TW201140127A - Anti-dizzy polarized board and image display device using the polarized board - Google Patents

Anti-dizzy polarized board and image display device using the polarized board Download PDF

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TW201140127A
TW201140127A TW100107861A TW100107861A TW201140127A TW 201140127 A TW201140127 A TW 201140127A TW 100107861 A TW100107861 A TW 100107861A TW 100107861 A TW100107861 A TW 100107861A TW 201140127 A TW201140127 A TW 201140127A
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Taiwan
Prior art keywords
film
glare
layer
polarizing plate
resin
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TW100107861A
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Chinese (zh)
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TWI512318B (en
Inventor
Tsutomu Furuya
Takashi Fujii
Sho Kanzaki
Toru Jinno
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Sumitomo Chemical Co
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G02B5/3041Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0043Inhomogeneous or irregular arrays, e.g. varying shape, size, height
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502Antiglare, refractive index matching layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks

Abstract

Proposed is an anti-dizzy polarized board and an image display device using the anti-dizzy polarized board, the anti-dizzy polarized board including an anti-dizzy film having a transparent support body, and an anti-dizzy layer having a roughened surface and stacked on the transparent support body; and a polarized film constituted by intervening a first adhesion layer of a hardened object formed by a hardened compound having oxide resin and stacked on the transparent support body, the polarized film being opposite to the anti-dizzy layer, wherein the ratio of the target energy spectrum H1 in the space frequency 0.01um of the roughened surface and the ratio of the energy spectrum H2 of the space frequency 0.04um is 1 to 20, the ratio of the energy spectrum H3 in the space frequency 0.1um and the energy spectrum H2 is under 0.1, and the roughened surface of the anti-dizzy layer comprises an oblique angle of over 95% and a plane of under 5%.

Description

201140127 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種顯示較佳的防眩性,可防止泛白及 閃斑的產生,且顯現良好的對比並賦予良好的 觀看性之防眩性偏光板及使用該偏光板之影像顯示裝置。 【先前技術】 液晶顯示器、電漿顯示面板、布勞恩管(Braun tube) (陰極射線管:CRT,Cathode Ray Tube)顯示器、有機電致 發光(EL : E1 ectro 1 uminescence)顯示器等影像顯示裝置, 係在外光映射至其顯示面時,會顯著地損及觀看性。為了 防止如此之外光的“,在重視晝質之電視和個人電腦、 於外光較強的室外所用之攝影機及數位照相機、以及利用 反射光來進行顯示之行動電料卜係在影像顯示裝置的 表面配置有用以防止外光的映射之防眩膜。例如在液晶顯 不器中’通常在液晶面板峨看麻置有㈣ 該防眩性偏光板具備:由聚乙蝉醇樹脂所構成之 以及使用聚乙稀醇系接著劑貼合於該偏細之防眩膜、 例如,在日本特開2006-053371號公報中二哉 對於經研磨的模具基材施以喷砂加工後, ⑦°己戟有 ^ ^ ^ %J^無電解链 錄’藉此而製造表面具有細微凹凸之模具,妙/ 成於三乙酸纖維素(TAC : Triacetyl Cellul:s^ —邊將形 硬化性樹脂層按壓於該模具的凹凸面,並一祺上之光 藉此而得到於光硬化性樹脂層的表面轉印有兮根2硬化, 面之防眩膜。 、具的凹凸 322869 4 201140127 【發明内容】 對於防眩膜,除了要求防眩性以外,亦期望當配置在 影像顯示裝置之偏光板的觀看侧時會顯現高對比,合配置 在影像顯示裝置之偏光板的觀看侧時’則抑制因气射光使 顯示面變白而產生顯示濁化之所謂「泛白」的產生,以及 當配置在影像顯示裝置之偏光板的觀看側時,則抑制因影 像顯示裝置的像素與防眩膜的表面凹凸形狀產生干涉而導 致亮度分布的產生並變得難以觀看之所謂「閃斑」的產生。 然而,上述日本特開2006-053371號公報所記載之防眩 膜,由於是使驗噴砂加卫而形成凹凸形狀之模具來製 作,故形成於防眩膜之凹凸形狀的精度不足,尤^因^能 會製作出具有SG/^以上的周期之較大的凹凸形狀,故月有 容易產生「閃斑」的問題。 此外’當使用以往廣泛使用之聚乙烯醇系接著劑作為用 以將防眩膜與由聚乙烯醇樹脂所構成之偏域貼合之接著 劑時,亦有無錢得具有高耐水性之㈣性偏光板之問題。 因此’本發明之目的係提供一種可顯示較佳的防眩 ^並顯現良好的對比,同時可防止因「泛白」及「閃斑」 偏光板。 看叫低’並且耐水㈣佳之防眩性 本發明係提供-種_性偏光板, 其具備:防眩膜,其具有透明支樓體 明支撐體上且具有凹久飱增m 樹脂膜所構成之偏==層;"及由聚乙稀醇系 、“係隔介第1接著劑層而積層於 322869 5 201140127 透明支撐體之與防眩層相反侧的面; 其中’第1接著劑層是由含有環氧系樹脂之硬化性組 成物的硬化物所構成; 空間頻率G.G1_—1中之防眩層的凹凸表面之標高的 能譜(energy Spectrum)Hl2與空間頻率〇. 〇4 a ^中之該凹 凸表面之標高的能譜H22之比H’u係在i至2〇的範圍 内;空間頻率(Μ#1中之該凹凸表面之標高的能譜Μ 與空間頻率Ο’/ζπΓ1中之該凹凸表面之標高的能譜η,之 比H32/H22為0· 1以下; 並且,該凹凸表面包含95%以上之傾斜角度為5。以下 的面。 本發明之防錄偏紐,_係復具備:賴膜或光 學補償膜等光學補償層,其係隔介第2接著劑層而積層於 偏光膜之與防眩膜相反側的面。光學補償層亦可積層於保 護膜上’絲護_隔介第2接著㈣而積層在偏光膜之 與防眩膜相反侧的面。 第2接著劑層較佳是由含有環氧 物的硬化物所構成。 又πτ王、.且成 =光膜較佳為使用經單軸拉伸且吸附配向有二色性 色素(d1Chr_ pigment)之聚乙烯醇系樹脂膜。 後顯此外隸供—種具備上述防錄偏光板及影 像K牛之影像顯示裝置。本發明之影 防眩性偏光板係以其_層側為 中 件的觀看侧。 巧卜側而配置在影像顯示元 322869 6 201140127 本發明之防眩性偏光板,能夠顯示較佳的防眩性,並 顯現良好的對比’同時可有效地防止因「泛白」及「閃斑」 的產生所導致之觀看性的降低,並且耐水性亦佳。 【實施方式】 <防眩性偏光板> 第1圖係示意性地顯示本發明之防眩性偏光板的較佳 一例之剖面圖。本發明之防眩性偏光板,如第1圖所示之 例子’係具備:防眩膜1,其具有透明支撐體102、及積層 於透明支撐體102上且具有細微的凹凸表面之防眩層1〇1; 以及由聚乙烯醇系樹脂膜所構成之偏光膜1〇4,其係隔介 第1接著劑層l〇3a而積層於透明支撐體1〇2之與防眩層 101相反側的面。第1接著劑層103a是由含有環氧系樹脂 之硬化性組成物的硬化物所構成。本發明之防眩性偏光板, 如第1圖所示之例子,可復具備:保護膜或光學補償層 105,其係隔介第2接著劑層l〇3b而積層於偏光膜1〇4之 與防眩膜1相反側的面。光學補償層亦可積層於保護膜 上’該保護膜係隔介第2接著劑層l〇3b而積層於偏光膜 1()4之與防眩膜1相反側的面。以下更詳細地說明本發明 之防眩性偏光板。 [1 ]防眩膜 (防眩層) 本發明之防眩性偏光板中所使用之防眩膜,係具備: 積層於透明支撐體上且具有細微的凹凸表面(細微凹凸表 面)之防眩層。該防眩層的特徵為:空間頻率〇.〇1以心中 322869 7 201140127 之細微凹凸表面之標高的能譜Ηι2與空間頻率〇. !中 之細微凹凸表面之標高的能譜H22之比HiVH22係在i至2〇 的範圍内,空間頻率(MW中之細微凹凸表面之標高的 能譜W與㈣解請^中之細微凹凸表面之標高的 能谱H2之比H3VH22為〇· 1以下。 以往’對於防眩膜之細微凹凸表面的週期,係以jisb 0601所記載之粗縫度曲線要素的平均長度咖、剖面曲線 要素的平均長度PSm、以及彎曲曲線要素的平均長度wSm 等來進行評估。然而,在如此之以往的評估方法中無法 正確地評估細微凹凸表面中所含之複數個週期。因此’,對 於閃斑與細微凹凸表面之相關性以及防錄與細微凹凸表 面之相關性,亦無法正確地評估,在控制RSm、pSm、WSm 等值之下,係難以製作出可兼具閃斑的抑制與充分的防眩 性能之防眩膜。 本發明人們係發現到,在將具有細微凹凸表面之防眩 層形成於透明支撐體上之防眩膜中,該細微凹凸表面顯示 出使用「細微凹凸表面之標高的能譜」所規定之特定的空 間頻率分布,亦即標高的能譜比Hi2/H22係在i至2〇的範 圍内且HAH22為0·1以下之防眩膜,可顯現較佳的防眩性 能,並防止因泛白的產生所造成之觀看性的降低,即使運 用在尚精細的影像顯示裝置時,亦不會產生閃斑而能夠顯 現兩對比。 首先,說明防眩層所具有之細微凹凸表面之標高的能 譜。第2圖係示意性地顯示本發明之防眩性偏光板所具備 8 322869 201140127 之防眩膜的表面之透視圖。如第2圖所示,本發明之防眩 膜1具備:具有由細微凹凸2所構成之細微凹凸表面的防 眩層。在此,本發明中所謂「細微凹凸表面的標高」 指在防眩膜1表面的任意點P中之細微凹凸表面的最低ς' 的高度中’從具有該高度之虛擬平面(標高係就基準而Γ為 0/ζπΟ,於防眩膜的主法線方向5(上述虛擬平面之法^方、' 向)之直線距離。如第2圖所示,當以(x,y)來表示防眩膜 面内的正交座標時’細微凹凸表面的標高可由座標(x,y) 的二維函數h(x,y)來表示。第2圖中’係以投影面3來表 示防眩膜全體的面。 細微凹凸表面的標高,可從藉由共焦顯微鏡、干涉顯 微鏡、原子力顯微鏡(AFM : Atomic F〇rce Micr〇sc〇pe)等 裝置所測定之表面形狀的三維資訊中求取。測定機所要求 的水平分解能至少為5 μ m以下,較佳為2 β m以下,此外, 垂直分解能至少為〇. l#m以下,較佳為〇 〇1/zm以下。適 合於此測定之非接觸式三維表面形狀·粗縫度測定機,可 列舉 New View 5000 系列(Zygo Corporation 公司製,在 日本可從Zygo有限公司來取得)、三維顯微鏡pl以2300 (Sensofar公司製)等。關於測定面積,由於標高之能譜的 分解能必須為0. 01 以下,所以測定面積較佳係至少為 200 ymx200 /zm 以上’尤佳為 500 /zmx500em 以上。 其次’說明從二維函數h(x,y)來求取標高的能譜之方 法。首先’係從二維函數h(x,y)中,藉由下列式(1)所定 義之二維傅利葉轉換來求取二維函數H(fx,fy)。 9 322869 201140127 式(l)201140127 VI. Description of the Invention: [Technical Field] The present invention relates to an anti-glare property which exhibits better anti-glare property, prevents whitening and flash spots, and exhibits good contrast and imparts good visibility. A polarizing plate and an image display device using the polarizing plate. [Prior Art] Image display device such as liquid crystal display, plasma display panel, Braun tube (CRT, CRT, Cathode Ray Tube) display, organic electroluminescence (EL: E1 ectro 1 uminescence) display , when the external light is mapped to its display surface, the visibility is significantly impaired. In order to prevent such light, "the TV and the personal computer that pay attention to the enamel, the camera and the digital camera used outdoors outside the strong external light, and the mobile power that uses the reflected light to display the image are displayed on the image display device. The surface is provided with an anti-glare film for preventing the external light from being mapped. For example, in a liquid crystal display device, 'usually in the liquid crystal panel, the anti-glare polarizing plate is provided with: a polyethylene glycol resin. And using a polyethylene glycol-based adhesive to adhere to the fine anti-glare film, for example, in the Japanese Laid-Open Patent Publication No. 2006-053371, after the sandblasting of the ground mold substrate, 7° There is a ^ ^ ^ %J^ electroless chain record 'by making a mold with fine irregularities on the surface, and it is made of cellulose triacetate (TAC : Triacetyl Cellul: s^ - the side of the hardening resin layer is pressed) The surface of the photocurable resin layer is transferred onto the surface of the photocurable resin layer, and the surface of the photocurable resin layer is transferred to the surface of the photocurable resin layer, and the antiglare film is cured. The unevenness 322869 4 201140127 [Description of the Invention] For anti-glare film, except In addition to the anti-glare property, it is also desirable to exhibit a high contrast when disposed on the viewing side of the polarizing plate of the image display device, and when disposed on the viewing side of the polarizing plate of the image display device, the display surface is inhibited from being changed by the gas light. The occurrence of so-called "whitening" which causes turbidity in white, and when it is disposed on the viewing side of the polarizing plate of the image display device, the interference between the pixels of the image display device and the surface unevenness of the anti-glare film is suppressed. In the case of the anti-glare film described in Japanese Laid-Open Patent Publication No. 2006-053371, the anti-glare film described in Japanese Laid-Open Patent Publication No. 2006-053371 is a mold for forming a concave-convex shape. Since it is produced, the precision of the uneven shape formed in the anti-glare film is insufficient, and it is possible to produce a large uneven shape having a period of SG/^ or more, so that there is a problem that "flash spots" are likely to occur in the month. 'When using a polyvinyl alcohol-based adhesive which has been widely used in the past as an adhesive for bonding an anti-glare film to a partial domain composed of a polyvinyl alcohol resin, there is no money. There is a problem of (4) polarizing plates having high water resistance. Therefore, the object of the present invention is to provide a contrast which can exhibit better anti-glare and which exhibits good contrast while preventing "whitening" and "flash spot" polarizing plates. The present invention provides an anti-glare film having an anti-glare film and having a transparent support structure and having a concave long-lasting m resin film. a partial == layer; " and a polyethylene-based, "interlayered first adhesive layer" laminated on the opposite side of the 322869 5 201140127 transparent support from the anti-glare layer; The agent layer is composed of a cured product containing a curable composition of an epoxy resin; an energy spectrum Hl2 and a spatial frequency of the elevation of the uneven surface of the antiglare layer in the spatial frequency G.G1_-1. The ratio H'u of the energy spectrum H22 of the elevation of the concave-convex surface in 〇4 a ^ is in the range of i to 2 ;; the spatial frequency (the energy spectrum Μ and the spatial frequency of the elevation of the concave-convex surface in Μ#1)能'/ζπΓ1, the energy spectrum η of the elevation of the concave-convex surface, the ratio H32/H22 is 0·1 And; the uneven surface comprises 95% or more of an inclination angle of 5. The following faces. The anti-recording button of the present invention comprises an optical compensation layer such as a film or an optical compensation film which is laminated on a surface of the polarizing film opposite to the anti-glare film by a second adhesive layer. The optical compensation layer may be laminated on the protective film, and the second layer (4) may be laminated on the surface of the polarizing film opposite to the anti-glare film. The second adhesive layer is preferably composed of a cured product containing an epoxy. Further, it is preferable to use a polyvinyl alcohol-based resin film which is uniaxially stretched and adsorbed and has a dichroic dye (d1Chr_ pigment). The latter is also provided as an image display device having the above-mentioned anti-recording polarizing plate and image K. The anti-glare polarizing plate of the present invention has a viewing side on which the layer side is the middle member. The anti-glare polarizing plate of the present invention can display better anti-glare property and exhibit good contrast while effectively preventing the "whitening" and "flash spots" from being displayed on the side of the image display unit 322869 6 201140127. The resulting appearance is reduced in visibility and water resistance is also good. [Embodiment] <Anti-glare polarizing plate> Fig. 1 is a cross-sectional view schematically showing a preferred example of the anti-glare polarizing plate of the present invention. The anti-glare polarizing plate of the present invention has an anti-glare film 1 having a transparent support body 102 and an anti-glare laminated on the transparent support body 102 and having a fine uneven surface. a layer 1〇1; and a polarizing film 1〇4 made of a polyvinyl alcohol-based resin film, which is laminated on the transparent support 1〇2, opposite to the anti-glare layer 101, via the first adhesive layer 10a Side face. The first adhesive layer 103a is composed of a cured product containing a curable composition of an epoxy resin. The anti-glare polarizing plate of the present invention, as exemplified in Fig. 1, may further include a protective film or an optical compensation layer 105 which is laminated on the polarizing film 1〇4 via the second adhesive layer l〇3b. The surface on the opposite side of the anti-glare film 1. The optical compensation layer may be laminated on the protective film. The protective film is laminated on the surface of the polarizing film 1 () 4 opposite to the anti-glare film 1 via the second adhesive layer 10b. The anti-glare polarizing plate of the present invention will be described in more detail below. [1] Anti-glare film (anti-glare layer) The anti-glare film used in the anti-glare polarizing plate of the present invention is provided with an anti-glare layer laminated on a transparent support and having a fine uneven surface (fine uneven surface) Floor. The anti-glare layer is characterized in that the spatial frequency 〇.〇1 is the ratio of the energy spectrum Ηι2 of the surface of the fine concave-convex surface of the 322869 7 201140127 in the heart to the energy spectrum H22 of the height of the fine concave-convex surface in the spatial frequency Hi. In the range of i to 2 ,, the ratio of the spatial frequency (the energy spectrum W of the level of the fine uneven surface in the MW to the energy spectrum H2 of the height of the fine uneven surface in the (4) solution is 〇·1 or less. The period of the fine uneven surface of the anti-glare film is evaluated by the average length of the rough-slit curve elements described in jisb 0601, the average length PSm of the cross-sectional curve elements, and the average length wSm of the curved curve elements. However, in such a conventional evaluation method, it is not possible to correctly evaluate the plurality of periods contained in the surface of the fine uneven surface. Therefore, the correlation between the spot and the fine uneven surface and the correlation between the anti-recording and the fine uneven surface are also It cannot be correctly evaluated that it is difficult to produce an anti-glare film which can suppress both the speckle and the sufficient anti-glare property under the control of values such as RSm, pSm, and WSm. It has been found that in the antiglare film in which the antiglare layer having the fine uneven surface is formed on the transparent support, the fine uneven surface exhibits a specific spatial frequency distribution prescribed by the "energy spectrum of the elevation of the fine uneven surface". , that is, the anti-glare film with an energy spectrum of the elevation of Hi2/H22 in the range of i to 2 且 and HAH22 of less than 0.1, can show better anti-glare performance and prevent the occurrence of whitening. When the visibility is lowered, even when it is used in a fine image display device, no speckle is generated and two contrasts can be expressed. First, the energy spectrum of the level of the fine uneven surface of the antiglare layer will be described. The perspective view of the surface of the anti-glare film of the anti-glare polarizing plate of the present invention having 8 322 869 201140127 is schematically shown. As shown in Fig. 2, the anti-glare film 1 of the present invention is provided with a fine unevenness 2 In the present invention, the "elevation of the fine uneven surface" means that the lowest ς' height of the fine uneven surface in any point P on the surface of the anti-glare film 1 has The height The pseudo-plane (the elevation is based on the reference and is 0/ζπΟ, the linear distance from the main normal direction 5 of the anti-glare film (the above-mentioned virtual plane method, 'direction). As shown in Fig. 2, when x, y) to indicate the orthogonal coordinates in the plane of the anti-glare film 'the elevation of the fine concave surface can be represented by the two-dimensional function h(x, y) of the coordinate (x, y). In the second figure, the projection is 'projected' The surface of the entire anti-glare film is shown on the surface 3. The surface height of the fine uneven surface can be measured from a surface shape measured by a confocal microscope, an interference microscope, or an atomic force microscope (AFM: Atomic F〇rce Micr〇sc〇pe). The horizontal decomposition energy required by the measuring machine is at least 5 μm or less, preferably 2 β m or less, and the vertical decomposition energy is at least 〇. l#m or less, preferably 〇〇1/zm. the following. The non-contact three-dimensional surface shape and the coarse-slit measuring machine suitable for this measurement include the New View 5000 series (manufactured by Zygo Corporation, available from Zygo Co., Ltd. in Japan) and the 3D microscope pl 2300 (manufactured by Sensofar Co., Ltd.) )Wait. Regarding the measurement area, since the decomposition energy of the energy spectrum of the elevation must be 0.1 or less, the measurement area is preferably at least 200 ym x 200 /zm or more, and particularly preferably 500 / zmx 500 or more. Next, a method for obtaining the energy spectrum of the elevation from the two-dimensional function h(x, y) will be described. First, the two-dimensional function H(fx, fy) is obtained from the two-dimensional function h(x, y) by the two-dimensional Fourier transform defined by the following equation (1). 9 322869 201140127 (l)

"(Λ,Λ>S 右具=/ L及Ρ刀別為Χ方向及Υ方向的空間頻率,具 =Γ度。此外’式⑴中㈣圓周率,i為 錄早位。猎由將所得之二維函數H(fxfy)進行平方 鼻’可求取標高的能碰H2rf : y)。此能譜H (f x丄)係表示 防眩層之細微凹凸表面的空間頻率分布。 以:,更具體地說明求取防眩層所具有之細微凹凸表 面之標尚的能譜之方法。葬由卜 藉由上述共焦顯微鏡、干涉顯微 見、原子力顯微鏡等所實際測定之表面形狀的三維資訊, -般係作為離散值’亦即作㈣應於多數個敎點之標高 而獲得。第3圖係顯示離散地獲得表示標高之函數h(x,w 之狀態的示意圖。如第3圖所示,當以(x,y)表示防眩膜面 内的正交座標’並以虛線來表示防眩膜的投影面3上在χ 轴方向以母△ X所分割的線以及在y抽方向以每△ y所分割 的線時’在實際的測定卜細微凹凸表面的標高係作為防 眩膜的技影面3上之各虛線的每個交又點之離散的標高值 而獲得。 ' 所得之標高值的數目,是由測定範圍與Δχ及Ay所 決定,如第3圖所示,當以x軸方向的測定範圍為χ=ΜΔχ, 以y軸方向的測定範圍為γ=ΝΔγ時,所得之標高值的數目 為(M+1)X(N+1)個。 如第3圖所示’當將防眩膜的投影面3上之著眼點A 的座標設為(jAx,kAy)(在此’ j為〇以上μ以下,k為〇 322869 10 201140127 以上N以下)時, 於著眼"(Λ,Λ>S right == L and the sickle is the spatial frequency of the Χ direction and the Υ direction, with =Γ. In addition, the formula (1) (4) pi, i is the early position. The two-dimensional function H(fxfy) performs the square nose 'can find the height of the collision H2rf : y). This energy spectrum H (f x 丄) indicates the spatial frequency distribution of the fine uneven surface of the anti-glare layer. In order to more specifically describe the energy spectrum of the fine concavo-convex surface of the anti-glare layer. The three-dimensional information of the surface shape actually measured by the above-mentioned confocal microscope, interference microscopy, atomic force microscope, etc., is generally obtained as a discrete value, which is obtained at the elevation of a plurality of defects. Fig. 3 is a view showing a state in which the function h (x, w) indicating the elevation is discretely obtained. As shown in Fig. 3, when (x, y) is used to indicate the orthogonal coordinates in the plane of the anti-glare film and is indicated by a broken line When the line on the projection surface 3 of the anti-glare film is divided by the mother Δ X in the χ axis direction and the line divided by Δ y in the y pumping direction, the height of the surface of the fine uneven surface is actually measured. Obtained by the discrete elevation values of each intersection of each dotted line on the technical surface of the glare film. ' The number of elevation values obtained is determined by the measurement range and Δχ and Ay, as shown in Fig. 3. When the measurement range in the x-axis direction is χ=ΜΔχ and the measurement range in the y-axis direction is γ=ΝΔγ, the number of the obtained elevation values is (M+1)X(N+1). As shown in the figure, when the coordinate of the eye point A on the projection surface 3 of the anti-glare film is (jAx, kAy) (here, 'j is 〇 or more μ or less, and k is 〇322869 10 201140127 or more and N or less), Focus on

的標高可表示為心一)。之防眩膜表面上之點P r相依,/則疋間隔ΔΧ&Δγ係與測定機器的水平分解 L及精度佳地評估細微μ表面,*上述般,以 、、列定範圍\又佳均為5,以下,尤佳均為2/zm以下。此外, ;= 係如上述般,較佳均為20一以上,尤佳 均為500 y m以上。 b在實際的測定中,表示細微凹凸表面的標高之 =數係作為具有(Μ+1)χ⑽)個值之離散函數h(x,y)而獲 付。因此^系藉由以測定所獲得之離散函數h (X,y)與下列 式⑵所疋義之離散傅利葉轉換,來求取離散函數H(fx,fy), 並藉由將離散函數H(fx fy)進行平方運算,而求取能譜的 離散函數H (fx,fy)。式⑵中的!為_(紐)/2以上(m+1)/2 以下之整數,m為-(NH)/2以上(N+1)/2以下之整數。此 外’ Δίχ及Afy分別為x方向及y方向的空間頻率間隔, 並分別由式(3)及式⑷所定義。Δίχ及Afy相當於標高之 能譜的水平分解能。 式(2) 式(3)The elevation can be expressed as a heart). The point on the surface of the anti-glare film P r depends, / then the interval ΔΧ & Δ γ and the horizontal decomposition of the measuring machine L and the accuracy of the evaluation of the fine μ surface, * the above, to, set the range \ and the average 5 or less, and particularly preferably 2/zm or less. Further, ? = is preferably 20 or more as described above, and more preferably 500 y m or more. b In the actual measurement, the number of the elevation indicating the surface of the fine uneven surface is obtained as a discrete function h(x, y) having (值+1)χ(10)) values. Therefore, the discrete function H(fx, fy) is obtained by the discrete Fourier transform defined by the discrete function h (X, y) obtained by the measurement and the following equation (2), and by the discrete function H (fx) Fy) Perform a squaring operation to find the discrete function H (fx, fy) of the energy spectrum. In the formula (2)! An integer of _(New)/2 or more (m+1)/2 or less, and m is an integer of -(NH)/2 or more (N+1)/2 or less. Further, Δίχ and Afy are spatial frequency intervals in the x direction and the y direction, respectively, and are defined by equations (3) and (4), respectively. Δίχ and Afy are equivalent to the horizontal decomposition energy of the energy spectrum of the elevation. Formula (2) (3)

{Ν+Ι)Δ>» ^ (4) 11 322869 201140127 第4圖係以二維離散函數h(x,y)來表示本發明之防眩 性偏光板所具備之防眩層的細微凹凸表面的標高之圖的一 例。第4圖中,標高係以白與黑的階度(gradati〇n)來表 示。第4圖所示之離散函數h(x,y)係具有512χ512個值, 水平分解能Δχ及Ay為1.66//m。 此外’第5圖係以白與黑的階度來表示將第4圖所示 之二維函數h(x,y)進行離散傅利葉轉換所得之標高的能 譜H2(fx,fy)之圖。第5圖所示之標高的能譜H2(fx,fy)亦為 具有512x512個值之離散函數,水平分解能Δίχ及Afy為 〇. 0012/ζπΓ丨。 如第4圖所示之例子般,由於本發明之防眩性偏光板 所具備之防眩層的細微凹凸表面是由不規則地形成之凹凸 所構成,所以,標高的能譜Η2係如第5圖所示,以原點為 中心呈對稱。因此,可從通過屬於二維函數之能譜H2(fx,fy) 的2原點之剖面,來求取空間頻率⑴…以心中之標高的能譜 扎2、空間頻率o.Mynf1中之標高的能譜仏2及空間頻率 /zm中之標高的能譜汛2。第6圖係顯示第5圖所示之能 譜H2(fx,fy)中的fx=0時之剖面的圖。從第6圖中可得知, 空間頻率0.01/zm-1中之細微凹凸表面的標高的能譜Hi2為 ,空間頻率中之細微凹凸表面的標高的能譜 H22為0.35,空間頻率G. 中之細微凹凸表面的標高的 能譜 H32為 0.00076,並算出比 Hi2/H2^ 14,比 h32/H22為 0.0022。 如上述般,本發明之防眩層中,空間頻率〇. β 322869 12 201140127 中之細微凹凸表面的標高的能譜HlZ與空間頻率〇 〇4#mM 中之標高的能譜W之比mViL·2被設定在!至2〇的範圍 内。標高的能譜之比低於1者,係顯示防眩層的細 微凹凸表面中所含之1〇0_以上的長週期之凹凸形狀較 少,未達25//in的短週期之凹凸形狀較多者。此時,無法 有效地防止外光的映射,而無法獲得充分的防眩性能。此 外,相對於此,標高的能譜之比HiVH22高於2〇者係顯 示細微凹凸表面中所含之100/zm以上的長週期之凹凸形 狀較多,未達25//m的短週期之凹凸形狀較少者。此時, 虽將防眩性偏光板適用在高精細的影像顯示裝置時,有產 生閃斑之傾向。為了顯示更佳的防眩性能並更有效地抑制 閃斑,標高的能譜出2之比Ηι2/Η22較佳為5至18的範圍内, 更佳為8至15的範圍内。 此外,本發明之防眩層中,空間頻率卩丨以心中之細 微凹凸表面的標高的能譜Ha2與空間頻率0 04“^中之標 高的能譜W之比W/H22被設定在〇. !以下,較佳設為〇. ^ 以下。比h32/h22為〇· 1以下者,係顯示可充分地降低細微 凹凸表面中所含之未達10//m的短週期成分,藉此可有效 地抑制泛白的產生。細微凹凸表面中所含之未達“以^的 短週期成分,不僅未有效地賦予防眩性,更會使入射於細 微凹凸表面之光散射而成為泛白之原因。 上述日本特開2006-053371號公報等所記載之以往所 知的防眩膜中,由於其空間頻率〇 〇1/znfl中之細微凹凸表 面的標高的能譜乩2與空間頻率〇.04//^中之標高的能譜 322869 13 201140127{Ν+Ι)Δ>» ^ (4) 11 322869 201140127 Fig. 4 shows the fine concave-convex surface of the anti-glare layer of the anti-glare polarizing plate of the present invention by a two-dimensional discrete function h(x, y) An example of the map of the elevation. In Fig. 4, the elevation is expressed in terms of white and black gradations (gradati〇n). The discrete function h(x, y) shown in Fig. 4 has 512 χ 512 values, and the horizontal decomposition energy Δ χ and Ay are 1.66 / / m. Further, Fig. 5 is a diagram showing the energy spectrum H2(fx, fy) of the elevation obtained by performing the discrete Fourier transform of the two-dimensional function h(x, y) shown in Fig. 4 in white and black gradations. The energy spectrum H2(fx,fy) of the elevation shown in Fig. 5 is also a discrete function with 512x512 values, and the horizontal decomposition energy Δίχ and Afy are 〇. 0012/ζπΓ丨. In the anti-glare layer of the anti-glare polarizing plate of the present invention, the fine uneven surface of the anti-glare layer of the present invention is composed of irregularly formed irregularities, so that the energy spectrum of the elevation is as follows. In the figure 5, it is symmetrical around the origin. Therefore, the spatial frequency (1) can be obtained from the profile of the 2 origins of the energy spectrum H2 (fx, fy) belonging to the two-dimensional function. The energy spectrum of the elevation in the heart 2, the elevation in the spatial frequency o.Mynf1 The energy spectrum 仏2 of the energy spectrum 仏2 and the spatial frequency/zm 汛2. Fig. 6 is a view showing a cross section at fx = 0 in the energy spectrum H2 (fx, fy) shown in Fig. 5. It can be seen from Fig. 6 that the energy spectrum Hi2 of the elevation of the fine concave-convex surface in the spatial frequency of 0.01/zm-1 is that the energy spectrum H22 of the elevation of the fine concave-convex surface in the spatial frequency is 0.35, and the spatial frequency is G. The energy spectrum H32 of the elevation of the fine uneven surface was 0.00076, and the ratio of Hi2/H2^14 was calculated to be 0.0022 for h32/H22. As described above, in the antiglare layer of the present invention, the ratio of the energy spectrum HlZ of the elevation of the surface of the fine uneven surface in the spatial frequency 〇.β 322869 12 201140127 to the energy spectrum W of the elevation of the spatial frequency 〇〇4# mM is mViL· 2 is set at! To the range of 2 〇. When the ratio of the energy spectrum of the elevation is less than one, it is shown that the long-period concave-convex shape of 1 〇 0 or more contained in the fine uneven surface of the anti-glare layer is small, and the short-period concave shape of less than 25 / / in is not obtained. More. At this time, the mapping of external light cannot be effectively prevented, and sufficient anti-glare performance cannot be obtained. On the other hand, in the case where the energy spectrum ratio of the elevation is higher than that of the HiVH22, the long-period shape of the long period of 100/zm or more contained in the surface of the fine uneven surface is large, and the short period of 25/m is not reached. Less bump shape. At this time, when the anti-glare polarizing plate is applied to a high-definition image display device, there is a tendency to generate a flare. In order to exhibit better anti-glare properties and more effectively suppress the speckle, the ratio of the energy spectrum of the elevation Ηι 2 / Η 22 is preferably in the range of 5 to 18, more preferably in the range of 8 to 15. Further, in the antiglare layer of the present invention, the spatial frequency 卩丨 is the ratio W/H22 of the energy spectrum Ha2 of the elevation of the fine uneven surface of the heart to the energy spectrum W of the elevation of the spatial frequency 0 04". In the following, it is preferably set to 〇. ^. The ratio h32/h22 is 〇·1 or less, and it is shown that the short-period component of less than 10/m in the surface of the fine uneven surface can be sufficiently reduced. Effectively suppresses the generation of whitening. The short-period component contained in the surface of the fine uneven surface is not effectively imparted anti-glare property, but also causes light incident on the surface of the fine uneven surface to become white. the reason. In the conventional anti-glare film described in Japanese Laid-Open Patent Publication No. 2006-053371, the energy spectrum 乩2 and the spatial frequency 〇.04/ of the surface of the fine uneven surface in the spatial frequency 〇〇1/znfl are obtained. The energy spectrum of the elevation in /^ 322869 13 201140127

