JP7370920B2 - stage equipment - Google Patents

stage equipment Download PDF

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JP7370920B2
JP7370920B2 JP2020062981A JP2020062981A JP7370920B2 JP 7370920 B2 JP7370920 B2 JP 7370920B2 JP 2020062981 A JP2020062981 A JP 2020062981A JP 2020062981 A JP2020062981 A JP 2020062981A JP 7370920 B2 JP7370920 B2 JP 7370920B2
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axis
moving body
axis direction
axis drive
drive section
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JP2021163835A (en
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龍太 中島
達矢 吉田
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Sumitomo Heavy Industries Ltd
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Sumitomo Heavy Industries Ltd
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Priority to JP2020062981A priority Critical patent/JP7370920B2/en
Priority to KR1020210037027A priority patent/KR102527517B1/en
Priority to TW110111037A priority patent/TWI839602B/en
Priority to CN202110345848.8A priority patent/CN113471133A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/26Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/34Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/01Frames, beds, pillars or like members; Arrangement of ways
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/26Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/38Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members using fluid bearings or fluid cushion supports
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68764Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q2707/00Automatic supply or removal of metal workpieces
    • B23Q2707/04Automatic supply or removal of metal workpieces by means of grippers also magnetic or pneumatic gripping

Description

本発明は、ステージ装置に関する。 The present invention relates to a stage device.

対象物を位置決めするためのステージ装置が知られている。従来では、第1移動体と、第1移動体をX軸方向に駆動する駆動体と、第1移動体のX軸方向の移動を案内し、Y軸方向に移動可能に構成された第2移動体と、を備えるステージ装置が提案されている(例えば特許文献1)。 Stage devices for positioning objects are known. Conventionally, a first movable body, a driving body that drives the first movable body in the X-axis direction, and a second movable body that guides the movement of the first movable body in the X-axis direction and is configured to be movable in the Y-axis direction. A stage device including a moving body has been proposed (for example, Patent Document 1).

特開2009-101427号公報JP2009-101427A

従来のステージ装置では、X軸駆動部は、第2移動体に支持される。そのため、X軸駆動部が第1移動体を駆動させたときの反力は第2移動体に伝搬しうる。 In the conventional stage device, the X-axis drive section is supported by the second moving body. Therefore, the reaction force generated when the X-axis drive unit drives the first moving body can be transmitted to the second moving body.

ところで、ステージ装置をより大きい対象物の位置決めに使用したいという要求がある。この場合、ステージ装置を大型化する必要があり、それに伴ってX軸駆動部も大型化し、X軸駆動部が第1移動体を駆動させたときの反力も大きくなる。従来のステージ装置をそのまま大型化すると、この大きい反力が第2移動体に伝搬してしまう。これは、第2移動体の構造部材に起因するヒステリシスおよび振動を誘発する。すなわち、高精度化への妨げとなる。 By the way, there is a demand for using the stage device for positioning a larger object. In this case, it is necessary to increase the size of the stage device, and accordingly, the X-axis drive section also increases in size, and the reaction force when the X-axis drive section drives the first moving body also increases. If the conventional stage device is made larger as it is, this large reaction force will be propagated to the second moving body. This induces hysteresis and vibrations due to the structural members of the second moving body. In other words, this becomes a hindrance to achieving higher precision.

また、ステージ装置は、半導体デバイスの製造に使用される場合がある。半導体デバイスのデザインルールの微細化や重ね合わせにより、または積層のニーズにより、製造に使用されるステージ装置には、さらなる高精度化が求められている。 Furthermore, the stage apparatus may be used in manufacturing semiconductor devices. Due to the miniaturization and stacking of semiconductor device design rules, or the need for stacking, stage devices used in manufacturing are required to have even higher precision.

いずれにせよ、ステージ装置には高精度化が求められている。 In any case, stage devices are required to be highly accurate.

本発明はこうした状況においてなされたものであり、そのある態様の例示的な目的のひとつは、ステージ装置の高精度化を実現できる技術を提供することにある。 The present invention has been made under these circumstances, and one exemplary purpose of a certain aspect of the present invention is to provide a technique that can realize high precision of a stage device.

上記課題を解決するために、本発明のある態様のステージ装置は、第1移動体と、第1移動体をX軸方向に駆動する、Y軸方向に移動可能に構成されたX軸駆動部と、第1移動体のX軸方向の移動を案内し、Y軸方向に移動可能に構成された第2移動体と、X軸駆動部または第2移動体をY軸方向に駆動するY軸駆動部と、X軸駆動部と第2移動体とのX軸方向の相対移動を拘束せず、Y軸方向の相対移動を両者が非接触の状態で拘束する拘束ユニットと、を備える。 In order to solve the above problems, a stage device according to an aspect of the present invention includes a first moving body and an X-axis drive section that drives the first moving body in the X-axis direction and is configured to be movable in the Y-axis direction. a second moving body that guides the movement of the first moving body in the X-axis direction and is configured to be movable in the Y-axis direction; and a Y-axis that drives the X-axis drive unit or the second moving body in the Y-axis direction. The present invention includes a drive unit and a restraint unit that does not restrain relative movement of the X-axis drive unit and the second movable body in the X-axis direction, but restrains relative movement of the X-axis drive unit and the second moving body in the Y-axis direction in a state where they are not in contact with each other.

なお、以上の構成要素の任意の組み合わせや、本発明の構成要素や表現を方法、装置、システムなどの間で相互に置換したものもまた、本発明の態様として有効である。 Note that arbitrary combinations of the above-mentioned components and mutual substitution of the components and expressions of the present invention among methods, devices, systems, etc. are also effective as aspects of the present invention.

本発明によれば、ステージ装置の高精度化を実現できる。 According to the present invention, high precision of the stage device can be realized.

実施の形態に係るステージ装置を示す図である。FIG. 1 is a diagram showing a stage device according to an embodiment. 図2(a)~(c)は、図1のステージ装置を示す図である。FIGS. 2(a) to 2(c) are diagrams showing the stage apparatus of FIG. 1. 図2(a)のA-A線断面図である。FIG. 2 is a cross-sectional view taken along line AA in FIG. 2(a). 図1のガイドビームの一端とその周辺を示す斜視図である。FIG. 2 is a perspective view showing one end of the guide beam in FIG. 1 and its surroundings. 拘束ユニットの一例を説明する図である。It is a figure explaining an example of a restraint unit. 拘束ユニットの別の例を説明する図である。It is a figure explaining another example of a restraint unit. 拘束ユニットのさらに別の例を説明する図である。It is a figure explaining yet another example of a restraint unit. 拘束ユニットのさらに別の例を説明する図である。It is a figure explaining yet another example of a restraint unit.

