JP7415235B2 - Tft用ガラス基板 - Google Patents
Tft用ガラス基板 Download PDFInfo
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- JP7415235B2 JP7415235B2 JP2022073325A JP2022073325A JP7415235B2 JP 7415235 B2 JP7415235 B2 JP 7415235B2 JP 2022073325 A JP2022073325 A JP 2022073325A JP 2022073325 A JP2022073325 A JP 2022073325A JP 7415235 B2 JP7415235 B2 JP 7415235B2
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- 239000011521 glass Substances 0.000 title claims description 268
- 239000000758 substrate Substances 0.000 title claims description 86
- 238000005498 polishing Methods 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 87
- 238000004519 manufacturing process Methods 0.000 description 39
- 238000000034 method Methods 0.000 description 33
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 27
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 24
- 239000011737 fluorine Substances 0.000 description 24
- 229910052731 fluorine Inorganic materials 0.000 description 24
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 20
- 238000005530 etching Methods 0.000 description 19
- 238000012545 processing Methods 0.000 description 14
- 238000010583 slow cooling Methods 0.000 description 12
- 238000005507 spraying Methods 0.000 description 10
- 230000005611 electricity Effects 0.000 description 8
- 239000005329 float glass Substances 0.000 description 8
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- 238000005192 partition Methods 0.000 description 8
- 230000003068 static effect Effects 0.000 description 8
- 238000000137 annealing Methods 0.000 description 7
- 238000007664 blowing Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 239000006060 molten glass Substances 0.000 description 7
- 238000006124 Pilkington process Methods 0.000 description 6
- 238000004381 surface treatment Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- ATJFFYVFTNAWJD-NJFSPNSNSA-N tin-121 Chemical compound [121Sn] ATJFFYVFTNAWJD-NJFSPNSNSA-N 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000009499 grossing Methods 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000003280 down draw process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229920004449 Halon® Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- OBCUTHMOOONNBS-UHFFFAOYSA-N phosphorus pentafluoride Chemical compound FP(F)(F)(F)F OBCUTHMOOONNBS-UHFFFAOYSA-N 0.000 description 1
- WKFBZNUBXWCCHG-UHFFFAOYSA-N phosphorus trifluoride Chemical compound FP(F)F WKFBZNUBXWCCHG-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- JOHWNGGYGAVMGU-UHFFFAOYSA-N trifluorochlorine Chemical compound FCl(F)F JOHWNGGYGAVMGU-UHFFFAOYSA-N 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B18/00—Shaping glass in contact with the surface of a liquid
- C03B18/02—Forming sheets
- C03B18/20—Composition of the atmosphere above the float bath; Treating or purifying the atmosphere above the float bath
- C03B18/22—Controlling or regulating the temperature of the atmosphere above the float tank
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/064—Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B18/00—Shaping glass in contact with the surface of a liquid
- C03B18/02—Forming sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/04—Annealing glass products in a continuous way
- C03B25/06—Annealing glass products in a continuous way with horizontal displacement of the glass products
- C03B25/08—Annealing glass products in a continuous way with horizontal displacement of the glass products of glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Nonlinear Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mathematical Physics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Description
無アルカリガラスであることにより、ガラス板10に含まれるアルカリ成分が継時変化によって溶出してガラス表面に形成したTFT等に悪影響を及ぼすことが無くなる。なお、本明細書について、「無アルカリ」とはアルカリ成分を厳密な意味で完全に含まないのではなく、不純物として含む程度は許容する概念を指す。具体的には、例えば0.01質量%程度は許容する。
Asystモード,scan size:5μm×5μm、scan rate:0.977Hzの条件で測定した。その後、2次の傾き補正をした上で上記範囲内の算術平均粗さ(Ra)を算出した。
10 ガラス板
11 第1主面
12 第2主面
13 第1辺
14 第2辺
15 第1断面
16 凸部
20 粗面化領域
21 非粗面化領域
30 第1領域
31 第2領域
100 フロートガラス製造装置
200 インジェクタ
Claims (9)
- 第1主面と、前記第1主面と対向する第2主面とを備えた矩形のガラス板より構成され、