Hz之比H! /¾2係大於本案,所以,有容易產生閃斑之問題。 因此’為了將比Ηι2/Η22設定在1至20的範圍内,必須降 低空間頻率0. 01 βπΓ1中之細微凹凸表面的標高的能譜Ηι2。 如此’具有使空間頻率〇. 〇1以m-i中之細微凹凸表面的標高 的能譜Hi2被降低之細微凹凸表面之防眩膜,如後述般,可 藉由使用顯示出在空間頻率大於〇以m-i且為〇. 以m-i以 下的範圍内不具有極大值之能譜的圖案(pat1:ern),而理想 地製作出。在此,所謂「圖案」,典型上係意指為了形成防 眩膜的細微凹凸表面所用之藉由計算機所製作之由2階調 (例如經二值化為白與黑之影像資料)或3階調以上的階度 所構成之影像資料’但亦可包含可單一意義地轉換為該影 像資料之資料(行列資料等可單一意義地轉換為影像資 料之^料,係可舉例如僅保存各像素的座標及階調之資料 等。 如此,藉由使用顯示出在空間頻率大於〇以且為 0.04/ζπΓ1以下的範圍内不具有極大值之能譜的圖案來形成 防眩膜的細微凹凸表面,可有效地降低空間頻率 中之細微凹凸表面的標高的能譜Hl2,而可將比Hi2/H22設定 在1至20的範圍内。 再者,為了獲得具有空間頻率〇· 1以m-i中之細微凹凸 表面的標高的能譜W與空間頻率〇.04从γ中之標高的能 谱Η2之比札2/!^為〇. 1以下之細微凹凸表面之防眩膜,前 述圖案的能譜,較佳係在空間頻率大於〇 〇4//nfl且未達 O.l/zm1之範圍内具有極大值。藉由使用具有如此之能譜 322869 14 201140127 之圖案來形成防眩膜的細微凹凸表面, 頻率中之細微凹a表面㈣高的_2:大= 將比H3VH22設定在0. 1以下。 使用如此之圖案來形成防眩臈的細微凹凸表面之方 法’較佳為使用該圖案來製作具有凹凸面之模具,並將該 模具的凹凸面轉印至基材膜上所形成之樹脂層的表面之^ 法(壓花法(embossing))。 —令赞明人们讀現到,防眩層的細微凹凸表面顯示特 ,的傾斜角度分布者’係會顯示較佳的防眩性能,且更有 =也:止泛白。亦即,本發明之防眩性偏光板中,防眩層 的、,·田破凹凸表面係包含95%以上之傾斜角度為5。以下的 “貝斜角度為5以下之面的比例低於95%時,凹凸 斜角度變陡,會將來自周_光予以聚光,而容易 =面全體變白之泛白現象。為了抑制此聚光效果並 例命二::(細微凹凸表面的傾斜角度為5。以下之面的比 例愈而者愈佳,較佳為97%以上,尤佳為㈣以上。 此’本發明中所謂「細微凹凸表面的傾斜角度」, =曰多,展第2 ®,在防眩膜1表面的任意點p中,相對於 的主法線方向5,在該處將凹凸進行加權後之局部 品/ i 6所成之角度(表面傾斜角度)必。關於細微凹凸表 面的傾斜角彦,# 万,、軚两相同地’可從藉由共焦顯微鏡、 二、、、貝微鏡、原子力顯微鏡(A F M)縣置所測定之表面形狀 的三維資訊中求取。 第7圖係用以說明細微凹凸表面之傾斜角度的測定方 15 322869 201140127 法之示意圖。說明具體的傾斜角度決定方法時,如第7圖 所示,首先決定以虛線所示之虛擬平面FGHI上的著眼點 A’在通過點A之X軸上的著眼點請近取相對於點a幾乎 呈對稱之點B及D,且在通過點八之y軸上的著眼點A附 近取相對於點A幾乎呈對稱之點c及E,並決定對應於此 等點B、C、D、E之在防眩膜面上的點q、R、s、τ。此外, 第7圖中,以(x,y)表示防眩膜面内的正交座標,以z來表 示防眩膜厚度方向的座標。平面FGHI係由通過y軸上的點 C且平行於X軸的直線以及同樣通過7軸上的點E且平行 於X軸的直線、與通過<軸上的點8且平行於y軸的直線 以及同樣通過X軸上的,點D且平行軸的直線之各交叉 點F、G、Η、I所形成之面。此外,雖然第7圖中係以使實 際之防眩膜面的位置相對於平面FGHI為上方之方式來描 繪,但當然可因著眼點A的取點位置之不同,使實際之防 眩臈面的位置在平面FGHI的上方或下方。 傾斜角度,可藉由從所測得之表面形狀的三維資訊 中,求取將由對應於著眼點A之實際防眩膜面上的點卩與 對應於在著眼點A附近所取之4點B、C、D、E之實際防眩 臈面上的點Q、R、S、T的合計5點所構成之多邊形的4 個平面,亦即四個三角形PQR、PRS、psT、pTQ的各法線向 量6a、6b、6c、6d予以平均所得之平均法線向量(平均法 線向量係與第2圖所示之將凹凸進行加權後之局部的法線 6同義)之相對於防眩膜的主法線方向之極角而獲得。對各 測定點求取傾斜角度後,計算出直方圖(histogram)。 16 322869 201140127 第8圖係顯示防眩膜所具備之防眩層的細微凹凸表面 之傾斜角度分布的直方圖的一例之圖表。第8圖所示之圖 表中,橫軸為傾斜角度’且以〇. 5。為刻度來分割。例如最 左邊的直柱,係表示傾斜角度為〇至〇.5。的範圍之集合的 分布’之後隨著往右方移動,角度每次增加〇. 5«。第8圖 中’每隔橫軸的2個刻度顯示值的下限值,例如,橫軸中 「1」的部分,表示傾斜角度為1至1.5。的範圍之集合的 分布,此外,縱軸表示傾斜角度的分布,是合計為1(1〇〇%) 之值。此例中’傾斜角度為5。以下之面的比例大致為1〇〇%。 為了製作出防眩層的細微凹凸表面包含95%以上之傾 斜角度為5。以下的面之防眩膜,較佳仍是採取使用該圖案 來製作具有凹凸面之模具,並將該模具的凹凸面轉印至基 材膜上所形成之樹脂層的表面之方法(壓花法)。如此之壓 花法中,防眩層的細微凹凸表面之傾斜角度,是由具有凹 凸面之模具的製造條件來決定。具體而言,可藉由改變後 述模具的製造方法中之蝕刻步驟的蝕刻量來進行控制。亦 即藉由減少第1姓刻步驟之姓刻量,可減少所形成之第 1表面凹凸形狀的高低差,而增加傾斜角度為5。以下的面 之比例。為了製得具備包含95%以上之傾斜角度為5。以下 的面之細微凹凸表面的防眩膜,第丨蝕刻步驟之蝕刻量較 佳為2至8ym。當蝕刻量未達2//m時,金屬表面幾乎無 法形成凹凸形狀而成為幾乎平坦之模具,故使用此模具‘所 製作之防眩膜無法顯示充分的防眩性。此外,當蝕刻量超 過8/z in時,形成於金屬表面之凹凸形狀的高低差增大,可 322869 17 201140127 能使傾斜角度為^以下的面未達95%。使用此模具所製作 之防眩膜,會有產生泛白之虞。 此外,亦可藉由第2蝕刻步驟之蝕刻量,來控制防眩 層的細微凹凸表面之傾斜角度。藉由增加第2蝕刻步驟之 蝕刻量,可有效地將第丨表面凹凸形狀之表面傾斜較陡的 部分予以鈍化,而可增加傾斜角度為5。以下的面之比例。 為了製得具備包含95%以上之傾斜角度為5。以下的面之細The ratio of Hz H! /3⁄42 is larger than this case, so there is a problem that flash spots are likely to occur. Therefore, in order to set the ratio Ηι2/Η22 in the range of 1 to 20, the energy spectrum Ηι2 of the level of the fine uneven surface in the spatial frequency of 0.01 βπΓ1 must be lowered. Such an anti-glare film having a fine uneven surface whose energy spectrum Hi1 is reduced by the level of the fine uneven surface in mi, as described later, can be expressed by using a spatial frequency greater than 〇 Mi is 〇. It is ideally produced in a pattern (pat1: ern) which does not have a maximum energy spectrum in the range of mi or less. Here, the "pattern" generally means a second-order tone (for example, binarized white and black image data) or a computer made by a computer for forming a fine uneven surface of the anti-glare film. The image data composed of the gradation above the gradation 'but may also include data that can be converted into the image data in a single sense (the arranging data, etc. can be converted into image data in a single sense, for example, only The coordinates of the coordinates of the pixel and the tone, etc. Thus, the fine uneven surface of the anti-glare film is formed by using a pattern showing an energy spectrum having a maximum value in a range where the spatial frequency is larger than 〇 and is 0.04/ζπΓ1 or less. The energy spectrum Hl2 of the elevation of the fine uneven surface in the spatial frequency can be effectively reduced, and the ratio Hi2/H22 can be set in the range of 1 to 20. Furthermore, in order to obtain the spatial frequency 〇·1 in mi The energy spectrum of the elevation of the surface of the fine concave and convex surface and the energy spectrum 〇.04 of the space frequency 〇.04 from the gamma height ratio 札2/!^ is 防. 1 below the fine anti-glare surface of the anti-glare film, the energy spectrum of the aforementioned pattern , preferably in space The rate is greater than 〇〇4//nfl and has a maximum value in the range of not reaching Ol/zm1. By using a pattern having such an energy spectrum 322869 14 201140127 to form a fine uneven surface of the anti-glare film, the fine concave a in the frequency The surface (4) is high _2: large = will be set to be lower than H3VH22. The method of using such a pattern to form an anti-glare fine uneven surface is preferably used to form a mold having a concave-convex surface, and The method of transferring the uneven surface of the mold to the surface of the resin layer formed on the substrate film (embossing) is exemplified by the fact that the fine uneven surface of the antiglare layer is displayed. , the inclination angle distributor's will show better anti-glare performance, and more = also: whitening. That is, in the anti-glare polarizing plate of the present invention, the anti-glare layer, The surface system contains 95% or more of the inclination angle of 5. When the ratio of the surface with the bevel angle of 5 or less is less than 95%, the inclination angle of the concavity becomes steep, and the light from the circumference is concentrated, and it is easy to = The whole whitening of the surface is whitened. In order to suppress this concentrating effect and to order life :: (The inclination angle of the fine uneven surface is 5. The ratio of the lower surface is preferably better, preferably 97% or more, and more preferably (4) or more. This is the "inclination angle of the fine uneven surface" in the present invention. , = 曰, 展 2 2, at any point p on the surface of the anti-glare film 1, relative to the main normal direction 5, where the unevenness is weighted by the local product / i 6 angle The tilt angle of the surface must be. The tilt angle of the surface of the fine uneven surface can be measured by confocal microscopy, bismuth, bismuth microscopy, and atomic force microscopy (AFM). The three-dimensional information of the surface shape is obtained. Fig. 7 is a schematic diagram for explaining the measurement of the inclination angle of the fine uneven surface 15 322869 201140127. When the specific tilt angle determining method is described, as shown in FIG. 7, first, the eye point A' on the virtual plane FGHI indicated by the broken line is determined to be close to the point a on the X-axis passing through the point A. Almost symmetric points B and D, and points c and E which are almost symmetrical with respect to point A near the point of view A on the y-axis of point eight, and determine corresponding points B, C, D, The point q, R, s, τ of E on the anti-glare film surface. Further, in Fig. 7, the orthogonal coordinates in the plane of the anti-glare film are indicated by (x, y), and the coordinates in the thickness direction of the anti-glare film are indicated by z. The plane FGHI is a straight line passing through a point C on the y-axis and parallel to the X-axis and a line passing through the point E on the 7-axis and parallel to the X-axis, and passing through the point 8 on the <axis and parallel to the y-axis. The straight line and the surface formed by the intersections F, G, Η, I of the straight line passing through the point D on the X-axis and the parallel axis. Further, in the seventh drawing, the position of the actual anti-glare film surface is drawn upward with respect to the plane FGHI, but of course, the actual anti-glare surface can be made due to the difference in the position of the eye point A. The position is above or below the plane FGHI. The tilt angle can be obtained from the three-dimensional information of the measured surface shape, and the point B on the actual anti-glare film surface corresponding to the eye point A and the 4-point B corresponding to the vicinity of the eye point A can be obtained. The four planes of the polygon formed by the total of five points Q, R, S, and T on the actual anti-glare surface of C, D, and E, that is, the four triangles PQR, PRS, psT, and pTQ The average normal vector obtained by averaging the line vectors 6a, 6b, 6c, and 6d (the average normal vector is synonymous with the local normal 6 of the local portion weighted by the unevenness shown in FIG. 2) with respect to the anti-glare film Obtained from the polar angle of the main normal direction. After obtaining the tilt angle for each measurement point, a histogram is calculated. 16 322869 201140127 Fig. 8 is a graph showing an example of a histogram of the oblique angle distribution of the fine uneven surface of the antiglare layer provided in the antiglare film. In the graph shown in Fig. 8, the horizontal axis is the inclination angle ' and is 〇. Split for the scale. For example, the leftmost straight column indicates that the tilt angle is 〇 to 〇.5. The distribution of the set of ranges is then moved to the right, and the angle is increased by 〇. 5«. In Fig. 8, the lower limit of the value displayed on each of the two scales on the horizontal axis, for example, the portion of "1" on the horizontal axis indicates that the tilt angle is 1 to 1.5. In addition, the vertical axis represents the distribution of the inclination angle, and is a value of 1 (1% by weight) in total. In this case, the angle of inclination is 5. The ratio of the following is approximately 1%. The fine uneven surface for producing the antiglare layer contains 95% or more of an inclination angle of 5. The antiglare film of the following surface is preferably a method of producing a mold having a concave-convex surface using the pattern, and transferring the uneven surface of the mold to the surface of the resin layer formed on the base film (embossing) law). In such an embossing method, the inclination angle of the fine uneven surface of the antiglare layer is determined by the manufacturing conditions of the mold having the concave convex surface. Specifically, the control can be performed by changing the etching amount of the etching step in the method of manufacturing the mold described later. That is, by reducing the surname of the first surname step, the height difference of the formed first surface concavo-convex shape can be reduced, and the inclination angle can be increased by 5. The ratio of the following faces. In order to obtain an angle of inclination of 5, including 95% or more. The anti-glare film on the surface of the fine uneven surface of the following surface preferably has an etching amount of 2 to 8 μm in the second etching step. When the etching amount is less than 2/m, the metal surface hardly forms an uneven shape and becomes a nearly flat mold. Therefore, the anti-glare film produced by using the mold cannot exhibit sufficient anti-glare property. Further, when the etching amount exceeds 8/z in, the height difference of the uneven shape formed on the metal surface is increased, and the face having an inclination angle of less than or equal to 95% can be obtained by 322869 17 201140127. The anti-glare film produced by using this mold has a whitening effect. Further, the inclination angle of the fine uneven surface of the antiglare layer can be controlled by the etching amount of the second etching step. By increasing the etching amount in the second etching step, it is possible to effectively passivate the portion where the surface of the second surface irregular surface is steeply inclined, and to increase the inclination angle to 5. The ratio of the following faces. In order to obtain an angle of inclination of 5, including 95% or more. The following details

微凹凸表面的防眩膜,第2蝕刻步驟之蝕刻量較佳設為I 至20" m之範圍内。當蝕刻量較小時,將藉由第i蝕刻步 驟所得之凹凸的表面形狀予以齡之效果^足,轉印該= 凸形狀所製得之防眩膜的光學特性並不佳。另一方面,者 蝕刻量太大時,凹凸形狀幾乎消失而成為幾乎平坦之模具, 所以無法顯示防眩性。 、^ 本發明中,防眩層可由光硬化型樹脂等硬化型樹 硬化物祕可雜樹料所構成,其巾触是由光硬化型 樹脂㈣化物所構成。防眩層中’亦可分散有與硬化型樹 脂的硬化物或熱可塑性樹脂具有不同折射率之微粒。藉由 使微粒分散’可更有效地抑制閃斑。 s 當使上述微粒分散於防眩層時,微粒的平均粒徑較佳 為以上’尤佳為6⑽以上。此外,微粒的平均奸 可設為W以下,較佳為以下。當平均粒徑低於^ _時,微粒所造成之廣角側的散射光強度上升,各將防 眩性偏光板利在影像顯㈣科,有使對崎低:傾向。 此外,微粒的折射率_硬化型樹脂的硬化物或執可 322869 18 201140127 塑性樹脂的折 0. 98以下、戈'&之折射率比仏/〜較佳為〇. 93以上 以下、或l.h r 〇1以上1,04以下,尤佳為〇. 97以上0.98 或高於1. 〇4時^上h 〇3以下。當折射率比nb/ni•低於〇. 93 粒之界面的反硬化型樹脂的硬化物或熱可塑性樹脂與微 光率降低之傾—率增大,結果使後方散射上升,而有總透 增大,運用在^ 。總透光率的降低會使防眩臈的霧度(haze) 當折射率比n ^像顯不襄置時會發生對比的降低。此外, 之内部散射敦果%超過〇.98且未達丨.01時,由於微粒所致 層以獲得閃斑永變^、’為了將既定的散射特性賦予至防眩 微粒的含旦制效果時’可能必須增加微粒的添加量。 重量份,A 2相對於硬化型樹脂或熱可塑性樹脂100 吊為50重量份以下’較佳為曰 此外,微粒的含番難為40重w以下。 量份以上。當微敍的八為1〇重量份以上,尤佳為15重 斑抑制效果;能會^罝未達1G重#份時’微粒所致之閃 =微粒之材料,較佳為滿足上述較佳折射率比者。 ^本發明中,_層的形成較佳係使用UV壓花 、 心Ό ’較佳為使用紫外線硬化型樹脂。此時, 由於紫外線硬化型樹脂的硬化物多半係顯示15〇左右的 折射率,所以’可配合防眩膜的設計,從折射率為U0 至1. 60者中適田地選擇作為微粒。微粒較佳係使用樹脂顆 粒(resin beads)且為幾乎呈球狀者。較佳的樹脂顆粒之 例,有下列所揭示者。 三聚氰胺顆粒(折射率1.57)、 322869 19 201140127 聚甲基丙烯酸曱酯顆粒(折射率丨49)、 曱基丙烯酸曱酯/苯乙烯共聚物樹脂顆粒(折射率 1. 50 至 1.59)、 聚碳酸酯顆粒(折射率1. 55)、 聚乙婦顆粒(折射率1. 53)、 聚苯乙烯顆粒(折射率丨.6)、 聚氣乙稀顆粒(折射率、 聚矽氧(siliC0ne)樹脂顆粒(折射率146)等。 (透明支撐體) 防眩膜中所使用之透明支撐體,較佳係使用實質上為 光學透明的樹脂膜,例如可列舉三乙酸纖維素膜、聚對苯 一曱I乙一酯膜、聚曱基丙烯酸曱酯膜、聚碳酸酯膜、以 降莰烯(norbornene)系化合物作為單體之非結晶性環狀聚 稀烴所構叙料熱可紐樹賴。此等熱可塑性樹脂 膜’可為溶劑洗鑄膜(s〇lven1; cast fUm)或是擠壓膜 (extruded film)等。此等樹脂膜亦可為經施以單軸拉伸或 雙軸拉伸等拉伸處理者。 透明支撐體的厚度,就處理性之觀點來看,較佳為2〇 ym以上,此外,就影像顯示裴置的薄型化及成本等觀點 來看,較佳為100# m以下。透明支撐體的厚度尤佳為糾 β m以上80 // m以下。 (防眩膜的製造方法) 本發明之防眩性偏光板所使用之防眩膜,較佳係藉由 含有下列步驟(A)及步驟(幻之方法來製造出: 20 322869 201140127 (A)根據顯示出在空間頻率大於Ο/znf1且為0.04/ζπΓ1 以下的範圍内不具有極大值之能譜的圖案,來製作出具有 凹凸面之模具之步驟;以及 (Β)將模具的凹凸面,轉印至形成於透明支撐體上並 含有光硬化性樹脂等硬化性樹脂或熱可塑性樹脂等之樹脂 層的表面之步驟。 藉由使用在空間頻率大於O/ζπΓ1且為0. (ΜμπΓ1以下 的範圍内不具有極大值之能譜的圖案,能夠精度佳地形成 具有上述特定的空間頻率分布之細微凹凸表面。此外,藉 由根據該圖案製作出具有凹凸面之模具,並將該模具的凹 凸面轉印至形成於透明支撐體上之樹脂層的表面之方法 (壓花法),能夠精度佳且重現性良好地製得具有細微凹凸 表面之防眩層。在此,所謂「圖案」,典型上係意指為了形 成防眩膜的細微凹凸表面所用之藉由計算機所製作之由2 階調(例如經二值化為白與黑之影像資料)或3階調以上的 階度所構成之影像資料,但亦可包含可單一意義地轉換為 該影像資料之資料(行列資料等)。可單一意義地轉換為影 像資料之資料,係可舉例如僅保存各像素的座標及階調之 資料等。 上述步驟(Α)所用之圖案的能譜,例如若為影像資料 時,可藉由在將影像資料轉換為2階調的二值化影像資料 後,以二維函數g(x,y)來表示影像資料的階調,並將所得 之二維函數g(x,y)進行離散傅利葉轉換而計算出二維函 數G(fx,fy),然後將所得之二維函數G(fx,fy)進行平方運 21 322869 201140127 算而求取。在此,x及y係表示影像資料面内的正交座標, fx及fy分別表示X方向的空間頻率及y方向的空間頻率。 與求取細微凹凸表面的標高之能譜時相同地,在求取 圖案的能譜時,階調的二維函數g(x,y)一般是作為離散函 數而獲得。此時,與求取細微凹凸表面的標高之能譜時相 同地,可藉由離散傅利葉轉換來計算能譜。具體而言,藉 由以式(5)所定義之離散傅利葉轉換來計算出離散函數g (h,W ’然後將所得之離散函數G(f f )進行平 求取能譜_。在此,式⑸中㈣圓 數早位。此外,Μ為X方向的像素數,方向的像素數, 1為-M/2以上M/2以下之整數,m為叫/2以上N/2以下之 整數。再者,W分別為χ方向及y方向的空間頻 率間隔’並由式⑹及式⑺所^義。式⑻及式⑺中之^ 及Ay分別為X軸方向及y軸方向的水平分解能。當圖案 為影像資料時,^及^分別與丨個像素U軸方向的長 度及y軸方向的長度相等。亦即,當製作圖案作為64〇_ ㈣像資料時’ Δχ=Δγ=4/ζιη’當製作圖 的影像資料時, 式(5) 式(6) 322869 22 201140127 第9圖係顯示為了製作本發明之防眩膜所可使用之圖 案的影像資料的一部分之圖,其為以階調的二維離散函數 g(x,y)來表示者。第9圖所示之圖案的影像資料為2mmx2inm 的大小,且以12800dpi來製作。 第10圖係以白與黑的階度來表示將第9圖所示之階 調的二維函數g(x,y)進行離散傅利葉轉換所得之能譜G2 (fx,fy)之圖。由於第9圖所示之圖案係不規則地配置點 (dot)者,因此,該能譜G2(fx,fy)如第10圖所示,係以原 點為中心呈對稱。因此,可從通過能譜的原點之剖面,來 求取顯示圖案之能譜G2(fx,fy)的極大值之空間頻率。第11 圖係顯示第10圖所示之能譜G2(fx,fy)中的fx=0時之剖面 的圖。由此得知,第9圖所示之圖案雖在空間頻率0. 045 //m_1中具有極大值,但在大於0/znf1且為0. 04/ζπΓ1以下 之範圍内則不具有極大值。 當用以製作防眩膜之圖案的能譜G2(fx,fy)在大於0以 nf1且為0.04# πΓ1以下之空間頻率範圍内具有極大值時, 所得之防眩膜的細微凹凸表面未顯示出上述特定的空間頻 率分布,所以無法同時達成閃斑的消除以及充分的防眩性。 能譜G2(fx,fy)在大於O/ζπΓ1且為0. 04/znf1以下的空間 頻率範圍内不具有極大值之圖案,例如,如第9圖所示之 圖案般,可藉由不規則且均一地配置多數個點而製作出。 不規則地配置之點徑可為1種或複數種。此外,不規則地 配置多數個點所製作之圖案中,能譜係在作為點間的平均 距離的倒數之空間頻率顯示第一極大值(在空間頻率大於 23 322869 201140127 之最小的空間頻率中的極大值)。因 譜G2(fx,fy)在大於〇“m-丨日盔^ w -丨 似且為0.〇4⑽以下的範圍内不具 有極大值之圖案,只需以使關的平均距離成為未達25 Μ之方式製作圖案即可。此外,為了將防眩膜之空間頻 率0· 1/zm中之細微凹凸表面的標高的能譜出2與空間頻 率〇· 04 y πΓ1中之標.高的能譜仏2之比…/出2設為〇. ^以下, 則圖案的能譜,較佳係在空間頻率大於〇 〇4以^且未達 Ο.Ι#1的範圍内具有極大值。如此之圖案,可藉由以使 點間的平均距離成為大於1〇/im且未達25/^之範圍内之 方式製得。 此外,亦可從不規則地配置此等多數個點所製作之圖 案中’使用通過用以去除特定空間頻率以下的低空間頻率 成分之高通濾波器(highpassfilter)而得之圖案。再者, 亦可從不規則地配置多數個點所製作之圖案中,使用通過 用以去除特定空間頻率以下的低空間頻率成分與特定空間 頻率以上的高空間頻率成分之帶通濾波器(bandpass filter)而得之圖案。 如第11圖所示,不規則地配置多數個點所製作之圖 案的能譜,係表示與所配置之點的點徑及點間的平均距離 相依之極大值’藉由使此等圖案通過前述高通濾波器或前 述帶通濾波器,可去除不必要的成分 。如此通過高通濾波 =或帶通滤波器之圖案的能譜’由於已藉由濾波器去除成 分,所以在空間頻率大於Oy m_1且為 0. 04#111_1以下的範圍 内不具有極大值。此外’能夠更有效率地製作出在空間頻 24 322869 201140127 率大於0. 04/znf1且未達〇· 1 的範圍内具有極大值之 圖案。在此,當使用前述高通濾波器時,為了去除空間頻 率大於0 # nf1且為〇· 04" πΓ1以下的範圍内之極大值,所去 除之低空間頻率成分的上限空間頻率較佳為0. 04/ζπΓ1以 下。此外,當使用前述帶通濾波器時,為了去除空間頻率 大於0/zm_1且為Ο.ίΜμπΓ1以下的範圍内之極大值,且在空 間頻率大於0. 04βπΓ1且未達0. 1 enf1的範圍内具有極大 值,則所去除之低空間頻率成分的上限空間頻率較佳為 0· 04/zm_1以下,所去除之高空間頻率成分的下限空間頻率 較佳為0. 08/ζπΓ1以上。 當採用通過高通濾波器或帶通濾波器等之手法來製 作圖案時,通過濾波器前的圖案,亦可使用藉由亂數或以 計算機所生成之虛擬亂數來決定濃淡而具有不規則的明亮 度分布之圖案。 關於根據上述方式所得之圖案來製作出模具之方法 的詳細内容,係於後詳述。 上述步驟(Β),為藉由壓花法,將具有細微凹凸表面 之防眩層形成於透明支撐體上之步驟。壓花法可例示如使 用光硬化性樹脂之UV壓花法、以及使用熱可塑性樹脂之熱 壓花法,其中就生產性之觀點來看,較佳為壓花法β 壓花法中’是將光硬化性樹脂層形成於透明支撐體的表面, 並一邊將該光硬化性樹脂層按壓於模具的凹凸面一邊進行 硬化,藉此將模具的凹凸面轉印至光硬化性樹脂層之方 法。更具體而言,係將含有光硬化型樹脂之塗佈液塗佈在 322869 25 201140127 透明支撐體上,在使塗佈後的光硬化型樹脂密著於模具的 凹凸面之狀態下,從透明支撐體侧照射紫外線等光使光硬 化型樹脂硬化,然後從該模具中,將形成有硬化後的光硬 化型樹脂層之透明支標體剝離,藉此而製得將模具的凹凸 形狀轉印至硬化後的光硬化型樹脂層(防眩層)之防眩膜。 使用uv壓花法時之光硬化性樹脂,較佳為使用藉由 紫外線進行硬化之紫外線硬化型樹脂,亦可使用將適當選 擇的光起始劑組合於紫外線硬化型樹脂而可藉由波長較紫 外線還長之可見光進行硬化之樹脂。紫外線硬化型樹脂的 種類並無特別限定,可使用市售的適當品。紫外線硬化型 樹脂的較佳例子,為含有三羥甲基丙烷三丙烯酸酯、季戊 四醇四丙烯酸酯等多官能丙烯酸酯的i種或2種以上,以 及 Irgacure 907(Chiba Specialty Chemicals 公司製)、 Irgacure 184(Chiba Specialty Chemicals 公司製)、The anti-glare film on the surface of the micro-concave surface is preferably in the range of I to 20 " m in the etching amount in the second etching step. When the etching amount is small, the surface shape of the unevenness obtained by the i-th etching step is affected by the effect of the age, and the optical characteristics of the anti-glare film obtained by transferring the convex shape are not good. On the other hand, when the amount of etching is too large, the uneven shape almost disappears and becomes a nearly flat mold, so that the anti-glare property cannot be displayed. In the present invention, the antiglare layer may be composed of a hardening type tree hardened material such as a photocurable resin, and the towel is made of a photocurable resin (tetra). The anti-glare layer may also be dispersed with fine particles having a refractive index different from that of the hardened resin or the thermoplastic resin. The scattering of the particles can be more effectively suppressed by dispersing the particles. s When the fine particles are dispersed in the antiglare layer, the average particle diameter of the fine particles is preferably more than or equal to 6 (10) or more. Further, the average degree of the fine particles can be set to W or less, preferably the following. When the average particle diameter is lower than ^ _, the intensity of the scattered light on the wide-angle side caused by the particles rises, and the anti-glare polarizing plate is advantageous in the image display (4), which tends to be low. Further, the refractive index of the fine particles _ hardened material of the hardened resin or the refractory of 322 869 18 201140127 plastic resin is less than 0.98, and the refractive index ratio 仏 / 〜 is preferably 〇. 93 or more, or lh r 〇1 or more 1,04 or less, especially preferably 〇. 97 or more 0.98 or higher than 1. 〇4 hours ^ upper h 〇3 or less. When the refractive index ratio nb/ni• is lower than that of the 〇. 93 grain, the hardened or thermoplastic resin of the anti-hardening resin increases the tilt ratio of the decrease in the light transmittance, and as a result, the backscattering is increased, and the total bleed is increased. Increase, apply to ^. A decrease in the total light transmittance causes a haze of the anti-glare to occur when the refractive index is less than the n^ image. In addition, when the internal scattering % exceeds 〇.98 and does not reach 丨.01, the layer due to the microparticles is used to obtain the sensation of the smear, and the effect of imparting the predetermined scattering characteristics to the anti-glare particles. 'It may be necessary to increase the amount of particles added. In the case of parts by weight, A 2 is suspended in an amount of 50 parts by weight or less with respect to the curable resin or the thermoplastic resin 100. It is preferable that the content of the fine particles is 40 or less w. More than the amount. When the micro-synthesis is more than 1 part by weight, it is particularly preferable to be 15 heavy-spot suppression effect; if it is less than 1G weight, the particle-induced flash = particle material preferably satisfies the above preferred Refractive index ratio. In the present invention, the formation of the _ layer is preferably carried out by using UV embossing or palpitations. In this case, most of the cured products of the ultraviolet curable resin exhibit a refractive index of about 15 Å. Therefore, the design of the antiglare film can be selected as the fine particles from the range of the refractive index of U0 to 1.60. The particles are preferably those which are resin beads and which are almost spherical. Examples of preferred resin particles are as disclosed below. Melamine particles (refractive index 1.57), 322869 19 201140127 poly(meth)acrylate particles (refractive index 丨49), decyl methacrylate/styrene copolymer resin particles (refractive index 1.50 to 1.59), polycarbonate Particles (refractive index 1.55), polyethylene particles (refractive index 1.53), polystyrene particles (refractive index 丨.6), polyethylene particles (refractive index, siliC0ne resin particles) (Reflective Index 146), etc. (Transparent Support) The transparent support used in the antiglare film is preferably a resin film which is substantially optically transparent, and examples thereof include a cellulose triacetate film and a polyparaphenylene hydride. I. Ethyl ester film, polydecyl methacrylate film, polycarbonate film, non-crystalline cyclic poly-halogen with a norbornene compound as a monomer, and the like. The thermoplastic resin film 'may be a solvent-washed film (s〇lven1; cast fUm) or an extruded film, etc. These resin films may also be subjected to uniaxial stretching or biaxial stretching, etc. Stretching processor. The thickness of the transparent support, from the viewpoint of handling Preferably, it is 2 〇 ym or more, and it is preferably 100 # m or less from the viewpoints of reduction in thickness and cost of the image display device, etc. The thickness of the transparent support is preferably θ β m or more and 80 // m or less. (Method for Producing Anti-Glare Film) The anti-glare film used in the anti-glare polarizing plate of the present invention is preferably produced by the following steps (A) and steps (manufacturing method: 20 322869 201140127 (A) a step of producing a mold having a concave-convex surface according to a pattern showing an energy spectrum having a maximum value in a range where the spatial frequency is larger than Ο/znf1 and less than 0.04/ζπΓ1; and (Β) the uneven surface of the mold And a step of transferring to a surface of a resin layer such as a curable resin such as a photocurable resin or a thermoplastic resin, which is formed on a transparent support. The space frequency is greater than O/ζπΓ1 and is 0. (ΜμπΓ1 or less) A pattern having an energy spectrum of a maximum value is not included in the range, and a fine uneven surface having the above-described specific spatial frequency distribution can be formed with high precision. Further, a mold having a concave-convex surface is formed according to the pattern, and the mold is formed A method (embossing method) in which the uneven surface of the film is transferred to the surface of the resin layer formed on the transparent support, and an anti-glare layer having a fine uneven surface can be obtained with high precision and good reproducibility. "Pattern" generally means a computer-made 2nd-order tone (for example, binarized white and black image data) or a 3rd-order tone or more for use in forming a fine uneven surface of an anti-glare film. The image data composed of the gradation, but may also include data (array data, etc.) that can be converted into the image data in a single sense. The data can be converted into image data in a single sense, for example, only the coordinates of each pixel are saved. And the information of the tone, etc. The energy spectrum of the pattern used in the above step (Α), for example, in the case of image data, can be obtained by converting the image data into a 2nd-order binarized image data by a two-dimensional function g(x, y). The tone of the image data is represented, and the obtained two-dimensional function g(x, y) is subjected to discrete Fourier transform to calculate a two-dimensional function G(fx, fy), and then the obtained two-dimensional function G(fx, fy) Carrying a square transport 21 322869 201140127 and looking for it. Here, x and y represent orthogonal coordinates in the plane of the image data, and fx and fy respectively represent the spatial frequency in the X direction and the spatial frequency in the y direction. As in the case of obtaining the energy spectrum of the elevation of the fine concave-convex surface, the two-dimensional function g(x, y) of the tone is generally obtained as a discrete function when the energy spectrum of the pattern is obtained. At this time, the energy spectrum can be calculated by discrete Fourier transform as in the case of obtaining the energy spectrum of the elevation of the fine uneven surface. Specifically, the discrete function g (h, W ' is calculated by the discrete Fourier transform defined by the equation (5), and then the obtained discrete function G(ff ) is subjected to the flat energy spectrum _. (5) Medium (4) The number of rounds is early. In addition, Μ is the number of pixels in the X direction, the number of pixels in the direction, 1 is an integer of -M/2 or more and M/2 or less, and m is an integer of /2 or more and N/2 or less. Furthermore, W is the spatial frequency interval 'in the χ direction and the y direction, respectively, and is defined by the equations (6) and (7). The equations (8) and (7) are the horizontal decomposition energy in the X-axis direction and the y-axis direction, respectively. When the pattern is image data, ^ and ^ are respectively equal to the length of the U-axis direction of the 像素 pixel and the length of the y-axis direction, that is, when the pattern is made as 64 〇 _ (four) image data ' Δ χ = Δ γ = 4 / ζ η 'When the image data of the drawing is produced, the formula (5) (6) 322869 22 201140127 Fig. 9 is a view showing a part of the image data of the pattern which can be used for producing the anti-glare film of the present invention, which is a step The two-dimensional discrete function g(x, y) is used to represent the image. The image data of the pattern shown in Figure 9 is 2mm x 2inm and is 1280. 0dpi is produced. Figure 10 shows the energy spectrum G2 (fx, fy) obtained by discrete Fourier transform of the two-dimensional function g(x, y) of the tone shown in Fig. 9 in white and black gradation. Since the pattern shown in Fig. 9 is irregularly arranged dots, the energy spectrum G2(fx, fy) is symmetrical about the origin as shown in Fig. 10. The spatial frequency of the maximum value of the energy spectrum G2(fx,fy) of the display pattern can be obtained from the profile passing through the origin of the energy spectrum. The eleventh figure shows the energy spectrum G2 (fx, shown in Fig. 10). Fy) is a graph of the cross section at fx = 0. It follows that the pattern shown in Fig. 9 has a maximum value in the spatial frequency of 0. 045 //m_1, but is greater than 0/znf1 and is 0. In the range below 04/ζπΓ1, there is no maximum value. The energy spectrum G2(fx, fy) of the pattern for making the anti-glare film has a maximum value in a spatial frequency range greater than 0 to nf1 and 0.04# πΓ1 or less. At this time, the fine uneven surface of the obtained anti-glare film does not exhibit the above-described specific spatial frequency distribution, so that the elimination of the flare and the sufficient anti-glare property cannot be achieved at the same time. Energy spectrum G2 (fx, fy) a pattern having no maximum value in a spatial frequency range greater than O/ζπΓ1 and less than 0.04/znf1, for example, as in the pattern shown in Fig. 9, a plurality of points can be arranged irregularly and uniformly In addition, irregularly arranged dot diameters may be one or plural. In addition, in a pattern in which a plurality of dots are irregularly arranged, the spectrum can be displayed in the spatial frequency as the reciprocal of the average distance between the dots. A maximum value (maximum value in the smallest spatial frequency where the spatial frequency is greater than 23 322869 201140127). Since the spectrum G2(fx,fy) does not have a pattern of maximum values in a range larger than 〇"m-丨 盔 helmet ^ w -丨 and is below 0. 〇 4 (10), it is only necessary to make the average distance of the off 25 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作 制作The ratio of energy spectrum ...2 is set to 〇. ^ Below, the energy spectrum of the pattern is preferably a maximum value in the range where the spatial frequency is greater than 〇〇4 to ^ and not up to Ο.Ι#1. Such a pattern can be obtained by making the average distance between the dots larger than 1 〇 / im and not within the range of 25 / ^. Further, it can also be made by irregularly arranging such a plurality of dots. In the pattern, a pattern obtained by removing a high-pass filter having a low spatial frequency component below a specific spatial frequency is used. Further, it may be used in a pattern created by irregularly arranging a plurality of dots. By removing low spatial frequency components below a certain spatial frequency and above a specific spatial frequency A pattern obtained by a bandpass filter of a high spatial frequency component. As shown in Fig. 11, the energy spectrum of a pattern created by a plurality of dots is irregularly arranged, and indicates a dot diameter of a point to be arranged. And the average distance between the points depends on the maximum value 'by passing the patterns through the aforementioned high-pass filter or the aforementioned band-pass filter, unnecessary components can be removed. The energy of the pattern through the high-pass filter = or band-pass filter Since the spectrum 'has been removed by the filter, it has no maximum value in the range where the spatial frequency is greater than Oy m_1 and is less than 0.04#111_1. In addition, it can be more efficiently produced in the spatial frequency of 24 322869 201140127. a pattern having a maximum value in a range of more than 0.04/znf1 and not reaching 〇·1. Here, when the high-pass filter described above is used, in order to remove a spatial frequency greater than 0 # nf1 and a range of 〇·04" πΓ1 or less The maximum internal frequency, the upper spatial frequency of the removed low spatial frequency component is preferably 0.04 ζ π Γ 1 or less. In addition, when the aforementioned band pass filter is used, in order to remove the spatial frequency greater than 0/zm _1 is the maximum value in the range below Μ.ίΜμπΓ1, and the upper limit spatial frequency of the removed low spatial frequency component is better when the spatial frequency is greater than 0. 04βπΓ1 and does not reach the maximum value in the range of 0.1 enf1. 0/04/zm_1 or less, the lower-order spatial frequency of the removed high-space frequency component is preferably 0.08 ζ π Γ 1 or more. When a pattern is formed by a high-pass filter or a band-pass filter, filtering is performed. The pattern in front of the device may also be a pattern having an irregular brightness distribution by using a random number or a virtual random number generated by a computer to determine the shade. The details of the method of producing a mold according to the pattern obtained in the above manner will be described in detail later. The above step (Β) is a step of forming an antiglare layer having a fine uneven surface on a transparent support by an embossing method. The embossing method can be exemplified by a UV embossing method using a photocurable resin and a hot embossing method using a thermoplastic resin, and in terms of productivity, it is preferable that the embossing method β embossing method is A method in which a photocurable resin layer is formed on a surface of a transparent support, and the photocurable resin layer is pressed against the uneven surface of the mold to be cured, thereby transferring the uneven surface of the mold to the photocurable resin layer . More specifically, a coating liquid containing a photocurable resin is applied onto a transparent support of 322869 25 201140127, and the coated photocurable resin is adhered to the uneven surface of the mold, and is transparent. The support body side is irradiated with light such as ultraviolet rays to cure the photocurable resin, and then the transparent support body on which the cured photocurable resin layer is formed is peeled off from the mold, whereby the uneven shape of the mold is transferred. An anti-glare film to a light-curable resin layer (anti-glare layer) after curing. The photocurable resin in the case of using the uv embossing method is preferably an ultraviolet curable resin which is cured by ultraviolet rays, or an optically curable resin which is appropriately selected may be used in combination with an ultraviolet curable resin. A UV-resistant resin that is hardened by visible light. The type of the ultraviolet curable resin is not particularly limited, and a commercially available suitable product can be used. A preferred example of the ultraviolet curable resin is one or two or more kinds of polyfunctional acrylates such as trimethylolpropane triacrylate or pentaerythritol tetraacrylate, and Irgacure 907 (manufactured by Chiba Specialty Chemicals Co., Ltd.), Irgacure 184. (made by Chiba Specialty Chemicals),

