JP7634139B1 - 半導体洗浄用薬液および半導体洗浄用薬液の製造方法 - Google Patents
半導体洗浄用薬液および半導体洗浄用薬液の製造方法 Download PDFInfo
- Publication number
- JP7634139B1 JP7634139B1 JP2024551616A JP2024551616A JP7634139B1 JP 7634139 B1 JP7634139 B1 JP 7634139B1 JP 2024551616 A JP2024551616 A JP 2024551616A JP 2024551616 A JP2024551616 A JP 2024551616A JP 7634139 B1 JP7634139 B1 JP 7634139B1
- Authority
- JP
- Japan
- Prior art keywords
- less
- continuous reactor
- alcohol
- gas
- content
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
- C07C29/03—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by addition of hydroxy groups to unsaturated carbon-to-carbon bonds, e.g. with the aid of H2O2
- C07C29/04—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by addition of hydroxy groups to unsaturated carbon-to-carbon bonds, e.g. with the aid of H2O2 by hydration of carbon-to-carbon double bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C31/00—Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
- C07C31/02—Monohydroxylic acyclic alcohols
- C07C31/10—Monohydroxylic acyclic alcohols containing three carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P70/00—Cleaning of wafers, substrates or parts of devices
- H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H10P70/15—Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023096884 | 2023-06-13 | ||
| JP2023096884 | 2023-06-13 | ||
| PCT/JP2024/016925 WO2024257504A1 (ja) | 2023-06-13 | 2024-05-07 | 半導体薬液および半導体薬液の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2024257504A1 JPWO2024257504A1 (https=) | 2024-12-19 |
| JP7634139B1 true JP7634139B1 (ja) | 2025-02-20 |
| JPWO2024257504A5 JPWO2024257504A5 (https=) | 2025-05-27 |
Family
ID=93851967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024551616A Active JP7634139B1 (ja) | 2023-06-13 | 2024-05-07 | 半導体洗浄用薬液および半導体洗浄用薬液の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7634139B1 (https=) |
| KR (1) | KR20260021637A (https=) |
| CN (1) | CN121039789A (https=) |
| TW (1) | TW202500541A (https=) |
| WO (1) | WO2024257504A1 (https=) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002121160A (ja) * | 2000-10-16 | 2002-04-23 | Mitsui Chemicals Inc | イソプロピルアルコールの製造方法 |
| WO2017217279A1 (ja) * | 2016-06-17 | 2017-12-21 | 株式会社トクヤマ | イソプロピルアルコールの製造方法及び不純物が低減されたイソプロピルアルコール |
| WO2021200936A1 (ja) * | 2020-04-02 | 2021-10-07 | 株式会社トクヤマ | 半導体処理液及びその製造方法 |
| WO2023176192A1 (ja) * | 2022-03-16 | 2023-09-21 | 株式会社トクヤマ | 半導体洗浄液および半導体洗浄液の製造方法 |
-
2024
- 2024-05-07 KR KR1020257041758A patent/KR20260021637A/ko active Pending
- 2024-05-07 CN CN202480027193.1A patent/CN121039789A/zh active Pending
- 2024-05-07 JP JP2024551616A patent/JP7634139B1/ja active Active
- 2024-05-07 WO PCT/JP2024/016925 patent/WO2024257504A1/ja not_active Ceased
- 2024-05-09 TW TW113117119A patent/TW202500541A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002121160A (ja) * | 2000-10-16 | 2002-04-23 | Mitsui Chemicals Inc | イソプロピルアルコールの製造方法 |
| WO2017217279A1 (ja) * | 2016-06-17 | 2017-12-21 | 株式会社トクヤマ | イソプロピルアルコールの製造方法及び不純物が低減されたイソプロピルアルコール |
| WO2021200936A1 (ja) * | 2020-04-02 | 2021-10-07 | 株式会社トクヤマ | 半導体処理液及びその製造方法 |
| WO2023176192A1 (ja) * | 2022-03-16 | 2023-09-21 | 株式会社トクヤマ | 半導体洗浄液および半導体洗浄液の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20260021637A (ko) | 2026-02-13 |
| TW202500541A (zh) | 2025-01-01 |
| CN121039789A (zh) | 2025-11-28 |
| WO2024257504A1 (ja) | 2024-12-19 |
| JPWO2024257504A1 (https=) | 2024-12-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102313108B1 (ko) | 이소프로필 알코올의 제조 방법 및 불순물이 저감된 이소프로필 알코올 | |
| JP7402385B1 (ja) | 半導体洗浄液および半導体洗浄液の製造方法 | |
| JP7118898B2 (ja) | イソプロピルアルコール組成物及びイソプロピルアルコールの製造方法 | |
| JP6810304B2 (ja) | 洗浄液及び高純度イソプロピルアルコールの製造方法 | |
| CN1312094C (zh) | 醇的制备方法 | |
| KR102471394B1 (ko) | 반도체 처리액 및 그 제조 방법 | |
| KR102486605B1 (ko) | 공액 디엔의 제조 방법 | |
| JP7634139B1 (ja) | 半導体洗浄用薬液および半導体洗浄用薬液の製造方法 | |
| EP4129962B1 (en) | Method for producing isobutylene, method for producing methacrylic acid, and method for producing methyl methacrylate | |
| TWI458700B (zh) | Method for separating epoxycyclohexane with n-pentanol | |
| US6255533B1 (en) | Process for the recovery of cyclohexanone and cyclohexanol from cyclohexanone production distillation bottoms | |
| RU2523011C2 (ru) | Способ очистки циклогексанона | |
| CN1413971A (zh) | 1.3-丙二醇中羰基物质的脱除方法 | |
| PL173885B1 (pl) | 1. Sposób otrzymywania cykloheksanonu o wysokiej czystości i niskiej zawartości aldehydów z produktów utleniania cykloheksanu i/lub produktów odwodorniania cykloheksanolu w procesie destylacji, w którym oddziela się zanieczyszczenia niżej wrzące od cykloheksanonu,wyodrębnia czysty cykloheksanon, wydziela cykloheksanol z pozostawieniem produktów wysokowrzących, a następnie wydzielony cykloheksanol po odwodomieniu zawraca do destylacji, znamienny tym, ze po wyodrębnieniu z produktów utleniania cykloheksanu i/lub produktów odwodorniania cykloheksanolu związków niżej wrzących od cykloheksanonu, pozostałą mieszaninę poddaje się destylacji w kolumnie pracującej pod ciśnieniem 30-100 Torr, w której czysty cykloheksanon odbiera się jako strumień boczny, z miejsca powyżej którego liczba półek teoretycznych stanowi 2-25% całkowitej liczby półek teoretycznych w kolumnie, natomiast destylat w sposób ciągły lub periodyczny zawraca się w ilości stanowiącej 0.05-3% strumienia bocznego do kolumny, w której wyodrębnia się zanieczyszczenia niżej wrzące od cykloheksanonu lub wykorzystuje do innych celów. | |
| JPH09309858A (ja) | アセトンの精製方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240829 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240829 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20240829 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20241210 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250108 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20250121 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20250207 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7634139 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |