JP7500672B2 - 薬液供給ユニットとこれを適用した基板処理システム及び薬液供給方法 - Google Patents
薬液供給ユニットとこれを適用した基板処理システム及び薬液供給方法 Download PDFInfo
- Publication number
- JP7500672B2 JP7500672B2 JP2022141342A JP2022141342A JP7500672B2 JP 7500672 B2 JP7500672 B2 JP 7500672B2 JP 2022141342 A JP2022141342 A JP 2022141342A JP 2022141342 A JP2022141342 A JP 2022141342A JP 7500672 B2 JP7500672 B2 JP 7500672B2
- Authority
- JP
- Japan
- Prior art keywords
- chemical
- supply line
- chemical liquid
- line
- ipa
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000126 substance Substances 0.000 title claims description 321
- 239000007788 liquid Substances 0.000 title claims description 164
- 239000000758 substrate Substances 0.000 title claims description 94
- 238000012545 processing Methods 0.000 title claims description 79
- 238000000034 method Methods 0.000 title claims description 73
- 239000012535 impurity Substances 0.000 claims description 60
- 238000007689 inspection Methods 0.000 claims description 58
- 238000001228 spectrum Methods 0.000 claims description 36
- 239000003814 drug Substances 0.000 claims description 31
- 238000003860 storage Methods 0.000 claims description 29
- 239000000523 sample Substances 0.000 claims description 22
- 238000005259 measurement Methods 0.000 claims description 19
- 238000006243 chemical reaction Methods 0.000 claims description 18
- 229940079593 drug Drugs 0.000 claims description 17
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims description 16
- 238000001514 detection method Methods 0.000 claims description 13
- 238000007599 discharging Methods 0.000 claims description 9
- 238000004458 analytical method Methods 0.000 claims description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 170
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 14
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 238000010586 diagram Methods 0.000 description 10
- 238000012546 transfer Methods 0.000 description 10
- 238000012360 testing method Methods 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 5
- 230000002950 deficient Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 4
- 229940011051 isopropyl acetate Drugs 0.000 description 4
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000013098 chemical test method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
- B01D35/02—Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3577—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing liquids, e.g. polluted water
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/359—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using near infrared light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2200/00—Solutions for specific problems relating to chemical or physical laboratory apparatus