以下、本発明を好適な実施の形態をもとに図面を参照しながら説明する。実施の形態は、発明を限定するものではなく例示であって、実施の形態に記述されるすべての特徴やその組み合わせは、必ずしも発明の本質的なものであるとは限らない。各図面に示される同一または同等の構成要素、部材、処理には、同一の符号を付するものとし、適宜重複した説明は省略する。 DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on preferred embodiments with reference to the drawings. The embodiments are illustrative rather than limiting the invention, and all features and combinations thereof described in the embodiments are not necessarily essential to the invention. Identical or equivalent components, members, and processes shown in each drawing are designated by the same reference numerals, and redundant explanations will be omitted as appropriate.

本明細書において、「部材Aが部材Bと非接触」とは、部材Aと部材Bが物理的に直接的に非接触であり、かつ、部材Aと部材Bが間接的にも非接触である(すなわち他の部材を介して間接的にも接続されていない)ことをいう。 In this specification, "member A is not in contact with member B" means that member A and member B are not physically in contact with each other directly, and member A and member B are also in non-contact indirectly. (i.e., not even indirectly connected through other members).

図1は、実施の形態に係るステージ装置100の斜視図である。説明の便宜上、図示のように、盤面10a(後述)に平行なある方向をX軸方向、X軸方向に直交する盤面10aに平行な方向をY軸方向、両者に直交する(すなわち盤面10aに直交する)方向をZ軸方向とするXYZ直交座標系を定める。図2(a)~(c)は、図1のステージ装置100を示す図である。図2(a)はステージ装置100の上面図、図2(b)はX軸方向に見たステージ装置100の側面図、図2(c)はY軸方向に見たステージ装置100の側面図である。 FIG. 1 is a perspective view of a stage device 100 according to an embodiment. For convenience of explanation, as shown in the figure, a certain direction parallel to the board surface 10a (described later) is the X-axis direction, a direction parallel to the board surface 10a orthogonal to the X-axis direction is the Y-axis direction, and a direction perpendicular to both (that is, to the board surface 10a). An XYZ orthogonal coordinate system is defined in which the Z-axis direction is the (orthogonal) direction. 2(a) to 2(c) are diagrams showing the stage device 100 of FIG. 1. FIG. 2(a) is a top view of the stage device 100, FIG. 2(b) is a side view of the stage device 100 seen in the X-axis direction, and FIG. 2(c) is a side view of the stage device 100 seen in the Y-axis direction. It is.

ステージ装置100は、XYステージと称され、対象物をX軸方向、Y軸方向に位置決めする。ステージ装置100は、定盤10と、X軸方向に移動可能に構成された第1移動体12と、第1移動体12のX軸方向の移動を案内するとともにY軸方向に移動可能に構成された第2移動体14と、第1移動体をX軸方向に駆動する第1X軸駆動部16および第2X軸駆動部18と、第2移動体をY軸方向に駆動する第1Y軸駆動部20および第2Y軸駆動部22と、第1Y軸ガイド24と、第2Y軸ガイド26と、X軸駆動部と第2移動体とのY軸方向の相対移動を非接触で拘束する4つの拘束ユニット88と、を備える。 The stage device 100 is called an XY stage, and positions the object in the X-axis direction and the Y-axis direction. The stage device 100 includes a surface plate 10, a first moving body 12 configured to be movable in the X-axis direction, and configured to guide movement of the first moving body 12 in the X-axis direction and to be movable in the Y-axis direction. a second moving body 14, a first X-axis drive section 16 and a second X-axis drive section 18 that drive the first moving body in the X-axis direction, and a first Y-axis drive that drives the second moving body in the Y-axis direction. 20, the second Y-axis drive section 22, the first Y-axis guide 24, the second Y-axis guide 26, and four components that restrain the relative movement of the X-axis drive section and the second movable body in the Y-axis direction in a non-contact manner. A restraint unit 88 is provided.

定盤10は、平面視で矩形状の部材である。定盤10の上面である盤面10aには、平面加工が施される。また、Y軸方向に沿って延在する第1側面10bにも、平面加工が施される。盤面10aおよび第1側面10bは、後述するようにエアベアリングが滑走する滑走面として機能する。 The surface plate 10 is a rectangular member in plan view. A plate surface 10a, which is the upper surface of the surface plate 10, is subjected to a flat surface processing. Further, the first side surface 10b extending along the Y-axis direction is also subjected to planar processing. The board surface 10a and the first side surface 10b function as a sliding surface on which an air bearing slides, as will be described later.

第1Y軸駆動部20は、第1Y軸固定子28と、第1Y軸可動子30と、を含む。第1Y軸固定子28は、長手方向に直交する断面が円形状である細長い棒状の部材であり、複数の円柱状の磁石を連結して構成される。第1Y軸固定子28は、軸線方向がY軸方向と一致するよう配置され、定盤10の第1側面10bに固定された図示しない一対の保持部材により両端が保持される。すなわち、第1Y軸固定子28は、平面視において定盤10の外側に配置される。 The first Y-axis drive unit 20 includes a first Y-axis stator 28 and a first Y-axis mover 30. The first Y-axis stator 28 is an elongated rod-shaped member whose cross section perpendicular to the longitudinal direction is circular, and is constructed by connecting a plurality of cylindrical magnets. The first Y-axis stator 28 is arranged so that its axial direction coincides with the Y-axis direction, and both ends are held by a pair of holding members (not shown) fixed to the first side surface 10b of the surface plate 10. That is, the first Y-axis stator 28 is arranged outside the surface plate 10 in plan view.

第1Y軸可動子30は、ハウジング32と、コイル(不図示)と、を含む。ハウジング32には、Y軸方向に貫通する断面が円形の挿通孔が形成されており、第1Y軸固定子28が挿通される。コイルは、第1Y軸固定子28を取り囲むよう挿通孔内に配置され、挿通孔の周面に固定される。コイルに電流が流れると、コイルと第1Y軸固定子28との間に電磁力が発生し、その電磁相互作用によってコイルひいては第1Y軸可動子30がY軸方向に移動する。 The first Y-axis mover 30 includes a housing 32 and a coil (not shown). The housing 32 has an insertion hole with a circular cross section that extends in the Y-axis direction, through which the first Y-axis stator 28 is inserted. The coil is arranged in the insertion hole so as to surround the first Y-axis stator 28, and is fixed to the circumferential surface of the insertion hole. When a current flows through the coil, an electromagnetic force is generated between the coil and the first Y-axis stator 28, and the electromagnetic interaction causes the coil and thus the first Y-axis mover 30 to move in the Y-axis direction.

第2Y軸駆動部22は、第2Y軸固定子34と、第2Y軸可動子36と、を含む。第2Y軸固定子34、第2Y軸可動子36は、第1Y軸固定子28、第1Y軸可動子30と同様に構成される。なお、第2Y軸固定子34は、その軸線方向がY軸方向と一致し、かつ、第1Y軸固定子28と平行に並ぶよう配置される。また、第2Y軸固定子34は、盤面10a上に固定された一対の保持部材(不図示)により両端が支持される。 The second Y-axis drive unit 22 includes a second Y-axis stator 34 and a second Y-axis mover 36. The second Y-axis stator 34 and the second Y-axis mover 36 are configured similarly to the first Y-axis stator 28 and the first Y-axis mover 30. Note that the second Y-axis stator 34 is arranged so that its axial direction coincides with the Y-axis direction and is aligned parallel to the first Y-axis stator 28. Further, the second Y-axis stator 34 is supported at both ends by a pair of holding members (not shown) fixed on the board surface 10a.

