JP7364516B2 - Circuit board and imaging module - Google Patents

Circuit board and imaging module Download PDF

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JP7364516B2
JP7364516B2 JP2020056973A JP2020056973A JP7364516B2 JP 7364516 B2 JP7364516 B2 JP 7364516B2 JP 2020056973 A JP2020056973 A JP 2020056973A JP 2020056973 A JP2020056973 A JP 2020056973A JP 7364516 B2 JP7364516 B2 JP 7364516B2
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circuit board
conductor film
image sensor
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JP2021158531A (en
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亮毅 吉田
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Kyocera Corp
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Description

本開示は、回路基板及び撮像モジュールに関する。 The present disclosure relates to a circuit board and an imaging module.

特許文献1には、実装基板と、実装基板に搭載された撮像素子と、実装基板の裏面又は表面側の撮像素子との間に位置するシールド板とを有する撮像素子ユニットが示されている。シールド板により、撮像素子ユニットの近傍にステッピングモータ等の電磁ノイズの発生源が配置されても、電磁ノイズが撮像素子へ伝搬することを軽減できる。 Patent Document 1 discloses an image sensor unit that includes a mounting board, an image sensor mounted on the mounting board, and a shield plate located between the image sensor on the back side or the front side of the mounting board. The shield plate can reduce the propagation of electromagnetic noise to the image sensor even if a source of electromagnetic noise such as a stepping motor is placed near the image sensor unit.

特開2005-039691号公報Japanese Patent Application Publication No. 2005-039691

撮像素子は、取付け角度に高い精度が要求される。シールド板を挟んでこのような撮像素子を回路基板に搭載する場合、シールド板の取付け角度にも高い精度が要求される。接着剤等を用いて高い取付け精度でシールド板を回路基板に接合するには、煩雑な工程を要し、製造コストが高騰する。 Image sensors require high precision in mounting angle. When mounting such an image sensor on a circuit board with a shield plate in between, high precision is also required in the mounting angle of the shield plate. Bonding the shield plate to the circuit board using an adhesive or the like with high mounting accuracy requires a complicated process, which increases manufacturing costs.

本開示は、シールド機能を有しかつ低いコストで製造できる回路基板、並びに、このような回路基板を有する撮像モジュールを提供することを目的とする。 The present disclosure aims to provide a circuit board that has a shielding function and can be manufactured at low cost, and an imaging module that includes such a circuit board.

本開示に係る回路基板は、
膜状の配線導体を含むセラミック基板と、
該セラミック基板上に位置する厚膜の導体膜と、を備え、
該導体膜上に撮像素子の搭載される搭載領域を有し、
前記導体膜は、前記配線導体よりも導電率が高く、かつ、前記配線導体よりも厚い。
The circuit board according to the present disclosure includes:
a ceramic substrate including a film-like wiring conductor;
a thick conductor film located on the ceramic substrate;
having a mounting area on the conductor film in which an image sensor is mounted;
The conductor film has higher conductivity than the wiring conductor and is thicker than the wiring conductor.

本開示に係る撮像モジュールは、
上記の回路基板と、
前記搭載部に搭載された撮像素子と、
を備える。
The imaging module according to the present disclosure includes:
The above circuit board,
an image sensor mounted on the mounting section;
Equipped with

本開示によれば、シールド機能を有しかつ低いコストで製造できる回路基板、並びに、このような回路基板を有する撮像モジュールを提供できる。 According to the present disclosure, it is possible to provide a circuit board that has a shielding function and can be manufactured at low cost, and an imaging module that includes such a circuit board.

本開示の実施形態に係る撮像モジュールを示す平面図(A)とB-B線における断面図(B)である。FIG. 2 is a plan view (A) and a cross-sectional view (B) taken along line BB of an imaging module according to an embodiment of the present disclosure. 変形例1の回路基板を示す断面図である。7 is a cross-sectional view showing a circuit board of Modification 1. FIG. 変形例2の回路基板を示す断面図である。7 is a cross-sectional view showing a circuit board of Modification 2. FIG. 変形例3の回路基板を示す断面図である。7 is a cross-sectional view showing a circuit board of Modification 3. FIG. 変形例4の回路基板を示す断面図である。FIG. 7 is a cross-sectional view showing a circuit board of Modification 4.

以下、本開示の実施形態について図面を参照して詳細に説明する。 Embodiments of the present disclosure will be described in detail below with reference to the drawings.

図1は、本開示の実施形態に係る撮像モジュールを示す平面図(A)とB-B線における断面図(B)である。本実施形態の撮像モジュール1は、回路基板100と、回路基板100に搭載された撮像素子200とを備える。撮像素子200は、例えばCCD(Charge Coupled Device)撮像素子、CMOS(Complementary Metal Oxide Semiconductor)撮像素子など、その種類は限定されない。 FIG. 1 is a plan view (A) and a cross-sectional view (B) taken along the line BB, showing an imaging module according to an embodiment of the present disclosure. The imaging module 1 of this embodiment includes a circuit board 100 and an imaging element 200 mounted on the circuit board 100. The type of image sensor 200 is not limited, and may be, for example, a CCD (Charge Coupled Device) image sensor, a CMOS (Complementary Metal Oxide Semiconductor) image sensor, or the like.