- B01L2200/14—Process control and prevention of errors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/06—Auxiliary integrated devices, integrated components
- B01L2300/0681—Filter
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2300/00—Additional constructional details
- B01L2300/08—Geometry, shape and general structure
- B01L2300/0861—Configuration of multiple channels and/or chambers in a single devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/04—Moving fluids with specific forces or mechanical means
- B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
- B01L2400/0457—Moving fluids with specific forces or mechanical means specific forces passive flow or gravitation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/06—Valves, specific forms thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N2021/3595—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using FTIR
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Pathology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Biochemistry (AREA)
- Power Engineering (AREA)
- Immunology (AREA)
- Computer Hardware Design (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Clinical Laboratory Science (AREA)
- Hematology (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
70 基板処理装置
100 薬液供給ユニット
110 薬液保管部
130 薬液供給ライン
150 薬液検査手段
170 ドレインライン
190 制御部
Claims (17)
- 薬液を保管する薬液保管部と、
前記薬液が流動する経路を提供する薬液供給ラインと、
前記薬液供給ライン上に流れる薬液に対して、分光検査法を介して、化学反応により生成された不純物を検出する薬液検査手段と、を含み、
前記薬液供給ラインは、両端が前記薬液保管部に連結される循環ラインと、前記循環ラインから基板処理装置に連結される分岐点を有し、
前記薬液供給ライン上において前記分岐点と前記薬液検査手段との間に配置され、前記薬液供給ライン上に流れる薬液を排出するドレインラインと、
前記薬液供給ライン上の前記ドレインラインとの連結部位の後段に配置され、前記薬液供給ラインを選択的に開閉させる第1バルブと、をさらに含むことを特徴とする、薬液供給ユニット。 - 前記薬液検査手段は、
フーリエ変換赤外分光器(FT-IR)又はフーリエ変換近赤外分光器(FT-NIR)を含むことを特徴とする、請求項1に記載の薬液供給ユニット。 - 前記薬液保管部は、IPAを保管し、
前記薬液供給ラインは、前記薬液保管部に保管されたIPAを供給することを特徴とする、請求項1に記載の薬液供給ユニット。 - 前記薬液検査手段は、
前記薬液供給ライン上のIPA誘導体を検出することを特徴とする、請求項3に記載の薬液供給ユニット。 - 前記薬液検査手段は、
分光スペクトル上で設定された波数(wave number)のピークの存在に基づいてIPA誘導体を検出することを特徴とする、請求項4に記載の薬液供給ユニット。 - 前記薬液検査手段は、
前記薬液供給ライン上に配置され、前記薬液供給ラインに流れる薬液に対して赤外線又は近赤外線を放出し、前記薬液を透過した光を検出する測定プローブと、
前記測定プローブで検出された光から分光スペクトルを取得するフーリエ変換器と、
前記分光スペクトルに基づいて不純物を判断する分析器と、を含むことを特徴とする、請求項1に記載の薬液供給ユニット。 - 前記薬液供給ライン上に配置されたフィルターをさらに含み、
前記測定プローブは、前記薬液供給ライン上の前記フィルターの後段に配置されたことを特徴とする、請求項6に記載の薬液供給ユニット。 - 前記ドレインラインに配置され、前記ドレインラインを選択的に開閉させる第2バルブと、
前記第1バルブと前記第2バルブを制御する制御部と、をさらに含むことを特徴とする、請求項1に記載の薬液供給ユニット。 - 前記制御部は、
前記薬液検査手段の検査結果に基づいて、前記第1バルブと前記第2バルブを選択的に制御することを特徴とする、請求項8に記載の薬液供給ユニット。 - 請求項1に記載の薬液供給ユニット、及び
前記薬液供給ユニットから薬液の供給を受けて基板を処理する前記基板処理装置を含むことを特徴とする、基板処理システム。 - 薬液保管部に保管された薬液を薬液供給ラインへ供給する薬液供給段階と、
前記薬液供給ライン上に流れる薬液に対して、薬液検査手段による分光検査法を介して、化学反応により生成された不純物を検出する不純物検出段階と、
不純物検出結果に基づいて基板処理装置へ薬液を供給するか或いは薬液を外部へ排出させる薬液供給判断段階と、を含み、
前記薬液供給ラインは、両端が前記薬液保管部に連結される循環ラインと、前記循環ラインから前記基板処理装置に連結される分岐点を有し、
前記薬液供給判断段階は、
設定された時間又は設定された容量に基づいて、前記薬液供給ライン上において前記分岐点と前記薬液検査手段との間に配置されるドレインラインを開放させる排出調節段階と、
不純物検出の際に、前記薬液供給ライン上の前記ドレインラインとの連結部位の後段に配置される第1バルブを介して前記薬液供給ラインを閉鎖させる薬液供給ライン閉鎖段階と、を含むことを特徴とする、薬液供給方法。 - 前記不純物検出段階は、
フーリエ変換赤外分光器(FT-IR)又はフーリエ変換近赤外分光器(FT-NIR)を介して前記薬液供給ライン上の不純物を検出することを特徴とする、請求項11に記載の薬液供給方法。 - 前記薬液供給段階は、
前記薬液保管部に保管されたIPAを前記薬液供給ラインに供給し、
前記不純物検出段階は、
前記薬液供給ライン上のIPA誘導体を検出することを特徴とする、請求項11に記載の薬液供給方法。 - 前記不純物検出段階は、
分光スペクトル上で設定された波数(wavenumber)のピークの存在に基づいてIPA誘導体を検出することを特徴とする、請求項13に記載の薬液供給方法。 - 前記薬液供給判断段階は、
前記ドレインライン上の第2バルブを介して、前記薬液供給ラインに流れる薬液を排出させるドレインライン開放段階をさらに含むことを特徴とする、請求項11に記載の薬液供給方法。 - 前記薬液供給判断段階は、
前記不純物検出段階を再実行し、不純物検出結果に基づいて薬液供給ライン閉鎖段階ないし排出調節段階を実行することを特徴とする、請求項11に記載の薬液供給方法。 - IPA薬液を保管する薬液保管部と、
IPA薬液が流動する経路を提供する薬液供給ラインと、
前記薬液供給ライン上に配置されたフィルターと、
前記薬液供給ライン上に流れる薬液を排出するドレインラインと、
前記薬液供給ライン上に前記ドレインラインの連結部位の後段に配置され、前記薬液供給ラインを選択的に開閉させる第1バルブと、
前記ドレインラインに配置され、前記ドレインラインを選択的に開閉させる第2バルブと、
前記薬液供給ライン上に配置され、前記薬液供給ラインに流れる薬液に対して赤外線又は近赤外線を放出し、前記薬液を透過した光を検出する測定プローブと、
前記測定プローブで検出された光から分光スペクトルを取得するフーリエ変換器と、
前記分光スペクトルに基づいてIPA誘導体を検出する分析器と、
前記分析器の分析結果に基づいて前記第1バルブと前記第2バルブを制御する制御部と、を含み、
前記薬液供給ラインは、両端が前記薬液保管部に連結される循環ラインと、前記循環ラインから基板処理装置に連結される分岐点を有し、
前記ドレインラインは、前記薬液供給ライン上において分岐点と前記測定プローブとの間に配置される、ことを特徴とする、薬液供給ユニット。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020210181000A KR20230092096A (ko) | 2021-12-16 | 2021-12-16 | 약액 공급 유닛과 이를 적용한 기판 처리 시스템 및 약액 공급 방법 |
KR10-2021-0181000 | 2021-12-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2023089921A JP2023089921A (ja) | 2023-06-28 |
JP7500672B2 true JP7500672B2 (ja) | 2024-06-17 |
Family
ID=86744117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022141342A Active JP7500672B2 (ja) | 2021-12-16 | 2022-09-06 | 薬液供給ユニットとこれを適用した基板処理システム及び薬液供給方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20230194422A1 (ja) |
JP (1) | JP7500672B2 (ja) |
KR (1) | KR20230092096A (ja) |
CN (1) | CN116266546A (ja) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002162342A (ja) | 2000-11-28 | 2002-06-07 | Jasco Corp | 液体用固定セル |
JP2012222070A (ja) | 2011-04-06 | 2012-11-12 | Japan Organo Co Ltd | 液体管理システム |
JP2012222071A (ja) | 2011-04-06 | 2012-11-12 | Japan Organo Co Ltd | 液体管理システム |
JP2013131531A (ja) | 2011-12-20 | 2013-07-04 | Japan Organo Co Ltd | 液体管理システム、および洗浄液の回収再生装置 |
JP2013131530A (ja) | 2011-12-20 | 2013-07-04 | Japan Organo Co Ltd | 液体管理システム、および洗浄液の回収再生装置 |
WO2018135408A1 (ja) | 2017-01-23 | 2018-07-26 | 株式会社トクヤマ | イソプロピルアルコール組成物及びイソプロピルアルコールの製造方法 |
JP2021519680A (ja) | 2018-03-30 | 2021-08-12 | フジフイルム エレクトロニック マテリアルズ ユー.エス.エー., インコーポレイテッド | 化学液体製造装置 |
-
2021
- 2021-12-16 KR KR1020210181000A patent/KR20230092096A/ko not_active Application Discontinuation
-
2022
- 2022-09-01 CN CN202211067257.XA patent/CN116266546A/zh active Pending
- 2022-09-06 JP JP2022141342A patent/JP7500672B2/ja active Active
- 2022-12-13 US US18/080,552 patent/US20230194422A1/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002162342A (ja) | 2000-11-28 | 2002-06-07 | Jasco Corp | 液体用固定セル |