第2移動体14は、第2可動部38と、複数のY軸ヨーエアベアリング40と、ガイドビーム42と、複数のY軸リフトエアベアリング44と、を含む。 The second moving body 14 includes a second movable portion 38 , a plurality of Y-axis yaw air bearings 40 , a guide beam 42 , and a plurality of Y-axis lift air bearings 44 .

第2可動部38は、板状の部材であり、2つの主面がX軸方向を向くよう配置される。第2可動部38は、第1Y軸可動子30の下方に設けられ、第1Y軸可動子30に連結される。したがって、第2可動部38は、第1Y軸可動子30とともに移動する。第2可動部38の下側部分は、定盤10の第1側面10bと対向する。 The second movable part 38 is a plate-shaped member, and is arranged so that its two main surfaces face the X-axis direction. The second movable section 38 is provided below the first Y-axis movable element 30 and is connected to the first Y-axis movable element 30 . Therefore, the second movable part 38 moves together with the first Y-axis movable element 30. A lower portion of the second movable portion 38 faces the first side surface 10b of the surface plate 10.

複数のY軸ヨーエアベアリング40は、定盤10の第1側面10bと対向する第2可動部38の下側部分に固定され、第1側面10bに対して空気などの気体を噴出する。その反発力により、第2可動部38と第1側面10bとの非接触状態が維持される。 The plurality of Y-axis yaw air bearings 40 are fixed to the lower part of the second movable part 38 facing the first side surface 10b of the surface plate 10, and eject gas such as air to the first side surface 10b. The repulsive force maintains the non-contact state between the second movable portion 38 and the first side surface 10b.

ガイドビーム42は、長尺状の部材であり、長手方向がX軸方向に一致するように、第1X軸固定子52(後述)と第2X軸固定子58(後述)との間に配置される。ガイドビーム42は、一端が第2可動部38に連結され、他端が第2Y軸可動子36に連結される。ガイドビーム42は、X軸方向に直交する断面の形状が凹形を有する。詳しくは、ガイドビーム42は、底壁46と、第1側壁48と、第2側壁50と、を含む。底壁46は、X軸方向に長い平板状の部材であり、2つの主面がZ軸方向を向くよう設けられる。第1側壁48は、X軸方向に長い立壁であり、底壁46の上面(すなわち一方の主面)のY軸方向の一端から立設する。第2側壁50は、第1側壁48と同様、X軸方向に長い立壁であり、第1側壁48とY軸方向で対向するように底壁46の上面のY軸方向の他端から立設する。 The guide beam 42 is a long member, and is arranged between a first X-axis stator 52 (described later) and a second X-axis stator 58 (described later) so that its longitudinal direction coincides with the X-axis direction. Ru. The guide beam 42 has one end connected to the second movable section 38 and the other end connected to the second Y-axis movable element 36 . The guide beam 42 has a concave cross section perpendicular to the X-axis direction. Specifically, guide beam 42 includes a bottom wall 46, a first side wall 48, and a second side wall 50. The bottom wall 46 is a flat member that is long in the X-axis direction, and is provided so that its two main surfaces face in the Z-axis direction. The first side wall 48 is a vertical wall that is long in the X-axis direction, and is erected from one end of the upper surface (that is, one main surface) of the bottom wall 46 in the Y-axis direction. Like the first side wall 48, the second side wall 50 is a vertical wall that is long in the X-axis direction, and is erected from the other end of the top surface of the bottom wall 46 in the Y-axis direction so as to face the first side wall 48 in the Y-axis direction. do.

第1側壁48の外側の面、すなわち第2側壁50と対向する面とは反対側の面は、平面加工が施され、エアベアリングが滑走するための滑走面として機能する。以下、第1側壁48の外側の面を第1滑走面48aと呼ぶ。同様に、第2側壁50の外側の面は、平面加工が施され、エアベアリングが滑走するための滑走面として機能する。以下、第2側壁50の外側の面を第2滑走面50aと呼ぶ。 The outer surface of the first side wall 48, that is, the surface opposite to the surface facing the second side wall 50, is processed to be flat and functions as a sliding surface on which the air bearing slides. Hereinafter, the outer surface of the first side wall 48 will be referred to as a first sliding surface 48a. Similarly, the outer surface of the second side wall 50 is processed to be flat and functions as a sliding surface on which the air bearing slides. Hereinafter, the outer surface of the second side wall 50 will be referred to as a second sliding surface 50a.

複数のY軸リフトエアベアリング44は、ガイドビーム42に固定されている。Y軸リフトエアベアリング44は、定盤10の盤面10aに対して気体を噴出する。その反発力によってY軸リフトエアベアリング44ひいてはガイドビーム42は、盤面10aと非接触のまま、詳しくは盤面10aとの間に数μm程度の隙間を介して、Z軸方向に支持される。 A plurality of Y-axis lift air bearings 44 are fixed to the guide beam 42. The Y-axis lift air bearing 44 blows out gas against the plate surface 10a of the surface plate 10. Due to the repulsive force, the Y-axis lift air bearing 44 and thus the guide beam 42 are supported in the Z-axis direction without contacting the board surface 10a, specifically, with a gap of about several μm between them and the board surface 10a.

第1X軸駆動部16は、第1X軸固定子52と、第1X軸可動子54と、を含む。第1X軸固定子52は、第1Y軸固定子28や第2Y軸固定子34と同様に構成される。第1X軸固定子52は、軸線方向がX軸方向と一致するよう配置され、第1支持部材56により両端が支持される。第1X軸可動子54は、第1Y軸可動子30や第2Y軸可動子36と同様に構成され、第1X軸固定子52との電磁相互作用によってX軸方向に移動する。 The first X-axis drive section 16 includes a first X-axis stator 52 and a first X-axis movable element 54 . The first X-axis stator 52 is configured similarly to the first Y-axis stator 28 and the second Y-axis stator 34. The first X-axis stator 52 is arranged so that its axial direction coincides with the X-axis direction, and both ends are supported by first support members 56. The first X-axis movable element 54 is configured similarly to the first Y-axis movable element 30 and the second Y-axis movable element 36, and moves in the X-axis direction by electromagnetic interaction with the first X-axis stator 52.