回路基板100は、セラミック基板110と、セラミック基板110上の導体膜150と、導体膜150と撮像素子200との間に介在する樹脂膜160とを含む。回路基板100は、モータモジュール等の高周波の電磁ノイズの発生源の近くに配置されることが想定される。モータモジュールは、電力変換回路から例えばPWM(Pulse Width Modulation)周波数(例えば200kHz以上)の電磁ノイズを発生する。導体膜150は、モータモジュール等から電磁ノイズが伝搬してきたときに、電磁ノイズが撮像素子200に伝わることを抑制する。以下、第1面111に垂直な方向から見て、導体膜150上の撮像素子200と重なる領域を、搭載領域R1と呼ぶ。搭載領域R1は、第1面111に垂直な方向から見たときの撮像素子200と同じ大きさを有する。 Circuit board 100 includes a ceramic substrate 110, a conductor film 150 on ceramic substrate 110, and a resin film 160 interposed between conductor film 150 and image sensor 200. It is assumed that the circuit board 100 is placed near a source of high frequency electromagnetic noise such as a motor module. The motor module generates electromagnetic noise at a PWM (Pulse Width Modulation) frequency (for example, 200 kHz or higher) from a power conversion circuit. The conductive film 150 suppresses electromagnetic noise from being transmitted to the image sensor 200 when it propagates from a motor module or the like. Hereinafter, the area on the conductive film 150 that overlaps with the image sensor 200 when viewed from the direction perpendicular to the first surface 111 will be referred to as a mounting area R1. The mounting area R1 has the same size as the image sensor 200 when viewed from a direction perpendicular to the first surface 111.

セラミック基板110は、絶縁性を有する複数のセラミック層110aが積層された積層体である。セラミック基板110は、導体膜150が位置する第1面111と、第1面111とは反対側の第2面112とを有する。 The ceramic substrate 110 is a laminate in which a plurality of insulating ceramic layers 110a are stacked. The ceramic substrate 110 has a first surface 111 on which the conductor film 150 is located, and a second surface 112 opposite to the first surface 111.

セラミック基板110は、更に、配線導体(ビア導体121、配線導体122、配線電極131、外部電極132)を備える。配線導体は、第1面111に位置し、撮像素子200の端子と電気的に接続される複数の配線電極131と、第2面112に位置し、外部構成と電気的に接続される外部電極132と、セラミック基板110内に位置するビア導体121及び膜状の配線導体122とを含む。配線電極131は、第1面111において撮像素子200の搭載領域R1を投影した領域(第1面111に垂直な方向に投影した領域)から外れた領域に位置する。配線電極131は、例えばボンディングワイヤーwを介して撮像素子200の電極と電気的に接続される。ビア導体121は第1面111に垂直な方向に延在し、配線導体122は第1面111に沿った方向に延在する。ビア導体121及び配線導体122は、第1面111上の配線電極131と第2面112に位置する外部電極132とを電気的に接続する。 The ceramic substrate 110 further includes wiring conductors (via conductor 121, wiring conductor 122, wiring electrode 131, and external electrode 132). The wiring conductor includes a plurality of wiring electrodes 131 located on the first surface 111 and electrically connected to the terminals of the image sensor 200, and an external electrode located on the second surface 112 and electrically connected to external components. 132, a via conductor 121 located within the ceramic substrate 110, and a film-like wiring conductor 122. The wiring electrode 131 is located in a region of the first surface 111 that is outside a region in which the mounting region R1 of the image sensor 200 is projected (a region projected in a direction perpendicular to the first surface 111). The wiring electrode 131 is electrically connected to an electrode of the image sensor 200 via, for example, a bonding wire w. The via conductor 121 extends in a direction perpendicular to the first surface 111, and the wiring conductor 122 extends in a direction along the first surface 111. The via conductor 121 and the wiring conductor 122 electrically connect the wiring electrode 131 on the first surface 111 and the external electrode 132 located on the second surface 112.

ビア導体121及び配線導体122は、タングステン、モリブデンなどの金属材料、もしくは、これらの金属の合金材料を導体成分として含み、複数のセラミック層110aと一体的に焼成される。配線電極131及び外部電極132は、タングステン、モリブデンなどの金属材料、もしくは、これらの金属の合金材料を導体成分として含み、複数のセラミック層110aと一体的に焼成されてもよいし、複数のセラミック層110aが焼成された後に、金属ペーストをスクリーン印刷及び焼成した後付けのメタライズ導体により構成されてもよい。 The via conductor 121 and the wiring conductor 122 contain a metal material such as tungsten or molybdenum, or an alloy material of these metals as a conductor component, and are fired integrally with the plurality of ceramic layers 110a. The wiring electrode 131 and the external electrode 132 contain a metal material such as tungsten or molybdenum, or an alloy material of these metals as a conductor component, and may be fired integrally with the plurality of ceramic layers 110a, or may be fired integrally with the plurality of ceramic layers 110a. After the layer 110a is fired, it may be constructed of a post-attached metallized conductor formed by screen printing and firing a metal paste.

導体膜150は、セラミック基板110の第1面111上に位置し、高周波の電磁ノイズを遮蔽する。導体膜150は、第1面111上に位置する。導体膜150上には、搭載領域R1が位置する。導体膜150は、搭載領域R1の全域にかけて位置してもよいし、搭載領域R1の一部を除く領域に位置してもよい。第1面111に垂直な方向から見て、導体膜150は搭載領域R1より大きく、搭載領域R1を内包していてもよく、このような構成により、撮像素子200に裏側斜め(第1面111に対して斜め)から伝搬する電磁ノイズをより抑制できる。さらに、表側から伝搬する電磁ノイズを周囲に離散させやすい。ここでは、撮像素子200の搭載領域R1側(セラミック基板110とは反対側)を表として、導体膜150の表裏を表わしている。 The conductor film 150 is located on the first surface 111 of the ceramic substrate 110 and shields high frequency electromagnetic noise. The conductive film 150 is located on the first surface 111. A mounting region R1 is located on the conductor film 150. The conductor film 150 may be located over the entire mounting region R1, or may be located in an area excluding a part of the mounting region R1. When viewed from the direction perpendicular to the first surface 111, the conductive film 150 is larger than the mounting region R1 and may include the mounting region R1. It is possible to further suppress electromagnetic noise that propagates from the side (obliquely to the ground). Furthermore, it is easy to disperse electromagnetic noise propagating from the front side to the surroundings. Here, the front and back sides of the conductor film 150 are shown with the mounting area R1 side of the image sensor 200 (the side opposite to the ceramic substrate 110) as the front side.

導体膜150は、膜状の配線導体122よりも厚く、膜状の配線導体122よりも導電率が高い。導体膜150は、配線電極131及び外部電極132よりも厚く、配線電極131及び外部電極132よりも導電率が高くてもよい。一例として、配線導体122の厚みが5~10μmであるのに対して、導体膜150の厚みは100μm以上である。導体膜150の厚みは300μm以下としてもよい。配線導体122の導電率(室温)はタングステン又はモリブデンの導電率17.5~18.5[×10S/m]とほぼ一致し、導体膜150の導電率(室温)は銅又は銀の導電率59~61.4[×10S/m]とほぼ一致する。このような厚み及び誘電率を有する導体膜150により、周波数が例えば100kHz以上の電磁ノイズを遮蔽できる。 The conductor film 150 is thicker than the film-like wiring conductor 122 and has higher conductivity than the film-like wiring conductor 122. The conductor film 150 may be thicker than the wiring electrode 131 and the external electrode 132 and have higher conductivity than the wiring electrode 131 and the external electrode 132. As an example, the thickness of the wiring conductor 122 is 5 to 10 μm, while the thickness of the conductor film 150 is 100 μm or more. The thickness of the conductor film 150 may be 300 μm or less. The electrical conductivity (room temperature) of the wiring conductor 122 almost matches that of tungsten or molybdenum, 17.5 to 18.5 [×10 6 S/m], and the electrical conductivity (room temperature) of the conductor film 150 matches that of copper or silver. The conductivity is approximately equal to 59 to 61.4 [×10 6 S/m]. The conductive film 150 having such a thickness and dielectric constant can shield electromagnetic noise having a frequency of, for example, 100 kHz or more.

導体膜150は、金属ペーストを焼成した厚膜導体である。導体膜150は、金属ペーストを焼成したメタライズ導体あるいは焼成金属と呼んでもよい。導体膜150の材料である金属ペーストは、銅、銀又はこれら両方を導体成分として含み、焼成後の導体膜150は、銅、銀又はこれら両方を主成分として含む。導体膜150が厚膜導体、メタライズ導体及び焼成金属であることは、断面に多くの粒界が含まれることで確認できる。 The conductor film 150 is a thick film conductor made of fired metal paste. The conductor film 150 may also be called a metallized conductor or fired metal obtained by firing a metal paste. The metal paste that is the material of the conductor film 150 contains copper, silver, or both as conductor components, and the conductor film 150 after firing contains copper, silver, or both as main components. The fact that the conductor film 150 is a thick film conductor, a metallized conductor, or a fired metal can be confirmed by the fact that the cross section contains many grain boundaries.

導体膜150は、セラミック基板110の焼成後に、後付けで形成される。導体膜150の成形は、スクリーン印刷により複数回の金属ペーストの印刷を重ねることで所定形状とし、金属ペーストの形状を保ったまま焼成することで実現される。導体膜150の成形は、型を用いた金属ペーストの塗布により実現してもよい。 The conductor film 150 is formed after firing the ceramic substrate 110. The conductor film 150 is formed by printing a metal paste multiple times using screen printing to form a predetermined shape, and then firing the metal paste while maintaining its shape. The conductor film 150 may be formed by applying a metal paste using a mold.

導体膜150の導電率として、上記の高い値を採用するには、銅又は銀などの低融点金属を使用する必要があり、焼成温度の高いセラミック基板110との同時焼成が困難となる。しかし、セラミック基板110の焼成後に、後付けで焼成することで、金属板を接着剤やろう材により接合するよりも、低コストにかつ高い精度でセラミック基板110上に導体膜150を形成できる。さらに、金属板を接着剤により接合するよりも、導体膜150の接合部に高い強度及び高い耐久性(耐熱性)が得られる。 In order to adopt the above-mentioned high value as the electrical conductivity of the conductor film 150, it is necessary to use a low melting point metal such as copper or silver, which makes co-firing with the ceramic substrate 110, which has a high firing temperature, difficult. However, by firing the ceramic substrate 110 after firing, the conductor film 150 can be formed on the ceramic substrate 110 at a lower cost and with higher accuracy than when joining metal plates with an adhesive or a brazing material. Furthermore, higher strength and higher durability (heat resistance) can be obtained at the joint of the conductor film 150 than when metal plates are joined with an adhesive.

導体膜150は、セラミック基板110と接触するベース層と、ベース層上に位置するメイン層など、複数の層を有する構成であってもよい。ベース層はセラミック基板110に対して高い接合強度が得られる成分(ガラス又は活性金属)を含み、メイン層は金属成分をより多く含んでいてもよい。導体膜150は、全域がセラミック基板110に対して接合強度が得られる成分(ガラス又は活性金属)を含んだ同一の成分から構成されてもよい。 The conductor film 150 may have a structure including a plurality of layers, such as a base layer in contact with the ceramic substrate 110 and a main layer located on the base layer. The base layer may contain a component (glass or active metal) that provides high bonding strength to the ceramic substrate 110, and the main layer may contain a larger amount of metal component. The entire conductor film 150 may be made of the same component including a component (glass or active metal) that provides bonding strength to the ceramic substrate 110.