JP2012222070A (ja) | 2011-04-06 | 2012-11-12 | Japan Organo Co Ltd | 液体管理システム |
JP2012222071A (ja) | 2011-04-06 | 2012-11-12 | Japan Organo Co Ltd | 液体管理システム |
JP2013131531A (ja) | 2011-12-20 | 2013-07-04 | Japan Organo Co Ltd | 液体管理システム、および洗浄液の回収再生装置 |
JP2013131530A (ja) | 2011-12-20 | 2013-07-04 | Japan Organo Co Ltd | 液体管理システム、および洗浄液の回収再生装置 |
WO2018135408A1 (ja) | 2017-01-23 | 2018-07-26 | 株式会社トクヤマ | イソプロピルアルコール組成物及びイソプロピルアルコールの製造方法 |
JP2021519680A (ja) | 2018-03-30 | 2021-08-12 | フジフイルム エレクトロニック マテリアルズ ユー.エス.エー., インコーポレイテッド | 化学液体製造装置 |
Also Published As
Publication number | Publication date |
---|---|
CN116266546A (zh) | 2023-06-20 |
US20230194422A1 (en) | 2023-06-22 |
JP2023089921A (ja) | 2023-06-28 |
KR20230092096A (ko) | 2023-06-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4054854B2 (ja) | 近赤外分光法を用いた液状試料の分析法 | |
US6762832B2 (en) | Methods and systems for controlling the concentration of a component in a composition with absorption spectroscopy | |
KR20020093924A (ko) | 동결 건조 프로세스를 모니터링하는 방법 | |
JP2773980B2 (ja) | 分光分析超臨界流体汚染モニタ | |
CN112041968B (zh) | 药液的异常检测装置、液处理装置、基片处理装置、药液的异常检测方法、液处理方法和基片处理方法 | |
US5536942A (en) | Method and arrangement for determining fibre properties by near-infrared-spectroscopy | |
CN106644970A (zh) | 一种利用紫外‑可见分光光度法同时测定溶液中亚甲基蓝和二价铜离子的三波长光谱方法 | |
DE102005030602A1 (de) | Gerät zum Trocknen von Substraten | |
JP7500672B2 (ja) | 薬液供給ユニットとこれを適用した基板処理システム及び薬液供給方法 | |
CN112697747A (zh) | 一种六氟化硫气体中分解物、水分和纯度检测装置和方法 | |
CN111610189B (zh) | 一种多组分气体浓度光学标定系统及方法 | |
CN104122221A (zh) | 中药提取过程动态趋势在线紫外分析方法 | |
CN102527094A (zh) | 一种用于变压器绝缘油的油气分离装置 | |
JPH0926391A (ja) | 重質油成分の定量方法及び装置 | |
Park et al. | A method for measuring the solubility of Disperse Red 60 in supercritical carbon dioxide using variable-volume view cell with in-situ UV–Vis spectrometer | |
JP4048139B2 (ja) | 濃度測定装置 | |
JPH09145611A (ja) | 半導体ウェーハの分析方法及び装置 | |
CN202404015U (zh) | 一种用于电气设备的脱气装置 | |
JP2006308549A (ja) | 配向膜の配向状態評価方法、液晶パネルの製造方法及び液晶パネルの検査方法 | |
JP2528111B2 (ja) | オゾン濃度計測方法および装置 | |
CN106841057A (zh) | 一种生物质预水解过程在线监测的方法与装置 | |
BR112016004599B1 (pt) | método para determinar o teor de siloxano de um gás por análise não dispersiva de infravermelhos e aparelho para determinar o teor de siloxano de um gás por análise não dispersiva de infravermelhos | |
JPH01165939A (ja) | 流動する液体中の異物質含分を測定する装置 | |
WO2024034216A1 (ja) | 燃焼ガス吸収液生成装置および燃焼イオンクロマトグラフ | |
CN217084655U (zh) | 多光路激光光声光谱油中溶解气体监测装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220906 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20231121 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240219 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20240528 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20240605 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7500672 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |