JP7538221B2 - ハイブリッド３ｄ検査システム - Google Patents

ハイブリッド３ｄ検査システム Download PDF

Info

Publication number
JP7538221B2
JP7538221B2 JP2022520938A JP2022520938A JP7538221B2 JP 7538221 B2 JP7538221 B2 JP 7538221B2 JP 2022520938 A JP2022520938 A JP 2022520938A JP 2022520938 A JP2022520938 A JP 2022520938A JP 7538221 B2 JP7538221 B2 JP 7538221B2
Authority
JP
Japan
Prior art keywords
image
area
pattern
reflected
image sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022520938A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022551129A5 (https=
JP2022551129A (ja
Inventor
ラム オロン
ギル ティッドハー
イリア ラットスカー
ハニナ ゴラン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orbotech Ltd
Original Assignee
Orbotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Priority claimed from PCT/IL2020/051062 external-priority patent/WO2021070174A1/en
Publication of JP2022551129A publication Critical patent/JP2022551129A/ja
Publication of JP2022551129A5 publication Critical patent/JP2022551129A5/ja
Application granted granted Critical
Publication of JP7538221B2 publication Critical patent/JP7538221B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
    • G01N21/453—Holographic interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02029—Combination with non-interferometric systems, i.e. for measuring the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02032—Interferometers characterised by the beam path configuration generating a spatial carrier frequency, e.g. by creating lateral or angular offset between reference and object beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02041—Interferometers characterised by particular imaging or detection techniques
    • G01B9/02047—Interferometers characterised by particular imaging or detection techniques using digital holographic imaging, e.g. lensless phase imaging without hologram in the reference path
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/021—Interferometers using holographic techniques
    • G01B9/023—Interferometers using holographic techniques for contour producing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
    • G01S17/06—Systems determining position data of a target
    • G01S17/08—Systems determining position data of a target for measuring distance only
    • G01S17/32—Systems determining position data of a target for measuring distance only using transmission of continuous waves, whether amplitude-, frequency-, or phase-modulated, or unmodulated
    • G01S17/36—Systems determining position data of a target for measuring distance only using transmission of continuous waves, whether amplitude-, frequency-, or phase-modulated, or unmodulated with phase comparison between the received signal and the contemporaneously transmitted signal
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
    • G01S17/06—Systems determining position data of a target
    • G01S17/46—Indirect determination of position data
    • G01S17/48—Active triangulation systems, i.e. using the transmission and reflection of electromagnetic waves other than radio waves
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/88—Lidar systems specially adapted for specific applications
    • G01S17/89—Lidar systems specially adapted for specific applications for mapping or imaging
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48—Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/4808—Evaluating distance, position or velocity data
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0443—Digital holography, i.e. recording holograms with digital recording means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0866—Digital holographic imaging, i.e. synthesizing holobjects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H2001/0033—Adaptation of holography to specific applications in hologrammetry for measuring or analysing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0866—Digital holographic imaging, i.e. synthesizing holobjects from holograms
    • G03H2001/0875—Solving phase ambiguity, e.g. phase unwrapping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2226/00—Electro-optic or electronic components relating to digital holography
    • G03H2226/11—Electro-optic recording means, e.g. CCD, pyroelectric sensors
    • G03H2226/13—Multiple recording means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Computing Systems (AREA)
  • Theoretical Computer Science (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2022520938A 2019-10-06 2020-09-30 ハイブリッド３ｄ検査システム Active JP7538221B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962911279P 2019-10-06 2019-10-06
US62/911,279 2019-10-06
PCT/IL2020/051062 WO2021070174A1 (en) 2019-10-06 2020-09-30 Hybrid 3d inspection system

Publications (3)

Publication Number Publication Date
JP2022551129A JP2022551129A (ja) 2022-12-07
JP2022551129A5 JP2022551129A5 (https=) 2023-09-11
JP7538221B2 true JP7538221B2 (ja) 2024-08-21

Family

ID=75274080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022520938A Active JP7538221B2 (ja) 2019-10-06 2020-09-30 ハイブリッド３ｄ検査システム

Country Status (6)

