JP7733255B2 - 被膜構造体の製造方法、及び被膜構造体 - Google Patents

被膜構造体の製造方法、及び被膜構造体

Info

Publication number
JP7733255B2
JP7733255B2 JP2024573540A JP2024573540A JP7733255B2 JP 7733255 B2 JP7733255 B2 JP 7733255B2 JP 2024573540 A JP2024573540 A JP 2024573540A JP 2024573540 A JP2024573540 A JP 2024573540A JP 7733255 B2 JP7733255 B2 JP 7733255B2
Authority
JP
Japan
Prior art keywords
metal
substrate
coated structure
compound
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024573540A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025005272A1 (https=
Inventor
周平 原
晃弘 近藤
惣一朗 荷方
輝一 坪田
泰嗣 上島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KUNITOMO NEKKOU CO.,LTD.
Mitsui Kinzoku Co Ltd
Original Assignee
KUNITOMO NEKKOU CO.,LTD.
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KUNITOMO NEKKOU CO.,LTD., Mitsui Mining and Smelting Co Ltd filed Critical KUNITOMO NEKKOU CO.,LTD.
Publication of JPWO2025005272A1 publication Critical patent/JPWO2025005272A1/ja
Application granted granted Critical
Publication of JP7733255B2 publication Critical patent/JP7733255B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/90—Carbides
    • C01B32/914—Carbides of single elements
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/85—Coating or impregnation with inorganic materials
    • C04B41/87—Ceramics
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Structural Engineering (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • General Chemical & Material Sciences (AREA)
JP2024573540A 2023-06-29 2024-06-28 被膜構造体の製造方法、及び被膜構造体 Active JP7733255B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2023107244 2023-06-29
JP2023107244 2023-06-29
JP2023141902 2023-09-01
JP2023141902 2023-09-01
PCT/JP2024/023617 WO2025005272A1 (ja) 2023-06-29 2024-06-28 被膜構造体の製造方法、及び被膜構造体

Publications (2)

Publication Number Publication Date
JPWO2025005272A1 JPWO2025005272A1 (https=) 2025-01-02
JP7733255B2 true JP7733255B2 (ja) 2025-09-02

Family

ID=93938484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024573540A Active JP7733255B2 (ja) 2023-06-29 2024-06-28 被膜構造体の製造方法、及び被膜構造体

Country Status (6)

Country Link
EP (1) EP4737612A1 (https=)
JP (1) JP7733255B2 (https=)
KR (1) KR20260030746A (https=)
CN (1) CN121399292A (https=)
TW (1) TW202503084A (https=)
WO (1) WO2025005272A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3035571U (ja) 1996-09-09 1997-03-28 アイテック株式会社 着色パチンコ玉
JP2010007103A (ja) 2008-06-24 2010-01-14 Chubu Electric Power Co Inc アルミニウム部材の製造方法
JP2012012632A (ja) 2010-06-29 2012-01-19 Furuya Kinzoku:Kk 白金成形物の表面硬化方法及び表面が硬化された白金成形物
WO2012096233A1 (ja) 2011-01-13 2012-07-19 三井金属鉱業株式会社 補強された多孔質金属箔およびその製造方法
JP2016194384A (ja) 2015-03-31 2016-11-17 株式会社神戸製鋼所 アルミニウム製フィン材
JP2020111812A (ja) 2019-01-16 2020-07-27 日本製鉄株式会社 方向性電磁鋼板

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07316778A (ja) * 1994-03-30 1995-12-05 Nippon Piston Ring Co Ltd 窒化ピストンリング
JPH09209117A (ja) * 1996-02-06 1997-08-12 Yawata Mekki Kogyo Kk 遊戯玉の製造方法
JP6058846B1 (ja) 2016-03-24 2017-01-11 國友熱工株式会社 水素浸入抑制方式の真空硬化方法及びこれを使用したワークの製造方法
WO2018155385A1 (ja) * 2017-02-21 2018-08-30 日本アイ・ティ・エフ株式会社 硬質炭素膜とその製造方法および摺動部材
JP6413060B1 (ja) * 2017-05-11 2018-10-31 日本アイ・ティ・エフ株式会社 硬質炭素膜とその製造方法および摺動部材
JP7313604B2 (ja) * 2019-08-23 2023-07-25 三菱マテリアル株式会社 ダイヤモンド被覆切削工具