第2X軸駆動部18は、第2X軸固定子58と、第2X軸可動子60と、第2支持部材62と、を含む。第2X軸固定子58、第2X軸可動子60はそれぞれ、第1X軸固定子52、第1X軸可動子54と同様に構成される。第2X軸固定子58は、軸線方向がX軸方向と一致し、かつ、第1X軸固定子52と平行に並ぶよう配置され、第2支持部材62により両端が支持される。 The second X-axis drive section 18 includes a second X-axis stator 58, a second X-axis movable element 60, and a second support member 62. The second X-axis stator 58 and the second X-axis mover 60 are configured similarly to the first X-axis stator 52 and the first X-axis mover 54, respectively. The second X-axis stator 58 is arranged so that its axial direction coincides with the X-axis direction and is parallel to the first X-axis stator 52, and is supported at both ends by the second support member 62.

図3は、図2(a)のA-A線断面図である。第1移動体12は、第1可動部64と、複数のX軸ヨーエアベアリング66と、複数のX軸リフトエアベアリング68と、ステージ70と、を含む。第1可動部64は、四角筒状の部材であり、ガイドビーム42が挿通される。第1可動部64は、底壁72と、上壁74と、第1側壁76と、第2側壁78と、を含む。第1側壁76はガイドビーム42の第1滑走面48aと対向し、第2側壁78はガイドビーム42の第2滑走面50aと対向する。第1側壁76の外側の面には、図示しない接続部材を介して第1X軸可動子54が連結され、第2側壁78の外側の面には、図示しない接続部材を介して第2X軸可動子60が連結される。したがって、第1可動部64は、第1X軸可動子54および第2X軸可動子60とともに移動する。 FIG. 3 is a cross-sectional view taken along line AA in FIG. 2(a). The first moving body 12 includes a first movable part 64 , a plurality of X-axis yaw air bearings 66 , a plurality of X-axis lift air bearings 68 , and a stage 70 . The first movable part 64 is a square cylindrical member, through which the guide beam 42 is inserted. The first movable part 64 includes a bottom wall 72 , a top wall 74 , a first side wall 76 , and a second side wall 78 . The first side wall 76 faces the first sliding surface 48a of the guide beam 42, and the second side wall 78 faces the second sliding surface 50a of the guide beam 42. A first X-axis mover 54 is connected to the outer surface of the first side wall 76 via a connecting member (not shown), and a second X-axis mover 54 is connected to the outer surface of the second side wall 78 via a connecting member (not shown). Children 60 are connected. Therefore, the first movable part 64 moves together with the first X-axis movable element 54 and the second X-axis movable element 60.

複数のX軸ヨーエアベアリング66は、第1側壁76の内面(すなわち第2側壁78と対向する面)76a、第2側壁78の内面(すなわち第1側壁76と対向する面)78aに固定され、ガイドビーム42の第1滑走面48a、第2滑走面50aに対して気体を噴出する。また、複数のX軸リフトエアベアリング68は、底壁72の下面72aに固定され、盤面10aに対して気体を噴出する。第1可動部64は、X軸ヨーエアベアリング66およびX軸リフトエアベアリング68が気体を噴出することによる反発力によって、ガイドビーム42および盤面10aと非接触のまま、詳しくはガイドビーム42および盤面10aとの間に数μm程度の隙間を介して、Y軸方向およびZ軸方向に支持される。 The plurality of X-axis yaw air bearings 66 are fixed to the inner surface 76a of the first side wall 76 (that is, the surface facing the second side wall 78) and the inner surface 78a of the second side wall 78 (that is, the surface facing the first side wall 76). , the gas is ejected to the first sliding surface 48a and the second sliding surface 50a of the guide beam 42. Further, the plurality of X-axis lift air bearings 68 are fixed to the lower surface 72a of the bottom wall 72 and eject gas toward the board surface 10a. The first movable part 64 remains out of contact with the guide beam 42 and the board surface 10a due to the repulsive force caused by the gas ejected from the X-axis yaw air bearing 66 and the X-axis lift air bearing 68. It is supported in the Y-axis direction and the Z-axis direction with a gap of about several μm between it and 10a.

ステージ70は、第1可動部64に固定される。ステージ70には、例えば、半導体ウェハなどの加工対象物等が載せられる。 The stage 70 is fixed to the first movable part 64. For example, a workpiece such as a semiconductor wafer is placed on the stage 70 .

図1、図2(a)~(c)に戻り、第1Y軸ガイド24は、第1Y軸ガイドレール80と、2つの第1スライダ82と、を含む。第1Y軸ガイドレール80は、延在方向がY軸方向に一致するよう盤面10a上に固定される。2つの第1スライダ82はそれぞれ、複数の転動体を含み、第1Y軸ガイドレール80に沿ってY軸方向に移動する。 Returning to FIGS. 1 and 2(a) to (c), the first Y-axis guide 24 includes a first Y-axis guide rail 80 and two first sliders 82. The first Y-axis guide rail 80 is fixed on the board surface 10a so that its extending direction coincides with the Y-axis direction. The two first sliders 82 each include a plurality of rolling elements and move in the Y-axis direction along the first Y-axis guide rail 80.

第2Y軸ガイド26は、第2Y軸ガイドレール84と、2つの第2スライダ86と、を含む。第2Y軸ガイドレール84、第2スライダ86はそれぞれ、第1Y軸ガイドレール80、第1スライダ82と同様に構成される。なお、第2Y軸ガイドレール84は、延在方向がY軸方向に一致し、かつ、第1Y軸ガイドレール80と平行に並ぶよう配置される。 The second Y-axis guide 26 includes a second Y-axis guide rail 84 and two second sliders 86. The second Y-axis guide rail 84 and the second slider 86 are configured similarly to the first Y-axis guide rail 80 and the first slider 82, respectively. Note that the second Y-axis guide rail 84 is arranged so that its extension direction coincides with the Y-axis direction and is aligned parallel to the first Y-axis guide rail 80.

第1X軸固定子52を支持する2つの第1支持部材56の一方は、第1Y軸ガイド24の第1スライダ82に支持され、他方は、第2Y軸ガイド26の第2スライダ86に支持される。つまり、第1支持部材56ひいては第1X軸駆動部16は、Y軸方向に移動可能に構成される。 One of the two first support members 56 supporting the first X-axis stator 52 is supported by the first slider 82 of the first Y-axis guide 24, and the other is supported by the second slider 86 of the second Y-axis guide 26. Ru. That is, the first support member 56 and, in turn, the first X-axis drive section 16 are configured to be movable in the Y-axis direction.

同様に、第2X軸固定子58を支持する2つの第2支持部材62の一方は、第1Y軸ガイド24の第1スライダ82に支持され、他方は、第2Y軸ガイドの第2スライダ86に支持される。つまり、第2支持部材62ひいては第2X軸駆動部18は、Y軸方向に移動可能に構成される。 Similarly, one of the two second support members 62 supporting the second X-axis stator 58 is supported by the first slider 82 of the first Y-axis guide 24, and the other is supported by the second slider 86 of the second Y-axis guide. Supported. That is, the second support member 62 and, in turn, the second X-axis drive section 18 are configured to be movable in the Y-axis direction.