Country Link
US (1) US11313794B2 (https=)
EP (1) EP4028719B1 (https=)
JP (1) JP7538221B2 (https=)
KR (1) KR102699398B1 (https=)
CN (1) CN114502912B (https=)
IL (1) IL291884B1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018211369B4 (de) * 2018-07-10 2021-06-24 Sirona Dental Systems Gmbh Optisches Messverfahren sowie optische Messvorrichtung
US20240255273A1 (en) * 2020-07-10 2024-08-01 Bae Systems Information And Electronic Systems Integration Inc. Computational shear by phase stepped speckle holography
EP4187198A4 (en) * 2020-07-22 2024-01-24 FUJIFILM Corporation DISTANCE MEASUREMENT DEVICE, DISTANCE MEASUREMENT METHOD, AND DISTANCE MEASUREMENT PROGRAM
JP7733751B2 (ja) * 2021-07-21 2025-09-03 オルボテック リミテッド レンズ貫通高さ測定
CN114323313A (zh) * 2021-12-24 2022-04-12 北京深测科技有限公司 一种基于iccd相机的成像方法和系统
US12566058B2 (en) * 2022-03-16 2026-03-03 Nikon Corporation Compact shearography system with adjustable shear distance
JP2024135247A (ja) * 2023-03-22 2024-10-04 株式会社東芝 光学検査方法及びプログラム、並びにそれを用いた光学検査装置
US20240377538A1 (en) * 2023-05-08 2024-11-14 Microsoft Technology Licensing, Llc Hybrid depth imaging with sparse subject irradiation
KR102821873B1 (ko) * 2023-12-15 2025-06-18 주식회사 큐빅셀 탈축 스캐닝 홀로그램 간섭계
WO2026074352A1 (en) * 2024-10-03 2026-04-09 Orbotech Ltd Systems and methods for inspection and metrology of vertical interconnect access in semiconductor substrates
US12467737B1 (en) 2025-03-06 2025-11-11 Camtek Ltd. Self-referencing interferometric microscope
CN120333351B (zh) * 2025-06-20 2025-08-26 上海隐冠半导体技术有限公司 一种多轴干涉仪平行度检测系统及检测方法
CN120801219A (zh) * 2025-09-12 2025-10-17 海盐嘉源色彩科技股份有限公司 一种纺织品染色均匀性检测系统、检测方法及染色方法
CN120890990B (zh) * 2025-09-30 2025-12-09 上海万泽精密铸造有限公司 复合式导叶表面探伤设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080266547A1 (en) 2007-04-24 2008-10-30 Bryan Clark Scatterometer-interferometer and method for detecting and distinguishing characteristics of surface artifacts
JP2015102485A (ja) 2013-11-27 2015-06-04 株式会社ニコン 形状測定装置、光走査装置、構造物製造システム、形状測定方法、構造物製造方法、及び形状測定プログラム
JP2018146391A (ja) 2017-03-06 2018-09-20 株式会社東京精密 表面形状測定装置及び表面形状測定方法

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6366357B1 (en) 1998-03-05 2002-04-02 General Scanning, Inc. Method and system for high speed measuring of microscopic targets
US6522777B1 (en) 1998-07-08 2003-02-18 Ppt Vision, Inc. Combined 3D- and 2D-scanning machine-vision system and method
WO2004057355A1 (en) 2002-12-20 2004-07-08 The Provost Fellows And Scholars Of The College Of The Holy And Undivided Trinity Of Queen Elizabeth Near Dublin A method and apparatus for inspection of high frequency and microwave hybrid circuits and printed circuit boards
CA2435935A1 (en) 2003-07-24 2005-01-24 Guylain Lemelin Optical 3d digitizer with enlarged non-ambiguity zone
US7283250B2 (en) 2004-01-16 2007-10-16 Veeco Instruments, Inc. Measurement of object deformation with optical profiler
US7525669B1 (en) 2004-07-09 2009-04-28 Mohsen Abdollahi High-speed, scanning phase-shifting profilometry using 2D CMOS sensor
US7649160B2 (en) 2005-02-23 2010-01-19 Lyncee Tec S.A. Wave front sensing method and apparatus
US9052294B2 (en) 2006-05-31 2015-06-09 The Boeing Company Method and system for two-dimensional and three-dimensional inspection of a workpiece
US7595894B2 (en) * 2006-06-02 2009-09-29 General Electric Company Profilometry apparatus and method of operation
FR2910123B1 (fr) 2006-12-19 2009-01-23 Phosylab Sarl Procede optico-informatique de mesure 3d de la surface exterieure d'un objet en relief par projection de franges et utilisation d'une methode a decalage de phase, systeme correspondant
US7505863B2 (en) 2007-07-13 2009-03-17 Veeco Instruments, Inc. Interferometric iterative technique with bandwidth and numerical-aperture dependency
US8854628B2 (en) * 2010-09-22 2014-10-07 Zygo Corporation Interferometric methods for metrology of surfaces, films and underresolved structures
CN102305601B (zh) * 2011-05-18 2012-10-10 天津大学 光学自由曲面三维形貌高精度非接触测量方法及装置
WO2013127975A1 (en) 2012-03-01 2013-09-06 Iee International Electronics & Engineering S.A. Compact laser source for active illumination for hybrid three-dimensional imagers
US9097612B2 (en) 2012-11-30 2015-08-04 Qed Technologies International, Inc. Integrated wavefront sensor and profilometer
EP2930461A4 (en) * 2012-12-06 2015-12-02 3Dragons Llc THREE-DIMENSIONAL FORM-MEASUREMENT DEVICE, METHOD FOR DETECTING A HOLOGRAM IMAGE, AND METHOD FOR MEASURING A THREE-DIMENSIONAL FORM
DE102014108353A1 (de) * 2013-06-13 2014-12-18 Werth Messtechnik Gmbh Verfahren und Vorrichtung zur Bestimmung von Geometrien an Messobjekten mittels eines kombinierten Sensorsystems
WO2015105980A1 (en) 2014-01-09 2015-07-16 Zygo Corporation Measuring topography of aspheric and other non-flat surfaces
US10401792B2 (en) 2014-02-06 2019-09-03 Lyncée Tec SA Digital holographic device
EP3254234A4 (en) * 2015-02-06 2018-07-11 The University of Akron Optical imaging system and methods thereof
WO2017041840A1 (en) * 2015-09-09 2017-03-16 Siemens Healthcare Gmbh An interferometric microscopy technique for inspecting a sample simultaneously at different depths of the sample
CN105222724B (zh) 2015-09-10 2018-09-18 北京天远三维科技股份有限公司 多线阵列激光三维扫描系统及多线阵列激光三维扫描方法
WO2017183017A1 (en) * 2016-04-21 2017-10-26 Nova Measuring Instruments Ltd. Optical system and method for measurements of samples
US10976532B2 (en) * 2016-06-10 2021-04-13 Tomocube, Inc. Structured illumination microscopy system using digital micromirror device and time-complex structured illumination, and operation method therefor
TWI655522B (zh) * 2017-08-08 2019-04-01 國立臺灣師範大學 結構光照明數位全像之方法與裝置
KR20190045645A (ko) 2017-10-24 2019-05-03 (주)펨트론 3차원 검사를 위한 하이브리드 모아레 측정 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080266547A1 (en) 2007-04-24 2008-10-30 Bryan Clark Scatterometer-interferometer and method for detecting and distinguishing characteristics of surface artifacts
JP2015102485A (ja) 2013-11-27 2015-06-04 株式会社ニコン 形状測定装置、光走査装置、構造物製造システム、形状測定方法、構造物製造方法、及び形状測定プログラム
JP2018146391A (ja) 2017-03-06 2018-09-20 株式会社東京精密 表面形状測定装置及び表面形状測定方法