Lucirin TP〇(BASF公司製)等光聚合起始劑之樹脂組成 物。可因應需要將微粒和溶劑等添加於此等紫外線硬化型 樹脂中,來調製出上述塗佈液。 (防眩膜製造用之模具的製造方法) 以下係說明製造防眩膜時所用之模具的製造方法。關 於本發明之防眩性偏光板所用之防眩膜的製造時所用之模 具的製造方法要是會獲得依據上述圖案所得之特定的 表面形狀之方法,則無特別限制,但為了精度佳且重現性 佳地製造細微凹凸*面,較佳係基本上含有⑴第1鍍覆步 驟、(11)研磨步驟、(iii)感光性樹脂膜形成步驟、(iv) 26 322869 201140127 曝光步驟、(v)顯影步驟、(vi)第1蝕刻步驟、(vii)感光 性樹脂膜剝離步驟、以及(viii)第2鍍覆步驟。第12圖係 示意性地顯示模具的製造方法之前半部分的較佳一例之 圖。第13圖係示意性地顯示模具的製造方法之後半部分的 較佳一例之圖。第12圖及第13圖中,係示意性地顯示各 步驟中之模具的剖面。以下參照第12圖及第13圖,詳細 地說明本模具之製造方法的各步驟。 (i)第1鍍覆步驟 本步驟中,係對模具中所用之基材的表面施以鍍銅或 鑛鎳。如此,藉由對模具用基材的表面施以鍵銅或鍵鎳, 可提升之後的第2鍍覆步驟中之鍍鉻的密著性與光澤性。 此係由於鍍銅或鍍鎳的被覆性高且平滑化作用強,故可埋 填模具用基材的微小凹凸或坑洞(Cavity)等,而能夠形成 平坦且具光澤的表面之故。藉由此等鍍銅或鍍鎳的特性, 即使在後述的第2鍍覆步驟中施以鍍鉻,亦可消除被視為 因基材上所存在的微小凹凸或坑洞(Cavity)而造成之鑛鉻 表面的粗化,並且,由於鍍銅或鍍鎳的被覆性高,而能夠 減少細微龜裂的產生。 第1鍍覆步驟中所用之銅或鎳,除了分別可為純金屬 之外,亦可為以銅為主體之合金或以鎳為主體之合金,因 此,本說明書中所謂「銅」係包含銅及銅合金之涵義,此 外,「鎳」係包含鎳及鎳合金之涵義。鍍銅及鍍鎳可分別藉 由電解鍍覆來進行或是無電解鍍覆來進行,一般係採用電 解鍍覆。 27 322869 201140127 施以鍵銅或_時,t織層太薄時,無法完全排除 底層表面的影響,所以其厚度較佳為50㈣以上。鐘覆層 厚度的上限並無臨限性,以成本等來看,—般為5〇〇⑽ 左右即可。 構成模八用基材之金屬材料,就成本的觀點來看,可 列舉銘、鐵等。此外,就處理便利性來看,尤佳為輕量的 銘。在此所謂的IS或鐵,除了分別可為純金屬之外,亦可 分別為以銘或鐵為主體之合金。 此外’模具用基材的形狀,只要是該領域中以往所採 用之適當的形狀者即可,例如,除了平板狀之外,亦可為 圓柱狀或圓筒狀的輥。若使用輥狀的基材來製作模具,則 具有能夠以連續的輥狀來製造防眩膜之優點。 (ii)研磨步驟 在接續的研磨步驟中,係將上述第丨鍍覆步驟中經施 以鍍銅或鍍鎳之基材表面進行研磨。較佳係經由此步驟將 基材表面研磨至接近鏡面之狀態。此係由於成為基材之金 屬板或金屬輥,為了達到期望精度,常施以切割或研磨等 機械加工,因而在基材表面殘留加工痕跡,即使在經施以 鍍銅或鍍鎳之狀態下,亦可能殘留此等加工痕跡,#且, 在經鍍覆之狀態下,表面不見得會完全地平滑之故。亦即, 即使將後述步驟施行在此等殘留有較深的加工痕跡之表 面,加工痕跡等的凹凸亦可能較施以各步驟後所形成之凹 凸還深,有殘留加工痕跡的影響之可能性,當使用此等模 具來製造防眩膜時,可能對光學特性產生無法預期之影 322869 28 201140127 響。第12圖(a)中,係示意性地顯示平板狀的模具用基材 7,在第1鏟覆步驟中該表面被施以鑛銅或鍍鎳(該步驟中 所形成之錄銅或鍍鎳的層並未圖示)’然後藉由研磨步驟而 具有經鏡面研磨之表面8的狀態。 關於將經施以鍍銅或鍍鎳之基材表面進行研磨之方 法並無特別限定,可使用機械研磨法、電解研磨法、化學 研磨法的任一種。機械研磨法可例示如超加工法、磨光法 (lapping)、流體研磨法、拋光(buff ing)研磨法等。此外, 亦可藉由使用切削工具進行鏡面切削,將模具用基材表面 7形成為鏡面。此時之切削工具的材質與形狀等並無特別 限制,可使用超硬刀、立方氮化硼((:1113丨(:13〇1«〇11111圩1(16, CBN)刀、陶瓷刀、金剛石刀等,就加工精度之觀點來看, 較佳為使用金剛石刀。 關於研磨後的表面粗糙度,依據JIS B 〇6〇1的規定 之中心線平均粗糙度Ra較佳為以ra以下,尤佳為〇 〇5 以下。當研磨後的中心線平均粗糙度Ra大於〇. ^以瓜 時,可能在最終形成之模具表面的凹凸形狀上會殘留研磨 後之表面祕度的影響。此外,中心線平均祕度Ra的下 限並無特別限制,可考量加工時間及加工成本等來適當地 決定。 (iii)感光性樹脂膜形成步驟 在接續的感光性樹脂卿成步驟中,係將在溶劑中溶 解有感光性樹脂之溶液,塗佈在藉由上述研磨步驟而施以 鏡面研磨之模具錄材7之經研相表面8,並進行加執· 322869 29 201140127 乾燥而形成感光性樹脂膜。第12圖(b)中’係示意性地顯 示在模具用基材7之經研磨的表面8形成有感光性樹脂膜 9之狀態。 感光性樹脂可使用以往所知的感光性樹脂。例如,作 為具有感光部分會硬化之性質的負型感光性樹脂’可使用 於分子中具有丙稀酿基或甲基丙埽醯基之丙稀酸S旨的單體 或預聚物、雙疊氮化物(bisazide)與二烯橡膠之混合物、 聚肉桂酸乙烯酯系化合物等。此外,作為具有藉由顯影使 感光部分溶出而僅殘留未感光部分之性質的正型感光性樹 脂,可使用盼樹脂系或紛酿樹脂(novolac resin)系等。此 外’感光性樹脂,可因應需要而調配增感劑、顯影促進劑、 密著性改質劑、塗佈性改質劑等各種添加劑。 當將此等感光性樹脂塗佈在模具用.基材7之經研磨的 表面8時,為了形成良好的塗膜,較佳係稀釋於適當的溶 劑來塗佈,可使用溶纖劑(cellosolve)系溶劑、丙:醇系 溶劑、酯系溶劑、醇系溶劑、_系溶劑、高極性溶劑等。 塗佈感光性樹脂溶液之方法,可使用彎月形液面塗佈 (meniscus CGating)、喷流塗佈(f_tain ⑺扣叫)、浸A resin composition of a photopolymerization initiator such as Lucirin TP (manufactured by BASF Corporation). The coating liquid can be prepared by adding fine particles, a solvent, or the like to the ultraviolet curable resin as needed. (Method for Producing Mold for Manufacturing Anti-Glare Film) Hereinafter, a method for producing a mold used for producing an anti-glare film will be described. The method for producing a mold for use in the production of the anti-glare film for use in the anti-glare polarizing plate of the present invention is not particularly limited, but is excellent in precision and reproducible in order to obtain a specific surface shape obtained according to the above pattern. Preferably, the fine uneven surface is preferably produced, and preferably contains (1) a first plating step, (11) a polishing step, (iii) a photosensitive resin film forming step, (iv) 26 322869 201140127 exposure step, (v) a developing step, (vi) a first etching step, (vii) a photosensitive resin film peeling step, and (viii) a second plating step. Fig. 12 is a view schematically showing a preferred example of the first half of the method for manufacturing a mold. Fig. 13 is a view schematically showing a preferred example of the latter half of the method for manufacturing a mold. In Figs. 12 and 13, the cross section of the mold in each step is schematically shown. Hereinafter, each step of the method of manufacturing the mold will be described in detail with reference to Figs. 12 and 13. (i) First plating step In this step, copper or nickel is applied to the surface of the substrate used in the mold. As described above, by applying the key copper or the nickel to the surface of the substrate for a mold, the adhesion and gloss of the chrome plating in the subsequent second plating step can be improved. Since copper plating or nickel plating is highly coated and has a high smoothing effect, it is possible to embed a fine unevenness or a cavity of a substrate for a mold, and to form a flat and shiny surface. By the characteristics of such copper plating or nickel plating, even if chrome plating is applied in the second plating step to be described later, it is possible to eliminate the occurrence of minute irregularities or voids on the substrate. The surface of the ore is roughened, and since the coating of copper plating or nickel plating is high, the occurrence of fine cracks can be reduced. The copper or nickel used in the first plating step may be a copper-based alloy or a nickel-based alloy in addition to a pure metal. Therefore, the term "copper" in the present specification includes copper. And the meaning of copper alloy, in addition, "nickel" contains the meaning of nickel and nickel alloy. Copper plating and nickel plating can be carried out by electrolytic plating or electroless plating, respectively, and are generally electrolytically plated. 27 322869 201140127 When the bond copper or _ is applied, when the t-woven layer is too thin, the influence of the underlying surface cannot be completely excluded, so the thickness is preferably 50 (four) or more. The upper limit of the thickness of the bell coating is not limited. In terms of cost, etc., it is generally about 5 〇〇 (10). The metal material constituting the base material for the mold is exemplified by the name, the iron, and the like from the viewpoint of cost. In addition, in terms of handling convenience, it is especially good for lightweight. The IS or iron referred to herein may be an alloy mainly composed of iron or iron, in addition to pure metal. Further, the shape of the substrate for a mold may be any shape conventionally used in the field, and may be, for example, a cylindrical or cylindrical roller in addition to a flat plate shape. When a mold is produced using a roll-shaped base material, there is an advantage that an anti-glare film can be produced in a continuous roll shape. (ii) Grinding step In the subsequent polishing step, the surface of the substrate subjected to copper plating or nickel plating in the above-mentioned second plating step is ground. Preferably, the surface of the substrate is ground to a state close to the mirror surface by this step. Since this is a metal plate or a metal roll which becomes a base material, in order to achieve a desired precision, it is often subjected to machining such as cutting or grinding, and thus processing marks remain on the surface of the substrate even in the case where copper plating or nickel plating is applied. These processing marks may also remain, # and, in the plated state, the surface may not be completely smooth. In other words, even if the steps described later are applied to the surface on which the deep processing marks remain, the irregularities such as the processing marks may be deeper than the irregularities formed after the respective steps, and the possibility of residual processing marks may be affected. When using these molds to make an anti-glare film, it may cause unpredictable effects on optical characteristics 322869 28 201140127. In Fig. 12(a), a flat substrate 7 for a mold is schematically shown, and in the first shovel step, the surface is subjected to ore or nickel plating (copper or plating formed in this step) The layer of nickel is not shown)' and then has the state of the mirror-polished surface 8 by the grinding step. The method of polishing the surface of the substrate to which copper plating or nickel plating is applied is not particularly limited, and any of a mechanical polishing method, an electrolytic polishing method, and a chemical polishing method can be used. The mechanical polishing method may, for example, be a super processing method, a lapping method, a fluid polishing method, a buffing polishing method or the like. Further, the surface 7 of the substrate for the mold can be formed into a mirror surface by mirror cutting using a cutting tool. The material and shape of the cutting tool at this time are not particularly limited, and a superhard knife or cubic boron nitride can be used ((: 1113丨(:13〇1«〇11111圩1(16, CBN) knife, ceramic knife, A diamond blade or the like is preferably a diamond knife from the viewpoint of the processing accuracy. The surface roughness after polishing is preferably equal to or less than ra according to the predetermined line width roughness of JIS B 〇6〇1. More preferably, it is less than or equal to 5. When the average center roughness Ra of the center line after grinding is larger than 〇. ^ When the melon is used, the surface roughness of the surface of the finally formed mold may remain. The lower limit of the center line average accuracy Ra is not particularly limited, and can be appropriately determined in consideration of processing time, processing cost, etc. (iii) The photosensitive resin film forming step is carried out in the solvent of the subsequent photosensitive resin. The solution in which the photosensitive resin is dissolved is applied to the surface 8 of the surface of the mold recording material 7 which has been mirror-polished by the above-mentioned polishing step, and dried by adding 322869 29 201140127 to form a photosensitive resin film. Figure 12 (b) In the state in which the photosensitive resin film 9 is formed on the surface 8 to be polished of the substrate 7 for a mold, the photosensitive resin can be used as the photosensitive resin. For example, it can be cured as a photosensitive portion. The negative photosensitive resin of the nature can be used as a monomer or prepolymer, bisazide and diene for the acrylic acid having a propylene or methyl propyl group in the molecule. A mixture of rubber, a polyvinyl cinnamate compound, etc. Further, as a positive photosensitive resin having a property of eluting a photosensitive portion by development and leaving only an unsensitized portion, a resin or a varnish resin (novolac) can be used. In addition, as the photosensitive resin, various additives such as a sensitizer, a development accelerator, an adhesion modifier, and a coatability modifier may be blended as needed. When the surface 8 to be polished of the substrate 7 is used for the mold, in order to form a good coating film, it is preferably diluted with a suitable solvent to apply it, and a cellosolve solvent or a solvent: alcohol solvent can be used. Ester system Agents, alcohol-based solvents, _ solvents, highly polar solvents, etc. The method of coating the photosensitive resin solution can be applied using a meniscus (meniscus CGating), spray coating (f_tain ⑺ cuebid), dip

泡塗佈、旋轉塗佈、輥塗佈、線棒塗佈、空氣刀塗佈、到 刀塗佈、淋幕塗佈等-般所知的方法。塗佈膜的厚声 佳係設成在乾燥後為1至之範圍。 A (iv)曝光步驟 為 在接續的曝光步驟中,係將上述能譜在大於〇以^且 以下之㈣頻率範圍内不具有極大值之=案, 322869 30 201140127 曝光於上述感光性樹脂膜形成步驟中所形成之感光性樹脂 膜9上。曝光步驟中所用之光源,可配合所塗佈之感光性 樹脂的感光波長或感度等來適當地選擇,例如可使用高壓 水銀燈的g射線(波長·· 436nm)、高壓水銀燈的h射線(波 長:405nm)、高壓水銀燈的i射線(波長:365nm)、半導體A commonly known method such as bubble coating, spin coating, roll coating, wire bar coating, air knife coating, knife coating, and curtain coating. The thick sound of the coating film is set to be in the range of 1 to 100 after drying. A (iv) exposing step is to expose the above-mentioned energy spectrum to the above-mentioned photosensitive resin film in the subsequent exposure step by using the above-mentioned energy spectrum in a frequency range greater than 〇 and below (4) without a maximum value, 322869 30 201140127 The photosensitive resin film 9 formed in the step. The light source used in the exposure step can be appropriately selected in accordance with the photosensitive wavelength or sensitivity of the applied photosensitive resin, for example, g-ray of a high-pressure mercury lamp (wavelength··436 nm), h-ray of a high-pressure mercury lamp (wavelength: 405nm), i-ray (wavelength: 365nm) of high-pressure mercury lamp, semiconductor

雷射(波長:830nm、532 nm、488 nm、405 nro 等)、YAGLaser (wavelength: 830nm, 532 nm, 488 nm, 405 nro, etc.), YAG

雷射(波長:1064nm)、KrF準分子雷射(波長:248nm)、ArF 準分子雷射(波長:193nm)、F2準分子雷射(波長:157nm) 等。 為了精度佳地形成模具的表面凹凸形狀,甚至防眩層 的表面凹凸形狀,則在曝光步驟中,較佳係在精密地控制 之狀態下將上述圖案曝光於感光性樹脂膜上,具體而言, 較佳係在電腦巾製作圖㈣為影像資料,並依據該影像資 料,藉由從經電腦控制的雷射頭所發出之雷射光,將圖案 描繪於感光性樹脂膜上。進行雷射描繪時,可使用印刷版 製作用的雷射描繪裝置。如此之雷射描繪裴置,可列舉Laser (wavelength: 1064 nm), KrF excimer laser (wavelength: 248 nm), ArF excimer laser (wavelength: 193 nm), F2 excimer laser (wavelength: 157 nm), and the like. In order to accurately form the surface uneven shape of the mold and even the surface uneven shape of the anti-glare layer, in the exposure step, the pattern is preferably exposed to the photosensitive resin film in a state of precise control, specifically Preferably, the computer towel drawing (4) is image data, and according to the image data, the pattern is drawn on the photosensitive resin film by laser light emitted from a computer-controlled laser head. For laser rendering, a laser-printing device for printing can be used. Such a laser depiction device can be enumerated