樹脂膜160は、導体膜150上に位置する。樹脂膜160は搭載領域R1を投影した領域(第1面111に垂直な方向に投影した領域)の全域にかけて位置してもよいし、上記投影した領域の一部を除く領域に位置してもよい。樹脂膜160は、導体膜150の表面の平行度及び平坦度に生じる誤差を補い、撮像素子200を搭載する搭載面の平行度及び平坦度をより向上させる。樹脂膜160の材料としては、エポキシ系の熱硬化型樹脂を適用できる。樹脂膜160の材料には、磁性体材料(Fe(鉄)、Fe-Si(フェロシリコン)等の粒子)が含まれていてもよい。樹脂膜160は、導体膜150の焼成後に、硬化前の樹脂材料をスクリーン印刷しかつ硬化させることで形成できる。硬化前の樹脂材料は、導体膜150を構成する硬化前の金属ペーストよりも粘性が低くてもよい。樹脂膜160としては、その他、様々な硬化型、並びに、様々な材質の樹脂が採用されてもよい。 The resin film 160 is located on the conductor film 150. The resin film 160 may be located over the entire area of the projected area of the mounting area R1 (the area projected in the direction perpendicular to the first surface 111), or may be located in an area excluding a part of the projected area. good. The resin film 160 compensates for errors occurring in the parallelism and flatness of the surface of the conductor film 150, and further improves the parallelism and flatness of the mounting surface on which the image sensor 200 is mounted. As a material for the resin film 160, an epoxy-based thermosetting resin can be used. The material of the resin film 160 may include a magnetic material (particles of Fe (iron), Fe-Si (ferrosilicon), etc.). The resin film 160 can be formed by screen printing and curing an uncured resin material after firing the conductor film 150. The resin material before hardening may have a lower viscosity than the metal paste before hardening that constitutes the conductor film 150. As the resin film 160, various other curable resins and resins made of various materials may be employed.

樹脂膜160は、図1に示すように、導体膜150の外面(撮像素子200が位置する側の上面及び側面)の全域を覆っていてもよい。このような構成により、導体膜150の耐腐蝕性を向上できる。撮像素子200は、樹脂膜160上に搭載される。 As shown in FIG. 1, the resin film 160 may cover the entire outer surface of the conductor film 150 (the upper surface and side surface on the side where the image sensor 200 is located). With such a configuration, the corrosion resistance of the conductor film 150 can be improved. The image sensor 200 is mounted on the resin film 160.

<製造方法>
続いて、回路基板100の製造方法の一例を説明する。セラミック基板110は、例えば酸化アルミニウム質焼結体、又は、窒化アルミニウム質焼結体のセラミック焼結体からなる。セラミック材料として、炭化珪素質焼結体又はムライト質焼結体等が用いられてもよい。セラミック基板110は、酸化アルミニウム質焼結体からなる場合であれば、次のようにして製作することができる。まず、酸化アルミニウム粉末及び焼結助剤成分となる酸化ケイ素等の粉末を主成分とする原料粉末を、有機溶剤、バインダと混練してスラリーとするとともに、このスラリーをドクターブレード法又はリップコータ法等の成形方法でシート状に成形してセラミック層110aとなるセラミックグリーンシート(以下、グリーンシートともいう)を作製する。次に、複数のグリーンシートを積層して積層体を作製する。その後、この積層体を約1300℃~1600℃程度の温度で焼成することによってセラミック基板110を製作することができる。
<Manufacturing method>
Next, an example of a method for manufacturing the circuit board 100 will be described. The ceramic substrate 110 is made of a ceramic sintered body, such as an aluminum oxide sintered body or an aluminum nitride sintered body. As the ceramic material, a silicon carbide sintered body, a mullite sintered body, or the like may be used. If the ceramic substrate 110 is made of an aluminum oxide sintered body, it can be manufactured as follows. First, raw material powder mainly composed of aluminum oxide powder and powder of silicon oxide, which is a sintering aid component, is kneaded with an organic solvent and a binder to form a slurry, and this slurry is processed using a doctor blade method or a lip coater method. A ceramic green sheet (hereinafter also referred to as a green sheet) that is molded into a sheet shape and becomes the ceramic layer 110a by the molding method described above is produced. Next, a laminate is produced by laminating a plurality of green sheets. Thereafter, the ceramic substrate 110 can be manufactured by firing this laminate at a temperature of approximately 1300° C. to 1600° C.

セラミック基板110の配線導体(ビア導体121、配線導体122、配線電極131、外部電極132)は、例えば、タングステン又はモリブデン等の金属材料、もしくは、これらの金属材料の合金材料を、セラミックグリーンシートの焼成と同時に焼結させて、セラミック基板110の表面及び内部にメタライズ導体として形成されている。例えば、焼結性を高めるためあるいはセラミックとの接合強度を高めるために、ガラスやセラミックス等の無機成分を含むものとすることもできる。上記の金属材料又は合金材料として、マンガン等の金属材料、マンガン又は銅等をさらに含む複合材料、もしくは、これらの金属の合金材料が適用されてもよい。 The wiring conductors (via conductor 121, wiring conductor 122, wiring electrode 131, external electrode 132) of the ceramic substrate 110 are made of a metal material such as tungsten or molybdenum, or an alloy material of these metal materials, and a ceramic green sheet. A metallized conductor is formed on the surface and inside of the ceramic substrate 110 by sintering at the same time as firing. For example, it may contain an inorganic component such as glass or ceramics in order to improve sinterability or bond strength with ceramics. As the above metal material or alloy material, a metal material such as manganese, a composite material further containing manganese or copper, or an alloy material of these metals may be applied.

