JP7286365B2 - SHUTTER DEVICE, EXPOSURE DEVICE, AND PRODUCT MANUFACTURING METHOD - Google Patents

Description

The present invention relates to a shutter device, an exposure device, and an article manufacturing method.

In an exposure apparatus that exposes an original by illuminating the original with light from a light source and projecting the pattern of the original onto the substrate using a projection optical system, a shutter device is used to control the irradiation of light onto the substrate. be done. The shutter device may control illumination of the substrate by rotating the shutter member across the beam. In order to improve the number of substrates processed per unit time, that is, the throughput, the shutter member is required to be driven at high speed, and the weight of the shutter member is therefore being reduced. The weight reduction of the shutter member can be achieved by thinning the shutter member. Thinning of the shutter member makes it easier to deform the shutter member. Deformation of the shutter member may cause mechanical interference between the shutter member and members arranged around it, resulting in failure of the shutter device.

Japanese Unexamined Patent Application Publication No. 2002-200001 describes an exposure apparatus having an abnormality detection means for detecting an abnormality of an exposure shutter. The abnormality detection means detects the reflectance of the shutter blades based on the output of the photodetector that detects light from the discharge lamp and the output of the photodetector that detects the reflected light of the exposure light from the shutter blades of the exposure shutter. Calculation is performed, and an abnormality of the exposure shutter is detected based on this reflectance. Alternatively, the abnormality detection means detects the surface temperature of the shutter blades of the exposure shutter, and detects the abnormality of the exposure shutter based on this surface temperature. Alternatively, the abnormality detection means detects an abnormality of the exposure shutter by detecting electrical contact between the shutter blades and shielding plates arranged therearound.

JP-A-2000-216074

Since abnormal deformation of the shutter blades cannot be directly detected in the configuration that detects the reflectance or surface temperature of the shutter blades, there is a possibility that abnormal deformation of the shutter blades cannot be detected. In addition, in a configuration that detects electrical contact between a shutter blade and a shielding plate arranged around it, there is a possibility that the shutter blade or the shielding plate or the like has already been damaged when the contact is detected. Therefore, with the configuration described in Document 1, there is a possibility that damage due to deformation of the shutter blades cannot be prevented.

SUMMARY OF THE INVENTION An object of the present invention is to provide an advantageous technique for more reliably preventing breakage of a shutter member.

One aspect of the present invention relates to a shutter device having a shutter member that blocks a light beam and a rotation mechanism that rotates the shutter member, and the shutter device has a light projecting section that projects light. and an optical sensor for detecting deformation of the shutter member, wherein the light projecting unit is arranged so that the direction of the optical path of the light is oblique to a straight line parallel to the rotation axis of the shutter member. .

ADVANTAGE OF THE INVENTION According to this invention, an advantageous technique is provided in order to prevent damage to a shutter member more reliably.

1 is a diagram showing the configuration of an exposure apparatus according to a first embodiment; FIG. The figure which shows the shutter apparatus of 1st Embodiment. 4A and 4B are diagrams exemplifying a blocking state and a passing state of exposure light by a shutter member; FIG. 1 is a diagram showing the configuration of a shutter device according to a first embodiment; FIG. 4A and 4B are diagrams schematically showing the principle of detecting deformation of the shutter member according to the first embodiment; FIG. 4A and 4B are diagrams illustrating output signals of the optical sensor according to the first embodiment; FIG. FIG. 7 is a diagram schematically showing the principle of detecting deformation of the shutter member in the second embodiment; FIG. 10 is a diagram illustrating output signals of an optical sensor according to the second embodiment; FIG. 11 is a diagram illustrating output signals of an optical sensor according to the third embodiment; The figure which shows the structure of the shutter apparatus of 4th Embodiment. The figure which illustrates the output signal of the optical sensor in 4th Embodiment. FIG. 11 is a diagram illustrating the principle of detection of deformation of the shutter member and the output signal of the optical sensor in the fifth embodiment;

Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. In addition, the following embodiments do not limit the invention according to the scope of claims. Although multiple features are described in the embodiments, not all of these multiple features are essential to the invention, and multiple features may be combined arbitrarily. Furthermore, in the accompanying drawings, the same or similar configurations are denoted by the same reference numerals, and redundant description is omitted.

