JP7761570B2 - 重合体、コーティング組成物、レジスト組成物及び物品 - Google Patents

重合体、コーティング組成物、レジスト組成物及び物品

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Publication number
JP7761570B2
JP7761570B2 JP2022546219A JP2022546219A JP7761570B2 JP 7761570 B2 JP7761570 B2 JP 7761570B2 JP 2022546219 A JP2022546219 A JP 2022546219A JP 2022546219 A JP2022546219 A JP 2022546219A JP 7761570 B2 JP7761570 B2 JP 7761570B2
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group
polymer
polymer block
meth
carbon atoms
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JP2022546219A
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English (en)
Japanese (ja)
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JPWO2022050062A5 (https=
JPWO2022050062A1 (https=
Inventor
真幸 畑瀬
良平 清水
秀也 鈴木
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DIC Corp
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DIC Corp
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Priority to JP2023122362A priority Critical patent/JP7632531B2/ja
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00Living radical polymerisation
    • C08F2438/01Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
JP2022546219A 2020-09-03 2021-08-19 重合体、コーティング組成物、レジスト組成物及び物品 Active JP7761570B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023122362A JP7632531B2 (ja) 2020-09-03 2023-07-27 重合体、コーティング組成物、レジスト組成物及び物品

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020148146 2020-09-03
JP2020148146 2020-09-03
PCT/JP2021/030329 WO2022050062A1 (ja) 2020-09-03 2021-08-19 重合体、コーティング組成物、レジスト組成物及び物品

Related Child Applications (1)

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JP2023122362A Division JP7632531B2 (ja) 2020-09-03 2023-07-27 重合体、コーティング組成物、レジスト組成物及び物品

Publications (3)

Publication Number Publication Date
JPWO2022050062A1 JPWO2022050062A1 (https=) 2022-03-10
JPWO2022050062A5 JPWO2022050062A5 (https=) 2023-01-04
JP7761570B2 true JP7761570B2 (ja) 2025-10-28

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Family Applications (2)

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JP2022546219A Active JP7761570B2 (ja) 2020-09-03 2021-08-19 重合体、コーティング組成物、レジスト組成物及び物品
JP2023122362A Active JP7632531B2 (ja) 2020-09-03 2023-07-27 重合体、コーティング組成物、レジスト組成物及び物品

Family Applications After (1)

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JP2023122362A Active JP7632531B2 (ja) 2020-09-03 2023-07-27 重合体、コーティング組成物、レジスト組成物及び物品

Country Status (7)

Country Link
US (1) US20230323002A1 (https=)
EP (1) EP4209524A4 (https=)
JP (2) JP7761570B2 (https=)
KR (1) KR20230059784A (https=)
CN (1) CN116034143B (https=)
TW (1) TWI907498B (https=)
WO (1) WO2022050062A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023117014A (ja) * 2022-02-10 2023-08-23 日本ペイント・オートモーティブコーティングス株式会社 塗料用組成物
TW202419491A (zh) * 2022-11-10 2024-05-16 日商Dic股份有限公司 抗蝕劑組成物及其硬化物
WO2025018168A1 (ja) * 2023-07-18 2025-01-23 Dic株式会社 レベリング剤、レジスト組成物及び偏光板
WO2025206028A1 (ja) * 2024-03-27 2025-10-02 富士フイルム株式会社 液晶組成物、液晶硬化層、光学フィルム、偏光板および画像表示装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015166438A (ja) 2014-02-13 2015-09-24 Jsr株式会社 パターン形成用組成物及びパターン形成方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL128965C (https=) 1963-09-06
US6583223B2 (en) * 2001-09-27 2003-06-24 Ppg Industries Ohio, Inc. Coating compositions which contain a low surface tension (meth) acrylate containing block copolymer flow control agent
JP4097434B2 (ja) 2002-02-07 2008-06-11 楠本化成株式会社 非水塗料用平滑剤
DE10227338B4 (de) * 2002-06-19 2006-05-24 Byk-Chemie Gmbh Verwendung von Polyacrylat-modifizierten Polysiloxanen als Verlaufmittel in Beschichtungsmitteln
JP4669364B2 (ja) * 2005-09-28 2011-04-13 大日本印刷株式会社 積層体及び反射防止積層体
CN102584883B (zh) * 2011-10-20 2014-06-04 湖北固润科技股份有限公司 含多硅的甲基丙烯酸酯和丙烯酸酯类单体及合成方法
EP2864379A1 (en) * 2012-06-22 2015-04-29 PPG Coatings Europe B.V. Antifouling coating composition
JP6134367B2 (ja) * 2014-10-31 2017-05-24 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC フォトレジスト保護膜組成物
EP3344704B1 (en) * 2015-08-31 2019-07-31 BYK-Chemie GmbH Copolymers containing polyether-polysiloxane macromonomer units, process of their preparation and their use in coating compositions and polymeric moulding compounds
JP6979791B2 (ja) * 2017-05-26 2021-12-15 楠本化成株式会社 両親媒性ブロック共重合体を利用した塗料用レベリング剤
JP7066107B2 (ja) * 2018-06-05 2022-05-13 日油株式会社 ポリ塩化ビニル樹脂組成物
JP7151909B2 (ja) * 2019-12-25 2022-10-12 Dic株式会社 重合体及び当該重合体を含むコーティング組成物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015166438A (ja) 2014-02-13 2015-09-24 Jsr株式会社 パターン形成用組成物及びパターン形成方法

Also Published As

Publication number Publication date
JP7632531B2 (ja) 2025-02-19
TWI907498B (zh) 2025-12-11
US20230323002A1 (en) 2023-10-12
JP2023153167A (ja) 2023-10-17
EP4209524A1 (en) 2023-07-12
CN116034143B (zh) 2024-09-24
EP4209524A4 (en) 2024-09-25
KR20230059784A (ko) 2023-05-03
JPWO2022050062A1 (https=) 2022-03-10
WO2022050062A1 (ja) 2022-03-10
TW202219087A (zh) 2022-05-16
CN116034143A (zh) 2023-04-28

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