JP7287103B2 - Ultraviolet irradiation device and gas treatment device provided with the same - Google Patents

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet irradiation device and a gas treatment device having the same.

Conventionally, techniques for purifying a gas to be treated using a low-pressure mercury lamp have been proposed. For example, Patent Document 1 below describes the use of a low-pressure mercury lamp that emits ultraviolet light with a wavelength of 185 nm or 254 nm to decompose and remove impurities and bacteria in the gas to be treated. More specifically, it is described that ozone (O ₃ ) gas is generated by ultraviolet rays with a wavelength of 185 nm, and impurities and malodorous substances are decomposed by this ozone gas.

By the way, Patent Document 2 below discloses a xenon excimer lamp that emits light of 172 nm, which is a shorter wavelength than the low-pressure mercury lamp.

JP 2006-204683 A JP-A-2007-335350

An excimer lamp as disclosed in Patent Document 2 has conventionally been used for the purpose of removing organic matter in the manufacturing process of semiconductors and liquid crystal panels. That is, conventionally, excimer lamps have generally been used in strictly controlled clean environments.

By using this excimer lamp in place of the low-pressure mercury lamp as described in Patent Document 1, the inventor of the present invention irradiates the gas to be treated with light of a shorter wavelength to remove VOCs (Volatile Organic Compounds). We are investigating ways to increase the decomposition efficiency of organic compounds) and improve sterilization performance. In particular, when the gas to be treated contains oxygen and moisture, irradiation with short-wavelength light emitted from the excimer lamp generates highly reactive hydroxyl radicals (.OH). High decomposition performance of VOC contained in the treated gas is expected.

As a result of intensive research on the use of excimer lamps to treat gases containing VOCs, the present inventors found that as the treatment continued, dirt adhered to the surface of the tube body of the excimer lamps, resulting in excimer contamination. A new problem was discovered in that the illuminance of the ultraviolet rays emitted from the lamp decreased.

As described above, in order to generate highly reactive hydroxyl radicals (.OH), moisture is required in the gas to be treated or the atmosphere gas. In order to investigate the cause of the contamination on the surface of the tubular body, the present inventors investigated the case of passing normal air (pattern A) and the case of passing steam made of humidified pure water (pattern B ), and the case where water vapor composed of humidified tap water is allowed to flow (pattern C). As a result, as shown in FIG. 1, it was confirmed that the rate of decrease in the illuminance maintenance rate was faster in patterns B and C, which contain much water, than in pattern A, which contains little water. Specifically, in patterns B and C, compared to pattern A, it was confirmed that the tube body of the excimer lamp was noticeably clouded.

From this, the inventors speculated that contamination may adhere to the surface of the excimer lamp tube by irradiating the gas containing moisture with the ultraviolet rays from the excimer lamp.

Based on the above verification, an object of the present invention is to provide an ultraviolet irradiation device including an excimer lamp to which dirt is less likely to adhere to the surface of the tubular body. Another object of the present invention is to provide a gas treatment apparatus equipped with such an ultraviolet irradiation device.

The ultraviolet irradiation device according to the present invention is
an elongated tubular body in which a discharge gas is enclosed;
a first electrode and a second electrode that are arranged on the wall surface of the tubular body or inside the tubular body so that a voltage can be applied to the discharge gas through the tubular body; an excimer lamp comprising
a lighting power source for lighting the excimer lamp by applying a voltage between the first electrode and the second electrode;
The lighting power supply applies a pulse voltage based on the potential of the second electrode to the first electrode arranged on the side from which the ultraviolet rays generated in the tubular body are extracted. do.

Through intensive research, the inventors have found that the potential of the electrode arranged on the side where the ultraviolet rays are extracted from the tubular body, that is, the side on which the object to be irradiated with ultraviolet rays exists, is equal to the potential of the electrode arranged on the opposite side. It was found that by applying a voltage to both electrodes so as to obtain a pulse-like potential when used as a reference, the degree of white turbidity that occurs on the surface of the tubular body can be improved more than before. Details are described below in the Detailed Description section.

The lighting power supply may set the second electrode to a ground potential and apply a pulse-shaped negative voltage having a zero-peak absolute value of 1 kV or more to the first electrode. In other words, a voltage of -1 kV or less may be applied to the first electrode.

The tubular body has an outer tube and an inner tube arranged inside the outer tube, and exhibits a double tube structure in which both ends of the outer tube and the inner tube are sealed in the longitudinal direction,
The discharge gas is enclosed in a space sandwiched between the inner tube and the outer tube,
The first electrode is arranged on the outer wall surface of the outer tube and has a mesh shape or a linear shape,
The second electrode may be arranged on the inner wall surface of the inner tube.

The first electrode is arranged on the outer wall surface of the tubular body and has a mesh shape or a linear shape,
The second electrode may be arranged inside the tubular body in which the discharge gas is enclosed.

The tubular body has a first surface and a second surface that face each other when viewed along the longitudinal direction,
The first electrode is arranged on the first surface and has a mesh shape or a linear shape,
the second electrode is disposed on the second surface,
A reflecting member may be provided for reflecting the ultraviolet rays generated in the tubular body and propagating toward the second surface toward the first surface.

Further, the present invention provides a gas treatment apparatus comprising the ultraviolet irradiation device,
a housing that accommodates the tubular body;
an intake port for introducing the gas to be treated into the inside of the housing;
an exhaust port for leading the gas to be treated irradiated with the ultraviolet rays to the outside of the housing,
The first electrode is arranged at a position in contact with the gas to be treated flowing through the housing.

According to such a configuration, even when the gas to be treated contains moisture, the potential of the electrode on the side in contact with the gas to be treated can generate a pulse when the potential of the electrode arranged on the opposite side is used as a reference. Since a voltage is applied to both electrodes so as to have a similar potential, the degree of cloudiness that occurs on the surface of the tubular body can be improved more than before. This makes it possible to maintain high throughput over a long period of time.

This gas treatment apparatus can be used for sterilizing an atmosphere such as air, and for decomposing VOCs from a gas to be treated containing VOCs, which are believed to affect the human body. As used herein, VOC is a general term for organic compounds that are volatile and gaseous in the air, and is a general term for a group of substances including formaldehyde, toluene, xylene, acetone, ethyl acetate, and the like.

In the gas treatment device,
The tubular body has an outer tube and an inner tube arranged inside the outer tube, and exhibits a double tube structure in which both ends of the outer tube and the inner tube are sealed in the longitudinal direction,
The discharge gas is enclosed in a space sandwiched between the inner tube and the outer tube,
The first electrode is arranged on the outer surface of the outer tube and has a mesh shape or a linear shape,
the second electrode is disposed on the inner surface of the inner tube;
In the housing, the gas to be treated may flow outside the outer tube.

In the gas treatment device,
The first electrode is arranged on the outer surface of the tubular body and has a mesh shape or a linear shape,
The second electrode is arranged inside the tubular body in which the discharge gas is enclosed,
In the housing, the gas to be treated may flow through the outside of the tubular body.

In the gas treatment device,
The tubular body has a first surface and a second surface that face each other when viewed along the longitudinal direction,
The first electrode is arranged on the first surface and has a mesh shape or a linear shape,
the second electrode is disposed on the second surface,
By arranging the second surface close to the wall surface of the housing, the gas to be treated may flow through the first surface side of the tubular body in the housing.

The gas treatment device may have a reflecting member that reflects the ultraviolet rays generated in the tubular body and propagating toward the second surface toward the first surface.

In the gas treatment device,
The second electrode may be a film-shaped electrode that absorbs the ultraviolet rays generated in the tubular body and traveling toward the second surface.

