JP7390997B2 - 成膜装置 - Google Patents
成膜装置 Download PDFInfo
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- JP7390997B2 JP7390997B2 JP2020154720A JP2020154720A JP7390997B2 JP 7390997 B2 JP7390997 B2 JP 7390997B2 JP 2020154720 A JP2020154720 A JP 2020154720A JP 2020154720 A JP2020154720 A JP 2020154720A JP 7390997 B2 JP7390997 B2 JP 7390997B2
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- film
- target
- film forming
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- workpiece
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Description
内部を真空とすることが可能なチャンバと、
前記チャンバ内に設けられ、ワークを円周の搬送経路に沿って循環搬送する回転テーブルと、
前記ワークに堆積されて膜となる成膜材料を含み形成され、前記回転テーブルにより循環搬送される前記ワークに対向し、前記回転テーブルの回転中心からの半径方向の距離が異なる位置に設けられた複数のターゲットと、
前記ターゲットからの前記成膜材料が飛散する領域を囲む成膜室を形成し、前記回転テーブルにより循環搬送される前記ワークに対向する側に開口を有するシールド部材と、
前記成膜室にスパッタガスを導入するスパッタガス導入部と、前記ターゲットに電力を印加する電源部とを有し、前記ターゲットに電力を印加させることにより前記成膜室内のスパッタガスにプラズマを発生させるプラズマ発生器と、
を有し、
前記開口を狭めることにより、前記ターゲットから飛散する前記成膜材料を遮蔽する遮蔽板を有し、
前記遮蔽板が前記開口を覆う面積の割合が、前記回転中心から最も遠いターゲットに対向する領域よりも、前記回転中心に最も近いターゲットに対向する領域が大きく、
前記回転中心から最も遠いターゲットに対向する領域は、前記開口で画される領域を、前記回転中心を中心とする同心円によって区切られた環状扇形の領域であって、前記回転中心から最も遠いターゲットの直下を含み、他のターゲットの直下を含まない領域であり、
前記回転中心から最も近いターゲットに対向する領域は、前記環状扇形の領域であって、前記回転中心から最も近いターゲットの直下を含み、他のターゲットの直下を含まない領域である。
[概要]
図1の透視平面図及び図2の断面図に示すように、成膜装置1は、スパッタリングによりワークW上に成膜を行う装置である。ワークWとしては、ガラス基板やウェーハ等を用いる。但し、スパッタリングによる成膜対象となるものであれば、ワークWとすることができる。この成膜装置1は、チャンバ10、排気部20、回転テーブル30、成膜部40、膜処理部50、移送チャンバ60、冷却装置70、制御部80を有する。
[チャンバ]
チャンバ10は、図1に示すように、円柱形状の容器である。チャンバ10の内部には、3つの成膜部40、1つの膜処理部50が配置されている。また、チャンバ10には、2つの成膜部40の間の領域に、移送チャンバ60が接続されている。
排気部20は、配管及び図示しないポンプ、バルブ等を含む負圧回路を有する。排気部20は、チャンバ10に設けられた排気口11に接続されている。排気部20は、排気口11を通じた排気により、チャンバ10内を減圧して真空とする。
回転テーブル30は、円盤形状を有し、側壁10cの内周面と接触しない程度に、チャンバ10内に大きく拡がっている。回転テーブル30は金属製であり、例えばステンレス鋼の板状部材の表面に酸化アルミニウムを溶射したものとすることができる。
成膜部40は、プラズマを生成し、成膜材料から構成されるターゲット42を該プラズマに曝す。これにより、成膜部40は、プラズマに含まれるイオンを成膜材料に衝突させて、叩き出された成膜材料の粒子をワークW上に堆積させる成膜を行う。図2に示すように、この成膜部40は、ターゲット42、バッキングプレート43及び電極44で構成されるスパッタ源と、成膜室45を形成するシールド部材90と、電源部46及びスパッタガス導入部47で構成されるプラズマ発生器と、を備える。
