JP2020160165A - Shutter device, exposure device and article manufacturing method - Google Patents

Abstract

To provide a technology advantageous for more surely preventing breakage of a shutter member.SOLUTION: A shutter device includes a shutter member to block a flux of light, a rotary mechanism to rotate and drive the shutter member, and an optical sensor in which an optical path is disposed so as to permit detection of deformation of the shutter member.SELECTED DRAWING: Figure 4

Description

The present invention relates to a shutter device, an exposure device, and a method for manufacturing an article.

In an exposure apparatus that illuminates an original plate using light from a light source and exposes the substrate by projecting the pattern of the original plate onto the substrate by a projection optical system, a shutter device is used to control the irradiation of the substrate with light. Will be done. The shutter device can control the irradiation of the substrate with light by rotationally driving the shutter member so as to cross the luminous flux. In order to improve the number of substrates processed per unit time, that is, the throughput, high-speed driving of the shutter member is required, and therefore the weight of the shutter member is reduced. The weight reduction of the shutter member can be achieved by reducing the thickness of the shutter member. The thinner shutter member makes it easier for the shutter member to deform. Deformation of the shutter member may cause mechanical interference between the shutter member and a member arranged around the shutter member, resulting in failure of the shutter device.

Patent Document 1 describes an exposure apparatus having an abnormality detecting means for detecting an abnormality of an exposure shutter. The abnormality detecting means determines the reflectance of the shutter blades based on the output of the light detector that detects the light from the discharge lamp and the output of the light detector that detects the reflected light of the exposure light from the shutter blades of the exposure shutter. It is calculated and an abnormality of the exposure shutter is detected based on this reflectance. Alternatively, the abnormality detecting means detects the surface temperature of the shutter blades of the exposure shutter, and detects the abnormality of the exposure shutter based on the surface temperature. Alternatively, the abnormality detecting means detects the abnormality of the exposure shutter by detecting the electrical contact between the shutter blade and the shielding plate arranged around the shutter blade.

Japanese Patent Application Laid-Open No. 2000-216874

In a configuration that detects the reflectance or surface temperature of the shutter blades, it is not possible to directly detect the abnormal deformation of the shutter blades, so that it may not be possible to detect the abnormal deformation of the shutter blades. Further, in the configuration of detecting the electrical contact between the shutter blade and the shielding plate arranged around the shutter blade, there is a possibility that the shutter blade or the shielding plate or the like is already damaged when the contact is detected. Therefore, with the configuration described in Cited Document 1, it may not be possible to prevent damage due to deformation of the shutter blades.

An object of the present invention is to provide an advantageous technique for more reliably preventing damage to a shutter member.

One aspect of the present invention relates to a shutter device having a shutter member that blocks a light beam and a rotation mechanism that rotationally drives the shutter member, so that the shutter device detects deformation of the shutter member. It is equipped with an optical sensor in which an optical path is arranged.

According to the present invention, an advantageous technique is provided for more reliably preventing damage to the shutter member.

The figure which shows the structure of the exposure apparatus of 1st Embodiment. The figure which shows the shutter device of 1st Embodiment. The figure which illustrates the blocking state and the passing state of the exposure light by a shutter member. The figure which shows the structure of the shutter device of 1st Embodiment. The figure which shows typically the detection principle of the deformation of the shutter member in 1st Embodiment. The figure which illustrates the output signal of the optical sensor in 1st Embodiment. The figure which shows typically the detection principle of the deformation of the shutter member in 2nd Embodiment. The figure which illustrates the output signal of the optical sensor in 2nd Embodiment. The figure which illustrates the output signal of the optical sensor in 3rd Embodiment. The figure which shows the structure of the shutter device of 4th Embodiment. The figure which illustrates the output signal of the optical sensor in 4th Embodiment. The figure which illustrates the detection principle of the deformation of the shutter member and the output signal of an optical sensor in 5th Embodiment.

Hereinafter, embodiments will be described in detail with reference to the accompanying drawings. The following embodiments do not limit the invention according to the claims. Although a plurality of features are described in the embodiment, not all of the plurality of features are essential for the invention, and the plurality of features may be arbitrarily combined. Further, in the attached drawings, the same or similar configurations are designated by the same reference numbers, and duplicate description is omitted.

