JP7475513B2 - 漏斗状ノズルの寸法ばらつきの低減 - Google Patents
漏斗状ノズルの寸法ばらつきの低減 Download PDFInfo
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- 238000000034 method Methods 0.000 claims description 99
- 239000000758 substrate Substances 0.000 claims description 96
- 238000005530 etching Methods 0.000 claims description 47
- 239000004065 semiconductor Substances 0.000 claims description 45
- 230000008569 process Effects 0.000 claims description 42
- 238000010438 heat treatment Methods 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 7
- 238000009623 Bosch process Methods 0.000 claims description 5
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 131
- 229920002120 photoresistant polymer Polymers 0.000 description 86
- 239000007788 liquid Substances 0.000 description 32
- 239000000463 material Substances 0.000 description 15
- 238000005086 pumping Methods 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 13
- 239000010703 silicon Substances 0.000 description 13
- 235000012431 wafers Nutrition 0.000 description 11
- 238000001312 dry etching Methods 0.000 description 10
- 239000012530 fluid Substances 0.000 description 10
- 239000012528 membrane Substances 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000007639 printing Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005323 electroforming Methods 0.000 description 2
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000001053 micromoulding Methods 0.000 description 2
- 241000237509 Patinopecten sp. Species 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 235000020637 scallop Nutrition 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1625—Manufacturing processes electroforming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14475—Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Drying Of Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
Claims (20)
- ノズルを形成する方法であって、該方法は、
基板の上層に、第1の幅を有する第1の開口を形成する工程、
前記第1の開口を形成する工程の後、パターン層が前記基板の上面に配置されるように、前記上面の第1の開口にまたがる第2の開口を画定し、前記基板の前記上面に、第1の幅より大きい第2の幅を有する前記第2の開口を有するパターン層を形成する工程であって、前記第2の開口が、前記基板の前記上面で終端する湾曲側面を有する工程、
前記基板の前記上面の前記第1の開口を通して前記基板の第2の層をエッチングして前記基板の前記第2の層に直立壁凹所を形成する工程であって、前記直立壁凹所が前記直立壁凹所の下面から前記基板の前記上面まで延び、実質的に一定の幅を有する工程、および
前記直立壁凹所が形成された後、前記パターン層の前記湾曲側面、前記基板の前記上面、および前記基板の前記第2の層をエッチングする工程を含み、エッチングにより、前記直立壁凹所が前記直立壁凹所の下面よりも前記基板の前記上面の方が広くなるようにする、方法。 - ステッパを使用して、前記基板の前記上面に前記パターン層を位置合わせする工程を含む、請求項1に記載の方法。
- 前記第1の開口を形成する工程は、ノンリフローレジストを用いて前記第1の開口をエッチングすることを含む、請求項1に記載の方法
- 前記基板は、半導体基板であり、前記上層は、ボッシュエッチングプロセスに対して高選択性を有する酸化物層である、請求項1に記載の方法。
- 前記基板の前記上面をエッチングして前記直立壁凹所を形成する工程は、ボッシュプロセスを用いて、前記パターン層の前記第2の開口を通して、前記基板の前記上面をエッチングする工程を含む、請求項1に記載の方法。
- 前記第2の開口の前記湾曲側面を形成するため、前記パターン層をリフローする工程を含む、請求項1に記載の方法。
- 前記パターン層をリフローする工程は、
前記第2の開口の上縁が丸みを帯びるようになるまで、加熱によって前記パターン層を軟化させる工程、および
加熱によって軟化させた後、前記第2の開口の前記上縁に丸みを帯びさせたまま、前記パターン層を再硬化させる工程を含む、請求項6に記載の方法。 - 前記パターン層を軟化する工程は、前記第2の開口が形成された前記パターン層を真空環境において加熱される工程を含む、請求項7に記載の方法。
- 前記パターン層がリフローするまで、前記第2の開口を有する前記パターン層を加熱することを含む、請求項8に記載の方法。
- 前記パターン層を再硬化させる工程は、前記第2の開口の前記上縁が丸みを帯びたまま、前記パターン層を冷却する工程を含む、請求項7に記載の方法。
- 前記直立壁凹所を形成するための前記エッチングは、前記パターン層および前記基板に対して実質的に同じエッチング速度を有する、請求項1に記載の方法。
- CF4/CHF3ガス混合物を使用して、前記基板の前記第2の層をエッチングすることを含む、請求項1に記載の方法。
- 前記第2の幅は、前記第1の幅よりも約1μm大きい、請求項1に記載の方法。
- 前記パターン層は、少なくとも10μmの厚さである、請求項1に記載の方法。
- ノズルを形成する方法であって、該方法は、
パターン層が基板の上面に配置されるように、前記上面の第1の開口にまたがる第2の開口を含み、前記基板の前記上面に、第1の幅より大きい第2の幅および前記基板の前記上面で終端する湾曲側面を有する前記第2の開口を有するパターン層を形成する工程であって、該パターン層を形成する前に上層に前記第1の開口を形成する工程、
前記基板の前記上面の前記第1の開口を通して前記基板の第2の層をエッチングして、前記基板の前記第2の層に直立壁凹所を形成し、前記上層の前記第1の開口の外縁が前記直立壁凹所の境界を画定する工程であって、前記直立壁凹所が前記直立壁凹所の下面から前記基板の上面まで延び、実質的に一定の幅を有する工程、および
前記直立壁凹所が形成された後、前記パターン層の前記湾曲側面、前記基板の前記上面、および前記基板の前記第2の層をエッチングする工程を含み、エッチングにより、前記直立壁凹所が前記直立壁凹所の下面よりも前記基板の前記上面の方が広くなるようにする、方法。 - 前記第2の開口の前記湾曲側面を形成するため、前記パターン層をリフローする工程を含む、請求項15に記載の方法。
- 前記パターン層をリフローする工程は、
前記第2の開口の上縁が丸みを帯びるようになるまで、加熱によって前記パターン層を軟化させる工程、および
加熱によって軟化させた後、前記第2の開口の前記上縁が丸みを帯びさせたまま、前記パターン層を再硬化させる工程を含む、請求項16に記載の方法。 - 前記パターン層を軟化する工程は、前記第2の開口が形成された前記パターン層を真空環境において加熱する工程を含む、請求項17に記載の方法。
- 前記パターン層がリフローするまで、前記第2の開口を有する前記パターン層を加熱することを含む、請求項18に記載の方法。
- 前記パターン層を再硬化させる工程は、前記第2の開口の前記上縁が丸みを帯びたまま、前記パターン層を冷却する工程を含む、請求項17に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/440,435 US10052875B1 (en) | 2017-02-23 | 2017-02-23 | Reducing size variations in funnel nozzles |
US15/440,435 | 2017-02-23 | ||
JP2021210868A JP7242826B2 (ja) | 2017-02-23 | 2021-12-24 | 漏斗状ノズルの寸法ばらつきの低減 |
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JP2021210868A Division JP7242826B2 (ja) | 2017-02-23 | 2021-12-24 | 漏斗状ノズルの寸法ばらつきの低減 |
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JP2023065675A JP2023065675A (ja) | 2023-05-12 |
JP7475513B2 true JP7475513B2 (ja) | 2024-04-26 |
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JP2019545754A Active JP7001698B2 (ja) | 2017-02-23 | 2018-02-22 | 漏斗状ノズルの寸法ばらつきの低減 |
JP2021210868A Active JP7242826B2 (ja) | 2017-02-23 | 2021-12-24 | 漏斗状ノズルの寸法ばらつきの低減 |
JP2023035642A Active JP7475513B2 (ja) | 2017-02-23 | 2023-03-08 | 漏斗状ノズルの寸法ばらつきの低減 |
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JP2019545754A Active JP7001698B2 (ja) | 2017-02-23 | 2018-02-22 | 漏斗状ノズルの寸法ばらつきの低減 |
JP2021210868A Active JP7242826B2 (ja) | 2017-02-23 | 2021-12-24 | 漏斗状ノズルの寸法ばらつきの低減 |
Country Status (5)
Country | Link |
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US (5) | US10052875B1 (ja) |
EP (2) | EP3585618B1 (ja) |
JP (3) | JP7001698B2 (ja) |
CN (2) | CN110461610B (ja) |
WO (1) | WO2018156753A1 (ja) |
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Publication number | Priority date | Publication date | Assignee | Title |
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US10052875B1 (en) * | 2017-02-23 | 2018-08-21 | Fujifilm Dimatix, Inc. | Reducing size variations in funnel nozzles |
JP7480839B2 (ja) | 2020-04-10 | 2024-05-10 | コニカミノルタ株式会社 | ノズル基板の製造方法 |
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US10850518B2 (en) | 2020-12-01 |
US20180236771A1 (en) | 2018-08-23 |
JP7001698B2 (ja) | 2022-01-20 |
US20230133379A1 (en) | 2023-05-04 |
CN110461610B (zh) | 2021-11-02 |
US20180326729A1 (en) | 2018-11-15 |
JP2020509948A (ja) | 2020-04-02 |
EP3585618B1 (en) | 2022-07-06 |
US10052875B1 (en) | 2018-08-21 |
US10471718B2 (en) | 2019-11-12 |
EP3585618A1 (en) | 2020-01-01 |
JP7242826B2 (ja) | 2023-03-20 |
EP4129693A2 (en) | 2023-02-08 |
JP2023065675A (ja) | 2023-05-12 |
WO2018156753A1 (en) | 2018-08-30 |
US11571895B2 (en) | 2023-02-07 |
CN110461610A (zh) | 2019-11-15 |
US20200070518A1 (en) | 2020-03-05 |
JP2022043224A (ja) | 2022-03-15 |
US20210031521A1 (en) | 2021-02-04 |
CN114179522A (zh) | 2022-03-15 |
CN114179522B (zh) | 2023-10-17 |
EP3585618A4 (en) | 2020-03-04 |
EP4129693A3 (en) | 2023-05-24 |
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