FIG. 1 shows the configuration of the exposure apparatus EXP according to the first embodiment of the present invention. The exposure apparatus EXP can include a light source 110 , a shutter device 120 , an illumination optical system 130 , an original holder 140 , a projection optical system 150 and a substrate holder 160 . The original holder 140 holds an original 142 . The original plate holding unit 140 is positioned by an original plate positioning mechanism (not shown), whereby the original plate 142 can be positioned. The substrate holder 160 holds a substrate 162 . A substrate 162 coated with a resist by a resist coating device is supplied to the exposure device EXP. The substrate holder 160 is positioned by a substrate positioning mechanism (not shown), whereby the substrate 162 can be positioned.

The shutter device 120 is arranged so as to be able to block the light flux in the optical path between the light source 110 and the original holder 140 . The illumination optical system 130 illuminates the original 142 using light from the light source 110 . The projection optical system 150 projects the pattern of the original 142 illuminated by the illumination optical system 130 onto the substrate 162 , thereby exposing the substrate 162 . Thereby, a latent image pattern is formed on the resist applied to the substrate 162 . The latent image pattern is developed by a developing device (not shown) to form a resist pattern on the substrate 162 .

The exposure apparatus EXP can include, for example, a detector 170 , a shutter controller 182 and a driver 184 as a configuration for controlling the exposure amount of the substrate 162 , in other words, a configuration for controlling the shutter device 120 . Detector 170 may include, for example, optical sensor 172 , amplifier 174 , V/F converter 176 and pulse counter 178 . The optical sensor 172 includes a photoelectric conversion element, and can photoelectrically convert light incident on the optical sensor 172 after passing through the shutter device 120 .

In one example, a portion of the light passing through shutter device 120 can be extracted by beam splitter 132 and directed to photosensor 172 . Amplifier 174 may convert an output signal (eg, a current signal) from photosensor 172 to a voltage signal. The V/F converter 176 can convert the voltage signal output from the amplifier 174 into a frequency signal. A pulse counter 178 can count the number of pulses of the frequency signal output from the V/F converter 176 . The count value counted by the pulse counter 178 corresponds to the integrated amount of exposure light intensity (that is, the integrated amount of exposure light that has passed through the shutter device 120 ), and also to the integrated exposure amount of the substrate 162 .

Shutter controller 182 may send a command to driver 184 to bring shutter device 120 into a pass state so that exposure of substrate 162 may begin. After that, based on the output from the detection unit 170, the shutter control unit 182 instructs the driver 184 to shut down the shutter device 120 so that the integrated exposure amount of the substrate 162 becomes the target exposure amount. can send A driver 184 can drive the shutter device 120 according to a command from the shutter control section 182 .

The exposure apparatus EXP can include a control section 190 that controls the above-described sections of the exposure apparatus EXP. The control unit 190 is, for example, a PLD (abbreviation of Programmable Logic Device) such as FPGA (abbreviation of Field Programmable Gate Array), or ASIC (abbreviation of Application Specific Integrated Circuit), or a general-purpose device in which a program is incorporated. or a dedicated computer, or a combination of all or part of these.

The substrate 162 typically has multiple shot areas. After a certain shot area of the substrate 162 and the original 142 are aligned, the shutter device 120 is controlled by the shutter controller 182 so as to be in a passing state through which light passes so that exposure of the shot area is started. can be In this state, the shutter control section 182 can send an instruction to the driver 184 to put the shutter device 120 into the blocking state based on the count value provided from the detection section 170 (pulse counter 178). In response, driver 184 may drive shutter device 120 to place shutter device 120 in a closed state. Thereafter, to expose another shot area, the other shot area can be aligned with the master and the other shot area can be exposed. The above processing can be executed for all shot areas.

FIG. 2 schematically shows the configuration and operation of the shutter device 120 of the first embodiment. The shutter device 120 can include a shutter member 30 and a motor (rotating mechanism) 31 that drives the shutter member 30 to rotate. The motor 31 can be driven by the driver 184 to rotationally drive the shutter member 30 .