膜状の配線導体122、配線電極131及び外部電極132は、例えば、タングステンのメタライズ層である場合には、以下のようにして形成することができる。例えば、タングステンの粉末を有機溶剤及び有機バインダと混合して作製した金属ペーストをセラミック層110aとなる上記グリーンシートの所定位置にスクリーン印刷法等の方法で印刷してグリーンシートとともに焼成する方法で形成することができる。また、ビア導体121は、上記の金属ペーストの印刷に先駆けてグリーンシートの所定の位置に貫通孔を設け、上記と同様の金属ペーストをこの貫通孔に充填しておき、グリーンシートとともに焼成する方法で形成することができる。 For example, when the film-like wiring conductor 122, wiring electrode 131, and external electrode 132 are metalized layers of tungsten, they can be formed as follows. For example, it is formed by printing a metal paste prepared by mixing tungsten powder with an organic solvent and an organic binder on a predetermined position of the green sheet that will become the ceramic layer 110a using a method such as screen printing, and firing it together with the green sheet. can do. In addition, the via conductor 121 is formed by providing a through hole at a predetermined position of the green sheet prior to printing the metal paste described above, filling the through hole with the same metal paste as described above, and firing it together with the green sheet. can be formed with.

配線電極131及び外部電極132のように露出する導体層の表面には、1~10μm程度のニッケル膜及び0.1~3μm程度の金膜を順に形成して、その表面を保護するとともに、ろう材やはんだ等の接合性を高めることができる。ニッケル膜及び金膜は、電解めっきによるめっき膜あるいは薄膜で形成することができる。 A nickel film of approximately 1 to 10 μm and a gold film of approximately 0.1 to 3 μm are sequentially formed on the surfaces of exposed conductor layers such as the wiring electrodes 131 and external electrodes 132 to protect the surfaces and to prevent soldering. It is possible to improve the bondability of materials, solders, etc. The nickel film and the gold film can be formed as a plated film or a thin film by electrolytic plating.

導体膜150は、銅等の金属材料、もしくは、このような金属材料の合金材料を、セラミックグリーンシートの焼成後に、後付けで焼結したメタライズ導体である。導体膜150は、例えば、銅等の金属粉末を有機溶剤及び有機バインダと混合して作製した金属ペーストをセラミック基板110の第1面111の所定位置にスクリーン印刷法等の方法で複数回印刷して所定の厚み及び所定の形状に成形し、セラミック基板110の焼成温度よりも低い温度で焼成する方法で形成できる。 The conductor film 150 is a metallized conductor obtained by sintering a metal material such as copper or an alloy material of such a metal material after firing the ceramic green sheet. The conductor film 150 is formed by, for example, printing a metal paste prepared by mixing metal powder such as copper with an organic solvent and an organic binder at a predetermined position on the first surface 111 of the ceramic substrate 110 multiple times using a method such as screen printing. The ceramic substrate 110 can be formed by molding it into a predetermined thickness and shape and firing it at a temperature lower than the firing temperature of the ceramic substrate 110.

樹脂膜160は、導体膜150の焼成後に、例えばエポキシ系の熱硬化型樹脂をスクリーン印刷法等の方法で所定位置に印刷し、硬化させることで形成できる。硬化前の樹脂は、導体膜150の材料である上記金属ペーストよりも粘性が低く、十分な厚みを設け、水平度を維持して硬化させることで、導体膜150の表面の高い平行度(第1面111に対する平行度)及び高い平坦度を達成できる。例えば、搭載領域R1と重なる範囲における樹脂膜160の厚みは100μm~250μmであってもよく、第1面111を水平にしたときに搭載領域R1と重なる範囲における導体膜150の表面の一番低い点と高い点との差が30μm以下の平坦度を実現できる。上記の搭載領域R1と重なる範囲とは、第1面111に垂直な方向に重なる範囲を意味し、搭載領域R1を投影した領域(第1面111に垂直な方向に投影した領域)と同義である。 The resin film 160 can be formed by printing, for example, an epoxy-based thermosetting resin at a predetermined position by a method such as screen printing and curing the resin film 160 after firing the conductor film 150. The resin before curing has a lower viscosity than the metal paste that is the material of the conductor film 150, and by providing a sufficient thickness and curing it while maintaining horizontality, the surface of the conductor film 150 has a high degree of parallelism. Parallelism with respect to one surface 111) and high flatness can be achieved. For example, the thickness of the resin film 160 in the range overlapping with the mounting region R1 may be 100 μm to 250 μm, and the lowest surface of the conductor film 150 in the range overlapping with the mounting region R1 when the first surface 111 is made horizontal. Flatness with a difference of 30 μm or less between a point and a high point can be achieved. The range that overlaps with the mounting area R1 above means the range that overlaps in the direction perpendicular to the first surface 111, and is synonymous with the area in which the mounting area R1 is projected (the area projected in the direction perpendicular to the first surface 111). be.