FIG. 1 shows the configuration of the exposure apparatus EXP according to the first embodiment of the present invention. The exposure apparatus EXP may include a light source 110, a shutter apparatus 120, an illumination optical system 130, an original plate holding unit 140, a projection optical system 150, and a substrate holding unit 160. The original plate holding unit 140 holds the original plate 142. The original plate holding portion 140 is positioned by an original plate positioning mechanism (not shown), whereby the original plate 142 can be positioned. The board holding portion 160 holds the board 162. The exposure apparatus EXP is supplied with a substrate 162 coated with a resist by a resist coating apparatus. The substrate holding portion 160 is positioned by a substrate positioning mechanism (not shown), whereby the substrate 162 can be positioned.

The shutter device 120 is arranged so that the light flux can be blocked in the optical path between the light source 110 and the original plate holding unit 140. The illumination optical system 130 uses the light from the light source 110 to illuminate the original plate 142. The projection optical system 150 projects the pattern of the original plate 142 illuminated by the illumination optical system 130 onto the substrate 162, whereby the substrate 162 is exposed. As a result, a latent image pattern is formed on the resist applied to the substrate 162. The latent image pattern is developed by a developing device (not shown), whereby a resist pattern is formed on the substrate 162.

The exposure apparatus EXP may include, for example, a detection unit 170, a shutter control unit 182, and a driver 184 as a configuration for controlling the exposure amount of the substrate 162, in other words, a configuration for controlling the shutter device 120. The detection unit 170 may include, for example, an optical sensor 172, an amplifier 174, a V / F converter 176, and a pulse counter 178. The optical sensor 172 includes a photoelectric conversion element, and can photoelectrically convert the light that has passed through the shutter device 120 and is incident on the optical sensor 172.

In one example, a portion of the light that has passed through the shutter device 120 can be fetched by the beam splitter 132 and guided to the photosensor 172. The amplifier 174 can convert an output signal (eg, a current signal) from the optical sensor 172 into a voltage signal. The V / F converter 176 can convert the voltage signal output from the amplifier 174 into a frequency signal. The pulse counter 178 can count the number of pulses of the frequency signal output from the V / F converter 176. The count value counted by the pulse counter 178 corresponds to the integrated amount of the exposure light intensity (that is, the integrated amount of the exposure light passing through the shutter device 120), and also corresponds to the integrated exposure amount of the substrate 162.

The shutter control unit 182 can send a command to the driver 184 to pass the shutter device 120 so that the exposure of the substrate 162 is started. After that, the shutter control unit 182 instructs the driver 184 to shut off the shutter device 120 so that the integrated exposure amount of the substrate 162 becomes the target exposure amount based on the output from the detection unit 170. Can be sent. The driver 184 can drive the shutter device 120 according to a command from the shutter control unit 182.

The exposure apparatus EXP may include a control unit 190 that controls each of the above-mentioned portions of the exposure apparatus EXP. The control unit 190 is, for example, a PLD (abbreviation for Programmable Logic Device) such as FPGA (abbreviation for Field Programmable Gate Array), or an ASIC (application specific specialized integrated circuit) or an abbreviation for an ASIC (application specific integrated circuit) integrated circuit. Alternatively, it may be composed of a dedicated computer or a combination of all or a part thereof.

The substrate 162 typically has a plurality of shot regions. After the shot region of the substrate 162 and the original plate 142 are aligned, the shutter control unit 182 controls the shutter device 120 so that the exposure of the shot region is started so that the light passes through the shot region. Can be done. In this state, the shutter control unit 182 can send a command to the driver 184 to put the shutter device 120 into the shutoff state based on the count value provided by the detection unit 170 (pulse counter 178). In response, the driver 184 may drive the shutter device 120 to shut off the shutter device 120. After that, in order to expose the other shot area, the other shot area and the original plate are aligned, and the other shot area can be exposed. The above processing can be executed for all shot areas.

FIG. 2 schematically shows the configuration and operation of the shutter device 120 of the first embodiment. The shutter device 120 may include a shutter member 30 and a motor (rotation mechanism) 31 that rotationally drives the shutter member 30. The motor 31 can be driven by the driver 184 to rotationally drive the shutter member 30.

