JP7288673B2 - Composition for lotion - Google Patents
Composition for lotion Download PDFInfo
- Publication number
- JP7288673B2 JP7288673B2 JP2020080994A JP2020080994A JP7288673B2 JP 7288673 B2 JP7288673 B2 JP 7288673B2 JP 2020080994 A JP2020080994 A JP 2020080994A JP 2020080994 A JP2020080994 A JP 2020080994A JP 7288673 B2 JP7288673 B2 JP 7288673B2
- Authority
- JP
- Japan
- Prior art keywords
- composition
- mass
- lotion
- present
- amino acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Cosmetics (AREA)
Description
本発明は、化粧水用組成物に関し、特に、抗菌剤フリーの化粧水用組成物に関する。 TECHNICAL FIELD The present invention relates to a lotion composition, and more particularly to an antibacterial agent-free lotion composition.
化粧水には一般的に、中身や容器が微生物により腐敗などの変性を起こさないように、微生物の繁殖や成育を抑制する防腐・殺菌成分が配合されている。多くの防腐・殺菌成分は、配合可能成分リスト（ポジティブリスト）に記載されているので、配合規制がある。 Lotions generally contain antiseptic and sterilizing ingredients that suppress the growth and growth of microorganisms so that the contents and containers do not deteriorate such as putrefaction due to microorganisms. Many antiseptic and sterilizing ingredients are included in the list of ingredients that can be added (positive list), so there are restrictions on their inclusion.
例えば、殺菌剤を含む拭き取り用の化粧水であって、敏感肌用、ニキビ予防用、及びニキビ改善用からなる群より選ばれた用途に用いられ、下記成分（Ａ）、下記成分（Ｂ）、下記成分（Ｃ）、下記成分（Ｄ）、及び下記成分（Ｅ）を含むことを特徴とする化粧水が知られている（特許文献１）。
成分（Ａ）：抗炎症剤
成分（Ｂ）：殺菌剤
成分（Ｃ）：脂肪酸エステル非イオン性界面活性剤
成分（Ｄ）：保湿剤
成分（Ｅ）：水
For example, a lotion for wiping containing a disinfectant, which is used for applications selected from the group consisting of sensitive skin, acne prevention, and acne improvement, and includes the following component (A) and the following component (B). , the following component (C), the following component (D), and the following component (E) are known (Patent Document 1).
Ingredient (A): Anti-inflammatory agent Ingredient (B): Bactericide Ingredient (C): Fatty acid ester nonionic surfactant Ingredient (D): Moisturizer Ingredient (E): Water
このように、上述の特許文献１を含め従来技術においては、中身や容器が微生物により腐敗などの変性を起こさないように、殺菌剤を含むものが多いのが現状である。一方で、未だにこれらの抗菌成分等は有害であるという認識を持つ消費者が多いことから、防腐・殺菌剤を配合しないことが望まれる。したがって、使用する前に、内容物や容器が微生物により腐敗などの変性を起こさないように、防腐・殺菌成分以外の手段によって、微生物の繁殖や成育を抑制することができれば望ましい。 As described above, the current situation is that many of the conventional technologies, including the above-mentioned Patent Document 1, contain a disinfectant so as to prevent deterioration such as putrefaction of contents and containers by microorganisms. On the other hand, since many consumers still recognize that these antibacterial ingredients are harmful, it is desirable not to add preservatives/bactericides. Therefore, it is desirable to suppress the propagation and growth of microorganisms by means other than antiseptic/sterilizing components so that contents and containers are not degraded by microorganisms before use.
そこで、本発明は、抗菌力を有し、安全性を有する化粧水組成物を提供することにある。 Accordingly, an object of the present invention is to provide a cosmetic water composition having antibacterial activity and safety.
上記目的を達成するために、本発明者らは、防腐、殺菌成分を配合することなく、抗菌性を有する組成物について鋭意検討した結果、本発明を見出すに至った。 In order to achieve the above objects, the present inventors have made intensive studies on compositions having antibacterial properties without adding antiseptic or bactericidal components, and as a result, have found the present invention.
すなわち、本発明の化粧水用組成物は、L-システイン、L-アルギニン、L-リシン、又はL－ヒスチジンの少なくとも1種のアミノ酸と、還元性イオン水とを含有する化粧水用組成物であって、前記化粧水用組成物のｐHは１０．９～１１．６３９であり、前記アミノ酸の含有量は、化粧水用組成物の全量に対して、０．０１質量％～０．００００１質量％の範囲であることを特徴とする。
That is, the cosmetic composition of the present invention is a cosmetic composition containing at least one amino acid selected from L-cysteine, L-arginine, L-lysine, or L-histidine , and reducing ionized water. The pH of the lotion composition is 10.9 to 11.639, and the content of the amino acid is 0.01% by mass to 0.00001% by mass with respect to the total amount of the lotion composition. % range .
また、本発明の化粧水用組成物の好ましい実施態様において、前記還元性イオン水の含有量は、化粧水用組成物の全量に対して、１０質量％～９０質量％の範囲であることを特徴とする。
Further, in a preferred embodiment of the composition for lotion of the present invention, the content of the reducing ionized water is in the range of 10% by mass to 90% by mass with respect to the total amount of the composition for lotion. Characterized by
また、本発明の抗菌水用組成物の好ましい実施態様において、前記アミノ酸の含有量は、化粧水用組成物の全量に対して、０．００１質量％～０．００００１質量％の範囲であることを特徴とする。
In a preferred embodiment of the composition for antibacterial water of the present invention, the content of the amino acid is in the range of 0.001 % by mass to 0.00001% by mass with respect to the total amount of the composition for lotion. characterized by
また、本発明の化粧水用組成物の好ましい実施態様において、前記還元性イオン水の含有量は、化粧水用組成物の全量に対して、１０質量％～９０質量％の範囲であることを特徴とする。 Further, in a preferred embodiment of the composition for lotion of the present invention, the content of the reducing ionized water is in the range of 10% by mass to 90% by mass with respect to the total amount of the composition for lotion. Characterized by
また、本発明の化粧水用組成物の好ましい実施態様において、炭酸ナトリウム、炭酸ソーダ、又は炭酸水素ナトリウムからなるｐH調整剤を含有しないことを特徴とする。 A preferred embodiment of the cosmetic composition of the present invention is characterized in that it does not contain a pH adjuster consisting of sodium carbonate, sodium carbonate, or sodium hydrogen carbonate.
本発明の化粧水用組成物によれば、いわゆる防腐剤や殺菌剤を配合せず、抗菌性を有する化粧水用組成物の提供が可能であるという有利な効果を奏する。 According to the cosmetic composition of the present invention, there is an advantageous effect that it is possible to provide a cosmetic composition having antibacterial properties without blending so-called preservatives or bactericidal agents.
本発明の化粧水用組成物は、L-システイン、L-アルギニン、L-リシン、又はL－ヒスチジンの少なくとも1種のアミノ酸を含有する化粧水用組成物であって、前記化粧水用組成物のｐHは１０．９以上、より好ましくは、１１．５以上であることを特徴とする。これは、抗菌成分等の添加を望まない消費者に対して、いわゆる防腐・殺菌剤を配合せずに、抗菌作用を有する組成物を提供しようとするものである。本発明において、L-システイン、L-アルギニン、L-リシン、又はL－ヒスチジンの少なくとも1種のアミノ酸を含有することとしたのは、人の毛髪の約８０％はアミノ酸由来のケラチンタンパク質により構成され、Ｌ－システインはその毛髪にも多く含まれるアミノ酸であること、代表的な塩基性アミノ酸としてＬ－アルギニン、Ｌ－リシン、Ｌ－ヒスチジンが挙げられるが、これらのアミノ酸と、抗菌力を有するアルカリ性のｐH値により、防腐・殺菌成分を配合せずとも、微生物等の繁殖を抑制し得ることからである。なお、Ｌ－システイン及びその塩類は毛髪の保湿および柔軟性を保たせることが可能であり、Ｌ－アルギニン、Ｌ－リシン、Ｌ－ヒスチジン等は毛髪の損傷により毛髪から流出するため、添加することにより、アミノ酸成分を補充することも可能となる。 The cosmetic composition of the present invention is a cosmetic composition containing at least one amino acid selected from L-cysteine, L-arginine, L-lysine, and L-histidine. has a pH of 10.9 or higher, more preferably 11.5 or higher. This is intended to provide a composition having an antibacterial action without blending a so-called antiseptic/bactericidal agent to consumers who do not desire the addition of an antibacterial component or the like. In the present invention, at least one amino acid of L-cysteine, L-arginine, L-lysine, or L-histidine is included because about 80% of human hair is composed of amino acid-derived keratin protein. L-cysteine is an amino acid that is also abundantly contained in hair, and representative basic amino acids include L-arginine, L-lysine, and L-histidine. This is because the alkaline pH value makes it possible to suppress the growth of microorganisms and the like without adding antiseptic/bactericidal components. Incidentally, L-cysteine and its salts can keep the hair moisturized and flexible, and L-arginine, L-lysine, L-histidine, etc. are added because they flow out of the hair due to hair damage. It also becomes possible to replenish amino acid components.
このように、本発明においては、アルカリ度が極めて低いため塗布されたときに肌の中和能で瞬時に弱酸性になり、肌に刺激のない化粧水とすることができる。したがって、肌に塗布される前は、ｐＨ１０．９以上～ｐＨ１１．５付近なので防腐剤を配合しなくても抗菌性のある化粧水であり、肌に塗布されると瞬時に弱酸性（肌表面でｐＨ６．０付近）になることを特徴の一つとすることができる。 Thus, in the present invention, since the alkalinity is extremely low, when applied, it instantly becomes weakly acidic due to the neutralizing ability of the skin, and can be used as a lotion that does not irritate the skin. Therefore, before it is applied to the skin, it is pH 10.9 or higher to around pH 11.5, so it is a lotion with antibacterial properties even if it does not contain preservatives. It can be one of the characteristics that the pH becomes around 6.0 at
また、本発明の化粧水用組成物の好ましい実施態様において、前記アミノ酸の含有量は、化粧水用組成物の全量に対して、１．０質量％～０．００００１質量％の範囲、より好ましくは、０．０１質量％～０．０００１質量％の範囲であることを特徴とする。かかる範囲としたのは、この程度の量であれば、抗菌性を有する組成物として効果を発揮し得るからである。 In a preferred embodiment of the composition for skin lotion of the present invention, the content of the amino acid is in the range of 1.0% by mass to 0.00001% by mass, more preferably 0.00001% by mass, relative to the total amount of the composition for skin lotion. is in the range of 0.01% by mass to 0.0001% by mass. This range is set because the amount of this amount can exhibit an effect as a composition having antibacterial properties.
本発明において、ｐH値の調整は、配合するアミノ酸の種類、配合量等により適宜調整可能である。一般に、炭酸ナトリウムの他、炭酸ソーダ、炭酸水素ナトリウム等を含めｐH調整剤を用いて調整することができるが、このようなｐH調整剤の使用は、組成物のアルカリ度が高くなりｐＨを維持する力は強くなり、肌に塗布した場合は瞬時に弱酸性には戻りづらくなる傾向がある。 In the present invention, the adjustment of the pH value can be appropriately adjusted depending on the type of amino acid to be blended, the blending amount, and the like. Generally, in addition to sodium carbonate, pH adjustment agents including sodium carbonate, sodium hydrogen carbonate, etc. can be used to adjust the pH. It tends to become difficult to instantly return to weak acidity when applied to the skin.
したがって、かかる観点から、本発明の好ましい実施態様において、ｐH調整剤を含有しないことを特徴とする。 Therefore, from this point of view, a preferred embodiment of the present invention is characterized by not containing a pH adjuster.
また、本発明において、前記化粧水用組成物のｐHは１０．９以上であるとしたのは、このようなｐH値であれば、いわゆる防腐・殺菌成分を添加しなくても、多くの好アルカリ性微生物を排除することが可能だからである。 Further, in the present invention, the reason why the pH of the composition for lotion is 10.9 or more is that such a pH value can be used without adding so-called antiseptic/bactericidal ingredients, and many favorable products can be obtained. This is because it is possible to exclude alkaline microorganisms.
また、本発明の化粧水用組成物の好ましい実施態様において、さらに、還元性イオン水を含有することを特徴とする。上述のように、ｐH値の調整は、配合するアミノ酸の種類、配合量等により適宜調整可能であるが、配合するアミノ酸や配合量によっては、所望のpH値を達成できない虞もある。この場合には、還元性イオン水を使用することができる。還元イオン水は、電気分解され、アルカリ性を示す水とすることができる。例えば、還元イオン水としては、株式会社エー・アイ・システムプロダクトが製造販売するＳ－１００等を挙げることができ、Ｓ-１００は、、電気分解された高機能還元性イオン水で、化粧品表示名称は「水」、ｐＨ１２±０．５のアルカリ性水である。 A preferred embodiment of the cosmetic water composition of the present invention is characterized by further containing reducing ionized water. As described above, the pH value can be appropriately adjusted depending on the type of amino acid to be blended, the blending amount, etc. However, depending on the amino acid to be blended and the blending amount, there is a possibility that the desired pH value cannot be achieved. In this case, reducing ionized water can be used. The reduced ion water can be water that is electrolyzed and exhibits alkalinity. For example, reduced ionized water includes S-100 manufactured and sold by A.I. System Products Co., Ltd. S-100 is electrolyzed high-performance reduced ionized water, The name is "water", which is alkaline water with a pH of 12±0.5.
また、本発明の化粧水用組成物の好ましい実施態様において、前記還元性イオン水の含有量は、化粧水用組成物の全量に対して、１０質量％～９０質量％の範囲、より好ましくは、１０質量％～２０質量％の範囲であることを特徴とする。 In a preferred embodiment of the composition for skin lotion of the present invention, the content of the reducing ion water is in the range of 10% by mass to 90% by mass, more preferably 90% by mass, based on the total amount of the composition for skin lotion. , in the range of 10% by mass to 20% by mass.
以下では本発明の化粧水用組成物の一例について実施例を用いて説明するが、本発明は、下記の実施例に限定して解釈されるものではない。 An example of the cosmetic water composition of the present invention will be described below with reference to Examples, but the present invention should not be construed as being limited to the following Examples.
実施例１
まず、アルカリ性を呈し、防腐・殺菌成分を配合しない頭髪・肌の化粧水用組成物の一例を試みた。アミノ酸の一例として、アルギニンを用いた。具体的に、精製水99.0質量％にＬ(+)―アルギニン（和光純薬工業（株）製）１．０％質量を配合して、アルカリ性水溶液を作成しｐＨを測定した。また、参照のため、精製水８０．０質量％に電解還元性イオン水Ｓ－１００（（株）エー・アイ・システムプロダクト製）を２０質量％配合し、アルカリ性水溶液を作成しｐＨを測定した。
Example 1
First, an example of a hair/skin lotion composition exhibiting alkalinity and containing no antiseptic/bactericidal component was tried. Arginine was used as an example of an amino acid. Specifically, 1.0% by mass of L(+)-arginine (manufactured by Wako Pure Chemical Industries, Ltd.) was added to 99.0% by mass of purified water to prepare an alkaline aqueous solution, and the pH was measured. For reference, 20% by mass of electrolytically reducing ionic water S-100 (manufactured by AI System Products Co., Ltd.) was added to 80.0% by mass of purified water to prepare an alkaline aqueous solution, and the pH was measured. .
なお、ｐＨ測定には以下の機種及び電極を用いた。
ｐＨメーターの機種：pH METER F-71（（株）堀場製作所）
ｐＨメーターの電極：＃9615-10D（（株）堀場製作所）
The following models and electrodes were used for pH measurement.
Model of pH meter: pH METER F-71 (Horiba, Ltd.)
pH meter electrode: #9615-10D (Horiba, Ltd.)