以上のように、本実施形態の回路基板100及び撮像モジュール1によれば、膜状の配線導体122を有するセラミック基板110と、セラミック基板110上に位置する導体膜150とを有する。そして、導体膜150上に撮像素子200の搭載領域R1が位置する。さらに、導体膜150は、配線導体122よりも厚く、配線導体122よりも導電率が高い。したがって、回路基板100の第2面112側から電磁ノイズが伝搬しても、導体膜150により、電磁ノイズを遮蔽して電子ノイズが撮像素子200に伝搬することを抑制できる。導体膜150の厚みが配線導体122の厚みの3倍以上であることで、電磁ノイズの遮蔽作用をより向上できる。さらに、導体膜150は、厚膜の導体で焼成された金属なので、接着剤やろう材による接合等と比較して、取付け角度の精度を低下させずに低いコストで製造できる。さらに、接着剤による接合等と比較して、導体膜150とセラミック基板110との接合部に高い強度及び高い耐久性(耐熱性)を付与できる。 As described above, the circuit board 100 and the imaging module 1 of this embodiment include the ceramic substrate 110 having the film-like wiring conductor 122 and the conductor film 150 located on the ceramic substrate 110. Then, a mounting region R1 for the image sensor 200 is located on the conductor film 150. Further, the conductive film 150 is thicker than the wiring conductor 122 and has higher conductivity than the wiring conductor 122. Therefore, even if electromagnetic noise propagates from the second surface 112 side of the circuit board 100, the conductor film 150 can shield the electromagnetic noise and suppress the propagation of electronic noise to the image sensor 200. When the thickness of the conductor film 150 is three times or more the thickness of the wiring conductor 122, the electromagnetic noise shielding effect can be further improved. Furthermore, since the conductor film 150 is a thick film conductor made of fired metal, it can be manufactured at a lower cost without reducing the precision of the mounting angle, compared to bonding using adhesives or brazing filler metals. Furthermore, compared to bonding using an adhesive or the like, high strength and high durability (heat resistance) can be imparted to the bonded portion between the conductive film 150 and the ceramic substrate 110.

さらに、本実施形態の回路基板100は、撮像素子である撮像素子200を搭載する基板として適用されている。撮像素子の近傍には、光学部品又は撮像モジュール1を変位させるモータモジュール等の電磁ノイズの発生源が配置されることがあり、電磁ノイズが撮像信号に載ると画質が劣化することがある。そこで、上記の電磁ノイズの遮蔽作用により、撮像信号にノイズが載ること、並びに、ノイズに起因する撮像画像の劣化を抑制できる。 Furthermore, the circuit board 100 of this embodiment is applied as a board on which an image sensor 200, which is an image sensor, is mounted. A source of electromagnetic noise, such as an optical component or a motor module that displaces the imaging module 1, may be placed near the imaging device, and if electromagnetic noise is added to the imaging signal, image quality may deteriorate. Therefore, by the electromagnetic noise shielding effect described above, it is possible to suppress noise from being added to the imaging signal and deterioration of the captured image due to the noise.

さらに、本実施形態の回路基板100及び撮像モジュール1によれば、導体膜150上に位置する樹脂膜160を更に備える。樹脂膜160を有することで、仮に、導体膜150の表面の平行度及び平坦度に誤差が生じても、樹脂膜160により誤差を補って、撮像素子200を搭載する搭載面の平行度及び平坦度をより向上できる。導体膜150の厚みを増すと、導体膜150の表面の平行度及び平坦度に誤差が生じやすくなるが、樹脂膜160により上記誤差を補填できることで、搭載面の平行度及び平坦度を低下させずに、導体膜150を厚く設計できる。さらに、樹脂膜160が磁性体材料を含んでいることで、樹脂膜160においても電磁ノイズの遮蔽作用を得ることができる。 Furthermore, according to the circuit board 100 and the imaging module 1 of this embodiment, the resin film 160 located on the conductor film 150 is further provided. By having the resin film 160, even if an error occurs in the parallelism and flatness of the surface of the conductor film 150, the resin film 160 compensates for the error and improves the parallelism and flatness of the mounting surface on which the image sensor 200 is mounted. You can further improve your degree. When the thickness of the conductor film 150 is increased, errors tend to occur in the parallelism and flatness of the surface of the conductor film 150, but since the resin film 160 can compensate for the above errors, the parallelism and flatness of the mounting surface can be reduced. Therefore, the conductor film 150 can be designed to be thicker. Furthermore, since the resin film 160 contains a magnetic material, the resin film 160 can also have an electromagnetic noise shielding effect.

さらに、本実施形態では、導体膜150がセラミック基板110内の配線導体122と異なる金属材料から構成される。したがって、配線導体122に要求される特性(例えばセラミック基板110との同時焼成可能な特性など)と、導体膜150に要求される特性(高い導電率、厚膜の成形性など)とが異なっても、両方の要求に応じることができる。 Furthermore, in this embodiment, the conductor film 150 is made of a metal material different from that of the wiring conductor 122 in the ceramic substrate 110. Therefore, the characteristics required for the wiring conductor 122 (for example, characteristics that allow co-firing with the ceramic substrate 110, etc.) and the characteristics required for the conductor film 150 (high conductivity, formability of thick films, etc.) are different. We can also meet both requests.

本実施形態の撮像モジュール1によれば、上記の作用が奏される回路基板100により、耐ノイズ性能を向上できる。 According to the imaging module 1 of this embodiment, the noise resistance performance can be improved by the circuit board 100 that exhibits the above-described effects.

(変形例)
図2は、変形例1の回路基板を示す断面図である。図2では撮像素子200を仮想線で示す。変形例1の回路基板100Aは、樹脂膜160Aの形成領域が異なる他は、構造、材質、用途及び製造方法を含め、前述した回路基板100と同様である。変形例1の回路基板100Aは、樹脂膜160Aを導体膜150上に配置し、導体膜150の側面まで覆っていない。このような構成により、樹脂膜160Aの成形がより容易となる。
(Modified example)
FIG. 2 is a sectional view showing a circuit board of Modification 1. In FIG. 2, the image sensor 200 is shown by a virtual line. The circuit board 100A of Modification 1 is the same as the circuit board 100 described above, including the structure, material, application, and manufacturing method, except that the region in which the resin film 160A is formed is different. In the circuit board 100A of Modification 1, the resin film 160A is placed on the conductor film 150, and does not cover the side surfaces of the conductor film 150. Such a configuration makes it easier to mold the resin film 160A.