FIGS. 3A to 3D exemplify a state in which the exposure light is blocked and a state in which the exposure light is passed by the shutter member 30 of the shutter device 120. The shutter member 30 may have blocking portions 30a1 and 30a2 for blocking the luminous flux (exposure light) 32 and passing portions 30b1 and 30b2 for passing the luminous flux 32. In the period ta shown in FIG. 3A, the luminous flux 32 is blocked by the blocking portion 30a, and the substrate 162 is not exposed. During the period tb shown in FIG. 3B, the luminous flux 32 passes through the passing portion 30b1 to expose a shot region of the substrate 162. During the period ct shown in FIG. 3C, the luminous flux 32 is blocked by the blocking portion 30a, and the substrate 162 is not exposed. During the period td shown in FIG. 3D, the luminous flux 32 passes through the passing portion 30b2 to expose the other shot region of the substrate 162.

In the example shown in FIGS. 2 and 3, the shutter member 30 has two blocking portions 30a1 and 30a2 and two passing portions 30b1 and 30b2, but the shutter member 30 has at least one blocking portion and It may have at least one passage. The shutter member 30 may be stopped at each position shown in FIGS. 3 (a), (b), (c), and (d), or may be continuously driven without being stopped, for example. Good.

FIG. 4 shows the configuration of the shutter device 120 of the first embodiment. FIG. 4A is a cross section of the shutter device 120 cut at a plane parallel to the rotation shaft (output shaft) 31a of the motor 31 (a plane passing through the rotation shaft 31a). FIG. 4B is a cross-sectional view of the shutter device 120 cut at a plane (a plane passing through the shutter member 30) perpendicular to the rotation shaft (output shaft) 31a of the motor 31. The motor 31 can rotate the rotating shaft (rotating shaft) 31a according to the current supplied from the driver 184. A shutter member 30 that blocks the luminous flux 32 is fixed to the rotating shaft 31a, and the shutter member 30 can be rotationally driven by the motor 31. The motor 31 may be fixed to the holding member 41. The holding member 41 may be provided with an opening 41a through which the luminous flux 32 passes. Here, an appropriate gap is provided between the holding member 41 and the shutter member 30 so that leakage of the light flux 32 from the shutter device 120 and mechanical interference between the shutter member 30 and the holding member 41 do not occur. ΔG can be provided.

The shutter device 120 may include an optical sensor 43 in which an optical path 43c is arranged so that deformation of the shutter member 30 rotationally driven by the motor 31 is detected. In one example, the optical sensor 43 is fixed to the sensor holder 42, and the sensor holder 42 can be fixed to the holding member 41 by a fixing component 45 such as a screw. The position of the sensor holder 42 relative to the holding member 41 can be adjusted by an adjustment mechanism (not shown). The optical sensor 43 may be, for example, a transmissive sensor having a light emitting unit 43a and a light receiving unit 43b arranged so as to face each other with the optical path 43c interposed therebetween. Alternatively, the optical sensor 43 may be a reflection type sensor in which a light emitting unit and a light receiving unit are incorporated in a sensor unit arranged so as to face the mirror. The optical sensor 43 can be a photointerruptor that outputs a binary signal. The two values are a value indicating that the optical path 43c is blocked by the shutter member 30 and a value indicating that the optical path 43c is not blocked by the shutter member 30.

In one example, the optical sensor 43 outputs a high level (High) when the optical path 43c is blocked by the shutter member 30, and outputs a low level (Low) when the optical path 43c is not blocked by the shutter member 30. Can be done. In another example, the optical sensor 43 can output a high level when the optical path 43c is not blocked by the shutter member 30, and can output a low level when the optical path 43c is blocked by the shutter member 30.

The shutter member 30 may have an arcuate edge 30e centered on the rotation center of the shutter member 30 (the center of the rotation shaft 31a). The optical path 43c of the optical sensor 43 may be arranged in the vicinity of the arcuate edge 30e of the shutter member 30. The direction of the optical path 43c can be the direction intersecting the straight line Dax parallel to the rotation axis 31a. The angle θ1 formed by the direction of the optical path 43c and the straight line Dax parallel to the rotation axis 31a is, for example, 30 degrees or more and 60 degrees or less, preferably 40 degrees or more and 50 degrees or less, and may be 45 degrees in one example.

The shutter device 120 may include a determination unit 60 for determining an abnormality of the shutter member 30 based on the output of the optical sensor 43. The determination unit 60 may notify the control unit 190 of the result of the determination. When the control unit 190 receives the notification of the determination result that the shutter member 30 has an abnormality from the determination unit 60, the control unit 190 can execute the error processing. The error processing may include, for example, a processing for stopping the exposure of the substrate 162 and a processing for notifying the operator of a determination result that the shutter member 30 has an abnormality. The determination unit 60 may be incorporated in the control unit 190.

