JP7410028B2 - 3dグラフェン - Google Patents
3dグラフェン Download PDFInfo
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- JP7410028B2 JP7410028B2 JP2020531825A JP2020531825A JP7410028B2 JP 7410028 B2 JP7410028 B2 JP 7410028B2 JP 2020531825 A JP2020531825 A JP 2020531825A JP 2020531825 A JP2020531825 A JP 2020531825A JP 7410028 B2 JP7410028 B2 JP 7410028B2
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 510
- 229910021389 graphene Inorganic materials 0.000 title claims description 208
- 229910052799 carbon Inorganic materials 0.000 claims description 286
- 239000000463 material Substances 0.000 claims description 265
- 239000000758 substrate Substances 0.000 claims description 230
- 238000000034 method Methods 0.000 claims description 84
- 229920001721 polyimide Polymers 0.000 claims description 35
- 229920000642 polymer Polymers 0.000 claims description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 18
- 239000010703 silicon Substances 0.000 claims description 18
- 229910052710 silicon Inorganic materials 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 10
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 2
- 229910002601 GaN Inorganic materials 0.000 claims 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 239000010410 layer Substances 0.000 description 17
- -1 poly(methyl methacrylate) Polymers 0.000 description 12
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- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 229920002223 polystyrene Polymers 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 239000002019 doping agent Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 7
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- 125000003118 aryl group Chemical group 0.000 description 6
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- 229910002804 graphite Inorganic materials 0.000 description 6
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- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
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- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- CMCBDXRRFKYBDG-UHFFFAOYSA-N 1-dodecoxydodecane Chemical compound CCCCCCCCCCCCOCCCCCCCCCCCC CMCBDXRRFKYBDG-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 241001082241 Lythrum hyssopifolia Species 0.000 description 1
- 229920002675 Polyoxyl Polymers 0.000 description 1
- 241000533293 Sesbania emerus Species 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 229920004890 Triton X-100 Polymers 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 1
- CKUAXEQHGKSLHN-UHFFFAOYSA-N [C].[N] Chemical compound [C].[N] CKUAXEQHGKSLHN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 150000001298 alcohols Polymers 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000000089 atomic force micrograph Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- SYELZBGXAIXKHU-UHFFFAOYSA-N dodecyldimethylamine N-oxide Chemical compound CCCCCCCCCCCC[N+](C)(C)[O-] SYELZBGXAIXKHU-UHFFFAOYSA-N 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000002847 impedance measurement Methods 0.000 description 1
- 229920005610 lignin Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- CSJDCSCTVDEHRN-UHFFFAOYSA-N methane;molecular oxygen Chemical compound C.O=O CSJDCSCTVDEHRN-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 239000002074 nanoribbon Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 229920002113 octoxynol Polymers 0.000 description 1
- 229940066429 octoxynol Drugs 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000000678 plasma activation Methods 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004626 polylactic acid Substances 0.000 description 1
- ODGAOXROABLFNM-UHFFFAOYSA-N polynoxylin Chemical compound O=C.NC(N)=O ODGAOXROABLFNM-UHFFFAOYSA-N 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000000244 polyoxyethylene sorbitan monooleate Substances 0.000 description 1
- 229920000136 polysorbate Polymers 0.000 description 1
- 229950008882 polysorbate Drugs 0.000 description 1
- 229940068977 polysorbate 20 Drugs 0.000 description 1
- 229940068968 polysorbate 80 Drugs 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 125000006160 pyromellitic dianhydride group Chemical class 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000013464 silicone adhesive Substances 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
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- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
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- 229920006344 thermoplastic copolyester Polymers 0.000 description 1
- 229920006345 thermoplastic polyamide Polymers 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B1/00—Single-crystal growth directly from the solid state
- C30B1/02—Single-crystal growth directly from the solid state by thermal treatment, e.g. strain annealing
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Carbon And Carbon Compounds (AREA)
- Laser Beam Processing (AREA)
Description
3Dグラフェンを以下に説明し図1~4に例示する方法によりシリコン基板上に堆積させ、付着させた。図1に示すように、600μmの厚みのシリコン基板1を、120μmの厚みのポリイミドフィルム上に直接配置した。
以下に説明し図7~10に例示する方法により、3Dグラフェンをポリスチレン基板に堆積させ、付着させた。図7に示すように、厚みが25μmのポリイミドフィルム8を厚みが600μmのポリスチレン基板9上に直接配置した。
Claims (21)
- 基板に付着した3Dグラフェン材料を形成する方法であって:炭素含有材料を含む炭素源を基板表面に直接接することと;前記炭素源の少なくとも一部及び/又は前記基板の少なくとも一部をレーザービームに曝露し、それにより、前記炭素源の少なくとも一部を前記基板に付着した3Dグラフェン材料に転化させ、前記レーザービームによって形成された界面層を介して、前記界面層が前記3Dグラフェン材料を前記基板に結合させることと;を含み、ここで、前記基板がシリコン、二酸化シリコン、窒化ガリウム、砒化ガリウム、酸化亜鉛の1種又は複数種である、方法。
- 前記炭素源は、炭素含有材料を含む予め形成されたシートであり、前記炭素源の少なくとも一部の、前記基板に付着した前記3Dグラフェン材料への転化は、前記予め形成されたシートから前記基板表面に炭素を転写することと、前記基板に付着した3Dグラフェン材料を形成することと、を含む、請求項1に記載の方法。
- 前記3Dグラフェン材料に転化しなかった前記炭素源の1つ又は複数の未転化部分を前記基板表面から除去することを更に含む、請求項1又は請求項2に記載の方法。
- 前記炭素源は1種又は複数種のポリマーを含む、請求項1~3のいずれか一項に記載の方法。
- 前記基板は、前記レーザービームに対し実質的に透明である1種又は複数種の材料を含
む、請求項1~4のいずれか一項に記載の方法。 - 前記基板は、前記レーザービームの入射光を、前記レーザービームの1つ又は複数の波
長において60%超を吸収する、請求項1~5のいずれか一項に記載の方法。 - 前記レーザービームはパルスレーザービームである、請求項1~6のいずれか一項に記載の方法。
- 大気圧及び室温下に実施される、請求項1~7のいずれか一項に記載の方法。
- 前記基板に付着した前記3Dグラフェン材料を形成することは、同時に、炭素を前記炭素源から前記基板表面に転写することと、前記3Dグラフェン材料を形成することと、前記3Dグラフェン材料を前記基板に付着させることとを含む、請求項1~8のいずれか一項に記載の方法。
- 前記炭素源が、前記レーザービームによって500℃~2000℃の間の温度に加熱される、請求項1~9のいずれか一項に記載の方法。
- 前記炭素源が、前記レーザービームによって800℃~1030℃の間の温度に加熱される、請求項10に記載の方法。
- 前記炭素源が、厚みが5μm~120μmのシートである、請求項1~11のいずれか一項に記載の方法。
- 前記レーザービームが赤外レーザービームである、請求項1~12のいずれか一項に記載の方法。
- 前記レーザービームがCO2レーザービームである、請求項13に記載の方法。
- 前記レーザービームが10.6μmの波長である、請求項13又は14に記載の方法。
- 前記炭素源の少なくとも一部及び/又は前記基板の少なくとも一部を曝露する前記レーザービームが、1μm~100μmの間のFWHM(半値全幅)ビーム幅を有する、請求項1~15のいずれか一項に記載の方法。
- 前記炭素源の少なくとも一部及び/又は前記基板の少なくとも一部を曝露する前記レーザービームが、1.2W~24Wの間の出力を有する、請求項1~16のいずれか一項に記載の方法。
- 前記炭素源の少なくとも一部及び/又は前記基板の少なくとも一部を曝露する前記レーザービームが、1μs~50μsの間のパルス幅を有するパルスレーザービームである、請求項1~17のいずれか一項に記載の方法。
- 前記基板に付着した前記3Dグラフェン材料は、5μm~20μmの間の厚みである、請求項1~18のいずれか一項に記載の方法。
- 前記基板に付着した前記3Dグラフェン材料は、20μm~45μmの間の厚みである、請求項1~19のいずれか一項に記載の方法。
- 前記炭素源が、ポリイミドフィルムであり、形成された前記3Dグラフェンは、前記ポリイミドフィルムの厚み全体に延在していない、請求項1~20のいずれか一項に記載の方法。
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EP17187835.8A EP3447026A1 (en) | 2017-08-24 | 2017-08-24 | 3d graphene |
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PCT/GB2018/052408 WO2019038558A1 (en) | 2017-08-24 | 2018-08-24 | GRAPHENE IN 3D |
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IT201900013092A1 (it) * | 2019-07-26 | 2021-01-26 | Torino Politecnico | Elettrodi ottenuti mediante scrittura laser di fibre polimeriche per applicazioni e-Textile |
WO2022038694A1 (ja) * | 2020-08-19 | 2022-02-24 | シャープ株式会社 | 表示装置およびその製造方法 |
CN112358322A (zh) * | 2020-10-13 | 2021-02-12 | 西安理工大学 | 一种基于飞秒激光的复合材料表面石墨烯涂层制备方法 |
GB202016447D0 (en) | 2020-10-16 | 2020-12-02 | Rd Graphene Ltd | Supercapacitor |
CN112265983B (zh) * | 2020-10-29 | 2023-11-07 | 中国林业科学研究院林产化学工业研究所 | 木质素石墨烯及其制备方法 |
CN112967889B (zh) * | 2021-01-25 | 2022-05-13 | 青岛农业大学 | 一种木质素基高面积比电容的超级电容材料及其制备方法和应用 |
CN113753880B (zh) * | 2021-08-27 | 2022-11-01 | 北京航空航天大学 | 一种3d打印制备三维石墨烯结构的方法 |
CA3242062A1 (en) | 2021-12-23 | 2023-06-29 | Marco CAFFIO | Laser-induced carbon nanostructures |
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IL272354A (en) | 2020-03-31 |
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