FIGS. 3A to 3D illustrate the blocking state and passing state of the exposure light by the shutter member 30 of the shutter device 120. FIG. The shutter member 30 can have blocking portions 30a1 and 30a2 that block the light flux (exposure light) 32 and passing portions 30b1 and 30b2 that allow the light flux 32 to pass therethrough. During the period ta shown in FIG. 3A, the light flux 32 is blocked by the blocking portion 30a and the substrate 162 is not exposed. In the period tb shown in FIG. 3B, the light beam 32 passes through the passing portion 30b1 and exposes a certain shot area on the substrate 162. In the period tb shown in FIG. During the period tc shown in FIG. 3C, the light flux 32 is blocked by the blocking portion 30a and the substrate 162 is not exposed. In the period td shown in FIG. 3(d), the light beam 32 passes through the passing portion 30b2 and exposes another shot area of the substrate 162. As shown in FIG.

In the example shown in FIGS. 2 and 3, the shutter member 30 has two blocking portions 30a1, 30a2 and two passing portions 30b1, 30b2, but the shutter member 30 has at least one blocking portion and and at least one passing portion. For example, the shutter member 30 may be stopped at each position shown in FIGS. 3(a), (b), (c) and (d), or may be continuously driven without being stopped. good.

FIG. 4 shows the configuration of the shutter device 120 of the first embodiment. 4A is a cross section of the shutter device 120 taken along a plane parallel to the rotating shaft (output shaft) 31a of the motor 31 (a plane passing through the rotating shaft 31a). FIG. 4B is a sectional view of the shutter device 120 taken along a plane perpendicular to the rotating shaft (output shaft) 31a of the motor 31 (a plane passing through the shutter member 30). The motor 31 can rotate the rotating shaft (rotating shaft) 31 a according to the current supplied from the driver 184 . A shutter member 30 that blocks a light beam 32 is fixed to the rotary shaft 31 a , and the shutter member 30 can be rotationally driven by a motor 31 . The motor 31 can be fixed to the holding member 41 . The holding member 41 may be provided with an opening 41a through which the light flux 32 passes. Here, an appropriate gap is provided between the holding member 41 and the shutter member 30 so that the light flux 32 does not leak from the shutter device 120 and mechanical interference between the shutter member 30 and the holding member 41 does not occur. ΔG can be provided.

The shutter device 120 can comprise an optical sensor 43 with an optical path 43c arranged to detect deformation of the shutter member 30 rotationally driven by the motor 31 . In one example, the optical sensor 43 can be fixed to the sensor holder 42, and the sensor holder 42 can be fixed to the holding member 41 by a fixing part 45 such as a screw. The relative position of the sensor holder 42 with respect to the holding member 41 can be adjusted by an adjustment mechanism (not shown). The optical sensor 43 can be, for example, a transmissive sensor having a light projecting section 43a and a light receiving section 43b arranged to face each other across an optical path 43c. Alternatively, the optical sensor 43 may be a reflective sensor in which a light projecting section and a light receiving section are incorporated in a sensor unit arranged to face the mirror. The optical sensor 43 can be a photointerrupter that outputs a binary signal. The two values are a value indicating that the optical path 43 c is blocked by the shutter member 30 and a value indicating that the optical path 43 c is not blocked by the shutter member 30 .

In one example, the optical sensor 43 outputs a high level (High) when the optical path 43c is blocked by the shutter member 30, and outputs a low level (Low) when the optical path 43c is not blocked by the shutter member 30. I can. In another example, the optical sensor 43 can output a high level when the optical path 43 c is not blocked by the shutter member 30 and output a low level when the optical path 43 c is blocked by the shutter member 30 .

The shutter member 30 can have an arcuate edge 30e around the rotation center of the shutter member 30 (the center of the rotation shaft 31a). The optical path 43c of the optical sensor 43 can be arranged in the vicinity of the arcuate edge 30e of the shutter member 30. As shown in FIG. The direction of the optical path 43c can be a direction intersecting the straight line Dax parallel to the rotation axis 31a. An angle θ1 between the direction of the optical path 43c and the straight line Dax parallel to the rotation axis 31a is, for example, 30 degrees or more and 60 degrees or less, preferably 40 degrees or more and 50 degrees or less, and can be 45 degrees in one example.