In the gas treatment apparatus, the discharge gas may contain xenon, and the gas to be treated may contain VOC. In particular, since the discharge gas contains xenon, ultraviolet rays with a wavelength of 180 nm or less are emitted from the tube, so highly reactive hydroxy radicals (OH) can be generated in high concentrations, resulting in high decomposition of VOCs. performance is achieved. Furthermore, when the gas to be treated contains VOCs, the gas to be treated may be humidified to contain moisture. As a result, .OH can be produced at a higher concentration.

ADVANTAGE OF THE INVENTION According to this invention, the ultraviolet-ray irradiation apparatus containing the excimer lamp to which dirt is hard to adhere to the surface of a tubular body compared with the past, and the gas processing apparatus provided with such an ultraviolet-ray irradiation apparatus are implement|achieved.

The illuminance maintenance rate of the excimer lamp when the normal atmosphere, steam composed of humidified pure water, and steam composed of humidified tap water are passed through while the excimer lamp is lit by a conventional lighting method. It is a graph which shows a time-dependent change. BRIEF DESCRIPTION OF THE DRAWINGS It is sectional drawing which shows typically the structure of the gas treatment apparatus of 1st embodiment. A schematic plan view of the excimer lamp in FIG. 2 when viewed from the direction d1 is shown together with the lighting power source, and corresponds to the schematic configuration diagram of the ultraviolet irradiation device of the first embodiment. It corresponds to a schematic configuration diagram of the ultraviolet irradiation device of the first embodiment, including a circuit diagram schematically showing an example of the configuration of the lighting power supply. 4 is a schematic graph showing temporal changes in the potential of the first electrode; FIG. 10 is a schematic plan view of the excimer lamp included in the gas treatment apparatus of the second embodiment when viewed from the direction d1, together with a lighting power supply; FIG. handle. FIG. 3 is a cross-sectional view schematically showing the configuration of a gas treatment device according to a third embodiment; FIG. 10 is a schematic plan view of the excimer lamp included in the gas treatment apparatus of the third embodiment when viewed from the direction d1, together with the housing and the lighting power source. FIG. 11 is a cross-sectional view schematically showing another configuration of the gas treatment device of the third embodiment; Another schematic plan view of the excimer lamp included in the gas treatment apparatus of the third embodiment when viewed from the direction d1 is illustrated together with the housing and the lighting power supply.

Embodiments of an ultraviolet irradiation device and a gas treatment device according to the present invention will be described with reference to the drawings as appropriate. In addition, the following drawings are all schematically shown, and the dimensional ratios on the drawings and the actual dimensional ratios do not necessarily match, and the dimensional ratios do not necessarily match between the drawings. .

[First embodiment]
A first embodiment of an ultraviolet irradiation device and a gas treatment device according to the present invention will be described. FIG. 2 is a cross-sectional view schematically showing the configuration of the gas treatment apparatus of this embodiment. The gas treatment device 1 shown in FIG. 2 includes a housing 2 , an excimer lamp 3 housed inside the housing 2 , and a lighting power supply 4 for controlling lighting of the excimer lamp 3 . In this specification, a device including the excimer lamp 3 and the lighting power supply 4 is referred to as an "ultraviolet irradiation device 10", and a device including the ultraviolet irradiation device 10 and used for gas treatment is referred to as an apparatus. It is called "gas treatment device 1".

The excimer lamp 3 has a shape extending along the direction d1. FIG. 3 shows a schematic plan view of the excimer lamp 3 as seen from the direction d1 together with the lighting power source 4, and corresponds to a schematic configuration diagram of the ultraviolet irradiation device 10 in this embodiment.

In this embodiment, the excimer lamp 3 has a tubular body 30 extending along the direction d1. More specifically, the tubular body 30 has a cylindrical outer tube 30a located outside, and an outer tube 30a disposed coaxially with the outer tube 30a inside the outer tube 30a and having an inner diameter smaller than that of the outer tube 30a. and an inner tube 30b having a cylindrical shape. Both tubular bodies 30 (30a, 30b) are made of a dielectric such as synthetic quartz glass.