The operation of detecting the deformation of the shutter member 30 by the optical sensor 43 will be described with reference to FIG. The optical path 43c of the optical sensor 43 may be arranged so that it is detected that the shape of the shutter member 30 deviates from the normal shape range. For example, the optical path 43c of the optical sensor 43 may be arranged so as to be blocked by the shutter member 30 when the shape of the shutter member 30 deviates from the normal shape range. Here, the deformation of the shutter member 30 may exist in a state where the shutter member 30 is stationary, or may occur in a state where the shutter member 30 is rotated. The latter can be caused by centrifugal force or acceleration acting on the shutter member 30.

In one example, when the displacement of the edge 30e of the shutter member 30 in the direction parallel to the rotation axis 31 exceeds the allowable displacement Δd, the output signal of the optical sensor 43 transitions from, for example, High (passing) to Low (blocking). In addition, the position of the optical sensor 43 can be adjusted. For example, when the shape of the shutter member 30 becomes the shape 50, the edge 30e of the shutter member 30 can exceed the allowable displacement Δd of the shutter member 30 in the direction parallel to the rotation axis 31.

FIG. 6A illustrates the output signal of the optical sensor 43 when the shape of the shutter member 30 is within the normal shape range. FIG. 6B illustrates the output signal of the optical sensor 43 when the shape of the shutter member 30 deviates from the normal shape range. In FIGS. 6A and 6B, the horizontal axis is the time t and the vertical axis is the output of the optical sensor 43.

As illustrated in FIG. 6A, when the shape of the shutter member 30 is within the normal shape range, the optical path 43c of the optical sensor 43 is the shutter member in any of the periods ta, tb, tk, and td. It is not blocked by 30. Therefore, the output signal of the optical sensor 43 maintains High (passing). As illustrated in FIG. 6B, when the shape of the shutter member 30 deviates from the normal shape range, the optical sensor is used during the periods ta and tk in which the shutter member 30 blocks the light flux 32 for exposure. The optical path 43c of 43 is blocked by the shutter member 30. However, during the periods tb and td, the optical path 43c of the optical sensor 43 is not blocked by the shutter member 30. Therefore, during the period ta and tk in which the shutter member 30 blocks the light flux 32 for exposure, the output signal of the optical sensor 43 becomes Low (blocking), and the shape of the shutter member 30 deviates from the normal shape range. Is shown.

The determination unit 60 can determine the abnormality of the shutter member 30 based on the output signal of the optical sensor 43. In this example, the determination unit 60 can determine that the shutter member 30 has an abnormality based on the fact that the output signal of the optical sensor 43 repeats High and Low, or the presence of Low. In other words, the determination unit 60 can detect an abnormality in the shutter member 30 based on the fact that the output signal of the optical sensor 43 repeats High and Low, or the presence of Low.

In the above example, when the shape of the shutter member 30 deviates from the normal shape range, the optical path 43c of the optical sensor 43 is set in the shutter member 30 during the period ta and tk in which the shutter member 30 blocks the light flux 32 for exposure. Is blocked by. However, when the shape of the shutter member 30 deviates from the normal shape range, the optical path 43c of the optical sensor 43 is blocked by the shutter member 30 during the period tb and td when the shutter member 30 does not block the light flux 32 for exposure. The optical sensor 43 may be arranged as such.

By adjusting the permissible displacement Δd to a value smaller than the gap ΔG schematically shown in FIG. 4, the determination unit 60 shutters before the shutter device 120 fails due to the contact between the shutter member 30 and the holding member 41. The abnormality of the device 120 can be detected. By replacing the shutter device 120 based on the detection of an abnormality, it is possible to prevent the exposure device EXP from stopping due to a failure of the shutter device 120.

In the example shown in FIG. 4, the optical sensor 43 is arranged so that the rotation axis 31 is located between the optical path of the luminous flux 32 and the optical sensor 43, but the edge 30e passes through the position of the optical sensor 43. It may be anywhere around the area to be used. Further, a plurality of optical sensors 43 may be arranged. The angle θ1 may be a negative value, assuming that the angle θ1 shown in FIG. 4A is a positive value. In this case, it is possible to detect that the shape of the shutter member 30 deviates from the normal shape range even if the deformation direction of the shutter member 30 is in the direction away from the motor 31.