Laser Stream FX(Think Laboratory 股份有限公司製)等。 第12圖(c)中,係示意性地顯示圖案被曝光於感光性 樹脂膜9之狀態。當以負型感光性樹脂來形成感光性樹脂 膜時,經曝光的區域10,係藉由曝光使樹脂的交聯反應進 打,使對於後述顯影液之溶解性降低。因此,顯影步驟中 未曝光的區域11會被顯影賴溶解,僅有經曝光的區域 10殘留於基材表面上而成為遮罩。另—方面,當以正型感 光性樹脂來形成感光性樹脂膜時,經曝光的區域1〇,係藉 322869 31 201140127 後述顯影液之溶解性 解,僅有未曝柄區域U 被㈣液所溶 ⑺顯影步驟 €於基材表面上而成為遮罩。 在接續的顯影步驟中,杳 光性樹脂膜9時,未曝光的負型感光性樹脂作為感 有經曝光㈣域1G殘存歸^11會被顯影賴溶解,僅 姓刻步驟中為遮罩發揮作用基材上,並在接續的第1 性榭浐你也成、,, 另—方面,當使用正型感光 顯^ 「性樹脂膜9時’僅有經曝光的區域10會被 在:續=解,未曝光的區域U殘存於模具用基材上,並 在接續的第1⑽步驟中為遮罩發揮作用。 可列驟中所用之顯影液’可使用以往所知者。例如 氨水等無機驗類;乙胺、::、讀納,酸納、 正丙胺等第二胺類二=第-胺類;二乙胺、二 Z基乙醇胺、三乙醇胺等醇胺類;氫氧化四甲基錢、氮 °底;ί t等!it化三甲基經乙基銨等四級敍鹽;°。各、 溶劑的驗性水溶液;以及二曱苯、甲苯等有機 顯影步驟中的蒸員 ^嘴霧顯影、刷式 影等之方法。 影方法並無特別限制,可使用浸潰顯 顯影(brush development)、超音波顯 第12圖(d)中, 作為感光性樹脂膜9 係示意性地顯示使用負型感光性樹脂 來進行顯影處理之狀態。第12圖(c) 322869 32 201140127 10㈣11 彡液所溶解,僅有經曝光的區域 1 立〇殘留於基材表面上而成為遮罩12。第12_中,传示 示使用正型感光性樹脂作為感光性樹脂膜9來進 顯影液所溶解,僅有=二:’經曝光的區域10會被 ,„ ^ ,未曝先的區域11殘留於基材表面上而 成為遮罩12。 (vi)第1钱刻步驟 在接續的第丨㈣步驟中,於上述顯影步驟後,係將 殘存於模具絲材表面之感紐樹脂膜㈣為遮罩,主要 對無遮罩之處賴具祕材崎_,而在經研磨之鍵覆 面开/成凹ώ第13圖(a)中’係示意性地顯示藉由第1钮 刻步驟而主要對無料之處13的模紐7進行餘刻之 狀J遮罩12下部的模具用基材7,雖未從模具用基材表 面被餘刻,但隨著麵刻的進行,亦從無遮罩之纟13被進行 ㈣。因A,在遮罩12與無遮罩之處13的交界附近,遮 罩12下部賴具用基材7亦被侧。以下,係將在此等遮 罩12與無遮罩之處13的交界附近,遮罩12下部的模具用 基材7亦被餘刻者’稱為側蝕(side etching)。 第1侧頻之银刻處理,一般係使用氣化鐵(FeCh)、 氯化銅(CiiCh)、驗蝕刻液(Cu⑽⑽2)等,藉由將金屬表 面進行腐蝕來進行,但亦可使用鹽酸或硫酸等強酸,或是 藉由施加與電解鍍覆時相反的電位來進行之反電解蝕刻。 施以蝕刻處理時之形成於模具用基材之凹形狀,係因底層 金屬的種類、感光性樹脂膜的種類及蝕刻手法等有所不 322869 33 201140127 同,無法一概而論,但當蝕刻量為1〇#m以下時,可從接 觸於似]液之金屬表面,以大致等向之方式進行钱刻。在 此所渭麵刻量是指藉由蝕刻所去除之基材的厚度。 第1钱刻步驟之触刻量,較佳為i至5〇_,尤佳為 2至10//m。當触刻量未達1//m時,金屬表面幾乎無法形 成凹凸形狀而成為幾乎平坦之模具,所以無法顯示防眩 陡。此外,當蝕刻量超過5〇時形成於金屬表面之凹 凸形狀的南低差增大,使用以所得之模具所製作之防眩膜 的影像顯示裝置會有產生泛白之虞。為了製得具備包含、 95%以上之傾斜角度為5以下的面之細微凹凸表面的防眩 膜’第1 _步驟之_量尤佳為2至8_。第i蚀刻步 驟之钱刻處理’可藉由1次㈣刻處理來進行,或是亦可 將蝕刻處理分為2次以上來進行。當將蝕刻處理分為2次 以上來進行時,2次以上之蝕刻處理的蝕刻量之合計,較 佳係設為上述範圍内。 (vii)感光性樹脂膜剝離步驟 在接續的感光性樹脂膜剝離步驟中,係將第丨蝕刻 驟中作為遮罩使用之殘存之感光性劃旨膜完全地溶解而 除。感光性樹賴卿步財,係使_離液來溶解感 性樹脂膜。剝離液可使用與上述㈣液相同者。藉由改 剝離液之pH、溫度、濃度及浸潰時間等,#使用負型感 性樹脂時係將曝光部的感光性樹脂膜完全地溶解,當使 f型感光性樹料係將非曝光部的感紐樹賴完全地 解而去除。_感紐樹賴_步财之_方法並 322869 34 201140127 _影、噴霧顯影、刷式顯影、超音 特別限制,可使用浸凊 波顯影等方法。 13 ®⑸中’〜意性地顯示藉由感光性樹脂膜剝 二驟’將第1㈣步*'綠中作為遮罩12使用之感光性樹脂 肢也&解而去除<狀態。藉由使用利用由感光性樹脂 ^成之遮罩12之飾刻,將第1表面凹凸形狀15形成 於板具用基材表面。 (viii)第2鍍覆步驟 其次’係藉由對所形成之凹凸面(第 1表面凹凸形狀 施以錢鉻’而將表面的凹凸形狀予以純化。第13圖(C) 中,係顯示將鍍鉻層16形成於藉由第1#刻步驟的關處 理所形成之第1表面凹凸形狀15,而形成使凹凸較第i表 _凸&狀15更為鈍化之表面(祕表面⑺之狀態。 ί各肖佳係對於平板或輥等的表面採用 具光澤,硬 冑#'數]'’且可賦予良好的脫模性之鑛鉻。如此 裝飾:二二:::旦較佳為使用稱為所謂光澤鑛鉻或 ^ ^ •々見良好光澤之鍍鉻。鍍鉻一般是藉由電 之X':: °亥鍍覆浴可使用含有鉻酸酐(Cr〇3)與少量硫酸 '、 藉由°周節電流密度與電解時間’可控制鏟鉻的 厚度。 v第2鍛覆步驟中,施以鑛鉻以外的鍍覆者並不佳。此 係由於在鍍絡以外㈣覆中,由於硬度或耐磨耗性低,使 β為模具之耐久性降低,可能在使用中使0凸磨損或損傷 '由此4模具所製得之防眩膜可能難以獲得充分的防 35 322869 201140127 眩功能’此外,防眩膜上產生缺陷的可能性亦高。 此外’鍍覆後進行表面研磨者亦不佳。亦即,較佳係 在第2鍍覆步驟後不設置將表面進行研磨之步驟,並將施 以鐘銘'後的凹凸面直接用作為轉印至透明支撐體上的樹脂 層的表面之模具的凹凸面。此係由於進行研磨會在最外表 面產生平i旦部分,而有導致光學特性惡化之可能性,此外, 會導致形狀的控制因素增加, 而難以進行重現性佳之形狀 控制等理由。 如此’藉由對形成有細微表面凹凸形狀之表面施以錢 銘· ’可將四凸形狀予以鈍化,並獲得表面硬度被提高之模 具。此時之凹凸的鈍化程度,因底層金屬的種類、藉由第 1触刻步綠所得之凹凸的尺寸及深度、以及鍍覆的種類及 厚度等而不同,無法一概而論,但控制鈍化程度之最大因 素仍疋錢覆厚度。當鍍鉻厚度較薄時,將鍍鉻加工前所得 之凹凸的表面形狀予以鈍化之效果不足,轉印該凹凸形狀 所製得之防眩膜的光學特性並不佳。另一方面,當鍍覆厚 度太厚時’除了生產性惡化以外,更會產生稱為突粒 (odule)<突起狀鑛覆缺陷’故不佳。因此’鍍鉻厚度 ·''芝之範圍内,尤佳為3至6/zm之範圍内。 在該第2鍍覆步驟中所形成之鍍鉻層,較佳係以使維 氏硬度成為800以上之方式形成,尤佳係以成為1〇〇〇以上 之方式形成。此係由於當鍍鉻層的維氏硬度未達800時, 模具使用時的耐久性降低且鍍鉻層的硬度降低者,於鍍覆 處理時,在鍍覆浴組成、電解條件等產生異常之可能性提 322869 36 201140127 高’且對於缺陷的產生狀況,造成較不佳的影響之可能性 提高之故。 此外,較佳係在上述(vii)感光性樹脂膜剝離步驟與 (VI11)第2鍍覆步驟之間,含有將經第丨蝕刻步驟所形成 之凹凸面以钱刻處理進行鈍化之第2蝕刻步驟。第2蝕刻 步驟中’係藉由姓刻處理,將由使用感光性樹脂膜作為遮 罩之以第1姓刻步驟所形成之第1表面凹凸形狀15予以鈍 化。藉由此第2飯刻處理,可消除由第1蝕刻步驟所形成 之第1表面凹凸形狀15之表面傾斜較陡的部分,使採用所 得之模具所製造出之防眩膜的光學特性往較佳的方向變 化。第14圖中,係示意性地顯示藉由第2蝕刻處理將模具 用基材7的第1表面凹凸形狀15予以鈍化,並使表面傾斜 較陡的部分被純化’而形成具有和緩的表面傾斜之第2表 面凹凸形狀18之狀態。 第2蝕刻步驟之蝕刻處理,亦與第丨蝕刻步驟相同 地,一般係使用氯化鐵(FeCL)液、氯化銅(CuCl2)液、鹼 钱刻液(Cu(NH3)4Ch)等並藉由將表面進行腐餘來進行,但 亦可使用鹽酸或硫酸等強酸,或亦可藉由施加與電解鍍覆 時為相反的電位來進行之反電解蝕刻。施以蝕刻處理後之 凹凸的鈍化程度,因底層金屬的種類.、蝕刻手法、以及藉 由第1蝕刻步驟所得之凹凸的尺寸及深度等而不同,無法 一概而論,但控制鈍化程度之最大因素為蝕刻量。在此, 所謂餘刻量,亦與第i闕步驟相同地,是指藉由勉刻所 去除之基材的厚度。當银刻量較小時,將藉由第i飾刻步 322869 37 201140127 驟所得之凹凸的表面形狀予以鈍化之效果不足,轉印該凹 凸形狀所製得之防眩膜的光學特性並不佳。另一方面,當 蝕刻量太大時,凹凸形狀幾乎消失而成為幾乎平坦之模 具,所以無法顯示防眩性。因此,蚀刻量較佳為1至5 0 # m之範圍内,此外,為了製得具備包含95%以上之傾斜角度 為5°以下的面之細微凹凸表面的防眩膜,尤佳為4至20 //m之範圍内。關於第2蝕刻步驟之蝕刻處理,亦與第1 蝕刻步驟相同地,可藉由1次的蝕刻處理來進行,或亦可 將触刻處理分為2次以上來進行。在此,當將触刻處理分 為2次以上來進行時,2 ,次以上之蝕刻處理的蝕刻量之合 計,較佳係設為上述範圍内。 [2]偏光膜 其次,說明本發明的防眩性偏光板中所使用之偏光 膜。本發明中,較佳係使用將二色性色素吸附配向於經單 軸拉伸的聚乙烯醇系樹脂膜之偏光膜。構成偏光膜之聚乙 烯醇系樹脂,係藉由將聚乙酸乙烯酯樹脂進行皂化 (saponification)而得。就聚乙酸乙烯酯樹脂而言,除了 屬於乙酸乙烯酯的均聚物之聚乙酸乙烯酯以外,可例示如 乙酸乙烯酯及可與該乙酸乙烯酯共聚合之其他單體的共聚 物等。可與乙酸乙烯酯共聚合之其他單體,例如可列舉出 不飽和羧酸類、烯烴類、乙烯酯類、不飽和磺酸類等。聚 乙烯醇系樹脂的皂化度通常為85至100莫耳%,較佳為98 至100莫耳%之範圍。此聚乙烯醇系樹脂可進一步經改質, 例如可使用經醛類改質之聚乙烯基縮曱醛(polyvinyl 38 322869 201140127 formal)或聚乙婦基縮乙藤(polyvinyl acetal)等。聚么择 醇系樹脂的聚合度通常為1000至10000,較佳為15〇〇多 10000之範圍。 本發明中所使用之偏光膜’可經由下列步驟來製造: 將此等聚乙烯醇系樹脂進行單軸拉伸之步驟;以二色性色 素將聚乙烯醇系樹脂膜染色’並使該二色性色素吸附之梦 驟;以硼酸水溶液處理吸附有二色性色素之聚乙烯醇系樹 脂膜之步驟;以及在以硼酸水溶液進行處理後,進行水洗 之步驟。 單軸拉伸,可於依據二色性色素所進行之染色前進 行,亦可與依據二色性色素所進行之染色同時進行,亦可 在依據二色性色素所進行之染色後進行。在依據二色性色 素所進行之染色後騎單錄伸時,該單軸㈣可在繼Laser Stream FX (manufactured by Think Laboratory Co., Ltd.). In Fig. 12(c), the state in which the pattern is exposed to the photosensitive resin film 9 is schematically shown. When the photosensitive resin film is formed of a negative photosensitive resin, the exposed region 10 is subjected to a crosslinking reaction of the resin by exposure to lower the solubility of the developer to be described later. Therefore, the unexposed area 11 in the developing step is dissolved by the development, and only the exposed area 10 remains on the surface of the substrate to become a mask. On the other hand, when a photosensitive resin film is formed by a positive photosensitive resin, the exposed region 1 〇 is the solubility solution of the developing solution described later by 322869 31 201140127, and only the uncovered region U is used by the (four) liquid solution. The dissolution (7) development step is applied to the surface of the substrate to form a mask. In the subsequent development step, when the calendered resin film 9 is used, the unexposed negative-type photosensitive resin is exposed as a sensation in the exposed (four) domain 1G, and is developed as a mask in the last step. On the substrate, and in the continuation of the first nature, you also become, and, on the other hand, when using the positive photosensitive display "" resin film 9 only the exposed area 10 will be: = solution, the unexposed area U remains on the substrate for the mold, and functions as a mask in the subsequent step (10). The developer used in the step can be used as known. For example, inorganic water such as ammonia Test class; ethylamine, ::, read, sodium, n-propylamine, etc., second amines, dioxins, amines such as diethylamine, di-Z-ethanolamine, triethanolamine, etc. Money, nitrogen bottom; ί t et al! It is a four-stage salt of trimethyl ethyl ammonium; etc.; an aqueous solution of each solvent; and a steamer in an organic developing step such as diphenylbenzene and toluene^ The method of nozzle fog development, brush shadow, etc. The shadow method is not particularly limited, and a brush development can be used. In the ultrasonic display 12 (d), the photosensitive resin film 9 schematically shows a state in which development processing is performed using a negative photosensitive resin. Fig. 12 (c) 322869 32 201140127 10 (d) 11 Dissolving of the mash Only the exposed region 1 remains on the surface of the substrate to form the mask 12. In the 12th, the positive photosensitive resin is used as the photosensitive resin film 9 to dissolve the developer, only = two: 'The exposed area 10 will be, „ ^ , the unexposed area 11 remains on the surface of the substrate to become the mask 12. (vi) The first step of engraving is carried out in the subsequent step (4). After the above development step, the inductive resin film (4) remaining on the surface of the mold wire is used as a mask, mainly for the unmasked portion. The secret material 崎 _, and in the polished key surface opening / recessed ώ 13 (a) in the 'schematically shows the first button engraving step and mainly the untouched 13 of the mold 7 The substrate 7 for the mold in the lower portion of the J-shaped mask 12 is not left from the surface of the substrate for the mold, but is also carried out from the unshielded crucible 13 as the surface is polished (4). Because of A, in the vicinity of the boundary between the mask 12 and the unshielded portion 13, the substrate 7 for the lower portion of the mask 12 is also sideways. Hereinafter, in the vicinity of the boundary between the mask 12 and the unmasked portion 13, the substrate 7 for the mold at the lower portion of the mask 12 is also referred to as side etching by the remainder. The first side frequency silver etching process is generally performed by using a gasified iron (FeCh), copper chloride (CiiCh), an etching solution (Cu(10)(10)2), etc., by etching the metal surface, but hydrochloric acid or A strong acid such as sulfuric acid or a reverse electrolytic etching by applying a potential opposite to that of electrolytic plating. The concave shape formed on the substrate for a mold during the etching treatment is not the same as the type of the underlying metal, the type of the photosensitive resin film, and the etching method, etc., but it cannot be generalized, but when the etching amount is 1 When 〇#m or less, it is possible to carry out the engraving in a substantially isocratic manner from the metal surface which is in contact with the liquid. The amount referred to herein refers to the thickness of the substrate removed by etching. The amount of the first step of the engraving step is preferably i to 5 〇 _, and particularly preferably 2 to 10 / / m. When the amount of the touch is less than 1/m, the metal surface is hardly formed into a concave-convex shape and becomes a nearly flat mold, so that the anti-glare is not displayed. Further, when the etching amount exceeds 5 Å, the south-lower difference of the concave-convex shape formed on the metal surface is increased, and the image display apparatus using the anti-glare film produced by the obtained mold may cause whitening. In order to obtain an anti-glare film having a fine uneven surface including a surface having an inclination angle of 5 or less of 95% or more, the amount of the first step is preferably 2 to 8 mm. The etching process of the i-th etching step can be performed by one (four) etching process, or the etching process can be divided into two or more times. When the etching treatment is carried out in two or more steps, the total of the etching amounts of the etching treatment of two or more times is preferably within the above range. (vii) Photosensitive resin film peeling step In the subsequent photosensitive resin film peeling step, the photosensitive film which is used as a mask in the second etching step is completely dissolved and removed. Sensitive tree Lai Qing stepping money, _ liquid to dissolve the inductive resin film. The peeling liquid can be the same as the above (iv) liquid. By changing the pH, temperature, concentration, and immersion time of the stripping solution, etc., when the negative-sensitive resin is used, the photosensitive resin film of the exposed portion is completely dissolved, and when the f-type photosensitive tree is used, the non-exposed portion is used. The sense of the new tree is completely removed and removed. _ 感纽树赖_Steps of the _ method and 322869 34 201140127 _ shadow, spray development, brush development, super-tone special restrictions, can be used for dip wave development. In the case of 13 ® (5), the photosensitive resin film used in the first step (4) step *' green is also used to remove the < state. The first surface uneven shape 15 is formed on the surface of the substrate for a board by using the decoration of the mask 12 made of a photosensitive resin. (viii) The second plating step is followed by purifying the uneven shape of the surface by forming the uneven surface (the first surface uneven shape is made of chrome chrome). In Fig. 13 (C), The chrome-plated layer 16 is formed on the first surface uneven shape 15 formed by the closing process of the first step, and forms a surface in which the unevenness is more passivated than the i-th convex-amplitude 15 (the state of the secret surface (7) ί 肖 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳 佳Known as so-called lustrous chrome or ^ ^ • 良好 良好 良好 良好 良好 良好 chrome plating. Chrome plating is generally used by X':: ° Hai plating bath can use chromic anhydride (Cr 〇 3) with a small amount of sulfuric acid', by °The current density and the electrolysis time of the circumference can control the thickness of the shovel chrome. v In the second forging step, the plating other than the chrome is not good. This is due to the hardness in the (four) coating. Or low wear resistance, so that the durability of the mold is reduced, and it may cause 0 convex wear or damage during use. It is difficult to obtain sufficient anti-glare film to prevent glare function. In addition, the possibility of defects on the anti-glare film is also high. In addition, the surface grinding after plating is also not good. After the second plating step, the step of polishing the surface is not provided, and the uneven surface after the application of Zhong Ming' is directly used as the uneven surface of the mold transferred to the surface of the resin layer on the transparent support. Since the polishing produces a flat portion on the outermost surface, there is a possibility that the optical characteristics are deteriorated, and in addition, the control factor of the shape is increased, and the shape control such as reproducibility is difficult to be performed. For the surface on which the fine surface irregularities are formed, Qian Ming·' can passivate the four convex shape and obtain a mold whose surface hardness is improved. At this time, the degree of passivation of the unevenness is due to the type of the underlying metal, by the first The size and depth of the bumps obtained by the step-cutting green, as well as the type and thickness of the plating, cannot be generalized, but the biggest factor in controlling the degree of passivation is still thick and thick. When the thickness of the chrome plating is thin, the effect of passivating the surface shape of the unevenness obtained before the chrome plating is insufficient, and the optical characteristics of the anti-glare film obtained by transferring the uneven shape are not good. When the thickness of the coating is too thick, in addition to the deterioration of productivity, there is a problem that it is called odule &protrusion; the mineral deposit defect is not good. Therefore, the thickness of the chrome-plated thickness is especially good. The chrome plating layer formed in the second plating step is preferably formed so that the Vickers hardness is 800 or more, and more preferably formed to be 1 Å or more. This is because when the Vickers hardness of the chrome plating layer is less than 800, the durability of the mold is lowered and the hardness of the chrome plating layer is lowered, and the plating bath composition, the electrolysis condition, and the like may be abnormal during the plating treatment. Sexuality 322869 36 201140127 High 'and the possibility of a lesser impact on the occurrence of defects. Further, preferably, between the (vii) photosensitive resin film peeling step and the (VI11) second plating step, the second etching is performed by passivating the uneven surface formed by the second etching step by passivation. step. In the second etching step, the first surface uneven shape 15 formed by the first surname step by the use of the photosensitive resin film as a mask is made passivated by the surname process. By the second meal processing, the portion of the surface of the first surface uneven shape 15 formed by the first etching step can be eliminated, and the optical characteristics of the anti-glare film produced by using the obtained mold can be improved. Good direction changes. In the fourteenth aspect, the first surface uneven shape 15 of the mold base material 7 is passivated by the second etching treatment, and the portion having a steep surface inclination is purified to form a gentle surface inclination. The state of the second surface uneven shape 18 is obtained. In the etching process of the second etching step, similarly to the second etching step, generally, ferric chloride (FeCL) liquid, copper chloride (CuCl2) liquid, alkali money etching solution (Cu(NH3)4Ch), etc. are used. The surface is subjected to rot, but a strong acid such as hydrochloric acid or sulfuric acid may be used, or reverse electrolytic etching may be performed by applying a potential opposite to that at the time of electrolytic plating. The degree of passivation of the unevenness after the etching treatment differs depending on the type of the underlying metal, the etching method, and the size and depth of the unevenness obtained by the first etching step, and cannot be generalized, but the maximum factor for controlling the degree of passivation is The amount of etching. Here, the amount of the remaining amount is the same as the step of the first step, and refers to the thickness of the substrate removed by the engraving. When the amount of silver engraving is small, the effect of passivating the surface shape of the concavities and convexities obtained by the step 322869 37 201140127 is insufficient, and the optical characteristics of the anti-glare film obtained by transferring the concavo-convex shape are not good. . On the other hand, when the amount of etching is too large, the uneven shape almost disappears and becomes an almost flat mold, so that the anti-glare property cannot be displayed. Therefore, the etching amount is preferably in the range of 1 to 50 μm, and further, in order to obtain an anti-glare film having a fine uneven surface including 95% or more of the surface having an inclination angle of 5 or less, it is particularly preferably 4 to 20 / m range. The etching treatment in the second etching step may be performed by one etching process as in the first etching step, or may be performed by dividing the etching process into two or more times. Here, when the etch processing is performed twice or more, the total of the etching amounts of the etching treatment of 2 or more times is preferably within the above range. [2] Polarizing film Next, a polarizing film used in the anti-glare polarizing plate of the present invention will be described. In the present invention, a polarizing film in which a dichroic dye is adsorbed to a uniaxially stretched polyvinyl alcohol-based resin film is preferably used. The polyvinyl alcohol-based resin constituting the polarizing film is obtained by saponification of a polyvinyl acetate resin. In the case of the polyvinyl acetate resin, in addition to the polyvinyl acetate which is a homopolymer of vinyl acetate, a copolymer such as vinyl acetate and another monomer copolymerizable with the vinyl acetate can be exemplified. Examples of the other monomer copolymerizable with vinyl acetate include unsaturated carboxylic acids, olefins, vinyl esters, and unsaturated sulfonic acids. The degree of saponification of the polyvinyl alcohol-based resin is usually from 85 to 100 mol%, preferably from 98 to 100 mol%. The polyvinyl alcohol-based resin may be further modified, and for example, polyvinyl acetal modified with aldehydes (polyvinyl 38 322869 201140127 formal) or polyvinyl acetal may be used. The polymerization degree of the polyalcohol resin is usually from 1,000 to 10,000, preferably from 15 to 10,000. The polarizing film ' used in the present invention can be produced by the following steps: a step of uniaxially stretching the polyvinyl alcohol-based resin; dyeing the polyvinyl alcohol-based resin film with a dichroic dye and making the two A dream of chromatic dye adsorption; a step of treating a polyvinyl alcohol-based resin film having a dichroic dye adsorbed thereon with a boric acid aqueous solution; and a step of washing with a boric acid aqueous solution. The uniaxial stretching can be carried out by dyeing according to the dichroic dye, simultaneously with the dyeing by the dichroic dye, or after the dyeing by the dichroic dye. The single axis (four) can be followed by a single-shot recording after dyeing according to the dichroic color

以膨潤之狀態下進行拉伸之濕式拉伸 。拉伸倍率一般為4 至8倍。Wet stretching by stretching in a swollen state. The draw ratio is generally 4 to 8 times.

例如可將 色性色素之水溶液。二色 残虱二色性染料。 一素時,通常採用將聚乙烯醇系 匕鉀之水溶液來進行染色之方 322869 39 201140127 法。該水溶液之碘的含詈, 水為_至U重量份,^吊是相對於每100重量份的 ⑽重量份的水為的含量通常是相對於每 on $ 4n〇r t|.AL 、 重置份。水溶液的溫度通常是 秒。 於水'錢中的浸潰時間通常為30至300 另一方面’當使用二色杈 常採用將聚乙騎系樹脂膜2料作為二色性色素時,通 之水溶液來進行染色之方法〜貝於3有水溶性二色性染料 量,通常是相對於每刚重番^水溶液之二色性染料的含 份。該水溶液可含有硫酸納m水為〇.001錢01重量 是20至m:,此外,於水^無:鹽。水溶液的溫度通常 3⑻秒。 也夜中的浸潰時間通常為30至 在依據二色性色素所進行之染色後的删酸處理,係藉 由將經染色之聚乙鱗系樹_浸潰於魏水溶液來進 Γ鑛水溶液中之顯的含量,通常是相對於每1〇〇重 量份的水為2至15重量份,較佳“ ::】 用猶為二色性色筒,該餐讀練料 田使 鉀。硼酸水溶液中之碘化物沾人θ i ^ 會吾Μ Μ 2至Μ * _ I ’通常是相對於每100 重Μ的水為2至2〇重量份’較佳為5幻5 魏水溶液中的浸潰時間通f為綱至12(^ 於 ⑽至_秒,更佳為2心侧秒。魏水 為 通常是5〇t:以上,較佳為50至85χ。 的/皿度 理。 ==::_膜,通常會進行水洗處For example, an aqueous solution of a coloring pigment can be used. Two-color residue dichroic dye. In the case of one element, a method of dyeing an aqueous solution of polyvinyl alcohol-based potassium is usually used. 322869 39 201140127. The iodine of the aqueous solution contains hydrazine, water is _ to U parts by weight, and the sling is relative to 100 parts by weight of water per 100 parts by weight of the water, usually relative to each of the $4n 〇rt|.AL, reset Share. The temperature of the aqueous solution is usually seconds. The dipping time in the water 'money is usually 30 to 300. On the other hand, when the dichroic enamel is used as the dichroic dye, the aqueous solution is used for dyeing. Bayes 3 has a water-soluble dichroic dye amount, which is usually a part of the dichroic dye relative to each of the aqueous solutions. The aqueous solution may contain sodium sulfate in water as 〇.001. The weight of the 01 is 20 to m: in addition, in the water, no: salt. The temperature of the aqueous solution is usually 3 (8) seconds. Also, the nighttime impregnation time is usually 30 to the acid-cutting treatment after dyeing according to the dichroic pigment, and the dyed poly-squamous tree is immersed in the Wei aqueous solution to enter the antimony ore aqueous solution. The content is usually 2 to 15 parts by weight per 1 part by weight of water, preferably "::" is a dichroic color cylinder, and the preparation is made of potassium. Iodide in the θ i ^ Μ Μ Μ 2 to Μ * _ I 'usually 2 to 2 parts by weight relative to the water per 100 Μ ' 'best 5 illus 5 immersion in Wei aqueous solution The time pass f is from 12 to (2 to (10) to _ second, more preferably 2 to the side of the second. Wei water is usually 5 〇 t: above, preferably 50 to 85 χ. / 皿理理. ==: :_ film, usually washed

Jc先處 了11由將經魏處理後之聚乙稀醇系 322869 201140127 樹脂膜浸潰於水來進 膜。水洗處理中之^ 冼後進行朗處理,得到偏光 常為2至12〇秒。之德溫度通常是5至机,浸潰時間通 燥機或遠紅外線加埶之乾燥處理’可使用熱風乾 t,乾燥處理的處;乾燥溫度通常是4〇至剛 吟間通常為120至600秒。 得到由經單轴拉伸且吸附配向有碰或一色性毕 為=:=所:成之偏光膜。偏光膜: 化性組成物二=接含有後述著環 一 := 妒往3 ^月之防眩眭偏光板中’就機械強度之觀點來看, 偏光膜之與貼合有防_的_側為相反側之面, =後述第2接著劑層來貼合保護臈。保護膜較佳為使用 透明樹脂膜。列舉出透明樹脂膜的具體例時,例如有:三 乙酸纖維素膜等纖維素系樹脂獏;聚兩烯等鏈狀聚稀烴系 樹脂;非結晶性聚烯烴系樹脂膜;聚酯系樹脂膜;(甲基) 丙烯酸系樹脂膜;聚碳酸醋系樹脂膜;聚石風系樹脂膜;脂 環式聚醜亞胺系樹脂膜等。其中特佳為使用三乙酸纖維素 膜或非結晶性聚烯烴系樹脂膜。 非結晶性聚稀烴系樹脂,通常為具有降获稀或多環降 $烯系單體等環《烴的聚合單位者,亦可為環狀稀煙與 鏈狀烯烴之共聚物。當中’具代表性者為熱可塑性飽和降 莰烯系樹脂。非結晶性聚烯烴系樹脂中,可導入極性基。Jc was first placed in the film by impregnating the polyethylene film 322869 201140127 resin film treated with Wei into water. After the treatment in the water washing treatment, the ridge is processed to obtain a polarizing light of 2 to 12 sec. The temperature of the German is usually 5 to the machine, the dipping time dryer or the far-infrared ray drying process can be used to dry the hot air, dry treatment; the drying temperature is usually 4 〇 to 吟 usually between 120 and 600 second. A polarizing film obtained by uniaxially stretching and having an adsorption alignment or a color chromaticity =:= is obtained. Polarizing film: Chemical composition 2 = containing the ring 1 described later: = 防 to 3 ^ month in the anti-glare polarizing plate 'From the viewpoint of mechanical strength, the polarizing film and the _ side of the anti- _ On the opposite side, the second adhesive layer described later is attached to the protective layer. The protective film is preferably a transparent resin film. When a specific example of the transparent resin film is used, for example, a cellulose resin such as a cellulose triacetate film; a chain-like polyolefin resin such as polyene; a non-crystalline polyolefin resin film; and a polyester resin; Film; (meth)acrylic resin film; polycarbonate-based resin film; poly-stone-type resin film; alicyclic poly-imide-based resin film. Among them, it is particularly preferable to use a cellulose triacetate film or a non-crystalline polyolefin resin film. The non-crystalline polyolefin resin is usually a copolymer having a cyclic hydrocarbon such as a reduced or polycyclic ring-eneken monomer, and may be a copolymer of a cyclic thin smoke and a chain olefin. Among them, the representative one is a thermoplastic saturated decene-based resin. In the amorphous polyolefin-based resin, a polar group can be introduced.