The outer tube 30a and the inner tube 30b are sealed at their ends in the direction d1 (not shown), and a ring-shaped luminous space is formed between them when viewed in the direction d1. A discharge gas 33G that forms excimer molecules by discharge is enclosed in the light emission space. A more detailed example of the discharge gas 33G is a gas in which xenon (Xe) and neon (Ne) are mixed in a predetermined ratio (for example, 3:7), and further includes trace amounts of oxygen and hydrogen. I do not care.

The excimer lamp 3 of this embodiment has a first electrode 31 arranged on the outer wall surface of the outer tube 30a and a second electrode 32 arranged on the inner wall surface of the inner tube 30b. The first electrode 31 has a mesh shape or a linear shape. Moreover, the second electrode 32 exhibits a film shape. The second electrode 32 may also have a mesh shape or a linear shape like the first electrode 31 .

The lighting power supply 4 is a power supply that applies a high-frequency AC voltage of, for example, about 50 kHz to 5 MHz between the first electrode 31 and the second electrode 32 . In this embodiment, the lighting power source 4 is configured to apply a periodic pulse voltage to the first electrode 31 with the second electrode 32 as a reference potential. That is, the lighting power supply 4 supplies a pulse voltage to the power supply line 51 connected to the first electrode 31 with the power supply line 52 connected to the second electrode 32 as a reference. The magnitude (absolute value) of the voltage is a 0-peak high voltage of the order of kV, preferably 1 kV or more and 9 kV or less.

In the example shown in FIG. 2, the excimer lamp 3 has a base portion 35 at the end of the tubular body 30 in the direction d1. The base portion 35 is made of a ceramic material (inorganic material) such as steatite, forsterite, sialon, alumina, or the like, and has a function of fixing the end portion of the tubular body 30 . Power supply lines (51, 52) connected to the respective electrodes (31, 32) are arranged through holes provided in the base portion 35 or the outer edge of the base portion 35. As shown in FIG.

A high-frequency AC voltage is applied between the first electrode 31 and the second electrode 32 by the lighting power source 4, and the voltage is applied to the discharge gas 33G through the tubular body 30. A discharge plasma is generated in the discharge space filled with gas 33G. As a result, the atoms of the discharge gas 33G are excited into an excimer state, and excimer light emission occurs when these atoms transition to the ground state. When the above-described xenon (Xe)-containing gas is used as the discharge gas 33G, this excimer emission becomes ultraviolet rays L1 (see FIG. 2) having a wavelength of about 172 nm. The wavelength of the ultraviolet light L1 can be changed by changing the substance used as the discharge gas 33G. For example, ArBr (165 nm), ArCl (175 nm), F ₂ (153 nm), etc. can be used as the discharge gas 33G.

As described above, the first electrode 31 has a mesh shape or a linear shape so as not to prevent the ultraviolet rays L1 generated inside the tubular body 30 (more specifically, inside the light emitting space) from being emitted to the outside of the tubular body 30. present. Thereby, the ultraviolet rays L1 are emitted to the outside of the tubular body 30 through the gaps between the first electrodes 31 .

In this embodiment, the gas treatment apparatus 1 is used for treatment of the gas to be treated G1 containing VOCs. For example, it is assumed that the gas treatment device 1 is used by being directly connected to an air-conditioning duct in a building, an exhaust treatment duct in a factory or a research institute, or the like.

As shown in FIG. 2, the gas treatment apparatus 1 includes an intake port 5 for sucking a gas to be treated G1 containing VOCs into the inside of the housing 2, and an ultraviolet ray L1 emitted from an excimer lamp 3 to the gas to be treated G1. and an exhaust port 6 for exhausting the gas (processed gas G2) after being treated to the outside of the housing 2 .

