JP7620043B2 - 感光性樹脂組成物、及び感光性エレメント - Google Patents

感光性樹脂組成物、及び感光性エレメント Download PDF

Info

Publication number
JP7620043B2
JP7620043B2 JP2023057752A JP2023057752A JP7620043B2 JP 7620043 B2 JP7620043 B2 JP 7620043B2 JP 2023057752 A JP2023057752 A JP 2023057752A JP 2023057752 A JP2023057752 A JP 2023057752A JP 7620043 B2 JP7620043 B2 JP 7620043B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
component
compound
mass
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2023057752A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023153082A (ja
Inventor
創 古谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Corp filed Critical Asahi Kasei Corp
Publication of JP2023153082A publication Critical patent/JP2023153082A/ja
Priority to JP2025003553A priority Critical patent/JP2025039766A/ja
Application granted granted Critical
Publication of JP7620043B2 publication Critical patent/JP7620043B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3445—Five-membered rings
    • C08K5/3447—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Graft Or Block Polymers (AREA)
  • Laminated Bodies (AREA)
JP2023057752A 2022-03-31 2023-03-31 感光性樹脂組成物、及び感光性エレメント Active JP7620043B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025003553A JP2025039766A (ja) 2022-03-31 2025-01-09 感光性樹脂組成物、及び感光性エレメント

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022061300 2022-03-31
JP2022061300 2022-03-31

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025003553A Division JP2025039766A (ja) 2022-03-31 2025-01-09 感光性樹脂組成物、及び感光性エレメント

Publications (2)

Publication Number Publication Date
JP2023153082A JP2023153082A (ja) 2023-10-17
JP7620043B2 true JP7620043B2 (ja) 2025-01-22

Family

ID=88292668

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2023057752A Active JP7620043B2 (ja) 2022-03-31 2023-03-31 感光性樹脂組成物、及び感光性エレメント
JP2025003553A Pending JP2025039766A (ja) 2022-03-31 2025-01-09 感光性樹脂組成物、及び感光性エレメント

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025003553A Pending JP2025039766A (ja) 2022-03-31 2025-01-09 感光性樹脂組成物、及び感光性エレメント

Country Status (3)

Country Link
JP (2) JP7620043B2 (https=)
KR (1) KR102882784B1 (https=)
TW (1) TWI888812B (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020076945A (ja) 2018-09-21 2020-05-21 旭化成株式会社 感光性樹脂組成物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009180795A (ja) 2008-01-29 2009-08-13 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法及びプリント配線板の製造方法
JP5948543B2 (ja) 2012-05-29 2016-07-06 旭化成株式会社 感光性樹脂組成物
KR20150118582A (ko) 2013-02-12 2015-10-22 도레이 카부시키가이샤 감광성 수지 조성물, 그것을 열경화시켜서 이루어지는 보호막 또는 절연막, 그것을 사용한 터치 패널 및 그 제조 방법
WO2017043544A1 (ja) * 2015-09-11 2017-03-16 旭化成株式会社 感光性樹脂組成物
JP6207654B2 (ja) 2016-04-07 2017-10-04 旭化成株式会社 感光性樹脂組成物
WO2019173967A1 (en) * 2018-03-13 2019-09-19 Hitachi Chemical Company, Ltd. Photosensitizer, photosensitive resin composition, photosensitive element, and method of producing wiring board
WO2020045587A1 (ja) * 2018-08-31 2020-03-05 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、平版印刷方法、及び、硬化性組成物

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020076945A (ja) 2018-09-21 2020-05-21 旭化成株式会社 感光性樹脂組成物

Also Published As

Publication number Publication date
KR102882784B1 (ko) 2025-11-06
JP2025039766A (ja) 2025-03-21
JP2023153082A (ja) 2023-10-17
TW202540777A (zh) 2025-10-16
TW202343139A (zh) 2023-11-01
KR20230141587A (ko) 2023-10-10
TWI888812B (zh) 2025-07-01

Similar Documents

Publication Publication Date Title
JP6637511B2 (ja) 感光性樹脂組成物
JP2025000730A (ja) 感光性樹脂組成物、感光性樹脂組成物を用いた転写フィルム
JP7820549B2 (ja) 感光性樹脂組成物、感光性樹脂積層体、及びレジストパターンの形成方法
JP7620043B2 (ja) 感光性樹脂組成物、及び感光性エレメント
JP4749305B2 (ja) 感光性樹脂組成物及び積層体
JP7695484B2 (ja) 感光性エレメント、及びレジストパターンの形成方法
TWI919194B (zh) 感光性元件、及光阻圖案之形成方法
TWI895025B (zh) 感光性樹脂組成物及其製造方法、感光性樹脂積層體及其捲、及光阻圖案之形成方法
WO2025095102A1 (ja) 感光性樹脂積層体、及びレジストパターンの形成方法並びに導体パターンを有する配線板の製造方法
TWI921991B (zh) 感光性樹脂積層體、及光阻圖案之形成方法以及具有導體圖案之配線板之製造方法
TWI903461B (zh) 感光性樹脂積層體、及光阻圖案之形成方法
JP2025029593A (ja) 感光性エレメント、レジストパターンの形成方法、及び配線板の製造方法
WO2025074970A1 (ja) 感光性樹脂積層体、レジストパターンの形成方法、及び配線板の形成方法
JP2025156258A (ja) 感光性樹脂積層体、及びその製造方法
JP2025155987A (ja) 感光性樹脂積層体、及びその製造方法
JP2025164502A (ja) 感光性樹脂組成物、感光性樹脂積層体、及びレジストパターンの形成方法
JP2026060536A (ja) 感光性樹脂組成物及びその製造方法
CN120722664A (zh) 感光性树脂层叠体及其制造方法
WO2026063436A1 (ja) 感光性樹脂積層体、レジストパターンの形成方法及び配線板の製造方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230331

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20240226

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240326

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240527

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240813

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241015

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20241210

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250109

R150 Certificate of patent or registration of utility model

Ref document number: 7620043

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150