S 322869 201140127 市售之非結晶性聚烯烴系樹脂,可列舉「ARTON」(JSR股 份有限公司製)、「ZE0N0R」(日本Zeon股份有限公司製)、 「ΖΕ0ΝΕΧ」(日本Zeon股份有限公司製)、「ΑΡ〇」(三井化 學股份有限公司製)、「APEL」(三井化學股份有限公司製) 等。當使用此等市售品之非結晶性聚烯烴系樹脂時,可藉 由溶劑洗鑄法、熔融擠壓法等—般所知的方法製膜而形成 膜。 保護膜的厚度,通常約為5至200 # m之範圍,較佳 為10至120 之範圍,更佳為1〇至85 之範圍。 [4]光學補償層 本發明之防眩性偏光板中,亦以具備下述光學補償層 來取代保。蔓膜為佳:隔介後述第2接著劑層而積層於偏光 膜之與貼合有防眩膜的一側為相反側之面的光學補償層。 或者是’該光學補償層亦可積層於上述保護膜上,該保護 臈係被貼合在偏光膜之與貼合有防眩膜的一側為相反侧之 面。光學補償層,是以相位差的補償等為目的之層(包含 膜)’以相位差的補償為目的之光學補償層亦稱為「相位差 板(或相位差臈)」。 光予補債層,例如可列舉:由透明樹脂的拉伸膜等所 冓成之又折射性膜(birefringent film);配向固定有盤形 ^ .曰(diSC〇tic liquid crystal)或向列液晶(nematic 歹之膜;於基材膜上形成有由盤形液晶或向 構成之液晶層者等之光學補償膜。當中’就成本、 之觀點來看,較佳係使用由透明樹脂的拉伸膜等 42 322869 201140127 所構成之雙折射性膜。該雙折射性膜 所以可兼具作為保護膜之功能,因此由於具有高敎性, 時,可省略另外的保護膜。 使用該雙折射性膜 積層於偏光膜之光學補償層可 置複數層光學補償層時,可積㈣ 數層° ^又 同種類的光學補償層。例如,可隔相^學補償層或不 樹脂的拉伸料所構成之雙折射性膜丨層而在由透明 的拉伸膜等所構成之雙折射⑽1 ^其他透明樹脂 膜。疋在由透明樹脂的拉伸媒等所構成之雙折射性 構成上述雙折射性膜之透明樹脂, 酯系樹脂;聚乙烯醇车榭r” 了舉例如:聚碳酿 騎甲烯广系樹月曰,聚本乙歸系樹脂;聚甲基丙 樹rS 脂;聚丙婦等鍵狀聚浠烴系 =專。拉伸膜可使雜單軸或雙軸等適當方式來進行處 此外’亦可將下列雙折射性膜用作為光學補償膜, 以雙折射性膜是在將熱收縮性膜貼合於由上述透明樹脂所 構成之膜之㈣下,藉祕加收縮力及/或拉伸力,來控帝 膜之厚度方向的折射率者。 在將光學補償層積層於保護膜上時,就接著作業的簡 便性和防止光學扭曲的產生等觀點來看,光學補償層與保 護膜之貼合,較佳係使用黏著劑(亦稱為感壓黏著劑)來進 行。黏著劑可使用以丙烯酸系聚合物、聚矽氧系聚合物、 1酉曰、聚胺基曱酸酯(polyurethane)或聚醚等作為基礎聚 322869 43 201140127 合物(base p〇iymer)之黏著劑組成物。當中,較佳為使用 光學透明性佳,雜適度的潤濕性和凝聚力,與基材的接 著性亦佳,並且具有耐候性和耐熱性等,在加熱或加濕的 條件下不會產生浮起或剝料獅問題之丙烯酸系黏著劑 (以丙烯酸系聚合物作為基礎聚合物之黏著劑)。丙稀酸系 黏著劑的基礎聚合物,較佳為制:具有甲基、乙基、丁 土 4反數20以下的燒基之(曱基)丙稀酸的烧酯與(甲基) 丙稀酸或(曱基)丙烯酸經基乙s旨等含有官能基的丙稀駿系 Μ之丙烯酸系共聚物’且玻璃轉移溫度為饥以下(較 2為0C以下),重量平均分子量為1〇萬以上之丙婦 共聚物。 使用黏著劑之光學補償層與保護膜之貼合,係藉^ ==形成於保護膜或光學補償層上,並隔介該㈣ :進5::合物(光學補償層或保護膜)積層並見 者劑層的形成,例如可藉由下述 : 而調製出…重量二甲:,乙_溶, 護膜或光學補償層上而形成此溶液直接塗心 點著劑層形成於防護膜劑層之方式;或是㈣ 償層上而形絲著嶋之方^將此移往保護膜或光肖 其接著力等來決定,;黏著劑層的厚度制 針# ^ 為1至50以"1左右之範圍。 黏者劑層中,可因應需 樹脂顆粒、金屬粉、其他1 璃纖維、破璃觀 抗氧化劑、紫外線吸收劑等。紫外線吸收劑可^ 322869 201140127 酸酯系化合物、二苯基_j(benzophenone)系化合物、苯并 二嗤系化合物、氰基丙烯酸g旨系化合物、鎳錯鹽(nickei complex salt)系化合物等。 當光學補償層不隔介保護膜而直接積層於偏光膜時, 光學補償層與偏光膜之貼合係使用接著劑來進行。此接著 劑係形成第2接著劑層者。 其次,詳細說明本發明之防眩性偏光板可具備之作為 相位差板的光學補償層或保護膜,與適用該防眩性偏光板 之液晶顯示裝置所具備之液晶單元(丨iquid crystal cel i) 的驅動模式之關係。本發明之防眩性偏光板可具備之相位 差板或保護膜的較佳型態,係與所適用之液晶顯示裝置所 具備之液晶單元的驅動模式相依。液晶單元的驅動模式, 有垂直配向(Vertical Alignment : VA)模式、橫向電場 (In-Plane Switching: IPS)模式、扭轉向列(Twisted Nematic : TN)模式等。 (垂直配向模式) 垂直配向模式’在非驅動狀態下,液晶分子相對於單 元基板呈垂直地配向,所以光未伴隨著偏光的變化而通 過。因此,以使偏光軸相互地正交之方式將直線偏光板配 設在液晶單元的上下方,藉此可在從正面觀看時獲得幾乎 完全的黑顯示,而可得到高對比。然而,在僅將直線偏光 板配設在此液晶單元之垂直配向模式的液晶顯示.裝置中, 從斜方觀看時,由於所配設之直線偏光板的軸角度從9〇β 偏離、以及液晶單元内的棒狀液晶分子顯現雙折射,故產 322869 45 201140127 生光漏,使對比_著降低。 、/垂直配:模式的液晶顯示裝置中,為了消除此等光漏, 必/頁在液曰曰單元與直線偏光板之間配設相位差板。垂直配 向,式中上所述,黑顯示狀態下,由於液晶分子相對 ;單元基板呈垂直地配向,故在以液晶層之面内慢轴(d〇w ^ ^ (f ast axxs) 二羊為…、以液晶層之厚度方向的折射率為nz時, 液曰曰層可視為顯示nx=ny<nz的關係之正型〇板。因此,已 =偏光膜與液晶單元之間’以膜之面内慢轴方向的折射 〜⑴、以膜之面内快軸方向的折射率為ny、以膜之厚度 广向的折射率為瞒,若配置顯示的關係之正型 )板及顯示㈣y>nz的關係之負型c板兩者,則可適當地 ^除光漏。此外,日本特開2007-256766號公報中,係記 '將具有nx>nygnz的關係之第一相位差板,以使其慢軸 ’、鄰接之偏光膜的穿透軸成為幾乎平行之關係或幾乎正交 =關係的方絲置,並在該第—相位差板與單元基板之間、 或疋在另一方的單元基板與和此相對向之偏光膜之間,配 置具有i^ny>n2的關係之第二相位差板。 曰將本發月之防眩性偏光板使用在垂直配向模式的液 *、、、頁示裝置時’較佳係將上述構成的相位差板適當地配置 偏光膜之與貼合有防眩膜的一侧為相反側之侧。鑒於成 生產性、防眩性偏光板的耐久性等,將本發明之防眩 性偏光板適用在垂直配向模式的液晶顯示裝置時,本發明 之防眩性偏光板_佳實施㈣的1為如下述之構成: 46 322869 201140127 隔介後述第2接著劑層,將具有nx>nygnz的關係之第一 相位差板積層於偏光膜之與貼合有防眩膜的一侧為相反侧 的面,並隔介黏著劑層等,將具有nx_ny>nz的關係之第 二相位差板積層於該第一相位差板上。具有 關係之第一相位差板,可藉由將由具有正的折射率異向性 之透明樹脂所構成之膜,在適當條件下進行單軸或雙軸拉 伸而製得。具有正的折射率異向性之透明樹脂,可使用以 二乙酸纖維素荨醯化纖維素為代表之纖維素系樹脂、環狀 烯烴系樹脂、聚碳酸酯系樹脂等。在此,環狀稀烴系樹脂 為以降莰烯或二曱橋八氫萘 (dimethanooctahydronaphthalene)等環狀烯烴作為單體 之樹脂,市售品有「ARTON」(JSR股份有限公司製)、 「ZE0N0R」(日本Zeon股份有限公司製)、「zeonEX」(曰本 Zeon股份有限公司製)等。此等透明樹脂中,由於光彈性 係數小、使用條件下的熱應變所導致之面内特性不一的產 生等較少’故可較佳地使用三乙酸纖維素或環狀烯烴系樹 脂。 具有Πχ与Fly > Πζ的關係之第二相位差板,例如可列舉: 將有盤形液晶塗佈在基材膜上者、以短間距將膽固醇液晶 (cholesteric liquid crystal)塗佈在基材膜上者、將雲 母等無機層狀化合物的層形成於基材膜上者、逐次或同時 將透明樹脂膜進行雙軸拉伸者、未經拉伸之溶劑洗禱模 專。具有ηχ与ny〉Πζ的關係之市售的相位差板,例如有「yM Film」(住友化學股份有限公司製)、「Fujitae 322869 47 201140127 ,因 0值,S 322869 201140127 Commercially available non-crystalline polyolefin resin, for example, "ARTON" (made by JSR Co., Ltd.), "ZE0N0R" (made by Japan Zeon Co., Ltd.), and "ΖΕ0ΝΕΧ" (made by Japan Zeon Co., Ltd.) , "ΑΡ〇" (manufactured by Mitsui Chemicals, Inc.), "APEL" (manufactured by Mitsui Chemicals, Inc.), etc. When the non-crystalline polyolefin-based resin of such a commercially available product is used, a film can be formed by a film-forming method such as a solvent washing method or a melt extrusion method to form a film. The thickness of the protective film is usually in the range of about 5 to 200 #m, preferably in the range of 10 to 120, more preferably in the range of 1 to 85. [4] Optical compensation layer The anti-glare polarizing plate of the present invention is also provided with an optical compensation layer as described below. The vine film is preferably an optical compensation layer which is laminated on the surface of the polarizing film opposite to the side on which the anti-glare film is bonded, in the second adhesive layer described later. Alternatively, the optical compensation layer may be laminated on the protective film, and the protective tape may be bonded to the opposite side of the polarizing film from the side to which the antiglare film is bonded. The optical compensation layer is a layer (including a film) for the purpose of compensating for phase difference or the like. The optical compensation layer for the purpose of compensating for the phase difference is also called "phase difference plate (or phase difference 臈)". The light-receiving layer may, for example, be a birefringent film formed of a stretched film of a transparent resin, or a diSC〇tic liquid crystal or a nematic liquid crystal. (The film of nematic ;; an optical compensation film formed of a disc-shaped liquid crystal or a liquid crystal layer formed on the base film. Among them, from the viewpoint of cost, it is preferable to use a stretching by a transparent resin. A birefringent film composed of a film such as 42 322869 201140127. This birefringent film can function as a protective film. Therefore, when it has high entanglement, an additional protective film can be omitted. When the optical compensation layer laminated on the polarizing film can be provided with a plurality of optical compensation layers, it is possible to accumulate (four) several layers of the same type of optical compensation layer. For example, it can be composed of a phase-compensated compensation layer or a non-resin stretch material. The birefringent film layer is a birefringent (10) 1 ^ other transparent resin film composed of a transparent stretched film or the like. The birefringence film is composed of a birefringence composed of a stretching medium of a transparent resin or the like. Transparent resin, Resin; polyvinyl alcohol 榭 ” 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了 了=Special. The stretched film can be used in an appropriate manner such as a hetero-uniaxial or biaxial. In addition, the following birefringent film can also be used as an optical compensation film, and the birefringent film is bonded to a heat-shrinkable film. Under (4) of the film composed of the above transparent resin, the refractive index in the thickness direction of the film is controlled by the contraction force and/or the stretching force. When the optical compensation layer is laminated on the protective film, From the viewpoints of the simplicity of the work and the prevention of the occurrence of optical distortion, the adhesion of the optical compensation layer to the protective film is preferably carried out using an adhesive (also referred to as a pressure-sensitive adhesive). The adhesive can be used with acrylic. A polymer composition, a polysiloxane polymer, a ruthenium, a polyurethane or a polyether, etc., as an adhesive composition of a base 322869 43 201140127 compound (base p〇iymer). It is preferred to use optical transparency, moderately wettability and Cohesive force, excellent adhesion to the substrate, and weather resistance, heat resistance, etc., acrylic adhesives that do not cause floating or stripping lion problems under heating or humidification conditions (acrylic polymers) As the base polymer adhesive), the base polymer of the acrylic acid adhesive is preferably made of a (meth)acrylic acid having a methyl group, an ethyl group, a butadiene 4 and an inverse number of 20 or less. The burned ester and (meth)acrylic acid or (mercapto)acrylic acid have a functional group-containing acrylonitrile-based acrylic copolymer with a functional group and the glass transition temperature is below hunger (more than 0C) The following is a polypropylene copolymer having a weight average molecular weight of more than 10,000. The optical compensation layer of the adhesive is bonded to the protective film by forming a protective film or an optical compensation layer, and interposing (4): Into the 5:: compound (optical compensation layer or protective film) to form a layer of the agent layer, for example, can be prepared by: ... weight dimethyl:, B - solution, film or optical compensation Forming the solution directly on the layer to form a layer of the coating agent layer formed on the protective film layer; or Yes (4) The layer is placed on the layer and the wire is moved to the protective film or the light is determined by the force, etc.; the thickness of the adhesive layer is #^ is 1 to 50 with a range of "1 . In the adhesive layer, resin granules, metal powder, other glass fibers, glazing antioxidants, and ultraviolet absorbing agents may be used as needed. The ultraviolet absorber may be a 322869 201140127 acid ester compound, a benzophenone compound, a benzodiazepine compound, a cyanoacrylic acid g-based compound, a nickel complex salt-based compound, or the like. When the optical compensation layer is directly laminated on the polarizing film without interposing the protective film, the bonding of the optical compensation layer and the polarizing film is performed using an adhesive. This adhesive is the one forming the second adhesive layer. Next, the optical compensation layer or the protective film which can be provided as the retardation plate of the anti-glare polarizing plate of the present invention, and the liquid crystal cell provided in the liquid crystal display device to which the anti-glare polarizing plate is applied (丨iquid crystal cel i) The relationship between the drive modes. The anti-glare polarizing plate of the present invention can be preferably provided with a phase difference plate or a protective film depending on the driving mode of the liquid crystal cell provided in the liquid crystal display device to which it is applied. The driving mode of the liquid crystal cell includes a Vertical Alignment (VA) mode, an In-Plane Switching (IPS) mode, and a Twisted Nematic (TN) mode. (Vertical alignment mode) Vertical alignment mode In the non-driving state, liquid crystal molecules are vertically aligned with respect to the unit substrate, so light is not passed along with changes in polarization. Therefore, the linear polarizing plates are disposed above and below the liquid crystal cell in such a manner that the polarization axes are orthogonal to each other, whereby an almost complete black display can be obtained when viewed from the front, and high contrast can be obtained. However, in the liquid crystal display device in which the linear polarizing plate is disposed only in the vertical alignment mode of the liquid crystal cell, when viewed from the oblique direction, the axial angle of the disposed linear polarizing plate is deviated from 9 〇 β, and the liquid crystal The rod-like liquid crystal molecules in the unit exhibit birefringence, so the 322869 45 201140127 produces light leakage, which reduces the contrast. In the / vertical alignment: mode liquid crystal display device, in order to eliminate such light leakage, a phase difference plate is disposed between the liquid helium unit and the linear polarizing plate. Vertical alignment, as described above, in the black display state, because the liquid crystal molecules are opposite; the unit substrate is vertically aligned, so the slow axis in the plane of the liquid crystal layer (d〇w ^ ^ (f ast axxs) When the refractive index in the thickness direction of the liquid crystal layer is nz, the liquid helium layer can be regarded as a positive type plate showing a relationship of nx = ny < nz. Therefore, it has been = between the polarizing film and the liquid crystal cell Refraction in the in-plane slow axis direction (1), the refractive index in the fast axis direction of the film is ny, the refractive index in the thickness direction of the film is 瞒, and the positive plate and the display (4) y when the display relationship is arranged. For both the negative c-plates of the relationship of nz, the light leakage can be appropriately removed. In addition, Japanese Laid-Open Patent Publication No. 2007-256766 discloses that the first phase difference plate having a relationship of nx >nygnz has a slow axis ', and the transmission axis of the adjacent polarizing film is nearly parallel or The square wire of almost orthogonal=relational relationship is disposed between the first retardation plate and the unit substrate, or between the other unit substrate and the opposite polarizing film, and has i^ny>gt;n2 The second phase difference plate of the relationship.使用 When the anti-glare polarizing plate of the present month is used in the liquid*, and the display device of the vertical alignment mode, it is preferable to appropriately arrange the polarizing film of the phase difference plate having the above configuration and the anti-glare film. One side is the side of the opposite side. In view of the durability of the production-oriented, anti-glare polarizing plate, etc., when the anti-glare polarizing plate of the present invention is applied to a liquid crystal display device of a vertical alignment mode, the anti-glare polarizing plate of the present invention is preferably In the second adhesive layer to be described later, a first phase difference plate having a relationship of nx > nygnz is laminated on the surface opposite to the side on which the anti-glare film is bonded to the polarizing film. And a second phase difference plate having a relationship of nx_ny > nz is laminated on the first phase difference plate with an adhesive layer or the like interposed therebetween. The first phase difference plate having a relationship can be obtained by subjecting a film made of a transparent resin having a positive refractive index anisotropy to uniaxial or biaxial stretching under appropriate conditions. As the transparent resin having a positive refractive index anisotropy, a cellulose resin represented by cellulose diacetate deuterated cellulose, a cyclic olefin resin, a polycarbonate resin or the like can be used. Here, the cyclic dilute-based resin is a resin having a cyclic olefin such as norbornene or dimethanooctahydronaphthalene as a monomer, and commercially available products include "ARTON" (manufactured by JSR Co., Ltd.) and "ZE0N0R". (made by Japan Zeon Co., Ltd.), "zeonEX" (made by Sakamoto Zeon Co., Ltd.), etc. Among these transparent resins, cellulose triacetate or a cyclic olefin resin can be preferably used because the photoelastic coefficient is small and the in-plane characteristics due to thermal strain under the use conditions are small. A second phase difference plate having a relationship between Πχ and Fly > , can be exemplified by coating a cholesteric liquid crystal on a substrate at a short pitch by coating a disk-shaped liquid crystal on a substrate film. In the film, a layer of an inorganic layered compound such as mica is formed on the substrate film, and the transparent resin film is subjected to biaxial stretching or the unstretched solvent washing mode. A commercially available phase difference plate having a relationship of ηχ and ny>Πζ, for example, "yM Film" (manufactured by Sumitomo Chemical Co., Ltd.) and "Fujitae 322869 47 201140127", due to a value of 0,

Film股份有限公司製)等。此第二相位差板為is^ 此,面内的相位差值R。幾乎為零,故不論具有何種η 亦不須特別規定其慢軸的軸角度。 此外,面内的相位差值b與厚度方向的相位差值 以膜(相位差板)之面内慢軸方向的折射率為n、、 Rth ’ 内快軸方向的折射率為ny、以膜之厚度方向的折之面 nz、以膜的厚度為d時,分別以下列式(a)&(b)所定 R〇=(nx-ny)xd (a)Film Co., Ltd.) and so on. The second phase difference plate is is^, the in-plane phase difference R. It is almost zero, so no matter what kind of η, it is not necessary to specify the axis angle of its slow axis. Further, the phase difference between the in-plane phase difference b and the thickness direction is such that the refractive index in the in-plane slow axis direction of the film (phase difference plate) is n, and the refractive index in the fast axis direction of Rth ' is ny. In the thickness direction, the folded surface nz, when the thickness of the film is d, is determined by the following formula (a) & (b), respectively, R 〇 = (nx - ny) xd (a)

Rth=[ (nx+ny)/2-nz]xd (b) 膜(相位差板)之面内的相位差值Re及厚度方向的相位 差值Rth’例如可在隔介黏著劑層將測定對象膜貼合於玻璃 板之狀態下,使用市售的相位差測定裝置(K0BRA-21ADH(王 子計測機器股份有限公司製等)來直接測定。如此之相位差 測定裝置中,例如藉由採用波長559nm的單色光之旋轉偵 測光子法(rotating analyzer method),測定該膜之面内 的相位差Ro,另一方面,並測定以該膜的面内慢軸作為傾 斜軸而傾斜40度時之相位差值R4Q,並使用所測定之相位 差值R4。、膜的厚度d及膜的平均折射率n〇,來求取nx、ny、 nz’並根據上述式(b)從此等值計算出厚度方向的相位差值 Rth。 (IPS模式) IPS模式,係藉由對單元基板面平行地施加電壓之橫 向電場來改變液晶分子的配向狀態者,在無電壓施加之狀 態下’液晶分子相對於單元基板呈平行地配向。在如此之 48 322869 201140127 I PS模式的液晶顯示I罟 .. 、 裝置中’在夾持液晶單元而僅配設偏 〃之構成中從斜方觀看時’由於所配^之直線偏光板 的軸角度從90偏離、以及液晶單元内的棒狀液晶分子顯 現又折射*,故產生光漏,使對比顯著降低。 d ips模式的液晶顯示裝置中,為了消除如此之光漏, Ί頁在液晶單元與偏光膜之間配設相位差板。為了補償 ips模式的液晶顯示裝置中之視角變化所造成之液晶層的 又折射變化’已知光學上為負的單軸性且其光學軸相對於 膜面呈平行之相位差板、或是配向於厚度方向之相位差板 為有效。 例如’曰本特開平10-54982號公報中,係記載在IPS 模式的液晶顯示裝置中’於液晶單元與至少一方的偏光板 之間’配置有光學上為負的單軸性且其光學軸相對於膜面 呈平行之光學補償膜。 曰本特開平11-133408號公報中,係記載在IPS模式 的液晶顯示裝置中之一對的偏光板之間,更具體而言,在 液晶單元與偏光板之間,配置有正的單軸性且在垂直於單 70基板甸之方向具有光學軸之光學補償層。 曰未特開2005-309110號公報中,係揭示在IPS模式 的液晶颟示裝置中,於液晶單元與上下一對的偏光板之 間’配薏有面内相位差值互為不同之光學補償膜(相位差 板)。 曰本特開2006-235576號公報中,係記載於背面侧偏 光膜與液晶單元之間至少配置1片相位差板,該相位差板 49 322869 201140127 中’包含從背面侧偏光膜的液晶單元侧表面至液晶單元的 背面侧基板表面為止之間所存在之相位差板之雙折射層的 厚度方向的相位差值Rth之和係於_4〇ηιη至+4〇mn之範園, 且此等之面内的相位差值Rq之和係於1〇〇nm至2〇〇nm之範 圍’前面側偏光板為具備偏光膜、以及至少設置在與該浪 晶單兀相對向之侧為相反側的觀看側透明保護層之偏光 板’並採用從偏光膜的液晶單元側表面至液晶單元的前面 侧基板表面為止之間之厚度方向的相位差值^係於_丨〇ηΠ1 至+40nm之範圍之偏光板。 此外’將樹脂膜配向於厚度方向之方法,例如於曰本 特開平7-23_7號公報中,係揭示將具有熱收縮性之勝, 以使《玄熱收縮性膜的熱收縮方向與經單軸拉伸之熱可塑揀 之方式,貼合於經單轴拉伸之 …可塑|±麻臈的至少單面,在進行熱收縮後,將熱收縮 性膜剝離去除之方法。 將本發月之防眩性偏光板使用在IPS模式的液晶顯系 裝置夺車交佳心、以成為上述構成之方式,將保護膜或相位 差板適S地配置在偏光膜之與貼合有防_的—側為相反 •j之側將本發明之防眩性偏光板適用在 ips模式:液晶 顯不裝置時,太-§5^ ηα … 赞月之防眩性偏光板的較佳實施型態的一 ' I下述之構成·隔介後述第2接著劑層,將厚度方向 光膜之盥2入h為、10nm至+40咖的範圍之保護膜積層於偏 光膜之與貼合有防眩膜的—侧為相反側的面。如此 方向的相位差值又 ^為-l〇nm至+4〇nm的範圍之保護膜,可 322869 50 201140127 列舉可容易從市場中取得,實質上無配向且厚度方向的相 位差值Rth為l〇nra以下,更進一步麵5nm以下之環 烴系樹脂膜、三乙酸纖維素等纖維素乙酸醋系樹脂膜等。 再者,三乙酸纖維素等纖維素乙酸酿系樹脂膜的溶劑洗禱 膜,其厚度較薄者,由於厚度方向的相位差值40nm 以下’故亦可使用。 當本發明之防眩性偏光板具備厚度方向的相位差值Rth=[ (nx+ny)/2-nz]xd (b) The phase difference Re in the plane of the film (phase difference plate) and the phase difference Rth' in the thickness direction can be determined, for example, in the interlayer adhesive layer. When the target film is bonded to a glass plate, it is directly measured using a commercially available phase difference measuring device (K0BRA-21ADH (manufactured by Oji Scientific Instruments Co., Ltd.). In such a phase difference measuring device, for example, by using a wavelength Rotating analyzer method of 559 nm monochromatic light, measuring the phase difference Ro in the plane of the film, and measuring the inclination of the in-plane slow axis of the film as the tilt axis by 40 degrees The phase difference R4Q, and using the measured phase difference R4, the thickness d of the film, and the average refractive index n〇 of the film, to obtain nx, ny, nz' and calculate from the equivalent according to the above formula (b) The phase difference Rth in the thickness direction (IPS mode) The IPS mode is a method of changing the alignment state of liquid crystal molecules by applying a transverse electric field of a voltage parallel to the surface of the unit substrate, and the liquid crystal molecules are relatively in a state where no voltage is applied. The unit substrates are aligned in parallel. 48 322869 201140127 I PS mode liquid crystal display I罟.., in the device 'when the liquid crystal cell is clamped and only the configuration is biased from the oblique direction', the axial angle of the linear polarizer is 90 Deviation, and the rod-like liquid crystal molecules in the liquid crystal cell appear and refract*, so that light leakage occurs, and the contrast is remarkably lowered. In the liquid crystal display device of the ips mode, in order to eliminate such light leakage, the page is in the liquid crystal cell and the polarizing film. A phase difference plate is disposed between them. In order to compensate for the change in the viewing angle of the liquid crystal layer caused by the change of the viewing angle in the liquid crystal display device of the ips mode, it is known to be optically negative uniaxial and its optical axis is parallel with respect to the film surface. The phase difference plate or the phase difference plate which is oriented in the thickness direction is effective. For example, in the liquid crystal display device of the IPS mode, the liquid crystal cell and at least one of the polarized light are described in the Japanese Patent Publication No. Hei 10-54982. An optical compensation film having an optically negative uniaxiality and having an optical axis parallel to the film surface is disposed between the plates. In Japanese Laid-Open Patent Publication No. Hei 11-133408, the liquid in the IPS mode is described. Between the polarizing plates of one pair of crystal display devices, more specifically, between the liquid crystal cell and the polarizing plate, positive uniaxiality is arranged and optical compensation is performed in an optical axis perpendicular to the direction of the single 70 substrate In the liquid crystal display device of the IPS mode, the in-plane phase difference values are different between the liquid crystal cell and the pair of upper and lower polarizing plates. In the optical compensation film (phase difference plate), it is described that at least one phase difference plate is disposed between the back side polarizing film and the liquid crystal cell, and the phase difference plate 49 322869 201140127 includes The sum of the phase difference values Rth in the thickness direction of the birefringent layer of the phase difference plate existing between the liquid crystal cell side surface of the back side polarizing film and the back surface side substrate surface of the liquid crystal cell is _4〇ηιη to +4 The range of the phase difference Rq in the plane of the 〇mn is in the range of 1 〇〇 nm to 2 〇〇 nm. The front side polarizing plate is provided with a polarizing film, and at least The opposite side of the single 兀 is the opposite side The phase difference in the thickness direction between the liquid crystal cell side surface of the polarizing film and the front substrate side of the liquid crystal cell is seen in the range of _丨〇ηΠ1 to +40 nm. Polarizer. Further, a method of aligning a resin film in a thickness direction, for example, in Japanese Patent Laid-Open Publication No. Hei 7-23-7, discloses that it has a heat shrinkage property so that the heat shrinkable direction of the heat shrinkable film and the warp order The method of heat-shaping by axial stretching is applied to a method in which a heat-shrinkable film is peeled off after being subjected to heat shrinkage by at least one side of uniaxially stretched. The anti-glare polarizing plate of the present month is used in a liquid crystal display device of the IPS mode to achieve the above-described configuration, and the protective film or the phase difference plate is disposed in the polarizing film and attached thereto. The anti-glare polarizing plate of the present invention is applied to the ips mode when the liquid crystal is not used, and the anti-glare polarizing plate of the moon is better. The configuration of the first embodiment of the present invention is as follows: the second adhesive layer is described later, and the protective film of the thickness direction of the light film is placed in the range of 10 nm to +40 Å, and the protective film is laminated on the polarizing film. The side with the anti-glare film is the opposite side. The phase difference in such a direction is a protective film in the range of -10 〇 nm to +4 〇 nm, which can be easily obtained from the market, and has substantially no alignment and a phase difference Rth of thickness direction is l. In the case of 〇nra or less, a cyclic hydrocarbon resin film of 5 nm or less, a cellulose acetate vinegar resin film such as cellulose triacetate, or the like is further provided. Further, the solvent-washing film of the cellulose acetate-based resin film such as cellulose triacetate may be used because it has a small thickness and a phase difference of 40 nm or less in the thickness direction. When the anti-glare polarizing plate of the present invention has a phase difference in the thickness direction

Rth為-10mn至+4〇nm的範圍之保護膜時,如上述般,較佳 係將從背面侧偏光板之偏光膜的液晶單元侧表面至液晶單 元的月面側基板表面為止之間所存在之雙折射層的厚度方 向的相位差值Rth之和設為_4〇11111至+4〇舰之範圍,且將此 等之面内的相位差值匕之和設為1〇〇咖至2〇〇抓之範圍。 如此之雙折射層,例如可列舉:經單轴拉伸並且亦配向於 厚度方向之熱可塑性樹脂膜;將具有負的折射率異向性之 …、了塱丨生樹月曰膜(聚本乙烯膜等)進行單轴或雙軸拉伸而得 之所謂負型纟板(亦可為雙軸性);將具有負的單軸性且光 予軸位於與膜面平行之方向上之所謂負型A板積層於具 有正的單軸性且光學轴位於膜的法線方向之所謂正型◦板 上而得者等。 (TN模式) TN模式,係藉由對單元基板面垂直地施加電 壓之縱向 電場來改變液晶分子的配向狀態者。TN模式中,液晶分子 從方的單元基板追蹤至另一方的單元基板時,係以使無 電壓施加之狀態下的液晶配向成為在各部分中一邊朝向與 51 322869 201140127 基板平行之面内且一邊於上下基板間產生9〇度扭轉(已扭 轉)之狀態的方式,相對於單元基板呈平行地配向。 以往之TN型液晶顯示裝置中,由於液晶單元内之液 晶物質的預傾(pretilt)所導致之折射率的異向性,而使視 角特性不足。因此,日本特開平6_214116號公報中,係揭 示將顯示負的單軸性^光學轴以相對於膜面成為斜向方向 之方式所配置之光學異向性層,配置在TN型液晶顯示裝置 中之液晶單^與偏光板之間。此外,日本特開平1〇_186356 號公報中,係揭㈣顯示正的單軸性之液晶性高分子以液 晶狀態所形成之向列混合配向予關定化之光學補償膜, 並揭示將該光學補伽適用在則液晶顯示裝置,以期 2角的擴大。如此由使用光學轴相對於膜面為斜向 向之光學異向性層作為光學補償膜(相位差板), TN型液晶顯示裝置的視角。 又When the Rth is a protective film in the range of -10 mn to +4 〇 nm, as described above, it is preferable to pass between the liquid crystal cell side surface of the polarizing film of the back side polarizing plate and the surface of the liquid crystal cell. The sum of the phase difference values Rth in the thickness direction of the existing birefringent layer is set to the range of _4〇11111 to +4 〇, and the sum of the phase difference 匕 in these planes is set to 1 至 to 2 〇〇 之 。. Such a birefringent layer may, for example, be a thermoplastic resin film which is uniaxially stretched and also oriented in the thickness direction; and has a negative refractive index anisotropy... a so-called negative-type slab (which may also be biaxial) obtained by uniaxial or biaxial stretching; a so-called negative uniaxiality and a so-called optical axis in a direction parallel to the film surface The negative type A plate is laminated on a so-called positive type plate having a positive uniaxiality and an optical axis located in the normal direction of the film. (TN mode) The TN mode is a method of changing the alignment state of liquid crystal molecules by applying a longitudinal electric field of a voltage perpendicularly to the surface of the unit substrate. In the TN mode, when the liquid crystal molecules are traced from the unit cell substrate to the other unit substrate, the liquid crystal alignment in a state where no voltage is applied is in a plane parallel to the 51 322 869 201140127 substrate in each portion. A state in which a state of twisting (twisted) of 9 turns is generated between the upper and lower substrates is aligned in parallel with respect to the unit substrate. In the conventional TN type liquid crystal display device, the viewing angle characteristics are insufficient due to the anisotropy of the refractive index due to the pretilt of the liquid crystal material in the liquid crystal cell. Japanese Patent Publication No. 6-214116 discloses an optical anisotropic layer which is disposed such that a negative uniaxial optical axis is obliquely oriented with respect to a film surface, and is disposed in a TN liquid crystal display device. The liquid crystal is between the single polarizer and the polarizing plate. Further, in Japanese Laid-Open Patent Publication No. Hei No. Hei. No. 186-356, the optical compensation film which exhibits a positive uniaxial liquid crystalline polymer in a liquid crystal state is prepared by a nematic hybrid alignment, and it is disclosed. The optical supplemental gamma is applied to the liquid crystal display device in order to expand the two angles. Thus, the optical anisotropic layer which is oblique with respect to the film surface using the optical axis is used as an optical compensation film (phase difference plate), and the viewing angle of the TN liquid crystal display device. also