When the VOC-containing gas to be treated G1 sucked from the intake port 5 is irradiated with the ultraviolet rays L1 emitted from the excimer lamp 3, it undergoes the reactions of the following equations (1) and (2), and becomes reactive. It produces high O ( ¹ D) and hydroxyl radicals (.OH). In the following formula, O( ¹ D) indicates an O atom in an excited state, and O( ³ P) indicates an O atom in a ground state. Also, hν(λ) indicates that light of wavelength λ is absorbed.
O ₂ + hν(λ) → O( ¹ D) + O( ³ P) (1)
O( ¹ D) + H ₂ O → ·OH + ·OH (2)

Note that the reaction of formula (1) above is likely to occur when the wavelength λ of the ultraviolet light L1 is 180 nm or less.

O( ¹ D) and hydroxyl radical (.OH) are more reactive than ozone (O ₃ ). For this reason, according to the gas treatment apparatus 1, compared with the conventional gas treatment apparatus that decomposes with ozone generated using a low-pressure mercury lamp, it is difficult to decompose with ozone, and the substance containing VOC-derived substances such as formaldehyde is difficult to decompose. It is possible to efficiently decompose the processing gas G1.

FIG. 4 is a schematic configuration diagram of the ultraviolet irradiation device 10 including a circuit diagram schematically showing an example of the configuration of the lighting power supply 4. As shown in FIG. The lighting power supply 4 includes a step-up transformer 41 , an inverter circuit 42 and a DC power supply 43 . The inverter circuit 42 shown in FIG. 4 is a circuit called a flyback system. In addition, as shown in FIG. 4, the power supply line 52 and the low voltage side of the DC power supply 43 may be connected directly or via a resistor.

This inverter circuit 42 has a transistor 46 which becomes conductive from a non-conducting state when a gate signal 45 becomes High. When the gate signal 45 becomes High, the transistor 46 becomes conductive, the voltage of the DC power supply 43 is applied to the primary side coil 41p of the step-up transformer 41, and the primary side current Ip begins to flow, and the current Ip increases over time. and go. When the gate signal 45 becomes Low, the transistor 46 becomes non-conductive, and the primary side current Ip flowing through the primary side coil 41p is cut off abruptly. As a result, the voltage Vp of the primary side coil 41p of the step-up transformer 41 recoils, thereby generating the voltage Vs in the secondary side coil 41s.

FIG. 5 is a schematic graph showing temporal changes in this voltage Vs. As shown in FIG. 4, since the power supply line 51 to which the voltage Vs is applied is connected to the first electrode 31, the voltage waveform shown in FIG. corresponds to the waveform.

By the way, in an excimer lamp having a so-called double-tube structure as shown in FIG. A lighting method is generally used in which a high voltage is applied between both electrodes so as to The reason for this is to prevent problems such as electric shock by applying a high voltage to the electrode near the exposed side.

Also, in a semiconductor manufacturing process or the like, there is known a method of cleaning a work such as a substrate by irradiating the work with ultraviolet rays from an excimer lamp. Even in this case, the electrode near the work surface, i.e., the case of the double-tube structure, is designed to prevent the work from being electrically affected by the high potential generated in the electrode near the work surface. In general, the electrode provided on the outer tube is grounded.

On the other hand, in the excimer lamp 3 of the present embodiment, the second electrode 32 arranged on the inner tube 30b is set to the reference potential (for example, ground potential) by the lighting power source 4, and is arranged on the outer tube 30a. A high voltage is applied to the first electrode 31 that is located. In the gas treatment apparatus 1, the gas to be treated G1 is treated using the excimer lamp 3 to which the voltage is applied in this way, so that the surface of the tubular body 30 of the excimer lamp 3 is less likely to become cloudy. is obtained. This point will be described below with reference to examples.

(inspection)
An excimer lamp 3 is placed in the housing 2, and air containing 10 ppm of xylene is humidified to a humidity of 90% as the gas to be treated G1, which flows into the housing 2 from the intake port 5 at a flow rate of 1000 L/min. Then, the condition of dirt adhering to the wall surface of the tubular body 30 of the excimer lamp 3 was observed.