実施例２
次に、精製水７９．０質量％にＳ－１００を２０．０質量％、Ｌ－アルギニン１．０質量％を配合して、アルカリ性水溶液を作成し、実施例１と同様にｐＨを測定した。
Example 2
Next, 20.0% by mass of S-100 and 1.0% by mass of L-arginine were added to 79.0% by mass of purified water to prepare an alkaline aqueous solution, and the pH was measured in the same manner as in Example 1. .
表１に、実施例１～２、参照例のｐＨ測定値を示す。 Table 1 shows the measured pH values of Examples 1 and 2 and Reference Example.
表１の結果から参照例のｐＨ測定値が一番高いことが判明した。 From the results in Table 1, it was found that the measured pH value of the reference example was the highest.
実施例３～６
表１の結果をもとに、実施例１と同様の手順に従って、種々の調整例を作成した。表２は、本発明の一実施態様における化粧水用組成物の成分例及び調整例を示す。
Examples 3-6
Based on the results in Table 1, various adjustment examples were prepared according to the same procedure as in Example 1. Table 2 shows component examples and adjustment examples of the composition for skin lotion in one embodiment of the present invention.
実施例７
次に、アミノ酸として、L-ヒスチジンを用いて、かつ、種々の量の還元イオン水を用いて、上述の実施例の手順に従って、本発明の組成物を作成した。その結果を、表４に示す。
Example 7
Next, compositions of the present invention were prepared using L-histidine as the amino acid and various amounts of reduced ionized water according to the procedures of the above Examples. The results are shown in Table 4.
これらの結果、ｐＨ１０．９以上の組成物を作成することができ、いわゆる防腐剤、殺菌剤を含むことなく、抗菌性を有する組成物を作成するできることが判明した。また、仮に、３種類の塩基性アミノ酸を同量配合する場合には、０．００１％以下が好ましいことが判明した。 As a result, it was found that a composition having a pH of 10.9 or higher can be prepared, and a composition having antibacterial properties can be prepared without containing so-called preservatives or bactericides. Further, it was found that if the same amount of three kinds of basic amino acids were blended, 0.001% or less would be preferable.
また、本発明においては、炭酸ナトリウムの他、炭酸ソーダ、炭酸水素ナトリウム等のｐH調整剤を使用していないので、アルカリ度が極めて低い組成物を提供することができるので肌に塗布されたときに肌の中和能で瞬時に弱酸性になり肌を刺激しないという有利な効果を奏する。さらに、本発明の組成物を頭髪に塗布した場合にはアルカリ性の時に毛髪への浸透性を高め、塩基性アミノ酸を補うことが可能であることが判明した。 In addition, in the present invention, other than sodium carbonate, sodium carbonate, sodium hydrogen carbonate, and other pH adjusters are not used, so it is possible to provide a composition with extremely low alkalinity. In addition, it has the advantageous effect of instantly becoming weakly acidic due to its ability to neutralize the skin and not stimulating the skin. Furthermore, it was found that when the composition of the present invention was applied to the hair, the penetration into the hair was enhanced when the hair was alkaline, and it was possible to supplement the basic amino acids.
本発明によると、防腐剤、殺菌剤を配合することなく、抗菌性を有することから、広い分野において産業上利用価値が高い。 INDUSTRIAL APPLICABILITY According to the present invention, since antiseptic agents and bactericidal agents are not blended and antibacterial properties are provided, the industrial utility value is high in a wide range of fields.