Hereinafter, the exposure apparatus EXP and the shutter apparatus 120 of the second embodiment will be described. Matters not mentioned as the second embodiment may follow the first embodiment. Deformation of the shutter member 30 and its detection in the second embodiment will be described with reference to FIG. 7. In the second embodiment, the arrangement of the optical sensor 43 is different from that in the first embodiment. In the second embodiment, the optical path 43c of the optical sensor 43 is arranged so as to be blocked by the shutter member 30 when the shape of the shutter member 30 is within the normal shape range.

In one example, when the displacement of the edge 30e of the shutter member 30 material in the direction parallel to the rotation axis 31 exceeds the allowable displacement Δd, the output signal of the optical sensor 43 transitions from, for example, Low (blocking) to High (passing). As such, the position of the optical sensor 43 can be adjusted. For example, when the shape of the shutter member 30 becomes the shape 50, the edge 30e of the shutter member 30 can exceed the permissible displacement Δd of the shutter member 30 in the direction parallel to the rotation axis 31.

FIG. 8A illustrates the output signal of the optical sensor 43 when the shape of the shutter member 30 is within the normal shape range. FIG. 8B illustrates the output signal of the optical sensor 43 when the shape of the shutter member 30 deviates from the normal shape range. In FIGS. 8A and 8B, the horizontal axis is the time t and the vertical axis is the output of the optical sensor 43.

As illustrated in FIG. 8A, when the shape of the shutter member 30 is within the normal shape range, the optical sensor 43 is in the period ta and tk during which the shutter member 30 blocks the light flux 32 for exposure. The optical path 43c of the above is blocked by the shutter member 30. As illustrated in FIG. 8B, when the shape of the shutter member 30 deviates from the normal shape range, the optical path 43c of the optical sensor 43 is not blocked by the shutter member 30 even during the periods ta and tk. .. Therefore, in any of the periods ta, tb, tk, and td, the optical path 43c of the optical sensor 43 is not blocked by the shutter member 30, and the output signal of the optical sensor 43 maintains the high level.

The determination unit 60 can determine the abnormality of the shutter member 30 based on the output signal of the optical sensor 43. In this example, the determination unit 60 is based on, for example, a period during which the shutter member 30 blocks the light flux 32 for exposure, and a period during which the output signal of the optical sensor 43 becomes High. It can be determined that there is an abnormality in 30.

In the second embodiment, as in the first embodiment, the position of the optical sensor 43 may be anywhere as long as it is around the region through which the edge 30e passes. Further, a plurality of optical sensors 43 may be arranged.

Hereinafter, the exposure apparatus EXP and the shutter apparatus 120 of the third embodiment will be described with reference to FIG. Matters not mentioned as the third embodiment may follow the first or second embodiment. The shutter device 120 of the third embodiment may include at least two optical sensors 43, 43'. Therefore, the shutter device 120 of the third embodiment may have at least two optical paths 43c, 43c'.

In the example shown in FIG. 9, the optical sensor 43 has an optical path 43c, and the optical sensor 43'has an optical path 43c'. The optical path (first optical path) 43c may be arranged so that it is detected that the shape of the shutter member 30 deviates from the normal shape range in the first direction (direction approaching the motor 31). The optical path (second optical path) 43c'is arranged so that it is detected that the shape of the shutter member 30 deviates from the normal shape range in a second direction (direction away from the motor 31) different from the first direction.

The optical sensor 43 may be, for example, a transmissive sensor having a light emitting unit 43a and a light receiving unit 43b arranged so as to face each other with the optical path 43c interposed therebetween. The optical sensor 43'can be, for example, a transmissive sensor having a light emitting unit 43a'and a light receiving unit 43b'arranged so as to face each other across the optical path 43c'. The light projecting unit 43a and the light projecting unit 43a'can be arranged at positions facing each other with the rotation range of the shutter member 30 interposed therebetween. The light receiving unit 43b and the light receiving unit 43b'can be arranged at positions facing each other with the rotation range of the shutter member 30 interposed therebetween. According to the third embodiment, even if the shutter member 30 is deformed outside the normal shape range in either the first direction or the second direction, it can be detected.

