JP7846520B2 - インプリント装置、及び物品の製造方法 - Google Patents

インプリント装置、及び物品の製造方法

Info

Publication number
JP7846520B2
JP7846520B2 JP2021203217A JP2021203217A JP7846520B2 JP 7846520 B2 JP7846520 B2 JP 7846520B2 JP 2021203217 A JP2021203217 A JP 2021203217A JP 2021203217 A JP2021203217 A JP 2021203217A JP 7846520 B2 JP7846520 B2 JP 7846520B2
Authority
JP
Japan
Prior art keywords
measurement
substrate
mold
unit
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021203217A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023088471A (ja
JP2023088471A5 (https=
Inventor
雄士 山川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2021203217A priority Critical patent/JP7846520B2/ja
Priority to US18/058,917 priority patent/US12304121B2/en
Priority to KR1020220169564A priority patent/KR20230091021A/ko
Publication of JP2023088471A publication Critical patent/JP2023088471A/ja
Publication of JP2023088471A5 publication Critical patent/JP2023088471A5/ja
Priority to US19/179,018 priority patent/US20250242524A1/en
Application granted granted Critical
Publication of JP7846520B2 publication Critical patent/JP7846520B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/58—Measuring, controlling or regulating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/04—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles using movable moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/58—Measuring, controlling or regulating
    • B29C2043/5833—Measuring, controlling or regulating movement of moulds or mould parts, e.g. opening or closing, actuating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Multimedia (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2021203217A 2021-12-15 2021-12-15 インプリント装置、及び物品の製造方法 Active JP7846520B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2021203217A JP7846520B2 (ja) 2021-12-15 2021-12-15 インプリント装置、及び物品の製造方法
US18/058,917 US12304121B2 (en) 2021-12-15 2022-11-28 Imprint apparatus and article manufacturing method
KR1020220169564A KR20230091021A (ko) 2021-12-15 2022-12-07 임프린트 장치 및 물품 제조 방법
US19/179,018 US20250242524A1 (en) 2021-12-15 2025-04-15 Imprint apparatus and article manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021203217A JP7846520B2 (ja) 2021-12-15 2021-12-15 インプリント装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2023088471A JP2023088471A (ja) 2023-06-27
JP2023088471A5 JP2023088471A5 (https=) 2024-12-10
JP7846520B2 true JP7846520B2 (ja) 2026-04-15

Family

ID=86695832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021203217A Active JP7846520B2 (ja) 2021-12-15 2021-12-15 インプリント装置、及び物品の製造方法

Country Status (3)

Country Link
US (2) US12304121B2 (https=)
JP (1) JP7846520B2 (https=)
KR (1) KR20230091021A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023210620A1 (de) * 2023-10-26 2025-04-30 Infineon Technologies Ag Automatische adressenzuweisung

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011023715A (ja) 2009-07-06 2011-02-03 Asml Netherlands Bv インプリントリソグラフィ装置
JP2011066323A (ja) 2009-09-18 2011-03-31 Toshiba Corp 露光処理の補正方法
JP2013021155A (ja) 2011-07-12 2013-01-31 Canon Inc インプリント装置、およびそれを用いた物品の製造方法
JP2013138175A (ja) 2011-11-30 2013-07-11 Canon Inc インプリント装置、インプリント方法及び物品の製造方法
JP2013538447A (ja) 2010-08-05 2013-10-10 エーエスエムエル ネザーランズ ビー．ブイ． インプリントリソグラフィ

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4185941B2 (ja) * 2006-04-04 2008-11-26 キヤノン株式会社 ナノインプリント方法及びナノインプリント装置
JP5809409B2 (ja) * 2009-12-17 2015-11-10 キヤノン株式会社 インプリント装置及びパターン転写方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011023715A (ja) 2009-07-06 2011-02-03 Asml Netherlands Bv インプリントリソグラフィ装置
JP2011066323A (ja) 2009-09-18 2011-03-31 Toshiba Corp 露光処理の補正方法
JP2013538447A (ja) 2010-08-05 2013-10-10 エーエスエムエル ネザーランズ ビー．ブイ． インプリントリソグラフィ
JP2013021155A (ja) 2011-07-12 2013-01-31 Canon Inc インプリント装置、およびそれを用いた物品の製造方法
JP2013138175A (ja) 2011-11-30 2013-07-11 Canon Inc インプリント装置、インプリント方法及び物品の製造方法

Also Published As

Publication number Publication date
KR20230091021A (ko) 2023-06-22
US20230182356A1 (en) 2023-06-15
JP2023088471A (ja) 2023-06-27
US12304121B2 (en) 2025-05-20
US20250242524A1 (en) 2025-07-31

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