Claims (5)
The composition according to any one of claims 1 to 4, characterized in that it does not contain a pH adjuster consisting of sodium carbonate, sodium carbonate, or sodium hydrogen carbonate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020080994A JP7288673B2 (en) | 2020-05-01 | 2020-05-01 | Composition for lotion |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020080994A JP7288673B2 (en) | 2020-05-01 | 2020-05-01 | Composition for lotion |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2021175709A JP2021175709A (en) | 2021-11-04 |
| JP7288673B2 true JP7288673B2 (en) | 2023-06-08 |
Family
ID=78300251
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020080994A Active JP7288673B2 (en) | 2020-05-01 | 2020-05-01 | Composition for lotion |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7288673B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7442833B2 (en) * | 2021-11-19 | 2024-03-05 | 株式会社サニープレイス | Antibacterial method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009040746A (en) | 2007-08-10 | 2009-02-26 | Sansho Kaken Kk | Cosmetic liquid |
| JP2011111436A (en) | 2009-11-30 | 2011-06-09 | Aron World:Kk | Cosmetic composition using alkali ion water |
-
2020
- 2020-05-01 JP JP2020080994A patent/JP7288673B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009040746A (en) | 2007-08-10 | 2009-02-26 | Sansho Kaken Kk | Cosmetic liquid |
| JP2011111436A (en) | 2009-11-30 | 2011-06-09 | Aron World:Kk | Cosmetic composition using alkali ion water |
Non-Patent Citations (3)
| Title |
|---|
| いち押しアイテム HAIR OPE輝髪シリーズ，株式会社和楽公式サイト，2014年08月01日，https://waraku.jpn.com/basic/hair-ope/ |
| かずのすけの化粧品評論と美容化学についてのぼやき，Amebaブログ，2013年11月25日，https://ameblo.jp/rik01194/entry-11711772472.html |
| プラチナアミノイオン水 180mL，Amazon.co.jp，2010年08月23日，https://www.amazon.co.jp/%E3%82%B5%E3%83%8B%E3%83%BC%E3%83%97%E3%83%AC%E3%82%A4%E3%82%B9-849-%E3%83%97%E3%83%A9%E3%83%81%E3%83%8A-%E3%82%A2%E3%83%9F%E3%83%8E%E3%82%A4%E3%82%AA%E3%83%B3%E6%B0%B4-180ml/dp/B0040FM84M |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2021175709A (en) | 2021-11-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101834584B1 (en) | Shampoo | |
| EP1801194B1 (en) | Detergent composition containing acyl amino acids and starch | |
| JP2008110999A (en) | Antibacterial composition and deodorant agent | |
| BRPI0417673A (en) | methods for the prevention or reduction of plaque or plaque buildup, and gingivitis in an individual, non-aqueous composition, and, toothpaste | |
| CN110292045B (en) | Preparation method and application of antimicrobial composition containing epsilon-polylysine | |
| JP2010275198A (en) | Composition for cleaning | |
| WO2015146398A1 (en) | Deodorant composition and deodorant agent | |
| JP7288673B2 (en) | Composition for lotion | |
| JP5162191B2 (en) | Topical skin preparation | |
| JP2007145771A (en) | Antibacterial agent composition and deodorant agent | |
| KR20190126135A (en) | Disinfection Composition | |
| JP2016121092A (en) | Tranexamic acid-containing composition | |
| JP2007145750A (en) | Antibacterial agent to osmidrosis bacterium, and osmidrosis-preventing agent and external preparation for skin, containing the antibacterial agent | |
| JP4959010B1 (en) | Topical skin preparation | |
| RU2684624C2 (en) | Personal hygiene composition with zinc phosphate as active substance | |
| RU2690157C2 (en) | Zinc phosphate complex for oral care | |
| JP2005015401A (en) | Preservative composition, composition for external use, and preserving method | |
| JP2022042891A (en) | Composition for antimicrobial water | |
| JP2007186465A (en) | Antibacterial agent against bacteria causing armpit smell | |
| JP6900121B2 (en) | Antiperspirant composition and antiperspirant | |
| JP2003226636A (en) | Weak-acidic cleansing preparation | |
| JPH07196463A (en) | Composition for oral cavity | |
| JP2004231534A (en) | Antibacterial cosmetic containing ultra fine silver particle colloid | |
| WO2013136890A1 (en) | External preparation for skin | |
| JP5393962B2 (en) | Antibacterial agent for odor-causing bacteria and anti-odor agent containing the antibacterial agent |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20211117 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220824 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220920 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221006 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230124 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230206 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230509 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230522 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7288673 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |