するのもその一例である。
Various other additives may be added to the adhesive layer composition of the present invention, if necessary. One example is the addition of a silane coupling agent, glass powder, glass fiber, heat-resistant fiber, etc. to increase adhesiveness or mechanical strength.

次に、本発明の積層体の代表的な2つの’14m方法に
ついて説明する。
Next, two typical '14m methods for producing the laminate of the present invention will be described.

■金属及びセラミックス等の層(薄板等)に本発明の接
着層組成物をペースト状でコーティングし、予備乾燥し
た後、金属の層(薄板等)を重ね、加熱圧着する。次で
熱処理し積層体とする。
(2) A layer (such as a thin plate) of metal or ceramics is coated with the adhesive layer composition of the present invention in the form of a paste, and after preliminary drying, a layer of metal (such as a thin plate) is overlaid and bonded under heat and pressure. Next, heat treatment is performed to form a laminate.

■あらかじめ本発明の接着層組成物のフィルムを製造し
熱処理しておく。
(2) A film of the adhesive layer composition of the present invention is prepared and heat-treated in advance.

この接着層組成物のフィルムの両面に本発明の接着層組
成物の溶媒を噴霧する。これを接着する金属と金属ある
いは金属とセラミックスの間に挟み込み、加熱圧着する
The solvent of the adhesive layer composition of the present invention is sprayed onto both sides of the film of this adhesive layer composition. This is sandwiched between the metals to be bonded or between the metals and the ceramics and bonded under heat and pressure.

〔実施例〕〔Example〕

次に実施例、比較例で本1発明を具体的に説明するが、
本発明はこれらに限定されるものではない。
Next, the present invention will be specifically explained using Examples and Comparative Examples.
The present invention is not limited to these.

なお、実施例及び比較例で行った積層体の評価方法およ
び条件は以下の通りである。
The evaluation methods and conditions for the laminates in Examples and Comparative Examples are as follows.

■ハンダ、試験片を300℃のハンダ浴に30秒浸耐M
性  潰したときのふくれ及びはがれの有無をみた。
■Solder, test piece immersed in 300℃ solder bath for 30 seconds M
Gender: The presence or absence of blistering and peeling when crushed was checked.

■密省性 : クロスカットテープ法で測定した。■Density: Measured using the cross-cut tape method.

試験片の金属箔面を、JIS K 5400のゴバン目
試験法に準じてクロスカ ット後、PETテープを付着し、つ いで引きはがし100箇の升目中の残 存升目数を測定した。なお密着性テ ストでは該積層体を350℃3時間熱 処理したものおよび121℃2気圧の プレッシャークツカーに1時間放置 したものの評価を行い、高温ドおよ び熱湿下での信頼性を確認した。
After cross-cutting the metal foil surface of the test piece according to the cross-cut test method of JIS K 5400, a PET tape was attached, and then it was peeled off to measure the number of squares remaining among the 100 squares. In the adhesion test, the laminate was heat-treated at 350° C. for 3 hours, and the laminate was left in a pressure cooker at 121° C. and 2 atm for 1 hour. The reliability under high temperature and heat and humidity was confirmed.

■接着性 : JIS C6481引きはがし強さ試験
法に準じて測定を行った。
■Adhesion: Measured according to JIS C6481 peel strength test method.

実施例1 4.4′−ジアミノジフェニルエーテル(DADPE)
と無水トリメリット酸クロリド(TMAC)から合成し
た有機極性溶媒可溶性の芳香族ポリアミドイミド樹脂(
以下PAIと略す:還元粘度1,6:比重1.5)  
100重量部に、N−メチルピロリドン450単岳部を
加えて、該PAIを溶解した。次いで平均粒径1.5μ
mの窒化ホウ素微粉末(BN>(昭和電工社製ショウビ
ーエヌ :比重2.25) 20車量部をNMP50重
量部に分散させた溶液と上記PAI樹脂溶液とを混合し
、ボールミールでBNを均一に分散させ、ベース1〜状
の組成物を得た。
Example 1 4.4'-diaminodiphenyl ether (DADPE)
and organic polar solvent-soluble aromatic polyamideimide resin synthesized from trimellitic anhydride (TMAC).
Hereinafter abbreviated as PAI: reduced viscosity 1.6: specific gravity 1.5)
450 parts of N-methylpyrrolidone was added to 100 parts by weight to dissolve the PAI. Then the average particle size is 1.5μ
A solution prepared by dispersing 20 parts by weight of boron nitride fine powder (BN> (Showa Denko Co., Ltd. Showbi-N: specific gravity 2.25) in 50 parts by weight of NMP and the above PAI resin solution was mixed with the above PAI resin solution, and BN was mixed with a ball mill. were uniformly dispersed to obtain compositions of Base 1 to 1.