The shutter device 120 may include a determination section 60 that determines abnormality of the shutter member 30 based on the output of the optical sensor 43 . The determination unit 60 can notify the control unit 190 of the determination result. The control unit 190 can execute error processing when receiving notification of the determination result that the shutter member 30 has an abnormality from the determination unit 60 . The error processing can include, for example, processing for stopping exposure of the substrate 162 and processing for notifying the operator of the determination result that the shutter member 30 has an abnormality. The determination section 60 may be incorporated into the control section 190 .

The operation of detecting deformation of the shutter member 30 by the optical sensor 43 will be described with reference to FIG. The optical path 43c of the optical sensor 43 can be arranged to detect deviation of the shape of the shutter member 30 from the normal shape range. For example, the optical path 43c of the optical sensor 43 can be arranged to be blocked by the shutter member 30 when the shape of the shutter member 30 deviates from the normal shape range. Here, the deformation of the shutter member 30 may occur while the shutter member 30 is stationary, or may occur while the shutter member 30 is rotated. The latter can be caused by centrifugal force, acceleration or the like acting on the shutter member 30 .

In one example, when the displacement of the edge 30e of the shutter member 30 in the direction parallel to the rotation axis 31 exceeds the permissible displacement Δd, the output signal of the optical sensor 43 transitions from High (pass) to Low (block), for example. Also, the position of the optical sensor 43 can be adjusted. For example, when the shape of the shutter member 30 becomes the shape 50 , the edge 30 e of the shutter member 30 can exceed the permissible displacement Δd of the shutter member 30 in the direction parallel to the rotation axis 31 .

FIG. 6A illustrates the output signal of the optical sensor 43 when the shape of the shutter member 30 is within the normal shape range. FIG. 6B illustrates the output signal of the optical sensor 43 when the shape of the shutter member 30 deviates from the normal shape range. 6A and 6B, the horizontal axis is time t, and the vertical axis is the output of the optical sensor 43. In FIG.

As illustrated in FIG. 6(a), when the shape of the shutter member 30 is within the normal shape range, the optical path 43c of the optical sensor 43 passes through the shutter member 30 in any of the periods ta, tb, tc, and td. 30 is not blocked. Therefore, the output signal of the optical sensor 43 remains High (passing). As illustrated in FIG. 6B, when the shape of the shutter member 30 deviates from the normal shape range, the optical sensor 43 is blocked by the shutter member 30 . However, the optical path 43c of the optical sensor 43 is not blocked by the shutter member 30 during the periods tb and td. Therefore, during periods ta and tc when the shutter member 30 blocks the light beam 32 for exposure, the output signal of the optical sensor 43 is Low (blocked), indicating that the shape of the shutter member 30 deviates from the normal shape range. indicates

The determination unit 60 can determine abnormality of the shutter member 30 based on the output signal of the optical sensor 43 . In this example, the determination unit 60 can determine that the shutter member 30 is abnormal based on the repetition of High and Low in the output signal of the optical sensor 43 or the presence of Low. In other words, the determination unit 60 can detect an abnormality of the shutter member 30 based on the repetition of High and Low in the output signal of the optical sensor 43 or the presence of Low.

In the above example, if the shape of the shutter member 30 deviates from the normal shape range, the optical path 43c of the optical sensor 43 is shifted to the shutter member 30 during periods ta and tc when the shutter member 30 blocks the light flux 32 for exposure. blocked by However, if the shape of the shutter member 30 deviates from the normal shape range, the light path 43c of the optical sensor 43 is blocked by the shutter member 30 during periods tb and td during which the shutter member 30 does not block the light flux 32 for exposure. The optical sensor 43 may be arranged as follows.

By adjusting the permissible displacement Δd to a value smaller than the gap ΔG schematically shown in FIG. Abnormality of the device 120 can be detected. By replacing the shutter device 120 based on the detection of an abnormality, it is possible to prevent the exposure apparatus EXP from stopping due to a failure of the shutter device 120 .

In the example shown in FIG. 4, the optical sensor 43 is arranged so that the rotating shaft 31 is positioned between the optical path of the light beam 32 and the optical sensor 43. It can be anywhere in the vicinity of the area where Also, a plurality of optical sensors 43 may be arranged. The angle θ1 may be a negative value assuming that the angle θ1 described in FIG. 4(a) is a positive value. In this case, even if the direction of deformation of the shutter member 30 is the direction away from the motor 31, it is possible to detect that the shape of the shutter member 30 deviates from the normal shape range.

The exposure apparatus EXP and the shutter device 120 of the second embodiment will be described below. Matters not mentioned in the second embodiment may follow the first embodiment. Deformation and detection of the shutter member 30 in the second embodiment will be described with reference to FIG. 2nd Embodiment differs in arrangement|positioning of the optical sensor 43 from 1st Embodiment. In the second embodiment, the optical path 43c of the optical sensor 43 is arranged to be blocked by the shutter member 30 when the shape of the shutter member 30 is within the normal shape range.

In one example, when the displacement of the edge 30e of the material of the shutter member 30 in the direction parallel to the rotation axis 31 exceeds the allowable displacement Δd, the output signal of the optical sensor 43 transitions from Low (blocking) to High (passing), for example. As such, the position of the optical sensor 43 can be adjusted. For example, when the shutter member 30 has the shape 50 , the edge 30 e of the shutter member 30 can exceed the allowable displacement Δd of the shutter member 30 in the direction parallel to the rotation axis 31 .

FIG. 8A illustrates the output signal of the optical sensor 43 when the shape of the shutter member 30 is within the normal shape range. FIG. 8B illustrates the output signal of the optical sensor 43 when the shape of the shutter member 30 deviates from the normal shape range. 8A and 8B, the horizontal axis is time t, and the vertical axis is the output of the optical sensor 43. In FIG.

As illustrated in FIG. 8A, when the shape of the shutter member 30 is within the normal shape range, the optical sensor 43 is blocked by the shutter member 30 . As illustrated in FIG. 8B, when the shape of the shutter member 30 deviates from the normal shape range, the optical path 43c of the optical sensor 43 is not blocked by the shutter member 30 during periods ta and tc. . Therefore, the optical path 43c of the optical sensor 43 is not blocked by the shutter member 30 during any of the periods ta, tb, tc, and td, and the output signal of the optical sensor 43 maintains High level.

The determination unit 60 can determine abnormality of the shutter member 30 based on the output signal of the optical sensor 43 . In this example, the determination unit 60 determines that the output signal of the optical sensor 43 is high during periods ta and tc during which the shutter member 30 blocks the light flux 32 for exposure. 30 can be determined to be abnormal.

In the second embodiment, as in the first embodiment, the position of the optical sensor 43 may be anywhere around the area through which the edge 30e passes. Also, a plurality of optical sensors 43 may be arranged.

The exposure apparatus EXP and the shutter device 120 of the third embodiment will be described below with reference to FIG. Matters not mentioned in the third embodiment may follow the first or second embodiment. The shutter device 120 of the third embodiment may comprise at least two optical sensors 43, 43'. Therefore, the shutter device 120 of the third embodiment can have at least two optical paths 43c, 43c'.

In the example shown in FIG. 9, the optical sensor 43 has an optical path 43c and the optical sensor 43' has an optical path 43c'. The optical path (first optical path) 43c can be arranged such that it is detected that the shape of the shutter member 30 deviates from the normal shape range in the first direction (the direction toward the motor 31). The optical path (second optical path) 43c' is arranged to detect deviation of the shape of the shutter member 30 from the normal shape range in a second direction (a direction away from the motor 31) different from the first direction.

The optical sensor 43 can be, for example, a transmissive sensor having a light projecting section 43a and a light receiving section 43b arranged to face each other across an optical path 43c. The optical sensor 43' can be, for example, a transmissive sensor having a light projecting section 43a' and a light receiving section 43b' which are arranged to face each other across an optical path 43c'. The light projecting portion 43 a and the light projecting portion 43 a ′ can be arranged at positions facing each other with the rotation range of the shutter member 30 interposed therebetween. The light receiving portion 43b and the light receiving portion 43b' can be arranged at positions facing each other with the rotation range of the shutter member 30 interposed therebetween. According to the third embodiment, even if the shutter member 30 is deformed outside the normal shape range in either the first direction or the second direction, it can be detected.