The excimer lamp 3 includes an inner tube 30b with an inner diameter of 16 mm and an outer tube 30a with an inner diameter of 26 mm. It had a tube 30 sealed at 0.7 kPa. The emission length of the excimer lamp 3 in the direction d1 was 85 mm.

A tungsten coil was used as the first electrode 31 , and mesh-like SUS was used as the second electrode 32 . As described above, the first electrode 31 was arranged on the outer wall surface of the outer tube 30a, and the second electrode 32 was arranged on the inner wall surface of the inner tube 30b.

<<Example 1>>
A voltage of −4 kV was supplied from the lighting power supply 4 to the first electrode 31 with the second electrode 32 set to a reference potential (substantial ground potential). More specifically, the ON/OFF time of the transistor 46 shown in FIG. 4 is 1.5 μs and the OFF time is 15 μs. A pulsed negative high voltage was applied at a frequency of 60 kHz.

<<Comparative example 1>>
The conditions were the same as in Example 1 except that the polarities of the first electrode 31 and the second electrode 32 were switched. That is, the first electrode 31 was set at a reference potential (substantial ground potential), and a voltage of −4 kV was supplied from the lighting power supply 4 to the second electrode 32 .

"result"
For each of Example 1 and Comparative Example 1, the excimer lamp 3 was caused to emit light for 500 hours while the gas G1 to be treated was made to flow. The status of adhesion of dirt to the tubular body 30 was confirmed. The results are shown in Table 1 below.

In the case of Comparative Example 1, the wall surface of the tubular body 30, more specifically, the outer wall surface of the outer tube 30a was stained with white dirt that was clearly visible to the naked eye. On the other hand, in the case of Example 1, no change in the transparency of the tubular body 30 was observed with the naked eye compared to before the verification, and it was confirmed that the transparency of the tubular body 30 was extremely high compared to Comparative Example 1. was done.

[Second embodiment]
A second embodiment of an ultraviolet irradiation device and a gas treatment device according to the present invention will be described with reference to the drawings as appropriate. It should be noted that this embodiment differs from the first embodiment only in the structure of the excimer lamp 3, and the rest is common to the first embodiment. Below, a different part from 1st embodiment is mainly demonstrated.

Similar to FIG. 3, FIG. 6 shows a schematic plan view of the excimer lamp 3 provided in the gas treatment apparatus 1 of the present embodiment when viewed from the direction d1 (see FIG. 2) together with the lighting power supply 4. It corresponds to a schematic configuration diagram of the ultraviolet irradiation device 10 of the present embodiment. As shown in FIG. 6, the excimer lamp 3 included in the ultraviolet irradiation device 10 of this embodiment has one tubular body 30 extending along the direction d1.

The first electrode 31 is arranged on the outer wall surface of the tubular body 30 and has a mesh shape or a linear shape. In addition, a discharge gas 33G is sealed inside the tubular body 30, and a second electrode 32 is arranged.

In such a configuration as well, when lighting, a pulse-like high voltage is applied from the lighting power source 4 to the power supply line 51 while the power supply line 52 is at the reference potential, so that the gas to be treated G1 comes into contact. Since a high voltage is applied to the first electrode 31, which is the electrode on the side, the wall surface of the tubular body 30 is less likely to be stained with cloudy dirt.

[Third embodiment]
A third embodiment of an ultraviolet irradiation device and a gas treatment device according to the present invention will be described with reference to the drawings as appropriate. Below, a different part from 1st embodiment is mainly demonstrated.

FIG. 7 is a cross-sectional view schematically showing the configuration of the gas treatment device 1 of this embodiment, and is illustrated following FIG. 8 is a schematic plan view of the excimer lamp 3 included in the gas treatment apparatus 1 of the present embodiment as seen from the direction d1, together with the housing 2 and the lighting power supply 4. FIG.