=本發明之防眩性偏光板使用在心模式的液晶顯 :、,較佳係將上述光學補償膜(相位差板)適當地画 日偏光膜之與貼合有防眩膜的—側為相反側之側。將^ 『之防眩性偏光板適用在TN模式的液晶顯示裝置時, :之防眩性偏光板的較佳實施型態的-例為如下述之海 貼.隔介後述第2接著㈣,將保護_層於偏光膜^ 合有防眩膜的-側為相反側的面,並將作為相位差本 =光學異向性層積層於絲護膜上。保制與相位j ^貼合’較佳係使用丙騎系黏著劑等黏著劑來進行。 學異向性層料直接制Μ光膜上。絲異向,M 322869 52 201140127 佳疋光學上為負的單軸性且其光學軸從膜的法線方向傾斜 5至5(Γ之光學異向性層’以及光學上為正的單軸性且其光 學軸從膜的法線方向傾斜5至5Qe之光學異向性層。 光學上為負的單軸性且其光學減_法線方向傾 斜5至50。之光學異向性層,例如為日本特開平6_214116 说A報中所δ己载般’較佳為使用:將有機化合物,其中尤 以顯示液晶性且具有圓盤狀分子結構之化合物、或是雖未 顯不液晶性但藉由電場或磁場而顯現負的折射率異向性之 化合物’塗佈在由三乙酸纖維素等所構成之透明基材膜 上,並以使光學軸從膜的法線方向傾斜5至5〇。間之方式 所配向之膜等。配向不僅為單向,亦可為例如斜率從膜的 一面朝另一面逐漸增大之所謂的混合配向。 顯示液晶性且具有圓盤狀分子結構之有機化合物,可 例示如:於低分子或高分子的盤形液晶,例如於具有聯伸 三笨(triphenylene)、三茚并苯(truxene)、苯等平面結構 之母核,輻射狀地鍵結有烷基、烷氧基、經烷基取代之苯 甲醯氧基、經烷氧基取代之笨曱醯氧基等直鏈狀的取代基 者。當中,較佳為在可見光區域中不顯現吸收者。 具有圓盤狀分子結構之有機化合物,並不限於僅使用 1種,為了獲得期望的配向,可因應需要使用複數種,或 是與高分子基質等其他有機化合物混合使用。混合使用之 有機化合物,只要是與具有圓盤狀分子結構之有機化合物 具相溶性,或是可將具有圓盤狀分子結構之有機化合物分 散為不使光產生散射之程度的粒徑者,則無特別限定。在 53 322869 201140127 由纖維素系樹脂所構成之透明基材膜設置有由該液晶性化 合物所構成之層,並且光學軸相對於膜的法線方向呈傾斜 之膜’較佳例如可使用「WV Film」(Fuji Film股份有限 公司製)。 此外’光學上為正的單軸性且其光學軸從膜的法線方 向傾斜5至50。之光學異向性層,例如為日本特開平 10-186356號公報中所記載般,可列舉:將具有細長棒狀 結構之有機化合物,其中尤以顯示向列液晶性且具有賦予 正的光學異向性之分子結構之化合物、或是雖未顯示液晶 性但藉由電場或磁場而顯現出正的折射率異向性之化合 物,成膜於由二乙酸纖維素等所構成之透明基材獏上,並 以使光學轴從膜的法線方向傾斜5至5〇。間之方式所配向 之膜等。配向不僅為單向,亦可為例如斜率從膜的一面朝 另一面逐漸增大之所謂的混合配向。在透明基材膜設置由 向列液晶化合物所構成之層,且光學軸相對於膜的法線方 向呈傾斜之膜,較佳例如可使用「NH Film」(新日本石油 股份有限公司製)。 ; 此外,藉由將能夠以真空蒸鍍形成薄膜並且在進行蒸 鑛時可顯現出正的折射率異向性之電介質’從相對於其法、 線呈:斜之方向蒸鍍於透明基材膜上’亦可製得光學:為 正的單轴性且其光學軸從朗法線方向傾斜5至50。之光 學異二層:用於此之電介質’可為由無機化合物所構成 之電”質或是由有機化合物所構成之電介質的任一種,但 就相對於真空蒸鍍時的熱之安定性的觀點來看,較佳為使 322869 54 201140127 用無機電介質。無機電介質,就透明性佳等觀點來看,較 佳為使用氧化钽(TaA5)、氧化鎢(W〇3)、二氧化石夕(Si〇2)、 一氧化矽(SiO)、氧化鉍(BhOs)、氧化鈥(此必)等金屬氧 化物。金屬氧化物中’尤佳為使用氧化鈕、氧化鎢、氧化 鉍等容易顯現折射率異向性且膜質硬者。 當使用將顯現折射率異向性之電介質的層積層於此 等透明基材膜上而成之光學異向性層時,該光學異向性層, 係以使其透明基材膜側與偏光膜或貼合於該偏光膜之保, 膜呈相對向之方式’積層於偏光膜或保護膜上。 此外,TN模式中,為了更進一步提升視角特性及高裒吊 特性,較佳係亦將光學異向性層配置在夾持液晶單元而戍 對之背面側偏光板,設置在背面側偏光板之光學異向性 層,如先前所說明般,較佳係使用光學上為負的單轴性足 其光學軸從膜的法線方向傾斜5至5{Γ之光學異向性層。 [5]接著劑層 本發明中,如第1圖所示,防眩膜i係隔介第i雉瞽 劑層103a而積層於偏光膜1〇4之一面。此外,在積層保* 膜或光學補償層105時,此等係隔介第2接著劑層1〇3b5 而積層於偏光膜104之另一面。 η本發明中,形成第1接著劑層之接著劑,係採用含 環氧系樹脂(較佳為含有環氧系樹脂作為主成分)之硬化性 組成物。藉由使用該硬化性組成物,可提升所得之防咳技 偏光板的耐水性,並且在防眩膜與偏光膜之間得到高接著 強度因而可提升防眩性偏光板的耐久性。形成第2 322869 55 201140127 劑層之接著劑,可與形成第1接著劑層之接著劑為同種類 或不同種類,就接著性與财久性之觀點來看,較佳鱼第^ 接著劑層相同地’以採用含有環氧系樹脂(較佳為含有環氣 系,”主成分)之硬化性組成物為佳。在此,_胃_ =樹月日’疋彳日分子巾具有平均2個以上㈣氧基並藉由反 ^而硬化之化合物,除了聚合物之外,亦包含低聚物及單 體。 使用由上述硬化性組成物所構成之接著劑所進行之 防眩膜與偏光膜之接著、偏光膜與保護膜或光學補償層之 =,係可藉由對介置於所貼合的_之該接著劑的塗佈 層照射活性能量線或進行加熱,而使接著劑中所含有之硬 化性環氧系樹脂硬化來進行。依據該活性能量線或加熱所 進行之環氧系樹脂的硬化,較佳為藉由陽離子聚人來進 活性能量線’為包含可見光、紫外線、χ射線、 電子束專之概念。 就耐候性、折射率、陽離子聚合性等觀點來看,作為 接著劑的硬化性組成物中所含有之環氧系樹脂,可例示如 氯化環氧樹脂、脂環式環氧樹脂、脂肪族環氧樹脂等。 氫化環氧化合物,可藉由在觸媒的存在下、加壓下,The anti-glare polarizing plate of the present invention uses a liquid crystal display in a core mode. Preferably, the optical compensation film (phase difference plate) is appropriately formed on the side of the polarizing film and the side on which the anti-glare film is attached. Side of the side. When the anti-glare polarizing plate is applied to a liquid crystal display device of the TN mode, a preferred embodiment of the anti-glare polarizing plate is an example of a seaweed as described below. The second and subsequent (four) are described later. The protective layer is placed on the side opposite to the side on which the anti-glare film is bonded to the polarizing film, and is laminated on the silk film as a phase difference ratio optical anisotropic layer. The bonding and the phase j bonding are preferably carried out using an adhesive such as a C-based adhesive. The anisotropic layer is directly formed on the film. Silk anisotropy, M 322869 52 201140127 Jiaxie is optically negative uniaxial and its optical axis is inclined 5 to 5 from the normal direction of the film (an optically anisotropic layer of Γ and optically positive uniaxiality) And an optical anisotropic layer whose optical axis is inclined from the normal direction of the film by 5 to 5 Qe. Optically negative uniaxial and optically minus _ normal direction inclined by 5 to 50. Optical anisotropic layer, for example For the Japanese Patent Application No. 6_214116, it is said that the δ has been used in the A report. It is preferable to use an organic compound, in which a compound exhibiting liquid crystallinity and having a discotic molecular structure, or a liquid crystal having no liquidity is used. A compound which exhibits a negative refractive index anisotropy by an electric field or a magnetic field is coated on a transparent substrate film composed of cellulose triacetate or the like, and the optical axis is inclined from the normal direction of the film by 5 to 5 〇. The film is aligned, etc. The alignment is not only unidirectional, but also a so-called mixed alignment in which the slope gradually increases from one side of the film to the other. The liquid crystal is displayed and has a disc-shaped molecular structure. The compound can be exemplified by a disk of low molecular weight or high molecular weight. Liquid crystal, for example, a mother core having a planar structure such as triphenylene, trixene, or benzene, which is radially bonded with an alkyl group, an alkoxy group, and an alkyl substituted benzamidine oxygen. A linear substituent such as a benzyloxy group substituted with an alkoxy group. Among them, it is preferred that no absorption occurs in the visible light region. The organic compound having a discotic molecular structure is not limited to only In order to obtain a desired alignment, a plurality of species may be used as needed, or may be mixed with other organic compounds such as a polymer matrix. The organic compound to be used in combination with an organic compound having a disc-shaped molecular structure may be used. The solubility is not particularly limited as long as the organic compound having a discotic molecular structure is dispersed to a degree that does not scatter light. 53 322 869 201140127 Transparent base film composed of cellulose resin A film having a layer composed of the liquid crystalline compound and having an optical axis inclined with respect to a normal direction of the film is preferably used. For example, "WV Film" (Fuji Film Unit) can be used. The optically anisotropic layer which is optically positive uniaxial and whose optical axis is inclined from the normal direction of the film by 5 to 50. For example, it is described in Japanese Laid-Open Patent Publication No. Hei 10-186356. In general, an organic compound having an elongated rod-like structure, particularly a compound exhibiting nematic liquid crystallinity and having a molecular structure imparting positive optical anisotropy, or a liquid crystal having no electric field or A compound which exhibits a positive refractive index anisotropy by a magnetic field is formed on a transparent substrate made of cellulose diacetate or the like, and the optical axis is inclined from the normal direction of the film by 5 to 5 Å. The alignment or the like is such that the alignment is not only unidirectional, but also a so-called mixing alignment in which the slope gradually increases from one surface of the film toward the other surface. In the transparent substrate film, a layer made of a nematic liquid crystal compound and having an optical axis inclined with respect to the normal direction of the film is preferably used. For example, "NH Film" (manufactured by Nippon Oil & Steel Co., Ltd.) can be used. In addition, a dielectric "capable of forming a thin film by vacuum evaporation and exhibiting positive refractive index anisotropy when performing vapor deposition" is vapor-deposited on a transparent substrate in a direction oblique to the direction of the method. Optical on the film can also be made optical: positive uniaxial and its optical axis is inclined from 5 to 50 from the direction of the Langfa line. Optical two-layer: The dielectric used herein may be any of an electric substance composed of an inorganic compound or a dielectric composed of an organic compound, but with respect to heat stability during vacuum evaporation. In view of the above, it is preferable to use an inorganic dielectric for 322869 54 201140127. In terms of transparency, etc., it is preferable to use yttrium oxide (TaA5), tungsten oxide (W〇3), and sulphur dioxide (in terms of transparency). Si〇2), metal oxides such as cerium oxide (SiO), cerium oxide (BhOs), cerium oxide (this must). In metal oxides, it is preferable to use an oxidation button, tungsten oxide, cerium oxide, etc. When the rate is anisotropic and the film is hard. When an optically anisotropic layer is formed by laminating a dielectric layer of a dielectric material exhibiting refractive index anisotropy on the transparent substrate film, the optical anisotropic layer is The transparent substrate film side is bonded to the polarizing film or bonded to the polarizing film, and the film is laminated on the polarizing film or the protective film in a relative manner. In addition, in the TN mode, in order to further improve the viewing angle characteristics and height Hanging characteristics, better The anisotropic layer is disposed on the back side polarizing plate sandwiching the liquid crystal cell and disposed on the optical anisotropic layer of the back side polarizing plate. As described above, it is preferable to use an optically negative single axis. The optical axis of the foot is inclined from the normal direction of the film by 5 to 5 {an optical anisotropic layer. [5] Adhesive layer In the present invention, as shown in Fig. 1, the anti-glare film i is interposed. The buffer layer 103a is laminated on one surface of the polarizing film 1〇4. Further, when the film is laminated or the optical compensation layer 105, these are laminated on the polarizing film 104 via the second adhesive layer 1〇3b5. In the present invention, the adhesive for forming the first adhesive layer is a curable composition containing an epoxy resin (preferably containing an epoxy resin as a main component). The composition can improve the water resistance of the obtained anti-claw polarizing plate, and obtain high adhesion strength between the anti-glare film and the polarizing film, thereby improving the durability of the anti-glare polarizing plate. Forming the second layer 322869 55 201140127 The adhesive may be of the same kind or different from the adhesive forming the first adhesive layer From the viewpoint of adhesion and longevity, it is preferable that the preferred layer of the fish is the same as the hardenable composition containing an epoxy resin (preferably containing a ring gas system, the main component). It is better. Here, the compound of the molecular napkin having an average of two or more (tetra)oxy groups and hardened by the anti-molecule, in addition to the polymer, also contains an oligomer and a monomer. The anti-glare film and the polarizing film, the polarizing film and the protective film or the optical compensation layer, which are formed by using the adhesive composition composed of the above-mentioned curable composition, can be interposed by the bonding The coating layer of the adhesive is irradiated with an active energy ray or heated to cure the curable epoxy resin contained in the adhesive. According to the active energy ray or the curing of the epoxy resin by heating, it is preferable that the active energy ray by the cation aggregation is a concept including visible light, ultraviolet ray, xenon ray, and electron beam. The epoxy resin contained in the curable composition as an adhesive agent may, for example, be a chlorinated epoxy resin, an alicyclic epoxy resin, or an aliphatic group, from the viewpoints of weather resistance, refractive index, and cationic polymerizability. Epoxy resin, etc. Hydrogenated epoxy compound by pressurization in the presence of a catalyst

對芳香族環氧樹脂的原料之芳香族多經基化合物選擇性地 進行核氫化反應,其次,進行縮水甘油峻化而製得。芳香 族環氧樹脂,可舉例如··雙酴Α的二縮水甘㈣、雙紛F 的二縮水甘油峻、及雙齡S的二输★4 ,丄 又 w財甘蝴等雙紛型環氧 樹脂;盼祕(Phenol _lac)環氧樹脂、甲龄祕環氧 322869 56 201140127 樹脂、及經基苯甲騎盼 四經基苯基甲_縮水甘、、_氧_日4祕魏氧樹脂; 油醚、及裱氧化聚乙烯酚等 縮夂甘 此專方香叫_脂的原料之例如雙賴 〆 化合物施以上述核氫化反應, · ^ 矢夕羥基 則得到氫化環氧樹脂。當‘::人:使純醇進行反應, 之雙盼A的縮水甘⑽。’ 11化環氧樹純佳為經氫化 所謂脂環式環氧樹脂, 鍵結於脂環式環的環氧基之p日77 U 1個以上之 式環的環氧基」係意指下^^脂。所謂「鍵結於月旨環 子'下列式中,構造叫^ (CH2)r 去除上述式的(CH2)m中之〗 ^ ^ T 但並不限定於此等化合物。 、^ (3)下列式(I)所示之環 : 长已烷羧酸環氧環己基, 之基與其他化學結構鍵結之彳4複數個氫原子的形式 脂。(叫中之丨個或複數^ ’可成為脂環式壤氣择 乙基等直鏈狀烧基所取代。適當地經甲基或 雙環己燒環(上述式中m=3者^衣乳树月旨中’具有環氧 中m=4者)之環氧樹脂,由 ^氧雙環庚燒環(上述式 用。以下係、具體例示本發^ 異之接著性,而適宜儀 樹脂,但並不限定於此等化合I當地使用之脂環式 酯類 322869 (I) 201140127The aromatic polybasic compound of the raw material of the aromatic epoxy resin is selectively subjected to a nuclear hydrogenation reaction, and secondly, glycidol is gradually formed. The aromatic epoxy resin may, for example, be a bismuth sulphate (four) of a double scorpion, a diglycidyl sulphate of a double spleen F, and a second loser of a double age S. Oxygen resin; Phenol _lac epoxy resin, enamel epoxy 322869 56 201140127 resin, and base benzophenone cycline phenyl group _ glycidyl, _ oxygen _ day 4 secret Wei oxygen resin Oil ether, bismuth oxidized polyvinyl phenol, etc., such as a double lysine compound, which is a raw material of the scent, is subjected to the above-mentioned nuclear hydrogenation reaction, and the hydrogenated epoxy resin is obtained. When ‘:: people: make the pure alcohol react, and the double shrinking A is shrinking (10). '11-epoxy tree is purely hydrogenated so-called alicyclic epoxy resin, which is bonded to the epoxy group of the alicyclic ring, p-77 U 1 or more of the ring epoxy group" means ^^脂. In the following formula of "bonding to the moon ring", the structure is called ^ (CH2)r to remove the ^ ^ T in the (CH2) m of the above formula, but is not limited to such compounds. ^, (3) a ring of the formula (I): a long-alkane carboxylic acid epoxidized cyclohexyl group, the group of which is bonded to other chemical structures in the form of a enthalpy of a plurality of hydrogen atoms (in the middle or plural ^ ' can become The alicyclic type of soil is replaced by a linear alkyl group such as an ethyl group, and is suitably subjected to a methyl or bicyclohexyl ring (in the above formula, m = 3, ^ 乳乳树中中' has an epoxy m=4 The epoxy resin of the epoxy resin is used in the above formula. The following is a specific example of the adhesiveness of the present invention, and is suitable for the resin, but is not limited to the fat used in the chemical I. Cyclic esters 322869 (I) 201140127

(式中,R1及R2互為獨立地表示氣原子或碳數1至5 的直鏈狀烷基)。 (b)下列式CIU所不之院二醇的環氧環己烧叛酸醋 類:(wherein R1 and R2 each independently represent a gas atom or a linear alkyl group having 1 to 5 carbon atoms). (b) Epoxy ring-burning vinegar of the diol of the following formula:

A C-0—(CH2)n-〇-C R3 cp〇 R4 (Π) (式中,R及R互為獨立地表示氫原子或碳數丄至5 的直鏈狀烧基’ η表示2至20的整數)。 (c)下列式(III)所示之二羧酸的環氧環己基曱酯類: 0 R5 CH2-〇-&-(CH2) pA C-0—(CH 2 ) n—〇—C R 3 cp 〇 R 4 (Π) (wherein R and R each independently represent a hydrogen atom or a linear alkyl group having a carbon number of 丄 to 5 ′ represents 2 An integer of up to 20.) (c) Epoxycyclohexyl decyl esters of dicarboxylic acids represented by the following formula (III): 0 R5 CH2-〇-&-(CH2) p

RR

(m) (式中,R5及R6互為獨立地表示氬原子或碳數i至5 的直鏈狀烧基,P表示2至20的整數)。 ⑷下列式(IV)所示之聚乙二醇的環氣環己基甲醚 322869 58 201140127 CH2—(0C2H4)q-0-CH2 R7 R8(m) (wherein R5 and R6 each independently represent an argon atom or a linear alkyl group having a carbon number of i to 5, and P represents an integer of 2 to 20). (4) Cyclohexane-methyl ether of polyethylene glycol represented by the following formula (IV) 322869 58 201140127 CH2—(0C2H4)q-0-CH2 R7 R8

Ο (17) (式中,R7及R8互為獨立地表示氫原子或碳數1至5 的直鏈狀烷基,q表示2至10的整數)。 (e)下列式(V)所示之烷二醇的環氧環己基甲醚類: ,CH2-0—(CH2)r—〇-CH2, R9 (V) R1 (式中,R9及R1()互為獨立地表示氫原子或碳數1至5 的直鏈狀烷基,r表示2至20的整數)。 (f)下列式(VI)所示之二環氧三螺化合物: R11 (VI) (式中,R11及R12互為獨立地表示氫原子或碳數1至5 的直鏈狀烧基)。 (g)下列式(VII)所示之二環氧單螺化合物: R13 (VII) (式中,R13及R14互為獨立地表示氫原子或碳數1至5 的直鏈狀炫基)。 (h)下列式(VIII)所示之乙烯基環己烯二環氧化物類·· 59 322869 201140127(17) (wherein R7 and R8 each independently represent a hydrogen atom or a linear alkyl group having 1 to 5 carbon atoms, and q represents an integer of 2 to 10). (e) Epoxycyclohexyl methyl ethers of alkanediols represented by the following formula (V): , CH2-0-(CH2)r-〇-CH2, R9 (V) R1 (wherein R9 and R1 ( And independently represent a hydrogen atom or a linear alkyl group having 1 to 5 carbon atoms, and r represents an integer of 2 to 20. (f) a diepoxide trispirate compound represented by the following formula (VI): R11 (VI) (wherein R11 and R12 each independently represent a hydrogen atom or a linear alkyl group having 1 to 5 carbon atoms). (g) a diepoxymonosole compound represented by the following formula (VII): R13 (VII) (wherein R13 and R14 each independently represent a hydrogen atom or a linear thio group having 1 to 5 carbon atoms). (h) Vinylcyclohexene diepoxides of the following formula (VIII) · 59 322869 201140127

(珊) (式中’ R15表示氫原子或碳數i至5的直鏈狀烷基) (i)下列式(IX)所示之烷二醇的環氧環戊醚類:(In the formula, R15 represents a hydrogen atom or a linear alkyl group having a carbon number of i to 5) (i) an epoxycyclopentene ether of an alkanediol represented by the following formula (IX):

R16 r17 (K) (式中,R及R互為獨立地表示氫原子或碳數1至5 的直鏈狀烷基)。 (j)下列式(X)所示之二環氧三環癸烧類··R16 r17 (K) (wherein R and R each independently represent a hydrogen atom or a linear alkyl group having 1 to 5 carbon atoms). (j) Diepoxy tricyclic terbene shown in the following formula (X)··

R18R18

•Q (X) (式中,R表不氫原子或碳數1至5的直鏈狀烷基)。 上述所例示之脂環式環氧樹脂中,就較容易取得等之 理由來看旨環式環輸脂更適宜使用。 (A) 7_氧雜雙環[4.丨.〇]庚烷-3-羧酸與(7-氧雜雙環 [4. 1.0]庚-3〜基)甲醇之酯化物[式(1)中,Rl=R2=H之化合 物], (B) 4曱基-7-氧雜雙環[4. l 〇]庚烷_3一羧酸與(4_曱 基-7-氧雜雙環[4.1〇]庚_3—基)甲醇之酯化物[式(1)中, Rl=4_CH3、R2=4-CH3之化合物], (C) 7氧雜雙環[4· 1· 0]庚烷-3-羧酸與1,2-乙二醇之 60 322869 201140127 酯化物[式(II)中,R3=R4=H、n=2之化合物], (D) (7-氧雜雙環[4. 1. 〇]庚-3-基)甲醇與己二酸之西旨 化物[式(III)中,R5=R6=H、p=4之化合物], (E) (4-甲基-7-氧雜雙環[4. 1. 〇]庚-3-基)甲醇與己 二酸之酯化物[式(III)中,R5=4-CH3、R6=4-CH3、p=4 之化 合物], (F) (7-氧雜雙環[4. 1.〇]庚-3-基)甲醇與1,2-乙二醇 之醚化物[式(V)中,R9=f=H、r=2之化合物]。 此外,脂肪族環氧樹脂,可舉例如脂肪族多元醇或其 環氧烧(alkylene oxide)加成物的多縮水甘油醚。具赠而 言’可舉例如:1,4-丁二醇的二縮水甘油醚;1,計己二醉 的二縮水甘油喊;甘油的三縮水甘油趟;三經曱基丙炫的 二縮水甘油醚;聚乙二醇的二縮水甘油醚;丙二醇的二縮 水甘油醚;以及將1種或2種以上的環氧烷(環氧乙烷 (ethylene oxide)、環氧丙烧(pr〇pyiene oxide)等)力口成 於乙二醇、丙二醇及甘油等脂肪族多元醇而藉此製得之聚 趟多元醇的多縮水甘油醚等。 上述所例示之環氧樹脂可僅單獨使用1種或是併用2 種以上。 環氧樹脂的環氧當量通常為30至3000g/當量,軾理 想為50至1500g/當量的範圍。當環氧當量低於3〇g/當量 時,硬化後之防眩性偏光板的可撓性可能會降低,或是接 •者強度降低。另一方面,當環氧當量超過3〇〇〇g/當量時, 與接著劑中所含有之其他成分的相溶性可能會降低。 322869 61 201140127 就反應性之觀點來看,較佳係使用陽離子聚合作為環 氧系樹脂的硬化反應。因此,作為接著剩的硬化性組成物, 較佳為含有陽離子聚合起始齊,卜陽離子聚合起始劑係藉由 可見先、紫外線、X射線、電子束等活性能量線的照射或 加熱’產生陽離子物種或路易斯酸,而使環氧基的聚合反 應開始進打。不論是何種型式的陽離子聚合起始劑,只要 是可賦予隱性者’就作紐的觀點來看即為較佳。以下, 量線_射產生陽離子物種或路易斯酸而使 二 =反應開始進行之陽離子聚合起始劑,稱為「光 將藉由熱產生陽離子物種或路易斯酸 來進行接二 =由活性能量線的照射 少需考晋係因可在常溫下硬化,並減 性,並且^ 的賴性或膨脹所導致之應變的必要 光膜予以接著,故較為有利。此員層)與偏 始劑是藉由光;光陽離子聚合起 脂,保存安定性和作業性亦為優良。光陽2;於=氧系樹 鹽;,及鐵-丙二烯錯合物等。 h香族錡鹽等鏽 i香族重氮鹽,例如可 A + 氣餐笨重氮鹽、六氣爾笨重氮鹽等氣料本重氮鹽、六 方香族鑷鹽’例如可列舉出四(五氟苯基)顯二苯基 322869 62 201140127 =、六氟魏二苯顏、六氟騎二苯絲、讀鱗酸二 (4-壬基笨基)鎭等。 众=香族鎳鹽,例如可列舉出六氟磷酸三笨基錡、六氟 ,酸三笨基疏、四(五氟苯基)養三苯基疏、4 4,_雙(二 笨基表1_基)二苯基硫醚雙六氟構酸鹽、4, 4,〜雙[二(沒一羥 氧基)笨基疏基]二苯基硫醚雙六氟録酸鹽、4, 4, 一^ L—d絲乙氧基)苯基疏基]二苯基硫謎雙六氟碟酸 =7一-[一(對甲苯基)銃基]_2_異丙基嘆吨嗣六敦録酸鹽、 一(對甲苯基)銃基]-2-異丙基噻吨酮四(五氣 二4 (對二級了鮮基縣)_4,_二苯祕基_二苯基硫越 六鼠銻酸鹽、4-(對三級丁基苯基羰基)-4,-二(對甲苯基) 錡基~二苯基硫醚四(五氟苯基)硼酸鹽等。 此外,鐵-丙一細錯合物,例如可列舉二曱笨—環戊一 烯基鐵(II)六氟銻酸鹽、異丙苯-環戊二烯基鐵(π)六氟磷 酉夂鹽、二甲苯一環戊二烯基鐵(Π)-三(三氟甲基磺醯基)曱 基化物。 此等光陽離子聚合起始劑.,可單獨使用或混合2種以 上使用。此等中,尤其是芳香族疏鹽,係因即使在 以上的波長區域中亦具有紫外線吸收特性,故可賦予硬化 性佳且具有良好的機械強度及接著強度之硬化物,所以係 適宜使用。 此等光陽離子聚合起始劑可容易從市售品中取得,例 如了刀別以商品名稱列舉如「Kayarad PCI-220」及 63 322869 201140127 「Kayarad PCI-620」(以上為日本化藥股份有限公司製)、 「UVI-6990」(Union Carbide 公司製)、「Adeka Optomer SP-150」及「Adeka0ptomerSP-170」(以上為 ADEKA 股份 有限公司製)、「CI-5102」、「CIT-1370」、「CIT-1682」、 「CIP-1866S」、「CIP-2048S」及「CIP-2064S」(以上為日 本曹達股份有限公司製)、「DPI-101」、「DPI-102」、 「DPI-103」、「DPI-105」、「MPI-103」、「MPI-105」、 「BBI-101」、「BBI-102」、「BBI-103」、「BBI-105」、 「TPS-101」、「TPS-102」、「TPS-103」、「TPS-105」、 「MDS-103」、「MDS-105」、「DTS-102」及「DTS-103」(以上 為Midori化學股份有限公司製)、「P卜2〇74」(Rh〇dia公 司製)等。 光陽離子聚合起始劑的調配量,相對於環氧樹脂1〇〇 重量份,一般為0.5至20重量份,較理想為1重量份以上, 此外,較理想為15重量份以下。當光陽離子聚合起始劑的 調配量相對於環氧樹脂100重量份低於0.5重.量份時,硬 化不足,而有硬化物的機械強度和接著強度降低之傾向。 此外,當光陽離子聚合起始劑的調配量相對於環氧樹脂 100重置份超過2〇重量份時,由於硬化物中的離子物質增 加使更化.物的吸濕性提高,可能會導致耐久性能的降低。 f用光%離子聚合起始劑時,硬化性組成物可因應必 要:復含有光增感劑。藉由使用光增感劑,可提升陽離子 聚合的反應性,而提升硬化物的機械強度和接著強度。光 增感射舉例如幾基化合物、有機硫化合物、過硫化物、 64 322869 201140127 氧化還原系化合物、偶氮及重氣化合物、鹵化物及光還原 性色素等。 光增感劑的具體例,可列舉:安息香曱醚、安息香異 丙醚及α,α -二曱氧基-α-笨基笨乙酮等安息香衍生物; 二苯基酮、2, 4-二氯二苯基i同、鄰苯甲醯基苯甲酸曱酯, 4, 4’ -雙(二曱基胺基)二苯基嗣及4, 4’-雙(二乙基胺基) 二苯基酮等二苯基酮衍生物;2-氣噻吨酮及2-異丙基嘆吨 酮等噻吨酮(thioxanthone)衍生物;2-氯蒽醌及2-曱基;g、 醌等蒽醌衍生物;N-甲基吖啶酮及N_丁基吖啶酮等吖咬鋼 (acridone)衍生物;其他例如〇:,α-二乙氧基苯乙酮、二 苯乙二酮(benzil)、苐酮、氧雜蒽酮(xanth〇ne)、雙氧鈾 化合物(uranyl compound)、鹵化物等。此等光增感劑可單 獨使用或混合2種以上使用。於硬化性組成物丨〇〇重量份 中,較佳係在0. 1至20重量份之範圍内含有光增感劑。 另一方面,熱陽離子聚合起始劑可列舉:苯甲基鍍鹽、 噻吩鑌鹽(thiophenium salt)、四氫噻吩鏽鹽(thiolanium salt)、苯甲基銨鹽、吡啶鏘鹽、聯胺鹽(hydrazinium salt)、羧酸酯、磺酸酯及胺醯亞胺等。此等熱陽離子聚合 起始劑可容易從市售品中取得,例如可分別以商品名稱列 舉如「Adeka Opton CP77」及「Adeka Opton CP66」(以上 為ADEKA股份有限公司製)、rCI_2639」及「CI_2624」(以 上為日本曹達股份有限公司製)、rSan_Aid SI_6〇L」、 「San-Aid SI-80L」及「San-Aid SI-100L」(以上為三新 化學工業股份有限公司製)等。 65 322869 201140127 接著劑所含有之環氧系樹脂,可 熱陽離子聚合中的任-種進行硬化,“合或 合及熱陽離子聚合兩者來進行硬化。為後4 =: 用光陽離子聚合起始劑與熱陽離子聚合起始劑。.、、、 此外’作為接著劑的硬化性組成物,可復含有氧 丁烷(oxetane)類或多元醇類等促進陽離子聚合之化合 氧雜環丁烧類為於分子内具有4員環喊之化合物,例 如可列舉:3-乙基-3,基甲基氧雜環了院、丨卜雙办 乙基-3-氧雜環丁基)甲氧基甲基]苯、3_乙基_3_(笨氧義甲 基)氧雜環丁院、二[(3-乙基_3_氧雜環丁基)甲基]喊^一 乙基-3-(2-乙基己氧基甲基)氧雜環丁烷、酚酚醛氧雜環丁 烷等。此等氧雜環丁烷類可容易從市售品中取得,例如可 分別以商品名稱列舉如r Ar〇ne 〇xetane 〇χτ_丨〇丨」、「 Oxetane 〇n-121」、「Arone 0xetane 0XT_2ii」、「Ar〇ne• Q (X) (wherein R represents no hydrogen atom or a linear alkyl group having 1 to 5 carbon atoms). Among the alicyclic epoxy resins exemplified above, it is more preferable to use the ring-type cyclic fat transfer for the reason that it is easier to obtain. (A) an ester of 7-oxabicyclo[4.丨.〇]heptane-3-carboxylic acid with (7-oxabicyclo[4.1.0]heptan-3-yl)methanol [Formula (1) , Rl=R2=H compound], (B) 4-mercapto-7-oxabicyclo[4.l 〇]heptane_3 monocarboxylic acid and (4-fluorenyl-7-oxabicyclo[4.1〇 Glycol-3-()-esterification of methanol [in the formula (1), Rl=4_CH3, R2=4-CH3 compound], (C) 7-oxabicyclo[4·1·0]heptane-3- 60 322869 201140127 ester of carboxylic acid and 1,2-ethanediol [Compound in formula (II), R3=R4=H, n=2], (D) (7-oxabicyclo[4. 〇]heptan-3-yl)methanol and adipic acid as a compound [in the formula (III), R5=R6=H, p=4 compound], (E) (4-methyl-7-oxa Bicyclo[4. 1. 〇]heptan-3-yl) ester of methanol with adipic acid [in the formula (III), R5=4-CH3, R6=4-CH3, p=4 compound], (F (7-oxabicyclo[4. 1.〇]heptan-3-yl)methanol and ether of 1,2-ethanediol [in the formula (V), R9=f=H, r=2 compound ]. Further, the aliphatic epoxy resin may, for example, be a polyglycidyl ether of an aliphatic polyhydric alcohol or an alkylene oxide adduct thereof. In the case of gifts, for example, diglycidyl ether of 1,4-butanediol; 1, diglycidyl shreds of dimethoate; triglycidyl hydrazine of glycerol; Glycidyl ether; diglycidyl ether of polyethylene glycol; diglycidyl ether of propylene glycol; and one or more alkylene oxides (ethylene oxide, propylene pyrene (pr〇pyiene) Oxide, etc.) A polyglycidyl ether of a polyfluorene polyol obtained by forming an aliphatic polyol such as ethylene glycol, propylene glycol or glycerin. The epoxy resins exemplified above may be used alone or in combination of two or more. The epoxy equivalent of the epoxy resin is usually from 30 to 3,000 g/equivalent, and is preferably in the range of from 50 to 1,500 g/equivalent. When the epoxy equivalent is less than 3 〇g / equivalent, the flexibility of the hardened anti-glare polarizing plate may be lowered, or the strength of the connector may be lowered. On the other hand, when the epoxy equivalent exceeds 3 〇〇〇g/eq, the compatibility with other components contained in the adhesive may be lowered. 322869 61 201140127 From the viewpoint of reactivity, it is preferred to use cationic polymerization as a hardening reaction of an epoxy resin. Therefore, as the remaining curable composition, it is preferred to contain a cationic polymerization initiator, and the cationic polymerization initiator is produced by irradiation or heating of an active energy ray such as visible light, ultraviolet rays, X-rays, or electron beams. A cationic species or a Lewis acid, and the polymerization of the epoxy group begins. Regardless of the type of cationic polymerization initiator, it is preferred from the viewpoint of imparting a recess. Hereinafter, the cation polymerization initiator which generates a cationic species or a Lewis acid to cause the reaction to proceed, which is called "light will be generated by heat generation of a cationic species or a Lewis acid" = by the active energy ray It is more advantageous to irradiate less than the primary film because it can be hardened at room temperature and reduced, and the necessary light film caused by the strain or expansion of the film is followed. Light; photo-cationic polymerization for fat, preservation stability and workability is also excellent. Gwangyang 2; Yu = oxygen tree salt; and iron-propadiene complex, etc. h fragrant 锜 salt and other rust i incense The diazonium salt, for example, a gas diazonium salt such as A + gas, hexahydro sulphate, or the like, may be exemplified by tetrakis(pentafluorophenyl)diphenyl 322869. 62 201140127 =, hexafluoroweidiphenylene, hexafluoride riding diphenyl wire, squaric acid di(4-indolyl), etc.. = scented nickel salt, for example, hexafluorophosphate trisyl Bismuth, hexafluoro, acid three stupid base, tetrakis(pentafluorophenyl) triphenyl sulfonate, 4 4, _ double (two stupid base table 1_ Diphenyl sulfide di hexafluoroate, 4, 4, bis[bis(undo-hydroxyoxy)phenyl)diphenyl sulfide dihexafluoroate, 4, 4, ^ L-d silk ethoxy)phenyl sulfhydryl] diphenyl sulphide double hexafluoride acid = 7-[1 (p-tolyl) fluorenyl] 2_isopropyl sulphide hexazone Salt, one (p-tolyl) fluorenyl]-2-isopropyl thioxanthone four (five gas two 4 (on the second grade of Xianji County) _4, _ diphenyl secret group _ diphenyl thiophene six rats Citrate, 4-(p-tert-butylphenylcarbonyl)-4,-bis(p-tolyl)decyl-diphenyl sulfide tetrakis(pentafluorophenyl)borate, etc. In addition, iron-propion A fine complex compound, for example, may be exemplified by dioxan-cyclopentaenyl iron (II) hexafluoroantimonate, cumene-cyclopentadienyl iron (π) hexafluorophosphonium salt, xylene A cyclopentadienyl iron (yttrium)-tris(trifluoromethylsulfonyl) fluorenyl compound. These photocationic polymerization initiators may be used singly or in combination of two or more. Aromatic salt-salt, which imparts ultraviolet light absorption even in the above wavelength region, so it can be hardened. It is suitable for use as a cured product having good mechanical strength and strength. Therefore, these photocationic polymerization initiators can be easily obtained from commercially available products. For example, Knife is listed under the trade name "Kayarad PCI-220". And 63 322869 201140127 "Kayarad PCI-620" (above made by Nippon Kayaku Co., Ltd.), "UVI-6990" (made by Union Carbide), "Adeka Optomer SP-150" and "Adeka0ptomer SP-170" (above) "made by ADEKA Co., Ltd.", "CI-5102", "CIT-1370", "CIT-1682", "CIP-1866S", "CIP-2048S" and "CIP-2064S" (above is Japan Caoda Co., Ltd.) Company system), "DPI-101", "DPI-102", "DPI-103", "DPI-105", "MPI-103", "MPI-105", "BBI-101", "BBI-102" "BBI-103", "BBI-105", "TPS-101", "TPS-102", "TPS-103", "TPS-105", "MDS-103", "MDS-105", "DTS-102" and "DTS-103" (above is made by Midori Chemical Co., Ltd.), "P Bu 2〇74" (made by Rh〇dia), etc.The amount of the photocationic polymerization initiator to be added is usually 0.5 to 20 parts by weight, more preferably 1 part by weight or more, and more preferably 15 parts by weight or less based on 1 part by weight of the epoxy resin. When the amount of the photocationic polymerization initiator is less than 0.5 part by weight relative to 100 parts by weight of the epoxy resin, the hardening is insufficient, and the mechanical strength and the subsequent strength of the cured product tend to be lowered. Further, when the compounding amount of the photocationic polymerization initiator is more than 2 parts by weight relative to the reset portion of the epoxy resin 100, the hygroscopicity of the substance is increased due to an increase in the ionic substance in the hardened substance, which may result in Reduced durability. When a photo-ionic polymerization initiator is used, the curable composition may be required to contain a photo-sensitizer. By using a photosensitizer, the reactivity of the cationic polymerization can be enhanced, and the mechanical strength and the strength of the cured product can be improved. The photo-sensitizing stimuli include, for example, a few base compounds, an organic sulfur compound, a persulfide compound, a 64 322 869 201140127 redox system compound, an azo and a heavy gas compound, a halide, and a photoreductive dye. Specific examples of the photosensitizer include benzoin ether, benzoin isopropyl ether, and benzoin derivatives such as α,α-didecyloxy-α-phenylidene ethyl ketone; diphenyl ketone, 2, 4- Dichlorodiphenyl i, decyl phthalate, 4, 4'-bis(dimercapto)diphenyl fluorene and 4,4'-bis(diethylamino) diphenyl Diphenyl ketone derivatives such as ketones; thioxanthone derivatives such as 2-air thioxanthone and 2-isopropyl sinone; 2-chloroindole and 2-indenyl; g, hydrazine, etc. Anthracene derivatives; acridone derivatives such as N-methylacridone and N-butylacridone; others such as 〇:, α-diethoxyacetophenone, diphenylethylenedione (benzil), anthrone, xanthene, uranyl compound, halide, and the like. These photosensitizers may be used singly or in combination of two or more. The photosensitive sensitizer is preferably contained in the range of 0.1 to 20 parts by weight in the weight component of the curable composition. On the other hand, the thermal cationic polymerization initiator may, for example, be a benzyl chloride salt, a thiophenium salt, a thiolanium salt, a benzylammonium salt, a pyridinium salt or a hydrazine salt. (hydrazinium salt), carboxylate, sulfonate and amidoximine. These thermal cationic polymerization initiators can be easily obtained from commercially available products, and for example, "Adeka Opton CP77" and "Adeka Opton CP66" (above, ADEKA Co., Ltd.), rCI_2639" and " CI_2624" (above is made by Japan Soda Co., Ltd.), rSan_Aid SI_6〇L", "San-Aid SI-80L" and "San-Aid SI-100L" (above, Sanshin Chemical Industry Co., Ltd.). 65 322869 201140127 The epoxy resin contained in the binder can be hardened by any of the types of thermal cationic polymerization, and can be hardened by both "combination and thermal cationic polymerization." And a thermo-cationic polymerization initiator, and a curable composition as an adhesive, which may contain an oxetane or a polyhydric alcohol, which promotes cationic polymerization, etc. For the compound having a four-membered ring in the molecule, for example, 3-ethyl-3, a methyloxycarbonyl heterocyclic ring, a succinyl ethyl-3-oxetanyl methoxy group Methyl]benzene, 3-ethyl_3_(phenoxy-methyl) oxetane, bis[(3-ethyl-3-(oxacyclobutyl)methyl] shout -(2-ethylhexyloxymethyl)oxetane, phenol novolac oxetane, etc. These oxetane can be easily obtained from commercially available products, for example, by product name Listed as r Ar〇ne 〇xetane 〇χτ_丨〇丨", "Oxetane 〇n-121", "Arone 0xetane 0XT_2ii", "Ar〇ne

OxetaneOXT-221」及「Ar〇ne〇xetane〇XT_212」(均為東 亞合成股份有限公司製)等。此等氧雜環丁烷,於硬化性組 成物中’通常是以5至95重量%,較佳是以30至70重量〇/〇 的比例含有。 多元醇類較佳為不存在有酚性羥基以外的酸性基者, 例如可列舉如不具有羥基以外的官能基之多元醇化合物、 聚酯多元醇化合物、聚己内酯多元醇化合物、具有酚性羥 基之多元醇化合物、聚碳酸酯多元醇化合物等。此等多元 醇類的分子量,通常為48以上,較佳為62以上,更佳為 100以上,此外,較佳為1000以下。此等多元醇類,於硬 66 322869 201140127 化性組成物中,通常是以5〇重量%以下,較佳是以 %以下的比例含有。 重里 再者,由硬化性組成物所構成之接著劑中,在不損及 其接著性下,可調配其他添加劑,例如離子捕集劑、抗氧 化劑、鏈轉移劑(chain transfer agent)、黏著賦予劑、 熱可塑性樹脂、填充劑、流動調整劑、可塑劑、消泡劑等。 離子捕集劑可列舉如粉末狀的银系、銻系、鎮系、紹系、 鈣系、鈦系及此等之混合系等的無機化合物。抗氣化劑可 列舉如受阻酚系抗氧化劑等。 將由含有上述環氧系樹脂之硬化性組成物所構成之 接著劑,塗佈在被貼合物(偏光膜、防眩膜、保護膜、光學 補償層)的至少任一貼合面後,隔介所塗佈之接著劑來貼合 被貼合物彼此,並藉由藉由照射活性能量線或加熱使未硬 化之接著劑層硬化,而得本發明之防眩性偏光板。未硬化 之接著劑層的厚度通常為50/zm以下,較佳為2〇_以下, 更佳為l〇em以下。接著劑層的塗佈方法,例如可運用刮 刀、線棒、壓模塗佈機(die coater)、逗號式塗佈機(c〇mma coater)凹版塗佈機等種種的塗佈方式。此時,由於各種 塗佈方式分別具有最適的黏度範圍,所以可在硬化性組成 物中含有用於黏度調整之溶劑。溶劑只要是不會使偏光膜 的光學性能降低且可良好地溶解硬化性組成物者即可,可 舉例如以曱苯為代表之烴類,以乙酸乙醋為代表之醋類等 有機溶劑。 當將保護臈或光學補償層貼合於偏光膜之與貼合有 322869 67 201140127 防眩膜的一側為相反側之侧時,防眩膜與保護膜或光學補 償層可分階段地一次貼合翠面,或是一次貼合兩者。 以接著劑來貼合被貼合物時,可預先在被貼合物的至 少任一貼合面施以皂化處理、電暈放電處理、底漆(primer) 處理、定錯塗佈(anchor coating)處理等易接著處理。 藉由照射活性能量線來進行接著劑的硬化時,所使用 之光源並無特別限定,可使用在波長400nm以下具有發光 分布者,例如低壓水銀燈、中壓水銀燈、高壓水銀燈、化 學燈、黑光燈、微波激發水銀燈、金屬齒化物燈等。對接 著劑之光照射強度,因組成物的不同而不同,較佳是對於 聚合起始劑的活化為有效之波長區域的照射強度為〇. 1至 100mW/cm2之範圍内。當對接著劑之光照射強度未達 0· lmW/cm2時’反應時間過長,超過i〇〇mw/cm2時,由於從 燈所發出之輻射熱以及硬化性組成物於聚合時的發熱,可 能產生接著劑的黃變或偏光膜的劣化。對接著劑之光照射 時間,係因應組成物的不同來控制,仍無特別限定,但較 佳疋以使照射強度與照射時間之乘積所表示之積算光量成 為10至5000mJ/cm2之範圍内來設定。當對接著劑之積算 光量未達10mJ/cm2時,來自聚合起始劑之活性物種的產生 不足,可能導致接著劑硬化的不足,此外,積算光量超過 5000mJ/cm2時,照射時間變得極長,就生產性提升方面, 有時會變得不利。 藉由熱來進行接著劑的硬化時,可藉由一般所知的方 法來加熱,其條件等亦無特別限定,通常是在可使調配於 322869 68 201140127 接著劑之熱陽離子聚合起始劑產生 η以m血 職生%離子物種或路易斯酸 ::度以上進仃加熱’具體的加熱溫度係例如為5〇至_ 不論是藉由照射活性能量線或加熱的任 硬化,較佳是在不會使偏光膜的偏光度、穿透率及來色= 防眩膜或保護膜的透明性及光學補償層的相位差特性等防 眩性偏光板的諸項躲降低之範_進行硬化。 <影像顯示裝置> 马推本發明更提供㈣上述本發明之防眩性偏光板以及 =4不7G件之影像顯不I置。本發明之影像顯示裝置中, =性偏光板係以其防眩層侧為外側而配置在影像顯示元 、觀看側。亦即’本發明之防眩性偏光板係適合作為前 :偏光板使用,並以使該防眩膜的凹凸面,亦即防眩層 貝1成為外側(觀看側)之方式配置在影像顯示元件的觀看 I°關於影像顯示元件’具代表性者為液晶被密封於上下 ^反間:且藉由施加電壓來改變液晶的配向狀態以進行影 =顯示之液晶單元。液晶單元的驅動模式,如上述般, 有垂直配向(Vertical Alignment : VA)模式、橫向電場 (In〜Plane Switching: IPS)模式、扭轉向列(Twisted Nematic : TN)模式等各種模式。 防眩性偏光板可直接貼合於影像顯示元件的表面,此 iyl 八例如以上所述般,亦可隔介保護膜或光學補償層而貼 S於影像顯示元件的表面。 具備本發明之防眩性偏光板之影像顯示裝置,可藉由 69 322869 201140127 防眩膜所具有之表面的凹凸,使入射光產生散射並使映射 像模糊化,而賦予較佳的觀看性。此外,本發明之防眩性 偏光板,即使運用在高精細的影像顯示裝置時,亦不會產 生如以往的防眩膜所觀看到之閃斑,而能夠顯現出可充分 地防止映射、泛白,抑制閃斑及對比的降低之優異性能。 (實施例) 以下係列舉出實施例來更詳細地說明本發明,但本發 明並不限定於此等實施例。下列例子之防眩性偏光板中所 使用之防眩膜及防眩膜製造用圖案之評估方法,係如以下 所述。 [1 ]防眩性偏光板中所使用之防眩膜之表面形狀的測定 使用三維顯微鏡PL v 2300(Sensofar公司製)來測定 防眩膜的表面形狀。為了防止樣本的翹曲,係使用光學上 呈透明之黏著劑,以使凹凸面成為表面之方式貼合於玻璃 基板後,再提供於測定。測定時,將物鏡的倍率設為10 倍。水平分解能Δχ及Ay均為1. 66y m,測定面積為850 /z mx850 e m。 (標高的能譜之比HJ/iL·2與H32/H22) 從以上所得之測定資料中,求取防眩膜之細微凹凸表 面的標高作為二維函數h(x, y),將所得之二維函數h(x,y) 進行離散傅利葉轉換而求得二維函數H(fx,fy)。將二維函 數H(fx,fy)進行平方運算以計算出能譜的二維函數 H2(fx,fy),並從fx=0的剖面曲線之H2(0, fy)中,求取空間 頻率0. 01 μ m_1中的能譜與空間頻率0. 04//m_1中的能譜 70 322869 201140127 H22,並計算出能譜之比HJ/IL·2。此外,求取空間頻率0. 1 βπΓ1中的能譜,並計算出能譜之比H32/H22。 (細微凹凸表面的傾斜角度) 根據以上所得之測定資料,並根據前述演算法進行計 算,製作出凹凸面的傾斜角度之直方圖,從該圖中求取每 個傾斜角度之分布,並計算出傾斜角度為5°以下之面的比 例。 [2 ]防眩性偏光板中所使用之防眩膜之光學特性的測定 (霧度) 防眩膜的霧度係藉由JIS K 7136所規定之方法來進 行測定。具體而言,係使用依據此規格之霧度計「HM-150 型」(村上色彩技術研究所製)來測定霧度。為了防止防眩 膜的翹曲,係使用光學上呈透明之黏著劑,以使凹凸面成 為表面之方式貼合於玻璃基板後,再提供於測定。一般而 言,當霧度增大時,運用在影像顯示裝置時之影像會變暗, 結果容易使正面對比降低。因此,以霧度較低者為佳。 [3 ]防眩性偏光板的防眩性能及對比的評估 在暗房内啟動如此製得之液晶顯示裝置的背光,使用 亮度計「BM5A型」(Topcon股份有限公司製),測定黑顯示 狀態及白顯示狀態下之液晶顯示裝置的亮度,並計算對比。 在此,對比是以白顯示狀態的亮度相對於黑顯示狀態的亮 度之比所表示。其次,將此評估系統移往明亮室内,設為 黑顯示狀態且以目視來觀察映射狀態、泛白。繼而,在明 亮室内,設為白顯示狀態且亦以目視來觀察閃斑。關於映 71 322869 201140127 如下所示。 射狀態、泛白、閃斑之評估基準 映射1 :未觀察到映射。 2:觀察到些許映射。 3:明顯地觀察到映射。 泛白1 :未觀察到泛白。 2:觀察到些許泛白。 3:明顯地觀察到泛白。 閃斑1 ··未觀察到閃斑。 2:觀察到些許閃斑。 3:觀察到許多閃斑。 [4]防眩性偏光板之耐水性的評估 藉由下列所示的方法,對所 耐水性。首先,以靼防# , Έ之防眩性偏光板評 方向)平行之杨=====拉 ::大小以製作出樣本,並正確地測定== 在此:偏域係因所吸附之蛾,故涵蓋全面均—地呈現: 有色彩。其次,在握持該樣本的一短邊側之狀態下,將;j 本之長度方向的大約8成浸潰於6(Tc的水槽,並保持4 時。然後從水槽中取出樣本’擦拭水分並觀察偏光板。-由5亥溫水浸潰’使樣本的偏光膜收縮。此外,藉由該溫^ 浸潰’使碘從與溫水接觸之偏光膜的周緣部溶出,而在才 本周緣部產生褪色之部分。此偏光膜的收縮及褪色程度, 可藉由測定從樣本短邊的中央之樣本的一端(防眩膜的一 端)至所收縮之偏光膜中殘留有偏光膜的特有色彩之區域 72 322869 201140127 為止之距離來評估,並作為侵蝕長度。該侵蝕長度愈小, 表示偏光膜的收縮及褪色程度愈小,亦即可評估其作為防 眩性偏光板的耐水性為高。 [5]防眩膜製造用圖案的評估 以二維的離散函數g(x,y)來表示所製作之圖案資料 的階調。離散函數g(X,y)的水平分解能Δχ及Ay均為2 ym。將所得之二維函數g(x y)進行離散傅利葉轉換而求 得二維函數G(fx,fy)。將二維函數G(fx,fy)進行平方運算 以計算出能譜的二維函數G2(fx,fy),並從fx=〇的剖面曲線 之G (0, fy)中’評估在大於〇 # m-1且為〇. 〆m_1以下的空 間頻率範圍内是否具有極大值。 <實施例1> (A) 偏光膜的製作 將平均聚合度約2400、皂化度99. 9莫耳%以上且厚度 75/zra之聚乙烯醇膜浸潰於3(TC的純水後,在3(TC下浸潰 於碘/碘化鉀/水的重量比為〇· 02/2/100之水溶液。然後在 56. 5°C下浸潰於碘化鉀/硼酸/水的重量比為12/5/100之 水溶液。其次’以8°C的純水洗淨後,在651下進行乾燥, 而得到碘吸附配向於聚乙烯醇之偏光膜。拉伸主要是在碘 染色及硼酸處理的步驟中進行,總拉伸倍率為5. 3倍。 (B) 防眩膜製造用之模具的製作 首先製備在直徑200mm的鋁輥(依據JIS之A5056)的 表面施以銅巴拉德鍍覆者。銅巴拉德鍍覆是由鍍銅層/薄鍍 銀層/表面鍍銅層所構成者,鍍覆層全體的厚度係設定為大 73 322869 201140127 力200以m β將該錢銅表面進行鏡面研磨,將感光性樹脂塗 佈在經研磨的鍍鋼表面,並進行乾燥而形成感光性樹脂 膜。其次’將由第15圖所示之影像資料所構成之圖案予以 複數個連續地重複排列而製成圖案,將該圖案於感光性樹 月曰膜上藉由雷射光進行曝光並顯影。依據雷射光所進行之 曝光與顯影’係使用 Laser Stream FX(Think Laboratory 股份有限公司製)來進行。感光性樹脂膜係使用正型感光性 树月曰。第15圖所示之圖案,係對於不規則地配置多數個點 徑12//m的點之圖案’運用用以去除空間頻率〇. 04“^^ 以下的低空間頻率成分與0. i以m-i以上的高空間頻率成分 之帶通濾波器而製作者。 然後,以氯化銅液進行第1蝕刻處理(蝕刻量:m)。 第1蝕刻處理後,從輥中去除感光性樹脂膜,再次以氯化 銅液進行第2蝕刻處理(蝕刻量:10/zm)。然後以使鍍鉻厚 度成為4 μ m之方式進行鍍鉻加工而製作模具a。 (C)防眩膜的製作 將光硬化性樹脂組成物「GRANDIC 806T」(大日本油 墨化學工業股份有限公司製)溶解於乙酸乙酯,製成5〇重 量%濃度的溶液,然後將光聚合起始劑的rLucirin τρο」 (BASF公司製,化學名稱:2, 4’ 6~三甲基苯甲醯基二苯基 膦氧化物),以硬化性樹脂成分每1〇〇重量份添加5重量份 之方式調製出塗佈液。其次,在厚度80以m的三乙酸纖維 素(TAC)膜上,以使乾燥後的塗佈厚度成為6vm之方式塗 佈此塗佈液,在設定為60°C之乾燥機中進行3分鐘的乾 322869 74 201140127 燥。將乾燥後的TAC膜,以使光硬化性樹脂組成物層成為 模具側之方式,藉由橡膠輥按壓於先前所得之模具A的凹 凸面並使密著。在此狀態下,從TAC防眩膜側,以h射、線 換算光量成為200mJ/cm2之方式,將來自強度2〇mW/cm2之 高壓水銀燈的光予以照射,使光硬化性樹脂組成物層硬 化。然後將TAC膜與硬化樹脂一起從模具剝離,而製作由 表面具有凹凸之硬化樹脂(防眩層)與TAC膜之積層體所構 成的透明防眩膜A。 (D)由以環氧系樹脂為主成分之硬化性組成物所構成之接 著劑的調製 將己二酸雙(3, 4-環氧環己基甲基)酯1〇〇重量份、氫 化雙盼A的二縮水甘油喊25ί量份、及光陽離子聚合起始 劑[4,4 -雙(二苯紐基)二苯基俩雙六氟魏鹽^ 2 重量份混合後,進行脫泡而製得由硬化性組成物所;成之 接著劑。絲離子聚合起始肢魏為5G f量%賴 醋(propylene carbonate)溶液。 ^ (E)防眩性偏光板的製作 在防眩膜A之與形成有防眩層的—側為相反侧之面 ^層膜上^偏^式塗佈機塗佈上述接著劑,並於其 電處i之厚^ 70、。此外,在作為保護膜之表面經電暈玫 日太7予又_的拉伸降㈣系樹脂膜(「ZE0N0R」, :股份有限公司製)(以下亦記载為降娜)之電 ==,以棒式塗佈機塗佈上述接著劑一後,: 接者#佈面側,將該喊_積層於偏光膜之與貼合 322869 75 201140127 有防眩膜的一側為相反侧之面。然後,藉由附有輸送帶之 紫外線照射裝置(照射燈:Fusion D Lamp、積算光量: 1000mJ/cm2)照射紫外線,並在室溫下放置1小時,而得防 眩性偏光板A。 (F)液晶顯示裝置的製作 從裝載有垂直配向模式的液晶顯示元件(液晶面板) 之市售的液晶電視(「LC-32GH3」,Sharp股份有限公司製) 中取出液晶面板,從該液晶單元中將偏光板剝離。然後皆 以使偏光板的吸收轴與原本貼附於各液晶單元之偏光板的 及收轴方向為一致之方式,隔介接著劑層,將偏光板 Sumikalan SRDB31E」(住友化學股份有限公司製)貼合於 液晶單元的背面侧(背光侧),並將上述防眩性偏光板八貼 合於液晶單元的前面側(觀看侧),而製作液晶面板。其次, 將該液晶面板以背光/光擴散板/液晶面㈣構成來組裝, 製作液晶顯示裝置A。 <實施例2> 在模具製作的曝光步驟中,將由第16圖所示之影Oxetane OXT-221" and "Ar〇ne〇xetane〇XT_212" (both manufactured by Toyo Synthes Co., Ltd.). These oxetanes are usually contained in the curable composition at a ratio of 5 to 95% by weight, preferably 30 to 70% by weight. The polyol is preferably one in which no acidic group other than the phenolic hydroxyl group is present, and examples thereof include a polyol compound having no functional group other than a hydroxyl group, a polyester polyol compound, a polycaprolactone polyol compound, and a phenol. A polyol compound of a hydroxyl group, a polycarbonate polyol compound, or the like. The molecular weight of these polyhydric alcohols is usually 48 or more, preferably 62 or more, more preferably 100 or more, and further preferably 1,000 or less. These polyols are usually contained in a ratio of 5% by weight or less, preferably at most 5% by weight, in the composition of the hard 66 322869 201140127. Further, in the adhesive composed of the curable composition, other additives such as an ion trapping agent, an antioxidant, a chain transfer agent, and adhesion can be added without damaging the adhesion. Agents, thermoplastic resins, fillers, flow regulators, plasticizers, defoamers, and the like. Examples of the ion trapping agent include inorganic compounds such as powdery silver, lanthanide, lanthanide, lanthanide, calcium-based, titanium-based, and the like. The anti-gasifying agent may, for example, be a hindered phenol-based antioxidant. An adhesive agent composed of a curable composition containing the epoxy resin is applied to at least one of the bonding surfaces of the adherend (polarizing film, antiglare film, protective film, and optical compensation layer), and then separated. The anti-glare polarizing plate of the present invention is obtained by laminating the adhesive to be applied to each other and curing the uncured adhesive layer by irradiation with an active energy ray or heating. The thickness of the uncured adhesive layer is usually 50/zm or less, preferably 2 Å or less, more preferably 1 〇 or less. As a method of applying the coating layer, for example, various coating methods such as a doctor blade, a wire bar, a die coater, and a crepe coater (c〇mma coater) gravure coater can be used. At this time, since each of the coating methods has an optimum viscosity range, a solvent for viscosity adjustment can be contained in the curable composition. The solvent is not particularly limited as long as it does not degrade the optical properties of the polarizing film, and the curable composition can be dissolved. For example, a hydrocarbon represented by terpene and an organic solvent such as vinegar represented by ethyl acetate may be used. When the protective enamel or the optical compensation layer is attached to the side of the polarizing film opposite to the side to which the 322869 67 201140127 anti-glare film is attached, the anti-glare film and the protective film or the optical compensation layer may be pasted in stages. He Cui face, or fit both at once. When the adherend is bonded by an adhesive, saponification treatment, corona discharge treatment, primer treatment, or error coating may be applied to at least one of the bonding surfaces of the composition to be applied in advance (anchor coating) Processing is easy to proceed. When the adhesive is cured by irradiation of an active energy ray, the light source to be used is not particularly limited, and a light-emitting distribution having a wavelength of 400 nm or less, for example, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, a chemical lamp, or a black light can be used. Microwave-excited mercury lamps, metal toothed lamps, and the like. The light irradiation intensity of the docking agent varies depending on the composition, and is preferably in the range of 至. 1 to 100 mW/cm 2 in the wavelength region where the activation of the polymerization initiator is effective. When the intensity of light irradiation to the adhesive is less than 0·lmW/cm2, the reaction time is too long, and when it exceeds i〇〇mw/cm2, it may be due to radiant heat emitted from the lamp and heat generation of the curable composition during polymerization. The yellowing of the adhesive or the deterioration of the polarizing film is generated. The light irradiation time of the adhesive is controlled depending on the composition, and is not particularly limited, but it is preferably such that the integrated light amount represented by the product of the irradiation intensity and the irradiation time is in the range of 10 to 5000 mJ/cm 2 . set up. When the total amount of light to the adhesive is less than 10 mJ/cm2, the production of the active species from the polymerization initiator is insufficient, which may cause insufficient curing of the adhesive. Further, when the integrated light amount exceeds 5000 mJ/cm2, the irradiation time becomes extremely long. In terms of productivity improvement, it sometimes becomes unfavorable. When the curing of the adhesive is carried out by heat, it can be heated by a generally known method, and the conditions thereof are not particularly limited, and it is usually produced by a thermal cationic polymerization initiator which can be formulated in 322869 68 201140127. η is a blood-borne % ion species or a Lewis acid:: degree or more heating. The specific heating temperature is, for example, 5 〇 to _ whether it is by hardening the active energy ray or heating, preferably at The degree of polarization of the polarizing film, the transmittance, and the color of the anti-glare film or the transparency of the protective film and the phase difference characteristics of the optical compensation layer, such as the anti-glare polarizing plate, can be hardened. <Image Display Device> The present invention further provides (4) that the anti-glare polarizing plate of the present invention and the image of the =4 and 7G are not displayed. In the video display device of the present invention, the = polarizing plate is disposed on the image display element and the viewing side with the anti-glare layer side being outside. In other words, the anti-glare polarizing plate of the present invention is suitably used as a front polarizing plate, and the uneven surface of the anti-glare film, that is, the anti-glare layer 1 is disposed on the outer side (viewing side). The viewing of the component I° with respect to the image display device is representative of a liquid crystal cell in which the liquid crystal is sealed between the upper and lower sides and the alignment state of the liquid crystal is changed by applying a voltage to perform shadow=display. As described above, the driving mode of the liquid crystal cell has various modes such as a vertical alignment (VA) mode, a transverse electric field (In to Plane Switching: IPS) mode, and a twisted nematic (TN) mode. The anti-glare polarizing plate can be directly attached to the surface of the image display element, and the iyl 8 can be attached to the surface of the image display element by a protective film or an optical compensation layer as described above. The image display device having the anti-glare polarizing plate of the present invention can scatter the incident light and blur the map image by the irregularities on the surface of the anti-glare film of 69 322 869 201140127, thereby imparting better visibility. Further, even when the anti-glare polarizing plate of the present invention is used in a high-definition image display device, it does not generate a speckle as viewed by a conventional anti-glare film, and can exhibit sufficient prevention of mapping and panning. White, which suppresses the excellent performance of the reduction of the speckle and contrast. (Embodiment) The present invention will be described in more detail in the following examples, but the present invention is not limited thereto. The anti-glare film and the method for evaluating the pattern for producing an anti-glare film used in the anti-glare polarizing plate of the following examples are as follows. [1] Measurement of surface shape of anti-glare film used in anti-glare polarizing plate The surface shape of the anti-glare film was measured using a three-dimensional microscope PL v 2300 (manufactured by Sensofar Co., Ltd.). In order to prevent the warpage of the sample, an optically transparent adhesive is applied to the glass substrate so that the uneven surface becomes a surface, and then supplied to the measurement. When measuring, set the magnification of the objective lens to 10 times. The horizontal decomposition energy Δχ and Ay are both 1.66 μ m, and the measurement area is 850 /z mx850 e m. (The ratio of the energy spectrum of the elevation is HJ/iL·2 and H32/H22) From the measurement data obtained above, the elevation of the fine uneven surface of the anti-glare film is obtained as a two-dimensional function h(x, y), and the obtained The two-dimensional function h(x, y) performs discrete Fourier transform to obtain a two-dimensional function H(fx, fy). The two-dimensional function H(fx,fy) is squared to calculate the two-dimensional function H2(fx,fy) of the energy spectrum, and the spatial frequency is obtained from the H2(0, fy) of the profile curve of fx=0. The energy spectrum in 0. 01 μ m_1 and the energy spectrum in space 04.//m_1 are 70 322869 201140127 H22, and the ratio of energy spectrum HJ/IL·2 is calculated. In addition, the energy spectrum in the spatial frequency of 0.1 βπΓ1 is obtained, and the energy spectrum ratio H32/H22 is calculated. (inclination angle of fine uneven surface) Based on the measurement data obtained above, and calculated according to the above algorithm, a histogram of the inclination angle of the concave-convex surface is prepared, and the distribution of each inclination angle is obtained from the figure, and the calculation is calculated. The ratio of the angle at which the inclination angle is 5° or less. [2] Measurement of optical characteristics of anti-glare film used in anti-glare polarizing plate (Haze) The haze of the anti-glare film was measured by a method defined in JIS K 7136. Specifically, the haze is measured using a haze meter "HM-150 type" (manufactured by Murakami Color Research Laboratory Co., Ltd.) according to this specification. In order to prevent the warpage of the anti-glare film, an optically transparent adhesive is applied to the glass substrate so that the uneven surface is formed into a surface, and then supplied to the measurement. In general, when the haze is increased, the image used in the image display device is darkened, and as a result, the front contrast is easily lowered. Therefore, it is better to have a lower haze. [3] Anti-glare performance and contrast evaluation of the anti-glare polarizing plate The backlight of the thus-prepared liquid crystal display device was activated in a dark room, and the black display state was measured using a brightness meter "BM5A type" (manufactured by Topcon Co., Ltd.). The brightness of the liquid crystal display device in the white display state, and the comparison is calculated. Here, the comparison is expressed by the ratio of the brightness of the white display state to the brightness of the black display state. Next, the evaluation system is moved to a bright room, set to a black display state, and the mapping state and whitening are visually observed. Then, in the bright room, the white display state is set and the flare is also observed visually. About 71 322869 201140127 is as follows. Evaluation criteria for shot state, whitening, and flash spots Mapping 1: No mapping observed. 2: A few mappings were observed. 3: The mapping is clearly observed. Whitening 1: No whitening was observed. 2: A little whitewash was observed. 3: Whitening was clearly observed. Flash spot 1 · No spot is observed. 2: A few flash spots were observed. 3: Many flash spots were observed. [4] Evaluation of water resistance of anti-glare polarizing plate The water resistance was determined by the method shown below. First, take 靼#, 防 防 防 防 ) ) ) = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = = Moth, so it covers all aspects of the ground: color. Next, in the state of holding a short side of the sample, about 80% of the length direction of the sample is immersed in 6 (Tc sink, and held for 4 hours. Then take the sample from the sink to wipe the moisture and Observe the polarizing plate. - The film is shrunk by 5 Hz warm water to shrink the polarizing film of the sample. In addition, the iodine is eluted from the peripheral portion of the polarizing film in contact with warm water by the temperature immersion, and this week The fading portion is fading. The degree of shrinkage and fading of the polarizing film can be determined by measuring the end of the sample from the center of the short side of the sample (one end of the anti-glare film) to the characteristic of the polarizing film remaining in the contracted polarizing film. The distance of the color area 72 322869 201140127 is evaluated and used as the erosion length. The smaller the erosion length, the smaller the shrinkage and fading of the polarizing film, and the higher the water resistance of the anti-glare polarizer. [5] Evaluation of anti-glare film manufacturing pattern The two-dimensional discrete function g(x, y) is used to represent the tonality of the pattern data produced. The horizontal decomposition energy Δχ and Ay of the discrete function g(X, y) 2 ym. The resulting two-dimensional function g(xy) The two-dimensional function G(fx,fy) is obtained by discrete Fourier transform. The two-dimensional function G(fx,fy) is squared to calculate the two-dimensional function G2(fx,fy) of the energy spectrum, and from fx=〇 In the G (0, fy) of the profile curve, it is evaluated whether it has a maximum value in a spatial frequency range greater than 〇#m-1 and below 〇. 〆m_1. <Example 1> (A) Production of polarizing film The polyvinyl alcohol film having an average polymerization degree of about 2400, a degree of saponification of 99.9 mol% or more and a thickness of 75/zra was immersed in 3 (TC pure water, and then immersed in iodine/potassium iodide/water at 3 (TC). The weight ratio is 〇· 02/2/100 aqueous solution, and then immersed in an aqueous solution of potassium iodide/boric acid/water in a weight ratio of 12/5/100 at 56.5 ° C. Secondly, it is pure at 8 ° C.倍倍。 (3 times. The total stretching ratio is 5.3 times. B) Preparation of mold for manufacturing anti-glare film First, a copper ball-plated plate was prepared on the surface of an aluminum roll (according to JIS A5056) with a diameter of 200 mm. The copper ballard plating was made of copper plating. / The thin silver plating layer / the surface copper plating layer is formed, the thickness of the entire plating layer is set to be large 73 322869 201140127 The force 200 is mirror-polished with m β of the copper surface, and the photosensitive resin is coated on the ground. The surface of the plated steel is dried to form a photosensitive resin film. Secondly, a pattern consisting of the image data shown in Fig. 15 is repeatedly arranged in a plurality of patterns to form a pattern, and the pattern is applied to the photosensitive tree. Exposure and development by laser light on the ruthenium film. Exposure and development by laser light were carried out using Laser Stream FX (manufactured by Think Laboratory Co., Ltd.). The photosensitive resin film is a positive photosensitive tree. The pattern shown in Fig. 15 is for the pattern of irregularly arranging a plurality of dots having a dot diameter of 12/m, which is used to remove the spatial frequency 〇. 04"^^ below the low spatial frequency component and 0. i Produced by a band-pass filter having a high spatial frequency component of mi or more. Then, the first etching treatment (etching amount: m) is performed with a copper chloride solution. After the first etching treatment, the photosensitive resin film is removed from the roller. The second etching treatment (etching amount: 10/zm) was carried out again with a copper chloride solution. Then, chrome plating was performed so that the thickness of the chrome plating was 4 μm to prepare a mold a. (C) Production of an anti-glare film The resin composition "GRANDIC 806T" (manufactured by Dainippon Ink Chemicals Co., Ltd.) was dissolved in ethyl acetate to prepare a solution having a concentration of 5 wt%, and then rLucirin τρο" of the photopolymerization initiator (BASF Corporation) Chemical name: 2, 4' 6-trimethylbenzimidyl diphenylphosphine oxide), and a coating liquid was prepared by adding 5 parts by weight per 1 part by weight of the curable resin component. Next, this coating liquid was applied to a cellulose triacetate (TAC) film having a thickness of 80 m so that the coating thickness after drying was 6 vm, and it was carried out for 3 minutes in a dryer set at 60 ° C. Dry 322869 74 201140127 Dry. The dried TAC film was pressed against the concave convex surface of the previously obtained mold A by a rubber roller so that the photocurable resin composition layer became the mold side, and was adhered. In this state, the light from the high-pressure mercury lamp having a strength of 2 〇 mW/cm 2 is irradiated from the TAC anti-glare film side so that the amount of light in the h-ray and the line-converted light becomes 200 mJ/cm 2 to form a photo-curable resin composition layer. hardening. Then, the TAC film was peeled off from the mold together with the cured resin, and a transparent antiglare film A composed of a laminate of a cured resin (antiglare layer) having irregularities on the surface and a TAC film was produced. (D) Preparation of an adhesive composed of a curable composition containing an epoxy resin as a main component, bis(3,4-epoxycyclohexylmethyl) adipate, 1 part by weight, hydrogenation double The diglycidyl group of A is called 25 parts by weight, and the photocationic polymerization initiator [4,4-bis(diphenylnonyl)diphenyl bis hexafluorowei salt 2 parts by weight is mixed and defoamed. Made of a hardenable composition; an adhesive. The silk ion polymerization initial limb is a 5 G f % propylene carbonate solution. ^ (E) Preparation of anti-glare polarizing plate The above-mentioned adhesive is applied to the surface of the anti-glare film A on the opposite side to the side on which the anti-glare layer is formed. The thickness of its electricity is i ^ 70. In addition, on the surface of the protective film, the electrosaumatic refraction (4) resin film ("ZE0N0R": manufactured by Co., Ltd.) (hereinafter also referred to as "Na Na") is electro=== After the above-mentioned adhesive agent is applied by a bar coater, the side of the cloth is placed on the opposite side of the surface of the polarizing film and the surface of the polarizing film 322869 75 201140127 having the anti-glare film. . Then, ultraviolet rays were irradiated by an ultraviolet irradiation device (irradiation lamp: Fusion D Lamp, integrated light amount: 1000 mJ/cm 2 ) with a conveyor belt, and left at room temperature for 1 hour to obtain an anti-glare polarizing plate A. (F) Production of a liquid crystal display device. A liquid crystal panel is taken out from a commercially available liquid crystal display ("LC-32GH3", manufactured by Sharp Co., Ltd.) of a liquid crystal display device (liquid crystal panel) in which a vertical alignment mode is mounted, and the liquid crystal cell is taken out from the liquid crystal cell. Lieutenant peeled off the polarizing plate. Then, the polarizing plate Sumikalan SRDB31E" (manufactured by Sumitomo Chemical Co., Ltd.) was placed in such a manner that the absorption axis of the polarizing plate was aligned with the direction of the retracting axis of the polarizing plate to be attached to each liquid crystal cell, and the adhesive layer was interposed. The liquid crystal panel was produced by laminating the back side of the liquid crystal cell (backlight side) and bonding the above-described anti-glare polarizing plate 8 to the front side (viewing side) of the liquid crystal cell. Next, the liquid crystal panel was assembled by a backlight/light diffusing plate/liquid crystal surface (four), and a liquid crystal display device A was produced. <Example 2> In the exposure step of mold making, the image shown in Fig. 16 will be