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3035571U (ja) 1996-09-09 1997-03-28 アイテック株式会社 着色パチンコ玉
JP2010007103A (ja) 2008-06-24 2010-01-14 Chubu Electric Power Co Inc アルミニウム部材の製造方法
JP2012012632A (ja) 2010-06-29 2012-01-19 Furuya Kinzoku:Kk 白金成形物の表面硬化方法及び表面が硬化された白金成形物
WO2012096233A1 (ja) 2011-01-13 2012-07-19 三井金属鉱業株式会社 補強された多孔質金属箔およびその製造方法
JP2016194384A (ja) 2015-03-31 2016-11-17 株式会社神戸製鋼所 アルミニウム製フィン材
JP2020111812A (ja) 2019-01-16 2020-07-27 日本製鉄株式会社 方向性電磁鋼板

Also Published As

Publication number Publication date
KR20260030746A (ko) 2026-03-06
JPWO2025005272A1 (https=) 2025-01-02
TW202503084A (zh) 2025-01-16
CN121399292A (zh) 2026-01-23
WO2025005272A1 (ja) 2025-01-02
EP4737612A1 (en) 2026-05-06

Similar Documents

Publication Publication Date Title
KR101267679B1 (ko) 코팅된 초경도 연마 입자 물질 및 초경도 연마 입자를 코팅하는 방법
US5364522A (en) Boride, carbide, nitride, oxynitride, and silicide infiltrated electrochemical ceramic films and coatings and the method of forming such
Yamabi et al. Crystal phase control for titanium dioxide films by direct deposition in aqueous solutions
Armelao et al. Au/TiO2 nanosystems: A combined RF-sputtering/sol− gel approach
CA2720753C (en) Method for production of carbon nanostructures
O'Neill et al. Anatase thin films on glass from the chemical vapor deposition of titanium (IV) chloride and ethyl acetate
TWI377176B (https=)
WO1999058451A1 (en) Titanium oxide sol, thin film, and processes for producing these
Innocenzi et al. Sol− gel synthesis of β-Al2TiO5 thin films at low temperature
JP7698155B2 (ja) 被膜構造体の製造方法、及び被膜構造体
JP7733255B2 (ja) 被膜構造体の製造方法、及び被膜構造体
Semaltianos et al. Laser ablation of a bulk Cr target in liquids for nanoparticle synthesis
Grzmil et al. Preparation and characterization of single-modified TiO2 for pigmentary applications
Fuchs et al. Deposition of titania thin films from aqueous solution by a continuous flow technique
Manjumol et al. A hybrid sol–gel approach for novel photoactive and hydrophobic titania coatings on aluminium metal surfaces
JP3912976B2 (ja) 光触媒膜を有するチタン基材の製造方法及びチタン基材表面の親水化方法
JP2025006444A (ja) 被膜構造体の製造方法、及び被膜構造体
Liu et al. Preparation of titanium nitride nanoparticles from a novel refluxing derived precursor
Mohammed et al. Optical, structural, morphological properties of chromium (III) oxide nanostructure synthesized using spray pyrolysis technique
Dupuis et al. Catalytic growth of TiO2 nanowires from a TiN thin film
JP7832781B2 (ja) 結晶性無機酸化物粒子の製造方法
JP2025010051A (ja) 金属化合物含有物
Boutarfa et al. Investigation on structural, morphological and optical properties of 5% Fe-doped TiO2 powder nanostructures synthesized by mechanical alloying
Sattha et al. Enhanced hydrophilicity for TiO2 nanotube array by simultaneous nitrogen plasma and thermal annealing treatments
JP2025033504A (ja) 複合酸化物粒子および酸硫化物の粒子の製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20241213

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20241213

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241216

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20250205

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20250313

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250411

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20250604

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20250723

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250730

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250806

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250821

R150 Certificate of patent or registration of utility model

Ref document number: 7733255

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350