次いで、該組成物を銅板(厚さ1m>にペースト状で1
00μmコーティングし、90℃で10分間予備乾燥後
、この組成物に圧延銅箔(厚さ35μTrL)を重ね合
わせ、上下にテフロンおよびシリコーンゴムシートのク
ツション材をはさみ、プレス機にて10に’j/ci 
180℃30分間加熱圧着した。
Next, apply the composition in paste form to a copper plate (thickness 1 m).
After pre-drying at 90°C for 10 minutes, this composition was layered with rolled copper foil (thickness 35μTrL), cushioning materials of Teflon and silicone rubber sheets were sandwiched between the upper and lower sides, and the composition was heated to 10mm using a press. /ci
Heat and pressure bonding was carried out at 180°C for 30 minutes.

この積層体の評価を前記の方法について行った結果■ハ
ンダ耐熱性ではふくれやはがれが見られなかった。また
、■接着性テストではブランクで1.61Nff/CI
i、350℃3時間の高温下処理で1.4ONg/ar
t1プレッシャークツカー処理後(121℃2気圧1時
間)で1.55KI/cmといずれも接着性は良好なも
のであった。
This laminate was evaluated using the method described above, and as a result (1) No blistering or peeling was observed in terms of solder heat resistance. Also, in the adhesion test, the blank was 1.61Nff/CI.
i, 1.4ONg/ar after high temperature treatment at 350℃ for 3 hours
After t1 pressure-packing treatment (121° C., 2 atm pressure, 1 hour), the adhesion was 1.55 KI/cm, which was good in all cases.

実施例2 実施例1で用いた組成物をアプリケーターで厚さ約10
μmの薄いフィルムを作製後、130℃、190℃で各
々30分加熱処理した。次にこのフィルムの表面にN−
メチルピロリドンを薄く噴霧し、アルミニウム@(厚さ
15μ而)とアルミナの薄板(ノリタケ製厚み635μ
m)の間に入れテフロン及びシリコンゴムシートのクツ
ション材で上下から押え、5に3/cM、  180℃
、 30分間プレス機で加熱圧着しアルミニウム箔とア
ルミナの積層体を得た。
Example 2 The composition used in Example 1 was applied to a thickness of about 10 mm using an applicator.
After producing μm-thin films, they were heat-treated at 130° C. and 190° C. for 30 minutes, respectively. Next, N-
Spray a thin layer of methylpyrrolidone onto aluminum (15μ thick) and thin alumina plates (Noritake, 635μ thick).
m) and press from above and below with cushioning material of Teflon and silicone rubber sheet, 5 to 3/cM, 180℃.
, A laminate of aluminum foil and alumina was obtained by heating and pressing in a press for 30 minutes.

この積層体を実施例1と同じ方法、条件で評価した結果
■ハンダ耐熱性ではふくれが観察され、■■密着性テス
トでもブランクでは100/100.350℃の高温処
理で100/100 、プレッシャークツカー処理後で
100/100であり、信頼性の非常に高い積層体であ
ることがわかった。
As a result of evaluating this laminate using the same method and conditions as in Example 1, ■■ Blistering was observed in the solder heat resistance, ■■Adhesion test was 100/100 in the blank, 100/100 in the high temperature treatment at 350°C, and pressure shoes. After Kerr treatment, the ratio was 100/100, indicating that the laminate was extremely reliable.