図3は、変形例2の回路基板を示す断面図である。図4は、変形例3の回路基板を示す断面図である。図3及び図4では撮像素子200を仮想線で示す。変形例2と変形例3の回路基板100B、100Cは、導体膜150B、150C及び樹脂膜160B、160Cの形状が異なる他は、構造、材質、用途及び製造方法を含め、前述した回路基板100と同様である。 FIG. 3 is a sectional view showing a circuit board of Modification 2. FIG. FIG. 4 is a sectional view showing a circuit board of Modification 3. In FIGS. 3 and 4, the image sensor 200 is shown by a virtual line. The circuit boards 100B and 100C of Modifications 2 and 3 are different from the circuit board 100 described above in terms of structure, material, application, and manufacturing method, except that the shapes of the conductor films 150B and 150C and the resin films 160B and 160C are different. The same is true.

図3に示すように、変形例2の導体膜150Bは、第1面111に垂直な方向から見たときの導体膜150Bの縁部よりも中央部の方が、薄い。例えば、導体膜150Bの縁部よりも中央部の方が30μm~70μm薄くてもよい。このような形状は、焼成前の金属ペーストを複数重ねてスクリーン印刷する際の印刷パターンにより形成できる。また、型成形により上記形状の導体膜150Bを形成することもできる。一方、樹脂膜160Bは、導体膜150Bの表面の凹みを相殺するように、第1面111に垂直な方向からみたときの搭載領域R1の縁部よりも中央部の方が厚く、撮像素子200の搭載面は平坦である。 As shown in FIG. 3, the conductive film 150B of Modification 2 is thinner at the center than at the edge when viewed from a direction perpendicular to the first surface 111. For example, the center portion of the conductor film 150B may be thinner by 30 μm to 70 μm than the edge portion. Such a shape can be formed by a printing pattern when a plurality of unfired metal pastes are stacked and screen printed. Further, the conductor film 150B having the above shape can also be formed by molding. On the other hand, the resin film 160B is thicker at the center than at the edge of the mounting area R1 when viewed from the direction perpendicular to the first surface 111, so as to offset the depression on the surface of the conductor film 150B, and the resin film 160B is The mounting surface is flat.

導体膜150Bの厚さを縁部と中央部とで異ならせることで、導体膜150Bの側面を介して撮像素子200に向かって斜めに伝搬してくる電磁ノイズに対して、導体膜150Bのこの部分の厚みが増すことで、遮蔽作用を向上できる。さらに、導体膜150Bの厚さを縁部と中央部とで異ならせることで、使用する銅の量を必要最小限に抑えることができ、さらに、樹脂膜160Bの形成工程において、硬化前の樹脂材料を導体膜150Bの凹状部に溜めやすく、硬化後の樹脂膜160Bの表面を平坦にしやすいという効果が奏される。 By making the thickness of the conductive film 150B different between the edge portion and the center portion, this portion of the conductive film 150B can be prevented from electromagnetic noise propagating diagonally toward the image sensor 200 via the side surface of the conductive film 150B. By increasing the thickness of the part, the shielding effect can be improved. Furthermore, by making the thickness of the conductor film 150B different between the edge and the center, the amount of copper used can be minimized. This has the effect of easily accumulating the material in the concave portion of the conductive film 150B and making it easy to flatten the surface of the resin film 160B after hardening.

図4に示すように、変形例3の導体膜150Cは、撮像素子200側の面に複数の凹凸Dを有する。凹凸Dは、筋状の凹凸であってもよいし、ドット状の凹凸であってもよい。第1面111に垂直な方向を高さ方向としたとき、凹凸Dの底から上端までの高さは15μm~50μmであってもよい。樹脂膜160Cは、導体膜150Cの凹凸Dを覆って、平坦な撮像素子200の搭載面を有する。導体膜150Cの凹凸Dは、焼成前の金属ペーストをメッシュ状にスクリーン印刷することで形成できる。 As shown in FIG. 4, the conductive film 150C of Modification 3 has a plurality of irregularities D on the surface facing the image sensor 200. The unevenness D may be a linear unevenness or a dot-like unevenness. When the direction perpendicular to the first surface 111 is defined as the height direction, the height from the bottom to the top of the unevenness D may be 15 μm to 50 μm. The resin film 160C covers the unevenness D of the conductor film 150C and has a flat mounting surface for the image sensor 200. The unevenness D of the conductor film 150C can be formed by screen printing a metal paste in a mesh shape before firing.

導体膜150Cの表面に複数の凹凸Dを有することで、平板状の導体では遮蔽できない電磁ノイズに対して遮蔽作用を得ることができる。さらに、複数の凹凸Dにより、樹脂膜160Cの形成時に硬化前の樹脂が横方向(第1面111に沿った方向)に流れることを抑制し、樹脂膜160Cの成形が容易になる。また、複数の凹凸Dにより、導体膜150Cと樹脂膜160Cの接合強度が上がるという効果が奏される。 By having a plurality of irregularities D on the surface of the conductive film 150C, it is possible to obtain a shielding effect against electromagnetic noise that cannot be shielded by a flat conductor. Furthermore, the plurality of irregularities D suppresses the resin before hardening from flowing in the lateral direction (direction along the first surface 111) when forming the resin film 160C, making it easier to mold the resin film 160C. Furthermore, the plurality of irregularities D has the effect of increasing the bonding strength between the conductor film 150C and the resin film 160C.