Also Published As

Publication number Publication date
KR20220073821A (ko) 2022-06-03
US11313794B2 (en) 2022-04-26
IL291884A (en) 2022-06-01
CN114502912A (zh) 2022-05-13
JP2022551129A (ja) 2022-12-07
CN114502912B (zh) 2024-03-08
KR102699398B1 (ko) 2024-08-26
US20210102892A1 (en) 2021-04-08
EP4028719B1 (en) 2025-11-05
IL291884B1 (en) 2026-03-01
EP4028719A1 (en) 2022-07-20
EP4028719A4 (en) 2023-10-04

Similar Documents

Publication Publication Date Title
JP7538221B2 (ja) ハイブリッド３ｄ検査システム
TWI794416B (zh) 多層堆疊結構之計量方法及干涉儀系統
US7499178B2 (en) Oblique incidence interferometer
US6909509B2 (en) Optical surface profiling systems
TWI743200B (zh) 用於最佳化以成像為基礎之疊對度量之聚焦的系統及方法
US7821647B2 (en) Apparatus and method for measuring surface topography of an object
JP2022551129A5 (https=)
TWI402498B (zh) 影像形成方法及影像形成裝置
US7595891B2 (en) Measurement of the top surface of an object with/without transparent thin films in white light interferometry
WO2001025749A2 (en) Optical method and system for measuring three-dimensional surface topography
KR102285818B1 (ko) 실시간으로 자동 초점이 가능한, 측정 대상물의 입체형상을 측정하는 입체형상 측정장치
CN118129627B (zh) 基于散斑干涉的高灵敏度镜面变形测量系统及方法
US20080043224A1 (en) Scanning simultaneous phase-shifting interferometer
IL234127A (en) Illumination method and microscopic viewing device
KR100785802B1 (ko) 입체 형상 측정장치
JP2004502954A (ja) 干渉測定装置
TWI833042B (zh) 混合式3d檢測系統
KR20080076303A (ko) 공간 영역 광결맞음 단층 촬영장치
JPH06194125A (ja) 対物レンズの焦点から物体のずれ又は位置変化を検出する方法及び装置
JP5518187B2 (ja) 変形計測方法
CN115950350B (zh) 一种双角度激光干涉系统
KR20220170272A (ko) 하나의 광원으로 2차원 및 3차원 영상을 측정할 수 있는 측정 장치
JP2003083710A (ja) 干渉測定装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230901

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230901

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20230901

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20231114

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240213

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240409

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240705

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20240723

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20240808

R150 Certificate of patent or registration of utility model

Ref document number: 7538221

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150