実施例3,4 実施例1と同様の方法によって表1に示すような金属の
積層体を作製し、夫々の積層体の評価を行った。結果を
表1に示す。いずれの積層体も優れた効果を示した。
Examples 3 and 4 Metal laminates as shown in Table 1 were produced by the same method as in Example 1, and each laminate was evaluated. The results are shown in Table 1. Both laminates showed excellent effects.

比較例1 ポリイミドワニス(東し社製 ヒレニー220%溶液)
 500重量部とBN(昭和電工社製 ショウビーエヌ
)20重量部をNMP50重量部に分散させた溶液を混
合し、ボールミールでBNを均一に分散さじた。次いで
実施例1と同様の方法及び条件で銅板とアルミニウム箔
を加熱圧着して積層体を製作し、同様に評価を行った。
Comparative Example 1 Polyimide varnish (Hilenie 220% solution manufactured by Toshisha Co., Ltd.)
A solution prepared by dispersing 500 parts by weight of BN and 20 parts by weight of BN (Showa Denko K.K., Shobi-N) in 50 parts by weight of NMP was mixed, and the BN was uniformly dispersed using a ball meal. Next, a copper plate and an aluminum foil were bonded under heat and pressure in the same manner and under the same conditions as in Example 1 to produce a laminate, and evaluated in the same manner.

結果を表2に示す。The results are shown in Table 2.

比較例2 ビスフェノール型エポキシAER331旭化成社製 エ
ポキシ当量180〜200 ) 100重量部とBN2
0重量部をNMP50重吊部に重数部せた溶液を混合し
、ボールミールで8Nを均一に分散さUた。
Comparative Example 2 Bisphenol-type epoxy AER331 manufactured by Asahi Kasei Co., Ltd. Epoxy equivalent weight 180-200) 100 parts by weight and BN2
A solution containing 0 parts by weight of NMP in 50 parts was mixed, and 8N was uniformly dispersed using a ball mill.

次に4,4′ジアミノジフ工ニルメタン25重足部をN
 M P 75重量部に溶かした溶液を上記BN混合エ
ポキシに加え撹拌した。次いで実施例1と同様の方法及
び条件で銅板とアルミニウム箔を加熱圧着して積層体を
製作し、同様に評価を行った。
Next, add N
A solution dissolved in 75 parts by weight of M P was added to the above BN mixed epoxy and stirred. Next, a copper plate and an aluminum foil were bonded under heat and pressure in the same manner and under the same conditions as in Example 1 to produce a laminate, and evaluated in the same manner.

結果を表2に示す。The results are shown in Table 2.

比較例3 実施例1で用いたPAI100重量部に NMP400
重吊部を加重工部解した。次いでBN 150重吊部を
NMP200重1部に分散させた溶液を混合し、ボール
ミールでBNを均一に分散させた。
Comparative Example 3 NMP400 was added to 100 parts by weight of PAI used in Example 1.
The heavy lifting section was disassembled into a weighted section. Next, a solution in which 150 parts of BN was dispersed in 1 part of 200 parts of NMP was mixed, and the BN was uniformly dispersed using a ball mill.

次いで実施例1と同様の方法及び条件で銅板とアルミニ
ウム箔を加熱圧着して積層体を製作し、同様に評価を行
った。
Next, a copper plate and an aluminum foil were bonded under heat and pressure in the same manner and under the same conditions as in Example 1 to produce a laminate, and evaluated in the same manner.

結果を表2に示す。The results are shown in Table 2.

(以下余白) 〔発明の効果〕 以上説明してきたように、本発明はハンダ耐熱性が優れ
、しかも熱湿下の接着信頼性を大rlJに向上uしめる
という優れた効果を発揮する積層体を提供するものであ
る。
(The following is a blank space) [Effects of the Invention] As explained above, the present invention provides a laminate that has excellent solder heat resistance and also exhibits the excellent effect of improving adhesion reliability under hot and humid conditions to a large degree. This is what we provide.