図5は、変形例4の回路基板を示す断面図である。図5では撮像素子200及びボンディングワイヤーwを仮想線で示す。変形例5の回路基板100Dは、セラミック基板110が第1面111に凹部Fを有し、凹部F内に導体膜150と樹脂膜160とが位置する。その他の、構造、材質、用途及び製造方法は、前述した回路基板100と同様である。配線電極131は、凹部Fの開口よりも外に位置してもよい。このような構成によれば、凹部Fにより導体膜150及び樹脂膜160による厚みの増加分を吸収し、撮像モジュール1の厚みを削減できる。また、配線電極131と撮像素子200との高低差が縮小され、ワイヤーボンディング作業が容易となる。なお、凹部Fの無い前述の回路基板100、100A~100Cは、導体膜150及び樹脂膜160を形成する際にスクリーン印刷しやすいという利点を有する。 FIG. 5 is a cross-sectional view showing a circuit board of modification 4. In FIG. 5, the image sensor 200 and the bonding wire w are shown by virtual lines. In the circuit board 100D of modification 5, the ceramic substrate 110 has a recess F on the first surface 111, and the conductor film 150 and the resin film 160 are located within the recess F. The other structures, materials, uses, and manufacturing methods are the same as those of the circuit board 100 described above. The wiring electrode 131 may be located outside the opening of the recess F. According to such a configuration, the increase in thickness due to the conductive film 150 and the resin film 160 can be absorbed by the recessed portion F, and the thickness of the imaging module 1 can be reduced. Furthermore, the difference in height between the wiring electrode 131 and the image sensor 200 is reduced, making wire bonding work easier. Note that the aforementioned circuit boards 100, 100A to 100C without recesses F have the advantage that screen printing is easy to perform when forming the conductive film 150 and the resin film 160.

以上、本開示の実施形態について説明した。しかし、本発明は上記実施形態に限られるものでない。例えば、上記実施形態では、樹脂膜160を有する回路基板を示したが、樹脂膜160は省略されてもよい。その他、実施形態で示した細部は、発明の趣旨を逸脱しない範囲で適宜変更可能である。 The embodiments of the present disclosure have been described above. However, the present invention is not limited to the above embodiments. For example, in the above embodiment, a circuit board having the resin film 160 is shown, but the resin film 160 may be omitted. Other details shown in the embodiments can be changed as appropriate without departing from the spirit of the invention.

1 撮像モジュール
100、100A~100D 回路基板
110 セラミック基板
110a セラミック層
111 第1面
112 第2面
121 ビア導体
122 配線導体
131 配線電極
132 外部電極
150、150B、150C 導体膜
160、160A、160B、160C 樹脂膜
200 撮像素子
D 凹凸
F 凹部
R1 搭載領域
w ボンディングワイヤー
1 Imaging module 100, 100A to 100D Circuit board 110 Ceramic substrate 110a Ceramic layer 111 First surface 112 Second surface 121 Via conductor 122 Wiring conductor 131 Wiring electrode 132 External electrode 150, 150B, 150C Conductor film 160, 160A, 160B, 160C Resin film 200 Image sensor D Unevenness F Recess R1 Mounting area w Bonding wire

Claims (8)

膜状の配線導体を含むセラミック基板と、
該セラミック基板上に位置する厚膜の導体膜と、を備え、
該導体膜上に撮像素子の搭載される搭載領域を有し、
前記導体膜は、前記配線導体よりも導電率が高く、かつ、前記配線導体よりも厚い、回路基板。
a ceramic substrate including a film-like wiring conductor;
a thick conductor film located on the ceramic substrate;
having a mounting area on the conductor film in which an image sensor is mounted;
The circuit board, wherein the conductor film has higher conductivity than the wiring conductor and is thicker than the wiring conductor.
前記導体膜の前記搭載領域上に位置する樹脂膜を、
更に備える、
請求項1記載の回路基板。
A resin film located on the mounting area of the conductor film,
Further prepare,
The circuit board according to claim 1.
前記樹脂膜は、磁性体材料を含んでいる、
請求項2記載の回路基板。
The resin film contains a magnetic material.
The circuit board according to claim 2.
前記導体膜の厚みは、前記配線導体の厚みの3倍以上である、
請求項1から請求項3のいずれか一項に記載の回路基板。
The thickness of the conductor film is three times or more the thickness of the wiring conductor,
The circuit board according to any one of claims 1 to 3.
前記導体膜は、縁部の厚みよりも中央部の厚みが小さい、
請求項1から請求項4のいずれか一項に記載の回路基板。
The conductor film has a thickness smaller at the center than at the edges.
The circuit board according to any one of claims 1 to 4.
前記導体膜は、厚み方向に複数の凹凸を有する、
請求項1から請求項5のいずれか一項に記載の回路基板。
The conductor film has a plurality of unevenness in the thickness direction,
The circuit board according to any one of claims 1 to 5.
前記導体膜は、前記配線導体と異なる金属材料から構成される、
請求項1から請求項6のいずれか一項に記載の回路基板。
The conductor film is made of a metal material different from the wiring conductor,
The circuit board according to any one of claims 1 to 6.
請求項1から請求項7のいずれか一項に記載の回路基板と、
前記搭載領域に搭載された撮像素子と、
を備える撮像モジュール。
The circuit board according to any one of claims 1 to 7,
an image sensor mounted in the mounting area;
An imaging module comprising:
JP2020056973A 2020-03-27 2020-03-27 Circuit board and imaging module Active JP7364516B2 (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008235551A (en) 2007-03-20 2008-10-02 Kyocera Corp Circuit board and electronic device using the same
CN205792909U (en) 2016-05-27 2016-12-07 鸿富锦精密工业(深圳)有限公司 Camera module

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008235551A (en) 2007-03-20 2008-10-02 Kyocera Corp Circuit board and electronic device using the same
CN205792909U (en) 2016-05-27 2016-12-07 鸿富锦精密工业(深圳)有限公司 Camera module

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