As shown in FIG. 8, the excimer lamp 3 included in the ultraviolet irradiation device 10 of this embodiment includes a tubular body 30 having two surfaces facing each other when viewed along the direction d1. A first electrode 31 is provided on one wall surface (corresponding to the “first surface”) of the tubular body 30, and a second electrode is provided on the opposite wall surface (corresponding to the “second surface”). 32 are provided. Note that FIG. 8 illustrates a case where the tubular body 30 has a rectangular tubular shape when viewed along the direction d1.

Here, in the gas treatment device 1 of the present embodiment, the wall surface (second surface) of the tubular body 30 on the side where the second electrode 32 is arranged is brought closer to the wall surface side of the housing 2 in the excimer lamp 3 . It is arranged in the housing 2 in a closed state. That is, in the housing 2, the gas to be treated G1 flows in the direction d1 through the side of the tubular body 30 of the excimer lamp 3 where the first electrode 31 is arranged.

As in the above-described embodiment, the first electrode 31 has a mesh shape or a linear shape so as not to hinder the emission of the ultraviolet rays L1 generated inside the tubular body 30 to the outside of the tubular body 30 . On the other hand, since the second electrode 32 is arranged closer to the wall surface side of the housing 2, it is not necessary to emit the ultraviolet rays L1 from the second electrode 32 side. Therefore, the second electrode 32 is formed in a film shape.

Also in this embodiment, as in the above-described embodiments, when lighting, a pulse-like high voltage is applied from the lighting power supply 4 to the power supply line 51 while the power supply line 52 is set to the reference potential. Since a high voltage is applied to the first electrode 31, which is the electrode on the side in contact with the gas G1 to be treated, white turbid stains are less likely to adhere to the wall surface of the tubular body 30. FIG.

In addition, as shown in FIGS. 9 and 10, a reflecting member 11 may be provided between the second electrode 32 and the wall surface of the housing 2 . As a result, the ultraviolet rays L1 that have traveled toward the second electrode 32 can be returned toward the first electrode 31, and the irradiation light amount of the ultraviolet rays L1 that irradiate the gas G1 to be treated is improved. In this case, like the first electrode 31, the second electrode 32 may have a mesh shape or a linear shape.

Furthermore, the reflecting member 11 may be formed on the inner wall surface of the tubular body 30 on the second electrode 32 side.

[Another embodiment]
Another embodiment will be described below.

<1> In the above embodiment, the case where the ultraviolet irradiation device 10 including the excimer lamp 3 is used for the gas treatment device 1 has been exemplified and explained. However, the application of the ultraviolet irradiation device 10 in the present invention is not limited to gas treatment, and in an environment where the atmosphere may contain moisture, the irradiation target can be irradiated with the ultraviolet rays L1. It is applicable to all uses for processing.

<2> In the third embodiment, the case where the wall surface (second surface) of the tubular body 30 of the excimer lamp 3 on the side of the second electrode 32 (the second surface) is located close to the wall surface of the housing 2 is taken as an example. explained. However, the present invention eliminates the case where the excimer lamp 3 having a shape like that of the third embodiment is arranged near the center in the housing 2 and is used for processing the gas to be processed G1. do not. However, when used in this arrangement mode, the wall surface on the first electrode 31 side of the tubular body 30 of the excimer lamp 3 tends to maintain a transparent state, while the wall surface on the second electrode 32 side tends to change over time. may become cloudy.

<3> The configuration of the lighting power source 4 described with reference to FIG. 4 is merely an example. For example, in FIG. 4, the lighting power source 4 has the flyback type inverter circuit 42, but it may have a push-pull type, half-bridge type, full-bridge type inverter circuit, or the like.