前記ガラス板の板厚方向からの視野において、互いに隣り合う第1辺と第2辺とを有し、
前記第1辺と前記第2辺との長さが、少なくとも1200mm以上であり、
前記ガラス板の板厚方向の断面のうち、前記第1辺と平行な直線に沿った第1断面において、当該ガラス板の板厚の最大値と板厚の最小値の差である板厚公差が6.26μm未満であり、
前記ガラス板の板厚方向のあらゆる断面において、前記板厚公差が7.12μm未満である、TFT用ガラス基板。 - 前記第1断面において、前記板厚の一次微分値の絶対値の平均値が1.72E-02未満である、請求項1に記載のTFT用ガラス基板。
- 前記第1断面において、前記板厚の一次微分値の絶対値の標準偏差が1.5E-03以下である、請求項1に記載のTFT用ガラス基板。
- 前記第1断面において、前記板厚の二次微分値の絶対値の最大値が6.0E-03以下である、請求項1から3のいずれか1項に記載のTFT用ガラス基板。
- 前記第1断面において、前記板厚の二次微分値の絶対値の標準偏差が1.5E-04以下である、請求項1から4のいずれか1項に記載のTFT用ガラス基板。
- 前記ガラス板のガラス組成が、無アルカリガラスである請求項1から5のいずれか1項に記載のTFT用ガラス基板。
- 前記ガラス板は、前記第1主面及び前記第2主面のうち、少なくとも一方において、研磨傷を有さない請求項1から6のいずれか1項に記載のTFT用ガラス基板。
- 前記ガラス板の厚さは1.0mm以下である請求項1から7のいずれか1項に記載のTFT用ガラス基板。
- 前記ガラス板は、前記第1主面及び前記第2主面のうち、少なくとも一方において、バルクの水分量に対し、80%以下の水分量である層を、10μm以上有する請求項1から8のいずれか1項に記載のTFT用ガラス基板。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017155468 | 2017-08-10 | ||
JP2017155468 | 2017-08-10 | ||
JP2018138799A JP7070197B2 (ja) | 2017-08-10 | 2018-07-24 | Tft用ガラス基板 |
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JP2018138799A Division JP7070197B2 (ja) | 2017-08-10 | 2018-07-24 | Tft用ガラス基板 |
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JP2022106863A JP2022106863A (ja) | 2022-07-20 |
JP7415235B2 true JP7415235B2 (ja) | 2024-01-17 |
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JP2022073325A Active JP7415235B2 (ja) | 2017-08-10 | 2022-04-27 | Tft用ガラス基板 |
Country Status (4)
Country | Link |
---|---|
US (1) | US10882775B2 (ja) |
JP (1) | JP7415235B2 (ja) |
KR (2) | KR102587508B1 (ja) |
CN (3) | CN115925234A (ja) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009013049A (ja) | 2007-06-08 | 2009-01-22 | Nippon Electric Glass Co Ltd | 無アルカリガラスおよび無アルカリガラス基板 |
JP2011016705A (ja) | 2009-07-10 | 2011-01-27 | Nippon Electric Glass Co Ltd | フィルム状ガラスの製造方法及び製造装置 |
JP2011246345A (ja) | 2010-05-26 | 2011-12-08 | Corning Inc | 流れている溶融ガラスリボンの厚さを制御する方法および装置 |
JP2013133246A (ja) | 2011-12-26 | 2013-07-08 | Nippon Electric Glass Co Ltd | 帯状ガラスの製造方法 |
WO2013136949A1 (ja) | 2012-03-14 | 2013-09-19 | 旭硝子株式会社 | フロートガラス板およびその製造方法 |
WO2014148604A1 (ja) | 2013-03-21 | 2014-09-25 | 日本電気硝子株式会社 | ガラス基板生産管理システム及びガラス基板生産管理方法 |
JP2019034878A (ja) | 2017-08-10 | 2019-03-07 | Agc株式会社 | Tft用ガラス基板 |
JP2020508958A (ja) | 2017-02-28 | 2020-03-26 | コーニング インコーポレイテッド | 厚み変動を抑制したガラス物品、その製造方法、及びそのための装置 |
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JP5623001B2 (ja) | 2007-12-25 | 2014-11-12 | 日本電気硝子株式会社 | ガラス基板 |
JP5733600B2 (ja) * | 2009-07-03 | 2015-06-10 | 日本電気硝子株式会社 | 素子封止体の製造方法、及び素子封止体 |
KR20140129153A (ko) * | 2012-02-08 | 2014-11-06 | 코닝 인코포레이티드 | 캐리어로 플렉시블 유리를 가공하는 방법 |
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2018
- 2018-08-09 US US16/059,525 patent/US10882775B2/en active Active
- 2018-08-09 KR KR1020180092884A patent/KR102587508B1/ko active IP Right Grant
- 2018-08-09 CN CN202211639141.9A patent/CN115925234A/zh active Pending
- 2018-08-09 CN CN201810902930.4A patent/CN109387967A/zh active Pending
- 2018-08-09 CN CN202211640054.5A patent/CN116332482A/zh active Pending
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2022
- 2022-04-27 JP JP2022073325A patent/JP7415235B2/ja active Active
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2023
- 2023-09-25 KR KR1020230127661A patent/KR20230143596A/ko not_active Application Discontinuation
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009013049A (ja) | 2007-06-08 | 2009-01-22 | Nippon Electric Glass Co Ltd | 無アルカリガラスおよび無アルカリガラス基板 |
JP2011016705A (ja) | 2009-07-10 | 2011-01-27 | Nippon Electric Glass Co Ltd | フィルム状ガラスの製造方法及び製造装置 |
JP2011246345A (ja) | 2010-05-26 | 2011-12-08 | Corning Inc | 流れている溶融ガラスリボンの厚さを制御する方法および装置 |
JP2013133246A (ja) | 2011-12-26 | 2013-07-08 | Nippon Electric Glass Co Ltd | 帯状ガラスの製造方法 |
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US10882775B2 (en) | 2021-01-05 |
CN115925234A (zh) | 2023-04-07 |
KR20230143596A (ko) | 2023-10-12 |
CN116332482A (zh) | 2023-06-27 |
KR102587508B1 (ko) | 2023-10-11 |
US20190047892A1 (en) | 2019-02-14 |
CN109387967A (zh) | 2019-02-26 |
JP2022106863A (ja) | 2022-07-20 |
KR20190017679A (ko) | 2019-02-20 |
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