ここで、第1移動体12、第2移動体14、X軸駆動部、Y軸駆動部の支持についてまとめる。 Here, support for the first moving body 12, the second moving body 14, the X-axis drive section, and the Y-axis drive section will be summarized.

(i)第1移動体12は、第2移動体14、X軸駆動部およびY軸駆動部には直接的にも間接的(すなわち他の部材を介しても)支持されない。第1移動体12は、定盤10に直接的に支持される。具体的には、第1移動体12はX軸リフトエアベアリング68から噴出される気体の反発力によって、定盤10と非接触の状態で定盤10に支持される。 (i) The first moving body 12 is not supported directly or indirectly (that is, via other members) by the second moving body 14, the X-axis drive section, and the Y-axis drive section. The first moving body 12 is directly supported by the surface plate 10. Specifically, the first moving body 12 is supported by the surface plate 10 without contacting the surface plate 10 by the repulsive force of the gas ejected from the X-axis lift air bearing 68 .

(ii)第2移動体14は、第1移動体12、X軸駆動部およびY軸駆動部には直接的にも間接的にも支持されない。第2移動体14は、定盤10に直接的に支持される。具体的には、第2移動体14は、複数のY軸リフトエアベアリング44から噴出される気体の反発力によって、定盤10と非接触の状態で、定盤10に支持される。 (ii) The second moving body 14 is not directly or indirectly supported by the first moving body 12, the X-axis drive section, and the Y-axis drive section. The second moving body 14 is directly supported by the surface plate 10. Specifically, the second moving body 14 is supported by the surface plate 10 without contacting the surface plate 10 by the repulsive force of the gas ejected from the plurality of Y-axis lift air bearings 44 .

(iii)X軸駆動部は、第1移動体12、第2移動体14およびY軸駆動部には直接的にも間接的にも支持されない。X軸駆動部は、定盤10に直接的に支持されるY軸ガイドを介して、定盤10に支持される。 (iii) The X-axis drive section is not directly or indirectly supported by the first moving body 12, the second moving body 14, and the Y-axis drive section. The X-axis drive section is supported by the surface plate 10 via a Y-axis guide that is directly supported by the surface plate 10.

(iv)Y軸駆動部は、第1移動体12、第2移動体14およびX軸駆動部には直接的にも間接的にも支持されない。Y軸駆動部は、定盤10に直接的に支持される図示しない保持部材を介して、定盤10に支持される。 (iv) The Y-axis drive section is not directly or indirectly supported by the first moving body 12, the second moving body 14, and the X-axis drive section. The Y-axis drive unit is supported by the surface plate 10 via a holding member (not shown) that is directly supported by the surface plate 10.

以上のように、第1移動体12、第2移動体14、X軸駆動部およびY軸駆動部は、互いに独立して、言い換えると共通の部材や互いを介さずに、定盤10に支持される。 As described above, the first moving body 12, the second moving body 14, the X-axis drive section, and the Y-axis drive section are supported on the surface plate 10 independently of each other, in other words, without common members or each other. be done.

図4は、ガイドビーム42の一端とその周辺を示す斜視図である。拘束ユニット88は、X軸駆動部と第2移動体14とのX軸方向の相対移動は拘束せずに、X軸駆動部と第2移動体14のY軸方向の相対移動を拘束する。拘束ユニット88は特に、X軸駆動部と第2移動体14とが非接触の状態で、より具体的には、X軸駆動部と第2移動体14とが直接接触せず、かつ、他の部材を介して接続されることもなく、Y軸方向の相対移動を拘束する。 FIG. 4 is a perspective view showing one end of the guide beam 42 and its surroundings. The restraint unit 88 does not restrain the relative movement of the X-axis drive section and the second moving body 14 in the X-axis direction, but restrains the relative movement of the X-axis drive section and the second moving body 14 in the Y-axis direction. In particular, the restraint unit 88 is configured such that the X-axis drive section and the second movable body 14 are not in contact with each other, and more specifically, the X-axis drive section and the second movable body 14 are not in direct contact with each other, and other Relative movement in the Y-axis direction is restricted without being connected through any other members.

図5は、拘束ユニット88の一例を説明する図である。図5は、ステージ装置100の上面図である。図5では、第1移動体12やY軸駆動部の表示を省略している。拘束ユニット88は、第1磁石90と、第2磁石92と、磁性体93と、を含む。磁石90,92は、永久磁石であっても電磁石であってもよい。第1磁石90は、X軸駆動部に固定される。図5では、ガイドビーム42と対向する支持部材の側面に固定されている。第2磁石92および磁性体93は、第2移動体14に固定される。図5では、支持部材と対向するガイドビーム42の側面に固定されている。 FIG. 5 is a diagram illustrating an example of the restraint unit 88. FIG. 5 is a top view of the stage device 100. In FIG. 5, the first moving body 12 and the Y-axis drive unit are not shown. The restraint unit 88 includes a first magnet 90, a second magnet 92, and a magnetic body 93. The magnets 90, 92 may be permanent magnets or electromagnets. The first magnet 90 is fixed to the X-axis drive section. In FIG. 5, it is fixed to the side of the support member facing the guide beam 42. The second magnet 92 and the magnetic body 93 are fixed to the second moving body 14. In FIG. 5, it is fixed to the side of the guide beam 42 facing the support member.

磁性体93は、第1磁石90とY軸方向に対向する。なお、磁性体93は、X軸駆動部に固定され、第2磁石92とY軸方向に対向してもよい。いずれにせよ、磁性体93と磁石とがY軸方向に引き合い、これにより、X軸駆動部と第2移動体14とがY軸方向に互いに引き合い、X軸駆動部と第2移動体14とのY軸方向の相対移動が拘束される。つまり、本実施の形態の拘束ユニット88は、磁気の吸引力により、X軸駆動部と第2移動体14とのY軸方向の相対移動を拘束する。Y軸方向の相対移動が拘束されることにより、Y軸駆動部に駆動されて第2移動体14がY軸方向に移動すると、第2移動体14に追従してX軸駆動部もY軸方向に移動する。 The magnetic body 93 faces the first magnet 90 in the Y-axis direction. Note that the magnetic body 93 may be fixed to the X-axis drive section and may face the second magnet 92 in the Y-axis direction. In any case, the magnetic body 93 and the magnet are attracted to each other in the Y-axis direction, and as a result, the X-axis drive section and the second moving body 14 are attracted to each other in the Y-axis direction, and the X-axis drive section and the second moving body 14 are attracted to each other in the Y-axis direction. relative movement in the Y-axis direction is restricted. In other words, the restraint unit 88 of this embodiment restrains the relative movement of the X-axis drive section and the second movable body 14 in the Y-axis direction by magnetic attraction force. Since the relative movement in the Y-axis direction is restricted, when the second moving body 14 is driven by the Y-axis drive unit and moves in the Y-axis direction, the X-axis drive unit also moves along the Y-axis following the second moving body 14. move in the direction.