REFERENCE SIGNS LIST 1: Gas treatment device 2: Housing 3: Excimer lamp 4: Lighting power source 5: Intake port 6: Exhaust port 10: Ultraviolet irradiation device 11: Reflective member 30: Tubular body 30a: Outer tube 30b: Inner tube 33G: For discharge Gas 35: Base part 41: Step-up transformer 41p: Primary coil 41s: Secondary coil 42: Inverter circuit 43: DC power supply 45: Gate signal 46: Transistor G1: Gas to be treated

Claims (9)

an elongated tubular body in which a discharge gas is enclosed;
A first electrode and a second electrode that are fixedly arranged on the wall surface of the tubular body or inside the tubular body so that a voltage can be applied to the discharge gas through the tubular body. an excimer lamp including electrodes;
a lighting power supply for lighting the excimer lamp by applying a voltage between the first electrode and the second electrode ;
a housing that accommodates the tubular body;
an intake port for introducing the gas to be treated into the inside of the housing;
an exhaust port for leading the gas to be treated irradiated with ultraviolet rays generated in the tubular body to the outside of the housing,
The first electrode is arranged at a position in contact with the gas to be treated flowing through the housing,
The gas treatment apparatus , wherein the lighting power supply applies a pulse voltage based on the potential of the second electrode to the first electrode arranged on the side from which the ultraviolet rays are extracted. The tubular body has an outer tube and an inner tube arranged inside the outer tube, and exhibits a double tube structure in which both ends of the outer tube and the inner tube are sealed in the longitudinal direction,
The discharge gas is enclosed in a space sandwiched between the inner tube and the outer tube,
The first electrode is arranged on the outer surface of the outer tube and has a mesh shape or a linear shape,
the second electrode is disposed on the inner surface of the inner tube;
2. The gas treatment apparatus according to claim 1 , wherein said gas to be treated flows outside said outer tube in said housing. The first electrode is arranged on the outer wall surface of the tubular body and has a mesh shape or a linear shape,
The second electrode is arranged inside the tubular body in which the discharge gas is enclosed,
2. The gas treatment apparatus according to claim 1 , wherein said gas to be treated flows outside said tubular body in said housing. The tubular body has a first surface and a second surface that face each other when viewed along the longitudinal direction,
The first electrode is arranged on the first surface and has a mesh shape or a linear shape,
the second electrode is disposed on the second surface,
The gas to be treated flows through the first surface side of the tubular body in the housing by arranging the second surface in close proximity to the wall surface of the housing. Item 1. The gas treatment device according to item 1 . 5. The gas treatment apparatus according to claim 4 , further comprising a reflecting member that reflects said ultraviolet rays generated in said tubular body and propagating toward said second surface toward said first surface. 5. The gas treatment apparatus according to claim 4 , wherein the second electrode is a film-shaped electrode that absorbs the ultraviolet rays generated in the tubular body and traveling toward the second surface. . The discharge gas contains xenon,
The gas treatment apparatus according to any one of claims 1 to 6 , wherein the gas to be treated contains VOC. an elongated tubular body in which a discharge gas is enclosed;
a first electrode and a second electrode that are arranged on the wall surface of the tubular body or inside the tubular body so that a voltage can be applied to the discharge gas through the tubular body; an excimer lamp comprising
a lighting power source for lighting the excimer lamp by applying a voltage between the first electrode and the second electrode;
The tubular body has a first surface and a second surface that face each other when viewed along the longitudinal direction,
The first electrode is arranged on the first surface and has a mesh shape or a linear shape,
the second electrode is disposed on the second surface,
a reflecting member that reflects ultraviolet rays generated in the tubular body and traveling toward the second surface toward the first surface ;
The ultraviolet irradiation device, wherein the lighting power source applies a pulse voltage based on the potential of the second electrode to the first electrode arranged on the side from which the ultraviolet rays are extracted. 9. The ultraviolet irradiation device according to claim 8 , wherein the lighting power source applies a pulsed negative voltage to the first electrode, with the second electrode being at a ground potential.

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