In the third embodiment, as in the first embodiment, the set of the optical sensors 43, 43'may be arranged anywhere as long as it is around the region through which the edge 30e passes. Further, a plurality of sets of optical sensors 43, 43'may be arranged.

Hereinafter, the exposure apparatus EXP and the shutter apparatus 120 of the fourth embodiment will be described with reference to FIGS. 10 and 11. Matters not mentioned as the fourth embodiment may follow the first to third embodiments. In the fourth embodiment, the arrangement of the optical sensor 43 is different from that in the first to third embodiments.

The shutter member 30 has an edge 30f that crosses the luminous flux 32 when the shutter member 30 is rotationally driven by the motor 31. The optical path 43c of the optical sensor 43 can detect the deformation of the shutter member 30 by detecting the change in the position of the edge 30f in the direction parallel to the rotation axis 31a of the shutter member 30. The angle θ1 formed by the direction of the optical path 43c and the straight line Dax parallel to the rotation axis 31a is, for example, 30 degrees or more and 60 degrees or less, preferably 40 degrees or more and 50 degrees or less, and may be 45 degrees in one example.

In one example, when the shutter member 30 is set (stopped) in any of the states of FIGS. 3 (a), (b), (c), and (d), the optical sensor 43 deforms the shutter member 30. Can be detected. Specifically, in this state, if the displacement of the arcuate edge 30e of the shutter member 30 in the direction parallel to the rotation axis 31 exceeds the allowable displacement Δd, the output signal of the optical sensor 43 may become Low (block). .. Therefore, the determination unit 60 can determine the abnormality of the shutter member 30 based on the output signal of the optical sensor 43.

FIG. 11 illustrates an output signal of the optical sensor 43 when there is no abnormality in the shutter member 30. The output signal of the optical sensor 43 can be a periodic signal having a period T. When an abnormality occurs in the shutter member 30, the waveform of the output signal of the optical sensor 43 can change from the waveform in the normal state. For example, if an abnormality occurs in the shutter member 30, the waveform of the output signal of the optical sensor 43 may lag behind the waveform in the normal state. For example, the phase of the output signal of the optical sensor 43 based on the timing at which the shutter control unit 182 sends a drive command to the driver 184 may change due to the occurrence of an abnormality in the shutter member 30. Therefore, the determination unit 60 can determine the abnormality of the shutter member 30 based on the waveform of the output signal of the optical sensor 43. Also in the fourth embodiment, a plurality of optical sensors 43 may be arranged.

Hereinafter, the exposure apparatus EXP and the shutter apparatus 120 of the fifth embodiment will be described with reference to FIG. Matters not mentioned as the fifth embodiment may follow the first to fourth embodiments. In the fifth embodiment, the specifications of the optical sensor 43 are different from those in the first to fourth embodiments. FIG. 12A schematically shows an arrangement example of the optical sensor 43 in the shutter device 120 of the fifth embodiment.

The shutter device 120 of the fifth embodiment includes an optical sensor 43 that outputs an analog signal. As for the optical sensor 43 in the fifth embodiment, the optical sensor 43 in the first to fourth embodiments may also have an optical path 43d thicker than the optical path 43c. The optical path 43d can be a space through which parallel light flux passes. The optical sensor 43 may be, for example, a transmissive sensor having a light emitting unit 43a and a light receiving unit 43b arranged so as to face each other with the optical path 43c interposed therebetween. Alternatively, the optical sensor 43 may be a reflection type sensor in which a light emitting unit and a light receiving unit are incorporated in a sensor unit arranged so as to face the mirror. The light receiving unit 43b can be a light amount sensor. The optical sensor 43 can output an analog signal having an amplitude corresponding to the intensity of the light received by the light receiving unit 43b. The optical path 43d of the optical sensor 43 passes near the edge 30e of the shutter member 30 in which the central axis (optical axis) 43ax of the optical path 43d is in the normal state, and a part of the optical path 43d is blocked by the edge 30e of the shutter member 30 in the normal state. Can be arranged to be.

FIG. 12B illustrates the output signal Sout of the optical sensor 43. The output signal Sout may have a waveform that depends on the vibration of the edge 30e of the shutter member 30 and the like during the periods ta and tc. The determination unit 60 can determine an abnormality of the shutter member 30 by comparing the output signal Sout in the normal state with the output signal Sout when the exposure device EXP is used. The comparison between the output signal Sout in the normal state and the output signal Sout when the exposure device EXP is used may be a comparison of the output signal Sout itself, or is performed based on the feature amount extracted from the output signal Sout. You may.

The article manufacturing method according to the embodiment of the present invention is suitable for manufacturing articles such as articles (semiconductor elements, magnetic storage media, liquid crystal display elements, etc.) and color filters. Such a manufacturing method includes an exposure step of exposing a substrate coated with a photosensitizer and a developing step of developing the substrate exposed in the exposure step by using the above-mentioned exposure apparatus. In addition, the manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, flattening, etching, resist peeling, dicing, bonding, packaging, etc.). The method for producing an article in the present embodiment is advantageous in at least one of the performance, quality, productivity and production cost of the article as compared with the conventional method.

The invention is not limited to the above embodiments, and various modifications and modifications can be made without departing from the spirit and scope of the invention. Therefore, a claim is attached to make the scope of the invention public.

EXP: Exposure device, 120: Shutter device, 30: Shutter member, 31: Motor, 31a: Rotating shaft, 43: Optical sensor, 43a: Light projecting unit, 43b: Light receiving unit

Claims (15)

A shutter device including a shutter member that blocks a light flux and a rotation mechanism that rotationally drives the shutter member.
An optical sensor in which an optical path is arranged so that deformation of the shutter member is detected is provided.
A shutter device characterized by this. The direction of the optical path is a direction that intersects a straight line parallel to the rotation axis of the shutter member.
The shutter device according to claim 1, wherein the shutter device. The angle between the direction of the optical path and the straight line is 30 degrees or more and 60 degrees or less.
The shutter device according to claim 2, wherein the shutter device is characterized by the above. The optical path is arranged so that it is detected that the shape of the shutter member deviates from the normal shape range.
The shutter device according to any one of claims 1 to 3, wherein the shutter device is characterized by the above. The optical path is arranged so as to be blocked by the shutter member when the shape of the shutter member deviates from the normal shape range.
The shutter device according to claim 4, wherein the shutter device is characterized by this. The optical path is arranged so as to be blocked by the shutter member when the shape of the shutter member is within the normal shape range.
The shutter device according to claim 4, wherein the shutter device is characterized by this. The optical path is a first optical path arranged so that it is detected that the shape of the shutter member deviates from the normal shape range in the first direction, and the shape of the shutter member is in the first direction from the normal shape range. Includes a second optical path arranged to detect deviations in a second direction different from
The shutter device according to any one of claims 1 to 6, wherein the shutter device. The shutter member has an arcuate edge centered on the center of rotation of the shutter member, and the optical path detects a change in the position of the edge in a direction parallel to the rotation axis of the shutter member. Detects deformation of the shutter member,
The shutter device according to any one of claims 1 to 7, wherein the shutter device is characterized. The shutter member has an edge that crosses the luminous flux when the shutter member is rotationally driven by the rotation mechanism, and the optical path changes the position of the edge in a direction parallel to the rotation axis of the shutter member. By detecting, the deformation of the shutter member is detected.
The shutter device according to any one of claims 1 to 7, wherein the shutter device is characterized. A determination unit for determining an abnormality of the shutter member based on the output of the optical sensor is further provided.
The shutter device according to any one of claims 1 to 9, wherein the shutter device. The optical sensor outputs a binary signal.
The shutter device according to claim 10. The optical sensor outputs an analog signal, and the determination unit determines an abnormality of the shutter member based on the waveform of the analog signal.
The shutter device according to claim 10. The optical sensor has a light projecting unit and a light receiving unit arranged so as to face each other across the optical path.
The shutter device according to any one of claims 1 to 12, wherein the shutter device. The original plate holding part that holds the original plate,
The board holding part that holds the board and
Light source and
An illumination optical system that illuminates the original plate using the light from the light source, and
A projection optical system that projects the pattern of the original plate onto the substrate,
The shutter device according to any one of claims 1 to 13 is provided.
The shutter device is arranged so as to be able to block a light flux in an optical path between the light source and the master plate holding portion.
An exposure apparatus characterized in that. It is an article manufacturing method
An exposure step of exposing a substrate using the exposure apparatus according to claim 14.
Including a developing step of developing the substrate exposed in the exposure step.
A method for producing an article, which comprises producing an article from the substrate that has undergone the development step.

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