St案予以複數個連續地重複排列而製成圖 ==於感光性樹脂膜上藉由雷射光_ 使第1㈣處理的蝴量成為5 第處理的钮刻量成為⑽之方之式方二來: 外’其他與實施例!同樣操 :x ’ “1 B。此外,除了使用樣操作而製作_ 除了使用防眩膜B之外,其他 322869 76 201140127 作而製作防眩性偏光板B及液晶顯示裝置6。第i6圖所示 之圖案’係對於不細地配置多數個_12_的點之圖 案,運用用以去除㈣頻率請〜^以下的低空間頻率 成分與0.135W丨以上的高空間頻率成分之帶通濾波器而 製作者。 &lt;比較例1&gt; 將直徑300咖的純(依據JIS &lt; A5〇56)的表面進行 鏡面研磨,並使用喷砂裝置(不二製作所股份有限公司製) 以喷砂壓力G. 1MPa(計示壓)、顆粒用量8g/em2(輥表面積 每1 cm2之用量)將二氧化鍅顆粒TZm 7 (T〇s〇h股份有限 公司製,平均粒徑:20/zm)喷砂至經研磨的鋁面,於表面 形成凹凸。對所得之附有凹凸的鋁輥進行無電解鍍鎳加 工,而製作模具c。此時’無電解鍍鎳厚度係設定為15#m。 除了使用所得之模具C之外,其他與實施例丨同樣操作而 製作防眩膜C。此外,除了使用防眩膜C之外,其他與實 施例1同樣操作而製作防眩性偏光板C及液晶顯示裝置C。 &lt;比較例2&gt; 將Kuraray股份有限公司所販售之經羧基改質的聚乙 烯醇「Kuraray Poval KL318」(改質度2莫耳%)ι. 8重量 份溶解於水100重量份’然後加入作為水溶性聚醯胺環氧 樹脂之Sumika Chemtex公司所販售之「Sumirez Resin 65〇」 (固形份30重量%的水溶液)1·5重量份並溶解,調製聚乙 烯醇系接著劑。 其次,在對防眩膜Α之與形成有防眩層的一側為相反 322869 77 201140127 側之面進行皂化處理後,以棒式塗佈機將上述聚乙稀醇系 接著劑塗佈在4化處理面,並於其上積層上述偏光 膜此外,在作為保護膜之表面經電暈放電處理之降莰烯 系樹脂(與實施例1者相同)的電暈放電處理面,以棒式塗 佈機塗佈上述聚乙烯醇系接著劑1()_後,以該接著劑塗 佈面侧,將該降莰烯膜積層於偏光膜之與貼合有防眩膜的 一侧為相反侧之面。然後在8{rc下乾燥5分鐘,再於常溫 下熟化1天,而得防眩性偏光板D。 關於上述[1]至[4]的測定及評估結果,係匯總如第! 表及第2表所示。此外,第17圖係顯示從實施例丨的模具 A及實施例2的模具B的製作時所使用之圖案所得之能譜 G2(fx’ fy)中的fx=〇時之剖面。從第17圖中,可得知實施 例1及2中所使用之圖案的能譜,在大於〇Mnfl且為〇 〇4 以m 1以下的空間頻率範圍内不具有極大值。 第1表 實施例1 實施例2 比較例1 防眩性偏光板 A B C 模具 A B C 能譜之比 h,vh22 19 4 41 表面形狀 H3VH22 0. 002 0. 001 0. 003 傾斜角度5。以下之 面的比例 100 100 100 光學特性 霧度(%) 0.4 0. 6 0.4 防眩性能 映射 1 1 1 泛白 1 1 1 閃斑 1 1 3 對比 1950 1950 1950 78 322869 201140127 第2表 實施例1 實施你 财水性 侵餘長度(mm) 0. 5 2Α~^^ ----s 從第1表所示的結果中,可得知滿足本發明的所有要 件之防眩性偏光板A及防眩性偏光板B,完全未產生閃斑, 顯示充分的防眩性,且亦未產生泛白。此外,配置在影像 顯示裝置時,亦顯示高對比。此外,如第2表所示,本發 明之防眩性偏光板A係由於使用以環氧系樹脂為主成分之 硬化性組成物作為接著劑,故耐水性亦高。 另一方面,能譜比Η,2/&quot;未滿足本發明的要件之比較 例1之防眩性偏光板C,係產生閃斑。此外,使用聚乙歸 醇系接著劑之比較例2之防眩性偏紐D,其耐水性差。 【圖式簡單說明】 示本發明之防眩性偏光板的較佳 第1圖係示意性地顯 一例之剖面圖。 第2圖係示意性地顯示本發明之防眩性偏光板所具備 之防眩膜的表面之透視圖。 第3圖係顯不離散地寐媒矣-4西^ &amp; — 欢地獲付表不標向之函數h(x,y)之狀 第4圖係以二維離散函數h(xy)來表示本發明之防眩 偏光板所具備之_層的細微凹凸表面的標高之圖的一 例。 不將第4圖所示之二維 第5圖係以白與黑的階度來表 322869 79 201140127 函數h ( x,y )進行離散傅利葉轉換所得之標高的能譜 H2(fx,fy)之圖。 第6圖係顯示第5圖所示之能譜H2(fx,fy)中的fx=〇時 之剖面的圖。 第7圖係用以說明細微凹凸表面之傾斜角度的測定方 法之示意圖。 第8圖係顯示防眩膜所具備之防眩層的細微凹凸表面 之傾斜角度分布的直方圖的一例之圖表。 第9圖係顯示為了製作本發明之防眩性偏光板所具備 的防眩膜而可使用之圖案的影像資料的一部分之圖。 第10圖係以白與黑的階度來表示將第9圖所示之階 調的二維函數g(X,y)進行離散傅利葉轉換所得之能譜 G2(fx,fy)之圖。 第11圖係顯示第10圖所示之能譜G\fx,fy)中的fx=〇 時之剖面的圖。 第12圖(a)至(e)係示意性地顯示模具的製造方法之 月1J半部分的較佳一例之圖。 第13圖(a)至(c)係示意性地顯示模具的製造方法之 後半部分的較佳一例之圖。 第14圖(a)及(b)係示意性地顯示在第1蝕刻步驟中 所形成之凹凸面,藉由第2蝕刻步驟予以鈍化之狀態的圖。 第15圖係顯示實施例1之模具製作時所使用的圖案 之圖。 第16圖係顯示實施例2之模具製作時所使用的圖案 322869 80 201140127 之圖。 2第17圖係表示第15圖及第16圖所示之圖案之能譜 中的fx=0時之剖面的圖。 【主要元件符號說明】 1 r\ 防眩膜 2 細微凹凸 3 防眩膜投影面 5 主法線方向 6 局部的法線 6a、6b、 6c、6d 法線向量 7 模具用基材 8 經研磨的表面 9 感光性樹脂膜 10 經曝光的區域 11 未曝光的區域 12 遮罩 13 無遮罩之處 15 第1表面凹凸形狀 16 鍍鉻層 17 鍍鉻表面 18 第2表面凹凸形狀 101 防眩層 102 透明支撐體 103a 第1接著劑層 103b 第2接著劑層 104 偏光膜 105 保護膜或光學補償層 322869 81In the case of St, the plurality of sheets are repeatedly arranged in a row to form a pattern == on the photosensitive resin film by the laser light _ the amount of the first (fourth) processing is 5, and the amount of the button is the formula (10). : Outside 'others and examples! The same operation: x ' "1 B. In addition to the use of the sample operation _ In addition to the use of the anti-glare film B, the other 322869 76 201140127 made the anti-glare polarizing plate B and the liquid crystal display device 6. Figure i6 The pattern shown is a band-pass filter for removing a low-frequency component of a frequency of ~4 or less and a high-frequency component of 0.135 W or more for a pattern in which a plurality of dots of _12_ are not arranged finely. Producer. <Comparative Example 1> The surface of pure 300 (JIS &lt; A5〇56) having a diameter of 300 coffee was mirror-polished, and a sand blasting apparatus (manufactured by Fuji Manufacturing Co., Ltd.) was used to apply blasting pressure G. 1 MPa (measured pressure), particle amount 8 g / em 2 (roll surface area per 1 cm 2 ) cerium oxide particles TZm 7 (T〇s〇h Co., Ltd., average particle size: 20 / zm) sandblasting The surface of the polished aluminum surface was formed with irregularities on the surface. The obtained aluminum roll with irregularities was subjected to electroless nickel plating to prepare a mold c. At this time, the thickness of the electroless nickel plating was set to 15 #m. Other than the obtained mold C, the same operation as in the embodiment An anti-glare film C was produced, and an anti-glare polarizing plate C and a liquid crystal display device C were produced in the same manner as in Example 1 except that the anti-glare film C was used. <Comparative Example 2> Kuraray Co., Ltd. The carboxy-modified polyvinyl alcohol "Kuraray Poval KL318" (modified degree 2 mol%) ι. 8 parts by weight dissolved in 100 parts by weight of water 'then added as Sumika as a water-soluble polyamide resin "Sumirez Resin 65" (a 30% by weight aqueous solution of a solid content) sold by Chemtex Co., Ltd. was dissolved in 1.5 parts by weight to prepare a polyvinyl alcohol-based adhesive. Next, after the saponification treatment is performed on the side of the anti-glare film which is formed with the anti-glare layer on the side opposite to the side of 322869 77 201140127, the above-mentioned polyethylene-based adhesive is applied to the surface by a bar coater. The surface was coated, and the polarizing film was laminated thereon. Further, the corona discharge treated surface of the norbornene-based resin (the same as in Example 1) which was subjected to corona discharge treatment as the surface of the protective film was coated with a rod. After applying the polyvinyl alcohol-based adhesive 1()_ to the coating machine, the decylene film is laminated on the side opposite to the side where the anti-glare film is bonded to the polarizing film. The face. Then, it was dried at 8 {rc for 5 minutes, and then aged at normal temperature for 1 day to obtain an anti-glare polarizing plate D. The results of the above [1] to [4] measurement and evaluation are summarized as follows! Table and Table 2. Further, Fig. 17 is a cross-sectional view showing fx = 中 in the energy spectrum G2 (fx' fy) obtained from the pattern used in the production of the mold A of the embodiment and the mold B of the second embodiment. From Fig. 17, it can be seen that the energy spectrum of the patterns used in the first and second embodiments does not have a maximum value in a spatial frequency range larger than 〇Mnfl and 〇 〇4 or less. Table 1 Example 1 Example 2 Comparative Example 1 Anti-glare polarizing plate A B C Mold A B C energy spectrum ratio h, vh22 19 4 41 Surface shape H3VH22 0. 002 0. 001 0. 003 Tilt angle 5. The ratio of the following surface 100 100 100 Optical characteristic haze (%) 0.4 0. 6 0.4 Anti-glare performance map 1 1 1 Whitening 1 1 1 Flash spot 1 1 3 Comparison 1950 1950 1950 78 322869 201140127 Table 2 Example 1 Implementing your financial water intrusion length (mm) 0. 5 2Α~^^ ----s From the results shown in Table 1, it is known that the anti-glare polarizing plate A and the prevention of all the requirements of the present invention are obtained. The glare polarizing plate B showed no flare at all, showed sufficient anti-glare property, and did not cause whitening. In addition, when configured on an image display device, high contrast is also displayed. Further, as shown in the second table, the anti-glare polarizing plate A of the present invention has a high water resistance because a curable composition containing an epoxy resin as a main component is used as an adhesive. On the other hand, the energy spectrum ratio 2, 2/&quot; the anti-glare polarizing plate C of Comparative Example 1 which did not satisfy the requirements of the present invention, produced a flare. Further, the antiglare property D of Comparative Example 2 using a polyethylene glycol-based adhesive was inferior in water resistance. BRIEF DESCRIPTION OF THE DRAWINGS A preferred first embodiment of the anti-glare polarizing plate of the present invention is a cross-sectional view schematically showing an example. Fig. 2 is a perspective view schematically showing the surface of an anti-glare film provided in the anti-glare polarizing plate of the present invention. Figure 3 shows the non-discretely 寐 寐 西 西 西 西 西 西 西 西 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第 第An example of the elevation of the fine uneven surface of the layer provided in the anti-glare polarizing plate of the present invention. The two-dimensional picture 5 shown in Fig. 4 is not shown in white and black. Table 322869 79 201140127 Function h ( x, y ) The energy spectrum H2 (fx, fy) of the elevation obtained by discrete Fourier transform Figure. Fig. 6 is a view showing a cross section of fx = 中 in the energy spectrum H2 (fx, fy) shown in Fig. 5. Fig. 7 is a schematic view for explaining a method of measuring the inclination angle of the fine uneven surface. Fig. 8 is a graph showing an example of a histogram of the oblique angle distribution of the fine uneven surface of the antiglare layer provided in the antiglare film. Fig. 9 is a view showing a part of image data of a pattern usable for producing an anti-glare film provided in the anti-glare polarizing plate of the present invention. Fig. 10 is a diagram showing the energy spectrum G2(fx, fy) obtained by performing discrete Fourier transform on the two-dimensional function g(X, y) of the gradation shown in Fig. 9 in white and black gradations. Fig. 11 is a view showing a section of fx = 中 in the energy spectrum G\fx, fy) shown in Fig. 10. Fig. 12 (a) to (e) are diagrams schematically showing a preferred example of the half of the month of the mold manufacturing method. Fig. 13 (a) to (c) are diagrams schematically showing a preferred example of the latter half of the method for manufacturing a mold. Fig. 14 (a) and (b) are diagrams schematically showing a state in which the uneven surface formed in the first etching step is passivated by the second etching step. Fig. 15 is a view showing a pattern used in the production of the mold of Example 1. Fig. 16 is a view showing a pattern 322869 80 201140127 used in the mold making of Example 2. Fig. 17 is a view showing a cross section at fx = 0 in the energy spectrum of the pattern shown in Figs. 15 and 16. [Main component symbol description] 1 r\ Anti-glare film 2 Fine bump 3 Anti-glare film projection surface 5 Main normal direction 6 Local normal 6a, 6b, 6c, 6d Normal vector 7 Mold base 8 Grinded Surface 9 Photosensitive resin film 10 Expoched area 11 Unexposed area 12 Mask 13 No mask 15 First surface uneven shape 16 Chrome plating layer 17 Chrome plated surface 18 Second surface uneven shape 101 Antiglare layer 102 Transparent support Body 103a first adhesive layer 103b second adhesive layer 104 polarizing film 105 protective film or optical compensation layer 322869 81

Claims (1)

201140127 七、申請專利範圍: 1. 一種防眩性偏光板,其具備:防眩臈,其具有透明支撐 體、及積層於前述透明支撐體上之具有凹凸表面之防眩 層,以及由聚乙稀醇系樹脂膜所構成之偏光膜,其係隔 介第1接著劑層而積層於前述透明支撐體之與前述防 眩層相反侧的面; 其中,前述第1接著劑層是由含有環氧系樹脂之硬 化性組成物的硬化物所構成; 空間頻率0. 01/ΖΠΓ1中之前述凹凸表面之標高的能 譜扎2與空間頻率〇. 〇4 β m-i中之前述凹凸表面之標高的 能譜W之比Hl2/H22係在1至20的範圍内; 空間頻率0. lym—1中之前述凹凸表面之標高的能 δ#Η3與空間頻率0. ηΓ1中之前述凹凸表面之標高的 能譜Η22之比H3VH22為〇. 1以下; 並且,前述凹凸表面包含95%以上之傾斜角度為 5 °以下的面。 •如申靖專利範圍第丨項所述之防眩性偏光板,其復具備 保5蔓膜’該保護膜係隔介第2接著劑層而積層於前述偏 光膜之與前述防眩膜相反側的面。 如申4專利範圍第2項所述之防眩性偏光板,其復具備 光子補彳員層’該光學補償層係積層於前述保護膜上。 如申凊專利範圍第3項所述之防眩性偏光板,其中,前 述光學補償層為光學補償膜。 如申研專利範圍第2項所述之防眩性偏光板,其中,前 1 322869 201140127 » 述第2接著劑層是由含有環氧系樹脂之硬化性組成物 的硬化物所構成。 6. 如申請專利範圍第1項所述之防眩性偏光板,其復具備 光學補償層,該光學補償層係隔介第2接著劑層而積層 於前述偏光膜之與前述防眩膜相反側的面。 7. 如申請專利範圍第6項所述之防眩性偏光板,其中,前 述光學補償層為光學補償膜。 8. 如申請專利範圍第6項所述之防眩性偏光板,其中,前 述第2接著劑層是由含有環氧系樹脂之硬化性組成物 的硬化物所構成。 9. 如申請專利範圍第1項所述之防眩性偏光板,其中,前 述偏光膜是由經單軸拉伸且吸附配向有二色性色素之 聚乙烯醇系樹脂膜所構成。 10. —種影像顯示裝置,其具備:申請專利範圍第1項所述 之防眩性偏光板、以及影像顯示元件; 其中,前述防眩性偏光板係以其防眩層側為外側而 配置在前述影像顯示元件的觀看側。 2 322869201140127 VII. Patent application scope: 1. An anti-glare polarizing plate, comprising: anti-glare, having a transparent support body, and an anti-glare layer having a concave-convex surface laminated on the transparent support body, and a polarizing film comprising a thin alcohol resin film, which is laminated on a surface of the transparent support opposite to the antiglare layer, via a first adhesive layer; wherein the first adhesive layer is a ring containing a ring The cured product of the curable composition of the oxygen-based resin; the energy spectrum of the elevation of the aforementioned concave-convex surface at a spatial frequency of 0.01/ΖΠΓ1 and the spatial frequency 〇. 标4 β mi of the aforementioned surface of the concave-convex surface The energy spectrum W ratio Hl2/H22 is in the range of 1 to 20; the spatial frequency is 0. lym-1 is the elevation of the aforementioned concave and convex surface energy δ#Η3 and the spatial frequency is 0. ηΓ1 is the elevation of the aforementioned concave and convex surface The energy spectrum Η22 ratio H3VH22 is 〇.1 or less; and the uneven surface includes 95% or more of the surface having an inclination angle of 5° or less. The anti-glare polarizing plate according to the above-mentioned item of the Shenjing patent scope, which has a protective coating film which is interposed between the second adhesive layer and laminated on the polarizing film opposite to the anti-glare film. Side face. The anti-glare polarizing plate according to claim 2, further comprising a photonic complement layer, wherein the optical compensation layer is laminated on the protective film. The anti-glare polarizing plate according to claim 3, wherein the optical compensation layer is an optical compensation film. The anti-glare polarizing plate according to the second aspect of the invention, wherein the first adhesive layer is composed of a cured product containing a curable composition of an epoxy resin. 6. The anti-glare polarizing plate according to claim 1, further comprising an optical compensation layer which is laminated on the polarizing film opposite to the anti-glare film by a second adhesive layer Side face. 7. The anti-glare polarizing plate according to claim 6, wherein the optical compensation layer is an optical compensation film. 8. The anti-glare polarizing plate according to claim 6, wherein the second adhesive layer is made of a cured product containing a curable composition of an epoxy resin. 9. The anti-glare polarizing plate according to claim 1, wherein the polarizing film comprises a polyvinyl alcohol-based resin film which is uniaxially stretched and adsorbed and has a dichroic dye. 10. An image display device comprising: an anti-glare polarizing plate according to claim 1; and an image display element; wherein the anti-glare polarizing plate is disposed such that an anti-glare layer side thereof is outside On the viewing side of the aforementioned image display element. 2 322869
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TWI569032B (en) * 2012-12-18 2017-02-01 Sumitomo Chemical Co Anti-glare polarizing plate and image display device
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CN102193132A (en) 2011-09-21

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