したがって、本発明の耐熱積層体を用いることにより、
電子部品の熱に対する信頼性が一段と向上することが期
待できる。又、本発明の耐熱v1層体は、その製造工程
が簡単で且つ好演的であるという効果も有している。
Therefore, by using the heat-resistant laminate of the present invention,
It is expected that the reliability of electronic components against heat will further improve. Further, the heat-resistant V1 layered body of the present invention has the advantage that the manufacturing process thereof is simple and efficient.

出願人 ニッポン高度紙工業株式会社 代理人 弁理士  野 崎 鋏 也Applicant: Nippon Kokoshi Kogyo Co., Ltd. Agent Patent Attorney Kazuya Nozaki

Claims (1)

【特許請求の範囲】 1 少なくとも1つの層が金属であり、他の層が金属あ
るいはセラミックスである積層体において、接着層が極
性有機溶媒可溶性芳香族ポリアミドイミド樹脂と高熱伝
導性フィラーとを有する組成物であることを特徴とする
耐熱積層体。 2 極性有機溶媒可溶性芳香族ポリアミドイミド樹脂が
、 一般式 ▲数式、化学式、表等があります▼もしくは、 ▲数式、化学式、表等があります▼ (但し、Xは酸素原子、硫黄原子、スルホニル基、カル
ボニル基又はメチレン基を表わし、nは2以上の整数を
表わす)で表わされる樹脂、又はその混合物であること
を特徴とする特許請求の範囲第1項記載の耐熱積層体。 3 高熱伝導性フィラーが窒化ホウ素又はアルミナであ
ることを特徴とする特許請求の範囲第1項記載の耐熱積
層体。
[Claims] 1. A laminate in which at least one layer is made of metal and the other layers are made of metal or ceramic, and the adhesive layer contains a polar organic solvent-soluble aromatic polyamide-imide resin and a highly thermally conductive filler. A heat-resistant laminate characterized by being a material. 2 Polar organic solvent soluble aromatic polyamideimide resin has the general formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (However, X is an oxygen atom, a sulfur atom, a sulfonyl group, 2. The heat-resistant laminate according to claim 1, wherein the heat-resistant laminate is a resin represented by a carbonyl group or a methylene group, and n represents an integer of 2 or more, or a mixture thereof. 3. The heat-resistant laminate according to claim 1, wherein the highly thermally conductive filler is boron nitride or alumina.
JP27168887A 1987-10-29 1987-10-29 Heat resistant laminated body Granted JPH01114433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27168887A JPH01114433A (en) 1987-10-29 1987-10-29 Heat resistant laminated body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27168887A JPH01114433A (en) 1987-10-29 1987-10-29 Heat resistant laminated body

Publications (2)

Publication Number Publication Date
JPH01114433A true JPH01114433A (en) 1989-05-08
JPH0530381B2 JPH0530381B2 (en) 1993-05-07

Family

ID=17503464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27168887A Granted JPH01114433A (en) 1987-10-29 1987-10-29 Heat resistant laminated body

Country Status (1)

Country Link
JP (1) JPH01114433A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0625614A (en) * 1992-04-20 1994-02-01 Nippon Koudoshi Kogyo Kk Bonding method and bondable member
JP2012507459A (en) * 2008-10-29 2012-03-29 クラミック エレクトロニクス ゲーエムベーハー Composite material, composite material forming method, and adhesive or bonding material

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62199651A (en) * 1986-02-27 1987-09-03 Nippon Koudoshi Kogyo Kk Flexible heat-resistant resin composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62199651A (en) * 1986-02-27 1987-09-03 Nippon Koudoshi Kogyo Kk Flexible heat-resistant resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0625614A (en) * 1992-04-20 1994-02-01 Nippon Koudoshi Kogyo Kk Bonding method and bondable member
JP2012507459A (en) * 2008-10-29 2012-03-29 クラミック エレクトロニクス ゲーエムベーハー Composite material, composite material forming method, and adhesive or bonding material

Also Published As

Publication number Publication date
JPH0530381B2 (en) 1993-05-07

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