In the third embodiment, as in the first embodiment, the set of optical sensors 43, 43' may be placed anywhere around the area through which the edge 30e passes. Also, multiple sets of optical sensors 43, 43' may be arranged.

The exposure apparatus EXP and the shutter device 120 of the fourth embodiment will be described below with reference to FIGS. 10 and 11. FIG. Matters not mentioned in the fourth embodiment may follow the first to third embodiments. The fourth embodiment differs from the first to third embodiments in the arrangement of the optical sensor 43 .

The shutter member 30 has an edge 30 f that traverses the light beam 32 when the shutter member 30 is rotationally driven by the motor 31 . The optical path 43 c of the optical sensor 43 can detect deformation of the shutter member 30 by detecting a change in the position of the edge 30 f in the direction parallel to the rotational axis 31 a of the shutter member 30 . An angle θ1 between the direction of the optical path 43c and the straight line Dax parallel to the rotation axis 31a is, for example, 30 degrees or more and 60 degrees or less, preferably 40 degrees or more and 50 degrees or less, and can be 45 degrees in one example.

In one example, the deformation of the shutter member 30 is detected by the optical sensor 43 when the shutter member 30 is set (stopped) in any one of the states shown in FIGS. can be detected. Specifically, in this state, when the displacement of the arc-shaped edge 30e of the shutter member 30 in the direction parallel to the rotation shaft 31 exceeds the allowable displacement Δd, the output signal of the optical sensor 43 can become Low (blocked). . Therefore, the determination unit 60 can determine abnormality of the shutter member 30 based on the output signal of the optical sensor 43 .

FIG. 11 illustrates the output signal of the optical sensor 43 when the shutter member 30 is normal. The output signal of the optical sensor 43 can be a periodic signal with a period T. When an abnormality occurs in the shutter member 30, the waveform of the output signal of the optical sensor 43 may change from the waveform in the normal state. For example, when an abnormality occurs in the shutter member 30, the waveform of the output signal of the optical sensor 43 may be delayed with respect to the waveform in the normal state. For example, the phase of the output signal of the optical sensor 43 based on the timing at which the shutter control section 182 sends a drive command to the driver 184 can change due to the occurrence of an abnormality in the shutter member 30 . Therefore, the determination unit 60 can determine abnormality of the shutter member 30 based on the waveform of the output signal of the optical sensor 43 . Also in the fourth embodiment, a plurality of optical sensors 43 may be arranged.

The exposure apparatus EXP and the shutter device 120 of the fifth embodiment will be described below with reference to FIG. Matters not mentioned in the fifth embodiment may follow the first to fourth embodiments. The fifth embodiment differs from the first to fourth embodiments in the specifications of the optical sensor 43 . FIG. 12A schematically shows an arrangement example of the optical sensor 43 in the shutter device 120 of the fifth embodiment.

The shutter device 120 of the fifth embodiment has an optical sensor 43 that outputs an analog signal. The optical sensor 43 in the fifth embodiment can also have an optical path 43d that is thicker than the optical path 43c in the optical sensors 43 in the first to fourth embodiments. The optical path 43d can be a space through which parallel light beams pass. The optical sensor 43 can be, for example, a transmissive sensor having a light projecting section 43a and a light receiving section 43b arranged to face each other across an optical path 43c. Alternatively, the optical sensor 43 may be a reflective sensor in which a light projecting section and a light receiving section are incorporated in a sensor unit arranged to face the mirror. The light receiving unit 43b can be a light intensity sensor. The optical sensor 43 can output an analog signal having an amplitude corresponding to the intensity of light received by the light receiving section 43b. In the optical path 43d of the optical sensor 43, the central axis (optical axis) 43ax of the optical path 43d passes near the edge 30e of the shutter member 30 in the normal state, and part of the optical path 43d is blocked by the edge 30e of the shutter member 30 in the normal state. can be arranged to be

The output signal Sout of the optical sensor 43 is illustrated in FIG. 12(b). The output signal Sout can have a waveform dependent on the vibration of the edge 30e of the shutter member 30 or the like during periods ta and tc. The determination unit 60 can determine whether the shutter member 30 is abnormal by comparing the output signal Sout in the normal state with the output signal Sout when the exposure apparatus EXP is in use. The comparison between the output signal Sout in the normal state and the output signal Sout when the exposure apparatus EXP is in use may be a comparison of the output signal Sout itself, or may be performed based on a feature amount extracted from the output signal Sout. may

