JP7628129B2 - 平面レンズを用いたコンフォーマル光学部品の波面誤差補正 - Google Patents
平面レンズを用いたコンフォーマル光学部品の波面誤差補正 Download PDFInfo
- Publication number
- JP7628129B2 JP7628129B2 JP2022549352A JP2022549352A JP7628129B2 JP 7628129 B2 JP7628129 B2 JP 7628129B2 JP 2022549352 A JP2022549352 A JP 2022549352A JP 2022549352 A JP2022549352 A JP 2022549352A JP 7628129 B2 JP7628129 B2 JP 7628129B2
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- JP
- Japan
- Prior art keywords
- lens
- conformal
- planar
- optic
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/003—Alignment of optical elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024208585A JP2025037982A (ja) | 2020-03-09 | 2024-11-29 | 平面レンズを用いたコンフォーマル光学部品の波面誤差補正 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US16/812,975 | 2020-03-09 | ||
| US16/812,975 US11796797B2 (en) | 2020-03-09 | 2020-03-09 | Wavefront error correction of a conformal optical component using a planar lens |
| PCT/US2021/021122 WO2021183387A1 (en) | 2020-03-09 | 2021-03-05 | Wavefront error correction of a conformal optical component using a planar lens |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024208585A Division JP2025037982A (ja) | 2020-03-09 | 2024-11-29 | 平面レンズを用いたコンフォーマル光学部品の波面誤差補正 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023517833A JP2023517833A (ja) | 2023-04-27 |
| JP2023517833A5 JP2023517833A5 (enExample) | 2024-01-12 |
| JP7628129B2 true JP7628129B2 (ja) | 2025-02-07 |
Family
ID=77555754
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022549352A Active JP7628129B2 (ja) | 2020-03-09 | 2021-03-05 | 平面レンズを用いたコンフォーマル光学部品の波面誤差補正 |
| JP2024208585A Pending JP2025037982A (ja) | 2020-03-09 | 2024-11-29 | 平面レンズを用いたコンフォーマル光学部品の波面誤差補正 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024208585A Pending JP2025037982A (ja) | 2020-03-09 | 2024-11-29 | 平面レンズを用いたコンフォーマル光学部品の波面誤差補正 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11796797B2 (enExample) |
| EP (2) | EP4790473A1 (enExample) |
| JP (2) | JP7628129B2 (enExample) |
| WO (1) | WO2021183387A1 (enExample) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050030644A1 (en) | 2003-08-04 | 2005-02-10 | Knapp David J. | Optical system having a transmission optical corrector with a selectively nonuniform passive transmission optical property |
| US20180356287A1 (en) | 2017-06-08 | 2018-12-13 | Raytheon Company | Real time correction of optical window thermal gradients |
| JP2019509637A (ja) | 2016-03-16 | 2019-04-04 | レイセオン カンパニー | 動的な位相補償を伴ったレーザービーム投影システム |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3571501D1 (en) * | 1984-04-13 | 1989-08-17 | Trw Inc | Active mirror wavefront sensor |
| US5526181A (en) * | 1993-12-22 | 1996-06-11 | Hughes Aircraft Company | Dynamic aberration corrector for conformal windows |
| US6091548A (en) * | 1997-10-01 | 2000-07-18 | Raytheon Company | Optical system with two-stage aberration correction |
| US6180938B1 (en) * | 1997-12-08 | 2001-01-30 | Raytheon Company | Optical system with a window having a conicoidal inner surface, and testing of the optical system |
| US5946143A (en) * | 1998-05-05 | 1999-08-31 | Raytheon Company | Dynamic aberration correction of conformal/aspheric domes and windows for missile and airborne fire control applications |
| US6040936A (en) | 1998-10-08 | 2000-03-21 | Nec Research Institute, Inc. | Optical transmission control apparatus utilizing metal films perforated with subwavelength-diameter holes |
| US6552318B1 (en) * | 1999-06-22 | 2003-04-22 | Raytheon Company | Sensor system with rigid-body error correcting element |
| TW519574B (en) | 2000-10-20 | 2003-02-01 | Nikon Corp | Multilayer mirror and method for making the same, and EUV optical system comprising the same, and EUV microlithography system comprising the same |
| US20030081722A1 (en) | 2001-08-27 | 2003-05-01 | Nikon Corporation | Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrations |
| US7662263B2 (en) | 2002-09-27 | 2010-02-16 | Euv Llc. | Figure correction of multilayer coated optics |
| EP1424570A1 (en) | 2002-11-28 | 2004-06-02 | Avanex Corporation | Focusing device |
| JP4457296B2 (ja) | 2004-07-23 | 2010-04-28 | 三菱電機株式会社 | 光遅延回路、集積光素子および集積光素子の製造方法 |
| DE102004046542A1 (de) | 2004-09-21 | 2006-03-23 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Einstellung optischer Abbildungseigenschaften durch Strahlungsbehandlung |
| DE102005003594B4 (de) | 2004-12-31 | 2016-02-18 | Schott Ag | Verfahren zur Herstellung eines optischen Bauteils, verfahrensgemäß hergestelltes Bauteil sowie derartige Bauteile umfassende Einrichtung |
| JP4550007B2 (ja) | 2005-06-10 | 2010-09-22 | 富士フイルム株式会社 | 光変調デバイス |
| DE102005053297A1 (de) | 2005-11-08 | 2007-05-10 | Bausch & Lomb Inc. | System und Verfahren zur Korrektur von ophthalmischen Brechungsfehlern |
| JP4842763B2 (ja) | 2006-10-23 | 2011-12-21 | 株式会社リコー | 光学素子および光学装置 |
| JP4810399B2 (ja) | 2006-11-06 | 2011-11-09 | 株式会社日立ハイテクノロジーズ | 電子線装置用試料台 |
| FR2920554A1 (fr) | 2007-08-31 | 2009-03-06 | Commissariat Energie Atomique | Procede de lithographie d'une image par ecriture directe continue |
| US8273832B2 (en) | 2009-02-24 | 2012-09-25 | General Electric Company | Block terpolymer with confined crystallization |
| DE102009029471A1 (de) | 2009-09-15 | 2011-03-31 | Carl Zeiss Smt Gmbh | Spiegel zur Verwendung in einer Mikrolithographie-Projektionsbelichtungsanlage |
| TWI501046B (zh) | 2010-07-30 | 2015-09-21 | 卡爾蔡司Smt有限公司 | 超紫外線曝光裝置 |
| US8294988B2 (en) | 2010-09-02 | 2012-10-23 | Raytheon Company | Dual field of view refractive optical system with external pupil and internal stabilization |
| US9144491B2 (en) | 2011-06-02 | 2015-09-29 | University Of Rochester | Method for modifying the refractive index of an optical material |
| US20130170044A1 (en) | 2012-01-04 | 2013-07-04 | Raydex Technology, Inc. | Method and structure of optical thin film using crystallized nano-porous material |
| JP6105577B2 (ja) | 2012-06-22 | 2017-03-29 | シャープ株式会社 | 反射防止構造体及び表示装置 |
| US9340446B1 (en) * | 2013-02-04 | 2016-05-17 | Lockheed Martin Corporation | Optical apparatus and method of forming a gradient index device |
| US10082664B2 (en) | 2013-09-23 | 2018-09-25 | Samsung Electronics Co., Ltd. | Tracking optics for a mobile device |
| US9557513B1 (en) * | 2014-08-08 | 2017-01-31 | Lockheed Martin Corporation | Optical system for correcting optical aberrations in electromagnetic radiation |
| US9772255B1 (en) * | 2014-12-01 | 2017-09-26 | Lockheed Martin Corporation | Optical element surface alteration to correct wavefront error |
-
2020
- 2020-03-09 US US16/812,975 patent/US11796797B2/en active Active
-
2021
- 2021-03-05 EP EP26184512.7A patent/EP4790473A1/en active Pending
- 2021-03-05 EP EP21768395.2A patent/EP4118482B1/en active Active
- 2021-03-05 WO PCT/US2021/021122 patent/WO2021183387A1/en not_active Ceased
- 2021-03-05 JP JP2022549352A patent/JP7628129B2/ja active Active
-
2024
- 2024-11-29 JP JP2024208585A patent/JP2025037982A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050030644A1 (en) | 2003-08-04 | 2005-02-10 | Knapp David J. | Optical system having a transmission optical corrector with a selectively nonuniform passive transmission optical property |
| JP2019509637A (ja) | 2016-03-16 | 2019-04-04 | レイセオン カンパニー | 動的な位相補償を伴ったレーザービーム投影システム |
| US20180356287A1 (en) | 2017-06-08 | 2018-12-13 | Raytheon Company | Real time correction of optical window thermal gradients |
Also Published As
| Publication number | Publication date |
|---|---|
| EP4118482A1 (en) | 2023-01-18 |
| JP2023517833A (ja) | 2023-04-27 |
| WO2021183387A1 (en) | 2021-09-16 |
| EP4118482A4 (en) | 2023-11-08 |
| EP4790473A1 (en) | 2026-08-12 |
| US11796797B2 (en) | 2023-10-24 |
| JP2025037982A (ja) | 2025-03-18 |
| EP4118482B1 (en) | 2026-07-22 |
| US20210278662A1 (en) | 2021-09-09 |
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