JP7511126B2 - 光学素子の製造方法 - Google Patents
光学素子の製造方法 Download PDFInfo
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- JP7511126B2 JP7511126B2 JP2020165979A JP2020165979A JP7511126B2 JP 7511126 B2 JP7511126 B2 JP 7511126B2 JP 2020165979 A JP2020165979 A JP 2020165979A JP 2020165979 A JP2020165979 A JP 2020165979A JP 7511126 B2 JP7511126 B2 JP 7511126B2
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Images
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Description
2 基材
21 第1主面(表面)
21a 周縁
22 第2主面
23 溝
3 コーティング膜
P0 重心
P1 点
L1 直線
Claims (9)
- 基材と、前記基材の表面に形成されるコーティング膜と、を有し、前記コーティング膜は、位相差膜、反射防止膜、防汚膜、及び色調補正膜から選ばれる1つ以上を含み、前記基材は、前記表面に、前記表面の周縁に沿う1本以上の溝を有し、前記基材の前記表面の周縁全体の各点と前記表面の重心とを結ぶ各線分と、1本以上の前記溝とが交差しており、前記コーティング膜は、1本以上の前記溝に入り込んでいる、光学素子の製造方法であって、
前記基材の前記表面の重心又はその近傍にコーティング液を滴下することと、
前記基材を回転させ、遠心力によって前記基材の前記表面の重心から前記表面の周縁全体に向けて放射状に前記コーティング液を広げ、前記コーティング液の液膜を形成することと、
前記液膜を形成する際に、前記コーティング液を1本以上の前記溝に入り込ませ、前記基材の回転中に前記コーティング液が前記基材の前記表面の周縁に達しないようにすることと、
前記液膜を乾燥し、前記コーティング膜を形成することと、
を含み、
前記基材の前記表面は、凹曲面である、光学素子の製造方法。 - 前記基材の前記表面の周縁全体の各点と前記表面の重心とを結ぶ各線分と、2本以上の前記溝とが交差している、請求項1に記載の光学素子の製造方法。
- 前記溝が環状に形成される、請求項1又は2に記載の光学素子の製造方法。
- 一の前記溝が切れ目を有し、別の前記溝が前記切れ目を塞ぐように形成される、請求項1~3のいずれか1項に記載の光学素子の製造方法。
- 前記コーティング膜は、前記位相差膜を含み、
前記位相差膜は、前記基材の上に形成される配向膜と、前記配向膜の上に形成される液晶膜とを含む、請求項1~4のいずれか1項に記載の光学素子の製造方法。 - 全ての前記溝は、前記基材の前記表面の周縁から10mm以内の周縁領域に形成されている、請求項1~5のいずれか1項に記載の光学素子の製造方法。
- 前記基材の前記表面のうち前記周縁領域を除く中央領域において、前記コーティング膜の膜厚の最大値と最小値の差が1μm以下である、請求項6に記載の光学素子の製造方法。
- 前記基材の前記表面の周縁は、円形である、請求項1~7のいずれか1項に記載の光学素子の製造方法。
- 前記基材は、レンズである、請求項1~8のいずれか1項に記載の光学素子の製造方法。
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002298435A (ja) | 2001-03-30 | 2002-10-11 | Tdk Corp | 光ディスク用基板、光ディスク |
JP2006231282A (ja) | 2005-02-28 | 2006-09-07 | Seiko Epson Corp | レンズの保持具およびレンズの製造方法 |
JP2007172674A (ja) | 2005-12-19 | 2007-07-05 | Dainippon Ink & Chem Inc | 受理層形成方法及び被塗布物 |
WO2008072633A1 (ja) | 2006-12-14 | 2008-06-19 | Panasonic Corporation | レンズおよびその製造方法 |
CN102621602A (zh) | 2012-04-13 | 2012-08-01 | 中国科学院光电技术研究所 | 一种双平面超分辨成像透镜的制备方法 |
JP2013011874A (ja) | 2011-05-30 | 2013-01-17 | Hoya Corp | 眼鏡レンズの製造方法 |
JP2013037045A (ja) | 2011-08-04 | 2013-02-21 | Arisawa Mfg Co Ltd | 位相差板および当該位相差板を用いた立体画像表示装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0991696A (ja) * | 1995-09-28 | 1997-04-04 | Kao Corp | 基板の加工装置及び方法 |
JPH1173691A (ja) * | 1997-08-29 | 1999-03-16 | Sony Corp | 光ディスク製造方法及びその方法により製造された光ディスク |
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2020
- 2020-09-30 JP JP2020165979A patent/JP7511126B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002298435A (ja) | 2001-03-30 | 2002-10-11 | Tdk Corp | 光ディスク用基板、光ディスク |
JP2006231282A (ja) | 2005-02-28 | 2006-09-07 | Seiko Epson Corp | レンズの保持具およびレンズの製造方法 |
JP2007172674A (ja) | 2005-12-19 | 2007-07-05 | Dainippon Ink & Chem Inc | 受理層形成方法及び被塗布物 |
WO2008072633A1 (ja) | 2006-12-14 | 2008-06-19 | Panasonic Corporation | レンズおよびその製造方法 |
JP2013011874A (ja) | 2011-05-30 | 2013-01-17 | Hoya Corp | 眼鏡レンズの製造方法 |
JP2013037045A (ja) | 2011-08-04 | 2013-02-21 | Arisawa Mfg Co Ltd | 位相差板および当該位相差板を用いた立体画像表示装置 |
CN102621602A (zh) | 2012-04-13 | 2012-08-01 | 中国科学院光电技术研究所 | 一种双平面超分辨成像透镜的制备方法 |
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