また、第1磁石90と、第2磁石92とは、同じ磁極がY軸方向に対向するように固定される。図5では、S極同士が対向するように固定されている。同じ磁極がY軸方向に対向することで、第1磁石90と第2磁石92とはY軸方向に反発し合う。この反発力により、第1磁石90ひいてはX軸駆動部と、第2磁石92ひいては第2移動体14との非接触状態が維持される。 Further, the first magnet 90 and the second magnet 92 are fixed so that the same magnetic poles face each other in the Y-axis direction. In FIG. 5, the S poles are fixed so as to face each other. Since the same magnetic poles face each other in the Y-axis direction, the first magnet 90 and the second magnet 92 repel each other in the Y-axis direction. This repulsive force maintains the non-contact state between the first magnet 90 and the X-axis drive unit, and the second magnet 92 and the second moving body 14.

一方、X軸駆動部と第2移動体14とは、X軸方向の相対移動は拘束されておらず、また、互いに独立して支持されるため、X軸駆動部により第1移動体12を駆動させたときの反力は、第2移動体14に伝搬されない。 On the other hand, the X-axis drive section and the second movable body 14 are not restricted in relative movement in the X-axis direction, and are supported independently of each other, so the X-axis drive section drives the first movable body 12. The reaction force upon driving is not propagated to the second moving body 14.

以上のように構成されたステージ装置100の動作を説明する。
第1Y軸駆動部20の第1Y軸可動子30のコイルと、第2Y軸駆動部22の第2Y軸可動子36のコイルに電流が供給されると、各コイルとY軸固定子との間に電磁力が発生し、その電磁相互作用によってY軸可動子ひいては第2移動体14(および第1移動体12)がY軸方向に移動する。第1X軸駆動部16の第1X軸可動子54のコイルと、第2X軸駆動部18の第2X軸可動子60のコイルに電流が供給されると、各コイルとX軸固定子との間に電磁力が発生し、その電磁相互作用によってX軸可動子ひいては第1移動体12がX軸方向に移動する。このように第1移動体12および第2移動体14を移動させることにより、第1移動体12のステージ70をXY方向に移動させ、ステージ70に載置される対象物をXY方向に位置決めする。第1X軸駆動部16および第2X軸駆動部18と第2移動体14とは、拘束ユニット88によりY軸方向の相対移動が拘束されているため、第2移動体14のY軸方向の移動にともなって第1X軸駆動部16および第2X軸駆動部18もY軸方向に移動する。
The operation of the stage device 100 configured as above will be explained.
When current is supplied to the coil of the first Y-axis mover 30 of the first Y-axis drive unit 20 and the coil of the second Y-axis mover 36 of the second Y-axis drive unit 22, a gap between each coil and the Y-axis stator An electromagnetic force is generated, and the Y-axis movable element and eventually the second movable body 14 (and the first movable body 12) move in the Y-axis direction due to the electromagnetic interaction. When current is supplied to the coils of the first X-axis movable element 54 of the first X-axis drive section 16 and the coils of the second X-axis movable element 60 of the second X-axis drive section 18, the distance between each coil and the X-axis stator An electromagnetic force is generated, and the X-axis movable element and, in turn, the first moving body 12 move in the X-axis direction due to the electromagnetic interaction. By moving the first moving body 12 and the second moving body 14 in this manner, the stage 70 of the first moving body 12 is moved in the XY directions, and the object placed on the stage 70 is positioned in the XY directions. . Since the first X-axis drive section 16, the second X-axis drive section 18, and the second moving body 14 are restrained from relative movement in the Y-axis direction by the restraint unit 88, movement of the second moving body 14 in the Y-axis direction Accordingly, the first X-axis drive section 16 and the second X-axis drive section 18 also move in the Y-axis direction.

以上説明した実施の形態に係るステージ装置100によると、X軸駆動部と第2移動体14とのX軸方向の相対移動は拘束されず、Y軸方向の相対移動が非接触で拘束され、さらにX軸駆動部と第2移動体とは互いに独立して支持される。これにより、第2移動体14のY軸方向の移動に追従してX軸駆動部をY軸方向に移動させつつも、X軸駆動部により第1移動体12を駆動させたときの反力が第2移動体14(特に第2可動部38)に伝搬するのが抑止される。そのため、第2可動部38の構造部材に起因するヒステリシスおよび振動が発生しなくなる、あるいはその発生が抑止される。つまり、より高精度なステージ装置100が実現される。また、反力が第2可動部38に伝搬するのが抑止されるため、その反力による第2可動部38の振動が比較的早く収まる。これにより、ステージ装置100を用いた生産のスループットが向上する。 According to the stage device 100 according to the embodiment described above, the relative movement of the X-axis drive unit and the second moving body 14 in the X-axis direction is not restrained, and the relative movement of the Y-axis direction is restrained without contact. Furthermore, the X-axis drive section and the second moving body are supported independently of each other. As a result, while the X-axis drive section is moved in the Y-axis direction following the movement of the second movable body 14 in the Y-axis direction, a reaction force is generated when the first movable body 12 is driven by the X-axis drive section. is prevented from propagating to the second moving body 14 (particularly to the second movable part 38). Therefore, hysteresis and vibration caused by the structural members of the second movable portion 38 do not occur or are suppressed from occurring. In other words, a more accurate stage device 100 is realized. Further, since the reaction force is prevented from propagating to the second movable part 38, the vibration of the second movable part 38 due to the reaction force stops relatively quickly. This improves the throughput of production using the stage device 100.

以上、実施の形態にステージ装置について説明した。この実施の形態は例示であり、それらの各構成要素や各処理プロセスの組合せにいろいろな変形例が可能なこと、またそうした変形例も本発明の範囲にあることは当業者に理解されるところである。以下変形例を示す。 The stage apparatus has been described above in the embodiment. Those skilled in the art will understand that this embodiment is merely an example, and that various modifications can be made to the combinations of the constituent elements and processing processes, and that such modifications are also within the scope of the present invention. be. A modified example will be shown below.

(変形例1)
図6は、拘束ユニット88の別の例を説明する図である。図6は、図5に対応する。本変形例では、拘束ユニット88は、エアパッド96である。エアパッド96は、X軸駆動部および第2移動体14の一方に固定される。図6では、エアパッド96は、ガイドビーム42と対向する支持部材の側面に固定される。エアパッド96は、ガイドビーム42との隙間が微小になるように、スペーサ98を介して支持部材に固定されてもよい。エアパッド96は、ガイドビーム42の側面を向いた吸引口96aおよび噴出口96bを有する。エアパッド96は、吸引口96aからエアを吸引する。この吸引力により、X軸駆動部と第2移動体14とのY軸方向の相対移動を拘束される。
(Modification 1)
FIG. 6 is a diagram illustrating another example of the restraint unit 88. FIG. 6 corresponds to FIG. In this modification, the restraining unit 88 is an air pad 96. The air pad 96 is fixed to one of the X-axis drive section and the second moving body 14. In FIG. 6, air pad 96 is secured to the side of the support member opposite guide beam 42. In FIG. The air pad 96 may be fixed to the support member via a spacer 98 so that the gap between the air pad 96 and the guide beam 42 is small. The air pad 96 has a suction port 96a and a jet port 96b facing the side surface of the guide beam 42. The air pad 96 sucks air from the suction port 96a. This attraction force restricts the relative movement of the X-axis drive unit and the second moving body 14 in the Y-axis direction.