The article manufacturing method according to the embodiment of the present invention is suitable for manufacturing articles such as articles (semiconductor devices, magnetic storage media, liquid crystal display devices, etc.) and color filters. Such a manufacturing method includes an exposure step of exposing a substrate coated with a photosensitive agent, and a development step of developing the substrate exposed in the exposure step, using the exposure apparatus described above. The manufacturing method may also include other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). The method for manufacturing an article according to the present embodiment is advantageous in at least one of performance, quality, productivity and production cost of the article as compared with conventional methods.

The invention is not limited to the embodiments described above, and various modifications and variations are possible without departing from the spirit and scope of the invention. Accordingly, the claims are appended to make public the scope of the invention.

EXP: exposure device, 120: shutter device, 30: shutter member, 31: motor, 31a: rotating shaft, 43: optical sensor, 43a: light projecting section, 43b: light receiving section

Claims (14)

A shutter device having a shutter member that blocks a light beam and a rotating mechanism that rotates the shutter member,
an optical sensor for detecting deformation of the shutter member, comprising a light projecting unit for projecting light ;
The light projecting unit is arranged such that the direction of the optical path of the light is oblique to a straight line parallel to the rotation axis of the shutter member.
A shutter device characterized by: The light projecting unit is arranged such that the angle formed by the direction of the optical path and the straight line is 30 degrees or more and 60 degrees or less.
2. The shutter device according to claim 1, wherein: The light projecting unit is arranged so that it is detected that the shape of the shutter member deviates from a normal shape range.
3. The shutter device according to claim 1 or 2, characterized in that: The light projecting unit is arranged such that the light path is blocked by the shutter member when the shape of the shutter member deviates from the normal shape range.
4. The shutter device according to claim 3, characterized in that: The light projecting unit is arranged such that the light path is blocked by the shutter member when the shape of the shutter member is within the normal shape range.
4. The shutter device according to claim 3, characterized in that: The optical path includes a first optical path for detecting that the shape of the shutter member deviates from the normal shape range in a first direction parallel to the rotational axis of the shutter member; a second optical path for detecting deviation from range in a second direction parallel to the axis of rotation of the shutter member and opposite the first direction;
6. The shutter device according to any one of claims 1 to 5, characterized in that: the shutter member has an arc-shaped edge centered on the center of rotation of the shutter member;
the optical sensor detects deformation of the shutter member by detecting a change in the position of the edge in a direction parallel to the axis of rotation of the shutter member;
7. The shutter device according to any one of claims 1 to 6, characterized in that: The shutter member has an edge that traverses the light flux when the shutter member is rotationally driven by the rotating mechanism, and the optical sensor detects a change in the position of the edge in a direction parallel to the rotation axis of the shutter member. detecting deformation of the shutter member by detecting
7. The shutter device according to any one of claims 1 to 6, characterized in that: further comprising a determination unit that determines an abnormality of the shutter member based on the output of the optical sensor;
9. The shutter device according to any one of claims 1 to 8, characterized in that: the optical sensor outputs a binary signal;
10. The shutter device according to claim 9, characterized in that: The optical sensor outputs an analog signal, and the determination unit determines an abnormality of the shutter member based on the waveform of the analog signal.
10. The shutter device according to claim 9, characterized in that: The optical sensor has a light receiving section arranged opposite to the light projecting section across the optical path,
The shutter device according to any one of claims 1 to 11, characterized in that: an original plate holding unit that holds the original plate;
a substrate holder that holds the substrate;
a light source;
an illumination optical system that illuminates the original using light from the light source;
a projection optical system that projects the pattern of the original onto the substrate;
A shutter device according to any one of claims 1 to 12,
The shutter device is arranged so as to be able to block a light flux in an optical path between the light source and the original holder.
An exposure apparatus characterized by: A method for manufacturing an article,
an exposure step of exposing a substrate using the exposure apparatus according to claim 13;
and a developing step of developing the substrate exposed in the exposing step,
A method for producing an article, comprising producing an article from the substrate that has undergone the developing step.

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