CN116034143B - 聚合物、涂布组合物、抗蚀组合物和物品 - Google Patents

聚合物、涂布组合物、抗蚀组合物和物品 Download PDF

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Publication number
CN116034143B
CN116034143B CN202180054525.1A CN202180054525A CN116034143B CN 116034143 B CN116034143 B CN 116034143B CN 202180054525 A CN202180054525 A CN 202180054525A CN 116034143 B CN116034143 B CN 116034143B
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polymer
group
polymer block
meth
carbon atoms
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Chinese (zh)
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CN116034143A (zh
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畑瀬真幸
清水良平
铃木秀也
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DIC Corp
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DIC Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
CN202180054525.1A 2020-09-03 2021-08-19 聚合物、涂布组合物、抗蚀组合物和物品 Active CN116034143B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-148146 2020-09-03
JP2020148146 2020-09-03
PCT/JP2021/030329 WO2022050062A1 (ja) 2020-09-03 2021-08-19 重合体、コーティング組成物、レジスト組成物及び物品

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CN116034143A CN116034143A (zh) 2023-04-28
CN116034143B true CN116034143B (zh) 2024-09-24

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Country Status (7)

Country Link
US (1) US20230323002A1 (https=)
EP (1) EP4209524A4 (https=)
JP (2) JP7761570B2 (https=)
KR (1) KR20230059784A (https=)
CN (1) CN116034143B (https=)
TW (1) TWI907498B (https=)
WO (1) WO2022050062A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023117014A (ja) * 2022-02-10 2023-08-23 日本ペイント・オートモーティブコーティングス株式会社 塗料用組成物
TW202419491A (zh) * 2022-11-10 2024-05-16 日商Ｄｉｃ股份有限公司 抗蝕劑組成物及其硬化物
WO2025018168A1 (ja) * 2023-07-18 2025-01-23 Dic株式会社 レベリング剤、レジスト組成物及び偏光板
WO2025206028A1 (ja) * 2024-03-27 2025-10-02 富士フイルム株式会社 液晶組成物、液晶硬化層、光学フィルム、偏光板および画像表示装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007090653A (ja) * 2005-09-28 2007-04-12 Dainippon Printing Co Ltd 積層体及び反射防止積層体
JP2018199765A (ja) * 2017-05-26 2018-12-20 楠本化成株式会社 両親媒性ブロック共重合体を利用した塗料用レベリング剤

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NL128965C (https=) 1963-09-06
US6583223B2 (en) * 2001-09-27 2003-06-24 Ppg Industries Ohio, Inc. Coating compositions which contain a low surface tension (meth) acrylate containing block copolymer flow control agent
JP4097434B2 (ja) 2002-02-07 2008-06-11 楠本化成株式会社 非水塗料用平滑剤
DE10227338B4 (de) * 2002-06-19 2006-05-24 Byk-Chemie Gmbh Verwendung von Polyacrylat-modifizierten Polysiloxanen als Verlaufmittel in Beschichtungsmitteln
CN102584883B (zh) * 2011-10-20 2014-06-04 湖北固润科技股份有限公司 含多硅的甲基丙烯酸酯和丙烯酸酯类单体及合成方法
EP2864379A1 (en) * 2012-06-22 2015-04-29 PPG Coatings Europe B.V. Antifouling coating composition
JP6394042B2 (ja) 2014-02-13 2018-09-26 Jsr株式会社 パターン形成用組成物及びパターン形成方法
JP6134367B2 (ja) * 2014-10-31 2017-05-24 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ フォトレジスト保護膜組成物
EP3344704B1 (en) * 2015-08-31 2019-07-31 BYK-Chemie GmbH Copolymers containing polyether-polysiloxane macromonomer units, process of their preparation and their use in coating compositions and polymeric moulding compounds
JP7066107B2 (ja) * 2018-06-05 2022-05-13 日油株式会社 ポリ塩化ビニル樹脂組成物
JP7151909B2 (ja) * 2019-12-25 2022-10-12 Dic株式会社 重合体及び当該重合体を含むコーティング組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007090653A (ja) * 2005-09-28 2007-04-12 Dainippon Printing Co Ltd 積層体及び反射防止積層体
JP2018199765A (ja) * 2017-05-26 2018-12-20 楠本化成株式会社 両親媒性ブロック共重合体を利用した塗料用レベリング剤

Also Published As

Publication number Publication date
JP7632531B2 (ja) 2025-02-19
TWI907498B (zh) 2025-12-11
US20230323002A1 (en) 2023-10-12
JP2023153167A (ja) 2023-10-17
EP4209524A1 (en) 2023-07-12
EP4209524A4 (en) 2024-09-25
KR20230059784A (ko) 2023-05-03
JPWO2022050062A1 (https=) 2022-03-10
JP7761570B2 (ja) 2025-10-28
WO2022050062A1 (ja) 2022-03-10
TW202219087A (zh) 2022-05-16
CN116034143A (zh) 2023-04-28

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