また、エアパッド96は、図示しない給気系から供給される高圧の気体を噴出口96bからガイドビーム42に向けてY軸方向に噴出する。その反発力により、X軸駆動部と第2移動体14との非接触状態が維持される。 The air pad 96 also jets high-pressure gas supplied from an air supply system (not shown) from the jet port 96b toward the guide beam 42 in the Y-axis direction. Due to the repulsive force, the non-contact state between the X-axis drive section and the second moving body 14 is maintained.

本変形例によれば、実施の形態と同様の効果を奏することができる。 According to this modification, the same effects as the embodiment can be achieved.

(変形例2)
図7は、拘束ユニット88のさらに別の例を説明する図である。図7は、図5に対応する。第1X軸駆動部16と第2X軸駆動部18とは、一体となってY軸方向に移動するように、接続部材94によって互いに接続されている。図7では、第1支持部材56と第2支持部材62とが、接続部材94によって接続されている。
(Modification 2)
FIG. 7 is a diagram illustrating still another example of the restraint unit 88. FIG. 7 corresponds to FIG. 5. The first X-axis drive section 16 and the second X-axis drive section 18 are connected to each other by a connecting member 94 so that they move together in the Y-axis direction. In FIG. 7 , the first support member 56 and the second support member 62 are connected by a connecting member 94 .

拘束ユニット88は、第1磁石90と、第2磁石92と、を含む。第1磁石90は、X軸駆動部に固定される。図7では、ガイドビーム42と対向する支持部材の側面に固定されている。第2磁石92は、第2移動体14に固定される。図7では、支持部材と対向するガイドビーム42の側面に固定されている。第1磁石90と、第2磁石92とは、同じ磁極がY軸方向に対向するように固定される。図7では、S極同士が対向するように固定されている。これにより、第1磁石90と第2磁石92とは、Y軸方向に反発し合う。 Restriction unit 88 includes a first magnet 90 and a second magnet 92. The first magnet 90 is fixed to the X-axis drive section. In FIG. 7, it is fixed to the side of the support member facing the guide beam 42. The second magnet 92 is fixed to the second moving body 14 . In FIG. 7, it is fixed to the side of the guide beam 42 facing the support member. The first magnet 90 and the second magnet 92 are fixed so that the same magnetic poles face each other in the Y-axis direction. In FIG. 7, the S poles are fixed so as to face each other. Thereby, the first magnet 90 and the second magnet 92 repel each other in the Y-axis direction.

第2移動体14が第1X軸駆動部16側に移動すると、第1支持部材56ひいては第1X軸駆動部16は、磁石の反発力を介してガイドビーム42(第2移動体14)に押され、第2移動体14とともに移動する。第1X軸駆動部16と接続された第2X軸駆動部18も、同じ向きに移動する。第2移動体14が第2X軸駆動部18側に移動すると、第2支持部材62ひいては第2X軸駆動部18は、磁石の反発力を介してガイドビーム42(第2移動体14)に押され、第2移動体14とともに移動する。第2X軸駆動部18と接続された第1X軸駆動部16も、同じ向きに移動する。 When the second movable body 14 moves toward the first X-axis drive unit 16, the first support member 56 and, in turn, the first X-axis drive unit 16 are pushed against the guide beam 42 (second movable body 14) through the repulsive force of the magnet. and moves together with the second moving body 14. The second X-axis drive section 18 connected to the first X-axis drive section 16 also moves in the same direction. When the second movable body 14 moves toward the second X-axis drive unit 18, the second support member 62 and, in turn, the second X-axis drive unit 18 are pushed against the guide beam 42 (second movable body 14) through the repulsive force of the magnet. and moves together with the second moving body 14. The first X-axis drive section 16 connected to the second X-axis drive section 18 also moves in the same direction.

つまり、本変形例では、磁気の反発力を用いて、X軸駆動部と第2移動体14とのY軸方向の相対移動を拘束する。 That is, in this modification, the relative movement of the X-axis drive unit and the second moving body 14 in the Y-axis direction is restrained using magnetic repulsion.

本変形例によれば、実施の形態と同様の効果を奏することができる。 According to this modification, the same effects as the embodiment can be achieved.

(変形例3)
図8は、拘束ユニット88のさらに別の例を説明する図である。図8は、図7に対応する。
(Modification 3)
FIG. 8 is a diagram illustrating still another example of the restraint unit 88. FIG. 8 corresponds to FIG. 7.

拘束ユニット88は、X軸駆動部および第2移動体14の一方に固定されるエアパッド96を含む。図8では、エアパッド96は、ガイドビーム42と対向する支持部材の側面に固定されている。エアパッド96は、噴出型のエアパッドである。エアパッド96は、図示しない給気系から供給される高圧の気体をガイドビーム42に向けてY軸方向に噴出し、ガイドビーム42との間の微小な隙間に高圧の気体層を形成する。なお、エアパッド96は、ガイドビーム42の側面に固定されてもよい。 The restraint unit 88 includes an air pad 96 fixed to one of the X-axis drive section and the second moving body 14. In FIG. 8, the air pad 96 is fixed to the side of the support member facing the guide beam 42. In FIG. The air pad 96 is a blowout type air pad. The air pad 96 blows out high-pressure gas supplied from an air supply system (not shown) toward the guide beam 42 in the Y-axis direction, thereby forming a high-pressure gas layer in a small gap between the air pad 96 and the guide beam 42 . Note that the air pad 96 may be fixed to the side surface of the guide beam 42.

第2移動体14が第1X軸駆動部16側に移動すると、第1支持部材56ひいては第1X軸駆動部16は、気体層を介してガイドビーム42(第2移動体14)に押され、第2移動体14とともに移動する。第1X軸駆動部16と接続された第2X軸駆動部18も、同じ向きに移動する。第2移動体14が第2X軸駆動部18側に移動すると、第2支持部材62ひいては第2X軸駆動部18は、気体層を介してガイドビーム42(第2移動体14)に押され、第2移動体14とともに移動する。第2X軸駆動部18と接続された第1X軸駆動部16も、同じ向きに移動する。 When the second moving body 14 moves toward the first X-axis drive unit 16, the first support member 56 and, in turn, the first X-axis drive unit 16 are pushed by the guide beam 42 (second moving body 14) through the gas layer. It moves together with the second moving body 14. The second X-axis drive section 18 connected to the first X-axis drive section 16 also moves in the same direction. When the second moving body 14 moves toward the second X-axis drive unit 18, the second support member 62 and, in turn, the second X-axis drive unit 18 are pushed by the guide beam 42 (second moving body 14) through the gas layer. It moves together with the second moving body 14. The first X-axis drive section 16 connected to the second X-axis drive section 18 also moves in the same direction.

