JP7416427B2 - 自己洗浄コーティング - Google Patents
自己洗浄コーティング Download PDFInfo
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- JP7416427B2 JP7416427B2 JP2020524453A JP2020524453A JP7416427B2 JP 7416427 B2 JP7416427 B2 JP 7416427B2 JP 2020524453 A JP2020524453 A JP 2020524453A JP 2020524453 A JP2020524453 A JP 2020524453A JP 7416427 B2 JP7416427 B2 JP 7416427B2
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- coating
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- cleaning
- photocatalytic
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Description
有機媒体中にプラズモニックナノ粒子を含む第1の分散体を提供することと、
有機媒体中に光触媒マトリックスの前駆体を含む第2の分散体を提供することと、
第1および第2の分散体の混合物を形成することと、
混合物を表面にコーティングすることと、
コーティングした混合物を焼成することと、を含む。
第1の溶液は、酸をさらに含むことができる。
プラズモニックナノ粒子を含む第1の分散体を提供することと、
光触媒マトリックスの前駆体を含む第2の分散体(例えば、溶液)を提供することと、
第1および第2の分散体の混合物を形成することと、
混合物を表面にコーティングすることと、
コーティングした混合物を焼成することと、を含む。
このようにして、自己洗浄コーティングは、好都合に十分に分散されたプラズモニックナノ粒子によって得ることができ、これは、比較的単純で経済的な方法である。
第1の実施例において、エタノール(すなわち、溶媒)中のAuプラズモニックナノ粒子の分散体を、反応容器中で水および酢酸と混合した。その後に、チタン(IV)イソプロポキシドの光触媒マトリックス前駆体エタノール溶液(すなわち、溶媒)を、攪拌しながら、反応容器に滴下して加え、それによって、ゾルを得た。次いで、スピンコーティングまたはディップコーティングによってゾルを基材にコーティングした。コーティングしたゾルを550℃で焼成し、透明な自己洗浄コーティングを形成した。
以下、プラズモン改質透明薄膜のためのいくつかの特徴付け結果を提示する。これらの薄膜を得るために、ゾルゲルプロセス中に、PVP安定化ナノ粒子をEtOH中に分散させて、TiO2マトリックスに組み込まれる混合物2(図1)に加えた。薄膜は、結果として生じるゾルを同じ粘度でスピンコーティングすることによって、シリコン基板およびガラス基板の両方に堆積させた。シリコンウエハ上の膜厚さに対するスピンコーティング速度および粘度の効果の以前の実験は、コーティングゾルの粘度を変化させることが、(図5(a)に示されるように)膜厚さに対して限定された影響しか有しないことを示している。一方で、スピン速度を変化させることは、図5(b)で証明されるように、明らかに、膜厚さに影響を及ぼしている。これらの結果に基づいて、プラズモン改質薄膜について、1000rpmのスピンコーティング速度を使用することを選択し、(図5(b)に示されるように)±94nmの層厚さをもたした。顕微鏡ガラススライドに対して行われる類似する実験は、この基材を使用したときに、層厚さ全体が若干小さいことを示した(図5(a)の白丸)。
Claims (7)
- 自己洗浄コーティングを形成するための方法であって、
a.有機媒体中に3nm~200nmのサイズを有するプラズモニックナノ粒子を懸濁することによって、プラズモニックナノ粒子を含む第1の分散体を提供することと、
b.有機媒体中に光触媒マトリックスの前駆体を含む第2の分散体を提供することと、
c.前記第1および第2の分散体の混合物を形成することと、
d.前記混合物を表面にコーティングすることと、
e.前記コーティングした混合物を焼成することと、を含み、
前記プラズモニックナノ粒子が、前記有機溶剤中に懸濁する前に、安定化剤によってキレート化され、それにより分散体が安定し、前記安定化剤が、前記有機溶剤の前記プラズモニックナノ粒子の前記分散体を安定させるのに適している、方法。 - 前記プラズモニックナノ粒子が、貴金属を含み、および/または前記光触媒マトリックスの前記前駆体が、TiO2の前駆体である、請求項1に記載の方法。
- 前記第1および第2の分散体の前記混合物を形成する工程cが、ゾルを形成することを含む、請求項1または2に記載の方法。
- 前記混合物を表面にコーティングする工程dが、ウェットコーティング技法を適用することを含む、請求項1~3のいずれかに記載の方法。
- 前記コーティングした混合物を焼成する工程eが、前記コーティングした混合物を、300℃~800℃の温度に加熱することを含む、請求項1~4のいずれかに記載の方法。
- 前記第2の分散体が、有機溶剤をさらに含む、請求項1~5のいずれかに記載の方法。
- 前記第1の溶液が、酸をさらに含む、請求項1~6のいずれかに記載の方法。
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PCT/EP2018/079983 WO2019086594A1 (en) | 2017-11-02 | 2018-11-02 | Self-cleaning coating |
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FR2857030B1 (fr) | 2003-07-01 | 2006-10-27 | Saint Gobain | Procede de depot d'oxyde de titane par source plasma |
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US20100062032A1 (en) * | 2008-09-09 | 2010-03-11 | Guardian Industries Corp. | Doped Titanium Dioxide Coatings and Methods of Forming Doped Titanium Dioxide Coatings |
JPWO2011059101A1 (ja) * | 2009-11-16 | 2013-04-04 | タムネットワーク株式会社 | 光触媒コーティング |
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