ターゲット42A:2.99kw
ターゲット42B:4.43kw
ターゲット42C:8.00kw
すると、ターゲット42Cに対向する領域γを通過する箇所には、ヒロックが発生しなかった。
膜処理部50は、プロセスガスG2が導入された処理空間S内で、誘導結合プラズマ(Inductively Coupled Plasma)を生成する。これにより、成膜部40によってワークW上に生成された膜に対して、膜処理を行う。膜処理は、成膜により堆積した膜の性質を変化させる処理であり、酸化、窒化、エッチング、アッシング、洗浄等の処理を含む。例えば、膜処理として、酸化を行う場合、酸素ガスをプラズマ化して化学種を発生させる。発生した化学種に含まれる酸素イオンは、ワークW上の膜に衝突して、化合物膜である酸化膜を形成する。
移送チャンバ60は、図1に示すように、チャンバ10に搬入される前のワークWが収容される内部空間を有する通路である。移送チャンバ60は、ゲートバルブGB1を介してチャンバ10に接続されている。移送チャンバ60の内部空間には、図示はしないが、ワークWをチャンバ10との間で搬入、搬出するための搬送手段が設けられている。移送チャンバ60は、図示しない真空ポンプの排気によって減圧されており、搬送手段によってチャンバ10の真空を維持した状態で、未処理のワークWを搭載したトレイ34を、チャンバ10内に搬入し、処理済みのワークWを搭載したトレイ34をチャンバ10から搬出する。
冷却装置70は、図1に示すように、移送チャンバ60に接続されている。冷却装置70は、冷凍機、冷却コイルを有し、上記の真空ポンプにより排気しながら、移送チャンバ60内の水分子を、冷凍機にて冷却される冷却コイルに凝縮して捕捉する装置である。水分は霜となって捕捉されるので、メンテナンスにて、コイルから霜を取り除くデフロストの作業を行う。
制御部80は、排気部20、スパッタガス導入部47、プロセスガス導入部56、電源部46、RF電源54、回転テーブル30、ゲートバルブGB1、移送チャンバ60、ゲートバルブGB2、ロードロック部62、冷却装置70など、成膜装置1を構成する各種要素を制御する。この制御部80は、PLC(Programmable Logic Controller)や、CPU(Central Processing Unit)を含む処理装置であり、制御内容を記述したプログラム、設定値、しきい値等が記憶されている。
次に、成膜装置1によるワークWへの成膜処理の動作を説明する。以下の成膜処理は、高純度イットリウム(Y)のターゲット42を用いたスパッタリングによる成膜と、膜を酸化させる膜処理を繰り返すことにより、膜厚1~100μmのイットリア(Y2О3)の膜を生成する例である。また、成膜装置1は、ターゲット42とワークWとの距離D2(図2参照)が比較的長い、100~250mmとすることで、ワークWが加熱され難くなっている。また、回転テーブル30の回転は、例えば、30~100rpmとすることができる。なお、成膜処理の前に、ゲートバルブGB1を閉じた状態で、搬送手段がワークWを搭載したトレイ34をロードロック部62から移送チャンバ60に搬入し、冷却装置70によって、ワークW及びトレイ34の除湿がなされているものとする。
(1)以上のように、本実施形態に係る成膜装置1は、内部を真空とすることが可能なチャンバ10と、チャンバ10内に設けられ、ワークWを円周の搬送経路Lに沿って循環搬送する回転テーブル30と、ワークWに堆積されて膜となる成膜材料を含み形成され、回転テーブル30により循環搬送されるワークWに対向し、回転テーブル30の回転中心からの半径方向の距離が異なる位置に設けられた複数のターゲット42と、ターゲット42からの成膜材料が飛散する領域を囲む成膜室45を形成し、回転テーブル30により循環搬送されるワークWに対向する側に開口91を有するシールド部材90と、成膜室45にスパッタガスG1を導入するスパッタガス導入部47と、ターゲット42に電力を印加する電源部46とを有し、ターゲット42に電力を印加させることにより成膜室45内のスパッタガスG1にプラズマを発生させるプラズマ発生器と、を有している。
本発明の実施形態及び各部の変形例を説明したが、この実施形態や各部の変形例は、一例として提示したものであり、発明の範囲を限定することは意図していない。上述したこれら新規な実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これら実施形態やその変形は、発明の範囲や要旨に含まれるとともに、特許請求の範囲に記載された発明に含まれる。
3 回転テーブル
3b 回転筒
3c 支柱
3d ボールベアリング
10 チャンバ
10a 天井
10b 底部
10c 側壁
10d 支持体
11 排気口
20 排気部
30 回転テーブル
31 内周支持部
33 保持部
34 トレイ
40 成膜部
42、42A、42B、42C ターゲット
43 バッキングプレート
44 電極
45 成膜室
46 電源部
47 スパッタガス導入部
48 配管
49 ガス導入口
50 膜処理部
51 筒状体
52 窓部材
53 アンテナ
54 RF電源
55 マッチングボックス
56 プロセスガス導入部
57 配管
58 ガス導入口
60 移送チャンバ
62 ロードロック部
70 冷却装置
80 制御部
90 シールド部材
91 開口
92 カバー部
92a ターゲット孔
93 側面部
93a 外周壁
93b 内周壁
93c、93d 隔壁
95 遮蔽板
Claims (8)
- 内部を真空とすることが可能なチャンバと、
前記チャンバ内に設けられ、ワークを円周の搬送経路に沿って循環搬送する回転テーブルと、
前記ワークに堆積されて膜となる成膜材料を含み形成され、前記回転テーブルにより循環搬送される前記ワークに対向し、前記回転テーブルの回転中心からの半径方向の距離が異なる位置に設けられた複数のターゲットと、
前記ターゲットからの前記成膜材料が飛散する領域を囲む成膜室を形成し、前記回転テーブルにより循環搬送される前記ワークに対向する側に開口を有するシールド部材と、
前記成膜室にスパッタガスを導入するスパッタガス導入部と、前記ターゲットに電力を印加する電源部とを有し、前記ターゲットに電力を印加させることにより前記成膜室内のスパッタガスにプラズマを発生させるプラズマ発生器と、
を有し、
前記開口を狭めることにより、前記ターゲットから飛散する前記成膜材料を遮蔽する遮蔽板を有し、
前記遮蔽板が前記開口を覆う面積の割合が、前記回転中心から最も遠いターゲットに対向する領域よりも、前記回転中心に最も近いターゲットに対向する領域が大きく、
前記回転中心から最も遠いターゲットに対向する領域は、前記開口で画される領域を、前記回転中心を中心とする同心円によって区切られた環状扇形の領域であって、前記回転中心から最も遠いターゲットの直下を含み、他のターゲットの直下を含まない領域であり、
前記回転中心から最も近いターゲットに対向する領域は、前記環状扇形の領域であって、前記回転中心から最も近いターゲットの直下を含み、他のターゲットの直下を含まない領域である
ことを特徴とする成膜装置。 - 前記ターゲットは3つ以上であり、
前記回転中心に近い領域になるに従って、前記遮蔽板が前記開口を覆う面積の割合が大きいことを特徴とする請求項1記載の成膜装置。 - 前記遮蔽板の一部は、前記回転中心に最も近いターゲットに対して、前記回転テーブルの回転軸方向の重なりが生じる位置に設けられていることを特徴とする請求項1または2に記載の成膜装置。
- 前記電源部は、前記回転中心に最も近いターゲットへ電力を印加する時間が、前記回転中心から最も遠いターゲットへの電力を印加する時間よりも短いことを特徴とする請求項1乃至3のいずれかに記載の成膜装置。
- 前記ターゲットは3つ以上であり、
前記回転中心に近いターゲットになるに従って、電力を印加する時間が短いことを特徴とする請求項4記載の成膜装置。 - 前記各ターゲットへの印加電力が、4.5kwより大きいことを特徴とする請求項1乃至5のいずれかに記載の成膜装置。
- 前記各ターゲットへの印加電力が等しいことを特徴とする請求項6記載の成膜装置。
- 前記チャンバ内に設けられ、循環搬送される前記ワークが前記成膜室を通過して膜が形成される毎に、前記膜に対して膜処理を行う膜処理部を有することを特徴とする請求項1乃至7のいずれかに記載の成膜装置。
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JP2020050939A (ja) | 2018-09-28 | 2020-04-02 | 芝浦メカトロニクス株式会社 | 成膜装置及び成膜製品の製造方法 |
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