つまり、本変形例では、エアの反発力を用いて、X軸駆動部と第2移動体14とのY軸方向の相対移動を拘束する。 That is, in this modification, the relative movement of the X-axis drive unit and the second moving body 14 in the Y-axis direction is restrained using the repulsive force of air.

本変形例によれば、実施の形態と同様の効果を奏することができる。 According to this modification, the same effects as the embodiment can be achieved.

(変形例4)
実施の形態では、Y軸駆動部が第2移動体14をY軸方向に駆動する場合について説明したが、これには限定されず、Y軸駆動部は、X軸駆動部をY軸方向に駆動してもよい。この場合、Y軸駆動部の可動子とX軸駆動部とが連結される。Y軸駆動部に駆動されてX軸駆動部がY軸方向に移動すると、拘束ユニット88によりX軸駆動部とのY軸方向の相対移動が拘束された第2移動体は、X軸駆動部とともにY軸方向に移動する。
(Modification 4)
In the embodiment, a case has been described in which the Y-axis drive section drives the second moving body 14 in the Y-axis direction, but the present invention is not limited to this, and the Y-axis drive section drives the X-axis drive section in the Y-axis direction. It may be driven. In this case, the movable element of the Y-axis drive section and the X-axis drive section are connected. When the X-axis drive section is driven by the Y-axis drive section and moves in the Y-axis direction, the second moving body whose relative movement in the Y-axis direction with respect to the X-axis drive section is restrained by the restraint unit 88 moves to the X-axis drive section. and move in the Y-axis direction.

上述した実施の形態と変形例の任意の組み合わせもまた本発明の実施の形態として有用である。組み合わせによって生じる新たな実施の形態は、組み合わされる実施の形態および変形例それぞれの効果をあわせもつ。 Any combination of the above-described embodiments and variations are also useful as embodiments of the present invention. A new embodiment resulting from a combination has the effects of each of the combined embodiments and modifications.

12 第1移動体、 14 第2移動体、 16 第1X軸駆動部、 18 第2X軸駆動部、 20 第1Y軸駆動部、 22 第2Y軸駆動部、 88 拘束ユニット、 100 ステージ装置。 12 first moving body, 14 second moving body, 16 first X-axis drive section, 18 second X-axis drive section, 20 first Y-axis drive section, 22 second Y-axis drive section, 88 restraint unit, 100 stage device.

Claims (4)

第1移動体と、
前記第1移動体をX軸方向に駆動する、Y軸方向に移動可能に構成されたX軸駆動部と、
前記第1移動体のX軸方向の移動を案内し、Y軸方向に移動可能に構成された第2移動体と、
前記X軸駆動部または前記第2移動体をY軸方向に駆動するY軸駆動部と、
前記X軸駆動部と前記第2移動体とのX軸方向の相対移動を拘束せず、Y軸方向の相対移動を両者が非接触の状態で拘束する拘束ユニットと、
を備えることを特徴とするステージ装置。
a first moving body;
an X-axis drive unit that drives the first moving body in the X-axis direction and is configured to be movable in the Y-axis direction;
a second moving body configured to guide movement of the first moving body in the X-axis direction and movable in the Y-axis direction;
a Y-axis drive unit that drives the X-axis drive unit or the second moving body in the Y-axis direction;
a restraint unit that does not restrain the relative movement of the X-axis drive unit and the second moving body in the X-axis direction, but restrains the relative movement of the X-axis drive unit and the second moving body in the Y-axis direction in a state where the two are not in contact with each other;
A stage device comprising:
前記X軸駆動部と前記第2移動体とは、互いに独立して支持されることを特徴とする請求項1に記載のステージ装置。 The stage device according to claim 1, wherein the X-axis drive unit and the second moving body are supported independently of each other. 前記拘束ユニットは、エアの吸引力、エアの反発力、磁気の吸引力または磁気の反発力により、前記X軸駆動部と前記第2移動体とのY軸方向の相対移動を拘束することを特徴とする請求項1または2に記載のステージ装置。 The restraint unit restrains the relative movement of the X-axis drive unit and the second movable body in the Y-axis direction by an air attraction force, an air repulsion force, a magnetic attraction force, or a magnetic repulsion force. The stage device according to claim 1 or 2. 前記X軸駆動部と前記Y軸駆動部とは、互いに独立して支持されることを特徴とする請求項1から3のいずれかに記載のステージ装置。 4. The stage apparatus according to claim 1, wherein the X-axis drive section and the Y-axis drive section are supported independently of each other.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002130281A (en) 2000-10-27 2002-05-09 Sigma Technos Kk Xy stage
WO2006068233A1 (en) 2004-12-24 2006-06-29 Nikon Corporation Magnetic guiding apparatus, stage apparatus, exposure apparatus and device manufacturing method
JP2017208373A (en) 2016-05-16 2017-11-24 住友重機械工業株式会社 Stage device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4078099B2 (en) * 2002-03-14 2008-04-23 株式会社リコー Holding device and holding method
JP4122815B2 (en) * 2002-04-03 2008-07-23 株式会社ニコン Linear motor, stage apparatus, and linear motor control method
JP5106981B2 (en) 2007-10-19 2012-12-26 住友重機械工業株式会社 Stage equipment
TWI471971B (en) * 2007-10-30 2015-02-01 尼康股份有限公司 Substrate holding member, substrate bonding apparatus, laminated substrate manufacturing apparatus, substrate bonding method, laminated substrate manufacturing method, and laminated semiconductor device manufacturing method
JP5026455B2 (en) * 2009-03-18 2012-09-12 住友重機械工業株式会社 XY stage apparatus, semiconductor inspection apparatus, and semiconductor exposure apparatus
JP5295855B2 (en) * 2009-04-28 2013-09-18 住友重機械工業株式会社 Reaction force processing mechanism
JP5304566B2 (en) * 2009-09-16 2013-10-02 株式会社安川電機 Substrate transport device with fail-safe mechanism
JP2018167337A (en) * 2017-03-29 2018-11-01 ブラザー工業株式会社 Machining device
CN108809037A (en) * 2018-06-20 2018-11-13 魏明刚 A kind of electromagnetic engine of low-disturbance power

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002130281A (en) 2000-10-27 2002-05-09 Sigma Technos Kk Xy stage
WO2006068233A1 (en) 2004-12-24 2006-06-29 Nikon Corporation Magnetic guiding apparatus, stage apparatus, exposure apparatus and device manufacturing method
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